JPH06242612A - Exposing method for photopolymerizable composition - Google Patents

Exposing method for photopolymerizable composition

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Publication number
JPH06242612A
JPH06242612A JP5030441A JP3044193A JPH06242612A JP H06242612 A JPH06242612 A JP H06242612A JP 5030441 A JP5030441 A JP 5030441A JP 3044193 A JP3044193 A JP 3044193A JP H06242612 A JPH06242612 A JP H06242612A
Authority
JP
Japan
Prior art keywords
magnetic field
light
exposing
compsn
photopolymerizable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5030441A
Other languages
Japanese (ja)
Inventor
Nobumasa Sasa
信正 左々
Takeo Akiyama
健夫 秋山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP5030441A priority Critical patent/JPH06242612A/en
Publication of JPH06242612A publication Critical patent/JPH06242612A/en
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide the photopolymerizable compsn. for a printing plate having high sensitivity and high printing resistance by irradiating the compsn. with active light while applying a magnetic field thereto at the time of recording images by imagewise-irradiating the compsn. with UV light and/or visible light at ordinary temp CONSTITUTION:This solid phase photopolymerizable compsn. contains a photopolymn. initiator, a multifunctional polymerizable monomer and matrix resin and is irradiated with the active light while the magnetic field is applied thereto at the time of recording the images by imagewise-irradiating the photopolymerizable compsn. with the UV light and/or visible light at ordinary temp. The initiation of a photopolymn. reaction is accelerated and the photosensitivity is increased by this exposing method. The way of applying the magnetic field to the compsn. at the time of the exposing more specifically includes a permanent magnet, electromagnet, etc., as the method for application of the magnetic field. The application is executed in a 10<-2> to 10<3> gauss range of magnetic field intensity. A device for exposing the images by an optical fiber, etc., is preferably used as the image exposing method by the UV light and/or visible light. The temp. at the time of the exposing may be ordinary temp. and room temp. range of 10 to 35 deg. is sufficient for the purpose.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光重合性組成物の露光方
法に関し、詳しくは凸版、平版、グラビア等の印刷版に
おいて、光感度の増加と耐刷力を向上することができる
光重合性組成物の露光方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of exposing a photopolymerizable composition, and more particularly, to a photopolymerizable composition capable of improving photosensitivity and printing durability in printing plates such as letterpress, planographic printing and gravure printing. The present invention relates to a method of exposing a composition.

【0002】[0002]

【従来の技術】従来、光重合性組成物に磁場をかけなが
ら活性光を露光することにより、重合度および重合速度
を増大する技術に関しては、例えばアクリロニトリルの
低温固相重合における磁場の効果或はアセトアルデヒド
の放射線固相重合における磁場の効果について、γ線照
射により重合度増大の有用性が例えば工業化学雑誌 73
巻6号(1970)1215〜1220及び同誌73巻4号(1970)175〜178
などに報告されている。
2. Description of the Related Art Conventionally, for the technique of increasing the degree of polymerization and the rate of polymerization by exposing a photopolymerizable composition to active light while applying a magnetic field, for example, the effect of a magnetic field in low temperature solid state polymerization of acrylonitrile or Regarding the effect of magnetic field on the radiation solid-state polymerization of acetaldehyde, the usefulness of increasing the degree of polymerization by γ-ray irradiation is described in, for example, Industrial Chemistry Journal 73.
Volume 6 (1970) 1215-1220 and Vol. 73, No. 4 (1970) 175-178
Have been reported to.

【0003】又、スチレンのエマルジョン溶液光重合に
対する磁場効果による重合速度の増大とその有用性に関
しては、例えばJ.Am.Chem.Soc.1983,105,1572-1577に
記載されている。
Further, regarding the increase of the polymerization rate due to the magnetic field effect on the emulsion solution photopolymerization of styrene and its usefulness, for example, J. Am. Chem. Soc. 1983, 105, 1572-1577.

【0004】しかしながらこれらの従来技術では、光重
合開始剤、多官能重合性モノマーを含有した固相光重合
組成物に、常温にて紫外光及び/又は可視光による画像
記録を行う際の磁場効果についてはなんら述べられてな
く、又それを示唆する記載もない。露光光源がγ線など
の放射線でなく、安全でしかも安易な紫外光及び/又は
可視光により容易に画像露光ができ、かつ高感度である
ことの要望が望まれていた。
However, in these prior arts, the magnetic field effect when performing image recording by ultraviolet light and / or visible light at room temperature on a solid-phase photopolymerization composition containing a photopolymerization initiator and a polyfunctional polymerizable monomer Is not mentioned at all, nor is there any description suggesting it. It has been desired that the exposure light source is not radiation such as γ-rays, but is capable of image exposure with safe and easy ultraviolet light and / or visible light, and has high sensitivity.

【0005】[0005]

【発明が解決しようとする課題】従って本発明の目的
は、前記した従来の欠点を除去し光感度の増加と耐刷力
を向上した光重合組成物の露光方法、及びこの方法によ
り作成された高感度で、高耐刷性の印刷版を提供するこ
とである。
SUMMARY OF THE INVENTION Accordingly, the object of the present invention is to eliminate the above-mentioned conventional drawbacks, to increase the photosensitivity and to improve the printing durability of the photopolymerizable composition, and a method for exposing the same. It is to provide a printing plate having high sensitivity and high printing durability.

【0006】[0006]

【課題を解決するための手段】上記の問題点は下記の本
発明によって解決された。
The above problems have been solved by the present invention described below.

【0007】即ち、光重合開始剤、多官能重合性モノマ
ー及びマトリックス樹脂を含有する固相光重合性組成物
に、常温にて紫外光及び/又は可視光を画像状に照射し
て画像記録を行う際、該光重合性組成物に磁場をかけな
がら該活性光を照射することを特徴とする光重合性組成
物の露光方法により達成される。
That is, a solid phase photopolymerizable composition containing a photopolymerization initiator, a polyfunctional polymerizable monomer and a matrix resin is imagewise irradiated with ultraviolet light and / or visible light at room temperature to record an image. This is achieved by a method for exposing a photopolymerizable composition, which comprises irradiating the photopolymerizable composition with the active light while applying a magnetic field.

【0008】以下、本発明を詳述する。The present invention will be described in detail below.

【0009】本発明で言う光重合性組成物としては、好
ましくは下記の成分から成る。
The photopolymerizable composition referred to in the present invention preferably comprises the following components.

【0010】(a)少なくとも2個の末端ビニル基を有す
るビニル単量体 (b)光重合開始剤 (c)マトリックス樹脂 上記の成分(a)の少なくとも2個の末端ビニル基を有す
るビニル単量体としては、特公昭35-5093号、同35-1471
9号、同44-28727号などの各公報に記載のものを用いる
ことができ、例えばポリオールのアクリル酸又はメタク
リル酸エステル、即ちジエチレングリコール-ジ-(メタ)
アクリレート、トリエチレングリコール-ジ-(メタ)アク
リレート、ペンタエリスリトール-トリ-(メタ)アクリレ
ート、トリメチロールプロパン(メタ)アクリレート等、
或はメチレンビス(メタ)アクリルアミド、エチレンビス
(メタ)アクリルアミドのようなビス(メタ)アクリルアミ
ド類或はウレタン基を含有する不飽和単量体で例えばジ
-(2′-メタクリロキシエチル)-2,4-トリレン-ジウレタ
ン、ジ-(2-アクリロキシエチル)トリメチレンジウレタ
ン等のジオールモノ(メタ)アクリレートとジイソシアネ
ートとの反応生成物などが挙げられる。
(A) Vinyl monomer having at least two terminal vinyl groups (b) Photopolymerization initiator (c) Matrix resin Monomer having at least two terminal vinyl groups of the above component (a) As for the body, Japanese Patent Publications No. 35-5093 and No. 35-1471
No. 9, the same as those described in each publication such as 44-28727 can be used, for example, acrylic acid or methacrylic acid ester of polyol, that is, diethylene glycol-di- (meth)
Acrylate, triethylene glycol-di- (meth) acrylate, pentaerythritol-tri- (meth) acrylate, trimethylolpropane (meth) acrylate, etc.
Or methylenebis (meth) acrylamide, ethylenebis
Unsaturated monomers containing bis (meth) acrylamides such as (meth) acrylamide or urethane groups, for example di-
Examples include reaction products of diol mono (meth) acrylates such as-(2'-methacryloxyethyl) -2,4-tolylene-diurethane and di- (2-acryloxyethyl) trimethylenediurethane with diisocyanates. .

【0011】上記成分(b)の光重合開始剤としては、例
えばJ.Kosar著「ライトセンシチィブ・システムズ」第5
章に記載されているようなカルボニル化合物、有機硫黄
化合物、過硫化物、レドックス系化合物、アゾ並びにジ
アゾ化合物、ハロゲン化合物、光還元性色素などがあ
る。具体的には英国特許1,459,563号に開示されている
ものが挙げられる。
Examples of the photopolymerization initiator of the above component (b) include, for example, J. Kosar, "Light Sensitive Systems", No. 5,
There are carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreducible dyes as described in Chapter. Specific examples include those disclosed in British Patent 1,459,563.

【0012】さらに成分(c)のマトリックス樹脂として
は、公知の種々のポリマーを使用することができる。例
えばポリエステル樹脂、塩化ビニル-酢酸ビニル共重合
体、アクリル樹脂、塩化ビニル樹脂、ポリアミド樹脂、
ポリビニルブチラール樹脂、エポキシ樹脂、アクリレー
ト系共重合体、酢酸ビニル系共重合体、フェノキシ樹
脂、ポリウレタン樹脂、ポリカーボネート樹脂、ポリア
クリロニトリルブタジエン、ポリ酢酸ビニルなどと混合
して使用するが、特に水酸基を有する親油性高分子化合
物と混合して使用するのが好ましい。
As the matrix resin of the component (c), various known polymers can be used. For example, polyester resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, vinyl chloride resin, polyamide resin,
Used as a mixture with polyvinyl butyral resin, epoxy resin, acrylate copolymer, vinyl acetate copolymer, phenoxy resin, polyurethane resin, polycarbonate resin, polyacrylonitrile butadiene, polyvinyl acetate, etc. It is preferably used by mixing with an oily polymer compound.

【0013】このような親油性高分子化合物としては、
例えば側鎖に脂肪族水酸基を有したモノマー例えば2-ヒ
ドロキシエチルアクリレート又は2-ヒドロキシエチルメ
タクリレートと共重合し得る他のモノマーとの共重合体
が挙げられる。又、これら以外にも必要に応じてポリビ
ニルブチラール樹脂、ポリウレタン樹脂、ポリアミド樹
脂、エポキシ樹脂、ノボラック樹脂、天然樹脂等を用い
てもよい。
Examples of such lipophilic polymer compounds are:
For example, a copolymer with a monomer having an aliphatic hydroxyl group in its side chain, for example, 2-hydroxyethyl acrylate or another monomer copolymerizable with 2-hydroxyethyl methacrylate can be mentioned. In addition to these, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, natural resin and the like may be used if necessary.

【0014】本発明に係る上記の成分(a)、(b)、(c)
の使用に際しては、光重合性組成物中に(a)は20〜80重
量%、(b)は0.1〜20重量%、(c)は20〜80重量%の割
合で含有されるのが好ましい。又、これらの光重合性組
成物には熱重合禁止剤、可塑剤、染料、顔料等を含有さ
せることができる。
The above-mentioned components (a), (b) and (c) according to the present invention
When used, (a) is preferably contained in the photopolymerizable composition in a proportion of 20 to 80% by weight, (b) in a proportion of 0.1 to 20% by weight, and (c) in a proportion of 20 to 80% by weight. . Further, these photopolymerizable compositions may contain a thermal polymerization inhibitor, a plasticizer, a dye, a pigment and the like.

【0015】組成物を塗布するときに用いる溶媒として
は、例えばメチルセロソルブ、エチルセロソルブ、エチ
レンジクロリド、シクロヘキサノン、メチルエチルケト
ン、2-メトキシエチルアセテート、モノクロールベンゼ
ン、トルエン、酢酸エチル、テトラヒドロフランなどが
挙げられる。これらの溶媒は単独もしくは2種以上組み
合わせて使用してもよい。
Examples of the solvent used when applying the composition include methyl cellosolve, ethyl cellosolve, ethylene dichloride, cyclohexanone, methyl ethyl ketone, 2-methoxyethyl acetate, monochlorobenzene, toluene, ethyl acetate, tetrahydrofuran and the like. You may use these solvents individually or in combination of 2 or more types.

【0016】本発明の光重合組成物のマトリックス樹脂
としてはマイクロゲルを含有するのが好ましい。
The matrix resin of the photopolymerizable composition of the present invention preferably contains a microgel.

【0017】本発明に用いられるマイクロゲルとして
は、粒子径が0.005〜1.0μmで好ましくは0.01〜0.5μm
の粒子内部が橋かけ構造をとったポリマーであり、溶剤
に不溶で水あるいは有機溶媒に分散可能なポリマーの微
粒子を指す。
The microgel used in the present invention has a particle size of 0.005 to 1.0 μm, preferably 0.01 to 0.5 μm.
The inside of the particles is a polymer having a crosslinked structure, and refers to fine particles of a polymer that is insoluble in a solvent and can be dispersed in water or an organic solvent.

【0018】本発明において特に好ましく用いられるマ
イクロゲルとしては、四級窒素原子又は四級リン原子を
含むカチオンラテックス重合体とし、例えば特公平2-47
738号明細書の第3欄33行から同第14欄31行に記載の化
合物などを挙げることができる。これらマイクロゲルの
添加量は感光性組成物中に20〜80重量%の範囲で用いら
れる。
The microgel particularly preferably used in the present invention is a cationic latex polymer containing a quaternary nitrogen atom or a quaternary phosphorus atom, for example, Japanese Patent Publication No. 2-47.
The compounds described in Col. 738, column 3, line 33 to column 14, line 31 can be mentioned. The addition amount of these microgels is used in the range of 20 to 80% by weight in the photosensitive composition.

【0019】本発明において上記の光重合性組成物に紫
外光及び/又は可視光にて画像露光する際、磁場をかけ
ることにより、光重合反応の開始が高まり感度の増大が
得られることは予想し得なかったことである。
In the present invention, when the above-mentioned photopolymerizable composition is imagewise exposed to ultraviolet light and / or visible light, it is expected that the initiation of the photopolymerization reaction will be enhanced and the sensitivity will be increased by applying a magnetic field. That was not possible.

【0020】本発明において露光時の磁場のかけかたと
しては、具体的には例えば磁場付与方法として永久磁
石、電磁石などがあって、磁場強度としては10-2〜103
ガウスの範囲で行われるのが好ましい。
In the present invention, as a method of applying a magnetic field at the time of exposure, specifically, there are a permanent magnet, an electromagnet, etc. as a magnetic field applying method, and a magnetic field strength of 10 -2 to 10 3
It is preferably performed in the Gauss range.

【0021】本発明における紫外光及び/又は可視光に
よる画像露光方法としては、通常の装置により可能であ
るが、オプチカルファイバーなどで画像露光する装置を
用いるのが好ましい。露光時の温度は常温でよく、例え
ば室温で10℃〜35℃の範囲でよい。
The image exposure method using ultraviolet light and / or visible light in the present invention can be carried out by an ordinary apparatus, but it is preferable to use an apparatus for image exposure with an optical fiber or the like. The temperature at the time of exposure may be room temperature, for example, in the range of 10 ° C to 35 ° C at room temperature.

【0022】[0022]

【実施例】以下、実施例を挙げて本発明をさらに具体的
に説明する。
EXAMPLES The present invention will be described in more detail below with reference to examples.

【0023】実施例1及び比較例1 2枚のアルミニウム板を10%の水酸化ナトリウム水溶液
にて脱脂し、これを1.8%の塩酸浴中で25℃、30/dm2
30秒の電流密度条件で電解エッチングし、水洗後30%硫
酸浴中で30℃、6.5A/dm2の条件で30秒間封孔処理し、
水洗乾燥して平版印刷版用のアルミニウム支持体を得
た。
Example 1 and Comparative Example 1 Two aluminum plates were degreased with a 10% aqueous sodium hydroxide solution, and this was degreased in a 1.8% hydrochloric acid bath at 25 ° C. and 30 / dm 2 .
Electrolytic etching is performed under a current density condition of 30 seconds, followed by washing with water and sealing treatment in a 30% sulfuric acid bath at 30 ° C. and 6.5 A / dm 2 for 30 seconds.
It was washed with water and dried to obtain an aluminum support for a lithographic printing plate.

【0024】このアルミニウム版に表1に示したような
感光液を、乾燥後の塗膜重量が20mg/dm2になるように
塗布して感光性平版印刷版試料No.1、4を作成した。
Photosensitive solutions as shown in Table 1 were applied to the aluminum plate so that the coating film weight after drying was 20 mg / dm 2 to prepare photosensitive lithographic printing plate samples Nos. 1 and 4. .

【0025】得られた試料の各々にネガフィルム コダ
ック ステップタブレットNo.2を密着させ室温下で2KW
メタルハライドランプで30秒間露光してから、25℃の水
中で1分間スポンジで擦り、未露光部分を除去して鮮明
な画像を有する印刷版を得た。
Negative film Kodak step tablet No. 2 was adhered to each of the obtained samples and 2 KW was applied at room temperature.
After exposing with a metal halide lamp for 30 seconds, the unexposed portion was removed by rubbing with a sponge for 1 minute in water at 25 ° C. to obtain a printing plate having a clear image.

【0026】但し、平版印刷版のうちの本発明の試料N
o.1には、露光時に1.1×103ガウスの磁場をかけた。
However, among the lithographic printing plates, sample N of the present invention
A magnetic field of 1.1 × 10 3 Gauss was applied to the o.1 during the exposure.

【0027】実施例2及び比較例2 表1に記載の感光液を用いた以外は実施例1と同様に行
い、試料No.2、5を作成した。
Example 2 and Comparative Example 2 Sample Nos. 2 and 5 were prepared in the same manner as in Example 1 except that the photosensitive solutions shown in Table 1 were used.

【0028】実施例3及び比較例3 表1に記載の感光液を用い、現像液として3%のメタケ
イ酸ソーダ水溶液を用いた以外は実施例1と同様に行
い、試料No.3、6を作成した。
Example 3 and Comparative Example 3 Samples Nos. 3 and 6 were prepared in the same manner as in Example 1 except that the photosensitive solutions shown in Table 1 were used and a 3% aqueous solution of sodium metasilicate was used as the developing solution. Created.

【0029】得られた試料について磁場の有無について
試験した結果を表1に示した。
Table 1 shows the results of testing the obtained samples for the presence or absence of a magnetic field.

【0030】なお、各試料に用いた感光液組成を下記に
示す。
The composition of the photosensitive solution used for each sample is shown below.

【0031】実施例1 比較例1Example 1 Comparative Example 1

【0032】[0032]

【化1】 [Chemical 1]

【0033】 トリメチロールプロパントリアクリレート 10g ジエチルチオキサントン 1g ジメチルアミノ安息香酸イソアミル 1g メチルセロソルブ 100g 実施例2 比較例2Trimethylolpropane triacrylate 10 g Diethylthioxanthone 1 g Isoamyl dimethylaminobenzoate 1 g Methylcellosolve 100 g Example 2 Comparative Example 2

【0034】[0034]

【化2】 [Chemical 2]

【0035】 トリメチロールプロパントリアクリレート 10g ジイソプロピルチオキサントン 1g ジメチルアミノ安息香酸イソアミル 1g メチルセロソルブ 100g 実施例3 比較例3Trimethylolpropane triacrylate 10 g Diisopropylthioxanthone 1 g Isoamyl dimethylaminobenzoate 1 g Methylcellosolve 100 g Example 3 Comparative Example 3

【0036】[0036]

【化3】 [Chemical 3]

【0037】 トリメチロールプロパントリアクリレート 10g ジイソプロピルチオキサントン 1g ジメチルアミノ安息香酸イソアミル 1g メチルセロソルブ 100gTrimethylolpropane triacrylate 10 g Diisopropylthioxanthone 1 g Isoamyl dimethylaminobenzoate 1 g Methyl cellosolve 100 g

【0038】[0038]

【表1】 [Table 1]

【0039】表から明らかなように、本発明に係る光重
合組成で、かつ磁場をかけながら活性光を露光すること
によって優れた光感度及び耐刷力を得られることが分か
る。
As is apparent from the table, it is understood that excellent photosensitivity and printing durability can be obtained with the photopolymerizable composition according to the present invention and by exposing to active light while applying a magnetic field.

【0040】[0040]

【発明の効果】磁場をかけながら、紫外光及び/又は可
視光により容易に画像露光ができる本発明により、高感
度で、かつ高耐刷性の印刷版用光重合組成物を得られ
た。
Industrial Applicability According to the present invention, which can easily perform image exposure with ultraviolet light and / or visible light while applying a magnetic field, a photopolymerizable composition for a printing plate having high sensitivity and high printing durability can be obtained.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光重合開始剤、多官能重合性モノマー及
びマトリックス樹脂を含有する固相光重合性組成物に、
常温にて紫外光及び/又は可視光を画像状に照射して画
像記録を行う際、該光重合性組成物に磁場をかけながら
該活性光を照射することを特徴とする光重合性組成物の
露光方法。
1. A solid-phase photopolymerizable composition containing a photopolymerization initiator, a polyfunctional polymerizable monomer, and a matrix resin,
A photopolymerizable composition characterized by irradiating the active light while applying a magnetic field to the photopolymerizable composition when image recording is performed by irradiating ultraviolet light and / or visible light imagewise at room temperature. Exposure method.
JP5030441A 1993-02-19 1993-02-19 Exposing method for photopolymerizable composition Pending JPH06242612A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5030441A JPH06242612A (en) 1993-02-19 1993-02-19 Exposing method for photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5030441A JPH06242612A (en) 1993-02-19 1993-02-19 Exposing method for photopolymerizable composition

Publications (1)

Publication Number Publication Date
JPH06242612A true JPH06242612A (en) 1994-09-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP5030441A Pending JPH06242612A (en) 1993-02-19 1993-02-19 Exposing method for photopolymerizable composition

Country Status (1)

Country Link
JP (1) JPH06242612A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2451431A (en) * 2007-07-27 2009-02-04 Photocentric Ltd Photopolymer composition curable by ambient light
US7491782B1 (en) 2004-10-08 2009-02-17 Kovio, Inc. Polysilane compositions, methods for their synthesis and films formed therefrom
US20090195904A1 (en) * 2005-07-21 2009-08-06 Nxp B.V. Magnetic rom information carrier
US8114569B2 (en) 2006-05-30 2012-02-14 Photocentric Limited Maskless photopolymer exposure process and apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7491782B1 (en) 2004-10-08 2009-02-17 Kovio, Inc. Polysilane compositions, methods for their synthesis and films formed therefrom
US8057865B1 (en) 2004-10-08 2011-11-15 Kovio, Inc. Polysilane compositions, methods for their synthesis and films formed therefrom
US20090195904A1 (en) * 2005-07-21 2009-08-06 Nxp B.V. Magnetic rom information carrier
US8114569B2 (en) 2006-05-30 2012-02-14 Photocentric Limited Maskless photopolymer exposure process and apparatus
GB2451431A (en) * 2007-07-27 2009-02-04 Photocentric Ltd Photopolymer composition curable by ambient light

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