JPH06229921A - Method for evaluating cure degree of polyimide oriented film - Google Patents

Method for evaluating cure degree of polyimide oriented film

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Publication number
JPH06229921A
JPH06229921A JP1767393A JP1767393A JPH06229921A JP H06229921 A JPH06229921 A JP H06229921A JP 1767393 A JP1767393 A JP 1767393A JP 1767393 A JP1767393 A JP 1767393A JP H06229921 A JPH06229921 A JP H06229921A
Authority
JP
Japan
Prior art keywords
alignment film
substrate
degree
absorption
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1767393A
Other languages
Japanese (ja)
Inventor
Narihiro Sato
成広 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1767393A priority Critical patent/JPH06229921A/en
Publication of JPH06229921A publication Critical patent/JPH06229921A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

PURPOSE:To evaluate a cure degree of an oriented film, using a substrate of a real liquid crystal display element, by measuring the infrared absorption spectrum of a substrate in a certain region, and by using an absorption degree of an OH stretching vibration absorption band within the region. CONSTITUTION:After cure of the polyimide orientation film applied to a substrate, the infrared absorption spectrum is measured. Hereupon, as an infrared absorption spectrometer, that of Fourier transform type is preferable in the point of sensibility. Only the wave number region of at least 3100-3600cm<-1> is measured. As a reference, a substrate on which the orientation film is not applied should be used. By finding the difference between spectra of a sample coated with the orientation film and a sample not coated, only the absorption derived from the polyimide orientated film can be measured. The integrated intensity is rather more preferably measured than the peak height when the absorption degree is measured, because the OH stretching vibration absorption in this wave number region is wide.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶表示素子の配向膜
の加熱硬化状態を正確にコントロールする必要のある、
TFT液晶表示素子、STN液晶表示素子等に用いられ
るポリイミド配向膜の硬化度評価法に関するものであ
る。
BACKGROUND OF THE INVENTION The present invention requires accurate control of the heat-cured state of the alignment film of a liquid crystal display device.
The present invention relates to a method for evaluating the degree of cure of a polyimide alignment film used in a TFT liquid crystal display element, an STN liquid crystal display element, and the like.

【0002】[0002]

【従来の技術】液晶表示素子は、2枚の基板上にそれぞ
れ電極・配向膜を積層し、2枚の基板上の配向膜が互い
に相対するように保持し、その2枚の基板間に液晶を導
入することにより作成されている。配向膜は液晶を配列
させる能力を有するものであればどのようなものを用い
ることもできるが、工業的にはポリイミドが用いられて
いる。
2. Description of the Related Art A liquid crystal display device is one in which electrodes and alignment films are laminated on two substrates and held so that the alignment films on the two substrates face each other. It is created by introducing. Any alignment film can be used as long as it has the ability to align liquid crystals, but polyimide is industrially used.

【0003】一般に配向膜として使われているポリイミ
ドはポリアミック酸の溶液を塗布、乾燥、加熱硬化して
ポリイミドとしている。このポリイミドの硬化条件は、
分子構造で大きく異なるので適正硬化条件を見つける必
要がある。適正硬化条件を見つけるために熱分析をして
熱分解開始温度を見つける方法と、赤外分光法により分
析的にイミド化率を求める方法がよく用いられている。
Polyimide, which is generally used as an alignment film, is formed by applying a solution of polyamic acid, drying, and curing by heating. The curing conditions for this polyimide are
It is necessary to find an appropriate curing condition because the molecular structures differ greatly. In order to find an appropriate curing condition, a method of performing thermal analysis to find a thermal decomposition initiation temperature and a method of analytically obtaining an imidization rate by infrared spectroscopy are often used.

【0004】赤外分光法では、イミド環の特有吸収の吸
光度を測定して配向膜の硬化度をイミド化率として表し
ている。このときに用いるイミド環の特有吸収は、おお
よそ1780cm-1、720cm-1、600cm-1である。
In infrared spectroscopy, the absorbance of the peculiar absorption of the imide ring is measured and the degree of curing of the alignment film is expressed as the imidization ratio. Specific absorption of imide ring used in this case, approximately 1780 cm -1, 720 cm -1, is 600 cm -1.

【0005】[0005]

【発明が解決しようとする課題】ところで、通常の液晶
表示素子に基板として用いられているソーダガラスやほ
うけい酸ガラスは赤外光の大部分の領域を強く吸収す
る。そのため、上記の吸収帯は測定することが不可能で
ある。したがって配向膜の硬化度を決定するために次の
ような方法をとらざるをえない。すなわち、わざわざ赤
外光に透明なシリコンウェハやフッ化カルシウム、塩化
ナトリウムなどの基板上にポリイミド配向膜溶液を塗布
し、乾燥、加熱する。このサンプルの赤外吸収スペクト
ルを測定し、先にあげたイミド環特有の吸収帯の吸光度
を調べるのである。
By the way, soda glass and borosilicate glass, which are used as substrates for ordinary liquid crystal display elements, strongly absorb most of the infrared light. Therefore, the above absorption band cannot be measured. Therefore, the following method is unavoidable for determining the degree of curing of the alignment film. That is, the polyimide alignment film solution is coated on a substrate such as a silicon wafer or calcium fluoride or sodium chloride that is transparent to infrared light, dried, and heated. The infrared absorption spectrum of this sample is measured, and the absorbance of the absorption band peculiar to the imide ring is examined.

【0006】しかしながらこの場合、実際の液晶表示素
子用の基板に配向膜を塗布した試料での硬化度を測定し
たわけではない。そのため、実際の基板上での配向膜の
硬化度や、実際の液晶表示素子の不良箇所と硬化度の対
応がとれないなどの課題が生じていた。
However, in this case, the degree of curing was not measured in the sample in which the alignment film was applied to the actual substrate for the liquid crystal display element. Therefore, there are problems such as the fact that the degree of curing of the alignment film on the actual substrate and the degree of curing of the actual defective portion of the liquid crystal display element cannot be matched.

【0007】本発明は、このような従来の配向膜の硬化
度評価方法の課題を考慮し、実際の液晶表示素子の基板
をもちいて配向膜の硬化度を評価出来る、ポリイミド配
向膜の硬化度評価方法を提供することを目的とするもの
である。
In view of the problems of the conventional method for evaluating the degree of cure of an alignment film, the present invention can evaluate the degree of cure of an alignment film by using a substrate of an actual liquid crystal display device. It is intended to provide an evaluation method.

【0008】[0008]

【課題を解決するための手段】本発明は、片面にポリイ
ミド配向膜を塗布した基板の赤外吸収スペクトルを、少
なくとも3100cm-1〜3600cm-1の領域で測定し、
この領域中のOH伸縮振動吸収帯の吸光度をもちいてこ
の基板上の配向膜の硬化度を評価する。
The present invention SUMMARY OF THE INVENTION may, an infrared absorption spectrum of the substrate coated with polyimide alignment film on one side, and measured at least in the region of 3100cm -1 ~3600cm -1,
The degree of hardening of the alignment film on this substrate is evaluated using the absorbance of the OH stretching vibration absorption band in this region.

【0009】[0009]

【作用】ポリイミド配向膜は熱処理によりポリアミック
酸が反応してポリイミドとなる。この反応はポリアミッ
ク酸中のアミノ基とカルボキシル基から脱水縮合してイ
ミド環が生成するものである。すなわちこの反応でカル
ボキシル基は消出する。
[Function] The polyimide alignment film is converted to polyimide by heat treatment with polyamic acid. In this reaction, an imide ring is formed by dehydration condensation from the amino group and the carboxyl group in the polyamic acid. That is, the carboxyl group is eliminated by this reaction.

【0010】ポリアミック酸においてカルボキシル基中
のOH伸縮振動に由来する吸収は、3100cm-1〜36
00cm-1の間に存在している。この吸収帯の吸光度は、
熱処理によってカルボキシル基の消出した程度により減
少する現象を見いだした。
In the polyamic acid, the absorption derived from the OH stretching vibration in the carboxyl group is 3100 cm -1 to 36.
It exists between 00 cm -1 . The absorbance of this absorption band is
It was found that the heat treatment reduced the degree of elimination of carboxyl groups.

【0011】また、液晶表示素子によく用いられている
基板材料は、ソーダガラスやほうけい酸ガラスである。
これらのガラスはおおよそ2000cm-1よりも高波数に
は強い吸収をもっていない。したがってOH伸縮振動に
由来する3100cm-1〜3600cm-1の吸収帯は、ガラ
ス基板上の配向膜についても測定することが可能とな
る。
The substrate material often used for the liquid crystal display element is soda glass or borosilicate glass.
These glasses do not have strong absorption at wave numbers higher than approximately 2000 cm -1 . Accordingly the absorption band of 3100cm -1 ~3600cm -1 derived from the OH stretching vibration, it is possible to measure also the orientation film on the glass substrate.

【0012】[0012]

【実施例】本発明のポリイミド配向膜の硬化度評価方法
の一実施例を説明する。基板は、少なくとも3100cm
-1〜3600cm-1の波数を通すようなものであれば、ガ
ラス基板でも樹脂基板でも構わない。ソーダガラスやほ
うけい酸ガラスは3100cm-1〜3600cm-1での吸収
が少なく最適である。
EXAMPLE An example of the method for evaluating the degree of cure of the polyimide alignment film of the present invention will be described. The substrate should be at least 3100 cm
A glass substrate or a resin substrate may be used as long as it can pass a wave number of -1 to 3600 cm -1 . Soda glass or borosilicate glass is optimally less absorption at 3100cm -1 ~3600cm -1.

【0013】また片面にポリイミド配向膜を塗布した基
板を用いるが、ここでポリイミド配向膜はポリアミック
酸を熱硬化してポリイミドとするものが最適である。熱
硬化する以前にイミド化しているタイプのポリイミド配
向膜は、本発明の硬化度評価方法を用いる必要がない。
また基板上には配向膜以外の薄膜が存在していても構わ
ない。透明電極やオーバーコート材料、TFT(薄膜ト
ランジスタ)などがあっても少なくとも3100cm-1
3600cm-1の波数の赤外光を通す程度の厚みであれば
基板上に存在していても構わない。
A substrate having a polyimide alignment film coated on one side is used. Here, the polyimide alignment film is most preferably a polyimide obtained by thermosetting polyamic acid. For the polyimide alignment film of the type that is imidized before being heat-cured, it is not necessary to use the curing degree evaluation method of the present invention.
Further, a thin film other than the alignment film may be present on the substrate. Even if there is a transparent electrode, overcoat material, TFT (thin film transistor), etc., at least 3100 cm -1
It may be present on the substrate as long as it has a thickness that allows infrared light having a wave number of 3600 cm -1 to pass therethrough.

【0014】基板上に塗布したポリイミド配向膜を硬化
後、赤外吸収スペクトルを測定する。ここで赤外吸収ス
ペクトロメータは分散型でもフーリエ変換型でも構わな
いが、感度の点からフーリエ変換型のスペクトロメータ
が好ましい。また測定は、全波数領域でおこなう必要は
なく、少なくとも3100cm-1〜3600cm-1の波数領
域だけ測定できればよい。また、リファレンスとして配
向膜を塗布していない基板を用いる必要がある。配向膜
を塗布したサンプルと塗布していないサンプルでのスペ
クトルの差をとることで、ポリイミド配向膜に由来する
吸収のみを測定することが可能になる。
After curing the polyimide alignment film coated on the substrate, the infrared absorption spectrum is measured. Here, the infrared absorption spectrometer may be a dispersion type or a Fourier transform type, but a Fourier transform type spectrometer is preferable from the viewpoint of sensitivity. The measurements need not be performed in all frequency domain, it is sufficient measure only the wave number region of at least 3100cm -1 ~3600cm -1. Further, it is necessary to use a substrate on which an alignment film is not applied as a reference. By taking the difference between the spectra of the sample coated with the alignment film and the sample not coated with the alignment film, it is possible to measure only the absorption derived from the polyimide alignment film.

【0015】3100cm-1〜3600cm-1の波数領域に
おけるポリアミック酸のカルボニル基中のOH伸縮振動
吸収は幅広いので、吸光度を測定するときにはピーク高
さよりも面積強度を測定する方がより好ましい。
[0015] Since the OH stretching vibration absorption in the carbonyl group of the polyamic acid at a wave number region of 3100cm -1 ~3600cm -1 is broad, more preferably is better to measure the area intensity than the peak height when measuring the absorbance.

【0016】他方、配向膜の膜厚変動がある場合は以下
に述べた方法で硬化度測定する必要がある。すなわち少
なくとも2800cm-1〜3600cm-1の領域で赤外吸収
スペクトルを測定し、この領域中のOH伸縮振動吸収帯
の吸光度とCH伸縮振動吸収帯の比をもちいてこの基板
上の配向膜の硬化度を評価するというものである。
On the other hand, if there is a variation in the film thickness of the alignment film, it is necessary to measure the degree of cure by the method described below. That measuring the infrared absorption spectrum in the region of at least 2800cm -1 ~3600cm -1, by using the ratio of absorbance and CH stretching vibration absorption band of OH stretching vibration absorption bands in this region hardening of the alignment film on the substrate It is to evaluate the degree.

【0017】2800cm-1〜3600cm-1のうち、ポリ
アミック酸のカルボニル基中のOH伸縮振動吸収帯は3
100cm-1〜3600cm-1にある。またポリアミック酸
のCH伸縮振動吸収帯は2900cm-1〜3000cm-1
ある。CH伸縮振動吸収帯の吸光度はイミド化反応の前
後で変化しない。したがってOH伸縮振動吸収帯とCH
伸縮振動吸収帯の吸光度比を測定すればよい。これらは
たいてい場合幅広いピークを与えるので、より好ましく
は面積強度を測定して比をとるべきである。
[0017] Among the 2800cm -1 ~3600cm -1, OH stretching vibration absorption band 3 in the carbonyl group of the polyamic acid
In the 100cm -1 ~3600cm -1. The CH stretching vibration absorption band of the polyamic acid is in a 2900cm -1 ~3000cm -1. The absorbance in the CH stretching vibration absorption band does not change before and after the imidization reaction. Therefore, OH stretching vibration absorption band and CH
The absorbance ratio of the stretching vibration absorption band may be measured. Since these often give broad peaks, more preferably the area intensity should be measured and ratioed.

【0018】以下に更に、具体的な実施例を述べる。 (実施例1〜4)STN表示素子用ソーダガラス上にポ
リイミド配向膜材料として、日産化学製SE150を膜
厚70nmとなるようにスピンコートした。ただちにこの
基板を設定温度60℃としたホットプレート上に1分間
放置し、溶媒を蒸発させた。さらにこの基板を熱風乾燥
器中で(表1)に示す設定温度で1時間熱処理して(表
1)に示す実施例1〜4のサンプルを作成した。
Specific examples will be described below. (Examples 1 to 4) A soda glass for STN display element was spin-coated with SE150 manufactured by Nissan Chemical Co., Ltd. as a polyimide alignment film material so as to have a film thickness of 70 nm. Immediately, this substrate was left for 1 minute on a hot plate having a preset temperature of 60 ° C. to evaporate the solvent. Further, this substrate was heat-treated in a hot air dryer at a set temperature shown in (Table 1) for 1 hour to prepare samples of Examples 1 to 4 shown in (Table 1).

【0019】[0019]

【表1】 [Table 1]

【0020】(実施例5〜8)ポリイミド配向膜材料と
して、チッソ石油化学製PSI2201を膜厚70nmと
なるようにスピンコートした。実施例1と同様の熱処理
をして実施例5〜8のサンプルを作成した。 (吸光度測定)実施例1〜8のサンプルの赤外吸収スペ
クトルをニコレー社製フーリエ変換赤外分光光度計モデ
ル740を用いて測定した。測定条件は、検出器TG
S、分解能8cm-1、積算100回とした。配向膜を塗布
していないガラス基板の赤外吸収スペクトルをリファレ
ンスとして実施例のサンプルを測定した。
(Examples 5 to 8) As a polyimide alignment film material, PSI2201 manufactured by Chisso Petrochemical was spin-coated to a film thickness of 70 nm. The same heat treatment as in Example 1 was performed to prepare the samples of Examples 5-8. (Measurement of Absorbance) The infrared absorption spectra of the samples of Examples 1 to 8 were measured using a Fourier transform infrared spectrophotometer model 740 manufactured by Nikolay. The measurement conditions are the detector TG
S, resolution 8 cm −1 , total 100 times. The samples of the examples were measured using the infrared absorption spectrum of the glass substrate not coated with the alignment film as a reference.

【0021】実施例1の赤外吸収スペクトルを図1に示
す。図1でわかるように2800cm-1〜3600cm-1
領域のなかで、3150cm-1〜3450cm-1はOH吸収
帯を示し、2900cm-1〜3000cm-1はCH吸収帯を
示す。3150cm-1〜3450cm-1のOH吸収帯の面積
強度を計算した。また2900cm-1〜3000cm-1のC
H吸収帯の面積強度を計算し、OH吸収帯の面積強度と
の比をとった。(表1)にその結果を示す。(表1)の
結果より加熱温度が高くなるほどOH吸収帯の吸光度が
減少しているのがわかる。このようにOH吸収帯の吸光
度を測定することにより硬化度評価が可能である。
The infrared absorption spectrum of Example 1 is shown in FIG. Among the areas of 2800cm -1 ~3600cm -1 As can be seen in Figure 1, 3150cm -1 ~3450cm -1 represents an OH absorption band, 2900cm -1 ~3000cm -1 represents CH absorption band. The area intensity of the OH absorption band from 3150 cm -1 to 3450 cm -1 was calculated. C of 2900 cm -1 to 3000 cm -1
The area intensity of the H absorption band was calculated, and the ratio with the area intensity of the OH absorption band was taken. The results are shown in (Table 1). It can be seen from the results in (Table 1) that the higher the heating temperature, the lower the absorbance in the OH absorption band. Thus, the degree of cure can be evaluated by measuring the absorbance in the OH absorption band.

【0022】またOH吸収帯の吸光度をCH吸収帯の吸
光度で割った値も同様に加熱温度が高くなるにつれ、減
少している。このようにOH吸収帯の吸光度をCH吸収
帯の吸光度で割った値により硬化度評価をすることも可
能である。
The value obtained by dividing the absorbance in the OH absorption band by the absorbance in the CH absorption band also decreases as the heating temperature rises. In this way, it is possible to evaluate the degree of curing by the value obtained by dividing the absorbance in the OH absorption band by the absorbance in the CH absorption band.

【0023】また本発明の配向膜の硬化度評価法と従来
のイミド化率測定との相関性を判断するために以下の実
験をおこなった。シリコンウェハ上に実施例4〜8で用
いた配向膜を塗布したサンプルを作成した。実施例4〜
8と同様の硬化条件で硬化し、725cm-1のイミド環吸
収の吸光度を測定した。ここで250℃で熱処理したも
のをイミド化率100%として、他の熱処理温度でのイ
ミド化率を725cm-1のイミド環吸収の吸光度から計算
した。このようにして求めたイミド化率と本発明のガラ
ス基板上の配向膜で求めたOH吸収の面積強度の関係を
図2に示す。図2よりイミド化率と本発明の硬化度評価
法で求めたOH吸収の面積強度は、負の相関があること
が明かである。 (比較例)実施例1〜8で用いたサンプルの赤外吸収ス
ペクトルを測定した。イミド化率を測定するために17
80cm-1、720cm-1、600cm-1付近の吸光度を測定
しようとしたが、吸光度で2000cm-1より小さい領域
ではスペクトルに吸収ピークが観測できなかった。
Further, the following experiment was conducted in order to judge the correlation between the method for evaluating the degree of curing of the alignment film of the present invention and the conventional measurement of imidization ratio. A sample was prepared by coating the alignment film used in Examples 4 to 8 on a silicon wafer. Example 4-
It was cured under the same curing conditions as in Example 8, and the absorbance of imide ring absorption at 725 cm -1 was measured. Here, the heat treatment at 250 ° C. was taken as the imidization ratio of 100%, and the imidization ratio at other heat treatment temperatures was calculated from the absorbance of the imide ring absorption at 725 cm −1 . FIG. 2 shows the relationship between the imidization ratio thus obtained and the area intensity of OH absorption obtained by the alignment film on the glass substrate of the present invention. From FIG. 2, it is clear that there is a negative correlation between the imidization ratio and the area intensity of OH absorption obtained by the curing degree evaluation method of the present invention. (Comparative Example) The infrared absorption spectra of the samples used in Examples 1 to 8 were measured. 17 to measure the imidization ratio
80cm -1, 720cm -1, tried to measure the absorbance around 600 cm -1, absorption peaks in the spectrum at 2000 cm -1 smaller area in absorbance could not be observed.

【0024】なお本発明の配向膜の硬化度評価法は、実
際の液晶表示素子用の基板を測定できるため容易に製造
工程に取り入れることができる。本発明の硬化度評価方
法を用いることによって製造現場でポリイミド配向膜の
最適硬化条件を容易に見つけ出しまた最適硬化条件を保
つことができるため品質の向上に有効である。
The method for evaluating the degree of curing of the alignment film of the present invention can be easily incorporated into the manufacturing process because the substrate for the actual liquid crystal display device can be measured. By using the curing degree evaluation method of the present invention, the optimum curing conditions for the polyimide alignment film can be easily found at the manufacturing site and the optimum curing conditions can be maintained, which is effective in improving the quality.

【0025】[0025]

【発明の効果】以上述べたところから明らかなように、
本発明のポリイミド配向膜の硬化度評価方法によれば、
液晶表示素子を作成する工程のなかで、実際の液晶表示
素子用の基板上の配向膜の硬化度を容易に知ることがで
きる。したがって、配向膜の硬化不良や基板面内での配
向膜の硬化むらなどを硬化工程の直後に容易に知ること
ができる。
As is apparent from the above description,
According to the curing degree evaluation method of the polyimide alignment film of the present invention,
In the process of manufacturing the liquid crystal display element, the actual curing degree of the alignment film on the substrate for the liquid crystal display element can be easily known. Therefore, defective curing of the alignment film, unevenness of curing of the alignment film within the substrate surface, and the like can be easily known immediately after the curing step.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は本発明の硬化度評価法で用いた赤外吸収
スペクトルをあらわすグラフである。
FIG. 1 is a graph showing an infrared absorption spectrum used in a curing degree evaluation method of the present invention.

【図2】図2は本発明の一実施例の硬化度評価と従来の
イミド化率との相関をあらわすグラフである。
FIG. 2 is a graph showing the correlation between the degree of cure of one example of the present invention and the conventional imidization ratio.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】片面にポリイミド配向膜が形成された基板
の赤外吸収スペクトルを、少なくとも3100cm-1〜3
600cm-1の領域で測定し、この領域中のOH伸縮振動
吸収帯の吸光度をもちいて、この基板上の配向膜の硬化
度を評価することを特徴とするポリイミド配向膜の硬化
度評価法。
1. An infrared absorption spectrum of a substrate having a polyimide alignment film formed on one surface thereof is at least 3100 cm −1 to 3
A method for evaluating the degree of cure of a polyimide alignment film, which comprises measuring in a region of 600 cm -1 and using the absorbance of the OH stretching vibration absorption band in this region to evaluate the degree of cure of the alignment film on this substrate.
【請求項2】片面にポリイミド配向膜が形成された基板
の赤外吸収スペクトルを、少なくとも2800cm-1〜3
600cm-1の領域で測定し、この領域中のOH伸縮振動
吸収帯の吸光度とCH伸縮振動吸収帯の吸光度の比をも
ちいて、この基板上の配向膜の硬化度を評価することを
特徴とするポリイミド配向膜の硬化度評価法。
2. An infrared absorption spectrum of a substrate having a polyimide alignment film formed on one surface thereof is at least 2800 cm -1 to 3
It is measured in a region of 600 cm -1 , and the ratio of the absorbance of the OH stretching vibration absorption band to the absorbance of the CH stretching vibration absorption band in this region is used to evaluate the curing degree of the alignment film on this substrate. Evaluation method for curing degree of polyimide alignment film.
【請求項3】ポリイミド配向膜は、ポリアミック酸を加
熱によりイミド化したものであることを特徴とする請求
項1又は請求項2記載のポリイミド配向膜の硬化度評価
法。
3. The method for evaluating the degree of cure of a polyimide alignment film according to claim 1 or 2, wherein the polyimide alignment film is formed by imidizing polyamic acid by heating.
JP1767393A 1993-02-04 1993-02-04 Method for evaluating cure degree of polyimide oriented film Pending JPH06229921A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1767393A JPH06229921A (en) 1993-02-04 1993-02-04 Method for evaluating cure degree of polyimide oriented film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1767393A JPH06229921A (en) 1993-02-04 1993-02-04 Method for evaluating cure degree of polyimide oriented film

Publications (1)

Publication Number Publication Date
JPH06229921A true JPH06229921A (en) 1994-08-19

Family

ID=11950380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1767393A Pending JPH06229921A (en) 1993-02-04 1993-02-04 Method for evaluating cure degree of polyimide oriented film

Country Status (1)

Country Link
JP (1) JPH06229921A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001086261A1 (en) * 2000-05-09 2001-11-15 Hamamatsu Photonics K.K. Method and device for detecting end point of curing of resin, assembly, apparatus and method for producing assembly
CN102967579A (en) * 2012-11-19 2013-03-13 深圳大学 Method for representing polyurethane curing reaction by in-situ diffuse reflection infrared spectrum
CN103278477A (en) * 2013-05-02 2013-09-04 深圳大学 Method for characterizing reaction process of solid surface hydroxyl groups by using in-situ diffuse reflection infrared spectroscopy
JP5285151B2 (en) * 2009-05-18 2013-09-11 シャープ株式会社 Liquid crystal panel and liquid crystal panel inspection method
CN108559113A (en) * 2018-04-17 2018-09-21 佛山市卓膜科技有限公司 A kind of substrate being used to form flexible strong dielectric film
CN112903622A (en) * 2021-01-25 2021-06-04 中国科学院上海光学精密机械研究所 Device and method for measuring local polymerization degree of multi-photon polymer
CN114199807A (en) * 2021-12-10 2022-03-18 南京大学 Method for detecting polyimide surface molecular chain orientation structure by AFM-IR

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001086261A1 (en) * 2000-05-09 2001-11-15 Hamamatsu Photonics K.K. Method and device for detecting end point of curing of resin, assembly, apparatus and method for producing assembly
JP5285151B2 (en) * 2009-05-18 2013-09-11 シャープ株式会社 Liquid crystal panel and liquid crystal panel inspection method
CN102967579A (en) * 2012-11-19 2013-03-13 深圳大学 Method for representing polyurethane curing reaction by in-situ diffuse reflection infrared spectrum
CN103278477A (en) * 2013-05-02 2013-09-04 深圳大学 Method for characterizing reaction process of solid surface hydroxyl groups by using in-situ diffuse reflection infrared spectroscopy
CN108559113A (en) * 2018-04-17 2018-09-21 佛山市卓膜科技有限公司 A kind of substrate being used to form flexible strong dielectric film
CN112903622A (en) * 2021-01-25 2021-06-04 中国科学院上海光学精密机械研究所 Device and method for measuring local polymerization degree of multi-photon polymer
CN114199807A (en) * 2021-12-10 2022-03-18 南京大学 Method for detecting polyimide surface molecular chain orientation structure by AFM-IR
CN114199807B (en) * 2021-12-10 2023-09-22 南京大学 Method for detecting polyimide surface molecular chain orientation structure by AFM-IR

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