JPH06158318A - Film forming device - Google Patents

Abstract

PURPOSE:To increase the throughput per unit time and to prevent a film from sticking to the sealing surface of a gate valve and to the inside surface of a load lock chamber. CONSTITUTION:The film forming device is provided with a film forming chamber 1 in which a film is formed at a disk 3 in the film forming position 2, plural load lock chambers 10 provided on the film forming chamber 1 via each gate valve 11 respectively, plural spindles 12 provided in the film forming chamber 1 for every load lock chamber 10, and transfer arms 13 supported with each spindle 12 respectively for transferring the disk 3 in the load lock chamber 10 to the film forming position 2 and the disk 3 in the film forming position 2 to the load lock chamber 10.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mass production machine for an ion beam sputtering apparatus, which is capable of improving the throughput (throughput) per unit time and preventing film formation in a load lock chamber. Regarding

[0002]

2. Description of the Related Art A conventional film forming apparatus is constructed as shown in FIG. 8 which is a schematic plan view, in which reference numeral 1 is a film forming chamber for forming a film on a disk 3 at a film forming position 2, Reference numeral 4 denotes two load lock chambers provided adjacent to the film forming chamber 1 via inner gate valves 5 each having a square side, and 6 denotes a square outer gate provided on the other side of the load lock chamber 4. Valve, 7
Is a support shaft erected in the load lock chamber 4, 8 is a transfer arm supported by the support shaft 7, and 9 is an exchange position for mounting and removing the disc 3.

Then, the outer gate valve 6 of one of the load lock chambers 4 is opened, the tip of the transfer arm 8 is moved to the exchange position 9, the disc 3 is set, and the disc 3 is moved to the load lock chamber 4. The outer gate valve 6 is closed and the load lock chamber 4 is evacuated. Next, the inner gate valve 5 is opened and the disk 3 is moved to the film forming position 2 to form a film. During this time, the disk 3 before film formation is carried into the other load lock chamber 4 as described above,
Is being evacuated.

After the film formation, the disk 3 is returned to one of the load lock chambers 4, and the inner gate valve 5
, The outer gate valve 6 is opened, the disk 3 is returned to the exchange position 9, the disk 3 after film formation is taken out, and the next disk 3 before film formation is set. During this time, the disk 3 in the other load lock chamber 4 is kept in the film forming position 2
The film is formed in step (3), and the above steps are repeated to sequentially form the film.

[0005]

In the case of the conventional film forming apparatus, since the support shaft 7 of the transfer arm 8 is provided in the load lock chamber 4, the volume of the load lock chamber 4 becomes large, and the vacuum evacuation time is increased. Is long, the amount of processing per unit time is reduced, and the inner gate valve 5 remains open during film formation, so that there is a risk of film deposition on the seal surface of the inner gate valve 5 and the inner surface of the load lock chamber 4. There is a problem. The present invention has been made in consideration of the above points, and an object of the present invention is to provide a film forming apparatus capable of increasing the throughput per unit time and preventing film formation on the seal surface of the gate valve and the inner surface of the load lock chamber. And

[0006]

In order to solve the above problems, a film forming apparatus of the present invention includes a film forming chamber for forming a film on a disk at a film forming position, and a gate valve in each of the film forming chambers. A plurality of load lock chambers provided in the film forming chamber, a plurality of support shafts provided in the film forming chamber for each of the load lock chambers, and a disk of the load lock chambers rotatably supported by the support shafts. At the film forming position, a transfer arm for moving the disk at the film forming position to the load lock chamber is provided.

[0007]

The film forming apparatus of the present invention configured as described above is
Since the spindle of the transfer arm for each load lock chamber is provided in the film forming chamber, there is no spindle in each load lock chamber, the volume of each load lock chamber becomes smaller, and the vacuum exhaust time becomes shorter. The processing amount per unit time increases. Furthermore, during film formation, the gate valve between the film formation chamber and the load lock chamber can be closed, and film formation on the sealing surface of the gate valve and the inner surface of the load lock chamber can be prevented.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment will be described with reference to FIGS. In these drawings, the same reference numerals as those in FIG. 8 indicate the same or corresponding ones, and first, FIGS. 1 to 4 showing the entire configuration will be described. Reference numeral 10 denotes a plurality of load lock chambers provided in the film forming chamber 1 via square gate valves 11, and 12 denotes a plurality of support lock chambers provided in the film forming chamber 1 for each load lock chamber 10. Shafts and 13 are transfer arms supported by the respective support shafts 12, and the disk 3 in the load lock chamber 10 before film formation is moved to the film formation position 2 in the film formation chamber 1 to form the film formation in the film formation position 2. The subsequent disk 3 is transferred to the load lock chamber 10.

Reference numeral 14 is a sputtering ion source, and 15 is a film forming chamber 1.
Is a target on which the ion boom 16 from the ion source 14 is irradiated, and 17 is a disk holder provided at the film forming position 2, which holds and rotates the disk 3 transferred by the transfer arm 13. Reference numeral 18 is a mounting table of the film forming chamber 1, and 19 is a lid of the load lock chamber 10.

Then, a lid 1 of a certain load lock chamber 10
9 is opened, the disk 3 before film formation is the load lock chamber 1
It is set to 0, the lid 19 is closed, and vacuum exhaust is performed. Next, the gate valve 11 is opened and the standby position 20
The transfer arm 13 moves to the load lock chamber 10 to support the disk 3, moves to the film forming position 2, and moves to the gate valve 1
1 is closed, the disk holder 17 pushes up and holds the disk 3, the arm 13 is retracted from the film formation position 2 to the standby position 20, and the holder 17 is rotated to perform film formation. Meanwhile, in the next load lock chamber 10, the disk 3 before film formation is set and evacuated.

After the film formation, the arm 13 moves to the film formation position 2, the holder 17 moves downward to transfer the disk 3 to the arm 13, the gate valve 11 opens, and the disk 3 moves to the load lock chamber 10. The arm 13 returns to the standby position 20, and the gate valve 11 is closed. Then, the lid 19 is opened, the disk 3 after film formation is taken out, the next disk 3 before film formation is set, and the disk 3 is evacuated. During this time, the disk 3 of the next load lock chamber 10 described above is
Similar to the above, the film formation is carried out by moving to the film formation position 2.

Further, in the next load lock chamber 10 as well, the disk 3 before film formation is set and evacuated in the same manner as described above. In this way, the setting of the disk 3 before film formation, the film formation, and the removal of the disk 3 after film formation are sequentially repeated, and film formation is continuously performed at the film formation position 2.

Next, delivery of the disk 3 to the transfer arm 13 in the load lock chamber 10 will be described with reference to FIGS. 5 and 6. Reference numeral 21 is a bottom plate of the load lock chamber 10, 22 is a circular lack formed in the bottom plate 21, 23 is a bottom body that covers the lack 22 from the lower side in an airtight manner, 2
Reference numeral 4 is a vertical shaft provided on the bottom body 23 so as to be vertically movable, 25 is a support body fixed to the upper end of the vertical shaft 24, and 26 is a support body 2.
5 circular lower plate, 27 C-shaped upper frame, 28 lower plate 26
The three support rods between the upper frame 27 and the upper frame 27, 29 is a disk-shaped attachment plate on which the disk 3 is placed, and 30 is a protrusion protruding from the lower surface of the attachment plate 29. Which is fitted inside the
Is positioned. Reference numeral 31 is a C-shaped receiving body formed at the tip of the transfer arm 13, and 32 is a through hole provided in the central portion of the deposition preventing plate 29.

When the disc 3 is set, the lid 1
The vertical shaft 24 moves upward in the state that 9 is opened, and the support 25
The upper surface of the lower plate 26 is flush with the upper surface of the bottom plate 21,
The deposition preventive plate 29 on which the disk 3 is placed is placed on the upper frame 27.

Next, the lid 19 is closed and vacuum exhausted,
The gate valve 11 opens and the transfer arm 13 moves to the load lock chamber 10, and the receiving body 31 of the arm 13 moves between the adjacent supporting rods 28 and moves to the lower side of the upper frame 27. At this time, the arm 13 is located at the lacking portion of the C-shaped upper frame 27. Then, the vertical shaft 24 moves downward, the deposition preventive plate 29 is placed on the receiving body 31, and the arm 13 moves to the film forming chamber 1.

Next, when the disk 3 after film formation is taken out, the arm 13 is moved by the arm 13 with the vertical shaft 24 moved downward.
5, the vertical shaft 24 moves upward, the deposition preventive plate 29 on the receiving body 31 is placed on the upper frame 27, and the arm 13 is moved to the film forming chamber 1.
Then, the gate valve 11 is closed, the lid 19 is opened, and the disk 3 after film formation is taken out.

Next, the delivery to the disk holder 17 in the film forming chamber 1 will be described with reference to FIG. Reference numeral 33 is a base in the film forming chamber 1, 34 is a lid plate that is in contact with the upper end of the cylindrical portion 35 of the base 33 via an O-ring 36, and 37 is a bolt that fixes the lid plate 34 to the cylindrical portion 35.
Reference numeral 8 is a through hole provided in the central portion of the cover plate 34, 39 is a hollow main shaft vertically movable in the cylindrical portion 35, 40 is a through hole in the upper end of the main shaft 39 and the lower surface of the cover plate 34. An elevating bellows provided between the main shaft 39 and the peripheral edge of the shaft 38, a hollow support shaft 41 provided inside the main shaft 39 and a lower end fixed to the main shaft 39, and a rotary shaft 42 supported by the support shaft 41 via a bearing 43. It is a freely supported rotation shaft, and a main shaft 39, a support shaft 41, and a rotation shaft 42 integrally move up and down.

Reference numeral 44 denotes an outer cylinder fixed to the upper portion of the rotation shaft 42 by screws 45, 46 denotes a plurality of vertically elongated holes penetrating the outer cylinder 45, and 47 is vertically movable inside the outer cylinder 44. The inner cylinder 48, which is provided on the outer surface of the inner cylinder 47, is provided with a long hole 46.
It is a protrusion inserted in.

Reference numeral 49 is a ball bearing provided between the upper portion of the inner cylinder 47 and the rotation shaft 42, 50 is a screw supporting the ball bearing 49, and 51 is a receiver fixed to the upper end surface of the cylinder 47 with a screw 52. A holder smaller than the inner diameter of 31 and a holder 51
Is a ring-shaped body protruding from the upper surface of the
Inserted in 2.

Reference numeral 54 denotes a spacer provided at the lower end of the ball bearing 49, and 55 denotes a spring provided between the spacer 54 and the bottom surface of the outer cylinder 44, which is held via the spacer 54, the ball bearing 49, and the inner cylinder 47. The body 51 is biased upward.

Reference numeral 56 denotes a cylindrical portion 35 of the base 33, an outer cylinder 44,
A cover that covers the inner cylinder 47 and the like, and includes a main shaft 39 and a support shaft 4.
1, the rotation shaft 42, the outer cylinder 44, the inner cylinder 47, the holding body 51, the spring 55 and the like constitute a lifting means 57.

Reference numeral 58 is a support rod, 59 is a mask fixed to the tip of the support rod 58 with a screw 60, 61 is a support body provided below the mask 59 via a bearing 62, and 63 is a lower surface of the support body 61. An annular protrusion 64 is provided on the support 61, a holding member 64 is fixed to the support 61 by a screw 65 to prevent the support 61 from deviating from the bearing 62, and 66 is an insulating material such as Teflon provided on the peripheral portion of the support 61. A disc pressing ring made of a material, 67 is a retaining ring for fixing the ring 66 to the support 61,
Reference numeral 68 denotes a water passage for cooling water which is disposed on the upper surface of the mask 59 through the support rod 58.

Next, the operation will be described. In the load lock chamber 10, the deposition preventive plate 29 and the disk 3 are placed on the receiving body 31 of the transfer arm 13, and the support shaft 12 is rotated to transfer the disk 3 to a position immediately below the film forming position 2 and the rotation shaft 42. , And the annular body 53 of the holding body 51 on the upper end of the rotation shaft 42.
Is fitted into the through hole 32 of the deposition preventive plate 29, the deposition preventive plate 29 is detached from the receiving body 31, the annular projection 63 of the support body 61 is fitted inside the annular body 53, and the upper surface of the disc 3 is supported. Abut the body 61.

At this time, the taper formed on the ring-shaped body 53 and the ring-shaped protrusion 63 absorbs the positional deviation and returns to a fixed position, and the spring 55 absorbs the shock between the holding body 51 and the support body 61. .

Next, the support shaft 12 rotates in the reverse direction, the receiver 31 is disengaged from the portion of the rotating shaft 42 by the opening of the C-shaped receiver 31, and the rotation of the rotating shaft 42 forms a film on the disk 3. . At this time, the mask 59 prevents film formation and overheating on the mechanism portion. Although the load lock chamber 10 is provided in four chambers in the above embodiment, at least two load lock chambers 10 may be provided.

[0026]

Since the present invention is configured as described above, it has the following effects. In the film forming apparatus of the present invention, a plurality of load lock chambers 10 are provided in the film forming chamber 1 via gate valves 11, respectively, and a spindle 12 and a transfer arm 13 for each load lock chamber 10 are provided in the film forming chamber 1. Since each load lock chamber 10 is provided with no support shaft, the volume of each load lock chamber 10 can be reduced, and the evacuation time of the load lock chamber 10 can be shortened.
The amount of processing per unit time can be increased. Furthermore, during film formation, the gate valve 1 of each load lock chamber 10
Since 1 can be closed, film deposition on the sealing surface of the gate valve 11 and the inner surface of the load lock chamber 10 can be prevented.

[Brief description of drawings]

FIG. 1 is a schematic front view of an embodiment of the present invention.

2 is a cutaway side view of a portion of FIG. 1. FIG.

FIG. 3 is a perspective view of a part of FIG.

4 is a perspective view of the whole of FIG. 1. FIG.

5 is a schematic plan view of a part of FIG. 1. FIG.

FIG. 6 is a partially cutaway front view of the load lock chamber of FIG.

7 is a cutaway front view of the disc holder of FIG. 1. FIG.

FIG. 8 is a schematic plan view of a conventional example.

[Explanation of symbols]

 1 film forming chamber 2 film forming position 3 disk 10 load lock chamber 11 gate valve 12 spindle 13 transfer arm

Claims (1)

[Claims] 1. A film forming chamber for forming a film on a disk at a film forming position, a plurality of load lock chambers respectively provided in the film forming chamber through gate valves, and each of the load lock chambers in the film forming chamber. A plurality of support shafts provided for each chamber, and a transfer arm that is supported by each of the support shafts and transfers the discs of the load lock chamber to the film forming position and the discs of the film forming position to the load lock chamber. A film forming apparatus equipped with.