JPH06158278A - Surface treatment of reflector - Google Patents
Surface treatment of reflectorInfo
- Publication number
- JPH06158278A JPH06158278A JP4336794A JP33679492A JPH06158278A JP H06158278 A JPH06158278 A JP H06158278A JP 4336794 A JP4336794 A JP 4336794A JP 33679492 A JP33679492 A JP 33679492A JP H06158278 A JPH06158278 A JP H06158278A
- Authority
- JP
- Japan
- Prior art keywords
- reflector
- film
- coating
- vapor deposition
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、自動車用前照灯の樹
脂製リフレクターに利用されるリフレクターの表面処理
方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method for a reflector used for a resin reflector of a vehicle headlight.
【０００２】[0002]
【従来の技術】従来のこの種リフレクターの表面処理方
法は、（１）リフレクター成形、（２）洗浄工程、
（３）アンダーコート塗装即ち、熱硬化型塗料或いは紫
外線硬化型塗料を用いたスプレー塗装又はディピング塗
装又はフローコーティング、（４）アルミ蒸着即ち、真
空蒸着又はスパッタリング又はイオンプレーティング、
（５）トップコート塗装即ち、熱硬化塗料或いは紫外線
硬化型塗料を用いたスプレー塗装又はディッピング塗装
又はフローコーティングの順序で処理を行っている。2. Description of the Related Art The conventional surface treatment method for this kind of reflector is (1) reflector molding, (2) cleaning step,
(3) Undercoat coating, that is, spray coating or dipping coating or flow coating using a thermosetting coating or an ultraviolet curing coating, (4) Aluminum vapor deposition, that is, vacuum vapor deposition, sputtering or ion plating,
(5) Topcoat coating, that is, spray coating, dipping coating or flow coating using a thermosetting coating or an ultraviolet curing coating is performed in this order.
【０００３】[0003]
【発明が解決しようとする課題】しかし、前記従来の技
術では、Ａ．成形品にアンダーコート塗装を施した場合
に、反射面に段差部や不連続部があると、アンダーコー
ト膜のタレや溜まりが生じ、その結果均一な膜形成がで
きないため、グレア光の原因になるという問題点があ
る。However, according to the above-mentioned conventional technique, A. If the reflective surface has a step or a discontinuity when an undercoat is applied to the molded product, the undercoat film sags or accumulates, and as a result, a uniform film cannot be formed. There is a problem that
【０００４】そこで、本発明は上記従来の技術の問題点
に鑑み案出されたもので、グレア光の発生を防止し、か
つアルミ蒸着を良好ならしめることが可能なリフレクタ
ーの表面処理方法の提供を目的としている。Therefore, the present invention has been devised in view of the above-mentioned problems of the prior art, and provides a surface treatment method for a reflector capable of preventing the generation of glare light and facilitating aluminum vapor deposition. It is an object.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
に、本発明におけるリフレクターの表面処理方法におい
ては、ＣＶＤ法等により、リフレクター基材上に有機高
分子膜を成膜後、その上にアルミ蒸着及びアルミ蒸着の
保護膜を成膜したことを特徴としている。In order to achieve the above object, in the surface treatment method for a reflector according to the present invention, an organic polymer film is formed on a reflector base material by a CVD method or the like, and then formed thereon. The feature is that aluminum vapor deposition and a protective film of aluminum vapor deposition are formed.
【０００６】[0006]
【作用】均一な有機高分子膜が形成されるため、グレア
光の低減が可能となる。[Function] Since a uniform organic polymer film is formed, glare light can be reduced.
【０００７】また、リフレクター基材上に有機高分子膜
を形成後、その上にアルミ蒸着及びアルミ蒸着の保護膜
を成膜しているため、アルミ蒸着の密着性は良好とな
る。Further, since the organic polymer film is formed on the reflector base material and the aluminum vapor deposition and the protective film for aluminum vapor deposition are formed thereon, the adhesion of the aluminum vapor deposition becomes good.
【０００８】[0008]
【実施例】本発明は、リフレクター成形、洗浄工程後に
おいて、リフレクター基材上には、従来のアンダーコー
ト塗装の代わりに、有機高分子例えば、スチレン系やシ
リコン系等を蒸着して処理して、アンダーコート膜を成
膜している。Example: In the present invention, after the reflector molding and washing steps, an organic polymer such as styrene or silicon is vapor-deposited and treated on the reflector substrate instead of the conventional undercoat coating. The undercoat film is formed.
【０００９】また、前記高分子膜は、有機高分子を主成
分とし、それを含む原料ガスを熱エネルギー又は光エネ
ルギー又はプラズマ等により分解し、リフレクター基材
表面での化学的反応により膜が成膜されている。The polymer film contains an organic polymer as a main component, and a raw material gas containing the organic polymer is decomposed by heat energy, light energy, plasma or the like, and a film is formed by a chemical reaction on the surface of the reflector substrate. It is a film.
【００１０】この化学的反応の手法は、ＣＶＤ（Ｃｈｅ
ｍｉｃａｌ Ｖａｐｏｒ Ｄｅｐｏｓｉｓｉｏｎ）を用
い、リフレクター基材表面に上記膜を成膜後は、真空蒸
着又はスパッタリング又はイオンプレーティングによる
アルミ蒸着を行い、その後、熱硬化塗料或いは紫外線硬
化型塗料を用いたスプレー塗装又はディッピング塗装又
はフローコーティングによるトップコート塗装が行われ
る。This chemical reaction method is based on the CVD (Che
After the above film is formed on the surface of the reflector base material, aluminum vapor deposition is performed by vacuum vapor deposition or sputtering or ion plating, and then spray coating using a thermosetting coating or an ultraviolet curing coating Topcoat coating by dipping coating or flow coating is performed.
【００１１】[0011]
【発明の効果】本発明は上述の通り構成されているの
で、次に記載する効果を奏する。 Ａ．従来のアンダーコート塗装に比べ、高分子膜により
均一な膜が形成されるため、グレア光が低減できる。Since the present invention is configured as described above, it has the following effects. A. Compared with the conventional undercoat coating, a uniform film is formed by the polymer film, so that glare light can be reduced.
【００１２】Ｂ．アンダーコートを施さないで、リフレ
クター基材に直接アルミ蒸着をする方法もあるが、基材
とアルミの密着性が得られない。しかし、リフレクター
基材上に高分子膜を成膜しているため、アルミ蒸着の際
のアルミの密着性は良くなる。B. There is also a method of depositing aluminum directly on the reflector base material without applying an undercoat, but the adhesion between the base material and aluminum cannot be obtained. However, since the polymer film is formed on the reflector base material, the adhesion of aluminum at the time of aluminum vapor deposition is improved.
Claims (1)
有機高分子膜を成膜後、その上にアルミ蒸着及びアルミ
蒸着の保護膜を成膜したことを特徴とするリフレクター
の表面処理方法。1. A surface treatment method for a reflector, which comprises depositing an organic polymer film on a reflector substrate by a CVD method or the like, and then depositing aluminum vapor deposition and a protective film for aluminum vapor deposition thereon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33679492A JP3216055B2 (en) | 1992-11-25 | 1992-11-25 | Surface treatment method of reflector by CVD method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33679492A JP3216055B2 (en) | 1992-11-25 | 1992-11-25 | Surface treatment method of reflector by CVD method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06158278A true JPH06158278A (en) | 1994-06-07 |
| JP3216055B2 JP3216055B2 (en) | 2001-10-09 |
Family
ID=18302750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33679492A Expired - Fee Related JP3216055B2 (en) | 1992-11-25 | 1992-11-25 | Surface treatment method of reflector by CVD method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3216055B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1325692C (en) * | 2003-12-22 | 2007-07-11 | 罗耀群 | Process for coating aluminium film and protective film for automobile reflector |
| JP2008231456A (en) * | 2007-03-16 | 2008-10-02 | Stanley Electric Co Ltd | Plasma film deposition system |
| JP2016211051A (en) * | 2015-05-12 | 2016-12-15 | 株式会社島津製作所 | Film deposition apparatus, plasma processing apparatus and film deposition method |
-
1992
- 1992-11-25 JP JP33679492A patent/JP3216055B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1325692C (en) * | 2003-12-22 | 2007-07-11 | 罗耀群 | Process for coating aluminium film and protective film for automobile reflector |
| JP2008231456A (en) * | 2007-03-16 | 2008-10-02 | Stanley Electric Co Ltd | Plasma film deposition system |
| JP2016211051A (en) * | 2015-05-12 | 2016-12-15 | 株式会社島津製作所 | Film deposition apparatus, plasma processing apparatus and film deposition method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3216055B2 (en) | 2001-10-09 |
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