JPH06134916A - Low friction-resistant mechanical part - Google Patents

Abstract

PURPOSE:To obtain a low friction-resistant mechanical part excellent in self- lubricity by forming a chemical adsorbing film of which the surface layer contains a fluorine group and the base part is chemically bonded to a base material by a siloxane bond on the surface of the mechanical part of a slide part such as a gear or a bearing. CONSTITUTION:For example, a slide member such as a gear made of ceramics such as SiO2 is immersed in a raw material soln. prepared by dissolving a surfactant such as CF3(CF2)7(CH2)2SiCl3. Since a large number of hydroxyl groups are contained in the surface of SiO2 the SiCl group of a substance containing a carbon fluoride group and a chlorosilane group and a hydroxyl group are reacted to generate dechlorination reaction and the bond of CF3(CF2)7(CH2)Si(O-)3 is formed over the entire surface of the slide part and a fluorine-containing monomolecular film 2 can be formed in a thickness of about 15Angstrom in the state chemically bonded to a base material.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a machine part having low friction resistance. More particularly, it relates to mechanical parts such as micromachines having self-lubricating properties.

[0002]

2. Description of the Related Art Sliding members such as gears, bearings, bearings, rotors, rotary shafts, cranks, turbines, etc., which are examples of general mechanical parts, are usually supplied with lubricating oil in order to maintain lubricity. is necessary. If the lubricating oil runs out or the supply becomes insufficient, frictional heat will be generated in the sliding part,
It may be worn and damaged. By the way, in the case of the above-mentioned general mechanical parts, depending on the application of the machine, lubricating oil cannot be used, or there is a great limitation in its use. For example, in food manufacturing equipment and pharmaceutical manufacturing equipment, great care is taken to prevent lubricant from accidentally entering the product. Similarly, great care is taken with medical devices. Further, even if the user is a general consumer such as a watch, the lubricating oil may be necessary in the long term.

Further, a micromachine (micro precision equipment) composed of parts having a so-called size of about 1 mm or less.
Since its parts are too small to use lubricating oil etc., in order to improve the slidability of the micromachine,
The only way to make the surface as smooth as possible was to do so.

[0004]

However, in the case of the general mechanical parts as described above, even if great care is taken, there is no risk that the lubricating oil will leak out. Further, when the user is a general consumer such as a watch, it may not be expected to supply the lubricating oil.

Further, in the case of the above-mentioned micromachine, the processing method using photolithography has a limit in smoothing the surface of the component and is not sufficiently durable under the present circumstances.

As described above, there has been a problem in the prior art that no high-performance mechanical parts having excellent sliding resistance have been obtained.
Particularly for precision instruments and medical instruments, mechanical parts having such performance have been strongly demanded.

In order to solve the above-mentioned problems of the prior art, it is an object of the present invention to provide a mechanical component having low frictional resistance and excellent self-lubricating property.

[0008]

In order to achieve the above object, a low friction resistant mechanical component of the present invention is a chemical adsorption film having a surface layer containing a fluorine group and a base portion chemically bonded to a substrate by a siloxane bond. Is formed at least on the surface of the sliding portion of the mechanical component.

In the above structure, the chemical adsorption film is preferably a monomolecular film.

In addition, the above-mentioned structure can be preferably applied to a micromachine as a mechanical part.

[0011]

According to the above-mentioned constitution of the present invention, the chemical adsorption film having the surface layer containing the fluorine group and the base portion chemically bonded to the base material by the siloxane bond is formed at least on the surface of the sliding portion of the mechanical component. Therefore, it is possible to obtain a mechanical component having a low frictional resistance and an excellent self-lubricating property. That is, since a fluoroalkyl group is present on the surface layer of the chemical adsorption film,
It has low frictional resistance and excellent self-lubricating property. Also,
Since the base of the chemisorption film is formed by chemically bonding via a siloxane bond, it can be a film with excellent durability, and the chemisorption film is a base material even if the surface is repeatedly slid. It does not peel off easily from the surface. Further, since the chemical adsorption film of the present invention is an extremely thin film of nanometer to angstrom unit, it does not impair the dimensional accuracy of the machined machine.

Further, according to the preferable constitution of the present invention in which the chemisorption film is a monomolecular film, a thin film having a uniform thickness can be formed, so that it is excellent in transparency and may impair mechanical properties. Absent.

Further, according to the preferable structure of the present invention, which can be applied to a micromachine as a mechanical component,
The self-lubricating property can be imparted without the need for a lubricant, and the durability can be improved.

[0014]

EXAMPLES The material of the machine part which can be used in the present invention may be any kind such as metal, ceramics, plastic and the like. Further, any type of mechanical parts may be applied. For convenience of explanation, a micromachine will be described as an example. As a micromachine sliding member,
Gears, rotors, rotating shafts, cranks, turbines, and other parts have a size of about 1 mm or less.

Since a general micromachine component is made of ceramics or metal, it has an oxide film containing hydroxyl groups on its surface. Therefore, a chlorosilane group (SiCl _n X
A molecule containing a linear carbon chain having a _3-n group, n = 1, 2, 3 and X is a functional group, for example, a non-aqueous solvent mixed with a chlorosilane-based surfactant containing a fluorocarbon group and a chlorosilane group. A hydroxyl group on the surface of the sliding part of the micromachine component is caused to contact with a chlorosilyl group of a substance containing a plurality of the chlorosilyl groups to deposit a monomolecular film of the substance on the surface of the sliding part of the micromachine component, or The micromachine part is contacted with a non-aqueous solvent mixed with a substance containing a plurality of chlorosilyl groups to react the hydroxyl group on the sliding surface of the micromachine part with the chlorosilyl group of the substance containing a plurality of chlorosilyl groups. A step of depositing on the surface of the sliding portion and a plurality of extra chlorosilyl groups remaining on the surface of the micromachine component using a non-aqueous organic solvent A step of washing and removing the material to form a siloxane-based monomolecular film made of a substance containing a plurality of chlorosilyl groups on the sliding part of the micromachine part; and a silane-based interface containing a linear carbon chain having a chlorosilane group at one end. A fluorocarbon-based chemically adsorbed monomolecular cumulative film can be formed on the surface of the sliding part of the micromachine component by the step of chemically adsorbing the activator on the sliding part of the micromachine component and accumulating the monomolecular adsorption film.

As a result, a very thin nanometer-level fluorocarbon-based monomolecular film is formed on the surface of the micromachine component, and the original function of the micromachine component is not impaired. Further, as this film, a fluorocarbon monomolecular film has excellent slidability, and it becomes possible to reduce the sliding resistance on the surface. Therefore, it is possible to provide a highly reliable micromachine with less wear. Furthermore, the micromachine shown in the present invention does not require a lubricating oil, and since the formed monomolecular film is inactive to the human body, it can be inserted into the human body.

Examples of the chlorosilane-based surfactant having a fluorinated alkyl group include CF ₃ (CF ₂ )
₇ (CF ₂ ) ₂ SiCl ₃ , CF ₃ CH ₂ O (CH ₂ )
₁₅ SiCl ₃ , CF ₃ (CH ₂ ) ₂ Si (CH ₃ )
₂ (CH ₂ ) ₁₅ SiCl ₃ , F (CF ₂ ) ₄ (CH ₂ )
₂ Si (CH ₃ ) ₂ (CH ₂ ) ₉ SiCl ₃ , F (CF
₂ ) ₈ (CH ₂ ) ₂ Si (CH ₃ ) ₂ (CH ₂ ) ₉ Si
Cl ₃ , CF ₃ COO (CH ₂ ) ₁₅ SiCl ₃ , CF ₃
Examples include trichlorosilane-based surfactants such as (CF ₂ ) ₅ (CH ₂ ) ₂ SiCl ₃ and the like, such as CF ₃ (C
F ₂ ) ₇ (CH ₂ ) ₂ SiCl _n (CH ₃ ) _3-n , CF
_{3 (CF 2) 7 (CH} 2) 2 SiCl n (C 2 H 5)
_{3-n, CF 3 CH 2O} (CH 2) 15 SiCl n (CH 3)
_{3-n, CF 3 CH 2O} (CH 2) 15 SiCl n (C
₂ H ₅ ) _3-n , CF ₃ (CH ₂ ) ₂ Si (CH ₃ )
₂ (CH ₂ ) ₁₅ SiCl _n (CH ₃ ) _3-n , F (C
F ₂ ) ₄ (CH ₂ ) ₂ Si (CH ₃ ) ₂ (CH ₂ ) ₉ S
iCl _n (C ₂ H ₅ ) _3-n , F (CF ₂ ) ₈ (CH ₂ )
₂ Si (CH ₃ ) ₂ (CH ₂ ) ₉ SiCl _n (CH ₃ )
_{3-n, CF 3 COO (} CH 2) 15 SiCl n (CH 3)
_3-n , CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ SiCl _n (C
H ₃ ) _3-n (wherein _{n in the} formula is 1 or 2) and the like, and lower alkyl group-substituted monochlorosilane-based or dichlorosilane-based surfactants. Among these, especially chlorosilyl bonds other than the chlorosilyl bond bonded to the hydrophilic group of the trichlorosilane-based surfactant form an intermolecular bond with the adjacent chlorosilane group and the siloxane bond, resulting in a stronger chemisorption film. Is preferred.

Further, CF ₃ (CF ₂ ) _n CH ₂ CH ₂ S
iCl ₃ (where n in the formula is an integer, and about 3 to 25 is the easiest to handle) is preferable because it is balanced with self-lubricating property and functionality such as water repellency and antifouling property. Furthermore, if an ethylene group or an acetylene group is incorporated in the fluorinated alkyl chain portion, it can be crosslinked by electron beam irradiation of about 5 megarads after the formation of the chemisorption film, so the hardness of the chemisorption film itself can be further improved. is there.

The chlorosilane-based surfactant which can be used in the present invention is not only linear as described above, but also has a branched alkyl fluoride group or hydrocarbon group, or has a fluorinated alkyl group or silicon atom at the terminal silicon. A form in which a hydrocarbon group is substituted (that is, R, R ₁ , R ₂ , and R ₃ are represented by general formulas R ₂ SiCl ₂ , R ₃ Si as fluoroalkyl groups or hydrocarbon groups).
Cl, R ₁ R ₂ SiCl ₂ or R ₁ R ₂ R ₃ SiC
However, in order to increase the adsorption density, a linear chain is generally preferable. Furthermore, for example, SiC
l ₄ , SiHCl ₃ , SiH ₂ Cl ₂ , Cl- (SiC
l ₂ O) _n -SiCl ₃ (where n is a natural number), Si
Cl _m (CH ₃ ) _4-m , SiCl _m (C ₂ H ₅ )
_4-m (where m is an integer from 1 to 3), HSiCl ₁ (C
H _{3) 3-l,} after _{HSiCl l (C 2 H 5)} 3-l ( where Shikichu l causes the chemical adsorbing material containing a plurality of chlorosilyl bonds, such as 1 or 2) or the like, when reacted with water The chlorosilyl bond on the surface changes to a hydrophilic silanol bond, and the surface of the plastic molded product becomes hydrophilic.

Among these substances containing a plurality of chlorosilyl groups, tetrachlorosilane (SiCl ₄ ) is preferable because it has a high reactivity and a small molecular weight and can give a silanol bond at a higher density. By making the substrate hydrophilic in this manner, the hydrophilicity can be made higher than that of the oxidation treatment of the substrate containing the polymer. For example, a chlorosilane-based surfactant containing a fluorinated alkyl group can be chemically adsorbed thereon, and the chemisorption film thus obtained is more preferable because it has a higher density.

When the mechanical parts are made of plastic, a chemical adsorption film containing a fluorinated alkyl group is formed on the surface of the plastic molded product through a siloxane bond. The means for this is to oxidize the surface of the plastic molded product. The step of making hydrophilic and the surface subjected to oxidation treatment are contacted by immersing it in a non-aqueous organic solvent to chemically adsorb the chlorosilane-based surfactant on the surface of the base material, and to form a fluorinated alkyl group through the siloxane bond. It is preferable to include a step of forming a chemisorption film to be contained.

As a method for oxidizing the plastic material, for example, an ordinary method such as oxygen plasma treatment, corona treatment, or immersion in a mixed solution of concentrated sulfuric acid and potassium dichromate (chromium mixed acid solution treatment) is applied. .

The non-aqueous solvent used in the present invention may be any organic solvent that does not dissolve the plastic material forming the chemisorption film and does not have active hydrogen that reacts with the chlorosilane-based surfactant. For example, 1,1-dichloro, 1-fluoroethane, 1,1-dichloro, 2, 2,
2-trifluoroethane, 1,1-dichloro, 2,2
Fluorine-based solvents such as 3,3,3-pentafluoropropane, 1,3-dichloro, 1,1,2,2,3-heptafluoropropane, and hydrocarbon-based solvents such as hexane, octane, hexadecane and cyclohexane, For example, ether solvents such as dibutyl ether and dibenzyl ether,
For example, any of ester solvents such as methyl acetate, ethyl acetate, isopropyl acetate, and amyl acetate is preferable.

A micromachine relating to the present invention includes a gear, a rotor, a rotary shaft, a crank, a turbine, and other parts having a size of 1 mm or less. explain.

Example 1 First, SiO ₂ having a diameter of 100 μm after processing was finished.
Made micromachine 1 (gear 1a, rotating shaft 1b)
Is prepared (FIG. 1) and washed with an organic solvent. Next, an example of a solvent of a substance including a fluorocarbon group and a chlorosilane group, 80% n-hexadecane (toluene _{CF 3 (CF 2) 7 (} CH 2) 2 SiCl 3, an example of a non-aqueous solvent , Xylene, dicyclohexyl), 12% carbon tetrachloride, 8% chloroform solution dissolved in a mixed solvent of about 2% concentration to prepare a raw material solution, and at least the sliding portion 1 '(may be all) When immersed for about 2 hours, the SiO ₂ surface contains many hydroxyl groups, so the SiCl groups of substances containing fluorocarbon groups and chlorosilane groups react with the hydroxyl groups to cause a dehydrochlorination reaction, and the entire surface of the sliding portion is covered. _{, CF 3 (CF 2) 7} (CH 2) 2 Si (O-)
Bonds of ₃ were generated, and the monomolecular film 2 containing fluorine could be formed with a film thickness of about 15 angstroms in a state of being chemically bonded to the gear and the rotating shaft. The critical surface energy of this film was measured to be 15 dyne / cm (measurement device: manufactured by Kyowa Interface Science Co., Ltd., automatic contact angle meter, CA-
Z type). Furthermore, the dynamic friction coefficient was 0.15 (measurement device: manufactured by Kyowa Interface Science Co., Ltd., fully automatic dynamic friction coefficient meter,
DFPM-SS type).

This monomolecular film is sufficiently thinner than the dimensions of the gear and the rotating shaft, and since it contains a fluorocarbon group, it has high lubricity and is extremely strongly chemically bonded, so that it can rotate at high speed. It also endured and did not peel at all. Further, this gear was tested by rotating it 10,000 times, but it was able to endure about 30 times more rotation than the untreated one.

Example 2 In the case of alumina which is hydrophilic but has a small proportion of hydroxyl groups (the same applies to metals such as stainless steel), a substance containing a plurality of trichlorosilyl groups (for example, SiCl ₄ or SiHCl ₃ , SiH ₂₎ Cl ₂ , Cl- (SiCl
₂ O) _n -SiCl ₃ (n is an integer). In particular, SiCl ₄
Is used, the molecule is small and the activity to hydroxyl group is large, so that it has a large effect of uniformly hydrophilizing the surface.) When immersed in a solution of 1 wt% dissolved in a non-aqueous solvent, for example, a chloroform solvent for about 30 minutes, Since there are some hydrophilic OH groups 12 on the surface of the manufactured component 11 (FIG. 3), dehydrochlorination reaction occurs on the surface and a chlorosilane monomolecular film of a substance containing a plurality of trichlorosilyl groups is formed.

For example, when SiCl ₄ is used as the substance containing a plurality of trichlorosilyl groups, a small amount of hydrophilic OH groups are exposed on the surface 11 of the component, and a dehydrochlorination reaction occurs on the surface, which is shown below. As in (Chemical Formula 1) and (Chemical Formula 2), molecules are fixed to the surface via —SiO— bonds.

[0029]

[Chemical 1]

[0030]

[Chemical 2] Then, wash with a non-aqueous solvent such as chloroform,
If further washed with water, Si that has not reacted with the surface of the component
The Cl ₄ molecule is removed, and (Chemical formula 3) and (Chemical formula 4) shown below
As described above, a siloxane monomolecular film 13 for the surface of the component is obtained (FIG. 4).

[0031]

[Chemical 3]

[0032]

[Chemical 4] The monomolecular film 13 formed at this time is -S
Since it is completely bonded through the chemical bond of iO-, it never peels off. Further, the obtained monomolecular film has many silanol bonds (SiOH bonds) on the surface. About three times as many as the initial hydroxyl groups are generated.

Therefore, a non-aqueous solvent mixed with a substance containing a fluorocarbon group and a chlorosilane group, for example, CF
_{3 (CF 2) 7 (CH} 2) using ₂ SiCl _3, 80% n- hexadecane dissolved at a concentration of about 3%, 12% carbon tetrachloride, and adjust the 8% chloroform solution, Si on the surface
When a part with a monomolecular film having many OH bonds is immersed for about 1 hour, CF ₃ (CF ₂ ) ₇ (C
H _{2) 2} Si (O-) bond ₃ are generated, the film thickness of the high density approximately 15 Angstroms over the component surface entire state monomolecular film 14 was a siloxane monomolecular film chemically bonded underlayer containing fluorine Could be formed (Fig. 5). The monomolecular cumulative film was not peeled at all even after the peeling test. The sliding resistance was about half that in the case where a monomolecular film containing fluorine was formed directly on the surface of the component.

Furthermore, in the above embodiment, CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiC was used as the fluorocarbon surfactant.
Although l ₃ was used, if an ethylene group or an acetylene group is added to or incorporated in the alkyl chain portion, it can be crosslinked by electron beam irradiation of about 5 megarads after forming the monomolecular film, so that the hardness of the monomolecular film is further improved. It is also possible.

According to the embodiment described above, since the lubricating fluorocarbon-based monomolecular film having a nanometer level film thickness sufficiently smaller than the size of the parts of the micromachine is formed on the surface of the sliding part of the micromachine, the micromachine is used. It does not impair the original function. Further, this fluorocarbon monolayer is inert to the human body, the sliding resistance can be made extremely low, and neither peeling nor simulated wear occurs. Therefore, it is extremely effective in a micromachine used in a human body where a lubricant or the like cannot be used.

[0036]

As described above, according to the present invention, a chemical adsorption film having a surface layer containing a fluorine group and a base portion chemically bonded to a substrate by a siloxane bond is formed at least on the surface of a sliding portion of a mechanical component. As a result, a mechanical component having low frictional resistance and excellent self-lubricating property can be obtained.

Further, according to the preferable constitution of the present invention in which the chemisorption film is a monomolecular film, a thin film having a uniform thickness can be formed, so that it is excellent in transparency and the dimensional accuracy of the machined machine. It doesn't hurt.

Further, according to the preferable constitution of the present invention which can be applied to a micromachine as a mechanical component,
In practice, self-lubricating properties can be imparted without the need for a lubricant, and the durability can be improved.

[Brief description of drawings]

FIG. 1 is a perspective view of a SiO ₂ gear and a rotary shaft that are typical examples of a micromachine of the present invention.

FIG. 2 is a conceptual cross-sectional view in which the surface of the gear of the present invention is enlarged to the molecular level.

FIG. 3 is a conceptual cross-sectional view before processing in which the surface of an alumina component is enlarged to a molecular level in order to explain a second embodiment of the micromachine of the present invention.

FIG. 4 is a conceptual cross-sectional view during processing in which the surface of an alumina component is enlarged to a molecular level in order to explain a second embodiment of the micromachine of the present invention.

FIG. 5 is a conceptual cross-sectional view after the process of enlarging the surface of the alumina component to the molecular level in order to explain the second embodiment of the micromachine of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Gear and rotation shaft made from SiO _2, 14 ... Monomolecular film 11 ... Alumina part 12 ... Hydroxyl group 13 ... Monomolecular film

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[Procedure amendment]

[Submission date] April 8, 1993

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0016

[Correction method] Change

[Correction content]

As a result, a fluorocarbon-based monomolecular film having an extremely thin film thickness on the nanometer level is formed on the surface of the micromachine component, so that the original function of the micromachine component is not impaired. Further, as this film, a fluorocarbon monomolecular film has excellent slidability, and it becomes possible to reduce the sliding resistance on the surface. Therefore, it is possible to provide a highly reliable micromachine with less wear. Furthermore, the micromachine shown in the present invention does not require a lubricating oil, and since the formed monomolecular film is inactive to the human body, it can be inserted into the human body.

[Procedure Amendment 2]

[Document name to be amended] Statement

[Correction target item name] 0017

[Correction method] Change

[Correction content]

Chlorosila having the fluorinated alkyl group
As the surfactant, for example, CF₃(CH ₂)
₇(CF₂)₂SiCl₃, CF₃CH₂O (CH₂)
₁₅SiCl₃, CF₃(CH₂)₂Si (CH₃)
₂(CH₂)₁₅SiCl₃, F (CF ₂)_Four(CH₂)
₂Si (CH₃)₂(CH₂)₉SiCl₃, F (CF
₂)₈(CH₂)₂Si (CH₃)₂(CH₂)₉Si
Cl₃, CF₃COO (CH₂)₁₅SiCl₃, CF₃
(CF₂)_Five(CH₂)₂SiCl₃A bird like
Chlorosilane-based surfactants such as CF₃(C
F₂)₇(CH₂)₂SiCl_n(CH₃)_3-n, CF
₃(CF₂)₇(CH₂)₂SiCl_n(C₂H _Five)
_3-n, CF₃CH ₂ OCH₂)₁₅SiCl_n(CH₃)
_3-n, CF₃CH ₂ O(CH₂)₁₅SiCl_n(C₂H
_Five)_3-n, CF₃(CH₂)₂Si (CH₃)₂(CH
₂)₁₅SiCl_n(CH₃)_3-n, F (CF₂)_Four(C
H₂)₂Si (CH₃)₂(CH₂)₉SiCl_n(C
₂H_Five)_3-n, F (CF₂)₈(CH ₂)₂Si (CH
₃)₂(CH₂)₉SiCl_n(CH₃)_3-n, CF₃
COO (CH₂)₁₅SiCl_n(CH₃)_3-n, CF₃
(CF₂)_Five(CH₂)₂SiCl_n(CH₃)
_3-n(However, n in the formula is 1 or 2 in all cases)
Alkyl-substituted monochlorosilane or dichloro
Examples thereof include silane-based surfactants. Among these
Bound to the hydrophilic group of trichlorosilane surfactant
Chlorosilyl bonds other than chlorosilyl bond are adjacent to each other.
Form intermolecular bond by siloxane bond with lorosilane group
Therefore, it is preferable because it provides a stronger chemisorption film.

[Procedure 3]

[Document name to be amended] Statement

[Correction target item name] 0019

[Correction method] Change

[Correction content]

Chlorosilane-based surface active agents that can be used in the present invention
As described above, the sexing agent is not only linear, but is fluorinated.
Even if the alkyl group or hydrocarbon group is branched, or at the end
Of silicon is replaced by a fluorinated alkyl group or hydrocarbon group
Shape (ie R,R ¹ ,R ² ,R ³ Fluorinated alkyl group
Or the general formula R as a hydrocarbon group₂SiCl₂, R₃Si
Cl, R¹R²SiCl₂Or R¹R²R³SiC
l, etc.) may be used, but in order to increase the adsorption density,
Generally, straight chain is preferred. Furthermore, for example, SiC
l_Four, SiHCl₃, SiH₂Cl₂, Cl- (SiC
l₂O)_n-SiCl₃(Where n is a natural number), Si
Cl_m(CH₃)_4-m, SiCl_m(C₂H _Five)
_4-m(However, m is an integer of 1 to 3 in the formula), HSiCl_l(C
H₃)_3-l, HSiCl_l(C₂H_Five)_3-l(However, in the formula
l contains a plurality of chlorosilyl bonds such as 1 or 2)
After chemically adsorbing the substance, it reacts with water to cause surface blackening.
The rosilyl bond changes to a hydrophilic silanol bond,
The surface of the stick molded product becomes hydrophilic.

[Procedure amendment 4]

[Document name to be amended] Statement

[Name of item to be corrected] 0023

[Correction method] Change

[Correction content]

The non-aqueous solvent used in the present invention may be any organic solvent that does not dissolve the plastic material forming the chemisorption film and does not have active hydrogen that reacts with the chlorosilane-based surfactant. For example, 1,1-dichloro, 1-fluoroethane, 1,1-dichloro, 2 , 2 ,
2-trifluoroethane, 1,1-dichloro, 2,2
Fluorine-based solvents such as 3,3,3-pentafluoropropane, 1,3-dichloro, 1,1,2,2,3-heptafluoropropane, and hydrocarbon-based solvents such as hexane, octane, hexadecane and cyclohexane, For example, ether solvents such as dibutyl ether and dibenzyl ether,
For example, any of ester solvents such as methyl acetate, ethyl acetate, isopropyl acetate, and amyl acetate is preferable.

[Procedure Amendment 5]

[Document name to be amended] Statement

[Name of item to be corrected] 0025

[Correction method] Change

[Correction content]

Example 1 First, SiO ₂ having a diameter of 100 μm after processing was finished.
Made micromachine 1 (gear 1a, rotating shaft 1b)
Is prepared (FIG. 1) and washed with an organic solvent. Next, an example of a solvent of a substance including a fluorocarbon group and a chlorosilane _{group, CF 3 (CF 2) 7} (CH 2) a ₂ SiCl _3, 80 wt%, which is an example of a non-aqueous solvent n- hexadecane ( Toluene, xylene, dicyclohexyl may be used), 12
Weight % carbon tetrachloride, 8% by weight chloroform solution 2% by weight
Dissolve in a mixed solvent that has been dissolved at a certain concentration to prepare a raw material solution, and at least the sliding portion 1 '(may be all) 2
When immersed for about an hour, since the SiO ₂ surface contains a large number of hydroxyl groups, the SiCl group of the substance containing a fluorocarbon group and a chlorosilane group reacts with the hydroxyl groups to cause a dehydrochlorination reaction, and the entire sliding portion surface is covered. CF ₃ (CF ₂ ) ₇ (C
A bond of H ₂ ) ₂ Si (O-) ₃ was generated, and the monomolecular film 2 containing fluorine was formed with a film thickness of about 15 angstroms in a state of being chemically bonded to the gear and the rotating shaft. The critical surface energy of this film was measured to be 15 dyne / c.
m (measurement device: manufactured by Kyowa Interface Science Co., Ltd., automatic contact angle meter, CA-Z type). Furthermore, the dynamic friction coefficient is 0.1
5 (measurement device: manufactured by Kyowa Interface Science Co., Ltd., fully automatic dynamic friction coefficient meter, DFPM-SS type).

[Procedure correction 6]

[Document name to be amended] Statement

[Name of item to be corrected] 0029

[Correction method] Change

[Correction content]

[0029]

[Chemical 1]

[Procedure Amendment 7]

[Document name to be amended] Statement

[Name of item to be corrected] 0030

[Correction method] Change

[Correction content]

[0030]

[Chemical 2]

[Procedure Amendment 8]

[Document name to be amended] Statement

[Correction target item name] 0031

[Correction method] Change

[Correction content]

[0031]

[Chemical 3]

[Procedure Amendment 9]

[Document name to be amended] Statement

[Name of item to be corrected] 0032

[Correction method] Change

[Correction content]

[0032]

[Chemical 4]

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification code Office reference number FI technical display location F16C 33/20 A 6814-3J

Claims (3)

[Claims] 1. A low friction resistance mechanical component having a chemisorption film having a surface layer containing a fluorine group, the base portion of which is chemically bonded to a base material by a siloxane bond, at least on the sliding portion surface of the mechanical component. 2. The low friction resistance mechanical part according to claim 1, wherein the chemical adsorption film is a monomolecular film. 3. The low friction resistant mechanical component according to claim 1, wherein the mechanical component is a micromachine.