JPH0624124Y2 - Scanning electron microscope - Google Patents

Scanning electron microscope

Info

Publication number
JPH0624124Y2
JPH0624124Y2 JP6742989U JP6742989U JPH0624124Y2 JP H0624124 Y2 JPH0624124 Y2 JP H0624124Y2 JP 6742989 U JP6742989 U JP 6742989U JP 6742989 U JP6742989 U JP 6742989U JP H0624124 Y2 JPH0624124 Y2 JP H0624124Y2
Authority
JP
Japan
Prior art keywords
electron microscope
base plate
cover
scanning electron
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6742989U
Other languages
Japanese (ja)
Other versions
JPH037255U (en
Inventor
能夫 石森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP6742989U priority Critical patent/JPH0624124Y2/en
Publication of JPH037255U publication Critical patent/JPH037255U/ja
Application granted granted Critical
Publication of JPH0624124Y2 publication Critical patent/JPH0624124Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は走査顕微鏡に関し、特に音等などの外乱の影響
を防止した装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a scanning microscope, and more particularly to a device that prevents the influence of disturbance such as sound.

[従来技術] 第2図に従来装置の概略を示す。第2図において、例え
ば電子銃1,電子光学系2,試料室3を内臓した電子顕
微鏡カラム4は、該電子顕微鏡カラム4を載置するため
のベースプレート5に支持されている。6は電子銃カラ
ム4を排気するための排気装置であり、該排気装置6は
ベースプレート5に固定されたカバー7によって覆うよ
うにして保護されている。又、該電子顕微鏡カラム4を
載置したベースプレート5は、例えばスプリングコイル
8a,8b,8c,8d(8c,8dは図示せず)等の
防振装置を介して本体架台9に載置されている。
[Prior Art] FIG. 2 schematically shows a conventional device. In FIG. 2, an electron microscope column 4 including, for example, an electron gun 1, an electron optical system 2, and a sample chamber 3 is supported by a base plate 5 on which the electron microscope column 4 is mounted. Reference numeral 6 denotes an exhaust device for exhausting the electron gun column 4, and the exhaust device 6 is protected by being covered with a cover 7 fixed to the base plate 5. The base plate 5 on which the electron microscope column 4 is mounted is mounted on the main body mount 9 via a vibration isolator such as spring coils 8a, 8b, 8c and 8d (8c and 8d are not shown). There is.

このように構成された装置では、走査電子顕微鏡が設置
された床Bの振動等によって、電子線と試料との相対位
置が変化して像観察に悪影響を及ぼす。そのため、床B
の振動等を前記スプリングコイル等の除振装置で吸収す
るか又は減衰させるようにしている。
In the apparatus configured as described above, the relative position between the electron beam and the sample is changed due to the vibration of the floor B on which the scanning electron microscope is installed, which adversely affects the image observation. Therefore, floor B
The vibration or the like is absorbed or damped by the vibration isolation device such as the spring coil.

[考案が解決しようとする問題点] しかしながら、この様に構成された装置では、排気装置
6を保護するためのカバー7がベースプレート5に直接
固定されているため、音等の外乱によりカバー7が振動
し、この振動が電子顕微鏡カラム4を振動させて電子線
と試料との相対位置を変化させるため像観察に悪影響を
及ぼす欠点があった。
[Problems to be Solved by the Invention] However, in the device configured as described above, the cover 7 for protecting the exhaust device 6 is directly fixed to the base plate 5, so that the cover 7 may be damaged by a disturbance such as a sound. There is a drawback that the image is adversely affected because it vibrates, and this vibration vibrates the electron microscope column 4 to change the relative position between the electron beam and the sample.

本考案はこのような欠点を解消して、音等の外乱の影響
を防止した走査電子顕微鏡を提供することを目的として
いる。
An object of the present invention is to provide a scanning electron microscope which eliminates such drawbacks and prevents the influence of disturbance such as sound.

[問題点を解決するための手段] 本目的を達成するための本考案は、架台上に防振部材を
介して配置されたベースプレートと、該ベースプート上
に配置された電子銃,電子光学系,試料室を内臓した電
子顕微鏡カラムと、該電子顕微鏡カラムを排気するため
前記ベースプレート上に配置された排気装置と、該排気
装置をカバーで覆うようにした装置において、該カバー
を前記ベースプレートに接触しない状態で前記架台に固
定するように構成したことを特徴としている。
[Means for Solving the Problems] The present invention for achieving the object is to provide a base plate disposed on a frame via a vibration isolating member, an electron gun disposed on the base plate, an electron optical system, In an electron microscope column with a built-in sample chamber, an exhaust device arranged on the base plate to exhaust the electron microscope column, and a device in which the exhaust device is covered with a cover, the cover does not contact the base plate. It is characterized in that it is configured to be fixed to the pedestal in this state.

[実施例] 以下本考案の実施例を図面に基づき詳述する。[Embodiment] An embodiment of the present invention will be described in detail below with reference to the drawings.

第1図は本考案の一実施例の概略構成図であり、従来装
置と同一構成要素には同一番号を付してその説明を省略
する。第1図において、10a,10b,10c,10
d(10c,10dは図示せず)は前記カバー7を本体
架台9に支持するための支柱で、それぞれの支柱はベー
スプレート5に穿たれた支柱貫通孔11を接触しない状
態で貫通している。この様に構成された装置では、カバ
ー7が、音等の外乱の影響を受けて振動しても、ベース
プレート5にカバーを支えるための前記支柱が接触して
いないため、カバー7の振動はベースプレート5に伝わ
ることはなく、従って、電子顕微鏡カラム4が振動する
ことがないため、電子線と試料との相対位置を変化させ
ることがなく像観察に悪影響を及ぼすこともない。
FIG. 1 is a schematic configuration diagram of an embodiment of the present invention. The same components as those of the conventional device are designated by the same reference numerals and the description thereof will be omitted. In FIG. 1, 10a, 10b, 10c, 10
Reference characters d (10c and 10d are not shown) are columns for supporting the cover 7 on the main frame 9, and each column penetrates the column through holes 11 formed in the base plate 5 without contacting them. In the apparatus configured as described above, even if the cover 7 vibrates due to the influence of external disturbance such as sound, the support plate for supporting the cover is not in contact with the base plate 5. Therefore, the vibration of the cover 7 is caused by the base plate 5. Therefore, since the electron microscope column 4 does not vibrate, the relative position between the electron beam and the sample is not changed and the image observation is not adversely affected.

上記は例示であり、変形して実施することができる。上
記実施例では、カバーを支柱を用いてベースプレートに
接触しない状態で架台に取り付けるようにしたが、前記
カーバをベースプレートに接触しない状態で床Bに取り
付けるよう構成しても良い。
The above is an example, and can be modified and implemented. In the above-described embodiment, the cover is attached to the pedestal by using the columns without contacting the base plate, but the cover may be attached to the floor B without contacting the base plate.

[考案の効果] 以上詳述した様に本考案によれば、排気装置を保護する
ためのカバーをベースプレートに接触しない状態で架台
に固定するようにしたため、電子線と試料との相対位置
を変化させずに像観察が可能な走査電子顕微鏡が提供さ
れる。
[Advantages of the Invention] As described in detail above, according to the present invention, the cover for protecting the exhaust device is fixed to the base without contacting the base plate, so that the relative position of the electron beam and the sample is changed. There is provided a scanning electron microscope capable of observing an image without performing the scanning.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の一実施例の概略図、第2図は従来技術
を説明するための図である。 1:電子銃,2:電子光学系,3:試料室、4:電子顕
微鏡カラム、5:ベースプレート、6:排気装置、7:
カバー、8a,8b,…:スプリングコイル、9:本体
架台、10a,10b,…:支柱、11:支柱貫通孔。
FIG. 1 is a schematic diagram of an embodiment of the present invention, and FIG. 2 is a diagram for explaining a conventional technique. 1: electron gun, 2: electron optical system, 3: sample chamber, 4: electron microscope column, 5: base plate, 6: exhaust device, 7:
Covers 8a, 8b, ...: Spring coils, 9: Main body mount, 10a, 10b, ...: Posts, 11: Post through holes.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】架台上に防振部材を介して配置されたベー
スプレートと、該ベースプート上に配置された電子銃,
電子光学系,試料室を内臓した電子顕微鏡カラムと、該
電子顕微鏡カラムを排気するため前記ベースプレート上
に配置された排気装置と、該排気装置をカバーで覆うよ
うにした装置において、該カバーを前記ベースプレート
に接触しない状態で前記架台に固定するように構成した
ことを特徴とする走査電子顕微鏡。
1. A base plate arranged on a pedestal via a vibration-proof member, and an electron gun arranged on the base plate.
In an electron microscope system including an electron optical system and a sample chamber, an exhaust device arranged on the base plate for exhausting the electron microscope column, and a device in which the exhaust device is covered with a cover, A scanning electron microscope, characterized in that the scanning electron microscope is configured to be fixed to the pedestal without contacting the base plate.
JP6742989U 1989-06-09 1989-06-09 Scanning electron microscope Expired - Lifetime JPH0624124Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6742989U JPH0624124Y2 (en) 1989-06-09 1989-06-09 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6742989U JPH0624124Y2 (en) 1989-06-09 1989-06-09 Scanning electron microscope

Publications (2)

Publication Number Publication Date
JPH037255U JPH037255U (en) 1991-01-24
JPH0624124Y2 true JPH0624124Y2 (en) 1994-06-22

Family

ID=31600994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6742989U Expired - Lifetime JPH0624124Y2 (en) 1989-06-09 1989-06-09 Scanning electron microscope

Country Status (1)

Country Link
JP (1) JPH0624124Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09129167A (en) * 1995-11-01 1997-05-16 Bridgestone Corp Charged particle beam device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2437478B2 (en) * 1974-08-03 1978-08-17 Union, Sils, Van De Loo & Co, 5758 Froendenberg Sports pedal for bicycles
JPH0359291U (en) * 1989-10-13 1991-06-11
US8809782B2 (en) * 2009-07-30 2014-08-19 Hitachi High-Technologies Corporation Scanning electron microscope

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09129167A (en) * 1995-11-01 1997-05-16 Bridgestone Corp Charged particle beam device

Also Published As

Publication number Publication date
JPH037255U (en) 1991-01-24

Similar Documents

Publication Publication Date Title
US5433422A (en) Active vibration control through sensing and controlling forces on an intermediate body
US5285995A (en) Optical table active leveling and vibration cancellation system
US4615504A (en) Anti-vibration device
JPH10259851A (en) Active vibration isolation device
JP3726207B2 (en) Active vibration isolator
JP2007510865A (en) Test platform for vibration sensitive equipment
JPH0624124Y2 (en) Scanning electron microscope
US6089525A (en) Six axis active vibration isolation and payload reaction force compensation system
JPH09329185A (en) Damping device
JPS5997341A (en) Device for restraining vibration of structural body
JPH03263810A (en) Vibration control method of semiconductor aligner
US5127614A (en) Microscope stand
JPH0973872A (en) Charged-particle beam device
JPH06176729A (en) Scanning type electron microscope and similar device
SU1091739A1 (en) Device for optical research
JPH06214179A (en) Noise insulating device for resonance scanner
JP2000170827A (en) Active type vibration resistant device
JP2001271870A (en) Active vibration damping device
JP3042763B2 (en) Anti-vibration device
JP2551462Y2 (en) Electric component vibration damping mechanism of loom
JPS6378441A (en) Vibration-proof supporting device for electron microscope or the like
JPH0992192A (en) Charge particulate beam device
JP2886053B2 (en) Active anti-vibration apparatus and control method thereof
JPH02190640A (en) Precise vibration-proofing device
JP2001076660A (en) Charged-particle beam apparatus