JPH06195761A - Manufacture for nickel stamper and manufacturing apparatus therefor - Google Patents
Manufacture for nickel stamper and manufacturing apparatus thereforInfo
- Publication number
- JPH06195761A JPH06195761A JP34188792A JP34188792A JPH06195761A JP H06195761 A JPH06195761 A JP H06195761A JP 34188792 A JP34188792 A JP 34188792A JP 34188792 A JP34188792 A JP 34188792A JP H06195761 A JPH06195761 A JP H06195761A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- stamper
- manufacturing
- electrode
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光ディスクを複製する
際の原型として用いられる光ディスクのスタンパの製造
方法と製造装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing an optical disk stamper used as a master for copying an optical disk.
【0002】[0002]
【従来の技術】従来のスタンパの製造方法を特公昭60
−28048号公報「マスタースタンパーの製造方法」
に記載されている内容の一部を用いて説明する。図3
は、ニッケルスタンパの製造工程図であり、図4は電気
めっき時のめっき時間とめっき電流の関係を示す図であ
る。2. Description of the Related Art A conventional stamper manufacturing method is disclosed in JP-B-60.
-28048, "Method for manufacturing master stamper"
It will be explained using a part of the contents described in. Figure 3
FIG. 4 is a manufacturing process diagram of a nickel stamper, and FIG. 4 is a diagram showing a relationship between a plating time and a plating current during electroplating.
【0003】まず、ガラス原盤20を洗浄工程できれい
に洗浄し、レジスト塗布工程で厚み約1000Åのレジ
スト層21を形成する。First, the glass master disk 20 is thoroughly cleaned in a cleaning process, and a resist layer 21 having a thickness of about 1000 Å is formed in a resist coating process.
【0004】次に、露光工程で信号となる凹凸、もしく
はトラック溝の形成すべきところをレーザ光で露光し、
現像工程で現像し、凹凸状の信号、もしくはトラック溝
を形成する。Next, the unevenness which becomes a signal in the exposure step, or the place where the track groove is to be formed is exposed with a laser beam,
Development is performed in the developing process to form uneven signals or track grooves.
【0005】次に、金属層形成1の工程で真空蒸着、ス
パッター等の方法により、凹凸、もしくは溝の形成され
たレジスト層21の表面に厚み600Å程度の金属層2
2を形成する。Next, in the step of forming the metal layer 1, the metal layer 2 having a thickness of about 600 Å is formed on the surface of the resist layer 21 on which irregularities or grooves are formed by a method such as vacuum deposition and sputtering.
Form 2.
【0006】さらに、金属層形成2の工程でニッケル電
気めっきを行い、厚み300μmのニッケルによる金属
層23を形成する。この時、陰極側のガラス原盤20に
流れる初期の陰極電流は、低い電流I1でT1時間程度
通電して陰極電流による金属層22の破壊を防止した
後、高い電流I2をT2時間通電する。次に、裏面に発
生した凹凸をエメリーペーパー等で研磨し、平滑にして
最後に、レジスト層21、金属層22、23を剥離工程
でガラス原盤20から剥離し、レジスト洗浄工程で剥離
した層の表面に付着しているレジスト層21をレジスト
溶解液で洗い落とし、マスタースタンパを製造する。Further, nickel electroplating is performed in the metal layer forming step 2 to form a metal layer 23 made of nickel and having a thickness of 300 μm. At this time, the initial cathode current flowing through the glass master 20 on the cathode side is a low current I1 for about T1 hours to prevent the metal layer 22 from being destroyed by the cathode current, and then a high current I2 is passed for T2 hours. Next, the unevenness generated on the back surface is polished with an emery paper or the like to make it smooth, and finally, the resist layer 21, the metal layers 22 and 23 are peeled from the glass master 20 in the peeling step, and the layers peeled in the resist cleaning step are The resist layer 21 adhering to the surface is washed off with a resist solution to manufacture a master stamper.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、上記の
ような製造工程には次のような課題がある。However, the above manufacturing process has the following problems.
【0008】第一の課題は、ガラス原盤の表面に電気め
っきによりニッケルを形成する際に、ガラス原盤の中央
部と外周部との間にニッケル膜厚のばらつきが50〜1
00μm程度有り、外周部に厚く形成される傾向にあ
る。これは、陰極電流を連続的に通電した場合に、ガラ
ス原盤表面のニッケルイオン濃度が中央部と外周部で異
なるために発生する現象であり、そのため実際のニッケ
ルスタンパは、所望の形状よりも大きく製作した後、外
周部の厚い所を金型で切断してニッケルスタンパを製作
している。この金型で切断する工程において、切断面の
ばり、ニッケルスタンパの反り等を無くすことは困難で
あった。The first problem is that when nickel is formed on the surface of the glass master by electroplating, the variation in nickel film thickness between the central portion and the outer peripheral portion of the glass master is 50 to 1.
It is about 00 μm, and tends to be thickly formed on the outer peripheral portion. This is a phenomenon that occurs when the cathode current is continuously applied because the nickel ion concentration on the surface of the glass master disc differs between the central portion and the outer peripheral portion.Therefore, the actual nickel stamper is larger than the desired shape. After manufacturing, the thick outer peripheral part is cut with a mold to manufacture a nickel stamper. In the step of cutting with this mold, it was difficult to eliminate burrs on the cut surface, warpage of the nickel stamper, and the like.
【0009】第二の課題は、裏面をエメリーペーパー等
で研磨するために、工程が増えるとともに、ニッケルス
タンパが反ったり、信号面に傷がつきやすいことであ
る。ニッケルスタンパの反り、信号面の傷は、樹脂成形
機にスタンパを装着し、射出成形してレプリカを製作す
る際、樹脂の流れやレプリカの厚みむらを発生し、信号
再生時の信号品質に悪い影響を与えていた。The second problem is that since the back surface is polished with emery paper or the like, the number of steps is increased, and the nickel stamper is easily warped or the signal surface is easily scratched. Nickel stamper warpage and scratches on the signal surface cause resin flow and uneven thickness of the replica when the stamper is mounted on a resin molding machine and injection-molded to produce a replica, resulting in poor signal quality during signal reproduction. Had an influence.
【0010】そこで本発明は、めっき段階でニッケルス
タンパの厚みを均一にすることで金型での切断工程と、
かつ裏面を研磨する工程を削減した信頼性の高いスタン
パの製造方法とその製造装置を提供することを目的とす
るものである。Therefore, according to the present invention, a step of cutting with a die by making the thickness of the nickel stamper uniform in the plating step,
Moreover, it is an object of the present invention to provide a highly reliable stamper manufacturing method and a manufacturing apparatus therefor, in which the step of polishing the back surface is reduced.
【0011】[0011]
【課題を解決するための手段】そして上記課題を解決す
るための本発明は、凹凸状の信号または溝を形成したデ
ィスク原盤から電気めっきによりニッケルスタンパを製
造する方法であって、スルファミン酸ニッケル、塩化ニ
ッケル、ほう酸を主成分とする電解液中でニッケルイオ
ンを供給するニッケル材を入れる電極バスケットを陽
極、ディスク原盤を陰極とし、めっき電流を断続的に通
電してニッケルの形成を行うと共に、ディスク原盤表面
に300μm程度のニッケルを形成した後、電極バスケ
ットとディスク原盤の極性を反転させることにより、ニ
ッケル表面を電解研磨する。The present invention for solving the above-mentioned problems is a method for producing a nickel stamper by electroplating from a disk master having an uneven signal or groove, which comprises nickel sulfamate, The electrode basket containing the nickel material that supplies nickel ions in the electrolyte containing nickel chloride and boric acid as the anode is the anode, and the disk master is the cathode, and the plating current is intermittently applied to form nickel. After forming nickel of about 300 μm on the surface of the master, the nickel surface is electropolished by reversing the polarities of the electrode basket and the master of the disk.
【0012】また、凹凸状の信号または溝を形成したデ
ィスク原盤から電気めっきによりニッケルスタンパを製
造する製造装置においては、ディスク原盤を回転させる
回転機構、ニッケル材を入れる電極バスケット、電流を
供給する電源、電流の流れる方向を切り換える切換器を
具備した構成を有している。Further, in a manufacturing apparatus for manufacturing a nickel stamper by electroplating from a disk master having an uneven signal or groove, a rotating mechanism for rotating the disk master, an electrode basket containing nickel material, and a power supply for supplying an electric current. , Has a configuration including a switching device that switches the direction of current flow.
【0013】[0013]
【作用】本発明は上記したように、ディスク原盤への陰
極電流を断続的に通電することによりガラス原盤表面付
近のニッケルイオン濃度を常に均一に保つことができる
ため、ニッケルの厚みを均一に形成することができる。
また、所望の厚みに形成した後、めっき電流を形成時と
逆の方向に通電することにより、裏面の凹凸を電解研磨
するために、従来のエメリーペーパー等での研磨を不要
とし、反りや信号面の傷を発生させることが無い。As described above, according to the present invention, the nickel ion concentration in the vicinity of the surface of the glass master disk can be always kept uniform by intermittently supplying the cathode current to the master disk, so that the nickel thickness can be made uniform. can do.
In addition, after forming to a desired thickness, by applying a plating current in the direction opposite to that at the time of formation, electrolytic polishing of the irregularities on the back surface does not require polishing with conventional emery paper, etc. No scratches on the surface.
【0014】[0014]
【実施例】以下、本発明の一実施例について図面を参照
して詳細に説明する。図1は本発明の一実施例を示すめ
っき装置の構成図、図2は、陰極電流とめっき時間及び
陽極電流と研磨時間の関係を示す図である。図1におい
て、本発明のめっき装置は、ニッケルイオンを供給する
ためのニッケル材を入れる電極バスケット4と、回転機
構としてガラス原盤1を固定する電極2と、電極2を回
転させるためのモータ3と、電極2に電流を通電させる
ための電極ブラシ5と、また、電流を供給するための電
源7と、電流の流れる方向を切り換えるための切換器8
から構成されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a configuration diagram of a plating apparatus showing an embodiment of the present invention, and FIG. 2 is a diagram showing a relationship between a cathode current and a plating time, and an anode current and a polishing time. 1, the plating apparatus of the present invention includes an electrode basket 4 containing a nickel material for supplying nickel ions, an electrode 2 for fixing a glass master 1 as a rotating mechanism, and a motor 3 for rotating the electrode 2. , An electrode brush 5 for supplying a current to the electrode 2, a power supply 7 for supplying a current, and a switch 8 for switching the direction in which the current flows.
It consists of
【0015】浴槽9内の電解液6は、スルファミン酸ニ
ッケル、塩化ニッケル、ほう酸、ピット防止剤からな
り、円板状のガラス板にフォトレジストを塗布し、その
表面に凹凸の信号またはトラック溝を形成した後、スパ
ッター、真空蒸着等により600Å程度のニッケルの金
属層を形成したガラス原盤1を電極2に固定し、電解液
6中で10〜20rpmの回転数で回転させながら電極
バスケット4を陽極とし、ガラス原盤1を陰極として電
流を流す。この時、ガラス原盤1に流れる電流は陰極電
流となる。The electrolytic solution 6 in the bath 9 is composed of nickel sulfamate, nickel chloride, boric acid, and a pit preventive agent. A photoresist is applied to a disk-shaped glass plate, and uneven signals or track grooves are formed on the surface thereof. After forming, the glass master 1 on which a nickel metal layer of about 600 Å is formed by sputtering, vacuum deposition or the like is fixed to the electrode 2, and the electrode basket 4 is anodized while rotating in the electrolytic solution 6 at a rotation speed of 10 to 20 rpm. Then, a current is caused to flow using the glass master 1 as a cathode. At this time, the current flowing through the glass master 1 becomes a cathode current.
【0016】次に図2を用いて電流と時間の関係につい
て説明する。めっきの初期は、ニッケルの金属層が薄い
ために高い陰極電流I2を通電すると電極2とニッケル
の金属層の接触部で、金属層の破壊を発生させるため
に、低い陰極電流I1でニッケルを数μmまで徐々に形
成する。その後、高い陰極電流I2を通電してニッケル
を形成するが、徐々にガラス原盤1表面のニッケルイオ
ン濃度が中央部と外周部で異なってきて厚みのばらつき
が発生してくる。この時、一定時間通電を停止すること
により、ガラス原盤1表面のニッケルイオン濃度を再び
均一にすることができる。このようにめっきの陰極電流
を通電状態と通電停止状態をニッケルの厚みが300μ
m程度になるまで断続的に繰り返すことにより、中央部
と外周部との厚みを均一にすることができる。Next, the relationship between current and time will be described with reference to FIG. At the initial stage of plating, when a high cathode current I2 is applied because the nickel metal layer is thin, the contact between the electrode 2 and the nickel metal layer causes destruction of the metal layer. Gradually form to μm. After that, a high cathode current I2 is applied to form nickel, but the nickel ion concentration on the surface of the glass master 1 gradually differs between the central portion and the outer peripheral portion, and the thickness varies. At this time, by stopping energization for a certain period of time, the nickel ion concentration on the surface of the glass master 1 can be made uniform again. In this way, when the cathode current of plating is in the energized state and the energized state is not applied, the nickel thickness is 300 μm.
By repeating the process intermittently until the thickness reaches about m, the thickness of the central portion and the outer peripheral portion can be made uniform.
【0017】300μm程度までニッケルを形成した
後、めっき装置の切換器8により電流の流れる方向をめ
っき時と逆にする。電流の流れる方向の切り換えにより
電極バスケット4は、陽極から陰極になり電極2は、陰
極から陽極に極性が変わるために、ガラス原盤1には陽
極電流I3が流れて、そのニッケル表面では、ニッケル
の溶解が始まり表面の凹凸が除去される。最後に、ガラ
ス原盤からスタンパを剥離し、剥離した表面に付着して
いるレジストをレジスト溶解液で洗い落とし、マスター
スタンパの製造を完了する。After nickel is formed to a thickness of about 300 μm, the direction of current flow is reversed by the switching device 8 of the plating apparatus. By switching the direction of the current flow, the electrode basket 4 changes from the anode to the cathode, and the polarity of the electrode 2 changes from the cathode to the anode. Therefore, the anode current I3 flows through the glass master 1 and nickel on the nickel surface is changed. Melting begins and the surface irregularities are removed. Finally, the stamper is peeled off from the glass master and the resist adhering to the peeled surface is washed off with a resist solution to complete the production of the master stamper.
【0018】なお、本発明の実施例では、原盤としてガ
ラス原盤を用いたが、金、銅、アルミ等の金属原盤でも
同じ効果が得られる。In the embodiment of the present invention, the glass master is used as the master, but the same effect can be obtained by using a metal master such as gold, copper or aluminum.
【0019】[0019]
【発明の効果】以上述べたように、本発明のニッケルス
タンパの製造方法とその製造装置によれば、ニッケルス
タンパの厚みを均一にすることができるために、従来の
金型による形状加工が不要となる。また、めっき装置内
で電解研磨を施すためエメリーペーパ等での裏面の研磨
が不要となり、安価で信頼性の高いニッケルスタンパを
製造することができる。As described above, according to the method and apparatus for manufacturing a nickel stamper of the present invention, since the thickness of the nickel stamper can be made uniform, it is not necessary to form the shape by a conventional die. Becomes Further, since electrolytic polishing is performed in the plating apparatus, it is not necessary to polish the back surface with emery paper or the like, and an inexpensive and highly reliable nickel stamper can be manufactured.
【図1】本発明のニッケルスタンパの製造装置の一実施
例を示す構成図FIG. 1 is a configuration diagram showing an embodiment of an apparatus for manufacturing a nickel stamper of the present invention.
【図2】同実施例装置におけるめっきおよび研磨時の電
流と時間の関係図FIG. 2 is a diagram showing the relationship between current and time during plating and polishing in the apparatus of the embodiment.
【図3】従来のニッケルスタンパの製造工程図FIG. 3 is a manufacturing process diagram of a conventional nickel stamper.
【図4】従来の製造方法におけるめっき時の電流と時間
の関係図FIG. 4 is a diagram showing the relationship between current and time during plating in the conventional manufacturing method.
1 ガラス原盤 2 電極 3 モータ 4 電極バスケット 5 電極ブラシ 6 電解液 7 電源 8 切換器 9 浴槽 20 ガラス板 21 レジスト 22、23 金属層 1 Glass Master 2 Electrode 3 Motor 4 Electrode Basket 5 Electrode Brush 6 Electrolyte 7 Power Supply 8 Switcher 9 Bath 20 Glass Plate 21 Resist 22, 23 Metal Layer
Claims (4)
原盤から電気めっきによりニッケルスタンパを製造する
方法であって、スルファミン酸ニッケル、塩化ニッケ
ル、ほう酸を主成分とする電解液中でニッケルイオンを
供給するニッケル材を入れる電極バスケットを陽極、デ
ィスク原盤を陰極とし、陰極電流を断続的に通電してニ
ッケルの形成を行うことを特徴とするニッケルスタンパ
の製造方法。1. A method of manufacturing a nickel stamper by electroplating from a disk master having an uneven signal or groove, wherein nickel ions are contained in an electrolytic solution containing nickel sulfamate, nickel chloride and boric acid as main components. A method for producing a nickel stamper, characterized in that an electrode basket containing a nickel material to be supplied is used as an anode and a disk master is used as a cathode, and a cathode current is intermittently applied to form nickel.
原盤から電気めっきによりニッケルスタンパを製造する
方法であって、スルファミン酸ニッケル、塩化ニッケ
ル、ほう酸を主成分とする電解液中でニッケルイオンを
供給するニッケル材と、それを入れる電極バスケットを
陽極、ディスク原盤を陰極とし、ディスク原盤表面に3
00μm程度のニッケルを形成した後、電極バスケット
とディスク原盤の極性を反転させることにより、ニッケ
ル表面を電解研磨することを特徴とするニッケルスタン
パの製造方法。2. A method for manufacturing a nickel stamper by electroplating from a disk master having an uneven signal or groove formed therein, wherein nickel ions are contained in an electrolytic solution containing nickel sulfamate, nickel chloride and boric acid as main components. The nickel material to be supplied and the electrode basket containing it are used as the anode, and the disk master is used as the cathode.
A method for manufacturing a nickel stamper, which comprises electrolytically polishing the nickel surface by reversing the polarities of the electrode basket and the disk master after forming nickel of about 00 μm.
さいことを特徴とする請求項2記載のニッケルスタンパ
の製造方法。3. The method for manufacturing a nickel stamper according to claim 2, wherein the electric current during electrolytic polishing is smaller than the electric current during formation.
原盤から電気めっきによりニッケルスタンパを製造する
製造装置であって、ディスク原盤を回転させる回転機
構、ニッケル材を入れる電極バスケット、電流を供給す
る電源、電流の流れる方向を切り換える切換器を具備し
たことを特徴とするニッケルスタンパの製造装置。4. A manufacturing apparatus for manufacturing a nickel stamper from a disk master having an uneven signal or groove formed by electroplating, which comprises a rotating mechanism for rotating the disk master, an electrode basket containing nickel material, and an electric current supply. An apparatus for manufacturing a nickel stamper, comprising a switching device that switches a power source and a current flowing direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34188792A JPH06195761A (en) | 1992-12-22 | 1992-12-22 | Manufacture for nickel stamper and manufacturing apparatus therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34188792A JPH06195761A (en) | 1992-12-22 | 1992-12-22 | Manufacture for nickel stamper and manufacturing apparatus therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06195761A true JPH06195761A (en) | 1994-07-15 |
Family
ID=18349513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34188792A Pending JPH06195761A (en) | 1992-12-22 | 1992-12-22 | Manufacture for nickel stamper and manufacturing apparatus therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06195761A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2614812A1 (en) * | 1987-05-07 | 1988-11-10 | Metal Casting Tech | APPARATUS AND METHOD FOR CASTING METAL AGAINST GRAVITY, WITH AIR EXCLUSION |
JP2005004839A (en) * | 2003-06-10 | 2005-01-06 | Hitachi Maxell Ltd | Stamper for forming substrate, glass stamper for forming substrate, resin substrate for optical recording medium, optical recording medium, and method for manufacturing stamper for forming substrate |
-
1992
- 1992-12-22 JP JP34188792A patent/JPH06195761A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2614812A1 (en) * | 1987-05-07 | 1988-11-10 | Metal Casting Tech | APPARATUS AND METHOD FOR CASTING METAL AGAINST GRAVITY, WITH AIR EXCLUSION |
JP2005004839A (en) * | 2003-06-10 | 2005-01-06 | Hitachi Maxell Ltd | Stamper for forming substrate, glass stamper for forming substrate, resin substrate for optical recording medium, optical recording medium, and method for manufacturing stamper for forming substrate |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH06195761A (en) | Manufacture for nickel stamper and manufacturing apparatus therefor | |
EP1044776B1 (en) | Nickel plating of a mould using pulsating current | |
JPH07241856A (en) | Manufacture of electroformed duplicate stamper | |
JPH0935337A (en) | Production of stamper for optical disk | |
JP4221954B2 (en) | Electroforming method and electrodeposit | |
JPH052776A (en) | Production of stamper | |
JPS5989782A (en) | Electroforming method of stamper for rotary recording body | |
JPS6156292A (en) | Electroforming device | |
JPH10106048A (en) | Method of making and processing stamper for information recording disk and device therefor, and stamper and information recording disk | |
JPS6156293A (en) | Apparatus for producing stamper | |
JPH09291390A (en) | Production of stamper | |
JPH09262733A (en) | Holding device for stamper | |
JPH04259936A (en) | Production of stamper for producing information recording medium | |
JPH09228100A (en) | Electrolytic degreasing and cleaning device for stamper for optical disk | |
JP3225556B2 (en) | Manufacturing method of optical disk stamper | |
JPH076414A (en) | Method for electroforming stamper for production of optical recording medium | |
JPH052778A (en) | Electrocasting device and production of stamper by using this device | |
JPS60182031A (en) | Information recording mother disk and its production | |
JPH076413A (en) | Electro forming device and electro forming method for stamper for production of optical recording medium | |
JPH05320973A (en) | Electroforming device | |
JPH059775A (en) | Production of stamper | |
JPH0927148A (en) | Production of stamper | |
JPH07109595A (en) | Glass substrate for optical master disk and plating method therefor | |
JPH02137916A (en) | Manufacture of stamper | |
JPH08180474A (en) | Manufacture of stamper |