JPH05134593A - Hologram exposing method - Google Patents

Hologram exposing method

Info

Publication number
JPH05134593A
JPH05134593A JP3320948A JP32094891A JPH05134593A JP H05134593 A JPH05134593 A JP H05134593A JP 3320948 A JP3320948 A JP 3320948A JP 32094891 A JP32094891 A JP 32094891A JP H05134593 A JPH05134593 A JP H05134593A
Authority
JP
Japan
Prior art keywords
hologram
photosensitive material
support structure
filter plate
antireflection coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3320948A
Other languages
Japanese (ja)
Other versions
JP3135320B2 (en
Inventor
Shotaro Takenobu
省太郎 武信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP03320948A priority Critical patent/JP3135320B2/en
Publication of JPH05134593A publication Critical patent/JPH05134593A/en
Application granted granted Critical
Publication of JP3135320B2 publication Critical patent/JP3135320B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Holo Graphy (AREA)
  • Instrument Panels (AREA)

Abstract

PURPOSE:To obtain the exposing method which eliminates the reflection on the rear surface and facilitates handling at the time of exposing in the production of a hologram. CONSTITUTION:An antireflection film 1 is provided on an ND filter plate 2 to form a supporting structural body 3a. A photosensitive material 4 for the hologram is put by the supporting structural bodies 3a therebetween in such a manner that the antireflection films 1 is disposed on the outer side and is irradiated with coherent light from both sides, by which the hologram of a reflection type is produced. The hologram of a transmission type is produced by joining the supporting structural body 3a and the photosensitive material 4 for the hologram in such a manner that the surface of the structural body having no antireflection film 1 comes into contact with the photosensitive material and irradiating the hologram with the coherent light from the one surface 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、裏面反射による不要格
子を低減する、ホログラムの露光方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hologram exposure method for reducing unnecessary grating due to back surface reflection.

【0002】[0002]

【従来の技術】車両内の運転手等に情報表示する方法と
して、ヘッドアップディスプレイが最近用いられるよう
になっている。これは、液晶表示装置等の発光表示手段
から投射された光学的情報を、ハーフミラー等からなる
コンバイナーに映し、運転手が運転状態からほとんど視
線を動かすことなく情報を読み取れるようにしたもので
ある。
2. Description of the Related Art A head-up display has recently been used as a method of displaying information to a driver in a vehicle. This is a system in which optical information projected from a light emitting display means such as a liquid crystal display device is displayed on a combiner composed of a half mirror or the like so that the driver can read the information from the driving state without moving the line of sight. ..

【0003】最近、光学的素子としての簡素さ、及び付
加される機能の豊富さから、上記のコンバイナーとして
ホログラムが注目されるようになっている。このホログ
ラフィックコンバイナーは反射機能(回折機能)のみな
らず、レンズ機能等を併せ持つことができるので、光学
的情報を運転手の視野方向に回折したり、或は、他にレ
ンズ等の光学系を使用せず、任意の位置に結像したりす
ることが可能となる。また、前景輝度を損なわずに高輝
度の表示像が得られるという特徴もある。
Recently, holograms have been attracting attention as the above combiner because of their simplicity as an optical element and the abundance of added functions. Since this holographic combiner can have not only the reflection function (diffraction function) but also the lens function and so on, it can diffract optical information in the driver's visual field direction, or use other optical systems such as lenses. It is possible to form an image at an arbitrary position without using it. Another feature is that a high-luminance display image can be obtained without impairing the foreground luminance.

【0004】かかるホログラフィックコンバイナーなど
に使用するホログラムの作製において、感光材に2つ以
上のレーザー光等のコヒーレント光を照射して作製して
いたが、その際、図3に概念的断面図として示すように
支持ガラス5及び感光材4からの裏面反射光7が露光の
際に作用し、不要格子を作っていた。そのため、支持ガ
ラスと感光材の両側にインデックスマッチング液を介し
て反射防止被膜付ガラスを用いて裏面反射を低減させる
方法が提案されている。また、図4に示したように、反
射光を吸収低減させるため、反射防止被膜付ガラス9と
感光材4との間にND(Neutral Densit
y)フィルター板2を挿入して裏面反射光を低減させる
方法が提案されている。
In producing a hologram used for such a holographic combiner, a photosensitive material was produced by irradiating two or more laser light beams or other coherent light. At that time, a conceptual sectional view is shown in FIG. As shown, the back surface reflected light 7 from the supporting glass 5 and the photosensitive material 4 acted upon exposure to form an unnecessary lattice. Therefore, there has been proposed a method of reducing backside reflection by using glass with an antireflection coating on both sides of a supporting glass and a photosensitive material via an index matching liquid. Further, as shown in FIG. 4, in order to absorb and reduce the reflected light, an ND (Neutral Densit) is provided between the glass 9 with the antireflection coating and the photosensitive material 4.
y) A method of inserting the filter plate 2 to reduce back surface reflected light has been proposed.

【0005】[0005]

【発明が解決しようとする課題】従来提案されている露
光方法では、支持体、感光材と異なる屈折率の界面で生
ずる裏面反射光のため、不要な格子が作られてしまう。
この裏面反射光を低減するために反射防止被膜付ガラス
を用いた露光方法では、充分除去できない。さらにND
フィルター板を挿入した露光方法では、界面が多層にな
るため裏面反射が発生してしまい、またハンドリングが
複雑になる等の欠点がある。
In the conventionally proposed exposure method, an unnecessary grating is formed due to the back-reflected light generated at the interface having a refractive index different from that of the support and the photosensitive material.
It cannot be sufficiently removed by an exposure method using glass with an antireflection coating in order to reduce the light reflected on the back surface. Furthermore ND
The exposure method in which a filter plate is inserted has drawbacks such as back surface reflection occurring because of a multi-layered interface and complicated handling.

【0006】本発明の目的は、従来技術が有していた前
述の欠点を解決しようとするものであり、従来知られて
いなかった裏面反射光を低減したホログラムの露光方法
を提供することを目的とするものである。
An object of the present invention is to solve the above-mentioned drawbacks of the prior art, and an object of the present invention is to provide a hologram exposure method in which back reflection light which has not been known has been reduced. It is what

【0007】[0007]

【課題を解決するための手段】本発明は、前述の課題を
解決すべくなされたものであり、一対の支持構造体の間
にホログラム用感光材を挟持してホログラム用感光材に
表裏2方向からコヒーレント光を照射する反射型ホログ
ラム作製時の露光方法において、上記支持構造体とし
て、少なくとも一層に、ホログラム用感光材と接する面
の反対側表面に反射防止被膜が設けられてなるND(N
eutralDensity)フィルター板を有する支
持構造体を使用することを特徴とするホログラム露光方
法を提供するものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and a hologram photosensitive material is sandwiched between a pair of support structures to form a hologram photosensitive material in two directions. In the method of exposure for producing a reflection hologram in which coherent light is radiated from at least one of the support structures, at least one layer is provided with an antireflection coating on the surface opposite to the surface in contact with the hologram photosensitive material.
The present invention provides a hologram exposure method characterized by using a support structure having an Euden Density) filter plate.

【0008】また、支持構造体にホログラム用感光材を
支持して、ホログラム用感光材側の2方向からコヒーレ
ント光を照射する透過型ホログラム作製時の露光方法に
おいて、上記支持構造体として、少なくとも一層に、ホ
ログラム用感光材と接する面の反対側表面に反射防止被
膜が設けられてなるNDフィルター板を有する支持構造
体を使用することを特徴とするホログラム露光方法を提
供するものである。
Further, in the exposure method at the time of producing the transmission hologram in which the hologram photosensitive material is supported on the support structure and the coherent light is irradiated from two directions on the hologram photosensitive material side, at least one of the support structures is used. The present invention also provides a hologram exposure method characterized by using a support structure having an ND filter plate having an antireflection coating on the surface opposite to the surface in contact with the hologram photosensitive material.

【0009】ここで、ホログラム用感光材としては、ポ
リビニルカバゾール、重クロム酸ゼラチン、光レジス
ト、フォトポリマー、銀塩など種々の感光材を用いるこ
とができる。
As the hologram photosensitive material, various photosensitive materials such as polyvinylcapazole, dichromated gelatin, photoresist, photopolymer and silver salt can be used.

【0010】本発明にかかる方法の1つの特徴は、露光
時のホログラム用感光材を支持する構造体の少なくとも
一層は反射防止被膜を有するNDフィルターとなってい
ることであり、また、必要に応じて、支持構造体は透明
支持板/インデックスマッチング液/NDフィルター板
/反射防止被膜という構造になっている。
One of the features of the method according to the present invention is that at least one layer of the structure for supporting the hologram photosensitive material at the time of exposure is an ND filter having an antireflection coating, and if necessary. The support structure has a structure of transparent support plate / index matching liquid / ND filter plate / antireflection coating.

【0011】反射防止被膜としては、SiO2、MgF2、CeF3
等の低屈折率の無機物やフッ素樹脂、ポリイミド樹脂等
の低屈折率有機物の単層、あるいは上記低屈折率の材料
からなる低屈折率膜を少なくとも一層有する多層系の干
渉膜、または微小な凹凸を有する膜等が採用できる。ま
た、形成法としては、蒸着、スパッタ法等の物理的形成
法、CVD等の化学的形成法、スプレー法等の湿式形成
法を用いることができる。
As the antireflection coating, SiO 2 , MgF 2 and CeF 3 are used.
Such as a low refractive index inorganic substance or a fluororesin, a polyimide resin or other low refractive index organic single layer, or a multilayer interference film having at least one low refractive index film made of the above low refractive index material, or minute unevenness A film or the like having As the forming method, a physical forming method such as vapor deposition or sputtering, a chemical forming method such as CVD, or a wet forming method such as a spray method can be used.

【0012】図1(a)は反射型ホログラム作製時の露
光を行う際の感光材を支持する方法を示す断面図であ
る。NDフィルター板2に反射防止被膜1を設け、支持
構造体3aを作る。反射型のホログラムを作製する際に
ホログラム用感光材4に照射するコヒーレント光は、ホ
ログラム用感光材の両面から照射するので、反射防止被
膜1が外側になるように支持構造体3aでホログラム用
感光材4を挟持する。この際、ホログラム用感光材4と
支持構造体3aの間にインデックスマッチング液が介在
しても良い。
FIG. 1 (a) is a sectional view showing a method of supporting a photosensitive material during exposure during the production of a reflection hologram. The antireflection coating 1 is provided on the ND filter plate 2 to form the support structure 3a. The coherent light that is applied to the hologram photosensitive material 4 when a reflection-type hologram is produced is applied from both sides of the hologram photosensitive material, so that the support structure 3a exposes the hologram photosensitive material to the outside so that the antireflection coating 1 is on the outside. The material 4 is clamped. At this time, an index matching liquid may be interposed between the hologram photosensitive material 4 and the support structure 3a.

【0013】インデックスマッチング液としては、キシ
レン、グリセリン等の屈折率の調整が可能な透明液が用
いられる。インデックスマッチング液層の厚みは、毛細
管現象によってインデックスマッチング液が注入されう
る程度に薄いことが望ましい。
As the index matching liquid, a transparent liquid such as xylene or glycerin whose refractive index can be adjusted is used. The thickness of the index matching liquid layer is desirably thin enough to allow the index matching liquid to be injected by the capillary phenomenon.

【0014】コヒーレント光の照射は例えば図5(a)
に示す方法が挙げられる。レーザー光発振装置10から
発生するレーザー光をビームスプリッタ12により2光
束に分割する。その後分割されたそれぞれのレーザービ
ームをミラー13及び14で反射して、レンズ16及び
15を通して拡散し、感光材の両面から2つの光を照射
する。
Irradiation of coherent light is shown in FIG.
The method shown in is mentioned. The laser light generated from the laser light oscillator 10 is split into two light beams by the beam splitter 12. After that, the divided laser beams are reflected by mirrors 13 and 14, diffused through lenses 16 and 15, and two lights are emitted from both sides of the photosensitive material.

【0015】図1(b)は透過型ホログラム作製時の露
光を行う際の感光材を支持する方法を示す断面図であ
る。透過型のホログラムを作製する際に照射する2種の
コヒーレント光は、ホログラム用感光材の一方の面側か
ら照射する。このときはホログラム用感光材4が支持構
造体3aと反射防止被膜1のない面で接するように、ホ
ログラム用感光材の片面に接合し、ホログラム用感光材
側の面にコヒーレント光を照射する。
FIG. 1B is a cross-sectional view showing a method of supporting a photosensitive material when performing exposure for producing a transmission hologram. The two types of coherent light that are emitted when a transmissive hologram is produced are emitted from one surface side of the hologram photosensitive material. At this time, the hologram photosensitive material 4 is bonded to one surface of the hologram photosensitive material so that the supporting structure 3a is in contact with the surface without the antireflection coating 1, and the surface on the hologram photosensitive material side is irradiated with coherent light.

【0016】透過型のホログラムを作製する際のコヒー
レント光を照射する方法は例えば図5(b)に示すとお
りである。ここでは同じ部材には図5(a)と同じ符号
を用い、説明は省略する。
The method of irradiating the coherent light in producing the transmission type hologram is as shown in FIG. 5 (b), for example. Here, the same members are designated by the same reference numerals as those in FIG. 5A, and description thereof will be omitted.

【0017】図2(a)及び(b)にホログラム用感光
材4の別の支持方法を示す。図2(a)は反射型ホログ
ラム作製時の支持方法、図2(b)は透過型ホログラム
作製時の支持方法を示している。
FIGS. 2A and 2B show another method of supporting the hologram photosensitive material 4. FIG. 2A shows a supporting method at the time of producing a reflection hologram, and FIG. 2B shows a supporting method at the time of producing a transmission hologram.

【0018】この場合において、ホログラム用感光材4
は透明支持板5にあらかじめ支持されている。即ち、少
なくとも一方の支持構造体3bは、透明支持板/インデ
ックスマッチング液/NDフィルター板/反射防止被膜
という構造を有することになる。また、透明支持板5と
してはガラス板もしくはポリエチレンテレフタレート等
のプラスチック板を用いる。
In this case, the hologram photosensitive material 4
Are previously supported by the transparent support plate 5. That is, at least one of the support structures 3b has a structure of transparent support plate / index matching liquid / ND filter plate / antireflection coating. As the transparent support plate 5, a glass plate or a plastic plate such as polyethylene terephthalate is used.

【0019】これらの場合のホログラム露光について
も、図5(a)、(b)に示したような配置で、図1
(a)、(b)の様にホログラムを支持した場合と同様
に行えば良い。
Also in the hologram exposure in these cases, the arrangement as shown in FIGS.
It may be performed in the same manner as in the case where the hologram is supported as in (a) and (b).

【0020】[0020]

【作用】支持構造体3は、反射防止被膜1とNDフィル
ター板2を一体化し、場合によってはインデックスマッ
チング液6等を介してホログラム用感光材4に接合して
いる。このため、コヒーレント光を照射する際に、どの
方向からの入射コヒーレント光に対しても入射方向の反
対側に反射防止被膜があるために、露光時の裏面反射が
低減されている。また、コヒーレント光はNDフィルタ
ー板を透過するために、波長特性を変えることなく反射
光の強度を減衰することができる。
In the support structure 3, the antireflection coating 1 and the ND filter plate 2 are integrated and bonded to the hologram photosensitive material 4 via the index matching liquid 6 or the like in some cases. For this reason, when irradiating the coherent light, the antireflection coating is provided on the side opposite to the incident direction with respect to the incident coherent light from any direction, so that the back surface reflection at the time of exposure is reduced. Moreover, since the coherent light passes through the ND filter plate, the intensity of the reflected light can be attenuated without changing the wavelength characteristic.

【0021】[0021]

【実施例】以下、本発明による実施例を説明する。EXAMPLES Examples according to the present invention will be described below.

【0022】(実施例1)支持構造体として図1(a)
に示すような構造を有する反射防止被膜付NDフィルタ
ー板3aにより、ホログラム用感光材4を挟持した。こ
こで、ホログラム用感光材4としてはフォトポリマー
を、反射防止被膜付NDフィルター板3aとしては、Si
O2系の反射防止被膜をNDフィルター板上に蒸着により
形成したものを用いた。さらに、図5(a)に示すよう
な配置でホログラム用感光材4の露光を行ったところ、
裏面反射が低減されて、不要な格子のない反射型ホログ
ラムが作製できた。ここでレーザー光発振装置10とし
てはアルゴンイオンレーザーを用いた。
(Embodiment 1) FIG. 1A as a supporting structure.
The hologram photosensitive material 4 was sandwiched by the ND filter plate 3a with the antireflection coating having the structure shown in FIG. Here, photopolymer is used as the hologram photosensitive material 4, and Si is used as the ND filter plate 3a with the antireflection coating.
An O 2 -based antireflection coating formed by vapor deposition on an ND filter plate was used. Further, when the hologram photosensitive material 4 was exposed in the arrangement as shown in FIG.
Back reflection was reduced, and a reflection hologram having no unnecessary grating could be produced. Here, an argon ion laser was used as the laser light oscillation device 10.

【0023】(実施例2)実施例1においてホログラム
用感光材4を図1(b)のごとく支持し、露光の光学配
置として図5(b)に示すようなものを採用する以外は
実施例1と同様に行い、裏面反射が低減されて、不要な
格子のない透過型ホログラムが作製できた。
(Embodiment 2) Embodiment 2 is the same as Embodiment 1 except that the hologram photosensitive material 4 is supported as shown in FIG. 1B and the optical arrangement for exposure is as shown in FIG. 5B. The same procedure as in No. 1 was performed, but the back surface reflection was reduced, and a transmission hologram having no unnecessary grating could be produced.

【0024】[0024]

【発明の効果】本発明によれば、ホログラム作製時の露
光の際、支持体及び感光材と異なる屈折率の界面で生ず
る裏面反射光を反射防止被膜とNDフィルター板の両方
で低減しかつ両者を一体とするため、多層界面による不
要格子を低減させることができ、また反射防止被膜付ガ
ラスにNDフィルター板と多層に渡っておらず、ハンド
リングの困難さも克服している。
According to the present invention, the back-reflected light generated at the interface between the support and the photosensitive material having a refractive index different from that of the support and the photosensitive material is reduced by both the antireflection coating and the ND filter plate during exposure during hologram production. Since it is integrated, the unnecessary lattice due to the multilayer interface can be reduced, and the glass with the antireflection coating does not extend to the multilayer with the ND filter plate, and the handling difficulty is overcome.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の方法に用いる支持構造体を示す断面図FIG. 1 is a cross-sectional view showing a support structure used in the method of the present invention.

【図2】本発明の方法に用いる支持構造体を示す断面図FIG. 2 is a cross-sectional view showing a support structure used in the method of the present invention.

【図3】従来の裏面反射光の概念図FIG. 3 is a conceptual diagram of conventional backside reflected light.

【図4】従来の露光時の支持構造を示す断面図FIG. 4 is a cross-sectional view showing a conventional support structure during exposure.

【図5】本発明の露光方法を示す概念図FIG. 5 is a conceptual diagram showing an exposure method of the present invention.

【符号の説明】 1 反射防止被膜 2 NDフィルター板 3 支持構造体 4 ホログラム用感光材 5 透明支持板 6 インデックスマッチング液 7 裏面反射光 8 入射光 9 反射防止被膜付ガラス 10 レーザー光発振装置 11,13,14 ミラー 12 ビームスプリッタ 15,16 レンズ[Explanation of Codes] 1 Antireflection Coating 2 ND Filter Plate 3 Support Structure 4 Hologram Photosensitive Material 5 Transparent Support Plate 6 Index Matching Liquid 7 Back Reflected Light 8 Incident Light 9 Glass with Antireflection Coating 10 Laser Light Oscillator 11, 13,14 Mirror 12 Beam splitter 15,16 Lens

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】一対の支持構造体の間にホログラム用感光
材を挟持してホログラム用感光材に表裏2方向からコヒ
ーレント光を照射する反射型ホログラム作製時の露光方
法において、 上記支持構造体として、少なくとも一層に、ホログラム
用感光材と接する面の反対側表面に反射防止被膜が設け
られてなるND(Neutral Density)フ
ィルター板を有する支持構造体を使用することを特徴と
するホログラム露光方法。
1. An exposure method for producing a reflection hologram in which a hologram photosensitive material is sandwiched between a pair of support structures and the hologram photosensitive material is irradiated with coherent light from two directions, front and back, in the exposure method. A hologram exposure method characterized by using a support structure having an ND (Neutral Density) filter plate having an antireflection coating on at least one layer opposite to the surface in contact with the hologram photosensitive material.
【請求項2】支持構造体にホログラム用感光材を支持し
て、ホログラム用感光材側の2方向からコヒーレント光
を照射する透過型ホログラム作製時の露光方法におい
て、 上記支持構造体として、少なくとも一層に、ホログラム
用感光材と接する面の反対側表面に反射防止被膜が設け
られてなるNDフィルター板を有する支持構造体を使用
することを特徴とするホログラム露光方法。
2. An exposure method for producing a transmissive hologram in which a hologram photosensitive material is supported on a support structure, and coherent light is emitted from two directions on the hologram photosensitive material side, wherein at least one layer is used as the support structure. In the hologram exposure method, a support structure having an ND filter plate having an antireflection coating on the surface opposite to the surface in contact with the hologram photosensitive material is used.
【請求項3】支持構造体として、ホログラムと接する面
側から透明支持板/インデックスマッチング液/NDフ
ィルター板/反射防止被膜という構造を有する支持構造
体を使用することを特徴とする請求項1または2に記載
のホログラム露光方法。
3. A support structure having a structure of a transparent support plate / index matching liquid / ND filter plate / anti-reflection coating from the side in contact with the hologram is used as the support structure. 2. The hologram exposure method according to item 2.
JP03320948A 1991-11-08 1991-11-08 Hologram exposure method Expired - Fee Related JP3135320B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03320948A JP3135320B2 (en) 1991-11-08 1991-11-08 Hologram exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03320948A JP3135320B2 (en) 1991-11-08 1991-11-08 Hologram exposure method

Publications (2)

Publication Number Publication Date
JPH05134593A true JPH05134593A (en) 1993-05-28
JP3135320B2 JP3135320B2 (en) 2001-02-13

Family

ID=18127080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03320948A Expired - Fee Related JP3135320B2 (en) 1991-11-08 1991-11-08 Hologram exposure method

Country Status (1)

Country Link
JP (1) JP3135320B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000068728A1 (en) * 1999-05-10 2000-11-16 Asahi Glass Company, Limited Hologram display device and production method for transmitting diffusion hologram suitable therefor
JP2016188907A (en) * 2015-03-30 2016-11-04 セイコーエプソン株式会社 Volume holographic element, method for manufacturing volume holographic element, and display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6545778B2 (en) 1909-05-10 2003-04-08 Asahi Glass Company, Limited Holographic display device and method for producing a transmission diffusion hologram suitable for it
WO2000068728A1 (en) * 1999-05-10 2000-11-16 Asahi Glass Company, Limited Hologram display device and production method for transmitting diffusion hologram suitable therefor
JP2016188907A (en) * 2015-03-30 2016-11-04 セイコーエプソン株式会社 Volume holographic element, method for manufacturing volume holographic element, and display device
US10353343B2 (en) 2015-03-30 2019-07-16 Seiko Epson Corporation Volume holographic element, volume holographic element manufacturing method, and display device

Also Published As

Publication number Publication date
JP3135320B2 (en) 2001-02-13

Similar Documents

Publication Publication Date Title
US4530564A (en) Method and apparatus for production of holographic optical elements
US5726782A (en) Hologram and method of fabricating
EP0536763B1 (en) Hologram
JP2000039515A (en) Light diffusing plate and liquid crystal display device using it
JP2000275408A (en) Light scattering sheet and liquid crystal display device using the same
JPH02157784A (en) Hologram sheet
JPH05134593A (en) Hologram exposing method
JPH05165391A (en) Hologram exposing method
JP3412426B2 (en) Holographic reflector and reflective liquid crystal display using the same
JP2693192B2 (en) Hologram sheet and method of manufacturing the same
JPH07101267A (en) Head up display device
JP2891499B2 (en) Holographic display device
JP3161607B2 (en) Hologram exposure method
JPH04113383A (en) Manufacture of curved-surface hologram
JPH07225546A (en) Production fo reflection type hologram
JPH0713475A (en) Production of hologram
JPH09127336A (en) Reflection type hologram
JPH0669964U (en) Holographic display
JPH09171364A (en) Holographic directional reflection body
JPH06183285A (en) Holographic display
JP2003121827A (en) Hologram reflection plate and reflection type liquid crystal display device using the same
JPH11202742A (en) Original plate for hologram duplication and duplication method for hologram
JPH05113741A (en) Preparation of hologram
CN117008235A (en) Apparatus and method for manufacturing hologram optical element
JPH08122548A (en) Method and device for optical transmission

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees