JPH06129963A - Method and device for producing glass bead for fluorescent x-ray analysis - Google Patents

Method and device for producing glass bead for fluorescent x-ray analysis

Info

Publication number
JPH06129963A
JPH06129963A JP4277028A JP27702892A JPH06129963A JP H06129963 A JPH06129963 A JP H06129963A JP 4277028 A JP4277028 A JP 4277028A JP 27702892 A JP27702892 A JP 27702892A JP H06129963 A JPH06129963 A JP H06129963A
Authority
JP
Japan
Prior art keywords
analysis
flatness
container
glass bead
smoothness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4277028A
Other languages
Japanese (ja)
Other versions
JP3312932B2 (en
Inventor
Yasuyuki Yamamoto
恭之 山本
Noriko Takeda
典子 武田
Kyoko Anami
京子 阿南
Yoshitaro Yuzuhara
由太郎 柚原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP27702892A priority Critical patent/JP3312932B2/en
Publication of JPH06129963A publication Critical patent/JPH06129963A/en
Application granted granted Critical
Publication of JP3312932B2 publication Critical patent/JP3312932B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To improve analysis accuracy and mass-producibility by grinding glass beads themselves if necessary so that their smoothness and flatness may be not more than a specified value. CONSTITUTION:Vibration is given to a container by a mixing section 11 to mix a sample and flux and a specified quantity of remover is put into the container. Next, the sample, flux, and remover put into the container are heated by a heating section 12 until they are dissolved, and the container is cooled by feeding cooling air through a cooling section 13 so as to peel off beads. Then, after the flatness and smoothness of the analysis face of the obtained beads are subject to total measurement by a measuring section 14, and it is judged based on the measured results whether or not they will satisfy the predetermined allowable value in compliance with target analysis accuracy and objective element for analysis. Further the analysis face of the beads which are judged to be defective is ground by a grinding section 15.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、セラミックス,鉄鉱
石,セメント等の粉末酸化物のガラスビード法による蛍
光X線分析に好適な蛍光X線分析用ガラスビード製造方
法及びガラスビード製造装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass bead manufacturing method and a glass bead manufacturing apparatus for fluorescent X-ray analysis suitable for fluorescent X-ray analysis of powdered oxides of ceramics, iron ore, cement and the like by the glass bead method.

【0002】[0002]

【従来の技術】セラミックス,鉄鉱石,セメント等の粉
末酸化物の元素の含有率を求めるのに、元素の含有率に
より蛍光X線強度が異なることを利用した蛍光X線分析
方法が一般に広く用いられている。また、この蛍光X線
分析を行う場合に、試料(粉末酸化物)を蛍光X線分析
に適した形態に調整する必要がある。その方法として粉
末プレス法とガラスビード法が代表的であるが、粉末プ
レス法より種々の点で優れるガラスビード法が一般的に
用いられている。
2. Description of the Related Art In order to obtain the content ratio of elements in powdered oxides such as ceramics, iron ore, cement, etc., a fluorescent X-ray analysis method utilizing the fact that the fluorescent X-ray intensity varies depending on the content ratio of the elements is generally widely used. Has been. Further, when performing the fluorescent X-ray analysis, it is necessary to adjust the sample (powder oxide) into a form suitable for the fluorescent X-ray analysis. The powder pressing method and the glass bead method are typical methods, but the glass bead method, which is superior in various points to the powder pressing method, is generally used.

【0003】このガラスビード法では、図5に示すよう
に、容器1内にガラスビードの組成粉末2′を投入した
後、その投入した粉末2′の溶解,冷却工程を経ること
により、図6に示すようなガラス化したガラスビード2
を製造する。そしてガラスビード2の容器1の底部内面
(直径約30mm)1aに対応する面が、蛍光X線分析
における分析面2aとなる。
In this glass bead method, as shown in FIG. 5, after a glass bead composition powder 2'is charged into a container 1, a melting and cooling process of the charged powder 2'is carried out, whereby the process shown in FIG. Vitrified glass beads 2 as shown in
To manufacture. The surface of the glass bead 2 corresponding to the bottom inner surface (diameter of about 30 mm) 1a of the container 1 becomes the analysis surface 2a in the fluorescent X-ray analysis.

【0004】また、ガラスビード法で用いられる容器1
は、得られるガラスビード2に不純物が混入せず、ま
た、ガラスビード2が冷却した場合の剥離性が良好で、
変形し難いことが望ましい。そのような材質としては、
一般に、白金と金の合金又は白金と金とロジウムの合金
などの高価な貴金属が用いられている。しかしながら、
この容器1,ガラスビード2間の熱膨脹差が大きいた
め、冷却した際の熱応力により、繰り返し使用するにつ
れ容器1の底部内面1aは図5の想像線で示すように変
形し、ガラスビード2の分析面2aも図6の想像線で示
すように変形(平坦度が最大0.8mm)してくる。よ
って1つの容器1で数百個のガラスビード2を製造する
と変形がさらに大きくなり、分析精度が低下する。
The container 1 used in the glass bead method
Has no impurities mixed in the glass beads 2 obtained, and has good peelability when the glass beads 2 are cooled,
It is desirable that it is difficult to deform. As such a material,
Generally, an expensive precious metal such as an alloy of platinum and gold or an alloy of platinum, gold and rhodium is used. However,
Since the thermal expansion difference between the container 1 and the glass bead 2 is large, the bottom inner surface 1a of the container 1 is deformed as shown by the imaginary line in FIG. The analysis surface 2a is also deformed (flatness is 0.8 mm at maximum) as shown by the imaginary line in FIG. Therefore, when hundreds of glass beads 2 are manufactured in one container 1, the deformation is further increased and the analysis accuracy is lowered.

【0005】一方、日本工業規格(JIS)では、ガラ
スビード2の分析面2aについての規定はなく、容器1
の底部内面1aに関し、「ビードの剥離性を良好に保つ
ために、底部内面を平滑に保つ」如く規定されているだ
けであるため、従来、底部内面1aを平滑にする考えは
あっても、平坦にするという考えはなかった。
On the other hand, the Japanese Industrial Standard (JIS) does not specify the analysis surface 2a of the glass bead 2, and the container 1
Regarding the bottom inner surface 1a of the above, since it is merely defined as "to keep the bottom inner surface smooth in order to keep the bead releasability good", conventionally, even though there is an idea to smooth the bottom inner surface 1a, I had no idea to flatten it.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、近年の
技術革新に伴い、高い分析精度が要求されるようにな
り、その要求を満たすガラスビード2を得ようとする
と、従来法では1つの容器1でせいぜい10個程度しか
製造できないことになり、量産性が低下する。また、そ
の都度改鋳したのではコスト高を招くことにもなる。
However, with the recent technological innovation, high analysis accuracy is required, and when it is attempted to obtain the glass beads 2 satisfying the requirement, one container 1 is used in the conventional method. Only 10 pieces can be manufactured at most, which reduces the mass productivity. Further, if the casting is performed each time, the cost will increase.

【0007】そこで、本発明は、上記事情に鑑みてなさ
れたものであり、分析精度の向上が図れ、しかも量産性
に優れる蛍光X線分析用ガラスビード製造方法及びガラ
スビード製造装置を提供することを目的としている。
Therefore, the present invention has been made in view of the above circumstances, and provides a glass bead manufacturing method and a glass bead manufacturing apparatus for fluorescent X-ray analysis, which can improve analysis accuracy and are excellent in mass productivity. It is an object.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に請求項1記載の製造方法は、底部内面が平滑な有底容
器内にガラスビードの組成粉末を投入した後、前記容器
に投入した粉末の溶解,冷却工程を経て、前記底部内面
に接する面を分析面とするガラスビードを得る蛍光X線
分析用ガラスビード製造方法において、前記分析面の平
滑度及び平坦度が所定値以下となるように必要に応じて
その分析面を研磨することを特徴とするものである。
In order to achieve the above object, the manufacturing method according to the first aspect of the present invention is such that the composition powder of glass beads is charged into a container with a bottom having a smooth bottom inner surface, and then the glass bead is charged into the container. In a glass bead manufacturing method for fluorescent X-ray analysis, which obtains a glass bead having a surface in contact with the inner surface of the bottom as an analysis surface through a powder melting and cooling step, the smoothness and flatness of the analysis surface are not more than a predetermined value. As described above, the analysis surface is polished as required.

【0009】また、請求項2記載の製造方法は、前記分
析面の平滑度及び平坦度の所定値は、分析対象元素によ
り異なることを特徴とするものである。
Further, the manufacturing method according to claim 2 is characterized in that the predetermined values of the smoothness and the flatness of the analysis surface differ depending on the element to be analyzed.

【0010】また、請求項3記載の製造装置は、底部内
面が平滑な有底容器内にガラスビードの組成粉末を投入
した後、前記容器に投入した粉末の溶解,冷却工程を経
て、前記底部内面に接する面を分析面とするガラスビー
ドを得るガラスビード製造装置において、前記分析面の
平滑度及び平坦度を測定する測定部と、前記分析面の平
滑度及び平坦度が所定値以下となるように分析面を研磨
する研磨部とを有することを特徴とするものである。
Further, in the manufacturing apparatus according to the third aspect of the invention, after the composition powder of the glass beads is charged into a bottomed container having a smooth bottom inner surface, the powder charged into the container is melted and cooled, and then the bottom part is subjected. In a glass bead manufacturing apparatus that obtains a glass bead having a surface in contact with an inner surface as an analysis surface, a measuring unit that measures the smoothness and flatness of the analysis surface, and the smoothness and flatness of the analysis surface become a predetermined value or less. Thus, it has a polishing part for polishing the analysis surface.

【0011】また、請求項4記載の製造装置は、前記分
析面の平滑度及び平坦度の所定値は、分析対象元素によ
り異なることを特徴とするものである。
The manufacturing apparatus according to claim 4 is characterized in that the predetermined values of the smoothness and flatness of the analysis surface differ depending on the element to be analyzed.

【0012】[0012]

【作用】請求項1記載の製造方法によれば、溶解,冷却
工程を経て得られるガラスビードの分析面には、容器の
底部内面の平滑度,平坦度がそのまま転写される。この
ため、底部内面を平滑にすることにより平滑な分析面が
得られるが、分析精度は、分析面の平滑度よりもむしろ
平坦度により左右される。従って、溶解,冷却工程によ
り容器が変形し、平滑度及び平坦度が悪くなっても、ガ
ラスビード自体を平滑度及び平坦度が所定値以下となる
ように必要に応じて研磨することにより、分析精度が向
上し、量産性も向上する。
According to the manufacturing method of the first aspect, the smoothness and flatness of the inner surface of the bottom of the container are directly transferred to the analysis surface of the glass beads obtained through the melting and cooling steps. For this reason, a smooth analysis surface can be obtained by smoothing the inner surface of the bottom portion, but the analysis accuracy depends on the flatness rather than the smoothness of the analysis surface. Therefore, even if the container is deformed due to the melting and cooling processes and the smoothness and flatness are deteriorated, the glass bead itself is analyzed as necessary by polishing the glass bead itself so that the smoothness and flatness are below a predetermined value. Accuracy is improved and mass productivity is also improved.

【0013】請求項2記載の製造方法によれば、分析対
象元素に応じて平滑度及び平坦度の所定値を定めること
により、分析対象元素に応じた分析精度の向上が図れ
る。
According to the manufacturing method of the second aspect, by setting the predetermined values of the smoothness and the flatness according to the element to be analyzed, it is possible to improve the analysis accuracy according to the element to be analyzed.

【0014】請求項3記載の製造装置によれば、請求項
1記載と同様、溶解,冷却工程を経て得られるガラスビ
ードの分析面には、容器の底部内面の平滑度,平坦度が
そのまま転写される。このため、底部内面を平滑にする
ことにより平滑な分析面が得られるが、分析精度は、分
析面の平滑度よりもむしろ平坦度により左右される。従
って、溶解,冷却工程により容器が変形し、平滑度及び
平坦度が悪くなっても、測定部によりその平滑度及び平
坦度の測定してその良否判定が可能となり、研磨部によ
り不良と判定されたガラスビードの分析面の平滑度及び
平坦度が所定値以下となるように研磨することにより、
分析精度が向上し、量産性も向上する。
According to the manufacturing apparatus of the third aspect, as in the first aspect, the smoothness and flatness of the inner surface of the bottom of the container are directly transferred to the analysis surface of the glass beads obtained through the melting and cooling steps. To be done. For this reason, a smooth analysis surface can be obtained by smoothing the inner surface of the bottom portion, but the analysis accuracy depends on the flatness rather than the smoothness of the analysis surface. Therefore, even if the container is deformed due to the melting and cooling steps and the smoothness and flatness are deteriorated, it is possible to measure the smoothness and flatness by the measurement unit and determine the quality, and the polishing unit determines that it is defective. By polishing so that the smoothness and flatness of the analysis surface of the glass bead are below a predetermined value,
Analysis accuracy is improved and mass productivity is also improved.

【0015】請求項4記載の製造装置によれば、請求項
2記載と同様に、分析対象元素に応じて平滑度及び平坦
度の所定値を定めることにより、分析対象元素に応じた
分析精度の向上が図れる。
According to the manufacturing apparatus of the fourth aspect, similarly to the second aspect, by setting the predetermined values of the smoothness and the flatness according to the element to be analyzed, the analysis accuracy according to the element to be analyzed can be improved. Can be improved.

【0016】[0016]

【実施例】以下、本発明の実施例を図面を参照して詳述
する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0017】図2は本発明に係るガラスビード製造装置
の概略構成図である。
FIG. 2 is a schematic configuration diagram of a glass bead manufacturing apparatus according to the present invention.

【0018】同図に示す製造装置10は、ガラスビード
2の組成粉末(試料)2′を入れるための前記図5に示
したのと同様の容器1と、容器1内に投入された試料,
融剤を振動により混合する混合部11と、容器1を例え
ば高周波誘導により最大1200℃まで加熱可能な加熱
部12と、例えば容器1に冷却用エアーを送風すること
により容器1を冷却する冷却部13と、ガラスビード2
の分析面2aの平坦度,平滑度を測定する測定部14
と、分析面2aを研磨する研磨部15とを有して概略構
成されている。
The manufacturing apparatus 10 shown in the same figure has a container 1 similar to that shown in FIG. 5 for containing the composition powder (sample) 2 ′ of the glass bead 2, a sample placed in the container 1,
A mixing unit 11 that mixes the flux by vibration, a heating unit 12 that can heat the container 1 up to 1200 ° C. by high-frequency induction, and a cooling unit that cools the container 1 by sending cooling air to the container 1, for example. 13 and glass bead 2
Measuring unit 14 for measuring flatness and smoothness of the analysis surface 2a of
And a polishing section 15 for polishing the analysis surface 2a.

【0019】前記測定部14は、例えば、平坦度,平滑
度の測定として一般に用いられている表面あらさ計が適
用される。なお、ここでいう「平滑度」とは、JISB
0601で定義されている「表面粗さ」のことをいい、
分析面2a全域における中心線平均粗さ(Ra)で示
す。また、「平坦度」とは、JISB0610で定義さ
れている「表面うねり」のことをいい、「基準長さ」を
分析面2aの直径(約30mm)とした場合の「最大う
ねり」で示す。
As the measuring unit 14, for example, a surface roughness meter generally used for measuring flatness and smoothness is applied. The term "smoothness" as used herein refers to JISB.
"Surface roughness" defined in 0601,
The center line average roughness (Ra) in the entire analysis surface 2a is shown. The "flatness" means "surface waviness" defined in JISB0610, and is shown as "maximum waviness" when the "reference length" is the diameter (about 30 mm) of the analysis surface 2a.

【0020】前記研磨部15は、図示しない研磨手段に
より分析面2aを機械研磨することにより、分析面2a
の平坦度が10μm以下、平滑度が5μm以下となるよ
うに構成されている。研磨手段は、例えば、研磨布,砥
石,研磨紙などに各種粒度の人造コランダム研磨材(A
2 3 )やカーボランダム(SiC)などの研磨材を
塗布したものが適用される。なお、平坦度50μm以
下,平滑度5μm以下でも所望する分析精度が得られる
ならば、手による研磨でもよい。
The polishing section 15 mechanically polishes the analysis surface 2a by a polishing means (not shown), so that the analysis surface 2a
The flatness is 10 μm or less and the smoothness is 5 μm or less. The polishing means is, for example, a polishing cloth, a whetstone, a polishing paper, etc.
A material coated with an abrasive such as 1 2 O 3 ) or carborundum (SiC) is applied. If the desired analysis accuracy can be obtained even with a flatness of 50 μm or less and a smoothness of 5 μm or less, polishing by hand may be used.

【0021】次に、上記構成の製造装置10を用いた本
発明のガラスビード製造方法の一実施例を図1に示す工
程図に従って説明する。
Next, an embodiment of the glass bead manufacturing method of the present invention using the manufacturing apparatus 10 having the above-mentioned structure will be described with reference to the process chart shown in FIG.

【0022】まず、所定量の試料2′を容器1内に投入
する(工程A)。この工程Aの後、仮焼工程及び冷却工
程を入れてもよい。次に、所定量の融剤を容器1内に投
入し(工程B)、混合部11にて容器1に振動を与えて
試料2′と融剤とを混合し(工程C)、所定量の剥離剤
を容器1内に投入する(工程D)。続いて、加熱部12
にて容器1内に投入した試料2′,融剤,剥離剤が溶解
するまで加熱し(工程E)、冷却部13にて容器1に冷
却用エアを送風して容器1を冷却し(工程F)、ビード
2を剥離する(工程G)。
First, a predetermined amount of sample 2'is put into the container 1 (step A). After this step A, a calcination step and a cooling step may be added. Next, a predetermined amount of the flux is put into the container 1 (step B), the container 1 is vibrated in the mixing section 11 to mix the sample 2'with the flux (step C), and a predetermined amount of the flux is added. A release agent is put into the container 1 (step D). Then, the heating unit 12
The sample 2 ′ charged in the container 1 is heated until the flux and the release agent are dissolved (step E), and cooling air is blown to the container 1 in the cooling unit 13 to cool the container 1 (step F), the bead 2 is peeled off (step G).

【0023】そして、このようにして得られたビード2
の分析面2aの平坦度,平滑度を測定部14にて全数測
定する(工程H)。この工程Hにより得られた測定結果
に基づき、目標とする分析精度,分析対象元素などによ
り予め定めた許容値(例えば平坦度50μm以下、平滑
度5μm以下)を満たすか否かにより良否を判定する
(工程I)。この判定は、自動判定でも人間による判定
でもよい。研磨部15にて前記工程Iで不良品と判定さ
れたビード2の分析面2aを研磨する(工程J)。これ
により、分析面2aの平坦度が50μm以下のビード2
が量産可能となる。その後、ビード2は蛍光X線分析に
供される。なお、全てのビード2を研磨した後、確認の
意味で平坦度,平滑度の測定を行ってもよい。
Then, the bead 2 thus obtained
All the flatness and smoothness of the analysis surface 2a are measured by the measuring unit 14 (process H). Based on the measurement result obtained in this step H, it is judged whether or not a predetermined allowable value (for example, flatness of 50 μm or less, smoothness of 5 μm or less) is satisfied depending on the target analysis accuracy, element to be analyzed and the like. (Step I). This determination may be automatic determination or human determination. The polishing unit 15 polishes the analysis surface 2a of the bead 2 which is determined to be defective in the process I (process J). As a result, the beads 2 whose flatness of the analysis surface 2a is 50 μm or less
Can be mass-produced. After that, the beads 2 are subjected to fluorescent X-ray analysis. In addition, after polishing all the beads 2, the flatness and the smoothness may be measured for the purpose of confirmation.

【0024】このようにしてビード2を得る本実施例の
製造方法の効果を図3,図4,表1をも参照して説明す
る。
The effect of the manufacturing method of this embodiment for obtaining the bead 2 in this manner will be described with reference to FIGS.

【0025】図3はジルコニウム(Zr)のX線強度と
平坦度との関係を示すグラフである。同図は平坦度によ
りX線強度が大きく変化していることを示している。同
図に示すように、本実施例によれば、平坦度が従来最大
0.8mmあったものが、本実施例では全て50μm以
下となるため、ジルコニウム(Zr)のX線強度が従来
46.7乃至47.7kpsとばらついていたものが、
本実施例では46.10乃至46.13kpsとばらつ
きが小さくなり、高精度の分析が可能となった。
FIG. 3 is a graph showing the relationship between the X-ray intensity and the flatness of zirconium (Zr). This figure shows that the X-ray intensity changes greatly depending on the flatness. As shown in the figure, according to the present embodiment, the flatness was 0.8 mm at the maximum in the prior art, but in the present embodiment, the flatness is all 50 μm or less. What varied from 7 to 47.7 kps
In this example, the variation was small at 46.10 to 46.13 kps, and high-precision analysis was possible.

【0026】また、表1は研磨前後によるX線強度のC
V値の比較を示すものである。なお、CV値は、100
α/Xを示す。(α:標準偏差,X:平均値)A/B比
はBa/(Ti+Zr)のモル比を示し、nはサンプル
数(10個)を示す。
Table 1 shows C of X-ray intensity before and after polishing.
It shows comparison of V values. The CV value is 100
Indicates α / X. (Α: standard deviation, X: average value) A / B ratio represents the molar ratio of Ba / (Ti + Zr), and n represents the number of samples (10).

【0027】[0027]

【表1】 [Table 1]

【0028】表1から明らかなように、CV値は研磨前
はBaO,TiO2 ,ZrO2 がそれぞれ0.05,
0.20,0.82あったものが、研磨後(平坦度50
μm以下)はそれぞれ0.02,0.08,0.14と
小さくなっていることから、ZrO2 と同様にBaO,
TiO2 においてもX線強度のばらつきが小さくなり、
高精度の分析が可能となった。
As is clear from Table 1, the CV values before polishing were 0.05 for BaO, TiO 2 and ZrO 2 , respectively.
Those with 0.20 and 0.82 were after polishing (flatness 50
.mu.m or less) is 0.02, 0.08, and 0.14, respectively. Therefore, as with ZrO 2 , BaO,
Even in TiO 2 , variations in X-ray intensity are reduced,
High-precision analysis has become possible.

【0029】なお、図4は元素毎の相対強度と相対距離
との関係を示すグラフである。相対強度は、ある基準位
置における各元素のX線強度を基準としたものである。
相対距離は、基準位置からX線管球に近づく方向をマイ
ナス、X線管球から遠ざかる方向をプラスで示す。
FIG. 4 is a graph showing the relationship between the relative intensity and the relative distance for each element. The relative intensity is based on the X-ray intensity of each element at a certain reference position.
The relative distance is indicated by minus in the direction approaching the X-ray tube from the reference position and by plus in the direction away from the X-ray tube.

【0030】同図から明らかなように、基準位置からの
距離が変化すると各元素のX線強度も変化する。また、
元素毎にX線強度の変化率は異なる。更に同じ元素でも
分析装置が異なると変化の仕方も異なってくる。それは
使用する分析装置の光学条件、特にブラック角と光学系
による。従って分析対象元素により、目標とする平坦度
を設定することにより、分析対象元素に応じた分析精度
の向上が図れる。
As is clear from the figure, when the distance from the reference position changes, the X-ray intensity of each element also changes. Also,
The rate of change in X-ray intensity differs for each element. Further, even if the same element is used, different analyzers have different ways of changing. It depends on the optical conditions of the analyzer used, especially the black angle and the optical system. Therefore, by setting the target flatness depending on the element to be analyzed, it is possible to improve the analysis accuracy according to the element to be analyzed.

【0031】なお、本発明は、上記実施例に限定され
ず、種々に変形実施できる。
The present invention is not limited to the above embodiment, but can be modified in various ways.

【0032】[0032]

【発明の効果】以上詳述した請求項1記載の発明によれ
ば、分析面の平滑度及び平坦度が所定値以下となるよう
に必要に応じてその分析面を研磨しているので、分析精
度の向上が図れ、しかも量産性に優れる蛍光X線分析用
ガラスビード製造方法を提供することができる。
According to the invention described in claim 1 described above in detail, since the analysis surface is polished as necessary so that the smoothness and flatness of the analysis surface are not more than a predetermined value, the analysis is performed. It is possible to provide a method for producing a glass bead for fluorescent X-ray analysis, which can improve accuracy and is excellent in mass productivity.

【0033】また、請求項2記載の発明によれば、分析
対象元素に応じて平滑度及び平坦度の所定値を定めるこ
とにより、分析対象元素に応じた分析精度の向上が図れ
る。
According to the second aspect of the invention, by setting the predetermined values of the smoothness and the flatness according to the element to be analyzed, it is possible to improve the analysis accuracy according to the element to be analyzed.

【0034】また、請求項3記載の発明によれば、分析
面の平滑度及び平坦度の測定によりその良否判定が可能
になり、不良と判定されたガラスビードの分析面の平滑
度及び平坦度が所定値以下となるように分析面を研磨で
きるので、分析精度の向上が図れ、しかも量産性に優れ
るガラスビード製造装置を提供することができる。
According to the third aspect of the invention, the quality of the analysis surface can be determined by measuring the smoothness and flatness of the analysis surface, and the smoothness and flatness of the analysis surface of the glass bead determined to be defective. Since the analysis surface can be polished so as to be less than or equal to a predetermined value, it is possible to provide a glass bead manufacturing apparatus that can improve the analysis accuracy and that is excellent in mass productivity.

【0035】また、請求項4記載の発明によれば、請求
項2記載と同様に、分析対象元素に応じた分析精度の向
上が図れる。
Further, according to the invention described in claim 4, as in the case of claim 2, it is possible to improve the analysis accuracy according to the element to be analyzed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のガラスビード製造方法の一実施例を示
す工程図である。
FIG. 1 is a process drawing showing an embodiment of the glass bead manufacturing method of the present invention.

【図2】本発明に係るガラスビード製造装置の概略構成
図である。
FIG. 2 is a schematic configuration diagram of a glass bead manufacturing apparatus according to the present invention.

【図3】ジルコニウム(Zr)のX線強度と平坦度との
関係を示すグラフである。
FIG. 3 is a graph showing the relationship between X-ray intensity and flatness of zirconium (Zr).

【図4】元素毎の相対強度と相対距離との関係を示すグ
ラフである。
FIG. 4 is a graph showing the relationship between relative intensity and relative distance for each element.

【図5】容器の断面図及び従来の問題点を示す図であ
る。
FIG. 5 is a cross-sectional view of a container and a view showing conventional problems.

【図6】ガラスビードの断面図及び従来の問題点を示す
図である。
FIG. 6 is a cross-sectional view of a glass bead and a view showing a conventional problem.

【符号の説明】[Explanation of symbols]

1 容器 1a 底部内面 2 ガラスビード 2′ 粉末 2a 分析面 10 ガラスビード製造装置 14 測定部 15 研磨部 1 Container 1a Bottom Inner Surface 2 Glass Bead 2'Powder 2a Analysis Surface 10 Glass Bead Manufacturing Equipment 14 Measuring Section 15 Polishing Section

フロントページの続き (72)発明者 柚原 由太郎 東京都中央区日本橋一丁目13番1号 ティ ーディーケイ株式会社内Front Page Continuation (72) Inventor Yutaro Yuzuhara 1-13-1 Nihonbashi, Chuo-ku, Tokyo Inside TDC Corporation

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 底部内面が平滑な有底容器内にガラスビ
ードの組成粉末を投入した後、前記容器に投入した粉末
の溶解,冷却工程を経て、前記底部内面に接する面を分
析面とするガラスビードを得る蛍光X線分析用ガラスビ
ード製造方法において、 前記分析面の平滑度及び平坦度が所定値以下となるよう
に必要に応じてその分析面を研磨することを特徴とする
蛍光X線分析用ガラスビード製造方法。
1. A surface in contact with the bottom inner surface is used as an analysis surface after the glass bead composition powder is charged into a bottomed container having a smooth bottom inner surface, and the powder charged into the container is melted and cooled. In a method for producing a glass bead for fluorescent X-ray analysis for obtaining a glass bead, the fluorescent X-ray is polished as necessary so that the smoothness and flatness of the analytical surface are not more than a predetermined value. Method for manufacturing analytical glass beads.
【請求項2】 前記分析面の平滑度及び平坦度の所定値
は、分析対象元素により異なることを特徴とする請求項
1記載の蛍光X線分析用ガラスビード製造方法。
2. The method for producing a glass bead for fluorescent X-ray analysis according to claim 1, wherein the predetermined values of the smoothness and flatness of the analysis surface differ depending on the element to be analyzed.
【請求項3】 底部内面が平滑な有底容器内にガラスビ
ードの組成粉末を投入した後、前記容器に投入した粉末
の溶解,冷却工程を経て、前記底部内面に接する面を分
析面とするガラスビードを得るガラスビード製造装置に
おいて、前記分析面の平滑度及び平坦度を測定する測定
部と、前記分析面の平滑度及び平坦度が所定値以下とな
るように分析面を研磨する研磨部とを有することを特徴
とするガラスビード製造装置。
3. A surface in contact with the inner surface of the bottom is used as an analysis surface after the composition powder of the glass beads is put into a bottomed container having a smooth inner surface at the bottom, and the powder put into the container is melted and cooled. In a glass bead manufacturing apparatus for obtaining a glass bead, a measuring unit that measures the smoothness and flatness of the analysis surface, and a polishing unit that polishes the analysis surface so that the smoothness and flatness of the analysis surface becomes a predetermined value or less. An apparatus for manufacturing a glass bead, comprising:
【請求項4】 前記分析面の平滑度及び平坦度の所定値
は、分析対象元素により異なることを特徴とする請求項
3記載のガラスビード製造装置。
4. The glass bead manufacturing apparatus according to claim 3, wherein the predetermined values of the smoothness and flatness of the analysis surface differ depending on the element to be analyzed.
JP27702892A 1992-10-15 1992-10-15 Method for manufacturing glass bead for X-ray fluorescence analysis and apparatus for manufacturing glass bead Expired - Lifetime JP3312932B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27702892A JP3312932B2 (en) 1992-10-15 1992-10-15 Method for manufacturing glass bead for X-ray fluorescence analysis and apparatus for manufacturing glass bead

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27702892A JP3312932B2 (en) 1992-10-15 1992-10-15 Method for manufacturing glass bead for X-ray fluorescence analysis and apparatus for manufacturing glass bead

Publications (2)

Publication Number Publication Date
JPH06129963A true JPH06129963A (en) 1994-05-13
JP3312932B2 JP3312932B2 (en) 2002-08-12

Family

ID=17577771

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Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3312932B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3384010B2 (en) 1992-12-28 2003-03-10 ティーディーケイ株式会社 Preparation of standard sample for X-ray fluorescence analysis

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JP3312932B2 (en) 2002-08-12

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