JPH0619382A - Exposing device for lippmann hologram - Google Patents

Abstract

PURPOSE:To reduce the influence of disturbance such as vibration and a flow of air and to facilitate the setting by utilizing a diffusion plate which has surface unevenness formed on the reverse surface on the opposite side from a photosensitive material as the substrate. CONSTITUTION:The diffusion substrate which has the surface unevenness formed on the reverse surface on the opposite side from the photosensitive material 2 is used as the substrate 1. Namely, when, for example, an argon laser oscillator 3 oscillates light having a 514.5nm wavelength after a dry plate 3 formed by coating the smooth surface of the diffusion substrate 1 such as frosted glass with, for example, gelatine bichromate as the photosensitive material 2 is set together with respective optical equipments, the laser light is made incident as parallel light on the dry plate 3 through a reflecting mirror 12, a reflecting mirror 13, a microscope objective 14, a pinhole 15, and a concave mirror 16, and transmitted through the dry plate 3, so that interference fringes are formed with light which is diffused and reflected by the reverse surface of the substrate where the surface unevenness is formed and the incident light. Then the hologram of high display quality is manufactured by normal development processing.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a window glass or vehicle body for automobiles, a window glass for construction, a building wall, a partition, furniture, a toy, etc. The present invention relates to an exposure device for a Lippmann hologram used as a hologram or the like.

[0002]

2. Description of the Related Art A hologram display uses a display to specifically record a stereoscopic image or a planar image to be displayed. However, figures, patterns, etc. are fixed and images other than the recorded image are fixed. Since the display cannot be performed, the applicant of the present invention is a holographic ornament in which a part of the hologram that reflects the illumination light is masked or the hologram itself is cut out to display a design such as characters, figures and patterns. Is Jinhei 4-4035
Filed as No. 9.

Although there is no known exposure apparatus for such a hologram that diffuses and reflects, there is an exposure apparatus called a shadow hologram as an apparatus that uses a diffusion plate to perform exposure. In this apparatus, as shown in FIG. 2, both the front and back surfaces of the substrate are made smooth, a diffusion plate is provided close to this substrate, and an object is placed between the diffusion plate and the substrate for exposure. It is possible to produce a Lippmann hologram that diffuses and reflects when exposed to light.

However, in such an exposure apparatus, although the diffusing plate is provided near the dry plate, since the exposure is performed separately, the diffraction efficiency of the hologram is affected by the influence of disturbance such as vibration and air flow. There is a risk that the quality of the exposed hologram may be lowered.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an exposure apparatus which eliminates the influence of disturbance such as vibration and air flow, and which allows easy setting of an optical system. .

[0006]

SUMMARY OF THE INVENTION The present invention is an apparatus for exposing a Lippmann hologram by irradiating light from a laser light source from both sides of a light-sensitive material adhered to a substrate, wherein the substrate is opposite to the light-sensitive material. The diffusing plate having the surface irregularity formed on the back surface of the substrate is used, and the back surface of the substrate having the surface irregularity may be covered with the high reflection layer.

[0007]

In the exposure apparatus of the present invention, when exposing a Lippmann hologram, the substrate uses a diffusion plate having a surface irregularity on the back surface of the substrate opposite to the photosensitive material. They are integrated and greatly reduce the effects of vibration and air flow.

That is, the light reflected or transmitted by the diffuser plate behaves as if there were a set of point light sources on the diffuser surface.
If the dry plate and the diffuser plate are separated, vibration causes the dry plate (sensitive material).
The relative position of the light source with respect to changes, and the desired hologram cannot be obtained. Also, if there is a change in the air flow between the dry plate (sensitive material) and the light source, the fluctuation of the air density will also disturb the wavefront of the light and reduce the quality of the hologram. It is possible to significantly reduce the influence of such a disturbance by using the exposure apparatus, and the use of the exposure apparatus according to the first embodiment simplifies the optical system, which makes it less susceptible to the influence of the disturbance, and is extremely easy to set. Is something that can be done.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to the drawings.
explain. 1 to 3 are schematic views of main parts showing an exposure apparatus according to Embodiments 1 to 3 of the present invention.

Example 1 A substrate has surface irregularities formed on the back surface of the substrate opposite to the photosensitive material.
An example of an exposure apparatus that uses a diffusion plate that does not cover anything on the back surface of the substrate will be described.

As shown in FIG. 1, a photosensitive material 2 such as dichromated gelatin is applied to the smooth surface of a diffusion substrate 1 such as frosted glass.
After setting the dry plate 3 coated as above with each optical device, for example, the argon laser oscillators 11 to 51
When oscillating a light having a wavelength of 4.5 nm, the laser light is incident on the dry plate 3 as parallel light through the reflecting mirror 12, the reflecting mirror 13, the microscope objective lens 14, the pinhole 15 and the concave mirror 16 and is transmitted through the dry plate 3. Then, interference fringes are formed by the light diffusely reflected by the back surface of the substrate on which the surface irregularities are formed and the incident light. After that, a normal development process can be performed to produce a hologram with high display quality.

The hologram thus obtained is peeled from the substrate and covered with a protective film or the like, and is adhered to another substrate masked with desired characters or figures, or the hologram is shaped into characters or figures. It is possible to obtain a decorative hologram by cutting it out and adhering it to another substrate.

When a light source such as a white light source is irradiated on this, it is diffracted by the hologram toward the light source side, but since this hologram is diffused and reflected, it is as if the light source is on the hologram surface from an observer in a wide range on the light source side. Bright,
In addition, it is possible to visually recognize letters, figures, etc. around the edge.

Example 2 The substrate has surface irregularities formed on the back surface of the substrate opposite to the photosensitive material,
An example of an exposure apparatus that uses a diffusion plate that does not cover anything on the back surface of the substrate and allows light to enter from both sides of the dry plate will be described.

As shown in FIG. 2, the dry plate 3 having the same structure as that of the first embodiment is set together with the respective optical devices, and then, for example, when the light having a wavelength of 514.5 nm is oscillated from the argon laser oscillator 11, the laser light is reflected. The laser light travels in the order of the mirror 12 and the beam splitter 17, and the laser light is split into two by the beam splitter 17, one of which is a parallel light through the microscope objective lens 14, the pinhole 15 and the concave mirror 16, and the other is a reflecting mirror 18 and a reflecting mirror. 19, a microscope objective lens 20, a pinhole 21, and a spherical wave are incident on the dry plate 3, respectively, and the other light is diffused by the surface irregularities on the back surface of the dry plate and reaches the sensitive material. It is formed. After that, a normal development process can be performed to produce a hologram with high display quality.

The hologram thus obtained can be applied as a decorative hologram as in the first embodiment. Third Embodiment A third embodiment shown in FIG. 3 has the same configuration as that of the first embodiment except that silver paint is applied as the high reflection film 4 to the back surface of the diffusion plate 1 of the first embodiment on which the surface irregularities are formed. In the first embodiment, not all the light is diffusely reflected from the uneven surface of the back surface of the diffusion substrate, and there is light that leaks out. However, according to the apparatus of this embodiment, It is most preferable because there is almost no light leaking to the surface, efficient exposure is possible, and the setting of the exposure device is easy.

The preferred embodiments have been described above, but the present invention is not limited to these, and various applications are possible. For a diffuser plate with one surface that is smooth and the other back surface that has irregularities, if you use a diffuser plate that has a smaller pattern, such as a satin pattern or a stitch pattern, than the frosted glass, it is a fine pattern. Characters and the like can be displayed with and a material such as resin such as polycarbonate or acrylic can be used.
In addition to silver, the high-reflection film coated on the uneven surface is a metal film of copper, aluminum, gold, etc., or other various high-reflection films such as metal oxides. A film obtained by a method such as vapor deposition can be used.

As the light-sensitive material, besides silver dichromate gelatin, a silver halide light-sensitive material, various photopolymers, photoresists, etc. may be appropriately selected and used. As the laser light source at the time of exposure, an argon laser of various wavelengths, a xenon laser, a He-Ne laser, or the like may be appropriately selected and used depending on the wavelength at the time of reproduction.

[0019]

The exposure apparatus of the present invention can significantly reduce the influence of disturbance such as vibration and air flow, and the optical system can be simplified, which makes it less susceptible to the influence of disturbance. The setting is extremely easy.

Particularly, the exposure apparatus as shown in the first and third embodiments can set the optical system very easily.

[Brief description of drawings]

FIG. 1 is a schematic diagram showing a main part of an exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is a schematic diagram showing a main part of an exposure apparatus according to a second embodiment of the present invention.

FIG. 3 is a schematic diagram showing a main part of an exposure apparatus according to a third embodiment of the present invention.

[Explanation of symbols]

 1 Substrate 2 Sensitive Material 3 Dry Plate 4 High Reflection Film 11 Laser Oscillator 12, 13, 18, 19 Reflector 14, 20 Microscope Objective Lens 16 Concave Mirror 17 Beam Splitter

Claims (2)

[Claims] 1. An apparatus for exposing a Lippmann hologram by irradiating light from a laser light source from both sides of a sensitive material adhered to a substrate, wherein the substrate has surface irregularities on the back surface of the substrate opposite to the sensitive material. An exposure apparatus for a Lippmann hologram, characterized in that the above diffusion plate is used. 2. The exposure apparatus for a Lippmann hologram according to claim 1, wherein the back surface of the substrate having surface irregularities is covered with a high reflection film.