JPH06187681A - Magneto-optical recording medium - Google Patents

Magneto-optical recording medium

Info

Publication number
JPH06187681A
JPH06187681A JP35458992A JP35458992A JPH06187681A JP H06187681 A JPH06187681 A JP H06187681A JP 35458992 A JP35458992 A JP 35458992A JP 35458992 A JP35458992 A JP 35458992A JP H06187681 A JPH06187681 A JP H06187681A
Authority
JP
Japan
Prior art keywords
magneto
layer
optical recording
recording medium
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP35458992A
Other languages
Japanese (ja)
Inventor
Yujiro Kaneko
裕治郎 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP35458992A priority Critical patent/JPH06187681A/en
Publication of JPH06187681A publication Critical patent/JPH06187681A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a high C/N in even in a small magnetic field by forming a TbDyFeCo film expressed by a specified formula as the magneto-optical recording layer having axis of easy magnetization perpendicular to the film plane and specifying the coercive force of the layer at room temp. a magneto- optical disk for recording, reproducing and erasing of information by using laser light. CONSTITUTION:An interference layer 2, recording layer 3, protective layer 4 and reflecting layer 5 are successively formed on a transparent substrate 1 having grooves consisting of polycarbonate, epoxyacrylate, etc. In this constitution, the magneto-optical recording layer 3 consists of a TbDyFeCo film expressed by the formula and has the axis of easy magnetization perpendicular to the film plane and 2-8 KOe coercive force. Since TbDyFeCo shows a large Kerr rotation angle as 0.25-0.35 degree and low Curie temp. as 140-150 deg.C, the obtd. medium has a high C/N and high sensitivity. In this way, the proportion of TbDy is made lower while the proportion of FeCo is made higher to obtain 2-8 KOe coercive force. In the formula, x, y, and z satisfy 0<x<=0.5, 0.8<=y<1.0 and 0.19<=z<0.21.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はレーザ光を用いて情報の
記録、再生、消去を行う光磁気ディスク等の光磁気記録
媒体に関するものであり、特に低磁界での高C/N化を
目的とした光磁気記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical recording medium such as a magneto-optical disk for recording / reproducing / erasing information by using a laser beam, and particularly to increase C / N in a low magnetic field. And a magneto-optical recording medium.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】光磁気
ディスクはレーザ光を用いて情報の記録、再生及び消去
を行うため、従来からの光ディスクと同様に記憶容量が
大きく、しかも記録層に磁性体を用いているため書き換
えが可能である。又非接触で記録、再生が出来、塵埃の
影響も受けないことから信頼性にも優れている。よって
現在研究開発が活発に行われており、又数年前に商品化
されて以来、光ファイルシステムやパソコンの外部記憶
装置等への展開が急速に進んでいる。
2. Description of the Related Art Since a magneto-optical disk records / reproduces / erases information by using a laser beam, it has a large storage capacity like a conventional optical disk and a magnetic recording layer. Rewriting is possible because the body is used. Moreover, recording and reproducing can be performed in a non-contact manner, and since it is not affected by dust, it has excellent reliability. Therefore, research and development are actively carried out at present, and since it was commercialized several years ago, it has been rapidly expanding to optical file systems and external storage devices of personal computers.

【0003】この光磁気記録層(以下記録層と記す)の
材料としては、TbFeCo、NdDyFeCo、Tb
DyFeCo等の希土類−遷移金属(RE−TM)非晶
質合金が、粒界ノイズが無く、スパッタリングを用いる
ことによって容易に垂直磁化膜が得られることから現在
最も多く用いられている。
Materials for this magneto-optical recording layer (hereinafter referred to as recording layer) are TbFeCo, NdDyFeCo, Tb.
A rare earth-transition metal (RE-TM) amorphous alloy such as DyFeCo is currently most often used because it has no grain boundary noise and a perpendicular magnetization film can be easily obtained by using sputtering.

【0004】また、ここで光磁気記録媒体の消去・記録
原理をまず現在一般に採用されている光変調方式につい
て説明する。データの消去は外部から磁界を与えた状態
でレーザ光を連続照射して熱し、外部磁界と同じ方向に
記録層の磁化をそろえる。データの記録は外部磁界を消
去時から反転させた状態にし、データマークを記録する
ところだけレーザ光の出力を大きくして、記録層を熱
し、記録層の磁化を反転させる。
The principle of erasing / recording of a magneto-optical recording medium will be described first with respect to an optical modulation method which is currently generally adopted. Data is erased by continuously irradiating and heating a laser beam with a magnetic field applied from the outside to align the magnetization of the recording layer in the same direction as the external magnetic field. For data recording, the external magnetic field is reversed from that at the time of erasing, the output of the laser beam is increased only where the data mark is recorded, the recording layer is heated, and the magnetization of the recording layer is reversed.

【0005】一方、磁界変調方式は光変調方式とは逆
で、記録時にレーザ光を連続照射した状態にして、デー
タマークを記録するところに記録方向の磁界を印加する
方式で、光変調方式と違ってダイレクトオーバーライト
が可能であるため将来の記録方式として盛んに開発が進
められている。これら外部磁界は大きすぎると光磁気記
録再生装置内の磁界発生部(電磁石)が大きくなってし
まったり、又消費電力が多くなってしまったりする。特
に磁界変調方式の場合、この問題は重要である。よって
外部磁界はなるべく小さい方が良い。しかし現在の光磁
気記録媒体は少なくとも300(Oe)以上の磁界を印
加しないと十分なC/Nが得られていない。
On the other hand, the magnetic field modulation method is the opposite of the light modulation method, and is a method of applying a magnetic field in the recording direction to a position where a data mark is recorded while continuously irradiating laser light at the time of recording. Differently, since direct overwriting is possible, it is being actively developed as a future recording method. If these external magnetic fields are too large, the magnetic field generating section (electromagnet) in the magneto-optical recording / reproducing apparatus may become large, or power consumption may increase. Especially in the case of the magnetic field modulation method, this problem is important. Therefore, the external magnetic field should be as small as possible. However, current magneto-optical recording media cannot obtain sufficient C / N unless a magnetic field of at least 300 (Oe) is applied.

【0006】本発明はこのような従来の光磁気記録媒体
の欠点を解消するためになされたもので、外部磁界が小
さくても良好な記録・消去が可能な光磁気記録媒体を提
供することを目的とする。
The present invention has been made to solve the above-mentioned drawbacks of the conventional magneto-optical recording medium, and it is an object of the present invention to provide a magneto-optical recording medium capable of excellent recording / erasing even when the external magnetic field is small. To aim.

【0007】[0007]

【課題を解決するための手段及び作用】よって、本発明
者らは、上述の欠点を克服すべく鋭意検討した結果、光
磁気記録層に特定の組成を有するTbDyFeCo膜で
あって、膜面に垂直方向に磁化容易軸を有し室温での保
磁力が2〜8KOeである膜を採用することによって、
特に低磁界で良好な記録及び消去が可能となることを見
出し、本発明を完成するに至った。
Therefore, as a result of intensive studies to overcome the above-mentioned drawbacks, the present inventors have found that the magneto-optical recording layer is a TbDyFeCo film having a specific composition and By adopting a film having an easy axis of magnetization in the perpendicular direction and a coercive force at room temperature of 2 to 8 KOe,
In particular, they have found that good recording and erasing can be performed in a low magnetic field, and have completed the present invention.

【0008】即ち、本発明によれば、透明基板上に少な
くとも光磁気記録層が形成された構成を有する光磁気記
録媒体において、前記光磁気記録層が下記一般式化1で
表わされるTbDyFeCo膜であり、かつ膜面に垂直
方向に磁化容易軸を有し室温での保磁力が2〜8(KO
e)であることを特徴とする光磁気記録媒体が提供され
る。
That is, according to the present invention, in a magneto-optical recording medium having a structure in which at least a magneto-optical recording layer is formed on a transparent substrate, the magneto-optical recording layer is a TbDyFeCo film represented by the following general formula 1. And has an axis of easy magnetization perpendicular to the film surface and a coercive force at room temperature of 2 to 8 (KO
There is provided a magneto-optical recording medium characterized by being e).

【化1】 (但し、0<x≦0.5,0.8≦y<1.0及び0.
19≦z<0.21である) また、本発明によれば、上記構成において、前記光磁気
記録層にAl、Ti、Cr、Pd、Ta、Ptの1種以
上が1〜5原子%含有されていることを特徴とする光磁
気記録媒体が提供される。また、本発明によれば、上記
構成において、透明基板上に少なくとも干渉層、前記光
磁気記録層、保護層及び反射層が順次形成されており、
前記光磁気記録層の膜厚が150〜300Åであること
を特徴とする光磁気記録媒体が提供される。さらに、本
発明によれば、上記構成において、前記反射層がSi、
Ti、Cr、Zr、Mo、Pd、Ta、Ptの1種以上
を1〜4原子%含有するAl合金であることを特徴とす
る光磁気記録媒体が提供される。
[Chemical 1] (However, 0 <x ≦ 0.5, 0.8 ≦ y <1.0 and 0.
19 ≦ z <0.21) Further, according to the present invention, in the above structure, the magneto-optical recording layer contains 1 to 5 atomic% of at least one of Al, Ti, Cr, Pd, Ta and Pt. A magneto-optical recording medium is provided. Further, according to the present invention, in the above structure, at least the interference layer, the magneto-optical recording layer, the protective layer and the reflective layer are sequentially formed on the transparent substrate,
There is provided a magneto-optical recording medium, wherein the magneto-optical recording layer has a film thickness of 150 to 300 Å. Furthermore, according to the present invention, in the above structure, the reflective layer is Si,
There is provided a magneto-optical recording medium characterized by being an Al alloy containing 1 to 4 atomic% of one or more of Ti, Cr, Zr, Mo, Pd, Ta and Pt.

【0009】本発明の光磁気記録媒体を具体的な構成例
に基づき図1に沿って説明する。図1の構成例は、プリ
グルーブ付き透明基板1上に干渉層2、記録層3、保護
層4及び反射層5を順次形成した構成を有する。以下各
要素について詳述する。
The magneto-optical recording medium of the present invention will be described with reference to FIG. 1 based on a specific configuration example. The configuration example of FIG. 1 has a configuration in which an interference layer 2, a recording layer 3, a protective layer 4, and a reflective layer 5 are sequentially formed on a transparent substrate 1 with pregrooves. Each element will be described in detail below.

【0010】(基板)本発明に用いる透明基板1として
は、ポリカーボネート(PC)、ポリメチルメタクリレ
ート(PMMA)、アモルファスポリオレフィン(AP
O)等の樹脂からなる溝付き成形基板、又はアルミノケ
イ酸、バリウム硼珪酸等のガラス表面に溝付き紫外線硬
化樹脂(エポキシアクリレート等)層を形成した基板等
が挙げられる。これらの基板はディスク形状をしてお
り、厚みは0.6〜1.2mm程度である。図1の1A
はガラス基板、1Bは紫外線硬化樹脂層を示したもので
ある。
(Substrate) As the transparent substrate 1 used in the present invention, polycarbonate (PC), polymethylmethacrylate (PMMA), amorphous polyolefin (AP)
Examples thereof include a grooved molded substrate made of a resin such as O) or a substrate having a grooved UV-curable resin (epoxy acrylate etc.) layer formed on the surface of a glass such as aluminosilicate or barium borosilicate. These substrates are disk-shaped and have a thickness of about 0.6 to 1.2 mm. 1A of FIG.
Shows a glass substrate and 1B shows an ultraviolet curable resin layer.

【0011】(干渉層)本発明においては、上記基板1
と記録層3との間に干渉層2を設けている。この干渉層
2には屈折率の高い(1.8以上)透明な膜を用い、こ
の層における再生光の多重反射を利用してみかけのカー
回転角(θk)を増大させ、それによってC(キャリ
ア)レベルを上げ、又反射率を小さくすることでN(ノ
イズ)レベルを下げて、トータルでC/Nを向上させる
ことを目的としている。又、RE−TM非晶質合金のよ
うに酸化等による腐食を起こしやすい材料を記録層3に
用いているため、この干渉層2は記録層3の腐食を防止
する保護膜としての役割りも兼ね備えていなければなら
ない。それには基板1からの水や酸素の侵入を防ぎ、そ
れ自身の耐食性が高く、かつ記録層3との反応性が小さ
いことが必要である。具体的な材料としては、SiO、
SiO2 、Al23 、Ta25 等の金属酸化物、S
i、Al、Zr、Ge等との金属窒化物、ZnS等の金
属硫化物が挙げられるが、特にSi、B、O、Nのうち
少なくともSiとNを含む化合物(SiN、SiON、
SiBN、SiBON)が適している。尚、これらは多
層膜であってもよく、膜厚は屈折率によっても異なる
が、通常トータルで500〜2000Åで好ましくは8
00〜1200Åである。
(Interference Layer) In the present invention, the substrate 1 is used.
The interference layer 2 is provided between the recording layer 3 and the recording layer 3. A transparent film having a high refractive index (1.8 or more) is used for the interference layer 2, and the apparent Kerr rotation angle (θk) is increased by utilizing the multiple reflection of the reproduction light in this layer, and thereby C ( The purpose is to raise the carrier level and decrease the reflectance to lower the N (noise) level, and improve the total C / N. Further, since the recording layer 3 is made of a material such as RE-TM amorphous alloy which is likely to be corroded by oxidation, the interference layer 2 also serves as a protective film for preventing the recording layer 3 from being corroded. You must have both. For that purpose, it is necessary to prevent water and oxygen from entering from the substrate 1, have high corrosion resistance of themselves, and have low reactivity with the recording layer 3. As a specific material, SiO,
Metal oxides such as SiO 2 , Al 2 O 3 and Ta 2 O 5 , S
Examples thereof include metal nitrides such as i, Al, Zr, and Ge, and metal sulfides such as ZnS. Particularly, compounds containing at least Si and N among Si, B, O, and N (SiN, SiON,
SiBN, SiBON) is suitable. It should be noted that these may be multi-layered films, and the film thickness varies depending on the refractive index, but is generally 500 to 2000 Å in total, preferably 8
It is 00 to 1200Å.

【0012】(記録層)本構成例の特徴はこの記録層3
にある。この記録層3は下記の一般式化1で表わされる
TbDyFeCo膜であり、かつ膜面に垂直方向に磁化
容易軸を有し、室温での保磁力が2〜8(KOe)であ
る。
(Recording Layer) This recording layer 3 is characterized by this structural example.
It is in. The recording layer 3 is a TbDyFeCo film represented by the following general formula 1, has an easy axis of magnetization in the direction perpendicular to the film surface, and has a coercive force at room temperature of 2 to 8 (KOe).

【化1】 (但し、0<x≦0.5,0.8≦y<1.0及び0.
19≦z<0.21である) TbDyFeCoは一般にθk(カー回転角)が大きく
(0.25〜0.35deg)かつTc(キュリー温度)
が低い(140〜180℃)ため、高C/Nで高感度な
媒体が実現出来る光磁気記録材料であると言える(特開
昭59−61011号公報)。しかし前述したような低
磁界で高C/Nを得るためにはRE(TbDy)が補償
組成よりも少ないTM(FeCo)リッチな組成でかつ
室温でのHc(保磁力)が2〜8(KOe)である必要
がある。
[Chemical 1] (However, 0 <x ≦ 0.5, 0.8 ≦ y <1.0 and 0.
19 ≦ z <0.21) TbDyFeCo generally has a large θk (Kerr rotation angle) (0.25 to 0.35 deg) and Tc (Curie temperature).
Since it is low (140 to 180 ° C.), it can be said that it is a magneto-optical recording material capable of realizing a medium having high C / N and high sensitivity (JP-A-59-61011). However, in order to obtain a high C / N in a low magnetic field as described above, the composition is rich in RE (TbDy) and has a smaller TM (FeCo) than the compensation composition, and the Hc (coercive force) at room temperature is 2 to 8 (KOe ) Must be.

【0013】尚、記録層3には耐食性を向上させるため
にAl、Cr、Ti、Pt、Pdが少量(1〜5原子
%)が含有されていても良い。膜厚は図1に示したよう
な反射層5を設けた媒体構成の場合は150〜300Å
が適している。反射層5を設けた構成は、記録層3のカ
ー効果とファラデー効果の両方が利用出来るためC/N
(信号対雑音比)やジッター特性に優れている。
The recording layer 3 may contain a small amount (1 to 5 atomic%) of Al, Cr, Ti, Pt and Pd in order to improve the corrosion resistance. The film thickness is 150 to 300 Å in the case of the medium structure having the reflective layer 5 as shown in FIG.
Is suitable. The structure provided with the reflective layer 5 can use both the Kerr effect and the Faraday effect of the recording layer 3 so that the C / N ratio is improved.
Excellent (signal-to-noise ratio) and jitter characteristics.

【0014】(保護層)通常、記録層3上には保護層4
を設ける。但し、設けなくても本発明の効果は損なわれ
ない。この保護層4は空気中(片面仕様の場合)、又は
接着剤(両面仕様の場合)からの水分や酸素又はハロゲ
ン元素のように記録層3に有害な物質の侵入を防止し、
記録層3を保護する目的で設けられるため、干渉層2同
様それ自身の耐食性が高く、記録層3との反応性が小さ
いことが必要である。具体的な材料は干渉層2として挙
げたものと同様である。この保護層4の膜厚はC/Nや
記録感度にも大きな影響を及ぼすが、通常0〜600Å
が好ましい。
(Protective Layer) Normally, a protective layer 4 is formed on the recording layer 3.
To provide. However, the effect of the present invention is not impaired even if it is not provided. This protective layer 4 prevents entry of harmful substances such as moisture, oxygen, or halogen elements from the air (for one-sided specifications) or adhesive (for both-sided specifications) into the recording layer 3,
Since it is provided for the purpose of protecting the recording layer 3, it must have high corrosion resistance of itself as well as the interference layer 2 and low reactivity with the recording layer 3. Specific materials are the same as those listed for the interference layer 2. The film thickness of the protective layer 4 has a great influence on C / N and recording sensitivity, but it is usually 0 to 600 Å
Is preferred.

【0015】(反射層)記録層3上に直接もしくは保護
層4を介して反射層5を設けてもよい。記録媒体の高C
/N、高感度化のためにこの反射層5は再生光に対して
反射率が高く、熱伝導率は小さい方が良い。また、当然
耐食性がなければならない。具体的な材料として、S
i、Ti、Cr、Zr、Mo、Pd、Pt、Taの1種
以上を1〜4原子%含有したAl合金が好ましい。膜厚
は薄すぎるとC/Nが低下し、厚すぎると記録感度が悪
くなるため300〜600Åが適当である。
(Reflective Layer) The reflective layer 5 may be provided directly on the recording layer 3 or via the protective layer 4. High C of recording medium
/ N, in order to increase the sensitivity, it is preferable that the reflective layer 5 has high reflectance with respect to reproduction light and low thermal conductivity. It must also have corrosion resistance. As a specific material, S
An Al alloy containing 1 to 4 atomic% of one or more of i, Ti, Cr, Zr, Mo, Pd, Pt, and Ta is preferable. If the film thickness is too thin, the C / N decreases, and if it is too thick, the recording sensitivity deteriorates, so 300 to 600 Å is suitable.

【0016】(作製法等)基板1上に干渉層2、記録層
3、保護層4及び反射層5を形成する手段としては、ス
パッタリング、イオンプレーティング等の物理蒸着法、
プラズマCVDのような化学蒸着法等が用いられる。
(Manufacturing method, etc.) As means for forming the interference layer 2, the recording layer 3, the protective layer 4 and the reflective layer 5 on the substrate 1, a physical vapor deposition method such as sputtering or ion plating,
A chemical vapor deposition method such as plasma CVD is used.

【0017】又、層構成は図1に示した以外に、保護層
4あるいは反射層5の上にさらに5〜10μmの有機保
護層(カバー層)等を設けたり、又それらの膜どうしを
接着剤によって貼り合わせた構成でも本発明の効果は損
なわれない。
In addition to the layer structure shown in FIG. 1, an organic protective layer (cover layer) having a thickness of 5 to 10 μm is further provided on the protective layer 4 or the reflective layer 5, or the layers thereof are bonded to each other. The effect of the present invention is not impaired even with a constitution in which the components are bonded together.

【0018】[0018]

【実施例】以下本発明の実施例を述べるが、本発明はこ
れら実施例に限定されるものではない。
EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples.

【0019】実施例1〜3 直径130mm、厚さ、1.2mmのガラス上に紫外線
(UV)硬化樹脂からなるプリグルーブを形成した基板
をスパッタ装置の真空槽内にセットし、5×10-7To
rr以下になるまで真空排気した。次いでArとN2
混合ガスを真空槽内に導入し、圧力を3×10-3Tor
rに調整し、Siをターゲットとして放電電力2KW
(4W/cm2 )で高周波マグネトロンスパッタリング
を行い、干渉層としてSiN膜を1000Å堆積した。
続いてTbDyFeCo合金をターゲットとして直流マ
グネトロンスパッタリングによって記録層であるTbD
yFeCo膜を200Å形成した(組成及び室温での保
磁力は表1を参照)。更に保護層として干渉層と同様な
方法によってSiN膜を300Å、反射層としてAlT
i膜を500Å順次形成して本発明の実施例となる光磁
気記録媒体を得た。尚、表1のHcは基板(ガラス)面
より測定したθk−H曲線より求めた。
Examples 1 to 3 A substrate having a diameter of 130 mm, a thickness of 1.2 mm, and a pregroove made of an ultraviolet (UV) curing resin formed on glass was set in a vacuum chamber of a sputtering apparatus, and 5 × 10 − was formed. 7 To
It was evacuated to rr or less. Next, a mixed gas of Ar and N 2 was introduced into the vacuum chamber, and the pressure was 3 × 10 −3 Tor.
Adjust to r and discharge power 2KW with Si as the target
High frequency magnetron sputtering was performed at (4 W / cm 2 ) to deposit an SiN film of 1000 liters as an interference layer.
Then, a TbDyFeCo alloy was used as a target to form a TbD recording layer by DC magnetron sputtering.
A 200 Fe layer of yFeCo film was formed (see Table 1 for composition and coercive force at room temperature). Further, as a protective layer, a SiN film is formed by 300Å by the same method as that of the interference layer, and a reflective layer is formed of AlT.
An i film was sequentially formed by 500Å to obtain a magneto-optical recording medium as an example of the present invention. In addition, Hc in Table 1 was determined from the θk-H curve measured from the substrate (glass) surface.

【0020】[0020]

【表1】 [Table 1]

【0021】比較例1〜3 実施例と同様な方法を用いて干渉層、記録層、保護層、
反射層を形成したが、記録層として、本発明で限定した
特性の範囲外のTbDyFeCo膜(組成及び室温での
保磁力は表1参照)を用いたものを比較例として用意し
た。
Comparative Examples 1 to 3 An interference layer, a recording layer, a protective layer, and
A reflective layer was formed, but a recording layer using a TbDyFeCo film (see Table 1 for composition and coercive force at room temperature) outside the range of the characteristics limited by the present invention was prepared as a comparative example.

【0022】実施例及び比較例の光磁気記録媒体の記録
/消去時の外部磁界(Hex)とC/Nとの関係を図
2、3に示す。尚、測定条件は以下の通りである。 ・記録半径 30mm ・レーザ波長 780nm ・記録周波数 4.9MHz ・ディスクの回転数 2400rpm(CA
V) ・記録レーザパワー 6mW ・再生レーザパワー 1mW
2 and 3 show the relationship between the external magnetic field (Hex) and C / N at the time of recording / erasing in the magneto-optical recording media of Examples and Comparative Examples. The measurement conditions are as follows. -Recording radius 30 mm-Laser wavelength 780 nm-Recording frequency 4.9 MHz-Disk rotation speed 2400 rpm (CA
V) ・ Recording laser power 6mW ・ Reproducing laser power 1mW

【0023】図2、3より、比較例と比べて本発明の実
施例の方がいずれも300(Oe)以下の低磁界でC/
Nが高くなっている。
2 and 3, the C / C in the low magnetic field of 300 (Oe) or less is higher in all the examples of the present invention than in the comparative example.
N is high.

【0024】上記では具体的な実施例として光変調方式
用の媒体として説明を行ったが、磁界変調方式を用いた
ダイレクトオーバーライト用光磁気記録媒体としても充
分効果が発揮される。
In the above description, a medium for the optical modulation system has been described as a specific embodiment, but the effect is also sufficiently exerted as a magneto-optical recording medium for direct overwrite using the magnetic field modulation system.

【0025】[0025]

【発明の効果】以上、本発明によれば、記録層に特定の
組成範囲でかつ特定の特性をもったTbDyFeCo膜
を用いることによって低磁界においても高C/Nな光磁
気記録媒体が実現出来る。
As described above, according to the present invention, a magneto-optical recording medium having a high C / N even in a low magnetic field can be realized by using a TbDyFeCo film having a specific composition range and specific characteristics for the recording layer. .

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光磁気記録媒体の具体的な構成例を示
す断面図である。
FIG. 1 is a cross-sectional view showing a specific configuration example of a magneto-optical recording medium of the present invention.

【図2】実施例1〜3の光磁気記録媒体の記録/消去時
の外部磁界(Hex)とC/Nとの関係を示す図であ
る。
FIG. 2 is a diagram showing a relationship between an external magnetic field (Hex) and C / N at the time of recording / erasing in the magneto-optical recording media of Examples 1 to 3.

【図3】比較例1〜3の光磁気記録媒体の記録/消去時
の外部磁界(Hex)とC/Nとの関係を示す図であ
る。
FIG. 3 is a diagram showing a relationship between an external magnetic field (Hex) and C / N during recording / erasing of the magneto-optical recording media of Comparative Examples 1 to 3.

【符号の説明】[Explanation of symbols]

1 透明基板 2 干渉層 3 記録層 4 保護層 5 反射層 1 transparent substrate 2 interference layer 3 recording layer 4 protective layer 5 reflective layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に少なくとも光磁気記録層が
形成された構成を有する光磁気記録媒体において、前記
光磁気記録層が下記一般式化1で表わされるTbDyF
eCo膜であり、かつ膜面に垂直方向に磁化容易軸を有
し室温での保磁力が2〜8(KOe)であることを特徴
とする光磁気記録媒体。 【化1】 (但し、0<x≦0.5,0.8≦y<1.0及び0.
19≦z<0.21である)
1. In a magneto-optical recording medium having a structure in which at least a magneto-optical recording layer is formed on a transparent substrate, the magneto-optical recording layer is TbDyF represented by the following general formula 1.
A magneto-optical recording medium, which is an eCo film, has an easy axis of magnetization in a direction perpendicular to the film surface, and has a coercive force of 2 to 8 (KOe) at room temperature. [Chemical 1] (However, 0 <x ≦ 0.5, 0.8 ≦ y <1.0 and 0.
19 ≦ z <0.21)
【請求項2】 前記光磁気記録層にAl、Ti、Cr、
Pd、Ta、Ptの1種以上が1〜5原子%含有されて
いることを特徴とする請求項1に記載の光磁気記録媒
体。
2. The magneto-optical recording layer comprises Al, Ti, Cr,
The magneto-optical recording medium according to claim 1, wherein at least one of Pd, Ta and Pt is contained in an amount of 1 to 5 atom%.
【請求項3】 透明基板上に少なくとも干渉層、光磁気
記録層、保護層及び反射層が順次形成されており、前記
光磁気記録層の膜厚が150〜300Åであることを特
徴とする請求項1又は2に記載の光磁気記録媒体。
3. A transparent substrate, on which at least an interference layer, a magneto-optical recording layer, a protective layer and a reflective layer are sequentially formed, and the magneto-optical recording layer has a thickness of 150 to 300 Å. Item 3. The magneto-optical recording medium according to Item 1 or 2.
【請求項4】 前記反射層がSi、Ti、Cr、Zr、
Mo、Pd、Ta、Ptの1種以上を1〜4原子%含有
したAl合金であることを特徴とする請求項3に記載の
光磁気記録媒体。
4. The reflective layer comprises Si, Ti, Cr, Zr,
The magneto-optical recording medium according to claim 3, wherein the magneto-optical recording medium is an Al alloy containing 1 to 4 atomic% of at least one of Mo, Pd, Ta and Pt.
JP35458992A 1992-12-16 1992-12-16 Magneto-optical recording medium Pending JPH06187681A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35458992A JPH06187681A (en) 1992-12-16 1992-12-16 Magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35458992A JPH06187681A (en) 1992-12-16 1992-12-16 Magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH06187681A true JPH06187681A (en) 1994-07-08

Family

ID=18438578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35458992A Pending JPH06187681A (en) 1992-12-16 1992-12-16 Magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH06187681A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06318346A (en) * 1993-02-25 1994-11-15 Gold Star Co Ltd Photomagnetic recording medium
EP0674310A1 (en) * 1994-03-24 1995-09-27 Sharp Kabushiki Kaisha Magneto-optical recording medium and method of producing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06318346A (en) * 1993-02-25 1994-11-15 Gold Star Co Ltd Photomagnetic recording medium
EP0674310A1 (en) * 1994-03-24 1995-09-27 Sharp Kabushiki Kaisha Magneto-optical recording medium and method of producing the same
US5635309A (en) * 1994-03-24 1997-06-03 Sharp Kabushiki Kaisha Magneto-optical recording medium
US5730846A (en) * 1994-03-24 1998-03-24 Sharp Kabushiki Kaisha Method of producing a magneto-optical recording medium

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