JPH06258241A - Foreign matter inspection device for pellicle film - Google Patents

Abstract

PURPOSE:To provide a foreign matter inspection device for a pellicle film which can discriminate that on which side a foreign matter in the pellicle film exists among the obverse and the reverse of the pellicle film. CONSTITUTION:A foreign matter inspection device has a light source 1 by which an incident angle can be changed to the first incident angle (theta1) at which incident inspection light passes through a pellicle film 10 and the second incident angle reflected by the pellicle film 10, a scattered light receiving system 2 to receive scattered light by a foreign matter on the surface of the pellicle film 10 after inspection light 13 of the first incident angle (theta1) and inspection light of the second incident angle are made incident and a discriminating means (4) to discriminate that on which side a foreign matter exists among the obverse and the reverse of the pellicle film 10 according to the existence of an output signal of this scattered light receiving system 2.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a foreign matter inspection device for a pellicle film mounted on a reticle in the field of lithography in semiconductor manufacturing.

[0002]

2. Description of the Related Art In recent years, as an inspection for foreign matter on a pellicle film, a light source for introducing inspection light into the pellicle film,
A scattered light receiving system for picking up scattered light of inspection light due to foreign matter is provided, and with this configuration, a foreign matter inspection apparatus for a pellicle film has come to be used for detecting a foreign matter on the pellicle film. FIG.
22 to 22, a conventional foreign matter inspection device for a pellicle film will be described. FIG. 18 is a functional system diagram of a conventional foreign matter inspection device for a pellicle film. In FIG. 18, 3
6 is a light source, 37 is a scattered light receiving system that receives scattered light from foreign matter on the pellicle film, 38 is a detection system having a light source 36 and scattered light receiving system 37, and 39 is a foreign matter on the pellicle film due to a signal from the detection system 38. 5 is a stage control system for mounting a reticle with a pellicle film to be inspected, 6
Is a display device for confirming the inspection status.

FIG. 19 shows a pellicle transmission spectrum of a pellicle film. Reference numeral 40 represents an inspection light of a wavelength λ 1 that can be adopted as light transmitted from the light source 36 through the pellicle film with high transmittance. 20 to 22 show a state in which foreign matter on the pellicle film 10 is being inspected. In these figures, 37 is the above-mentioned scattered light receiving system for receiving scattered light from foreign matter, 9 is a substrate, 11 is the surface of the pellicle film, 12 is the back surface of the pellicle film, 15 is the foreign matter on the surface of the pellicle film, and 18 is the pellicle film. Foreign matter on the back, 13, 16,
Reference numeral 19 denotes inspection light having a wavelength λ1 which is transmitted from the pellicle film 10 obtained from the light source 36, and 14 denotes transmitted light which is the inspection light 13 transmitted through the pellicle film 10. Reference numerals 17 and 20 denote scattered lights when the inspection lights 16 and 19 hit the foreign matters 15 and 18 on the pellicle film 10.

As shown in FIG. 20, when the pellicle film surface 11 is inspected using inspection light having a wavelength λ1 which is transmitted by the pellicle film 10 obtained from the light source 36, the inspection light 13 has no foreign matter on the surface. Since it becomes the transmitted light 14 and passes through the pellicle film 10, the scattered light receiving system 37 that receives the scattered light from the foreign matter does not receive the light. As shown in FIG.
By using the inspection light 16 from the light source 36, the pellicle film surface 1
When 1 is inspected, there is a foreign matter 15 on the surface of the pellicle, the inspection light 16 hits the foreign matter 15, and the scattered light 17 from the foreign matter enters the scattered light receiving system 37, and the foreign matter enters the signal processing system 39 from the inspection system 38. Is sent.

As shown in FIG. 22, the inspection light 19 from the light source 36 is used to inspect from the pellicle film surface 11 side.
When the back surface 12 of the pellicle film is inspected by irradiating the
The inspection light 19 impinges on 8 and the scattered light 20 from the foreign matter enters the scattered light receiving system 37, and the signal of the foreign matter is sent from the inspection system 38 to the signal processing system 39.

[0006]

However, the conventional foreign matter inspection device for the pellicle film, which performs such an operation, cannot distinguish the foreign matter on the pellicle film front surface and the pellicle film rear surface and cannot detect the foreign matter on the pellicle film back surface. It may be mistaken for being on the membrane surface. The advantage of mounting the pellicle on the reticle is that foreign matter does not directly adhere to the pattern on the reticle but adheres to the surface of the pellicle, which makes it difficult for the foreign matter to be transferred to the silicon substrate in the lithography process, so that improvement in yield can be expected. However, if foreign matter adheres to the back surface of the pellicle, the foreign matter may drop onto the pattern due to vibrations when the reticle with a pellicle is used, blowing for removing the foreign matter from the pellicle film, and changes in the storage environment. In this case, there is a problem that foreign matter is transferred as a pattern defect at the time of pattern transfer, which causes an extremely low yield in the silicon process.

Further, in this conventional example, it is not possible to find a decrease in transmittance due to alteration of the pellicle film due to a large amount of exposure of the stepper or changes in the environment, which causes defects in the lithography process. There was a problem of doing. Therefore, it is an object of the present invention to determine whether the foreign matter existing in the pellicle film is on the front surface or the back surface of the pellicle film, and also to detect the alteration of the pellicle film. Is provided.

[0008]

According to another aspect of the present invention, there is provided a pellicle film foreign matter inspection apparatus, wherein a light source for injecting inspection light at a first incident angle passing through the pellicle film and a second incident angle reflected by the pellicle film. A scattered light receiving system for receiving the inspection light of the first incident angle and the inspection light of the second incident angle and receiving scattered light by foreign matter on the surface of the pellicle film; And a determination unit that determines whether the foreign matter is present on the front surface or the back surface of the pellicle film based on the presence or absence of an output signal.

The foreign matter inspection device for a pellicle film according to claim 2 is
In claim 1, a reflection direct light receiving system is provided which receives the reflection direct light on the surface of the pellicle film by the inspection light having the second incident angle.

[0010]

According to the foreign matter inspection apparatus for a pellicle film of claim 1, when the inspection light is incident on the pellicle film at the first incident angle, it becomes transmitted light when there is no foreign matter. When it is on the back side, scattered light enters the scattered light receiving system. When the inspection light is incident on the pellicle film at the second incident angle, it becomes reflected light when there is no foreign matter, and when the foreign matter is on the surface side of the pellicle film, the scattered light of the foreign matter enters the scattered light receiving system,
If there is a foreign substance on the back side of the pellicle film, the light is reflected on the surface of the pellicle film and is not scattered. As a result, since the light received by the scattered light receiving system is different between the first incident angle and the second incident angle, it is possible to determine whether the foreign matter is on the front surface or the back surface of the pellicle film by the determination means.

As described above, it is possible to determine whether the foreign matter existing in the pellicle film is on the front surface or the back surface of the pellicle film, and the silicon process in the lithography process when the foreign matter exists on the back surface side of the pellicle film. In this case, it is possible to prevent the transfer of defects to the actual device and improve the yield. According to the foreign matter inspection device for a pellicle film of claim 2,
In Claim 1, since the reflection direct light receiving system for receiving the reflection direct light on the surface of the pellicle film by the inspection light of the second incident angle is provided, in addition to the function of Claim 1, when the pellicle film is denatured Since the reflected light of the inspection light incident at the first incident angle becomes strong, the alteration of the pellicle film can be discriminated by directly receiving the reflected light by the light receiving system, and the defect transfer in the lithography process can be performed. Can be prevented and the yield can be improved.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A pellicle film foreign matter inspection apparatus according to a first embodiment of the present invention will be described with reference to the drawings. Figure 2
FIG. 3 is a functional system diagram of the foreign matter inspection device for a pellicle film of the first embodiment. In FIG. 1, 1 is a light source, 2 is a scattered light receiving system that receives scattered light from a pellicle film as an inspection object, 3 is a detection system having a light source 1 and a scattered light receiving system 2, and 4 is a detection system 3. A signal processing system having a discriminating means for discriminating the location of a foreign substance based on a signal, 5 is a stage control system for mounting a reticle and a pellicle to be inspected, and 6 is a display device for confirming an inspection state.

FIG. 3 is a graph showing the relationship between the incident angle and the transmittance of the inspection light having the same wavelength but different incident angles to the pellicle film. Reference numeral 7 is the inspection light having the first incident angle θ1 that can be adopted as a light having a high transmittance in the light of the light source 1, and 8 is a light having the lowest transmittance in the pellicle film and thus can be used as a light having a high reflectance. The inspection light has the second incident angle θ2.

FIGS. 1, 4 and 5 show the first incident angle θ.
The inspection state when the inspection light No. 1 is incident on the pellicle film is shown. In these drawings, reference numeral 2 is a scattered light receiving system for receiving scattered light, 9 is a substrate, 10 is a pellicle film, 11 is a pellicle film front surface, 12 is a pellicle film back surface, and 13, 16 and 19 are pellicles obtained from the light source 1. The inspection light of the first incident angle θ1 which shows the transmission through the film 10, 15 is the foreign matter on the surface of the pellicle film,
Reference numeral 18 indicates a foreign substance on the back surface of the pellicle film, and reference numeral 14 indicates the transmitted light of the inspection light 13 transmitted through the pellicle film 10. Reference numerals 17 and 20 denote scattered lights when the inspection lights 16 and 19 hit the foreign matters 15 and 18, respectively.

FIG. 1 shows the case where there is no foreign matter on the pellicle film 10, and the inspection light 13 is the light 14 that passes through the pellicle film 10.
Therefore, the scattered light receiving system 2 does not receive light. FIG. 4 shows a case where the foreign matter 15 is present on the surface 11 of the pellicle film. The inspection light 16 hits the foreign matter 15, and its scattered light 17 enters the scattered light receiving system 2 and outputs a foreign matter detection signal.

FIG. 5 shows a foreign matter 18 on the back surface 12 of the pellicle film.
In this case, the inspection light 19 passes through the pellicle film 10 and strikes the foreign matter 18, and the scattered light 20 passes through the pellicle film 10 in reverse and enters the scattered light receiving system 2 to output a foreign matter detection signal. To do. 6 to 8 show the inspection state when the angle of the light incident on the pellicle film 10 is changed by changing the direction of the light source 1 and the inspection light is incident on the pellicle film 10 at the second incident angle θ2. . In these figures,
Reference numerals 21, 23 and 25 are inspection lights of a second incident angle θ2 which are reflected by the pellicle film 10 obtained from the light source 1, and 22, 2
6 is reflected by the surface 11 of the pellicle film, and its reflected direct light passes through the hole or slit 41 provided in the scattered light receiving system and does not enter the scattered light receiving system 2, and 24 is the inspection light 2
3 shows scattered light when the foreign matter 15 hits the foreign matter 15.

FIG. 6 shows the case where there is no foreign matter on the pellicle film 10, and the reflected light 22 passes through the slit 41 and does not enter the scattered light receiving system 2. FIG. 7 shows the surface 11 of the pellicle film.
When there is a foreign substance 15 in the sheet, scattered light of the inspection light 23 by the foreign substance 15 enters the scattered light receiving system 2 and outputs a detection signal. FIG. 8 shows a case in which the foreign matter 18 is present on the back surface 12 of the pellicle film, the inspection light 25 is reflected by the pellicle film 10, and the reflected direct light passes through the hole or slit 41 provided in the scattered light receiving system to obtain the scattered light receiving system. No. 2 receives no light, and it is determined that there is no foreign material 18.

Table 1 shows the presence / absence of the received light signal of the scattered light receiving system 2 with respect to the inspection light having different incident angles according to the presence / absence of the foreign matters 15 and 18 and the positions where the foreign matters 15/18 exist.

[0019]

[Table 1]

In Table 1, ◯ indicates that there is a light reception signal of the scattered light receiving system 2, and x indicates that there is no light reception signal. As is clear from Table 1, presence / absence of the foreign matters 15 and 18 on the pellicle film 10 depends on whether the received light signal of the scattered light receiving system 2, that is, the output signal, with respect to the inspection light having the first incident angle θ1 and the second incident angle θ2. By determining the combination of the presence and absence in the signal processing system 4 having the determining means, for example, by a logic circuit,
It can be seen whether the foreign matter 15, 18 being inspected is on the front surface or the back surface of the pellicle film 10.

According to this embodiment, when the inspection light 13 is incident on the pellicle film 10 at the first incident angle θ1, it becomes transmitted light when there is no foreign matter, but the foreign matters 15 and 18 are the pellicle film 1.
Scattered light when it is on the front or back side of 0
Enter into. When the inspection light 21 is incident on the pellicle film 10 at the second incident angle θ2, it becomes reflected light when there is no foreign matter,
When the foreign matter 15 is on the surface side of the pellicle film 10, the scattered light of the foreign matter 15 enters the scattered light receiving system 2, and when the foreign matter 18 is on the back surface side of the pellicle film 10, it becomes reflected light on the surface of the pellicle film 10. So don't scatter. As a result, since the light received by the scattered light receiving system 2 is different between the first incident angle θ1 and the second incident angle θ2, it is possible to determine whether the foreign matters 15 and 18 are on the front surface or the back surface of the pellicle film 10. Can be determined by

In this way, it is possible to determine whether the foreign matter 15, 18 existing on the pellicle film 10 is on the front surface or the back surface of the pellicle film 10, and when the foreign matter 18 is on the back surface side of the pellicle film 10. It is possible to prevent the defect transfer to the actual device during the silicon process in the lithography process, and to improve the yield. A second embodiment of the present invention will be described with reference to FIGS. 9 to 17.

FIG. 9 is a functional system diagram of the foreign matter inspection device for a pellicle film of the second embodiment. In FIG.
Reference numeral 1 is a light source, 27 is a scattered light receiving system that receives scattered light from a pellicle film that is an object to be inspected, 28 is a detection system including the light source 1 and the scattered light receiving system 27, and 29 is a foreign matter location based on a signal from the detection system 28. 5 is a signal processing system having a discriminating means for discriminating the stage, 5 is a stage control system for mounting a reticle with a pellicle film to be inspected, and 6 is a display device for confirming the inspection state. The inspection light 7 having the first incident angle θ1 and the inspection light 8 having the second incident angle θ2 of the light source 1 are as shown in FIG.

10 to 13, 27 is a scattered light receiving system for receiving scattered light, 9 is a substrate, 10 is a pellicle film, 11 is a pellicle film front surface, 12 is a pellicle film back surface, 1
Reference numerals 3, 30, 16, and 19 denote inspection light having a first incident angle θ 1 that is transmitted through the pellicle film 10 obtained from the light source 1, 15 denotes a foreign substance on the pellicle film front surface 11, and 18 denotes a pellicle film rear surface 12.
The foreign matter on the upper side, 14 is the transmitted light that the inspection light 13 has transmitted through the pellicle film 10. Reference numeral 31 indicates the reflected light of the inspection light 30 reflected by the altered pellicle film 33. 17, 20
The inspection lights 16 and 19 are foreign matter 15 on the pellicle film 10, respectively.
The scattered light when it hits 18 is shown.

10 to 13 show the pellicle film 1
This is a state in which the inspection light 13 having the first incident angle θ1 having a property of high transmittance with respect to 0 is incident. FIG. 10 shows the case where there is no foreign matter on the pellicle film 10. In this case, the inspection light 13
Becomes the light 14 transmitted through the pellicle film 10, and the scattered light receiving system 27 and the reflected direct light receiving system 32 do not receive the light.

FIG. 11 shows the case where the inspection light 30 is incident on the pellicle film 33 which has been altered due to a large amount of exposure of the stepper and changes in the storage environment. Since the transmittance of the pellicle film 33 is low, the inspection light 30 is not emitted. Reflected by the altered pellicle film 33, the reflected direct light receiving system 32 receives the reflected direct light 31. FIG. 12 shows a case where the foreign matter 15 is present on the surface 11 of the pellicle film. In this case, the inspection light 16 is scattered by the foreign matter 15, and the scattered light 17 is incident on the scattered light receiving system 27, and is transmitted from the scattered light receiving system 27. It is possible to know that there is the foreign matter 15 by outputting the detection signal.

FIG. 13 shows a foreign matter 18 on the back surface 12 of the pellicle film.
In this case, the inspection light 19 passes through the pellicle film 10 and is scattered by the foreign matter 18.
It is possible to know that there is the foreign substance 18 because 0 passes through the petle film 10 in reverse and enters the scattered light receiving system 27. Therefore, the scattered light receiving system 27 detects the foreign matters 15 and 18 regardless of the positions of the foreign matters 15 and 18 on the pellicle film 10 regardless of the front and back sides of the pellicle film 10.

14 to 17, the angle of the inspection light incident on the pellicle film 10 is changed and the pellicle film 1 is changed.
This is a case where the inspection light is incident at the second incident angle θ2 which has a property of reflecting 0. In these figures, 21,3
Reference numerals 4, 23 and 25 denote inspection lights having an incident angle θ2 reflected by the pellicle film 10 obtained from the light source 1, and reference numerals 22, 35 and 26 denote reflected direct light reflected by the pellicle film 10 and passing through the slit 41. Reference numeral 24 denotes scattered light when the inspection light 23 hits the foreign matter 15 on the pellicle film 10. 32 is a slit 4
1 shows a reflected direct light receiving system arranged outside 1.

FIG. 14 shows a case where there is no foreign matter on the pellicle film 10, and the inspection light 21 becomes reflected direct light 22 and is received by the reflected direct light receiving system 32 through the slit 41. FIG. 15 shows the case of the altered pellicle film 33, and the reflected direct light 35 is received by the reflected direct light receiving system 32 as in the case of no foreign matter. FIG. 16 shows the surface 11 of the pellicle film.
In the case where there is a foreign matter 15 on the surface, the inspection light 23 becomes scattered light 24 by the foreign matter 15 on the pellicle film surface 11, and the scattered light receiving system 27 receives the scattered light 24. In this case, the scattered light 24 entering the reflected direct light receiving system 32 is much weaker than the reflected direct light on the pellicle film surface 11, and causes a clear difference in the received light intensity of the reflected direct light receiving system 32.

FIG. 17 shows a foreign matter 18 on the back surface 12 of the pellicle film.
In this case, the inspection light 25 becomes the direct reflected light 26 reflected by the pellicle film surface 11, and the reflected direct light receiving system 32.
Since it does not enter the scattered light receiving system 27, it is determined that there is no foreign matter on the pellicle film surface 11. Table 2 shows the presence / absence of a light receiving signal of the light receiving system with respect to the inspection light according to the film quality of the pellicle film 10 and the position of the foreign matter.

[0031]

[Table 2]

In Table 2, ◯ indicates that the scattered light receiving system 2 has received scattered light, Δ indicates that the reflected direct light receiving system 32 has received reflected direct light, and x indicates both light receiving systems. It means that it does not receive reflected light. As is clear from Table 2, whether the pellicle film 10 is not altered or the foreign matter 15 or 18 being inspected is determined by determining the combination of the received light signal with respect to the inspection light, that is, the output signal, by a logic circuit or the like. Whether it is on the front surface or the back surface of the pellicle film 10 can be discriminated by the signal processing system 29 having a discriminating means.

According to this embodiment, the pellicle film 33 has the reflected direct light receiving system 32 for receiving the reflected direct light on the surface of the pellicle film 10 by the inspection light having the second incident angle θ2.
When the pellicle film 10 is degenerated, the reflected light of the inspection light incident at the first incident angle θ1 becomes strong. Therefore, by directly receiving the reflected light by the light receiving system 32, it is possible to discriminate the alteration of the pellicle film 10. This also makes it possible to prevent defect transfer in the lithography process and improve the yield. Other than that, there are the same operational effects as the first embodiment.

[0034]

According to the foreign matter inspection device for a pellicle film of the first aspect, when the inspection light is incident on the pellicle film at the first incident angle, it becomes transmitted light when there is no foreign matter. The scattered light enters the scattered light receiving system when it is on the front surface or the back surface. When the inspection light is incident on the pellicle film at the second incident angle, it becomes reflected light when there is no foreign matter, and when the foreign matter is on the front surface side of the pellicle film, the scattered light of the foreign matter enters the scattered light receiving system and the pellicle film. If there is a foreign substance on the back side of the pellicle film, it will be reflected light on the surface of the pellicle film and will not be scattered. As a result, since the light received by the scattered light receiving system is different between the first incident angle and the second incident angle, it is possible to determine whether the foreign matter is on the front surface or the back surface of the pellicle film by the determination means.

As described above, it is possible to determine whether the foreign matter existing in the pellicle film is on the front surface or the back surface of the pellicle film, and the silicon process in the lithography process when the foreign matter exists on the back surface side of the pellicle film. In this case, it is possible to prevent the defect transfer to the actual device at the time and to improve the yield. The pellicle film foreign matter inspection device according to claim 2 has a reflection direct light receiving system which receives the reflection direct light of the surface of the pellicle film due to the inspection light of the second incident angle. In addition to the above action, when the pellicle film is degenerated, the reflected light of the inspection light incident at the first incident angle becomes strong. Therefore, by directly receiving this reflected light by the light receiving system, It is possible to discriminate the quality change, prevent the defect transfer in the lithography process, and improve the yield.

[Brief description of drawings]

FIG. 1 is an explanatory diagram showing an inspection state when the inspection light according to the first embodiment of the present invention is incident at a first incident angle and there is no foreign matter on the pellicle film.

FIG. 2 is a functional system diagram of a foreign matter inspection device for a pellicle film according to a first embodiment.

FIG. 3 is a transmission spectrum diagram of transmittance with respect to an incident angle of inspection light on a pellicle film.

FIG. 4 is an explanatory diagram showing an inspection state when foreign matter is present on the pellicle film surface when the inspection light is incident at a first incident angle.

FIG. 5 is an explanatory diagram showing an inspection state when foreign matter is present on the back surface of the pellicle film when the light is incident at a first incident angle.

FIG. 6 is an explanatory diagram showing an inspection state when the inspection light is incident at a second incident angle and there is no foreign matter on the pellicle film.

FIG. 7 is an explanatory diagram showing an inspection state when a foreign substance is present on the surface of the pellicle film when the light is incident at a second incident angle.

FIG. 8 is an explanatory diagram showing an inspection state when foreign matter is present on the back surface of the pellicle film when the light is incident at a second incident angle.

FIG. 9 is a functional system diagram of a foreign matter inspection device for a pellicle film according to a second embodiment.

FIG. 10 is an explanatory diagram showing an inspection state when the inspection light is incident at the first incident angle and there is no foreign matter on the pellicle film.

FIG. 11 is an explanatory diagram showing an inspection state when the pellicle film is denatured when incident at a first incident angle.

FIG. 12 is an explanatory diagram showing an inspection state when a foreign substance is present on the surface of the pellicle film when the light is incident at the first incident angle.

FIG. 13 is an explanatory diagram showing an inspection state when foreign matter is present on the back surface of the pellicle film when the light is incident at the first incident angle.

FIG. 14 is an explanatory diagram showing an inspection state when there is no foreign matter on the pellicle film when incident at a second incident angle.

FIG. 15 is an explanatory diagram showing an inspection state when the pellicle film is denatured when incident at a second incident angle.

FIG. 16 is an explanatory diagram showing an inspection state when foreign matter is present on the surface of the pellicle film when the light is incident at the second incident angle.

FIG. 17 is an explanatory diagram showing an inspection state when foreign matter is present on the back surface of the pellicle film when the light is incident at the second incident angle.

FIG. 18 is a functional system diagram of a conventional foreign matter inspection device for a pellicle film.

FIG. 19 is a transmission spectrum diagram of the transmittance of the pellicle film of the conventional example with respect to the wavelength of the inspection light.

FIG. 20 is an explanatory diagram illustrating a foreign substance inspection state when there is no foreign substance on the pellicle film in the conventional example.

FIG. 21 is an explanatory diagram illustrating a foreign matter inspection state when a foreign matter is present on the surface of the pellicle film in the conventional example.

FIG. 22 is an explanatory diagram for explaining a foreign matter inspection state when there is a foreign matter on the back surface of the pellicle film in the conventional example.

[Explanation of symbols]

 1 Light Source 2 Scattered Light Receiving System 4 Signal Processing System with Discriminating Means 10 Pellicle Film θ1 First Incident Angle

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification code Office reference number FI technical display location H01L 21/66 J 7630-4M

Claims (2)

[Claims] 1. A light source for injecting inspection light at a first incident angle passing through a pellicle film and a second incident angle reflected by the pellicle film, and an inspection light at the first incident angle and the second incident angle. One of the front surface and the back surface of the pellicle film based on the presence or absence of an output signal of the scattered light receiving system that receives the inspection light of the incident angle and receives the scattered light by the foreign matter on the surface of the pellicle film. A pellicle film foreign matter inspection device, comprising: a determination unit that determines whether or not a foreign matter is present. 2. The foreign matter inspection device for a pellicle film according to claim 1, further comprising a reflected direct light receiving system for receiving the reflected direct light on the surface of the pellicle film by the inspection light having the second incident angle.