JPH06168753A - Seal structure - Google Patents
Seal structureInfo
- Publication number
- JPH06168753A JPH06168753A JP34336492A JP34336492A JPH06168753A JP H06168753 A JPH06168753 A JP H06168753A JP 34336492 A JP34336492 A JP 34336492A JP 34336492 A JP34336492 A JP 34336492A JP H06168753 A JPH06168753 A JP H06168753A
- Authority
- JP
- Japan
- Prior art keywords
- sealing
- glass
- nickel
- metal
- pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、金属間を封着用ガラス
にてシールするシール構造、特にハーメチックシールに
おいて好適なシール構造に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing structure for sealing between metals with glass for sealing, and more particularly to a sealing structure suitable for hermetic sealing.
【0002】[0002]
【従来の技術】例えば、特開平3-106077号公報に記載さ
れているように、ハーメチックシールを行う際に封着用
ガラスが用いられており、かかる封着用ガラスとして
は、ソーダライム系,ソーダバリウム系,硼珪酸系等の
ガラス粉末を若干のバインダを加えて顆粒粉末としたも
のをプレス成型後バインダを除去し、焼結熱処理してタ
ブレットとした高融点ガラスであり、その融点は800 〜
1200℃程度である。2. Description of the Related Art For example, as described in Japanese Patent Application Laid-Open No. 3-106077, a sealing glass is used when performing a hermetic seal. Examples of the sealing glass include soda lime type and soda barium. It is a high melting point glass that is made by adding a small amount of a binder to a glass powder of borosilicate, borosilicate, etc. to make a granular powder, press-molding the binder, removing the binder, and heat-treating it into a tablet. The melting point is 800 ~
It is about 1200 ℃.
【0003】[0003]
【発明が解決しようとする課題】前記封着用ガラスを用
いて被封着部材である金属間のハーメチックシールを行
う際、シールの温度を前記融点以上にまで高めなければ
ならず、被封着部材は化学変化(特に酸化)を受けやす
く、シール後にスケール(熱サビ)落しのための化学処
理を行う必要があった。When carrying out a hermetic seal between metals, which is a member to be sealed, using the glass for sealing, the temperature of the seal must be raised to the melting point or higher. Is susceptible to chemical changes (especially oxidation), and it was necessary to perform chemical treatment to remove scale (heat rust) after sealing.
【0004】また、被封着部材をハーメチックシールを
行った後、前記被封着部材の一部と他の金属との間で溶
接(レーザ溶接,抵抗溶接等)を行う場合、前記被封着
部材にハーメチックシールを行う際のシールの温度によ
る耐食(耐サビ)性を高めるため、通常予めニッケル
(Ni)メッキを施すが、一般には、電気メッキを行い、
前記シールを行った後酸処理にてスケールを落し、次に
無電解メッキを行い、前記溶接を行っていた。すなわ
ち、電気メッキは高温に強いものの均一なメッキが難し
く、無電解メッキは均一なメッキが可能なものの高温に
弱いことから、二度メッキを行い所望のメッキを得てい
た。このメッキが均一に行われないと、前記溶接(特に
抵抗溶接の場合)が十分に行われないことがある。In addition, after performing hermetic sealing on the member to be sealed, if welding (laser welding, resistance welding, etc.) is performed between a part of the member to be sealed and another metal, the member to be sealed is Nickel (Ni) plating is usually applied in advance in order to improve the corrosion resistance (rust resistance) depending on the temperature of the hermetically sealed member, but in general, electroplating is performed.
After the sealing, the scale was removed by acid treatment, then electroless plating was performed, and the welding was performed. That is, since electroplating is resistant to high temperatures, uniform plating is difficult, and electroless plating is capable of uniform plating but weak to high temperatures. Therefore, desired plating was performed twice. If this plating is not performed uniformly, the above welding (especially in the case of resistance welding) may not be performed sufficiently.
【0005】[0005]
【課題を解決するための手段】本発明は、前記課題を解
決するため、第1の金属と第2の金属とを封着用ガラス
にてシールするシール構造において、前記両金属はニッ
ケル,ニッケルメッキ,ニッケル合金の何れかであり、
前記封着用ガラスは融点が700 ℃以下の鉛(PbO )系ガ
ラスを用いた。In order to solve the above-mentioned problems, the present invention provides a sealing structure for sealing a first metal and a second metal with a sealing glass, wherein both metals are nickel and nickel-plated. , Any of nickel alloys,
As the glass for sealing, a lead (PbO 3) glass having a melting point of 700 ° C. or less was used.
【0006】[0006]
【作用】低温でのシールが可能となる。[Function] It becomes possible to seal at a low temperature.
【0007】[0007]
【実施例】本発明を、添付図面に記載した実施例を用い
てハーメチックシールを行う場合の例を説明する。な
お、以下においては、圧力センサや加速度センサにおけ
るベース板(第1の金属)とピン(第2の金属)とをシ
ールする例を示している。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An example of carrying out the hermetic seal of the present invention will be described with reference to the embodiments shown in the accompanying drawings. In the following, an example of sealing the base plate (first metal) and the pin (second metal) in the pressure sensor or the acceleration sensor is shown.
【0008】被封着部材であるベース板1は、SPC 鋼板
やSUS304等の金属にニッケルメッキを施して成るが、こ
のニッケルメッキは後述するように無電解メッキで良
い。このベース板1は、後述する封着用ガラスで後述す
る他の被封着部材であるピンをシールするための孔1a
を複数個有している。The base plate 1, which is the member to be sealed, is formed by plating nickel on a metal such as SPC steel plate or SUS304. This nickel plating may be electroless plating as described later. The base plate 1 is a hole 1a for sealing a pin which is another sealing target member described later with a sealing glass described later.
Have a plurality of.
【0009】ピン2は、50Ni-Fe 合金,42Ni-Fe 合金あ
るいはニッケルメッキを施したコバール等の金属で、ベ
ース板1の孔1aに後述する封着用ガラスを介してセッ
トされる。The pin 2 is made of a metal such as 50Ni-Fe alloy, 42Ni-Fe alloy or nickel-plated Kovar, and is set in the hole 1a of the base plate 1 through a sealing glass described later.
【0010】封着用ガラス3は、鉛系ガラスから成り、
孔3aを有するドーナッツ状の成型体で、ベース1の孔
1aにこの封着用ガラス3をセットし、更に封着用ガラ
ス3の孔3aにピン2をセットする。The glass 3 for sealing is made of lead-based glass,
In a donut-shaped molded body having a hole 3a, the sealing glass 3 is set in the hole 1a of the base 1, and the pin 2 is further set in the hole 3a of the sealing glass 3.
【0011】かかる構成により、ベース板1とピン2と
を封着用ガラス3にてシールすることができた。この場
合、シールの温度は、従来に比べ大きく下がり、低温で
のシールが可能となったことから、ベース板1のニッケ
ルメッキとしては高温に弱い無電解メッキでも十分であ
り、しかも、低温によるシールにより、ベース板1やピ
ン2に殆どスケールが発生しない。従って、従来必要と
していた電気メッキやスケール落しのための酸処理が不
要となり、製作工程が著しく簡素化できた。With this structure, the base plate 1 and the pin 2 can be sealed with the glass 3 for sealing. In this case, the temperature of the seal is much lower than in the conventional case, and it is possible to seal at a low temperature. Therefore, electroless plating which is weak to high temperature is sufficient as the nickel plating of the base plate 1, and the sealing at low temperature is also possible. Therefore, almost no scale is generated on the base plate 1 and the pins 2. Accordingly, the electroplating and the acid treatment for scale removal, which are conventionally required, are not required, and the manufacturing process can be remarkably simplified.
【0012】また、シールの温度が低温で良いことか
ら、ベース板1内部に配設される他部品(図示しない)
とピン2との電気的接続を行う際に用いられる金(Au)
等のワイヤボンディングのため、ボンディングバッドと
して前記シールを行う前に予めアルミ(Al)をピン2の
上面に設けておくことができ、全体としての製作工程を
も簡素化できる。Further, since the temperature of the seal may be low, other components (not shown) arranged inside the base plate 1
(Au) used to make electrical connection between pin and pin 2
For wire bonding, etc., aluminum (Al) can be preliminarily provided on the upper surface of the pin 2 as a bonding pad before performing the sealing, and the manufacturing process as a whole can be simplified.
【0013】次に、本発明者が実際に製作した具体的な
実施例を説明する。Next, a specific embodiment actually manufactured by the present inventor will be described.
【0014】良好な成果を得た実施例としては、ベース
板1に無電解メッキにより厚さ5〜10ミクロンのニッケ
ルメッキを施したSPC 鋼板、ピン2に無電解メッキによ
り厚さ5〜10ミクロンのニッケルメッキを施した50Ni-F
e 合金、封着用ガラスとして鉛系ガラス粉末を円筒状プ
レス成型した後プレス成型のために添加したニトロセル
ロースや芳香族有機化合物等の有機バインダを除去して
強度を持たせるためこの封着用ガラスの融点付近で焼結
させたガラスタブレット、を夫々用いた。また、シール
は酸素が1.0ppm以下の窒素雰囲気中にて温度500 ℃,時
間20分にて行った。Examples in which good results have been obtained include an SPC steel plate having a thickness of 5 to 10 microns nickel plated on the base plate 1 by electroless plating, and a pin 5 having a thickness of 5 to 10 microns plated by electroless plating. 50Ni-F with nickel plating
e Alloy, as a glass for sealing, a lead-based glass powder is press-molded into a cylindrical shape and then the organic binder such as nitrocellulose or aromatic organic compound added for press-molding is removed to increase strength. Glass tablets sintered near the melting point were used, respectively. The sealing was performed in a nitrogen atmosphere containing oxygen of 1.0 ppm or less at a temperature of 500 ° C for 20 minutes.
【0015】この実施例と比較するため、ベース板1と
ピン2は前記実施例と同じ材料で、封着用ガラス3のみ
をソーダバリウム(SiO-BaO-Na2O)系ガラスに代え、前
記実施例と同じ雰囲気中にてシールの温度1000℃,時間
10分にて行った比較例を製作した。For comparison with this embodiment, the base plate 1 and the pin 2 are made of the same material as in the above embodiment, and only the sealing glass 3 is replaced with soda barium (SiO-BaO-Na 2 O) type glass and the above-mentioned embodiment is carried out. Seal temperature 1000 ℃, time in the same atmosphere as the example
A comparative example was made in 10 minutes.
【0016】前記製作した実施例と比較例とのシールの
状態を検討した結果、ピン2の引き抜き強度は、前者が
13Kgでもピン2の引き抜きは発生せずシール個所が破断
したのに対し、後者は4〜5Kgでピン2の引き抜きが発
生し、前者が実際の使用に際し問題のないことが確認さ
れた。前者において、ベース板1,ピン2と封着用ガラ
ス3との接合断面を調査したところ、ニッケルメッキに
対する封着用ガラス3の侵食性が激しく、封着用ガラス
3がベース板1やピン2の内部に深く侵入し、これによ
り前記強度の増強が図られたものと考えられる。なお、
シールの温度を700 ℃以下にすれば、ベース板1やピン
2に殆どスケールが発生しない。As a result of examining the seal states of the manufactured example and the comparative example, the pull-out strength of the pin 2 is
Even at 13 kg, the pin 2 was not pulled out and the seal part was broken, whereas in the latter, the pin 2 was pulled out at 4 to 5 kg, and it was confirmed that the former had no problem in actual use. In the former case, when the joint cross section of the base plate 1 and the pin 2 and the sealing glass 3 was investigated, the corrosiveness of the sealing glass 3 with respect to nickel plating was severe, and the sealing glass 3 was found inside the base plate 1 and the pin 2. It is considered that the material penetrated deeply to enhance the strength. In addition,
If the temperature of the seal is 700 ° C or less, almost no scale is generated on the base plate 1 and the pins 2.
【0017】本発明は、その要旨の範囲内で種々の変更
が可能であり、例えば、被封着部材は、ニッケル,ニッ
ケルメッキ,ニッケル合金の何れかであれば封着用ガラ
ス3として鉛系ガラスを用いて低温でのシールが可能で
ある。勿論、一方の金属をニッケルメッキとし、他方の
金属をニッケル合金とする組合せでもかまわない。The present invention can be variously modified within the scope of the invention. For example, if the member to be sealed is any one of nickel, nickel plating, and nickel alloy, the lead glass 3 is used as the sealing glass 3. Can be used to seal at low temperature. Of course, one metal may be nickel-plated and the other metal may be a nickel alloy.
【0018】[0018]
【発明の効果】本発明は、第1の金属と第2の金属とを
封着用ガラスにてシールするシール構造において、前記
両金属はニッケル,ニッケルメッキ,ニッケル合金の何
れかであり、前記封着用ガラスは融点が700 ℃以下の鉛
系ガラスを用いたものであり、従来に比べて低温でのシ
ールが可能となり、これにより、被封着部材は化学変化
を受けにくく、製作工程全体の簡素化を図り、かつ、良
好なシールを行うことができる。According to the present invention, in a seal structure for sealing a first metal and a second metal with a sealing glass, both the metals are nickel, nickel plating or nickel alloy, The wearable glass uses lead-based glass with a melting point of 700 ° C or less, and it is possible to seal at a lower temperature than before, which makes the sealed material less susceptible to chemical changes and simplifies the entire manufacturing process. In addition, it is possible to achieve good sealing.
【図1】本発明の実施例の分解断面図。FIG. 1 is an exploded sectional view of an embodiment of the present invention.
1 ベース板(第1の金属) 2 ピン(第2の金属) 3 封着用ガラス 1 base plate (first metal) 2 pins (second metal) 3 glass for sealing
Claims (1)
スにてシールするシール構造において、前記両金属はニ
ッケル(Ni),ニッケルメッキ,ニッケル合金の何れか
であり、前記封着用ガラスは融点が700 ℃以下の鉛(Pb
O )系ガラスであることを特徴とするシール構造。1. A sealing structure for sealing a first metal and a second metal with a sealing glass, wherein the both metals are nickel (Ni), nickel plating, or nickel alloy, and the sealing is performed. Glass has lead (Pb
O) Glass type seal structure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34336492A JPH06168753A (en) | 1992-11-30 | 1992-11-30 | Seal structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34336492A JPH06168753A (en) | 1992-11-30 | 1992-11-30 | Seal structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06168753A true JPH06168753A (en) | 1994-06-14 |
Family
ID=18360951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34336492A Pending JPH06168753A (en) | 1992-11-30 | 1992-11-30 | Seal structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06168753A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010032532A (en) * | 2002-07-17 | 2010-02-12 | Sigma Aldrich Co | Method and system for monitoring liquid level in container |
-
1992
- 1992-11-30 JP JP34336492A patent/JPH06168753A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010032532A (en) * | 2002-07-17 | 2010-02-12 | Sigma Aldrich Co | Method and system for monitoring liquid level in container |
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