JPH0612995A - Ion source electrode - Google Patents

Ion source electrode

Info

Publication number
JPH0612995A
JPH0612995A JP16971992A JP16971992A JPH0612995A JP H0612995 A JPH0612995 A JP H0612995A JP 16971992 A JP16971992 A JP 16971992A JP 16971992 A JP16971992 A JP 16971992A JP H0612995 A JPH0612995 A JP H0612995A
Authority
JP
Japan
Prior art keywords
electrode
metal wire
ion source
electrodes
source electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16971992A
Other languages
Japanese (ja)
Inventor
Yoshikazu Okumura
義和 奥村
Kazuhiro Watanabe
和弘 渡邉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Atomic Energy Agency
Original Assignee
Japan Atomic Energy Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Atomic Energy Research Institute filed Critical Japan Atomic Energy Research Institute
Priority to JP16971992A priority Critical patent/JPH0612995A/en
Publication of JPH0612995A publication Critical patent/JPH0612995A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide an ion beam of large current density with low energy by providing an electrode structure wherein a distance between a plurality of sheets of electrodes can be decreased, in an ion source electrode formed of a plurality of sheets of the electrodes piled together. CONSTITUTION:Many fine metal wires 6 of 1mm or less diameter are parallelly arranged closely in a transverse direction and secured to a supporting frame 8, to form an electrode having a slit hole of space in the same degree to a diameter of the metal wire 6. A plurality of sheets of the electrode thus formed are piled together by providing a space in the same degree to the space of the slit hole, to obtain an ion source electrode. For always applying tensile force to the metal wire 6, a spring mechansim 7 is provided in at least one end part of the metal wire 6. In order to prevent the fellow adjacent supporting frame 8 of the electrode and part of the spring mechansim 7 from interfering with each other, the one electrode metal wire 6 of a plurality of the adjacent electrodes is formed in only a straight line, and both end parts of the other electrode metal wire 6 are bent with curvature of not interfering in the point end part of a support 9.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明はイオン源電極に関する
ものである。さらに詳しくは、この発明は、低エネルギ
ーのイオンビームを高い電流密度で発生させるためのイ
オン源電極の構造に関するものである。
FIELD OF THE INVENTION The present invention relates to an ion source electrode. More specifically, the present invention relates to the structure of an ion source electrode for generating a low energy ion beam at a high current density.

【0002】[0002]

【従来の技術とその課題】従来より、各種の新材料の創
製や電子デバイス製造、あるいは分析等の諸分野におい
てイオン源は重要な要素技術となっている。通常、この
イオン源においては、大電流のイオンビームを引き出し
加速するためのイオン源電極として、厚さ1mmから数mm
の金属板に直径数mmから数十mmの丸孔または幅数mmのス
リット孔を多数あけた構造のものを複数枚間隙をあけて
重ねたものが多く用いられてきている。また、金属板を
用いないイオン源電極としては、片端を固定した直線状
の金属棒を多数並べることによってスリット孔を形成す
る電極の例もあるが、この場合も金属棒の幅やスリット
の幅は数mmであった。図1(a)(b)はこの従来の金
属板を用いたイオン源電極の平面図と断面図を、また図
2(a)(b)は、従来の金属棒を並べた電極の平面図
と断面図を示している。図1(a)(b)においては、
1は電極、2は電極1に設けられた丸孔であり、図1
(b)に示したように2枚の電極が重ねられてイオン源
電極が構成されている。また、図2(a)(b)におい
ては、3は金属棒で、各金属棒3間にスリット孔4が形
成されている。5は金属棒の支持枠である。図2(b)
に示したように、同じく2枚の電極が重ねられてイオン
源電極が構成されている。
2. Description of the Related Art Conventionally, an ion source has been an important elemental technology in various fields such as creation of various new materials, manufacturing of electronic devices, and analysis. Normally, in this ion source, as an ion source electrode for extracting and accelerating a large current ion beam, a thickness of 1 mm to several mm
A metal plate having a structure in which a large number of round holes each having a diameter of several mm to several tens mm or a plurality of slit holes each having a width of several mm are opened and stacked with a gap is often used. In addition, as an ion source electrode that does not use a metal plate, there is an example of an electrode that forms a slit hole by arranging a number of linear metal rods with one end fixed, but also in this case, the width of the metal rod and the width of the slit. Was a few mm. 1 (a) and 1 (b) are a plan view and a sectional view of an ion source electrode using this conventional metal plate, and FIGS. 2 (a) and 2 (b) are plan views of an electrode in which conventional metal rods are arranged. And a cross-sectional view. In FIGS. 1 (a) and 1 (b),
1 is an electrode and 2 is a round hole provided in the electrode 1.
As shown in (b), two electrodes are stacked to form an ion source electrode. In addition, in FIGS. 2A and 2B, 3 is a metal rod, and slit holes 4 are formed between the metal rods 3. Reference numeral 5 is a support frame for the metal rod. Figure 2 (b)
As shown in FIG. 5, the two electrodes are similarly stacked to form the ion source electrode.

【0003】一方、イオンの引き出しに関するチャイル
ド・ラングミュアー則によれば、引き出し得る最大電流
密度Jは、次式によって与えられる。
On the other hand, according to the Child-Langmuir rule regarding the extraction of ions, the maximum current density J that can be extracted is given by the following equation.

【0004】[0004]

【数1】 [Equation 1]

【0005】ここで、Vは電極間に印加する電圧、dは
重畳する2枚の電極間の距離、Mはイオンの質量数、Z
はイオンの電荷数である。すなわち、最大電流密度Jは
電極間の距離dを小さくとればとるほど大きな値をとる
ことができる。ただし、良好なビーム光学を保つために
電極間の距離dは孔の直径または幅と同程度のサイズに
する必要があり、そのため従来電極間の距離dは孔のサ
イズと同程度の数mmから数十mmにとられていた。電極間
に印加する電圧Vが十分に大きければ、その場合でも十
分な電流密度を得ることが可能であった。
Here, V is the voltage applied between the electrodes, d is the distance between two overlapping electrodes, M is the mass number of ions, and Z is
Is the number of charges of the ion. That is, the maximum current density J can take a larger value as the distance d between the electrodes becomes smaller. However, in order to maintain good beam optics, the distance d between the electrodes needs to be about the same size as the diameter or width of the hole. Therefore, the distance d between the conventional electrodes is several mm, which is about the same as the size of the hole. It was set to several tens of millimeters. If the voltage V applied between the electrodes was sufficiently large, it was possible to obtain a sufficient current density even in that case.

【0006】ところが、イオンビームによる表面処理な
どの用途のために極めて低いエネルギーのイオンビーム
が必要な場合には、電極間に印加する電圧Vが小さな値
となり、従来の電極間の距離では高い電流密度が得られ
ない。そこで孔の直径または幅を小さくとり、電極間の
距離を小さくする必要があるが、前記の通りの従来の金
属板を用いた電極では小さい孔を多数あけることは困難
であり、また機械的強度の制限から電極の厚みは通常1
mm以上であるため、電極間の距離を1mm以下に小さくす
ることはできなかった。
However, when an ion beam with extremely low energy is required for applications such as surface treatment with an ion beam, the voltage V applied between the electrodes becomes a small value, and a high current is obtained at the conventional distance between the electrodes. No density can be obtained. Therefore, it is necessary to reduce the diameter or width of the holes to reduce the distance between the electrodes, but it is difficult to open many small holes with the electrode using the conventional metal plate as described above, and the mechanical strength The thickness of the electrode is usually 1 due to the limitation of
Since it is more than mm, the distance between the electrodes cannot be reduced to less than 1 mm.

【0007】また、従来の金属棒を用いたスリット孔の
電極の場合にも、機械的強度の制限からスリットの幅や
金属棒の厚みとして1mm〜数mm必要であり、従って、電
極間の距離は数mmであった。このような制限から、従来
は低エネルギーで大電流密度のイオンビームを得ること
は不可能であった。
Also, in the case of a conventional electrode having a slit hole using a metal rod, the width of the slit and the thickness of the metal rod are required to be 1 mm to several mm due to the limitation of mechanical strength. Was a few mm. Due to such a limitation, it has hitherto been impossible to obtain an ion beam with low energy and high current density.

【0008】この発明は、以上の通りの問題点を解決す
るためになされたものであり、従来のイオン源電極の欠
点を解消し、重ね合わせた複数の電極間の距離を小さく
することが可能な電極構造とすることにより、低エネル
ギーであっても大電流密度のイオンビームを得ることを
可能とし、表面処理などの工程にも効率よく対応できる
新しいイオン源電極を提供することを目的としている。
The present invention has been made in order to solve the problems as described above, and it is possible to eliminate the drawbacks of the conventional ion source electrodes and reduce the distance between a plurality of superposed electrodes. The purpose of the present invention is to provide a new ion source electrode that can obtain an ion beam with a large current density even with low energy and can efficiently cope with processes such as surface treatment by adopting a different electrode structure. .

【0009】[0009]

【問題を解決するための手段】この発明は、上記の課題
を解決するものとして、複数の間隔をあけて重ね合わせ
て構成したイオン源電極においては、重ね合わせた各電
極には直径1mm以下の複数の金属線を密に並べてその直
径と同程度の幅の複数のスリット孔を形成した電極を、
スリット孔の幅と同程度の間隔を設けて複数重ね合わせ
て配設したことを特徴とするイオン源電極を提供する。
この電極構造によって、金属線の直径は容易に小さくす
ることが可能で、かつ、多数並べることは容易なので、
簡便にスリット幅の極めて狭い電極を製作することがで
きる。従って、このような構造を持つ複数枚の電極を密
に重ねれば電極間隔を極めて小さくすることができる。
SUMMARY OF THE INVENTION In order to solve the above problems, the present invention provides an ion source electrode constructed by stacking a plurality of electrodes at intervals with a diameter of 1 mm or less for each stacked electrode. An electrode in which a plurality of metal wires are densely arranged and a plurality of slit holes having a width similar to the diameter are formed,
Provided is an ion source electrode, which is characterized in that a plurality of them are arranged so as to be overlapped with each other at an interval substantially equal to the width of a slit hole.
With this electrode structure, the diameter of the metal wire can be easily reduced, and it is easy to arrange a large number of metal wires.
It is possible to easily manufacture an electrode having an extremely narrow slit width. Therefore, if a plurality of electrodes having such a structure are closely stacked, the electrode interval can be made extremely small.

【0010】また、この発明のように金属線の直径が極
めて小さい場合には、熱膨張や振動などによる金属線の
変形が問題となるが、この発明では金属線の片端もしく
は両端にスプリング機構を設け、金属線に常時引っ張り
力を加えることによって変形を防いでいる。さらに、電
極を重ね合わせた場合に、それぞれの電極の支持枠やス
プリング機構の部分が干渉し合うことを防ぐために、こ
の発明では重ねた複数枚の電極の隣合う電極の一方の電
極の金属線を直線のみで構成し、他方の電極の金属線の
両端部に干渉し合わない程度の曲率を持った曲げ部分を
配設する。
Further, when the diameter of the metal wire is extremely small as in the present invention, deformation of the metal wire due to thermal expansion or vibration becomes a problem, but in the present invention, a spring mechanism is provided at one end or both ends of the metal wire. It is provided to prevent deformation by constantly applying tensile force to the metal wire. Further, in order to prevent the support frame of each electrode and the portion of the spring mechanism from interfering with each other when the electrodes are overlapped with each other, in the present invention, the metal wire of one electrode of the adjacent electrodes of the overlapped plurality of electrodes is used. Is composed of only a straight line, and bent portions having a curvature that does not interfere with both ends of the metal wire of the other electrode are provided.

【0011】以下、実施例を示し、さらに詳しくこの発
明について説明する。
Hereinafter, the present invention will be described in more detail with reference to examples.

【0012】[0012]

【実施例】図3(a)は本発明のイオン源電極の平面
図、図3(b)は側面図、図3(c)はイオンビームを
引き出し加速するスリット孔を形成する金属線部分の断
面拡大図である。図3(a)に示すように支持枠8に直
径1mm以下の金属線6を横方向に多数密に並べて金属線
の直径と同程度の幅のスリット状の孔を有する電極を形
成するとともに、図3(b)及び図3(c)に示すよう
に極めて狭い間隔、すなわち金属線の直径と同程度の間
隔でそれらの電極を重ね合わせる。このようにして電極
間隔の極めて小さなイオン源電極を製作することができ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 3 (a) is a plan view of an ion source electrode of the present invention, FIG. 3 (b) is a side view, and FIG. 3 (c) is a metal wire portion forming a slit hole for extracting and accelerating an ion beam. FIG. As shown in FIG. 3 (a), a large number of metal wires 6 having a diameter of 1 mm or less are densely arranged laterally on a support frame 8 to form an electrode having slit-shaped holes having a width approximately equal to the diameter of the metal wires. As shown in FIGS. 3 (b) and 3 (c), the electrodes are superposed at extremely narrow intervals, that is, at intervals of the same order as the diameter of the metal wire. In this way, an ion source electrode having an extremely small electrode interval can be manufactured.

【0013】また、金属線6の片端をスプリング機構7
を用いて常時引っ張っておくことによって熱膨張や振動
による変形を防ぐことができる。スプリング機構7は図
3(b)に示すように、支持枠8の端部は外支持枠8b
と内支持枠8aから構成し、外支持枠8bは内支持枠8
aから外側に可動にする。金属線6を電極の端部の外支
持枠8bに固着しかつ内支持枠8aに滑動可能とし、外
支持枠8bと内支持枠8aの支持枠間に圧縮ばねを配設
する。このようにすることで、圧縮ばねの反発力により
金属線を固着した外支持枠は内支持枠から外側に押し広
げられるので、金属線に常時引っ張り力が作用する。も
ちろん、図3(a)(b)(c)の例ではスプリング機
構7は金属線6の片端に設けたが、勿論金属線の両端に
設けることができる。
Further, one end of the metal wire 6 is attached to the spring mechanism 7
It is possible to prevent deformation due to thermal expansion or vibration by constantly pulling with. In the spring mechanism 7, as shown in FIG. 3B, the end portion of the support frame 8 has an outer support frame 8b.
And an inner support frame 8a, and an outer support frame 8b is an inner support frame 8a.
Move from a to the outside. The metal wire 6 is fixed to the outer support frame 8b at the end of the electrode and slidable on the inner support frame 8a, and a compression spring is arranged between the outer support frame 8b and the inner support frame 8a. By doing so, the outer support frame to which the metal wire is fixed is pushed outward from the inner support frame by the repulsive force of the compression spring, so that the metal wire is always subjected to a pulling force. Of course, in the example of FIGS. 3A, 3B, and 3C, the spring mechanism 7 is provided at one end of the metal wire 6, but it can of course be provided at both ends of the metal wire.

【0014】さらに、図3(b)に示したように、以上
の例では複数の電極を重ね合わせた場合に電極の支持枠
8やスプリング機構7などが上下で干渉しないように、
電極の金属線6の両端部をサポート9の先端部分で曲げ
ている。この発明で用いている金属線の直径は極めて細
いので曲率を持った場合でもスプリング機構により金属
線に引っ張り力を与えることができるからである。
Further, as shown in FIG. 3B, in the above example, when a plurality of electrodes are superposed, the support frame 8 of the electrodes, the spring mechanism 7, etc. do not vertically interfere with each other.
Both ends of the metal wire 6 of the electrode are bent at the tip of the support 9. This is because the diameter of the metal wire used in the present invention is extremely small, so that even if the metal wire has a curvature, a tensile force can be applied to the metal wire by the spring mechanism.

【0015】[0015]

【発明の効果】以上の如く、この発明に従ってイオン源
電極を製作することにより、重ね合わせた複数の電極の
電極間隔を極めて狭くすることが可能であり、電極に印
加する電圧が低い場合でも、すなわちイオンビームのエ
ネルギーが低い場合でも、大電流密度のイオンビームを
得ることができる。従って、極めて低いエネルギーで、
かつ大電流密度のイオンビームを必要とする表面処理な
どを効率よく行うことができる。
As described above, by manufacturing an ion source electrode according to the present invention, it is possible to make the electrode interval of a plurality of superposed electrodes extremely narrow, and even when the voltage applied to the electrodes is low, That is, even if the energy of the ion beam is low, it is possible to obtain an ion beam with a large current density. Therefore, with very low energy,
In addition, it is possible to efficiently perform a surface treatment that requires an ion beam with a large current density.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は、金属板を用いたイオン源電極の平面
図であり、(b)は、金属板を用いたイオン源電極の断
面図である。
FIG. 1A is a plan view of an ion source electrode using a metal plate, and FIG. 1B is a cross-sectional view of the ion source electrode using a metal plate.

【図2】(a)は、金属棒を用いたイオン源電極の平面
図であり、(b)は、金属棒を用いたイオン源電極の断
面図である。
FIG. 2A is a plan view of an ion source electrode using a metal rod, and FIG. 2B is a cross-sectional view of the ion source electrode using a metal rod.

【図3】(a)は、この発明のイオン源電極の平面図で
あり、(b)は、この発明のイオン源電極の側面図であ
り、(c)は、この発明のイオン源電極の金属線部分の
断面拡大図である。
3A is a plan view of the ion source electrode of the present invention, FIG. 3B is a side view of the ion source electrode of the present invention, and FIG. 3C is a side view of the ion source electrode of the present invention. It is a cross-sectional enlarged view of a metal wire portion.

【符号の説明】[Explanation of symbols]

1 電極板 2 丸孔 3 金属棒 4 スリット孔 5 支持枠 6 金属線 7 スプリング機構 8 支持枠 9 サポート 1 Electrode Plate 2 Round Hole 3 Metal Rod 4 Slit Hole 5 Support Frame 6 Metal Wire 7 Spring Mechanism 8 Support Frame 9 Support

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 直径1mm以下の複数の金属線を密に並べ
てその直径と同程度の幅の複数のスリット孔を形成した
電極をスリット孔の幅と同程度の間隔を設けて複数重ね
合わせて配設したことを特徴とするイオン源電極。
1. An electrode in which a plurality of metal wires having a diameter of 1 mm or less are densely arranged and a plurality of slit holes having a width approximately equal to the diameter are formed at a distance approximately the same as the width of the slit holes. An ion source electrode characterized by being provided.
【請求項2】 金属線の少なくとも一端部に金属線に常
時引っ張り力を加えるスプリング機構を設けたことを特
徴とする請求項1のイオン源電極。
2. The ion source electrode according to claim 1, wherein a spring mechanism for constantly applying a tensile force to the metal wire is provided on at least one end of the metal wire.
【請求項3】 複数の電極の隣合う一方の電極の金属線
を直線のみから構成し、他方の電極の金属線を、両端部
に曲げ部分を有する金属線から構成したことを特徴とす
る請求項1または2のイオン源電極。
3. The metal wire of one electrode adjacent to a plurality of electrodes is composed of only a straight line, and the metal wire of the other electrode is composed of a metal wire having bent portions at both ends. Item 1 or 2 of the ion source electrode.
JP16971992A 1992-06-26 1992-06-26 Ion source electrode Pending JPH0612995A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16971992A JPH0612995A (en) 1992-06-26 1992-06-26 Ion source electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16971992A JPH0612995A (en) 1992-06-26 1992-06-26 Ion source electrode

Publications (1)

Publication Number Publication Date
JPH0612995A true JPH0612995A (en) 1994-01-21

Family

ID=15891596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16971992A Pending JPH0612995A (en) 1992-06-26 1992-06-26 Ion source electrode

Country Status (1)

Country Link
JP (1) JPH0612995A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5444258A (en) * 1992-08-24 1995-08-22 Societe Europeenne De Propulsion Ion-optics system for a source of ions to be discharged into a gas
US6338561B1 (en) 1998-01-29 2002-01-15 Nippon Seiki Co., Ltd. Luminous pointer
JP2010123574A (en) * 2008-11-19 2010-06-03 Korea Atom Energ Res Inst Beam generation device and transport device using multiple electrode
EP2878932A1 (en) 2011-01-26 2015-06-03 Yazaki Corporation Indicator member, indicator unit and indicator instrument

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5444258A (en) * 1992-08-24 1995-08-22 Societe Europeenne De Propulsion Ion-optics system for a source of ions to be discharged into a gas
US6338561B1 (en) 1998-01-29 2002-01-15 Nippon Seiki Co., Ltd. Luminous pointer
JP2010123574A (en) * 2008-11-19 2010-06-03 Korea Atom Energ Res Inst Beam generation device and transport device using multiple electrode
EP2878932A1 (en) 2011-01-26 2015-06-03 Yazaki Corporation Indicator member, indicator unit and indicator instrument

Similar Documents

Publication Publication Date Title
US7361916B2 (en) Coupled nano-resonating energy emitting structures
EP3510470B1 (en) Device for producing haptic feedback
TW558914B (en) Multi-face forming mask device for vacuum deposition
US10263542B2 (en) Plate, transducer and methods for making and operating a transducer
US8476994B2 (en) Electromechanical switch and method of manufacturing the same
US9859079B2 (en) Reconfigurable device for terahertz (THz) and infrared (IR) filtering and modulation
DE102016111909A1 (en) Micromechanical structure and method for its production
DE102019203914B3 (en) MEMS with a large fluidically effective surface
EP3852391A1 (en) Enhanced performance mems loudspeaker
DE102015213757B4 (en) Micromechanical structure and method of making the same
GB2034531A (en) Piezoelectric tuning fork device
DE102015213756A1 (en) Micromechanical structure and method of making the same
JPH0612995A (en) Ion source electrode
DE102016208356B4 (en) Micromechanical structure and method of making the same
DE10147911B4 (en) accelerometer
US5758397A (en) Process for making piezoelectric ceramic transformer having large voltage step-up ratio
KR900000949A (en) Electronic tube
DE102018213735B4 (en) Component and method for producing a component
JP3575837B2 (en) Ion source electrode structure
KR20130047674A (en) Ion beam extraction electrode and ion source
US3119038A (en) Electron multiplier
KR20080101098A (en) Magnetic deflector for an electron column
EP1422740B1 (en) Device for generating secondary electrons, secondary electrode and accelerating electrode
KR102059349B1 (en) 3d nano structure manufacturing method and 3d nano device manufacturing method
US20190222146A1 (en) Pre-loaded Piezoelectric Stack Actuator