JPH06237063A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH06237063A
JPH06237063A JP2453293A JP2453293A JPH06237063A JP H06237063 A JPH06237063 A JP H06237063A JP 2453293 A JP2453293 A JP 2453293A JP 2453293 A JP2453293 A JP 2453293A JP H06237063 A JPH06237063 A JP H06237063A
Authority
JP
Japan
Prior art keywords
ink
pattern
wiring board
printed wiring
copper foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2453293A
Other languages
Japanese (ja)
Inventor
Kenji Kushi
憲治 串
Takayuki Izeki
隆幸 井関
Hiroyuki Uchida
廣幸 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP2453293A priority Critical patent/JPH06237063A/en
Publication of JPH06237063A publication Critical patent/JPH06237063A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To solve the problem of disposal of a waste developper and to reduce considerably the time for fabricating a printed wiring board by spraying an ink onto a substrate by an ink-jet method to form an ink pattern which becomes a desired resist. CONSTITUTION:Ink 5 is sprayed onto a copper foil 3 of a copper-plated laminar plate 1 by using an ink-jet method, thereby forming an ink pattern 6. Subsequently, the copper foil 3 not covered with the ink pattern 6 is removed by etching, after which the ink pattern 6 is peeled from the copper foil 3 of the part where it is covered with the ink pattern 6 and a wiring pattern 7 is formed. Accordingly, a photomask is not necessary and there is no developping process using an alkali water solution or an organic solvent. As a result, there is no problem of disposal of a waste developper and the time for fabricating a printed wiring board can be reduced considerably.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、廃液処理の負担を低減
し、かつプリント配線板の作製所要時間を大幅に短縮す
ることが可能なプリント配線板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, which can reduce the burden of waste liquid treatment and can significantly reduce the time required for manufacturing the printed wiring board.

【0002】[0002]

【従来の技術】従来、プリント配線板を製造する方法の
具体例としては、フォトリソグラフィ法が用いられてい
る。このフォトリソグラフィ法は、例えば、絶縁層と銅
箔とからなる銅張積層板の上にドライフィルムレジスト
などからなるフォトレジスト層を形成する。ついで、こ
のフォトレジスト層の表面にフォトマスクを介して紫外
線を照射し、ドライフィルムレジストを光硬化させる。
こののち、有機溶剤、アルカリ水溶液などの現像液を用
い、未硬化部分のドライフィルムレジストを溶解除去し
てレジストパターンを形成する。ついで、レジストパタ
ーンに覆われていない部分の銅箔をエッチングにより除
去した後、レジストパターンを除去して配線パターンを
形成するとプリント配線板が得られる。
2. Description of the Related Art Conventionally, a photolithography method has been used as a specific example of a method for manufacturing a printed wiring board. In this photolithography method, for example, a photoresist layer made of a dry film resist or the like is formed on a copper clad laminate made of an insulating layer and a copper foil. Then, the surface of the photoresist layer is irradiated with ultraviolet rays through a photomask to photo-cure the dry film resist.
After that, the dry film resist in the uncured portion is dissolved and removed using a developing solution such as an organic solvent or an alkaline aqueous solution to form a resist pattern. Then, after removing the copper foil in the portion not covered with the resist pattern by etching, the resist pattern is removed to form a wiring pattern, whereby a printed wiring board is obtained.

【0003】しかしながら、このようなプリント配線板
の製造方法は、フォトマスクの作製に非常に長時間要す
るため、プリント配線板の作製所要時間が長くなってし
まうという欠点があった。また、有機溶剤、アルカリ水
溶液などを用いて現像を行うため、プリント配線板の作
製所要時間が長くなるとともに廃液処理の問題があっ
た。
However, such a method for manufacturing a printed wiring board has a drawback that the time required for manufacturing the printed wiring board becomes long because it takes a very long time to manufacture the photomask. Further, since the development is performed using an organic solvent, an alkaline aqueous solution, etc., the time required for producing the printed wiring board is long and there is a problem of waste liquid treatment.

【0004】[0004]

【発明が解決しようとする課題】本発明における課題
は、現像廃液処理の問題がなく、プリント配線板の作製
所要時間を大幅に短縮することが可能なプリント配線板
の製造方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a printed wiring board which does not have a problem of developing waste liquid treatment and can significantly reduce the time required for manufacturing the printed wiring board. is there.

【0005】[0005]

【課題を解決するための手段】かかる課題は、インク
を、インクジェット方式を用いて基板上に吹き付け、所
望のレジストとなるインクパターンを形成する方法で解
決される。
This problem is solved by a method in which ink is sprayed onto a substrate by using an ink jet system to form an ink pattern which becomes a desired resist.

【0006】以下、本発明のプリント配線板の製造方法
の一例を図面に基づき詳しく説明する。この例の製造方
法では、まず、図1(A)に示すような、銅張積層板1
とインク5を用意する。この銅張積層板1は、ガラス/
エポキシ樹脂積層板、紙/フェノール樹脂積層板、ポリ
イミドフィルム、ポリエステルフィルムなどの絶縁層2
の表面に銅箔3が積層されたものである。銅箔3の厚さ
は、配線板の用途に応じて選択される。
An example of the method for manufacturing a printed wiring board according to the present invention will be described in detail below with reference to the drawings. In the manufacturing method of this example, first, as shown in FIG.
And ink 5 are prepared. This copper clad laminate 1 is made of glass /
Insulation layer 2 such as epoxy resin laminate, paper / phenol resin laminate, polyimide film, polyester film, etc.
The copper foil 3 is laminated on the surface of the. The thickness of the copper foil 3 is selected according to the application of the wiring board.

【0007】インク5は、インクジェットノズル4から
吐出され、かつ耐エッチング性を有するものであれば特
に限定されず、例えば有機溶剤、水などからなる液媒体
にワックスや熱可塑性樹脂を溶解あるいは分散させたも
のなどが用いられ、必要に応じて粘度調製剤、表面張力
調製剤、湿潤剤、pH調製剤、架橋剤、密着性向上剤、
各種安定剤、着色剤等が添加される。なお、インク5
は、インクジェットノズル4から吐出される時点で液状
であればよく、従って液媒体を含まず、常温では固体で
あって、加熱により液状となる組成物でもよい。
The ink 5 is not particularly limited as long as it is ejected from the ink jet nozzle 4 and has etching resistance. For example, a wax or a thermoplastic resin is dissolved or dispersed in a liquid medium composed of an organic solvent, water or the like. Etc. are used, and if necessary, a viscosity adjusting agent, a surface tension adjusting agent, a wetting agent, a pH adjusting agent, a crosslinking agent, an adhesion improving agent,
Various stabilizers, colorants and the like are added. Ink 5
May be a composition that is liquid at the time of being ejected from the inkjet nozzle 4, and therefore may be a composition that does not include a liquid medium, is solid at room temperature, and becomes liquid by heating.

【0008】上記したような物質のうち、特にカルボキ
シル基を有する熱可塑性重合体と光架橋性単量体を含む
インクは、短時間の活性エネルギー線照射により耐エッ
チング性の強い硬化膜を容易に形成することができ、か
つアルカリ溶液で容易に硬化膜を剥離することができる
ので好ましい。
Among the above-mentioned substances, the ink containing a thermoplastic polymer having a carboxyl group and a photocrosslinkable monomer can easily form a cured film having strong etching resistance by irradiation with active energy rays for a short time. It is preferable because it can be formed and the cured film can be easily peeled off with an alkaline solution.

【0009】上記カルボキシル基を有する熱可塑性重合
体の具体例としては、例えば、(メタ)アクリル酸メチ
ル(アクリル酸メチルまたはメタクリル酸メチルの意,
以下同様)、(メタ)アクリル酸エチル、(メタ)アク
リル酸n−プロピル、(メタ))アクリル酸イソプロピ
ル、(メタ)アクリル酸n−ブチル、(メタ)アクリル
酸イソブチル、(メタ)アクリル酸t−ブチル、(メ
タ)アクリル酸2−エチルヘキシル、(メタ)アクリル
酸ラウリル、(メタ)アクリル酸2−ヒドロキシエチ
ル、(メタ)アクリル酸2−ヒドロキシプロピル等の
(メタ)アクリル酸エステル、スチレンなどとアクリル
酸、メタクリル酸、イタコン酸、フマル酸、マイレン酸
等のカルボキシル基含有単量体との共重合体などがあ
る。
Specific examples of the thermoplastic polymer having a carboxyl group include, for example, methyl (meth) acrylate (which means methyl acrylate or methyl methacrylate,
The same applies hereinafter), ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t (meth) acrylate. -(Meth) acrylic acid ester such as butyl, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, styrene, etc. Examples thereof include copolymers with a carboxyl group-containing monomer such as acrylic acid, methacrylic acid, itaconic acid, fumaric acid, and maleic acid.

【0010】上記の光架橋性単量体の具体例としては、
分子中に少なくとも1個のエチレン性不飽和基を有する
架橋性単量体等があり、例えばポリエチレングリコール
ジアクリレート、ペンタエリスリトールジアクリレー
ト、ペンタエリスリトールトリアクリレート、ペンタエ
リスリトールテトラアクリレート、トリメチロールプロ
パントリアクリレート等のポリエステルアクリレートや
エポキシアクリレート、ウレタンアクリレート等があげ
られる。
Specific examples of the above photocrosslinkable monomer include
There are crosslinkable monomers having at least one ethylenically unsaturated group in the molecule, such as polyethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane triacrylate, etc. Polyester acrylate, epoxy acrylate, urethane acrylate, etc.

【0011】また、上記の光架橋性単量体を含むインク
を紫外線や可視光線で硬化させたい場合には、インクに
光重合開始剤を添加することが好ましい。このような光
重合開始剤としては公知の例えば、ベンゾフェノン、ミ
ヒラーズケトン、4,4’−ビス(ジエチルアミノ)ベ
ンゾフェノン、t−ブチルアントラキノン、2−エチル
アントラキノン、チオキサントン類、ベンゾインアルキ
ルエーテル類、ベンジルケタール類等があげられ、これ
らは1種または2種以上を併用できる。
When it is desired to cure the ink containing the above photocrosslinkable monomer with ultraviolet rays or visible rays, it is preferable to add a photopolymerization initiator to the ink. Known examples of such a photopolymerization initiator include benzophenone, Michler's ketone, 4,4′-bis (diethylamino) benzophenone, t-butylanthraquinone, 2-ethylanthraquinone, thioxanthones, benzoin alkyl ethers, and benzyl ketals. These may be used alone or in combination of two or more.

【0012】ついで、インクジェットノズル4からイン
ク5を上記銅張積層板1の銅箔3上に吹き付け、図1
(B)に示すように、配線パターンを形成する部分を覆
うようにインクパターン6を形成する。インクパターン
6は、必要に応じて紫外線、電子線等の活性エネルギー
線や熱などにより硬化させてもよい。
Then, the ink 5 is sprayed from the ink jet nozzle 4 onto the copper foil 3 of the copper-clad laminate 1 as shown in FIG.
As shown in (B), the ink pattern 6 is formed so as to cover the portion where the wiring pattern is formed. If necessary, the ink pattern 6 may be cured by ultraviolet rays, active energy rays such as electron rays, heat, or the like.

【0013】ついで、インクパターン6が形成された銅
張積層板1を図1(C)に示すように、上記インクパタ
ーン6に覆われていない部分の銅箔3をエッチングによ
り除去する。エッチング液は、塩化銅系、塩化鉄系、ア
ンモニア系のものなどが用いられる。
Next, as shown in FIG. 1C, the copper clad laminate 1 on which the ink pattern 6 is formed is removed by etching the copper foil 3 in a portion not covered with the ink pattern 6. As the etching liquid, a copper chloride-based, iron chloride-based, ammonia-based, or the like is used.

【0014】最後に、上記インクパターン6を上記銅箔
3から剥離し、図1(D)に示すような配線パターン7
を形成すると、目的とするプリント配線板が得られる。
剥離液には、用いたインク5に応じて、例えば水酸化ナ
トリウムや水酸化カリウム等のアルカリ水溶液や塩化メ
チレン、メチルエチルケトン(MEK)等の有機溶剤が
用いられる。
Finally, the ink pattern 6 is peeled from the copper foil 3, and the wiring pattern 7 as shown in FIG.
By forming, the intended printed wiring board is obtained.
Depending on the ink 5 used, an alkaline aqueous solution such as sodium hydroxide or potassium hydroxide or an organic solvent such as methylene chloride or methyl ethyl ketone (MEK) is used as the stripping solution.

【0015】この例のプリント配線板の製造方法は、イ
ンク5を、インクジェット方式を用いて銅張積層板1の
銅箔3上に吹き付けインクパターン6を形成し、つい
で、このインクパターン6に覆われていない部分の銅箔
3をエッチングにより除去した後、上記インクパターン
6をこのインクパターン6で覆われている部分の銅箔3
から剥離し配線パターン7を形成するので、フォトマス
クが不要であるとともにアルカリ水溶液や有機溶剤など
を用いる現像工程もないので、現像廃液処理の問題がな
く、プリント配線板の作製所要時間を大幅に短縮するこ
とが可能であるという利点がある。また、この例におい
ては絶縁層2の片面に銅箔3が積層されている例につい
て説明したが、絶縁層2の両面に銅箔が積層されている
場合にも同様になし得る。
In the method for manufacturing a printed wiring board of this example, the ink 5 is sprayed onto the copper foil 3 of the copper clad laminate 1 by an ink jet method to form an ink pattern 6, and then the ink pattern 6 is covered. After removing the copper foil 3 in the unexposed portion by etching, the ink pattern 6 is covered with the ink pattern 6.
Since the wiring pattern 7 is peeled off from the substrate, there is no need for a photomask and there is no development process using an alkaline aqueous solution or an organic solvent. There is an advantage that it can be shortened. Further, in this example, the example in which the copper foil 3 is laminated on one surface of the insulating layer 2 has been described, but the same can be done when the copper foil 3 is laminated on both surfaces of the insulating layer 2.

【0016】また、この例においては、銅張積層板を素
材として使用し、これの銅箔上に配線パターンを形成す
る部分を覆うようにインクパターンを形成してプリント
配線板を製造する場合に本発明を採用した例について説
明したが、銅箔の張りつけていない積層板を素材として
使用し、配線パターンを形成する部分以外にインクパタ
ーンを形成してプリント配線板を製造する、いわゆるア
ディティブ法においても同様になし得る。
Further, in this example, when a copper clad laminate is used as a material and an ink pattern is formed on the copper foil so as to cover a portion where a wiring pattern is formed, a printed wiring board is manufactured. Although the example of adopting the present invention has been described, a laminated board to which a copper foil is not adhered is used as a material, and a printed wiring board is manufactured by forming an ink pattern other than a portion where a wiring pattern is formed, in a so-called additive method Can be done in the same way.

【0017】[0017]

【実施例】次に本発明のプリント配線板の製造方法の実
施例を図1を用いて説明する。 (実施例)厚さ25μmのポリイミドフィルムの片面に
厚さ18μmの銅箔3が積層されたフレキシブル銅張積
層板1を用意した。ついで、インク5を銅張積層板1の
銅箔3上にインクジェットノズル4から吹き付け、配線
パターンを形成する部分を覆うようにインクパターン6
を形成した。ここで使用したインク5は、下記組成物を
メチルエチルケトン/イソプロパノール混合溶剤に溶解
したものを使用した。ついで、この銅張積層板1に紫外
線を照射して、インクパターン6を光硬化させた後、こ
のインクパターン6に覆われていない部分の銅箔3を塩
化銅系エッチング液を用いて除去した。最後に、上記イ
ンクパターン6を銅箔3から剥離液(3%NaOH水溶
液)を用いて剥離し配線パターン7を形成すると、プリ
ント配線板が得られた。この実施例においては、プリン
ト配線板の作製所要時間は20分であった。
EXAMPLE An example of a method for manufacturing a printed wiring board according to the present invention will be described with reference to FIG. (Example) A flexible copper clad laminate 1 in which a copper foil 3 having a thickness of 18 μm was laminated on one surface of a polyimide film having a thickness of 25 μm was prepared. Next, the ink 5 is sprayed onto the copper foil 3 of the copper-clad laminate 1 from the inkjet nozzle 4, and the ink pattern 6 is formed so as to cover the portion where the wiring pattern is formed.
Was formed. Ink 5 used here was prepared by dissolving the following composition in a mixed solvent of methyl ethyl ketone / isopropanol. Then, the copper clad laminate 1 was irradiated with ultraviolet rays to photo-cure the ink pattern 6, and then the copper foil 3 in a portion not covered with the ink pattern 6 was removed using a copper chloride-based etching solution. . Finally, the above-mentioned ink pattern 6 was peeled off from the copper foil 3 using a peeling solution (3% NaOH aqueous solution) to form a wiring pattern 7, whereby a printed wiring board was obtained. In this example, the time required for producing the printed wiring board was 20 minutes.

【0018】 インクの組成 アクリル樹脂(メチルメタクリレート/メチルアクリレート/メタクリル酸= 60/20/20の共重合体) 10重量部 トリメチロールプロパントリアクリレート 4重量部 ポリプロピレングリコールジアクリレート 3重量部 ベンジルジメチルケタール 1重量部 Composition of ink Acrylic resin (copolymer of methyl methacrylate / methyl acrylate / methacrylic acid = 60/20/20) 10 parts by weight trimethylolpropane triacrylate 4 parts by weight polypropylene glycol diacrylate 3 parts by weight benzyl dimethyl ketal 1 Parts by weight

【0019】(比較例)上記実施例で用いたものと同様
の銅張積層板の上に、感光性レジスト層の厚さが25μ
mのドライフィルムレジストを、ドライフィルム用ラミ
ネータを用いてラミネートした。ここで用いたドライフ
ィルムレジストの感光性レジスト層の組成は下記に示す
通りである。ついで、ドライフィルムレジストが積層さ
れた銅張積層板を30分放置して室温に戻した後、この
ドライフィルムレジストの表面をフォトマスクを介して
露光を行い、ドライフィルムレジストを光硬化させた。
こののち、現像液(1%Na2CO3水溶液)を用い、未
硬化部分のドライフィルムレジストを溶解除去して配線
パターンを形成する部分を覆うようにレジストパターン
を形成した。現像後に、この銅張積層板を十分水洗いし
た。ついで、レジストパターンに覆われていない部分の
銅箔を塩化銅系エッチング液により除去した。最後に、
剥離液(3%NaOH水溶液)を用いてレジストパター
ンを除去し配線パターンを形成すると、プリント配線板
が得られた。この比較例においては、プリント配線板の
作製所要時間は1時間であった。また、これ以外にフォ
トマスクを外注して作製するのに1週間を要した。
(Comparative Example) A copper-clad laminate similar to that used in the above example was coated with a photosensitive resist layer having a thickness of 25 μm.
m dry film resist was laminated using a laminator for dry film. The composition of the photosensitive resist layer of the dry film resist used here is as shown below. Then, the copper clad laminate having the dry film resist laminated thereon was left for 30 minutes to return to room temperature, and then the surface of the dry film resist was exposed through a photomask to photo-cur the dry film resist.
After that, a developing solution (1% Na 2 CO 3 aqueous solution) was used to dissolve and remove the uncured dry film resist to form a resist pattern so as to cover the portion where the wiring pattern is formed. After development, the copper clad laminate was thoroughly washed with water. Then, the copper foil in the portion not covered with the resist pattern was removed with a copper chloride-based etching solution. Finally,
The resist pattern was removed using a stripping solution (3% NaOH aqueous solution) to form a wiring pattern, whereby a printed wiring board was obtained. In this comparative example, the time required for producing the printed wiring board was 1 hour. In addition to this, it took one week to outsource and manufacture the photomask.

【0020】 感光性レジスト層の組成 アクリル樹脂(メチルメタクリレート/メチルアクリレート/メタクリル酸= 60/20/20の共重合体) 10重量部 トリメチロールプロパントリアクリレート 4重量部 ポリプロピレングリコールジアクリレート 3重量部 ベンジルジメチルケタール 1重量部 Composition of photosensitive resist layer Acrylic resin (copolymer of methyl methacrylate / methyl acrylate / methacrylic acid = 60/20/20) 10 parts by weight trimethylol propane triacrylate 4 parts by weight polypropylene glycol diacrylate 3 parts by weight benzyl Dimethyl ketal 1 part by weight

【0021】[0021]

【発明の効果】以上説明したように、本発明のプリント
配線板の製造方法は、インクを、インクジェット方式を
用いて基板上に吹き付け、所望のレジストとなるインク
パターンを形成するので、フォトマスクが不要であると
ともにアルカリ水溶液や有機溶剤などを用いる現像工程
もないので、現像廃液処理の問題がなく、プリント配線
板の作製所要時間を大幅に短縮することが可能であると
いう利点がある。
As described above, according to the method for manufacturing a printed wiring board of the present invention, the ink is sprayed onto the substrate by using the ink jet method to form the ink pattern which becomes the desired resist. Since it is not necessary and there is no development process using an alkaline aqueous solution or an organic solvent, there is no problem of waste treatment of developing solution, and there is an advantage that the time required for producing a printed wiring board can be greatly shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明のプリント配線板の製造方法の一例の
各工程を示す縦断面図である。
FIG. 1 is a vertical cross-sectional view showing each step of an example of a method for manufacturing a printed wiring board according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・銅張積層板、2・・・絶縁層、3・・・銅箔、4・・・イン
クジェットノズル、5・・・インク、6・・・インクパター
ン、7・・・配線パターン
1 ... Copper clad laminate, 2 ... Insulating layer, 3 ... Copper foil, 4 ... Ink jet nozzle, 5 ... Ink, 6 ... Ink pattern, 7 ... Wiring pattern

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 インクを、インクジェット方式を用いて
基板上に吹き付け、所望のレジストとなるインクパター
ンを形成することを特徴とするプリント配線板の製造方
法。
1. A method for manufacturing a printed wiring board, which comprises spraying an ink onto a substrate by using an inkjet method to form an ink pattern as a desired resist.
JP2453293A 1993-02-12 1993-02-12 Manufacture of printed wiring board Withdrawn JPH06237063A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2453293A JPH06237063A (en) 1993-02-12 1993-02-12 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2453293A JPH06237063A (en) 1993-02-12 1993-02-12 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPH06237063A true JPH06237063A (en) 1994-08-23

Family

ID=12140770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2453293A Withdrawn JPH06237063A (en) 1993-02-12 1993-02-12 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPH06237063A (en)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005027601A1 (en) * 2003-09-11 2005-03-24 Taiyo Ink Mfg. Co., Ltd. Insulating pattern and method of forming the same
JP2005539391A (en) * 2002-09-20 2005-12-22 アベシア・リミテッド Method and ink for manufacturing an electronic device
JP2006344961A (en) * 2005-06-06 2006-12-21 Fujifilm Electronic Imaging Ltd Method of forming conductive pattern on substrate
KR100678419B1 (en) * 2005-04-01 2007-02-02 삼성전기주식회사 Method for surface treatment of board, method for forming wiring and wiring substrate
US7183146B2 (en) 2003-01-17 2007-02-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US7192859B2 (en) 2003-05-16 2007-03-20 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device and display device
JP2007507610A (en) * 2003-05-30 2007-03-29 フジフィルム・イメイジング・カラランツ・リミテッド Method
KR100704917B1 (en) * 2005-11-08 2007-04-09 삼성전기주식회사 Printed circuit board and the manufacturing method thereof
KR100771468B1 (en) * 2006-09-27 2007-10-30 삼성전기주식회사 Method for forming fine wiring
US7354808B2 (en) 2003-08-15 2008-04-08 Semiconductor Energy Laboratory Co., Ltd. Resist composition and method for manufacturing semiconductor device using the same
US7405033B2 (en) 2003-01-17 2008-07-29 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing resist pattern and method for manufacturing semiconductor device
US7446054B2 (en) 2003-10-28 2008-11-04 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US7462653B2 (en) 2003-05-09 2008-12-09 Taiyo Ink Manufacturing Co., Ltd. Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof
CN100461986C (en) * 2002-04-15 2009-02-11 独立行政法人产业技术综合研究所 Fast production method for printed board
US7494923B2 (en) 2004-06-14 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of wiring substrate and semiconductor device
US7554117B2 (en) 2003-03-26 2009-06-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP2015525116A (en) * 2012-05-23 2015-09-03 オセ−テクノロジーズ ビーブイ Functional pattern printing method and printing apparatus
US9453137B2 (en) 2012-03-30 2016-09-27 Taiyo Holdings Co., Ltd. Photo-curable/thermally curable composition, method for manufacturing cured product thereof, cured product, and printed wiring board including the same

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100461986C (en) * 2002-04-15 2009-02-11 独立行政法人产业技术综合研究所 Fast production method for printed board
JP2005539391A (en) * 2002-09-20 2005-12-22 アベシア・リミテッド Method and ink for manufacturing an electronic device
US7405033B2 (en) 2003-01-17 2008-07-29 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing resist pattern and method for manufacturing semiconductor device
US7648897B2 (en) 2003-01-17 2010-01-19 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing conductive layer and semiconductor device
US7183146B2 (en) 2003-01-17 2007-02-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US7955910B2 (en) 2003-03-26 2011-06-07 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7554117B2 (en) 2003-03-26 2009-06-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7462653B2 (en) 2003-05-09 2008-12-09 Taiyo Ink Manufacturing Co., Ltd. Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof
US7192859B2 (en) 2003-05-16 2007-03-20 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device and display device
US7575993B2 (en) 2003-05-16 2009-08-18 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device and display device
JP2007507610A (en) * 2003-05-30 2007-03-29 フジフィルム・イメイジング・カラランツ・リミテッド Method
US7354808B2 (en) 2003-08-15 2008-04-08 Semiconductor Energy Laboratory Co., Ltd. Resist composition and method for manufacturing semiconductor device using the same
JPWO2005027601A1 (en) * 2003-09-11 2006-11-24 太陽インキ製造株式会社 Insulating pattern and method for forming the same
WO2005027601A1 (en) * 2003-09-11 2005-03-24 Taiyo Ink Mfg. Co., Ltd. Insulating pattern and method of forming the same
JP4563939B2 (en) * 2003-09-11 2010-10-20 太陽インキ製造株式会社 Insulation pattern forming method
US7446054B2 (en) 2003-10-28 2008-11-04 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US7494923B2 (en) 2004-06-14 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of wiring substrate and semiconductor device
US8102005B2 (en) 2004-06-14 2012-01-24 Semiconductor Energy Laboratory Co., Ltd. Wiring substrate, semiconductor device and manufacturing method thereof
KR100678419B1 (en) * 2005-04-01 2007-02-02 삼성전기주식회사 Method for surface treatment of board, method for forming wiring and wiring substrate
JP2006344961A (en) * 2005-06-06 2006-12-21 Fujifilm Electronic Imaging Ltd Method of forming conductive pattern on substrate
KR100704917B1 (en) * 2005-11-08 2007-04-09 삼성전기주식회사 Printed circuit board and the manufacturing method thereof
KR100771468B1 (en) * 2006-09-27 2007-10-30 삼성전기주식회사 Method for forming fine wiring
US9453137B2 (en) 2012-03-30 2016-09-27 Taiyo Holdings Co., Ltd. Photo-curable/thermally curable composition, method for manufacturing cured product thereof, cured product, and printed wiring board including the same
JP2015525116A (en) * 2012-05-23 2015-09-03 オセ−テクノロジーズ ビーブイ Functional pattern printing method and printing apparatus

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A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20000509