JPH06239930A - Production of aqueous solution of water-soluble photosensitive resin - Google Patents

Production of aqueous solution of water-soluble photosensitive resin

Info

Publication number
JPH06239930A
JPH06239930A JP2832493A JP2832493A JPH06239930A JP H06239930 A JPH06239930 A JP H06239930A JP 2832493 A JP2832493 A JP 2832493A JP 2832493 A JP2832493 A JP 2832493A JP H06239930 A JPH06239930 A JP H06239930A
Authority
JP
Japan
Prior art keywords
water
photosensitive resin
aqueous solution
soluble photosensitive
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2832493A
Other languages
Japanese (ja)
Inventor
Tatsushi Goto
達士 後藤
Asao Isobe
麻郎 磯部
Nobuaki Hayashi
伸明 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2832493A priority Critical patent/JPH06239930A/en
Publication of JPH06239930A publication Critical patent/JPH06239930A/en
Pending legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To produce an aqueous solution of a water soluble photosensitive resin having high sensitivity and excellent in releasability. CONSTITUTION:An aqueous solution of a water-soluble photosensitive resin is produced by reacting a copolymer of a polymerizable unsaturated group- containing water-soluble monomer and vinyl acetophenone with an azide group- containing aldehyde compound and acetaldehyde and then adding two kinds of alkali compounds of sodium hydroxide and ammonia to the reactional product.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、アセトアルデヒドを一
原料とする水溶性感光性樹脂の製造方法に関し、特にカ
ラーブラウン管のブラックマトリックスの形成に有用な
水溶性感光性樹脂水溶液の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a water-soluble photosensitive resin containing acetaldehyde as a raw material, and more particularly to a method for producing an aqueous solution of a water-soluble photosensitive resin useful for forming a black matrix of a color cathode ray tube.

【0002】[0002]

【従来の技術】従来、水溶性感光性樹脂はパターン形成
用材料として利用され、特にカラーブラウン管のブラッ
クマトリックス製造には、精細なマトリックスパターン
を形成するのに非常に有用な材料として用いられてい
る。この水溶性感光性樹脂の一例として、特開平1−3
02348号公報には重合性不飽和基含有水溶性モノマ
ー単位並びにアジド基及び水溶液中でイオン性を示す官
能基を有するモノマー単位を含む共重合体が記載されて
いる。その中で特性的に優れ、合成も比較的簡単なもの
に、マレイン酸単位並びにビニルアジドベンジリデンア
セトフェノンスルホン酸塩及びビニルアジドシンナミリ
デンアセトフェノンスルホン酸塩単位を含む水溶性感光
性樹脂がある。
2. Description of the Related Art Conventionally, a water-soluble photosensitive resin has been used as a material for forming a pattern, and is particularly useful as a material for forming a fine matrix pattern in the production of a black matrix of a color cathode ray tube. . As an example of this water-soluble photosensitive resin, JP-A 1-3
No. 02348 describes a copolymer containing a water-soluble monomer unit containing a polymerizable unsaturated group and a monomer unit having an azide group and a functional group exhibiting ionicity in an aqueous solution. Among them, water-soluble photosensitive resins containing a maleic acid unit and vinyl azidobenzylidene acetophenone sulfonate and vinyl azidocinnamylidene acetophenone sulfonate units are among the ones which are excellent in characteristics and relatively easy to synthesize.

【0003】[0003]

【発明が解決しようとする課題】上記の水溶性感光性樹
脂は高感度であるが、パターンを形成した後不要となっ
た樹脂を基板から剥離させる際に、剥離性が十分でなく
樹脂が完全に除去できずに基板に残るという問題点があ
った。本発明は、高感度を維持し剥離性を改善した水溶
性感光性樹脂水溶液の製造方法を提供するものである。
The above water-soluble photosensitive resin has high sensitivity, but when the resin that is no longer needed after the pattern is formed is peeled off from the substrate, the releasability is not sufficient and the resin is completely removed. There was a problem that it could not be removed and remained on the substrate. The present invention provides a method for producing an aqueous solution of a water-soluble photosensitive resin that maintains high sensitivity and improves releasability.

【0004】[0004]

【課題を解決するための手段】本発明は、重合性不飽和
基含有水溶性モノマーと4−ビニルアセトフェノンとの
共重合体、アジド基含有アルデヒド化合物及びアセトア
ルデヒドを反応させた後に、水酸化ナトリウムとアンモ
ニアの2種類のアルカリを加える水溶性感光性樹脂水溶
液の製造方法に関する。この水溶性感光性樹脂には、重
合性不飽和基含有水溶性モノマー単位及びアジド基及び
水溶液中でイオン性を示す官能基を有するモノマー単位
が含まれる。
The present invention is directed to the reaction of a copolymer of a polymerizable unsaturated group-containing water-soluble monomer with 4-vinylacetophenone, an azide group-containing aldehyde compound and acetaldehyde, followed by addition of sodium hydroxide. The present invention relates to a method for producing a water-soluble photosensitive resin aqueous solution in which two types of alkalis of ammonia are added. This water-soluble photosensitive resin contains a polymerizable unsaturated group-containing water-soluble monomer unit and an azide group and a monomer unit having a functional group exhibiting ionicity in an aqueous solution.

【0005】本発明における重合性不飽和基含有水溶性
モノマーと4−ビニルアセトフェノンとの共重合体は公
知の化合物で、例えば、重合性不飽和基含有水溶性モノ
マーとスチレンの共重合体をフリーデルークラフツ反応
によりアセチル化して得られる。重合性不飽和基含有水
溶性モノマーとしてはマレイン酸、アクリル酸、メタク
リル酸、スチレンスルホン酸、2−アクリルアミド−2
−メチル−1−プロパンスルホン酸等がある。また、ア
ジド基含有アルデヒド化合物は、芳香環にアジド基及び
水溶液中でイオン性を示す官能基の付いたアルデヒド化
合物を用いることができる。この例としては、4−アジ
ドベンズアルデヒド−2−スルホン酸ナトリウム、4−
アジドベンズアルデヒド−2−スルホン酸カリウム、4
−アジドベンズアルデヒド−2−カルボン酸ナトリウム
等があげられる。上記の共重合体のアセチル基1当量に
対して、アジド基含有アルデヒド化合物を0.5〜2当
量、アセトアルデヒドを0.2〜1当量の割合で反応さ
せることが好ましく、溶媒は生成物が水溶性であるので
水を用いることが好ましく、反応温度は原料のアジドの
安定性を考慮すると30℃〜50℃の範囲が好ましい。
アセトアルデヒドは原液のまま用いるか、あるいは1〜
20重量%の水溶液として用いることができる。
The copolymer of the polymerizable unsaturated group-containing water-soluble monomer and 4-vinylacetophenone in the present invention is a known compound, for example, the copolymer of the polymerizable unsaturated group-containing water-soluble monomer and styrene is free. It is obtained by acetylation by the Delucrafts reaction. As the water-soluble monomer containing a polymerizable unsaturated group, maleic acid, acrylic acid, methacrylic acid, styrenesulfonic acid, 2-acrylamido-2
-Methyl-1-propanesulfonic acid and the like. As the azido group-containing aldehyde compound, an aldehyde compound having an azide group on the aromatic ring and a functional group showing ionicity in an aqueous solution can be used. Examples of this include sodium 4-azidobenzaldehyde-2-sulfonate, 4-
Azidobenzaldehyde-2-sulfonate potassium, 4
-Sodium azidobenzaldehyde-2-carboxylate and the like can be mentioned. It is preferable to react the azido group-containing aldehyde compound in a proportion of 0.5 to 2 equivalents and acetaldehyde in a proportion of 0.2 to 1 equivalent to 1 equivalent of the acetyl group of the above copolymer, and the product is water-soluble. It is preferable to use water because it has good properties, and the reaction temperature is preferably in the range of 30 ° C to 50 ° C in consideration of the stability of azide as a raw material.
Use acetaldehyde as undiluted solution, or
It can be used as a 20% by weight aqueous solution.

【0006】本発明において上記の共重合体の溶解時に
用いるアルカリは水酸化ナトリウムとアンモニアの2種
類のアルカリを併用する。両者の比率は任意に選ぶこと
ができるが、特性上の点から、水酸化ナトリウム100
重量部に対しアンモニアを50〜400重量部の範囲に
することが好ましい。
In the present invention, two kinds of alkalis, sodium hydroxide and ammonia, are used in combination as the alkali used for dissolving the above copolymer. The ratio of the two can be selected arbitrarily, but from the viewpoint of characteristics, sodium hydroxide 100
Ammonia is preferably in the range of 50 to 400 parts by weight with respect to parts by weight.

【0007】[0007]

【実施例】次に実施例により本発明を説明する。なお、
実施例および比較例中、部とあるのは重量部、%とある
のは重量%である。 比較例 SMA−3000〔ATOCHEM社製、スチレン−無
水マレイン酸共重合体(75%スチレン、分子量約20
00)〕33gをクロロホルム250mlに溶解した。
この溶液を、塩化アセチル50g及び無水塩化アルミニ
ウム83gをクロロホルム300mlに溶解した溶液に
室温で撹拌しながら滴下した。その後加熱して2時間撹
拌しながら還流させた。これを放冷した後、濾別して不
溶化物を乾燥し粉末化した。この粉末を多量の水で水洗
して乾燥し、マレイン酸−4−ビニルアセトフェノン共
重合体を得た。この共重合体20g、水酸化ナトリウム
10g、4−アジドベンズアルデヒド−2−スルホン酸
ナトリウム20g、アセトアルデヒド3gを水1リット
ルに40℃で順に溶解させ、そのまま40℃で3時間撹
拌した。溶液に食塩240gを加え、吸引濾過した。濾
物を1.5%酸水溶液1リットル中に入れて撹拌し、吸
引濾過した。濾物を水1リットル中に入れて40℃で撹
拌し、水酸化ナトリウム3gを加え1時間撹拌して溶解
させた。溶液にエチルアルコール5リットルを加えて沈
殿物を析出させ、濾別し乾燥してマレイン酸、4−ビニ
ルモノアジドベンジリデンアセトフェノンスルホン酸ナ
トリウム及び4−ビニルモノアジドシンナミリデンアセ
トフェノンスルホン酸ナトリウムの共重合体(A)を得
た。
The present invention will be described below with reference to examples. In addition,
In Examples and Comparative Examples, “part” means “part by weight” and “%” means “% by weight”. Comparative Example SMA-3000 [manufactured by ATOCHEM, styrene-maleic anhydride copolymer (75% styrene, molecular weight about 20
00)] 33 g was dissolved in 250 ml of chloroform.
This solution was added dropwise to a solution prepared by dissolving 50 g of acetyl chloride and 83 g of anhydrous aluminum chloride in 300 ml of chloroform while stirring at room temperature. Then, the mixture was heated and refluxed with stirring for 2 hours. After allowing this to cool, it was filtered and the insoluble material was dried and pulverized. This powder was washed with a large amount of water and dried to obtain a maleic acid-4-vinylacetophenone copolymer. 20 g of this copolymer, 10 g of sodium hydroxide, 20 g of sodium 4-azidobenzaldehyde-2-sulfonate and 3 g of acetaldehyde were sequentially dissolved in 1 liter of water at 40 ° C., and the mixture was stirred at 40 ° C. for 3 hours as it was. 240 g of sodium chloride was added to the solution, and suction filtration was performed. The residue was put into 1 liter of a 1.5% aqueous acid solution, stirred, and suction filtered. The filter cake was put in 1 liter of water and stirred at 40 ° C., 3 g of sodium hydroxide was added, and the mixture was stirred for 1 hour to be dissolved. To the solution was added 5 liters of ethyl alcohol to form a precipitate, which was filtered off and dried to give a co-weight of maleic acid, sodium 4-vinylmonoazidobenzylideneacetophenonesulfonate and sodium 4-vinylmonoazidocinnamylideneacetophenonesulfonate. A coalescence (A) was obtained.

【0008】実施例1 比較例1の水酸化ナトリウム3gを水酸化ナトリウム
2.5g及び25%アンモニア水2.5gにした以外は
比較例と同様にして、マレイン酸、4−ビニルモノアジ
ドベンジリデンアセトフェノンスルホン酸ナトリウム及
び4−ビニルモノアジドシンナミリデンアセトフェノン
スルホン酸ナトリウムの共重合体(B)を得た。
Example 1 Maleic acid and 4-vinylmonoazidobenzylideneacetophenone were prepared in the same manner as in Comparative Example 1 except that 3 g of sodium hydroxide in Comparative Example 1 was changed to 2.5 g of sodium hydroxide and 2.5 g of 25% aqueous ammonia. A copolymer (B) of sodium sulfonate and sodium 4-vinylmonoazidocinnamylideneacetophenonesulfonate was obtained.

【0009】実施例2 比較例の水酸化ナトリウム3gを水酸化ナトリウム1.
5g及び25%アンモニア水5gにした以外は比較例と
同様にして、マレイン酸、4−ビニルモノアジドベンジ
リデンアセトフェノンスルホン酸ナトリウム及び4−ビ
ニルモノアジドシンナミリデンアセトフェノンスルホン
酸ナトリウムの共重合体(C)を得た。
Example 2 3 g of the sodium hydroxide of the comparative example was mixed with 1.
A copolymer of maleic acid, sodium 4-vinylmonoazidobenzylideneacetophenonesulfonate, and sodium 4-vinylmonoazidocinnamylideneacetophenonesulfonate (C) in the same manner as in Comparative Example except that 5 g and 5 g of 25% ammonia water were used. ) Got.

【0010】実施例及び比較例の共重合体の特性を表1
に示す。
The properties of the copolymers of Examples and Comparative Examples are shown in Table 1.
Shown in.

【表1】 [Table 1]

【0011】* 感度は次の方法で評価した。 共重合体0.3部、PAD(アクリルアミドージアセト
ンアクリルアミド共重合体)1.7部、水98部を混合
撹拌し、ガラス板に0.5〜1μmの厚さにスピンコー
トし、60℃で1分間乾燥して塗膜とし、、塗膜上から
紫外光を20秒間照射し、温水噴射現像して160μm
のホール径のパターンを得るのに最低どれだけの照度が
必要かを調べてその逆数を感度とした。(なお、値は比
較例の感度(0.7W/cm2)を1とする相対感度で
表わした。) ** 剥離性は、同じ材料を用いて160μmのホール
径のパターンを形成後、5%過酸化水素水95部及びス
ルファミン酸5部よりなる剥離液を用いて60℃で2分
間処理した後、温水現像して剥離性をみた。剥離性は、
次のレベルで表わした。 ○:良品レベル △:良品限度 表1に示されるように、実施例によって高感度を維持し
剥離性を改善した水溶性感光性樹脂を製造することがで
きる。
* The sensitivity was evaluated by the following method. 0.3 parts of copolymer, 1.7 parts of PAD (acrylamide-diacetone acrylamide copolymer), and 98 parts of water were mixed and stirred, and spin-coated on a glass plate to a thickness of 0.5 to 1 μm, and 60 ° C. It is dried for 1 minute at 50 ° C to form a coating film, which is then irradiated with ultraviolet light for 20 seconds and then sprayed with hot water for development to 160 μm.
The minimum illuminance required to obtain the hole diameter pattern was investigated and the reciprocal was taken as the sensitivity. (Note that the values are expressed as relative sensitivities where the sensitivity of the comparative example (0.7 W / cm 2 ) is set to 1.) Peelability was 5 after forming a pattern with a hole diameter of 160 μm using the same material. After treatment with a stripping solution consisting of 95% by weight hydrogen peroxide solution and 5 parts of sulfamic acid at 60 ° C. for 2 minutes, the stripping property was observed by developing with warm water. Peelability is
Expressed at the next level. ◯: Good product level Δ: Good product limit As shown in Table 1, it is possible to produce a water-soluble photosensitive resin having high sensitivity and improved releasability according to Examples.

【0012】[0012]

【発明の効果】本発明になる水溶性感光性樹脂の製造方
法によって、高感度を維持し、剥離性に優れる水溶性感
光性樹脂水溶液を製造することができる。本発明の樹脂
水溶液を例えば大型カラーブラウン管のブラックマトリ
ックスの製造に用いることにより、露光時間の短縮及び
品質の向上が可能となり生産性が向上される。
By the method for producing a water-soluble photosensitive resin according to the present invention, it is possible to produce an aqueous solution of a water-soluble photosensitive resin which maintains high sensitivity and is excellent in releasability. By using the aqueous resin solution of the present invention for producing, for example, a black matrix for a large color cathode ray tube, exposure time can be shortened and quality can be improved to improve productivity.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 林 伸明 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Nobuaki Hayashi Inventor Nobuaki Hayashi 1-280, Higashi Koigokubo, Kokubunji, Tokyo Inside the Central Research Laboratory, Hitachi, Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 重合性不飽和基含有水溶性モノマーと4
−ビニルアセトフェノンとの共重合体、アジド基含有ア
ルデヒド化合物及びアセトアルデヒドを反応させた後
に、水酸化ナトリウムとアンモニアの2種類のアルカリ
を加えることを特徴とする水溶性感光性樹脂水溶液の製
造方法。
1. A polymerizable unsaturated group-containing water-soluble monomer and 4
-A method for producing a water-soluble photosensitive resin aqueous solution, which comprises reacting a copolymer with vinylacetophenone, an azide group-containing aldehyde compound and acetaldehyde, and then adding two kinds of alkalis, sodium hydroxide and ammonia.
JP2832493A 1993-02-18 1993-02-18 Production of aqueous solution of water-soluble photosensitive resin Pending JPH06239930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2832493A JPH06239930A (en) 1993-02-18 1993-02-18 Production of aqueous solution of water-soluble photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2832493A JPH06239930A (en) 1993-02-18 1993-02-18 Production of aqueous solution of water-soluble photosensitive resin

Publications (1)

Publication Number Publication Date
JPH06239930A true JPH06239930A (en) 1994-08-30

Family

ID=12245439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2832493A Pending JPH06239930A (en) 1993-02-18 1993-02-18 Production of aqueous solution of water-soluble photosensitive resin

Country Status (1)

Country Link
JP (1) JPH06239930A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
US6861456B2 (en) 2002-03-29 2005-03-01 Toyo Gosei Kogyo Co., Ltd. Photosensitive compound, photosensitive resin, and photosensitive composition
WO2020255529A1 (en) 2019-06-17 2020-12-24 東洋合成工業株式会社 Cell culture substrate, method for producing said cell culture substrate, and screening method using said cell culture substrate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
US6861456B2 (en) 2002-03-29 2005-03-01 Toyo Gosei Kogyo Co., Ltd. Photosensitive compound, photosensitive resin, and photosensitive composition
WO2020255529A1 (en) 2019-06-17 2020-12-24 東洋合成工業株式会社 Cell culture substrate, method for producing said cell culture substrate, and screening method using said cell culture substrate

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