JPH06138072A - Micro-sensor - Google Patents

Micro-sensor

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Publication number
JPH06138072A
JPH06138072A JP30940792A JP30940792A JPH06138072A JP H06138072 A JPH06138072 A JP H06138072A JP 30940792 A JP30940792 A JP 30940792A JP 30940792 A JP30940792 A JP 30940792A JP H06138072 A JPH06138072 A JP H06138072A
Authority
JP
Japan
Prior art keywords
cover member
silicon chip
adhesive
microsensor
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30940792A
Other languages
Japanese (ja)
Other versions
JP3127056B2 (en
Inventor
Junji Manaka
順二 間中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Seiki Co Ltd
Original Assignee
Ricoh Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Seiki Co Ltd filed Critical Ricoh Seiki Co Ltd
Priority to JP04309407A priority Critical patent/JP3127056B2/en
Publication of JPH06138072A publication Critical patent/JPH06138072A/en
Application granted granted Critical
Publication of JP3127056B2 publication Critical patent/JP3127056B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To improve the joining strength between a silicon chip and cover member. CONSTITUTION:In this micro-sensor constituted by bonding a silicon chip 201 coated with a protective thin film 202 to a cover member 101 with a bonding agent 102, a joined layer is formed with the end section and side face at the end of the chip 201, bonding agent 102, and cover member 101.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,温湿度センサや,ガス
センサとして使用されるマイクロセンサに関し,より詳
細には,上部表面に保護用の薄膜が形成されたシリコン
チップと,カバー部材とを接着剤で接合してなるマイク
ロセンサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a micro-sensor used as a temperature / humidity sensor or a gas sensor, and more specifically, a silicon chip having a protective thin film formed on its upper surface and a cover member are bonded to each other. The present invention relates to a microsensor bonded with a chemical.

【0002】[0002]

【従来の技術】温湿度や,ガス等を検出するセンサの一
つとしてマイクロセンサが知られている。マイクロセン
サはシリコンチップの同一基板上に温度補償と検出との
2つの機能を具備しており,この温度補償を機能させる
ために外部雰囲気を遮断し,熱伝導のみを得る必要があ
る。このため,接着剤(シール部材)を用いて温度補償
用のセンサ部が設けられたシリコンチップとカバー部材
とを接合する構造が一般的に用いられている。
2. Description of the Related Art A microsensor is known as one of sensors for detecting temperature and humidity, gas and the like. The microsensor has two functions of temperature compensation and detection on the same substrate of the silicon chip, and it is necessary to block the external atmosphere and obtain only heat conduction for this temperature compensation to function. Therefore, a structure in which a silicon chip provided with a temperature compensating sensor portion and a cover member are joined together using an adhesive (sealing member) is generally used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら,従来の
マイクロセンサによれば,接着剤によってシリコンチッ
プとカバー部材とを接合してるものの,シリコンチップ
の表面には保護用の薄膜が形成されており,接合層がシ
リコンチップ,薄膜,接着剤,カバー部材とによって形
成されているため,最も接合強度の小さいシリコンチッ
プと薄膜との接合強度が接合層の接合強度となり,シリ
コンチップとカバー部材の接合強度が低下するという問
題点があった。具体的には,図7(a),(b)に示す
ように,上部表面に保護用の薄膜701が形成されたシ
リコンチップ702と,カバー部材703とを接着剤7
04で接合するため,接着剤704の接着力が大きくて
も,シリコンチップ702と薄膜701との接合強度が
小さいと,結果的にカバー部材703とシリコンチップ
702との接合強度が低下する。
However, according to the conventional microsensor, although the silicon chip and the cover member are bonded by an adhesive, a protective thin film is formed on the surface of the silicon chip, Since the bonding layer is formed by the silicon chip, the thin film, the adhesive, and the cover member, the bonding strength between the silicon chip and the thin film, which has the smallest bonding strength, becomes the bonding strength of the bonding layer, and the bonding strength between the silicon chip and the cover member. However, there was a problem that Specifically, as shown in FIGS. 7A and 7B, a silicon chip 702 having a protective thin film 701 formed on the upper surface thereof and a cover member 703 are bonded to each other with an adhesive 7
Even if the adhesive strength of the adhesive 704 is large, if the bonding strength between the silicon chip 702 and the thin film 701 is small, the bonding strength between the cover member 703 and the silicon chip 702 is reduced as a result.

【0004】また,シリコンチップとカバー部材の接合
強度が低下し,温度補償用のセンサ部が外部雰囲気に暴
露されると,マイクロセンサの高精度・高信頼性が低下
するという不都合も発生する。
Further, if the bonding strength between the silicon chip and the cover member is reduced and the temperature compensating sensor portion is exposed to the external atmosphere, there is a disadvantage that the precision and reliability of the microsensor are reduced.

【0005】本発明は上記に鑑みてなされたものであっ
て,シリコンチップとカバー部材の接合強度を向上させ
ることを目的とする。
The present invention has been made in view of the above, and an object thereof is to improve the bonding strength between a silicon chip and a cover member.

【0006】[0006]

【課題を解決するための手段】本発明は上記の目的を達
成するために,上部表面に保護用の薄膜が形成されたシ
リコンチップと,カバー部材とを接着剤で接合してなる
マイクロセンサにおいて,接着剤を塗布する面の薄膜を
除去し,シリコンチップ,接着剤,カバー部材の順序で
重なる接合層を形成したマイクロセンサを提供するもの
である。
In order to achieve the above object, the present invention provides a microsensor in which a silicon chip having a protective thin film formed on an upper surface thereof and a cover member are bonded with an adhesive. The present invention provides a microsensor in which a thin film on a surface to which an adhesive is applied is removed and a bonding layer is formed in which a silicon chip, an adhesive, and a cover member are overlapped in this order.

【0007】また,本発明は上記の目的を達成するため
に,上部表面に保護用の薄膜が形成されたシリコンチッ
プと,カバー部材とを接着剤で接合してなるマイクロセ
ンサにおいて,シリコンチップの端部及び端部の側面
と,接着剤と,カバー部材とで形成される接合層を有す
るマイクロセンサを提供するものである。
Further, in order to achieve the above object, the present invention provides a microsensor in which a silicon chip having a protective thin film formed on its upper surface and a cover member are bonded with an adhesive agent. The present invention provides a microsensor having a joining layer formed of an end portion, a side surface of the end portion, an adhesive, and a cover member.

【0008】また,本発明は上記の目的を達成するため
に,上部表面に保護用の薄膜が形成されたシリコンチッ
プと,カバー部材とを接着剤で接合してなるマイクロセ
ンサにおいて,カバー部材はシリコンチップの側面の一
部或いは全部を覆う蓋形状であり,且つ,シリコンチッ
プの側面と,接着剤と,カバー部材とで形成される接合
層を有するマイクロセンサを提供するものである。
In order to achieve the above object, the present invention provides a microsensor in which a cover member and a silicon chip having a protective thin film formed on the upper surface thereof are joined with an adhesive, Provided is a microsensor having a lid shape that covers a part or all of the side surface of a silicon chip and having a bonding layer formed of the side surface of the silicon chip, an adhesive, and a cover member.

【0009】また,本発明は上記の目的を達成するため
に,上部表面に保護用の薄膜が形成されたシリコンチッ
プと,カバー部材とを接着剤で接合してなるマイクロセ
ンサにおいて,シリコンチップは接着剤を塗布する位置
にエッチングによって形成した溝部を有し,溝部と,接
着剤と,カバー部材とで形成される接合層を有するマイ
クロセンサを提供するものである。
Further, in order to achieve the above object, the present invention provides a microsensor in which a silicon chip having a protective thin film formed on its upper surface and a cover member are bonded by an adhesive, and the silicon chip is Provided is a microsensor having a groove formed by etching at a position where an adhesive is applied and having a bonding layer formed of the groove, the adhesive, and the cover member.

【0010】[0010]

【作用】本発明のマイクロセンサ(請求項1)は,接着
剤を塗布する面の薄膜を除去し,シリコンチップとカバ
ー部材とを接着剤で直接接合して接合層を形成する。
In the microsensor of the present invention (claim 1), the thin film on the surface to which the adhesive is applied is removed and the silicon chip and the cover member are directly bonded with the adhesive to form a bonding layer.

【0011】また,本発明のマイクロセンサ(請求項
2)は,シリコンチップの端部及び端部の側面とカバー
部材とを接着剤で直接接合して接合層を形成する。
In the microsensor of the present invention (claim 2), the end portion of the silicon chip and the side surface of the end portion are directly joined to the cover member with an adhesive to form a joining layer.

【0012】また,本発明のマイクロセンサ(請求項
3)は,蓋形状のカバー部材でシリコンチップの側面の
一部或いは全部を覆い,シリコンチップの側面とカバー
部材とを接着剤で直接接合して接合層を形成する。
Further, in the microsensor of the present invention (claim 3), a cover member having a lid shape covers a part or all of the side surface of the silicon chip, and the side surface of the silicon chip and the cover member are directly bonded with an adhesive. To form a bonding layer.

【0013】また,本発明のマイクロセンサ(請求項
4)は,シリコンチップ上の接着剤を塗布する位置にエ
ッチングによって溝部を形成し,シリコンチップの溝部
とカバー部材とを接着剤で直接接合して接合層を形成す
る。
Further, in the microsensor of the present invention (claim 4), a groove is formed by etching at a position on the silicon chip where the adhesive is applied, and the groove of the silicon chip and the cover member are directly bonded with the adhesive. To form a bonding layer.

【0014】[0014]

【実施例】以下,本発明のマイクロセンサについて,
〔実施例1〕,〔実施例2〕,〔実施例3〕,〔実施例
4〕,〔実施例5〕の順に図面を参照して詳細に説明す
る。
EXAMPLES Hereinafter, the microsensor of the present invention will be described.
[Embodiment 1], [Embodiment 2], [Embodiment 3], [Embodiment 4], [Embodiment 5] will be described in detail with reference to the drawings.

【0015】〔実施例1〕図1は,実施例1のマイクロ
センサのカバー部材101の構成を示し,同図(a)は
接着剤102側から見たカバー部材101の平面図,同
図(b)はA−A断面図を示す。実施例1のマイクロセ
ンサは,温度補償用センサと検出用センサとを有してお
り,図示の如く,カバー部材101は,温度補償用セン
サ部を覆って外部雰囲気と遮断するためのキャビティ1
01aと,外部雰囲気を取り込む検出穴101bが設け
られた検出用センサ部を覆うキャビティ101cとを有
している。
[Embodiment 1] FIG. 1 shows the structure of a cover member 101 of a microsensor according to Embodiment 1, and FIG. 1A is a plan view of the cover member 101 viewed from the adhesive 102 side. b) shows an AA cross-sectional view. The microsensor of the first embodiment has a temperature compensating sensor and a detecting sensor, and as shown in the figure, the cover member 101 covers the temperature compensating sensor portion and cavities 1 for blocking the external atmosphere.
01a and a cavity 101c that covers the detection sensor portion provided with a detection hole 101b for taking in an external atmosphere.

【0016】図2は,実施例1のマイクロセンサの構成
を示す。実施例1のマイクロセンサは,温度補償用セン
サ(図示せず)と検出用センサ(図示せず)とを配設し
たシリコンチップ201とカバー部材101とを接着剤
102で接合して構成されている。このシリコンチップ
201上の上部表面には,保護用の薄膜202が形成さ
れいる。
FIG. 2 shows the structure of the microsensor of the first embodiment. The microsensor of the first embodiment is configured by bonding a silicon chip 201 provided with a temperature compensation sensor (not shown) and a detection sensor (not shown) and a cover member 101 with an adhesive 102. There is. A protective thin film 202 is formed on the upper surface of the silicon chip 201.

【0017】ここで,カバー部材101は,同図(a)
に示すように,シリコンチップ202より若干大きくし
てある。従って,カバー部材101をシリコンチップ2
01に重ね合わせて接合させる際に,接着剤102が,
同図(b)のB部拡大図に示すように,シリコンチップ
201の端部及び端部の側面に回り込んで,シリコンチ
ップ201の端部及び端部の側面と,接着剤102と,
カバー部材101とから成る接合層を形成する。
Here, the cover member 101 is shown in FIG.
As shown in FIG. 5, it is slightly larger than the silicon chip 202. Therefore, the cover member 101 is attached to the silicon chip 2
When the adhesive 102 is superposed and bonded to 01,
As shown in the enlarged view of part B of FIG. 2B, the end portion of the silicon chip 201 and the side surface of the end portion are wrapped around and the end portion and the side surface of the end portion of the silicon chip 201, the adhesive 102,
A bonding layer including the cover member 101 is formed.

【0018】このような接合層を設けることにより,接
着剤102は薄膜202が介在する水平方向の接合だけ
でなく,薄膜202のない側面からも固定するのでシリ
コンチップ201とカバー部材101の接合強度を向上
させることができる。
By providing such a bonding layer, the adhesive 102 is fixed not only in the horizontal direction with the thin film 202 interposed but also from the side surface without the thin film 202, so that the bonding strength between the silicon chip 201 and the cover member 101 is high. Can be improved.

【0019】また,実施例1のマイクロセンサは,カバ
ー部材101をシリコンチップ201より大きくするこ
とを除けば,従来のマイクロセンサと構成上の違いはな
いので,従来と同一のプロセスで作成し,簡単に接合強
度の向上を図ることができる。
The microsensor of the first embodiment has the same structure as the conventional microsensor except that the cover member 101 is larger than the silicon chip 201. Therefore, the microsensor is manufactured by the same process as the conventional one. It is possible to easily improve the bonding strength.

【0020】前述した実施例1では,カバー部材101
をシリコンチップ201より大きくすることにより,接
着剤102を介してシリコンチップ201の端部の側面
とカバー部材101とを接合したが,シリコンチップ2
01と同一の大きさのカバー部材を用いて,カバー部材
をずらしてシリコンチップ201の端部の側面とカバー
部材とを接合しても同様の効果を得ることができる。
In the first embodiment described above, the cover member 101
Is larger than the silicon chip 201, the side surface of the end portion of the silicon chip 201 and the cover member 101 are bonded via the adhesive 102.
Even if the cover member having the same size as 01 is used and the cover member is displaced to join the side surface of the end portion of the silicon chip 201 and the cover member, the same effect can be obtained.

【0021】〔実施例2〕図3(a),(b)は,実施
例2のマイクロセンサの接合層を示す。実施例2のマイ
クロセンサでは,図示の如く,接着剤102を塗布する
面の薄膜202を除去し,シリコンチップ201,接着
剤102,カバー部材101の順序で重なる接合層を形
成している。このような接合層を設けることにより,薄
膜202を介在させることなく固定するのでシリコンチ
ップ201とカバー部材101の接合強度を向上させる
ことができる。
[Embodiment 2] FIGS. 3 (a) and 3 (b) show a bonding layer of a microsensor of Embodiment 2. FIG. In the microsensor of the second embodiment, as shown in the figure, the thin film 202 on the surface to which the adhesive 102 is applied is removed, and a bonding layer that overlaps the silicon chip 201, the adhesive 102, and the cover member 101 in this order is formed. By providing such a bonding layer, since the thin film 202 is fixed without intervening, the bonding strength between the silicon chip 201 and the cover member 101 can be improved.

【0022】〔実施例3〕図4は,実施例3のマイクロ
センサの構成を示す。実施例3では,カバー部材101
に代えて,シリコンチップの側面の一部或いは全部を覆
う蓋形状のカバー部材401を用いたものである。接着
剤102は,図示の如く,蓋形状のカバー部材401の
シリコンチップ201と対応する内側の面に塗布されて
いる。従って,シリコンチップ201の側面と,接着剤
102と,カバー部材401とで接合層が形成されてい
る。このような接合層を設けることにより,薄膜202
を介在させることなく固定するのでシリコンチップ20
1とカバー部材401の接合強度を向上させることがで
きる。また,シリコンチップ201の側面と全体を用い
て接着剤102で接着するので,温度補償用センサ(図
示せず)を外部雰囲気から遮断する際のシール性を向上
させることができる。
[Third Embodiment] FIG. 4 shows the structure of a microsensor according to a third embodiment. In the third embodiment, the cover member 101
Instead of this, a lid-shaped cover member 401 that covers a part or all of the side surface of the silicon chip is used. The adhesive 102 is applied to the inner surface of the lid-shaped cover member 401 corresponding to the silicon chip 201 as illustrated. Therefore, the side surface of the silicon chip 201, the adhesive 102, and the cover member 401 form a bonding layer. By providing such a bonding layer, the thin film 202
Since it is fixed without interposing a silicon chip 20
1 and the cover member 401 can be improved in joint strength. Moreover, since the side surface of the silicon chip 201 and the entire surface are bonded with the adhesive agent 102, the sealing property when the temperature compensation sensor (not shown) is shielded from the external atmosphere can be improved.

【0023】〔実施例4〕図5は,実施例4のマイクロ
センサの構成を示す。実施例4では,シリコンチップ5
01の端部の接着剤102を塗布する位置にエッチング
によって溝部502を形成し,カバー部材503の溝部
502と当接する位置に凸部504を設け,溝部50
2,接着剤102,凸部504(即ち,カバー部材50
3)とで接合層を形成したものである。このような接合
層を設けることにより,薄膜202を介在させることな
く固定するのでシリコンチップ501とカバー部材50
3の接合強度を向上させることができる。尚,詳細は省
略するが溝部502の作成は,センサのエアブリッジを
形成するエッチングの際に同時に行うことができ,特に
特別な工程を追加する必要はない。
[Fourth Embodiment] FIG. 5 shows the structure of a microsensor according to a fourth embodiment. In the fourth embodiment, the silicon chip 5
The groove portion 502 is formed by etching at the position where the adhesive 102 is applied at the end of 01, and the convex portion 504 is provided at the position where the groove portion 502 of the cover member 503 abuts.
2, the adhesive 102, the convex portion 504 (that is, the cover member 50
3) and the bonding layer is formed. By providing such a bonding layer, since the thin film 202 is fixed without interposition, the silicon chip 501 and the cover member 50 are fixed.
The bonding strength of No. 3 can be improved. Although details are omitted, the groove 502 can be formed at the same time as the etching for forming the air bridge of the sensor, and it is not necessary to add a special process.

【0024】〔実施例5〕図6は,実施例4のマイクロ
センサの構成を示す。実施例4では,シリコンチップ6
01の接着剤102を塗布する全ての位置にエッチング
によって溝部602を形成し,カバー部材603の溝部
602と当接する位置に凸部604を設け,溝部60
2,接着剤102,凸部604(即ち,カバー部材60
3)とで接合層を形成したものである。このような接合
層を設けることにより,薄膜202を介在させることな
く固定するのでシリコンチップ601とカバー部材60
3の接合強度を向上させることができる。
[Embodiment 5] FIG. 6 shows the structure of a microsensor of Embodiment 4. In the fourth embodiment, the silicon chip 6
The groove portion 602 is formed by etching at all the positions where the adhesive 102 of No. 01 is applied, and the convex portion 604 is provided at the position of contacting the groove portion 602 of the cover member 603.
2, the adhesive 102, the convex portion 604 (that is, the cover member 60
3) and the bonding layer is formed. By providing such a bonding layer, the thin film 202 is fixed without the interposition, so that the silicon chip 601 and the cover member 60 are fixed.
The bonding strength of No. 3 can be improved.

【0025】[0025]

【発明の効果】以上説明したように本発明のマイクロセ
ンサは,接着剤を塗布する面の薄膜を除去し,シリコン
チップ,接着剤,カバー部材の順序で重なる接合層を形
成したため,シリコンチップとカバー部材の接合強度を
向上させることができる。
As described above, in the microsensor of the present invention, the thin film on the surface to which the adhesive is applied is removed, and the bonding layer that overlaps the silicon chip, the adhesive, and the cover member in this order is formed. The joint strength of the cover member can be improved.

【0026】また,本発明のマイクロセンサは,シリコ
ンチップの端部及び端部の側面と,接着剤と,カバー部
材とで形成される接合層を有するため,シリコンチップ
とカバー部材の接合強度を向上させることができる。
Further, since the microsensor of the present invention has the end portion of the silicon chip and the side surface of the end portion, the adhesive, and the joining layer formed by the cover member, the joining strength between the silicon chip and the cover member is improved. Can be improved.

【0027】また,本発明のマイクロセンサは,カバー
部材はシリコンチップの側面の一部或いは全部を覆う蓋
形状であり,且つ,シリコンチップの側面と,接着剤
と,カバー部材とで形成される接合層を有するため,シ
リコンチップとカバー部材の接合強度を向上させること
ができる。
In the microsensor of the present invention, the cover member has a lid shape that covers a part or all of the side surface of the silicon chip, and is formed by the side surface of the silicon chip, the adhesive, and the cover member. Since the bonding layer is provided, the bonding strength between the silicon chip and the cover member can be improved.

【0028】また,本発明のマイクロセンサは,シリコ
ンチップは接着剤を塗布する位置にエッチングによって
形成した溝部を有し,溝部と,接着剤と,カバー部材と
で形成される接合層を有するため,シリコンチップとカ
バー部材の接合強度を向上させることができる。
Further, in the microsensor of the present invention, the silicon chip has a groove formed by etching at a position where an adhesive is applied, and has a bonding layer formed of the groove, the adhesive and the cover member. , It is possible to improve the bonding strength between the silicon chip and the cover member.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1のマイクロセンサのカバー部材の構成
を示す説明図である。
FIG. 1 is an explanatory diagram showing a configuration of a cover member of a microsensor according to a first embodiment.

【図2】実施例1のマイクロセンサの構成を示す説明図
である。
FIG. 2 is an explanatory diagram showing a configuration of a microsensor of Example 1.

【図3】実施例2のマイクロセンサの接合層を示す説明
図である。
FIG. 3 is an explanatory diagram showing a bonding layer of the microsensor of Example 2.

【図4】実施例3のマイクロセンサの構成を示す説明図
である。
FIG. 4 is an explanatory diagram showing a configuration of a microsensor according to a third embodiment.

【図5】実施例4のマイクロセンサの構成を示す説明図
である。
FIG. 5 is an explanatory diagram showing a configuration of a microsensor of Example 4.

【図6】実施例5のマイクロセンサの構成を示す説明図
である。
FIG. 6 is an explanatory diagram showing a configuration of a microsensor of Example 5.

【図7】従来のマイクロセンサの接合層を示す説明図で
ある。
FIG. 7 is an explanatory diagram showing a bonding layer of a conventional microsensor.

【符号の説明】[Explanation of symbols]

101 カバー部材 102 接着
剤 201 シリコンチップ 202 薄膜 401 蓋形状のカバー部材 501 シリコンチップ 502 溝部 503 カバー部材 504 凸部 601 シリコンチップ 602 溝部 603 カバー部材 604 凸部
101 Cover Member 102 Adhesive 201 Silicon Chip 202 Thin Film 401 Lid-shaped Cover Member 501 Silicon Chip 502 Groove 503 Cover Member 504 Convex 601 Silicon Chip 602 Groove 603 Cover Member 604 Convex

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 上部表面に保護用の薄膜が形成されたシ
リコンチップと,カバー部材とを接着剤で接合してなる
マイクロセンサにおいて,前記接着剤を塗布する面の薄
膜を除去し,前記シリコンチップ,接着剤,カバー部材
の順序で重なる接合層を形成したことを特徴とするマイ
クロセンサ。
1. A microsensor comprising a silicon chip having a protective thin film formed on an upper surface thereof and a cover member bonded with an adhesive, wherein the thin film on the surface to which the adhesive is applied is removed to remove the silicon. A microsensor comprising a chip, an adhesive, and a bonding layer formed in this order in the order of a cover member.
【請求項2】 上部表面に保護用の薄膜が形成されたシ
リコンチップと,カバー部材とを接着剤で接合してなる
マイクロセンサにおいて,前記シリコンチップの端部及
び端部の側面と,接着剤と,カバー部材とで形成される
接合層を有することを特徴とするマイクロセンサ。
2. A microsensor comprising a silicon chip having a protective thin film formed on an upper surface thereof and a cover member joined by an adhesive, wherein an end portion and a side surface of the end portion of the silicon chip, and an adhesive agent. A microsensor having a bonding layer formed of: and a cover member.
【請求項3】 上部表面に保護用の薄膜が形成されたシ
リコンチップと,カバー部材とを接着剤で接合してなる
マイクロセンサにおいて,前記カバー部材は前記シリコ
ンチップの側面の一部或いは全部を覆う蓋形状であり,
且つ,前記シリコンチップの側面と,接着剤と,カバー
部材とで形成される接合層を有することを特徴とするマ
イクロセンサ。
3. A microsensor comprising a silicon chip having a protective thin film formed on an upper surface thereof and a cover member joined by an adhesive, wherein the cover member covers a part or all of a side surface of the silicon chip. It has a lid shape to cover
A microsensor having a bonding layer formed of a side surface of the silicon chip, an adhesive, and a cover member.
【請求項4】 上部表面に保護用の薄膜が形成されたシ
リコンチップと,カバー部材とを接着剤で接合してなる
マイクロセンサにおいて,前記シリコンチップは前記接
着剤を塗布する位置にエッチングによって形成した溝部
を有し,前記溝部と,接着剤と,カバー部材とで形成さ
れる接合層を有することを特徴とするマイクロセンサ。
4. A microsensor comprising a silicon chip having a protective thin film formed on an upper surface thereof and a cover member bonded with an adhesive, wherein the silicon chip is formed by etching at a position where the adhesive is applied. A microsensor having a groove portion, and a bonding layer formed of the groove portion, an adhesive, and a cover member.
JP04309407A 1992-10-23 1992-10-23 Micro sensor Expired - Fee Related JP3127056B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04309407A JP3127056B2 (en) 1992-10-23 1992-10-23 Micro sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04309407A JP3127056B2 (en) 1992-10-23 1992-10-23 Micro sensor

Publications (2)

Publication Number Publication Date
JPH06138072A true JPH06138072A (en) 1994-05-20
JP3127056B2 JP3127056B2 (en) 2001-01-22

Family

ID=17992642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04309407A Expired - Fee Related JP3127056B2 (en) 1992-10-23 1992-10-23 Micro sensor

Country Status (1)

Country Link
JP (1) JP3127056B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017173126A (en) * 2016-03-24 2017-09-28 ヤマハファインテック株式会社 Gas sensor
WO2019103116A1 (en) * 2017-11-27 2019-05-31 アルプスアルパイン株式会社 Humidity detection device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6040334B1 (en) * 2016-02-03 2016-12-07 情報機器販売株式会社 Deodorant treatment material for tobacco

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017173126A (en) * 2016-03-24 2017-09-28 ヤマハファインテック株式会社 Gas sensor
WO2019103116A1 (en) * 2017-11-27 2019-05-31 アルプスアルパイン株式会社 Humidity detection device

Also Published As

Publication number Publication date
JP3127056B2 (en) 2001-01-22

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