JPH06251703A - Formation of phosphor screen for plasma display substrate - Google Patents

Abstract

PURPOSE:To provide phosphor screens not only on a glass substrate but also on the side surface of a barrier. CONSTITUTION:Each of the three kinds of phosphor pastes 3, R, G, B is filled into the space of a specific barrier 2 by screen printing, and after a liquid honing process is carried out through a subtracting mask 7, phosphor screens made of phosphor are formed on a glass substrate 1 and on the side surface of the barrier 2. As the subtracting mask 7, a photoresist is used for the material, while a desired pattern is provided by photo-lithography.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a phosphor screen on a plasma display substrate.

[0002]

2. Description of the Related Art Conventionally, as a method for forming a phosphor screen on a plasma display substrate, a photosensitive liquid in which a phosphor is dispersed is coated on a glass substrate and dried, and then light having an absorption wavelength of the photosensitive liquid is formed into a desired pattern. There is known a method of forming a predetermined phosphor pattern by irradiating through a mask to harden the exposed portion and performing development to remove the unexposed portion. In this method, the above steps are repeated using three types of phosphors of red (R), green (G), and blue (B) to obtain a desired phosphor screen. As another method, there is also known a method of forming a desired fluorescent screen on a glass substrate by screen printing using a screen printing phosphor paste composed of three types of R, G, and B.

[0003]

By the way, in the plasma display, it is desirable that not only the glass substrate but also the side wall of the barrier is a fluorescent screen in order to improve the luminous efficiency due to limited energy. In the photolithography method or screen printing method of
There is a problem that it is difficult to provide a phosphor on the side surface of the barrier to form a phosphor screen.

The present invention was devised in order to solve the above-mentioned problems of the prior art. The purpose of the present invention is to provide a phosphor on the side surface of the barrier other than on the glass substrate. Another object of the present invention is to provide a method of forming a fluorescent screen on a plasma display substrate.

[0005]

In order to achieve the above object, in the method of forming a phosphor screen of a plasma display substrate of the present invention, three kinds of phosphor pastes of red, green and blue are respectively placed in predetermined barrier spaces. After filling and performing liquid honing through a subtractive mask consisting of a pattern having smaller eyes than the transverse pattern of the barrier, a phosphor screen is formed on the glass substrate and on the side of the barrier through a baking process. Is characterized by.

As the subtract mask, it is possible to use a mask made of photoresist as a material and having a desired pattern formed by photolithography.

[0007]

According to the method of forming a phosphor screen having the above structure, after the phosphor pastes of the respective colors are filled in the predetermined barriers, respectively,
Liquid honing is performed through the subtract mask, and as a result of removing unnecessary portions of the phosphor paste by this treatment, the phosphor paste remains on the glass substrate and on the side surfaces of the barrier, and the remaining phosphor paste causes the glass substrate to disappear. A fluorescent screen is formed not only on the upper surface but also on the side surface of the barrier.

[0008]

1 and 2 are continuous process diagrams showing an embodiment of a method for forming a phosphor screen of a plasma display substrate according to the present invention. Hereinafter, the present embodiment will be described step by step. To do.

First, as shown in (a), the glass substrate 1
R, G, and B are placed in a barrier space surrounded by a barrier 2 (in this embodiment, a matrix pattern having a pitch of 500 μm and a line width of 100 μm) formed in advance. Three kinds of phosphor pastes 3 were filled by screen printing so that each color had a predetermined arrangement state. Then, the phosphor paste 3 is dried to remove the solvent contained in the organic binder, and then the substrate 1 is heated to 50 to 80 ° C. as shown in FIG. After laminating a film (manufactured by Tokyo Ohka Kogyo Co., Ltd., OSBR film), as shown in (c), ultraviolet rays 6 are passed through a dot pattern mask 5 having a pitch of 500 μm and a width of 300 μm.
Then, pattern exposure was performed. Exposure condition is 365 nm
Intensity of 200μW / cm ² and irradiation dose of 70m
J / cm ² . Then, in the developing step shown in (d),
Liquid temperature 30 with 0.2 wt% anhydrous sodium carbonate solution
Spray development was carried out at -50 ° C. By the above process,
On the barrier 2 and the phosphor paste 3, a pitch of 500 μm,
A mask 7 for subtraction having a grid pattern with a line width of 200 μm was obtained.

Then, after a drying step, unnecessary portions of the phosphor were removed by liquid honing 8 as shown in (e). In this step, brown fused alumina # 1500 as an abrasive was dispersed in water, and a liquid honing treatment was performed under the conditions of a nozzle diameter of 5 mm and an ejection pressure of 1 kg / cm ² . After the treatment, the subtractive mask 7 is peeled off, washed with water,
By drying, the film thickness is 50μ as shown in (f).
It was possible to perform pattern formation of a phosphor formed by depositing the phosphor paste 3 of m on the glass substrate 1 and the side surface of the barrier 2. The film thickness of the phosphor paste 3 attached to the glass substrate 1 can be controlled by the conditions and time of the liquid honing process. Next, in the firing step shown in (g), the phosphor paste 3 was fired under conditions of a peak temperature of 450 ° C. and a holding time of 10 to 20 minutes to bind the phosphor on the glass substrate 1 and the side surfaces of the barrier. . By the above process,
It was possible to obtain a plasma display substrate in which R, G, and B phosphors having a film thickness of 40 μm were patterned on the predetermined glass substrate 1 and on the side surface of the barrier 2, respectively.

In the present embodiment, the photo-curable dry film was used as the photoresist forming the subtract mask, but this selection does not limit the present invention, and the present invention is not limited thereto. A suitable photoresist may be selected depending on the desired pattern size, suitability as a mask for liquid honing treatment, and the like.

Further, when the phosphor paste is filled in the barrier space, other than the screen printing method described in the above embodiment, other means such as a spray method may be used.

[0013]

As described above, in the method of forming a phosphor screen of the plasma display substrate of the present invention, the phosphor paste is filled in the barrier space by the screen printing method, and then the liquid honing process is performed through the subtract mask. By doing so, a phosphor screen was formed on the glass substrate and on the side surface of the barrier by the phosphor paste.Therefore, patterning the phosphor on a place other than the glass substrate, which is difficult with the conventional photolithography method or screen printing method, is performed. This makes it easy to produce a plasma display with excellent luminous efficiency.

[Brief description of drawings]

FIG. 1 is a process chart for explaining an embodiment of a method for forming a phosphor screen of a plasma display substrate according to the present invention.

FIG. 2 is a process diagram that is continuous with FIG.

[Explanation of symbols]

 1 Glass Substrate 2 Barrier 3 Phosphor Paste 4 Photoresist 7 Subtract Mask 8 Liquid Honing

Claims (2)

[Claims] 1. A liquid honing process in which three kinds of phosphor pastes of red, green, and blue are filled in predetermined barrier spaces, respectively, and a subtraction mask having a pattern having eyes smaller than a transverse pattern of the barrier is used. After the above step, a phosphor screen of a plasma display substrate is formed on the glass substrate and on the side surface of the barrier through a firing step. 2. The method for forming a phosphor screen on a plasma display substrate according to claim 1, wherein a mask for subtraction, which is formed by forming a desired pattern by a photolithography method, using a photoresist as a material is used.