JPH06262203A - Manufacture of supporting body for planographic printing plate - Google Patents

Abstract

PURPOSE:To remarkably reduce a cost by reducing variance of an alloy component of an aluminum supporting body giving ruggedness on the surface of the aluminum at the sane time of the final cold rolling and and simplifying stages. CONSTITUTION:After molten aluminum heated to 680 deg.C is poured into a phi500 cooling double roll and coil having a 6mm thickness is cast continuously, it is cold-rolled up a 1mm thickness and heat treated at 450 deg.C for 60 min, then, cold-rolled again up to 0.201mm, rolled by emboss rolls having a surface roughness Ha of 10mum at 100kg /cm<2> pressure to make a rugged surface on the aluminum surface and it is finished in to the surface toughness of 0.20mm to form JIS1050 material.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a lithographic printing plate support, and more particularly to a method for producing an aluminum support having a low production cost.

[0002]

2. Description of the Related Art Conventionally, an aluminum plate has been widely used as a support for a lithographic printing plate, but it has good adhesion to a photosensitive layer provided thereon, and a lithographic printing plate produced by using the same. The purpose is to improve the water retention of the non-image area of the plate (the area that receives the dampening water used during printing and repels the oil-based ink, and the area where the surface of the support is exposed plays the role). As a general rule, the surface of the aluminum plate is roughened. This roughening treatment is called so-called graining, and is an indispensable step in the preparation of the lithographic printing plate support, and is a work that requires a considerable degree of skill.

This graining is roughly classified into a mechanical graining method such as ball grain, wire grain and brush grain, and an electrical graining method. In the case of ball grain, there are many factors that require skill such as the material of the ball, the type of abrasive, the adjustment of water content during polishing, etc. Also, it is impossible to perform the work continuously and it is necessary to finish one by one. is there. In addition, the wire grain has non-uniform grain. On the other hand, brush grain is an improved version of these methods, and it is suitable for mass production because it has a uniform grain and can be continuously treated. However, it is difficult to obtain sufficient performance as a printing plate support by the above mechanical method.

Generally, when the surface roughness is large, the water retention (that is,
It is said that when the lithographic printing plate is made for the purpose of improving water retention and making printing easier, the surface shape of the support has unevenness as uniform as possible. It is said that those having a further finer surface roughness are preferable. As a method for obtaining such a preferable surface shape, an electrochemical roughening method has been noted, but in the case of this method, the composition of the electrolytic solution,
By keeping various conditions such as temperature and electrolysis conditions constant,
Although an aluminum plate having a certain roughened surface can be obtained, the range of electrolysis conditions thereof is very narrow, and therefore it is extremely difficult to electrolyze by adjusting so as to always keep it within such a range. . Further, the electrochemical roughening has a problem from an economical point of view because the power consumption becomes large when the uneven surface and the fine roughening are combined. Moreover, the electrolysis causes a considerable amount of aluminum ions to be accumulated in the electrolytic solution, which has a drawback that the labor cost and the chemical fee for treating the waste solution reach a considerable amount.

Further, as a method of making unevenness on the aluminum surface, a method of using a rolling roller having a reverse graining surface is known in Japanese Patent Laid-Open No. 74898 / 55-74898. It is very difficult to form a fine grained reverse graining surface which is particularly suitable as the above. As a method for improving the above-mentioned drawbacks, in JP-A-60-36195 and JP-A-60-36196, a long axis average length of 10 to 140 μm and a short axis average length of 7 to 80 μ are obtained by rolling rollers.
It describes a method of forming fine concavities and convexities of 1 to 10 μm chemically or electrochemically after forming an elliptical press concave portion of m. JP-A-60-203496 describes an aluminum support for a lithographic printing plate which has been subjected to chemical etching treatment and electrochemical etching treatment after transferring irregularities having an average diameter of 10 to 100 μm by an embossed roll. Has been done.

On the other hand, as a method of manufacturing an aluminum support, an aluminum ingot is melted and held to form a slab (thickness 400 to 600 mm, width 1000 to 2000 m).
m, length 2000 to 6000 mm), and a uniform heat treatment for holding the impurity texture portion of the slab surface in a soaking furnace at 480 to 600 ° C. for 6 to 18 hours in order to make the texture uniform in the chamfering machine. Process and then hot rolling 200 ~
Perform at 540 ° C. After hot rolling to a thickness of 5 to 40 mm, cold rolling is performed to a predetermined thickness at room temperature. Further, after that, in order to homogenize the structure and to make the plate have a good flatness, annealing is performed to homogenize the rolled structure and the like, and then cold rolling is performed to a prescribed thickness for straightening. The aluminum support thus prepared was used as a support for a lithographic printing plate. However, in the case of electrolytic surface roughening treatment, it is particularly susceptible to the target aluminum support, and when the aluminum support is manufactured through a process of melting and holding → casting → chamfering → soaking,
Variations such as metal alloy components were generated in the surface layer, which was a cause of lowering the yield as a lithographic printing plate.

On the other hand, the present applicant has previously proposed a method capable of producing a lithographic printing plate of excellent quality by reducing variations in the material of the aluminum support and improving the efficiency of the electrolytic surface roughening treatment. As a feature, it is characterized by performing casting and hot rolling continuously from molten aluminum to form a hot rolling coil of a thin plate, and then subjecting an aluminum support subjected to cold rolling, heat treatment and straightening to a surface roughening treatment. A method for producing a lithographic printing plate support has been proposed. (JP-A-3-79
798 publication)

[0008]

However, although the above method is excellent as a method for producing an aluminum support as a support for a lithographic printing plate, it is still more desirable to form uniform unevenness as a roughening method. It is desirable to perform it together with the final cold rolling.

The object of the present invention is to reduce the above-mentioned variations in alloy components of the aluminum support, and to make the surface of the aluminum uneven during the final cold rolling to simplify the process, thereby enabling a large cost reduction. It provides a process to do.

[0010]

The above object of the present invention, that is, the object of the present invention, is to produce a thin plate directly by continuous casting, and obtain a lithographic printing plate obtained through the steps of annealing, cold rolling and straightening. In the method for producing a plate support, the above-mentioned cold rolling for adjusting the final plate thickness, or finish cold rolling for finishing the surface shape after adjusting the final plate thickness is performed, and the uneven surface is pressed and transferred to an aluminum plate, A method for producing a support for a lithographic printing plate, which comprises forming an uneven pattern on the surface. 2. The method for producing a lithographic printing plate support according to claim 1, wherein the thin plate produced by continuous casting is produced by a direct cooling twin roll method.

As a method for directly casting a thin plate by continuously casting the molten aluminum in the present invention, the Hunter method,
There is a 3C method and the like, and as a method for forming a thin plate by continuously performing casting and hot rolling, there is a Hazley method.
No. 238801, JP-A-60-240360 and the like. Further, Japanese Patent Application Laid-Open No. 3-79708, Japanese Patent Application No. 4-313323, Japanese Patent Application No. 4-341471 each disclose a method for forming a thin plate and an annealing method. Also, Japanese Patent Application No. 4-223534 and Japanese Patent Application No. 4-258.
88, Japanese Patent Application No. 4-293960, each specification discloses casting conditions and the like. The thin plate obtained by casting, cold rolling, and heat treatment as described above controls the surface roughness together with the cold rolling to adjust the final plate thickness or the finish cold rolling. Transfer. With cold rolling means in the same process. The final rolling roller may have an uneven surface, or the final rolling roller may be followed by an uneven surface roller. Various transfer methods have been proposed. The above-mentioned JP-A-55-74898 and JP-A-60-3619.
5, Japanese Patent Application Laid-Open No. 60-203496, Japanese Patent Application No. 4-175946, which is characterized by being performed several times, and Japanese Patent Application No. 4 (1999), characterized in that the surface of the rough surface of the uneven surface is elastic.
-204235 and the like. Also, by using electrical discharge machining, shot blasting, laser, plasma etching, etc., it is possible to perform repeated transfer using a roller that has fine irregularities etched, and to contact the aluminum plate with the irregular surface coated with fine particles. The surface is made to face and a pressure is repeatedly applied thereto a plurality of times to repeatedly transfer the uneven pattern corresponding to the average diameter of the fine particles to the aluminum plate a plurality of times. As a method of imparting fine irregularities to the transfer roller, there are disclosed in Japanese Patent Laid-Open Nos. 3-08635 and 3-066404.
And Japanese Patent Laid-Open No. 63-065017 are known. Further, fine grooves may be cut from two directions on the roller surface by using a die, a bite, a laser or the like to form square irregularities on the surface. The roller surface may be subjected to a known etching treatment or the like so that the formed square irregularities are rounded. Needless to say, quenching, hard chrome plating, etc. may be performed to increase the hardness of the surface.

Next, after the unevenness is formed by the transfer as described above, the aluminum surface is chemically treated with an acid or alkali for the purpose of smoothing and uniformizing the aluminum plate, if necessary. Particularly, in the case of performing electrochemical surface roughening, the surface roughening becomes non-uniform when the surface is continuously transferred after the transfer. Specific examples of the acid and alkali used in such chemical treatment include a method using an aqueous solution of soda salt such as phosphoric acid, sulfuric acid, hydrochloric acid, nitric acid, sodium hydroxide, sodium carbonate, sodium bicarbonate, sodium sulfate, orthosilicate. Method using an aqueous solution of silicate such as sodium silicate, sodium metasilicate, sodium disilicate, sodium silicate No. 3, sodium monophosphate, sodium triphosphate,
There is a method of using an aqueous solution of a phosphate such as dibasic sodium phosphate, sodium tripolyphosphate, sodium pyrophosphate, sodium hexametaphosphate. As processing conditions,
The concentration is appropriately selected from 0.01% to 50% by weight, temperature 20 ° C to 90 ° C, and time 5 seconds to 5 minutes. The etching amount is appropriately selected depending on the material of aluminum and the required quality. JP-A-54-65607, JP-A-55-12
In each of the 5299 publications, a pretreatment for electrochemical graining is proposed. JP-A-63-235500, JP-A-63-
307990, JP-A-1-127388, JP-A1-1
60690, JP-A-1-136789, JP-A-1-13
6788, JP-A-1-178497, JP-A-1-308
689, JP-A-3-126871, JP-A-3-1269
No. 00, JP-A-3-173800 and the like include various pretreatments, but the present invention is not limited to these. However, when the aluminum surface is chemically treated with an acid / alkali aqueous solution in this manner, an insoluble residue portion, that is, smut, is generated on the surface. This smut can be removed with phosphoric acid, nitric acid, sulfuric acid, chromic acid or mixtures thereof. In the present invention, the aluminum surface subjected to electrochemical graining treatment is
A clean surface with no smut is desirable. However, when the electrolytic solution is an acid and has a desmutting effect, this can be omitted.

If necessary, the aluminum plate thus treated is subjected to electrochemical graining. The electrochemical grain method is described in JP-B-48-28123 and British Patent 896563. The above-mentioned electrolytic graining conventionally uses an alternating current having a sinusoidal waveform, but may be performed using a special waveform as described in JP-A-52-58602. Further, JP-A-55-158298 and JP-A-56-2
8898, JP-A-52-58602, JP-A-52-15
2302, JP-A-54-85802, JP-A-60-19
0392, JP-A-58-120531, JP-A-63-1
76187, JP-A-1-5889, JP-A-1-5889
280590, JP-A-1-118489, JP-A1-1
48592, Japanese Unexamined Patent Publication No. 1-178496, Japanese Unexamined Patent Publication No. 1-18
8315, Japanese Patent Application Laid-Open No. 1-154797, Japanese Patent Application Laid-Open No. 2-235.
794, JP-A-3-260100, JP-A-3-2536
00, JP-A-4-72079, JP-A-4-72098,
The methods described in JP-A-3-267400 and JP-A-1-141094 can also be applied. As the frequency, in addition to the above, those proposed for electrolytic capacitors can also be used. For example, US Pat. Nos. 4,276,129 and 46,
76879 each specification.

As the electrolytic solution, nitric acid, hydrochloric acid and the like mentioned above,
U.S. Pat. Nos. 4,671,859, 4,666,576 and 466.
1219, 4618405, 462628, 46
00482, same as 4566960, same as 4566958, same as 4566959, same as 4416972, same as 437471.
The electrolytic solution described in each specification of No. 0, No. 4336113, No. 4184932, etc. can also be used. As an electrolyzer and power supply,
Various proposals have been made, but U.S. Pat. No. 4,203,637, JP-A-56-123400, JP-A-57-597.
70, JP-A-53-12738, and JP-A-53-3282.
1, JP-A-53-32822, JP-A-53-3282
3, JP-A-55-122896, JP-A-55-1328
84, JP-A-62-127500, JP-A-1-5210.
0, JP-A-1-52098, JP-A-60-67700,
There are Japanese Patent Laid-Open Nos. 1-230800 and 3-257199. In addition to the patents mentioned above, various proposals have been made. For example, JP-A-52-58602, JP-A-52-152302, JP-A-53-12738, JP-A-53-12739, JP-A-53-32821, and JP-A-5-52821.
3-32822, JP-A-53-32833, JP-A-53.
-32824, JP-A-53-32825, JP-A-54-
85802, JP-A-55-122896, JP-A-55-
132884, Japanese Patent Publication 48-28123, Japanese Patent Publication 51-
7081, JP-A-52-133838, JP-A-52-1
33840, JP-A-52-133844, JP-A-52-
133845, JP-A-53-149135, JP-A-54.
Of course, those described in each publication of -146234 can be applied.

If necessary, the aluminum plate thus obtained is treated with an alkali or an acid. Alkali treatment is performed as described in JP-A-56-51388, and desmutting treatment is performed with sulfuric acid as described in JP-A-53-12739. In addition, JP-A-53-1
Phosphoric acid treatment as described in JP-A-15302, JP-A-60-8091, JP-A-63-176188, JP-A-1
-38291, JP-A-1-127389, Japanese Patent Application No. 1-1
88699, JP-A-3-177600, JP-A-3-12
6891, JP-A-3-191100 and the like can also be used.

It is preferable to form an anodized film on the surface of the aluminum support thus obtained. As the electrolytic solution, sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, or the like, or an aqueous solution or a non-aqueous solution in which two or more kinds of these are combined is used.
An anodized film can be formed. The treatment conditions for anodizing vary variously depending on the electrolytic solution used, so it cannot be said unequivocally, but generally the concentration of the electrolytic solution is 1
~ 80% by weight, liquid temperature 5-70 ° C, current density 0.5-60
A / cm ² , voltage 1 to 100 V, electrolysis time 15 seconds to 50
Minutes are appropriate. As an electrolysis device, Japanese Patent Laid-Open No. 48-26
638, JP-A-47-18739, JP-B-58-245.
17 It is introduced in each publication. In addition, JP-A-54-
81133, JP-A-57-47894, and JP-A-57-5.
1289, JP-A-57-51290, JP-A-57-54
300, JP-A-57-136596, JP-A-58-10
7498, JP-A-60-200256, JP-A-62-1
36596, JP-A-63-176494, JP-A-4-1-1.
76897, Japanese Patent Application Laid-Open No. 4-280997, Japanese Patent Application No. 3-187376, Japanese Patent Application No. 3-188829, Japanese Patent Application No.
-187377, Japanese Patent Application 3-188830, Japanese Patent Application 3-
294204, Japanese Patent Application No. 3-289849, Japanese Patent Application No. 4-9
The method described in each of the 701 specifications can of course be used. As the treatment liquid, JP-A-3-253596, JP-A-62-82089, JP-A-1-133794, JP-A-54-32424, Japanese Patent Application No. 3-159901,
Of course, the liquids of Japanese Patent Application No. 3-197306 and the like can also be used.

After forming the anodized film as described above,
In order to optimize the adhesion between each support and the photosensitive composition, after etching the anodic oxide film, water vapor and
There is an apparatus for sealing a support, which provides a photosensitive printing plate which is subjected to sealing treatment with hot water and has good stability over time, good developability, and no stains on non-image areas. (Postal No. 12518) A film formation post-treatment may be carried out with such an apparatus. Also, Japanese Patent Application Laid-Open No. 4-4194 and Japanese Patent Application No. 4-33.
952, Japanese Patent Application No. 4-33951, Japanese Patent Application No. 3-31524
5 The sealing treatment may be performed by the device and method described in each specification.

Others are described in US Pat. No. 2,946,638, potassium fluoride zirconate treatment, US Pat. No. 3,201,247, phosphomolybdate treatment British Patent 1,108,559. Alkyl titanate treatment, German patent 109
1433, polyacrylic acid treatment, DE 1134093 and GB 1
Polyvinylphosphonic acid treatment described in JP-A-230447, phosphonic acid treatment described in JP-B-44-6409, phytic acid treatment described in US Pat. No. 3,307,951, JP-A-58. -16
No. 893 and JP-A-58-18291, treatment with a salt of a lipophilic organic polymer compound and a divalent metal, and as described in US Pat. No. 3,860,426. , An undercoat layer of hydrophilic cellulose (eg, carboxymethyl cellulose) containing a water-soluble metal salt (eg, zinc acetate), or JP-A-59-59
The water-soluble polymer having a sulfonic acid group described in JP-A No. 101651, which is hydrophilized by undercoating, the phosphate described in JP-A No. 62-019494, and JP-A No. 62-194494. Water-soluble epoxy compounds described in JP-A-03-03692, JP-A-62-097.
Phosphoric acid-modified starch described in Japanese Patent No. 892, 1988
No. 056498, a diamine compound described in JP-A-63-130391, an inorganic or organic acid of an amino acid, an organic phosphonic acid containing a carboxyl group or a hydroxyl group described in JP-A-63-145092, Compounds having an amino group and a phosphonic acid group described in JP-A-63-165183, specific carboxylic acid derivatives described in JP-A-2-316290, and JP-A-1-27259.
Phosphoric acid ester described in JP-A No. 4-2615
No. 92, one amino group and phosphorus oxyacid group 1
A compound having an individual, a phosphoric acid ester described in Japanese Patent Application No. 2-265845, an aliphatic or aromatic phosphonic acid such as phenylphosphonic acid described in Japanese Patent Application No. 3-10604, JP-A-1- Compounds containing S atom such as thiosalicylic acid described in JP-A-307745, Japanese Patent Application No. 3-4
Undercoating such as a compound having a phosphorus oxygen acid group described in Japanese Patent No. 6932, or coloring with an acid dye described in JP-A-60-64352 can be performed.

The support of the present invention may be provided with a photosensitive layer exemplified below to form a photosensitive lithographic printing plate. [I] In the case of providing a photosensitive layer containing an o-naphthoquinonediazide sulfonate and a phenol / cresol mixed novolak resin. The o-quinonediazide compound is an o-naphthoquinonediazide compound and is described, for example, in US Pat. No. 2,766,118.
No. 2,767,092, No. 2,772,97
No. 2, No. 2,859,112, No. 3,102,8
09, 3,106,465 and 3,635.
No. 709, No. 3,647,443, and various publications, and these can be preferably used. Among these, o-naphthoquinone diazide sulfonic acid ester or o-naphthoquinone diazide carboxylic acid ester of aromatic hydroxy compound, and o-naphthoquinone diazide sulfonic acid amide or o-naphthoquinone diazide carboxylic acid amide of aromatic amino compound are particularly preferable. , Especially US Pat. No. 3,63
US Pat. No. 4,028,1 wherein the condensate of pyrogallol and acetone described in US Pat. No. 5,709, is ester-reacted with o-naphthoquinonediazide sulfonic acid.
A polyester obtained by esterifying o-naphthoquinone diazide sulfonic acid or o-naphthoquinone diazide carboxylic acid with a polyester having a hydroxy group at the terminal described in JP-A No. 11-94, in British Patent No. 1,494,043. A homopolymer of p-hydroxystyrene as described or a copolymer thereof with another copolymerizable monomer, which is esterified with o-naphthoquinone diazide sulfonic acid or o-naphthoquinone diazide carboxylic acid. Copolymers of p-aminostyrene with other copolymerizable monomers as described in U.S. Pat. No. 3,759,711 include o-naphthoquinone diazide sulfonic acid or o-naphthoquinone diazide carboxylic acid. What is obtained by amide reaction is very excellent. These o-quinonediazide compounds can be used alone, but are preferably used as a mixture with an alkali-soluble resin. Suitable alkali-soluble resins include novolac type phenol resins, and specifically include phenol formaldehyde resin, o-cresol formaldehyde resin, m-cresol formaldehyde resin and the like. Further, as described in U.S. Pat. No. 4,028,111, phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms such as t-butylphenolformaldehyde resin together with the above-mentioned phenol resin. It is even more preferable to use a condensate of and formaldehyde together.

Further, in order to form a visible image by exposure, o-naphthoquinonediazide-4-sulfonyl chloride, inorganic anion salt of p-diazodiphenylamine, trihalomethyloxadiazole compound, trihalomethyloxadiazole having a benzofuran ring. A compound such as a compound is added. On the other hand, as a colorant for the image, a triphenylmethane dye such as Victoria Bull-BOH, crystal violet or oil blue is used.
Further, the dyes described in JP-A-62-293247 are particularly preferable. Further, as an oil sensitizer, a phenol substituted with an alkyl group having 3 to 15 carbon atoms as described in JP-B-57-23253, for example, t-butylphenol, N-octylphenol, t-.
Novolak resin obtained by condensing butylphenol and formaldehyde, or o of such novolak resin
-Naphthoquinonediazide-4- or -5-sulfonic acid ester (for example, described in JP-A-61-242446) can be contained. In addition, in order to improve the developability, it is further disclosed in JP-A-62-25174.
Nonionic surfactants such as those described in No. 0 can be included.

The above composition is dissolved in a solvent which dissolves each of the above components and coated on a support. As the solvent used here, ethylene dichloride, cyclohexanone,
Methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-
Methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, methyl lactate, ethyl lactate, dimethylsulfoxide, dimethylacetamide, dimethylformamide, water, N-methylpyrrolidone, tetrahydrofurfuryl alcohol, acetone, There are diacetone alcohol, methanol, ethanol, isopropanol, diethylene glycol dimethyl ether and the like, and these solvents are used alone or as a mixture. A photosensitive composition comprising these components,
The solid content is 0.5 to 3.0 g / m ² .

[II] When a photosensitive layer containing a diazo resin and a water-insoluble and lipophilic photomolecular compound is provided. As the diazo resin, for example, a diazo resin inorganic salt which is a reaction product of a condensate of p-diazodiphenylamine and formaldehyde or acetaldehyde, and a hexafluorophosphate or tetrafluoroborate soluble in an organic solvent, and US Pat. No. 3,300,309, said condensate and sulfonic acids such as P
-Toluenesulfonic acid or a salt thereof, phosphinic acids such as benzenephosphinic acid or a salt thereof, a hydroxyl group-containing compound such as 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone-
Examples thereof include organic solvent-soluble diazo resin organic acid salts which are reaction products of 5-sulfonic acid or salts thereof. In the present invention, other diazo resins that can be preferably used include a carboxyl group, a sulfonic acid group, a sulfinic acid group,
A co-condensate containing, as a structural unit, an aromatic compound having at least one organic group of an oxygen acid group and a hydroxyl group of phosphorus and a diazonium compound, preferably an aromatic diazonium compound. And as the above-mentioned aromatic ring, a phenyl group and a naphthyl group can be preferably cited. Examples of the aromatic compound containing at least one of the above-mentioned carboxyl group, sulfonic acid group, sulfinic acid group, phosphorus oxyacid group, and hydroxyl group include various compounds, but 4-methoxy is preferable. Benzoic acid, 3-chlorobenzoic acid, 2,4-dimethoxybenzoic acid, p-phenoxybenzoic acid, 4-anilinobenzoic acid, phenoxyacetic acid, phenylacetic acid, p-hydroxybenzoic acid, 2,4-dihydroxybenzoic acid, benzene They are sulfonic acid, p-toluenesulfinic acid, 1-naphthalenesulfonic acid, phenylphosphoric acid and phenylphosphonic acid. The aromatic diazonium compound forming the constitutional unit of the above-mentioned co-condensed diazo resin includes, for example, Japanese Patent Publication No. 49-48001.
Although diazonium salts such as those listed in the publication can be used, diphenylamine-4-diazonium salts are particularly preferable. Diphenylamine-4-diazonium salts are derived from 4-amino-diphenylamines, and such 4-amine-diphenylamines include 4-aminodiphenylamine, 4-amino-3-methoxydiphenylamine, 4-amino- 2-methoxydiphenylamine, 4'-amino-2-methoxydiphenylamine, 4'-amino-4-methoxydiphenylamine, 4-amino-3-methyldiphenylamine, 4-amino-3-ethoxydiphenylamine, 4-
Amino-3-β-hydroxyethoxydiphenylamine, 4-amino-diphenylamine-2-sulfonic acid,
4-amino-diphenylamine-2-carboxylic acid, 4-
Amino-diphenylamine-2'-carboxylic acid and the like can be mentioned, with particular preference given to 3-methoxy-4-amino-4.
-Diphenylamine and 4-aminodiphenylamine.

Further, as a diazo resin other than the co-condensation diazo resin with an aromatic compound having an acid group, Japanese Patent Application No. 1-13
A diazo resin condensed with an aldehyde containing an acid group or an acetal compound thereof described in JP-A No. 0493, JP-A-3-163551 and JP-A-3-253857 can also be preferably used. The counter anion of the diazo resin includes an anion that stably forms a salt with the diazo resin and makes the resin soluble in an organic solvent. These include organic carboxylic acids such as decanoic acid and benzoic acid, organic phosphoric acids such as phenylphosphoric acid and sulfonic acids, and typical examples thereof include fluoroalkanesulfonic acids such as methanesulfonic acid and trifluoromethanesulfonic acid. , Lauryl sulfonic acid, dioctyl sulfosuccinic acid,
Dicyclohexylsulfosuccinic acid, camphorsulfonic acid, tolyloxy-3-propanesulfonic acid, nonylphenoxy-3-propanesulfonic acid, nonylphenoxy-4-butanesulfonic acid, dibutylphenoxy-3-propanesulfonic acid, diamylphenoxy-3-propane Sulfonic acid, dinonylphenoxy-3-propanesulfonic acid, dibutylphenoxy-4-butanesulfonic acid, dinonylphenoxy-4-butanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, mesitylenesulfonic acid, p-chlorobenzenesulfonic acid, 2,5-dichlorobenzenesulfonic acid, sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, p-acetylbenzenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 2-nitrobenzenesulfone , 3-chlorobenzene sulfonic acid, 3-bromobenzene sulfonic acid, 2-chloro-5-
Nitrobenzenesulfonic acid, butylbenzenesulfonic acid, octylbenzenesulfonic acid, decylbenzenesulfonic acid, dodecylbenzenesulfonic acid, butoxybenzenesulfonic acid, dodecyloxybenzenesulfonic acid, 2
-Hydroxy-4-methoxybenzophenone-5-sulfonic acid, isopropylnaphthalenesulfonic acid, butylnaphthalenesulfonic acid, hexylnaphthalenesulfonic acid, octylnaphthalenesulfonic acid, butoxynaphthalenesulfonic acid, dodecyloxynaphthalenesulfonic acid,
Dibutylnaphthalenesulfonic acid, dioctylnaphthalenesulfonic acid, triisopropylnaphthalenesulfonic acid,
Tributylnaphthalenesulfonic acid, 1-naphthol-5
-Sulfonic acid, naphthalene-1-sulfonic acid, naphthalene-2-sulfonic acid, 1,8-dinitro-naphthalene-
Aliphatic and aromatic sulfonic acids such as 3,6-disulfonic acid and dimethyl-5-sulfoisophthalate, 2,2 ′,
4,4'-Tetrahydroxybenzophenone, 1,2,3
- tri hydrosilation carboxymethyl benzophenone, 2,2'4- hydroxyl group-containing aromatic compounds such as trihydroxy benzophenone, hexafluorophosphate, halide Lewis acids such as tetrafluoroboric acid, HClO _4, HIO ₄ perhalogen acids such as such as However, the present invention is not limited to this. Among these, butylnaphthalenesulfonic acid, dibutylnaphthalenesulfonic acid, hexafluorophosphoric acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, and dodecylbenzenesulfonic acid are particularly preferable.

The diazo resin used in the present invention can have an arbitrary value for its molecular weight by variously changing the molar ratio of each monomer and the condensation conditions, but it is effective for the purpose of the present invention. Molecular weight of about 400
100 to 100,000, preferably about 800 to 8,
000 is suitable. Examples of the water-insoluble and lipophilic polymer compound include copolymers having the structural units of the monomers shown in (1) to (15) below and having a molecular weight of usually from 100,000 to 200,000. (1) Acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester and hydroxystyrene having an aromatic hydroxyl group, such as N- (4-
Hydroxyphenyl) acrylamide or N- (4-
Hydroxyphenyl) methacrylamide, o-, m-,
p-hydroxystyrene, o-, m-, p-hydroxyphenyl-acrylate or methacrylate, (2) acrylic acid ester having an aliphatic hydroxyl group, and methacrylic acid ester such as 2-hydroxyethyl acrylate or 2-hydroxyethyl Methacrylate, 4-hydroxybutyl methacrylate (3) Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic anhydride, itaconic acid, etc. (4) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, acrylic acid Amyl, hexyl acrylate, cyclohexyl acrylate, octyl acrylate, benzyl acrylate, -2-acrylic acid
(Substituted) alkyl acrylates such as chloroethyl, glycidyl acrylate, N-dimethylaminoethyl acrylate, (5) methyl methacrylate, ethyl methacrylate,
Propyl methacrylate, butyl methacrylate, amyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, glycidyl methacrylate, N
(Substituted) alkyl methacrylate such as dimethylaminoethyl methacrylate, (6) acrylamide, methacrylamide, N-methylol acrylamide, N-methylol methacrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N- Acrylamide or methacrylamide such as hydroxyethyl acrylamide, N-phenyl acrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenyl acrylamide,

(7) Ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether,
Vinyl ethers such as octyl vinyl ether and phenyl vinyl ether, (8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate, (9) Styrenes such as styrene, α-methylstyrene and chloromethylstyrene. (10) Methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, phenyl vinyl ketone, and other vinyl ketones, (11) Ethylene, propylene, isobutylene, butadiene, isoprene, and other olefins, (12) N-vinylpyrrolidone, N -Vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile, etc. (13) Maleimide, N-acryloylacrylamide, N-aceketyl methacrylamide, N-propionylmethacrylamide Unsaturated imides such as N- (p-chlorobenzoyl) methacrylamide, (14) N (o-aminosulfonylphenyl) methacrylamide, N- (m-aminosulfonylphenyl) methacrylamide, N- (p-amino) sulfonyl. Methacrylic acid amides such as phenyl methacrylamide, N- (1- (3-aminosulfonyl) naphthyl) methacrylamide, N- (2-aminosulfonylethyl) methacrylamide, and acrylamides having the same substituents as above, Also, o-aminosulfonylphenyl methacrylate, m-aminosulfonylphenyl methacrylate, p-aminosulfonylphenyl methacrylate, 1
Methacrylic acid esters such as-(3-aminosulfonylnaphthyl) methacrylate, and unsaturated sulfonamides such as acrylic acid esters having the same substituents as above (15) N- (2- (methacryloyloxy) -ethyl) Unsaturated monomers having a crosslinkable group in the side chain, such as 2,3-dimethylmaleimide and vinylcinnamate. Further, a monomer copolymerizable with the above-mentioned monomer may be copolymerized. (16) Phenolic resins described in U.S. Pat. No. 3,751,257 and polyvinyl acetal resins such as polyvinyl formal resin and polyvinyl butyral resin. (17) JP-B-54 with solubilized polyurethane in alkali
-19773, JP-A-57-904747, 60
-182437, 62-58242, 62-1
No. 23452, No. 62-123453, No. 63-11.
Polymer compounds described in JP-A No. 3450 and JP-A No. 2-146042. If necessary, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, natural resin, etc. may be added to the above copolymer.

The photosensitive composition used for the support of the present invention may further contain a dye for the purpose of obtaining a visible image by exposure and a visible image after development. Examples of the dyes include Victoria Pure-BOH [Hodogaya Chemical Co., Ltd.], Oil Blue # 603 [Orient Chemical Co., Ltd.], Patent Pure Blue [Sumitomo Mikuni Chemical Co., Ltd.], Crystal Violet, Brilliant Green, Ethyl Violet, Tri typified by methyl violet, methyl green, erythrosine B, basic fuchsin, malachite green, oil red, m-cresol purple, rhodamine B, auramine, 4-p-diethylaminophenyliminaphthoquinone, cyano-p-diethylaminophenylacetanilide. Color tone of phenylmethane, diphenylmethane, oxazine, xanthene, iminonaphthoquinone, azomethine or anthraquinone dye from colored to colorless or different It mentioned as examples of discoloring agents changing. On the other hand, as a discoloring agent that changes from colorless to colored, there are leuco dyes and, for example, triphenylamine, diphenylamine, o-chloroaniline, 1,2,3-triphenylguanidine, naphthylamine, diaminodiphenylmethane, p, p'-bis. -Dimethylaminodiphenylamine, 1,2-dianilinoethylene, p, p ', p "-tris-dimethylaminotriphenylmethane, p, p'-
Bis-dimethylaminodiphenylmethylimine, p,
p ', p "-triamino-o-methyltriphenylmethane, p, p'-bis-dimethylaminodiphenyl-4-
Examples thereof include primary or secondary sphere arylamine dyes represented by anilinonaphthylmethane and p, p ′, p ″ -triaminotriphenylmethane. Particularly preferred are triphenylmethane dye and diphenylmethane dye. It is effectively used, and more preferably a triphenylmethane dye, particularly Victoria Pure Blue BOH.

Various additives can be further added to the photosensitive composition used for the support of the present invention. For example, alkyl ethers (such as ethyl cellulose and methyl cellulose) for improving coating properties, fluorosurfactants, nonionic surfactants (particularly preferred are fluorosurfactants), coating flexibility, resistance A plasticizer for imparting abrasion resistance (for example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate,
Trioctyl phosphate, tetrahydrofurfuryl oleate, acrylic acid or methacrylic acid oligomers and polymers, of which tricresyl phosphate is particularly preferred), and an oil-sensitizing agent for improving the oil-sensitivity of the image area (for example, JP-A No. 55-527, a half-esterified product of a styrene-maleic anhydride copolymer with alcohol, a novolak resin such as pt-butylphenol-formaldehyde resin, and 50 of p-hydroxystyrene.
% Fatty acid ester, etc.), stabilizer {eg, phosphoric acid, phosphorous acid, organic acid (citric acid, oxalic acid, dipicolinic acid, benzenesulfonic acid, naphthalenesulfonic acid, sulfosalicylic acid, 4-methoxy-2-hydroxybenzophenone- 5-sulfonic acid, tartaric acid, etc.), development accelerators (eg higher alcohols, acid anhydrides, etc.) and the like are preferably used.

In order to provide the above-mentioned photosensitive composition on a support, a photosensitive diazo resin, a lipophilic polymer compound and, if necessary, various additives are added in predetermined amounts in a suitable solvent (methyl cellosolve, ethyl). Cellosolve, dimethoxyethane, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, 1-methoxy-2-propanol, methyl cellosolve acetate, acetone, methyl ethyl ketone, methanol, dimethylformamide, dimethylacetamide, cyclohexanone, dioxane,
Tetrahydrofuran, methyl lactate, ethyl lactate, ethylene dichloride, dimethylsulfoxide, water or a mixture thereof) to prepare a coating solution of the photosensitive composition, which is coated on a support and dried. The solvent used may be a single solvent, but it is more preferable to use a mixture of a high boiling point solvent such as methyl cellosolve, 1-methoxy-2-propanol and methyl lactate and a low boiling point solvent such as methanol and methyl ethyl ketone. The solid content concentration of the photosensitive composition at the time of application is preferably in the range of 1 to 50% by weight. In this case, the coating amount of the photosensitive composition may be approximately 0.2 to 10 g / m ² (dry weight), and more preferably 0.5 to 3 g / m ² .

[III] When Providing a Photosensitive Layer Including a Photodimerizable Photosensitive Composition and a Photopolymerizable Photosensitive Composition The photodimerizable photosensitive composition includes a maleimide group, a cinnamyl group, a cinnamoyl group, a cinnamylidene group, and a cinna Examples of the polymer having a side chain or a main chain such as a millidenacetyl group or a chalcone group are mentioned, and as a polymer having a maleimide group in the side chain, JP-A-52-988 (corresponding US Pat. No. 4,079,041) Gazette and German Patent Nos. 2 and 6
26,769, European Patent No. 21,019.
No., European Patent No. 3,552 and Die Angewandte Makromolekulare Chemie 115 (1
983), pages 163 to 181, the polymers described in JP-A-49-128991 and JP-A-49-128.
No. 992, No. 49-128993, No. 50-5376.
No. 50, No. 50-5377, No. 50-5379, No. 50
-5378, 50-50380, 53-5298.
No. 53-5299, No. 53-5300, No. 50
-50107, 51-47940, 52-13
907, 50-45076, 52-12170.
No. 0, No. 50-10884, No. 50-45087, German Patent Nos. 2,349,948 and 2,61.
The polymer etc. which are described in each specification of 6,276 can be mentioned. In order to make these polymers soluble or swellable in alkaline water, carboxylic acid / sulfonic acid, phosphoric acid, phosphonic acid, and their alcal metal salts and ammonium salts, and pKa dissociating in alkaline water are 6 It is useful to include the acid group of -12 and the like in the polymer. If necessary, the 13 kinds of monomers having an acid group may be copolymerized with the monomer having a maleimide group.

The acid value of the maleimide polymer having an acid group is preferably in the range of 30 to 300, and among the polymers having such an acid value, Die Angewandte Makromoleku.
lare Chemie) 128 (1984), pp. 71-91, a copolymer of N- [2- (methacryloyloxy) ethyl] -2,3-dimethylmaleimide and methacrylic acid or acrylic acid. It is useful.
Furthermore, a multi-component copolymer suitable for the purpose can be easily synthesized by copolymerizing the vinyl monomer as the third component in the synthesis of this copolymer. For example, by using as the third component vinyl monomer, an alkyl methacrylate or an alkyl acrylate whose homopolymer has a glass transition point of room temperature or lower, flexibility can be imparted to the copolymer. Cinnamyl group, cinnamoyl group,
Examples of the photocurable polymer having a cinnamylidene group, a cinnamylidene acetyl group, a chalcone group, or the like in the side chain or the main chain include US Pat. No. 3,030,208, US Patent Applications 709,496, and 828. There is a photosensitive polyester described in each specification of No. 455. Examples of the photo-crosslinkable polymer solubilized in alkaline water include the following.

That is, a photosensitive polymer as described in JP-A-60-191244 can be mentioned. Further, JP-A-62-175529 and JP-A-6-175729
Examples thereof include photosensitive polymers described in JP-A No. 2-175730, JP-A-63-25443, JP-A-63-218944, and JP-A-63-218945. Further, a sensitizer can be used in the photosensitive layer containing them, and as such a sensitizer, a benzophenone derivative, a benzanthrone derivative, a quinone, an aromatic nitro compound, a naphthothiazoline derivative, a benzothiazoline derivative can be used. , Thioxanthones, naphthothiazole derivatives, ketocoumarin compounds, benzothiazole derivatives, naphthofuranone compounds, pyrylium salts, and thiabilylium salts. Such a photosensitive layer may optionally contain chlorinated polyethylene, chlorinated polypropylene, polyacrylic acid alkyl ester, acrylic acid alkyl ester, acrylonitrile, vinyl chloride,
Styrene, copolymers with at least one monomer such as butadiene, polyamide, methyl cellulose, polyvinyl formal, polyvinyl butyral, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer and other binders, dibutyl phthalate It is possible to use plasticizers such as phthalic acid dialkyl esters such as dihexyl phthalate, oligoethylene glycol alkyl esters, and phosphoric acid esters. Further, for the purpose of coloring the photosensitive layer, p is used as a dye or pigment or a printing-out agent.
It is also preferable to add an H-supporting agent or the like.

Examples of the photopolymerizable photosensitive composition include unsaturated carboxylic acids and salts thereof, esters of unsaturated carboxylic acids with aliphatic polyhydric alcohol compounds, and amides of unsaturated carboxylic acids with aliphatic polyvalent amine compounds. And so on. As the photopolymerization initiator, vicinal polytaketaldonyl compound, α-carbonyl compound, acyloin ether, α-
Aromatic acyloin compounds substituted with hydrocarbons at positions, polynuclear quinone compounds, triallyl imidazole dimers / p
-A combination of aminophenyl ketones, benzothiazole compounds, trihalomethyl-s-triazine compounds,
Acridine and phenazine compounds, oxadiazole compounds, etc. are included, and together with these, benzyl (meth) acrylate / (meth) acrylic acid / necessary as a high-molecular polymer that is soluble or swellable in alkaline water and capable of forming a film. Other addition-polymerizable vinyl monomer copolymers, methacrylic acid / methyl methacrylate (or methacrylic acid ester) copolymers, maleic anhydride copolymers with pentaerythritol triacrylate added by half-esterification And acidic vinyl copolymers.

[IV] Electrophotographic Photosensitive Layer For example, the ZnO photosensitive layer disclosed in US Pat. No. 3,001,872 can be used. Also, JP-A-56-161550 and JP-A-60-186847.
A photosensitive layer using an electrophotographic photoreceptor described in JP-A-61-238063 and the like may be used.
The amount of the photosensitive layer provided on the support is, based on the dry weight after coating, 0.1 to about 7 g / m ² of the drug, preferably 0.5 to 4 g.
The range is / m ² .

In the method for producing a lithographic printing plate support according to the method of the present invention, in order to enhance the adhesion between the support and the photosensitive layer, to prevent the photosensitive layer from remaining after development, or to prevent halation. For the purpose of, an intermediate layer may be provided if necessary. In order to improve the adhesiveness, the intermediate layer is generally made of a diazo resin or a phosphoric acid compound, an amino compound, a carboxylic acid compound or the like which is adsorbed on aluminum. The intermediate layer made of a highly soluble substance so that the photosensitive layer does not remain after development is generally made of a highly soluble polymer or a water-soluble polymer. Further, for antihalation, the intermediate layer generally contains a dye or a UV absorber. The thickness of the intermediate layer is arbitrary, and must be such that it can undergo a uniform bond forming reaction with the upper photosensitive layer when exposed. Usually about 1-100 mg / m ^{2 as} a dry solid
The coating rate is 5 to 40 mg / m ^{2, which} is particularly good.

On the coated photosensitive layer, a mat layer composed of protrusions provided independently of each other may be provided. The purpose of the matte layer is to improve the vacuum adhesion between the negative image film and the photosensitive lithographic printing plate during contact exposure, thereby shortening the vacuuming time and preventing the collapse of fine halftone dots during exposure due to poor adhesion. That is.
As a coating method of the matte layer, there is disclosed in JP-A-55-12974.
There is a method of heat-sealing powdered solid powder described in JP-A No. 58-182636 and a method of spraying and drying polymer-containing water described in JP-A-58-182636, and any method may be used. It is desirable that the matte layer itself be soluble in an aqueous alkaline developer containing substantially no organic solvent or be removable by this.

The photosensitive lithographic printing plate prepared as described above is subjected to imagewise exposure and then a resin image is formed by a process including development by a conventional method. For example, in the case of the photosensitive lithographic printing plate having the photosensitive layer of the above [I], it is exposed by imagewise exposure and then development by an aqueous alkali solution as described in US Pat. No. 4,259,434. A portion is removed to obtain a lithographic printing plate, and in the case of a photosensitive lithographic printing plate having a photosensitive layer of [II], after image exposure,
With a developer as described in U.S. Pat. No. 4,186,006, the photosensitive layer in the unexposed area is removed by development to obtain a lithographic printing plate. Also, JP-A-59-84
241, JP-A-57-192952, and JP-A-6-
It is also possible to use an aqueous alkaline developer composition used in developing a positive working lithographic printing plate as described in JP-A No. 2-24263.

[0037]

【Example】

(Example-1) A molten aluminum heated to 680 ° C was put between φ500 cooling twin rolls to continuously cast a thin plate coil having a thickness of 6 mm, and then cold-rolled to a thickness of 1 mm.
After heat treatment at 0 ° C. for 60 minutes, cold rolling is performed again to 0.201 mm, and an embossing roller having a surface roughness of Ha of 10 μm is pressed at a pressure of 100 kg / cm ² to form an uneven surface on the aluminum surface. A JIS 1050 material finished to 20 mm was prepared. Then, 2 μm (5.4 g / m ² ) was etched with a 15% caustic soda aqueous solution at a temperature of 60 ° C., washed with water, immersed in a sulfuric acid solution of 150 g / 1,50 ° C. for 10 seconds to desmut, and washed with water. Further, the support was placed in a 14 g / l nitric acid aqueous solution, and the Japanese Patent Publication No. 55-191.
Electrochemical roughening was performed using the alternating waveform current described in Japanese Patent No. 91. As electrolysis conditions, anode voltage V _A =
With 14 V and cathode voltage V _C = 12 V, the amount of electricity at the anode was set to 350 coulomb / dm ² . Anodized film 2.5 g / m ^{2 is} formed on this support in 20% sulfuric acid and dried to form 100 coils of this kind.
_{It was set to 1 to} A ₁₀₀ .

(Comparative Example-1) Melting and holding from an aluminum ingot → slab casting → chamfering → soaking After forming a coil with a thickness of 6 mm by hot rolling, it was cold rolled to a thickness of 1 mm and 4
After heat treatment at 50 ° C. for 60 minutes, it was rolled again to 0.2 mm to prepare JIS1050 material. Ha10 this plate
A corrugated surface was formed on the aluminum surface by pressing with a pressure of 100 kg / cm ^{2 using} an empos roll of μm. Then, with a 15% aqueous sodium hydroxide solution at a temperature of 60 ° C., 2 μm (5.4 g / m ² ).
Was etched, washed with water, immersed in a sulfuric acid solution of 150 g / l, 50 ° C. for 10 seconds to desmut, and washed with water. Further, the support was placed in a 14 g / l nitric acid aqueous solution,
Electrochemical roughening was performed using the alternating waveform current described in Japanese Patent No. 9191. As the electrolysis condition, the anode voltage V
_{With A} = 14V and cathode voltage V _C = 12V, the amount of electricity at the anode was set to 350 coulomb / dm ² . This support is provided with an anodic oxide coating of 2.5 g / m ² in 20% sulfuric acid and dried to make 100 such coils, and B
It was ₁ ~B _100.

The substrates (A ₁ ~
A _10), (a B ₁ ~B ₁₀₀₎ below the composition, the coating weight after drying was a photosensitive layer by coating so as to become 2.0 g / m ^2. (Photosensitive solution composition) N- (4-hydroxyphenyl), methacrylamide / 2-hydroxyethyl methacrylate / acrylonitrile / methyl methacrylate / methacrylic acid (= 15: 10: 30: 38: 7 molar ratio) copolymer (average molecular weight 60000) ・ ・ ・ ・ 5.0 g Sodium carbonate ・ ・ ・ ・ 5 g Sodium isopropylnaphthalene sulfonate ・ ・ ・ 12 g Pure water ・ ・ ・ 1000 g

Using the lithographic printing plate thus prepared, printing was carried out by the usual procedure.
All of the samples of 0 coil passed the test after clearing the stain of 0 and the printing durability of 100% or more, but in Comparative Example-1, the sample of 3 coils out of 100 coils failed. In addition, in Example-1, the capital investment was lower and the running cost was lower than in Comparative Example-1.

[0041]

EFFECTS OF THE INVENTION According to the method for producing a lithographic printing plate support of the present invention, variations in alloy components of the aluminum support are reduced, and the final cold rolling simplifies the process by forming irregularities on the aluminum surface. As a result, the amount of capital investment has been reduced, the number of workers has been reduced, the running cost has been reduced, and a great cost reduction has been realized, further improving quality.

Claims (2)

[Claims] 1. A method for producing a lithographic printing plate support obtained by directly forming a thin plate by continuous casting, followed by annealing, cold rolling and straightening, wherein the cold rolling is adjusted to a final plate thickness, or A method for producing a support for a lithographic printing plate, characterized in that the uneven surface is pressed and transferred to an aluminum plate to form an uneven pattern on the surface of the aluminum plate together with finish cold rolling for finishing the surface shape after final plate thickness adjustment. . 2. The method for producing a lithographic printing plate support according to claim 1, wherein the thin plate produced by continuous casting is produced by a direct cooling twin roll method.