JPH06254524A - Method and device for sweeping pipeline - Google Patents
Method and device for sweeping pipelineInfo
- Publication number
- JPH06254524A JPH06254524A JP5044221A JP4422193A JPH06254524A JP H06254524 A JPH06254524 A JP H06254524A JP 5044221 A JP5044221 A JP 5044221A JP 4422193 A JP4422193 A JP 4422193A JP H06254524 A JPH06254524 A JP H06254524A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust system
- pipe
- system pipe
- pressurizing device
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置の製造装置に
おけるCVD装置などの排気系配管の清掃方法および装
置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for cleaning exhaust system piping such as a CVD apparatus in a semiconductor device manufacturing apparatus.
【0002】[0002]
【従来の技術】近年、半導体装置の製造工程において、
CVD装置は薄膜堆積装置として必要不可欠なものとな
っている。2. Description of the Related Art In recent years, in the manufacturing process of semiconductor devices,
The CVD apparatus has become indispensable as a thin film deposition apparatus.
【0003】以下図面を参照しながら、上記した従来の
CVD装置の一例について説明する。図8は従来の常圧
CVD(AP−CVD)装置の構成図を示すものであ
る。An example of the conventional CVD apparatus described above will be described below with reference to the drawings. FIG. 8 shows a configuration diagram of a conventional atmospheric pressure CVD (AP-CVD) apparatus.
【0004】図8に示すAP−CVD装置は、まず、原
料ガスがマスフローコントローラー12により制御さ
れ、ヘッド13から反応部14に導入される。反応部1
4では、ヒーター15により加熱された基板16上で、
原料ガスを反応させることにより、薄膜を堆積する。し
かし、ここでは全ての原料ガスが反応することはなく、
未反応ガスが、排気系配管17を通り、排気ガス処理装
置18により処理される。また、CVD装置としては図
9に示す真空状態で熱により反応を行う減圧CVD(L
P−CVD)、その他図10に示す真空状態でプラズマ
により反応を行うプラズマCVD(PE−CVD)があ
る。これらの装置においても、未反応ガスが、排気系配
管17,17′、真空ポンプ19を通り、排気ガス処理
装置18により処理される。なお、これらの装置におい
て、真空ポンプ19としてロータリーポンプを使用する
ことが多かったが、ロータリーポンプはオイルの交換な
どのメンテナンスが多いので、メンテナンスの必要のな
いドライポンプに変更されつつある。In the AP-CVD apparatus shown in FIG. 8, a raw material gas is first controlled by the mass flow controller 12 and introduced from the head 13 into the reaction section 14. Reaction part 1
In 4, on the substrate 16 heated by the heater 15,
A thin film is deposited by reacting the source gas. However, here, not all source gases react,
The unreacted gas passes through the exhaust system pipe 17 and is processed by the exhaust gas processing device 18. As a CVD apparatus, a low pressure CVD (L
P-CVD), and plasma CVD (PE-CVD) in which a reaction is caused by plasma in a vacuum state shown in FIG. In these devices as well, the unreacted gas is processed by the exhaust gas processing device 18 after passing through the exhaust system pipes 17 and 17 'and the vacuum pump 19. In these devices, a rotary pump was often used as the vacuum pump 19, but since the rotary pump often undergoes maintenance such as oil exchange, it is being replaced with a dry pump that does not require maintenance.
【0005】[0005]
【発明が解決しようとする課題】ところで図8のような
構成では、未反応ガス排気系配管17内で反応し、図1
1に示したように排気系配管17内に反応物20が堆積
するので、排気系配管17が目詰まりする。そこで、目
詰まりを防止するするため、排気系配管17を大規模に
分解して、排気系配管17を洗浄するメンテナンスを、
定期的に行う必要があるという問題点を有していた。こ
こで図9、図10の装置においても同様な問題がある。By the way, in the structure as shown in FIG. 8, reaction occurs in the unreacted gas exhaust system pipe 17,
As shown in FIG. 1, since the reactant 20 is accumulated in the exhaust system pipe 17, the exhaust system pipe 17 is clogged. Therefore, in order to prevent clogging, maintenance for disassembling the exhaust system pipe 17 on a large scale and cleaning the exhaust system pipe 17 is performed.
It had a problem that it had to be done regularly. Here, the devices of FIGS. 9 and 10 have similar problems.
【0006】また、図9、図10のような構造のCVD
装置で、真空ポンプ19として、ドライボンプを使用す
ると、オイルによる未反応ガス、および反応物のトラッ
プがなくなるので、配管内に反応物がさらに堆積し易く
なる。このため目詰まりを防止するため、排気系配管を
大規模に行う分解して、排気系配管を洗浄するメンテナ
ンスを、定期的に必要があるという問題点を有してい
た。Further, CVD having a structure as shown in FIGS.
When a dry pump is used as the vacuum pump 19 in the apparatus, the unreacted gas and the trap of the reaction product due to the oil are eliminated, so that the reaction product is more easily deposited in the pipe. Therefore, in order to prevent clogging, there is a problem that maintenance is required to periodically disassemble the exhaust system piping and clean the exhaust system piping.
【0007】本発明は上記問題点に鑑み、排気系配管の
メンテナンスが容易に行える配管清掃方法とその装置を
提供するものである。In view of the above problems, the present invention provides a pipe cleaning method and an apparatus for the same, which allows easy maintenance of exhaust system pipes.
【0008】[0008]
【課題を解決するための手段】上記問題点を解決するた
めに本発明の配管清掃方法およびその装置は、排気系配
管内に加圧装置により清掃球を圧送し、この圧送によっ
て除かれる堆積物および前記清掃球を回収部で回収する
ようにしたものである。In order to solve the above problems, the pipe cleaning method and apparatus of the present invention are such that a cleaning ball is pressure-fed into an exhaust system pipe by a pressure device, and deposits removed by this pressure feeding. Also, the cleaning balls are collected by the collecting unit.
【0009】[0009]
【作用】本発明は上記した方法において、清掃球を排気
系配管に圧送し、排気系配管内の堆積物は物理的に除去
されることとなる。According to the present invention, in the above-mentioned method, the cleaning balls are pumped to the exhaust system pipe, and the deposits in the exhaust system pipe are physically removed.
【0010】[0010]
【実施例】以下本発明の一実施例の配管清掃装置につい
て、図面を参照しながら説明する。図1は本発明の一実
施例における配管清掃装置の構成図を示すものである。
図1において、3は排気系配管であり、始端は装置(図
示せず)に接続され、終端は排気ガス処理装置(図示せ
ず)に接続されている。前記排気系配管3の始端近くに
はコンプレッサ1を接続部2を介して接続してあり、ま
た、排気系配管3の終端近くには、回収部8を接続部9
を介して接続している。前記コンプレッサ1を接続する
接続部2と排気系配管3との間の接続管2′内には、排
気系配管3の内径よりやや小さい直径の清掃球6を保持
する球保持部7を設けるとともに、前記接続管2′を排
気系配管3に連通・遮断および排気系配管3を装置へ連
通・遮断する切り替えバルブ4を設けている。また、回
収部8を接続する接続部9と排気系配管3との間の接続
管9′内には、この接続管9′を排気系配管3に連通・
遮断および排気系配管3を排気ガス処理装置へ連通・遮
断する切り替えバルブ5を設けている。さらに前記回収
部8の下流側にはフィルター10を設けてあり、フィル
ター10の下流側は接続部9″を介して排気ガス処理装
置に接続されている。図中の11は排気系配管3内の堆
積物である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A pipe cleaning apparatus according to an embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a block diagram of a pipe cleaning device according to an embodiment of the present invention.
In FIG. 1, 3 is an exhaust system pipe, the starting end of which is connected to a device (not shown) and the end of which is connected to an exhaust gas treatment device (not shown). A compressor 1 is connected near the start end of the exhaust system pipe 3 via a connecting part 2, and a recovery part 8 is connected near the end of the exhaust system pipe 3.
Connected through. In the connecting pipe 2 ′ between the connecting part 2 connecting the compressor 1 and the exhaust system pipe 3, a ball holding part 7 for holding a cleaning ball 6 having a diameter slightly smaller than the inner diameter of the exhaust system pipe 3 is provided. A switching valve 4 is provided for connecting / disconnecting the connecting pipe 2'to / from the exhaust system pipe 3 and connecting / disconnecting the exhaust system pipe 3 to / from the apparatus. Further, in the connection pipe 9 ′ between the connection portion 9 connecting the recovery unit 8 and the exhaust system pipe 3, this connection pipe 9 ′ is connected to the exhaust system pipe 3.
A switching valve 5 is provided for connecting / disconnecting the shutoff / exhaust pipe 3 to / from the exhaust gas treatment device. Further, a filter 10 is provided on the downstream side of the recovery section 8, and the downstream side of the filter 10 is connected to an exhaust gas treatment device via a connection section 9 ″. It is a deposit of.
【0011】以上のように構成された配管洗浄装置につ
いて、以下図2〜7を用いてその動作を説明する。ま
ず、図2に示すように、コンプレッサ1を外し、清掃球
6を保持部7に保持させ、図3に示すようにコンプレッ
サー1を接続する。そして切り替えバルブ4を切りかえ
て排気系配管3と装置の接続を断つとともに接続管2′
を排気系配管3に連通させる。同時に切り替えバルブ5
を切り替えて排気系配管3と排ガス処理装置の接続を断
つとともに、排気系配管3と接続管9′を連通させる。The operation of the pipe cleaning apparatus configured as described above will be described below with reference to FIGS. First, as shown in FIG. 2, the compressor 1 is removed, the cleaning ball 6 is held by the holding portion 7, and the compressor 1 is connected as shown in FIG. Then, the switching valve 4 is switched to disconnect the connection between the exhaust system pipe 3 and the device, and the connecting pipe 2 '.
To communicate with the exhaust system pipe 3. Switching valve 5 at the same time
Is switched to disconnect the exhaust system pipe 3 from the exhaust gas treatment device, and connect the exhaust system pipe 3 to the connection pipe 9 '.
【0012】次にコンプレッサー1で圧力を高めてい
く。この圧力が保持部7で清掃球6を保持できない圧力
になると図4に示すように、清掃球6が排気系配管3内
に押し出される。押し出された清掃球6は排気系配管3
内の堆積物11を削り落として行き、図5に示したよう
に、削られた堆積物11とともに回収部8に回収され、
堆積物11はフィルター10によりトラップされる。Next, the pressure is increased by the compressor 1. When this pressure reaches a pressure at which the holding portion 7 cannot hold the cleaning ball 6, the cleaning ball 6 is pushed out into the exhaust system pipe 3 as shown in FIG. The cleaning ball 6 pushed out is the exhaust system piping 3
The deposits 11 in the inside are scraped off, and as shown in FIG.
The deposit 11 is trapped by the filter 10.
【0013】次に、図6に示すように、切り替えバルブ
4、5を切り替えて、コンプレッサー1および回収部8
と排気系配管3との連通を断つ。最後に図7に示すよう
に、回収部8を接続部9から外し、フィルター10に溜
った堆積物11と清掃球6を取り出し、回収部8を接続
部9で接続する。Next, as shown in FIG. 6, the switching valves 4 and 5 are switched so that the compressor 1 and the recovery unit 8 are connected.
And disconnecting the exhaust system piping 3 from each other. Finally, as shown in FIG. 7, the collecting part 8 is removed from the connecting part 9, the deposit 11 and the cleaning ball 6 accumulated in the filter 10 are taken out, and the collecting part 8 is connected by the connecting part 9.
【0014】以上のように本実施例によればコンプレッ
サー1により清掃球6を排気系配管3に押し出し、排気
系配管3の堆積物11を削り落とし、この堆積物11と
清掃球6を回収部8に回収するようにしたので、排気系
配管3内の清掃が容易に、かつ確実にできる。As described above, according to this embodiment, the compressor 1 pushes the cleaning ball 6 into the exhaust system pipe 3, scrapes off the deposit 11 on the exhaust system pipe 3, and collects the deposit 11 and the cleaning ball 6 from the recovery unit. Since it is collected in No. 8, the inside of the exhaust system pipe 3 can be easily and surely cleaned.
【0015】なお、本実施例において、加圧装置として
はコンプレッサー1としたが、加圧装置としては不活性
ガスの高圧ボンベとしてもよい。Although the compressor 1 is used as the pressurizing device in this embodiment, a high-pressure cylinder of an inert gas may be used as the pressurizing device.
【0016】[0016]
【発明の効果】以上の実施例の説明より明らかなよう
に、本発明は排気系配管に加圧装置によって清掃球を圧
送するようにしたので排気系配管内の堆積物を容易に除
去することができ、排気系配管の大規模な分解を不要と
するのでメンテナンス性がよい。As is apparent from the above description of the embodiments, since the present invention is designed so that the cleaning balls are pressure-fed to the exhaust system piping by the pressurizing device, the deposits in the exhaust system piping can be easily removed. The maintenance work is good because it does not require large-scale disassembly of the exhaust system piping.
【図1】本発明の一実施例の配管清掃装置の構成図FIG. 1 is a configuration diagram of a pipe cleaning device according to an embodiment of the present invention.
【図2】同実施例における動作説明のための配管清掃装
置の構成図FIG. 2 is a configuration diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図3】同実施例における動作説明のための配管清掃装
置の構成図FIG. 3 is a configuration diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図4】同実施例における動作説明のための配管清掃装
置の構成図FIG. 4 is a configuration diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図5】同実施例における動作説明のための配管清掃装
置の構成図FIG. 5 is a configuration diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図6】同実施例における動作説明のための配管清掃装
置の構成図FIG. 6 is a configuration diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図7】同実施例における動作説明のための配管清掃装
置の構成図FIG. 7 is a block diagram of a pipe cleaning device for explaining the operation in the embodiment.
【図8】従来のCVD装置の概略構成図FIG. 8 is a schematic configuration diagram of a conventional CVD apparatus.
【図9】従来のCVD装置の概略図FIG. 9 is a schematic view of a conventional CVD apparatus.
【図10】従来のCVD装置の概略図FIG. 10 is a schematic diagram of a conventional CVD apparatus.
【図11】排気系配管の断面図[Fig. 11] Cross-sectional view of exhaust system piping
1 コンプレッサー 2 接続部 3 排気系配管 4 切り替えバルブ 5 切り替えバルブ 6 清掃球 7 保持部 8 回収部 9 接続部 10 フィルター 11 堆積物 1 Compressor 2 Connection part 3 Exhaust system piping 4 Switching valve 5 Switching valve 6 Cleaning ball 7 Holding part 8 Recovery part 9 Connection part 10 Filter 11 Deposit
Claims (4)
近くに接続自在な加圧装置と、前記排気系配管の終端部
近くに接続自在な回収部を備え、前記加圧装置により清
掃球を排気系配管内に圧送し、前記排気系配管内を清掃
する配管清掃方法。1. An exhaust system pipe, a pressurizing device connectable near a start end of the exhaust system pipe, and a recoverable unit connectable near an end end of the exhaust system pipe, which are cleaned by the pressurizing device. A pipe cleaning method of pumping a ball into an exhaust system pipe to clean the inside of the exhaust system pipe.
ンベよりなる請求項1記載の配管清掃方法。2. The pipe cleaning method according to claim 1, wherein the pressurizing device comprises a compressor or a high-pressure cylinder.
近くに接続された加圧装置と、前記加圧装置によって排
気系配管内を圧送される清掃球と、前記排気系配管の終
端部近くに接続された回収部を備え、前記加圧装置およ
び回収部は取り外し自在に接続され、加圧装置と排気系
配管の接続部および排気系配管の始端部と装置の連通・
遮断用の切り替えバルブと、回収部と排気系配管の接続
部および排気系配管の終端部と排気ガス処理装置の連通
・遮断用の切り替えバルブを設けた配管清掃装置。3. An exhaust system pipe, a pressurizing device connected near a starting end of the exhaust system pipe, a cleaning ball pumped in the exhaust system pipe by the pressurizing device, and an end of the exhaust system pipe. The recovery unit is connected near the section, the pressurizing device and the recovery unit are detachably connected, and the connecting unit between the pressurizing device and the exhaust system pipe and the communication between the starting end of the exhaust system pipe and the device are connected.
A pipe cleaning device provided with a switching valve for shutting off, a connection part between the recovery part and the exhaust system pipe, and a switching valve for connecting / disconnecting the exhaust gas treatment device with the end part of the exhaust system pipe.
ルブよりなる請求項3記載の配管清掃装置。4. The pipe cleaning device according to claim 3, wherein the pressurizing device comprises a compressor or a high-pressure valve.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5044221A JPH06254524A (en) | 1993-03-05 | 1993-03-05 | Method and device for sweeping pipeline |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5044221A JPH06254524A (en) | 1993-03-05 | 1993-03-05 | Method and device for sweeping pipeline |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06254524A true JPH06254524A (en) | 1994-09-13 |
Family
ID=12685492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5044221A Pending JPH06254524A (en) | 1993-03-05 | 1993-03-05 | Method and device for sweeping pipeline |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06254524A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998040174A1 (en) * | 1997-03-13 | 1998-09-17 | Bg Plc | Pipeline cleaning method and apparatus |
JP2008175046A (en) * | 2006-12-20 | 2008-07-31 | Kurimoto Ltd | Washing method for water distributing pipe and guide spatula of pipe washing pig |
-
1993
- 1993-03-05 JP JP5044221A patent/JPH06254524A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998040174A1 (en) * | 1997-03-13 | 1998-09-17 | Bg Plc | Pipeline cleaning method and apparatus |
AU726747B2 (en) * | 1997-03-13 | 2000-11-16 | Bg Plc | Pipeline cleaning method and apparatus |
US6361616B1 (en) * | 1997-03-13 | 2002-03-26 | Transco Plc | Pipeline cleaning method and apparatus |
JP2008175046A (en) * | 2006-12-20 | 2008-07-31 | Kurimoto Ltd | Washing method for water distributing pipe and guide spatula of pipe washing pig |
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