JPH06128075A - Growing method for single crystal - Google Patents

Growing method for single crystal

Info

Publication number
JPH06128075A
JPH06128075A JP30664592A JP30664592A JPH06128075A JP H06128075 A JPH06128075 A JP H06128075A JP 30664592 A JP30664592 A JP 30664592A JP 30664592 A JP30664592 A JP 30664592A JP H06128075 A JPH06128075 A JP H06128075A
Authority
JP
Japan
Prior art keywords
single crystal
crucible
melt
growth
solidified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30664592A
Other languages
Japanese (ja)
Inventor
Kiyokazu Watanabe
清和 渡邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP30664592A priority Critical patent/JPH06128075A/en
Publication of JPH06128075A publication Critical patent/JPH06128075A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide the subject method so designed that, in growing high- melting single crystal by pull method, iridium crucible breakage is prevented due to its abnormal expansion caused by the ambient gas trapped therein in solidifying residual melt after completing the growth. CONSTITUTION:On cooling a grown single crystal while immersing it in the residual melt even after completing its growth, the residual melt can be solidified while providing it with crystallinity, resulting in volume contraction of the melt and developing a gap between the crucible and the solidified melt, thus facilitating the ambient gas' escape and preventing crack developments etc. in the crucible without applying excessive stress thereon.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、イットリウム・シリケ
ート単結晶(以後はYSO単結晶と称する)等の高融点
単結晶を引上げ法により育成する単結晶の育成方法に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for growing a high melting point single crystal such as yttrium silicate single crystal (hereinafter referred to as YSO single crystal) by a pulling method.

【0002】[0002]

【従来の技術】従来、YSO単結晶を育成するには、チ
ョクラルスキー法が一般に用いられている。即ち、チョ
クラルスキー法では酸化イットリウム(Y23)、酸化
珪素(SiO2)等の結晶原料を所望の単結晶の比率に
取り、ルツボ内で結晶原料を溶かし込んで原料融液とな
し、種結晶をサファイア製の種結晶支持棒に固定し、所
定の回転を加えながら前記原料融液に浸し、所定の速度
で引上げて単結晶を育成し、育成終了時にはルツボ内原
料融液から育成した単結晶を完全に切離し降温・固化を
行っていた。該ルツボ材としては、高価なイリジウムが
使われている。
2. Description of the Related Art Conventionally, the Czochralski method is generally used to grow a YSO single crystal. That is, in the Czochralski method, crystal raw materials such as yttrium oxide (Y 2 O 3 ) and silicon oxide (SiO 2 ) are taken in a desired single crystal ratio, and the crystal raw materials are melted in a crucible to form a raw material melt. , A seed crystal is fixed to a sapphire seed crystal support rod, immersed in the raw material melt while applying a predetermined rotation, and pulled up at a predetermined speed to grow a single crystal, and at the end of the growth, grow from the raw material melt in the crucible The single crystal was completely cut off to lower the temperature and solidify. Expensive iridium is used as the crucible material.

【0003】[0003]

【発明が解決しようとする課題】上述の育成方法におい
て、残存原料融液がイリジウムルツボ内で固化する際
に、原料融液は表面から固化するので融液中に多量に含
まれるN2等の雰囲気ガスが内部に閉じ込められ、外部
に脱出しようとして上部方向には脱出できないので、残
存原料融液の側面及び下方方向に圧力が加わり、ルツボ
壁に応力が集中することになるので、高価なイリジウム
ルツボが簡単に破損する問題があった。本発明の課題
は、残存原料融液に含まれる雰囲気ガスの脱出を容易に
し、急激な容積変化を制御してルツボ破損を防ぐことに
ある。
In the above-mentioned growing method, when the residual raw material melt is solidified in the iridium crucible, the raw material melt is solidified from the surface, so that a large amount of N 2 or the like contained in the melt can be obtained. Atmospheric gas is confined inside and cannot be escaped in the upper direction in an attempt to escape to the outside.Therefore, pressure is applied to the side surface and downward direction of the remaining raw material melt, and stress is concentrated on the crucible wall. There was a problem that the crucible was easily damaged. An object of the present invention is to facilitate the escape of the atmospheric gas contained in the residual raw material melt and control the rapid volume change to prevent the crucible from being damaged.

【0004】[0004]

【課題を解決するための手段】即ち、融液から種結晶を
用いて単結晶を引上げて育成する方法において、単結晶
育成終了後に、育成した単結晶下部を該残存融液に付け
たままで降温し、該残存融液に結晶性を持たせて固化さ
せることにより、ルツボ破損を防止することを特徴とす
る単結晶育成方法によって課題を解決する。
[Means for Solving the Problems] That is, in a method of pulling a single crystal from a melt by using a seed crystal to grow the single crystal, after the growth of the single crystal, the lower part of the grown single crystal is cooled while being attached to the remaining melt. Then, the problem is solved by a single crystal growing method characterized by preventing the crucible from being damaged by making the residual melt have crystallinity and solidifying.

【0005】[0005]

【作用】YSO単結晶育成終了後の残存原料融液に、育
成を終えた単結晶下部を該残存原料融液に付けたままの
状態で降温・固化し、該原料融液を結晶化させること
で、単に降温・固化した状態に比し体積が収縮し、ルツ
ボ壁との間に間隙をもたせることができ、融液に含まれ
たN2等の雰囲気ガスを内部に閉じ込めることなく外部
に容易に脱出させるので、ルツボに応力が集中せず、従
って、高価なイリジウムルツボの破損を抑えることがで
きる。
[Function] To crystallize the raw material melt by cooling and solidifying the remaining raw material melt after the growth of the YSO single crystal, with the grown single crystal lower part being attached to the residual raw material melt. The volume shrinks as compared to the state where the temperature is lowered and solidified, and a gap can be created between the crucible wall and the crucible wall, and the atmosphere gas such as N 2 contained in the melt can be easily discharged to the outside. Since stress is not concentrated on the crucible, the damage of the expensive iridium crucible can be suppressed.

【0006】[0006]

【実施例】以下、本発明の実施例を用いて従来の単結晶
育成方法と比較しながら本発明を説明する。図1は、Y
SO単結晶を引上げて育成する方法の概略の構成を示す
説明図である。図1において、イリジウムルツボ1(以
下、Irルツボと呼ぶ)の中にはY23及びSiO2
充填されており、Irルツボ外周に巻かれた高周波誘導
加熱コイル3によりIrルツボを加熱し、ほぼ2050
℃の温度で溶融している。溶融原料の上面液面には、育
成中の単結晶4が種結晶5を介して回転されながら上方
へ引上げられ結晶をつくる。Irルツボ1とルツボ保温
材7の間にはジルコニア(ZrO2)粉末8が充填さ
れ、上面は保温筒9,10により二重に覆われている。
本発明の実施例に係わる結晶材料においては、イットリ
ウム・珪素酸化物単結晶の結晶育成時の溶融液面上の温
度勾配は、長さが10mm当り30℃から40℃の温度
勾配となるような炉の構造と高周波誘導加熱コイルの配
置が工夫されている。
EXAMPLES The present invention will be described below with reference to examples of the present invention and comparison with a conventional method for growing a single crystal. Figure 1 is Y
It is explanatory drawing which shows the schematic structure of the method of pulling up and growing SO single crystal. In FIG. 1, an iridium crucible 1 (hereinafter referred to as an Ir crucible) is filled with Y 2 O 3 and SiO 2, and the Ir crucible is heated by a high frequency induction heating coil 3 wound around the Ir crucible. , About 2050
Melting at a temperature of ℃. On the upper surface of the molten raw material, the growing single crystal 4 is pulled up while being rotated through the seed crystal 5 to form a crystal. Zirconia (ZrO 2 ) powder 8 is filled between the Ir crucible 1 and the crucible heat insulating material 7, and the upper surfaces thereof are double-coated with heat insulating cylinders 9 and 10.
In the crystal materials according to the examples of the present invention, the temperature gradient on the melt surface during the crystal growth of the yttrium / silicon oxide single crystal is such that the temperature gradient is from 30 ° C. to 40 ° C. per 10 mm length. The structure of the furnace and the layout of the high frequency induction heating coil have been devised.

【0007】[0007]

【実施例1】次に、本発明の実施例について具体的に説
明する。まず、原料となるY23とSiO2を1:1の
割合で秤量・混合し、φ50×50H×1.5tmmのI
rルツボに充填し焼成を行い焼成体を3個作る。これを
出発原料とし、流量1リットル/分の窒素雰囲気ガス中
で昇温・溶融させる。その後、直径6mm、全長200
mmの種結晶支持棒6に白金・ロジウム線11を介して
セットされた種結晶4を融液につけて10〜20rpm
の速度で回転させ、1.5〜2.5mm/hrの速度で
引上げて結晶を育成する。これによって得られた単結晶
下部を残存原料融液に付けたままで降温・固化を行った
結果、クラック等の破損部分がイリジウムルツボには観
られず、又再現性も良好であった。従来通り、単結晶下
部を原料融液から切離し降温・固化を行った場合、10
0%の確率で破損してしまった。
[Embodiment 1] Next, an embodiment of the present invention will be specifically described. First, the raw materials Y 2 O 3 and SiO 2 were weighed and mixed at a ratio of 1: 1 to obtain I of φ50 × 50 H × 1.5 t mm.
Fill the crucible and fire to make 3 fired bodies. Using this as a starting material, the temperature is raised and melted in a nitrogen atmosphere gas at a flow rate of 1 liter / min. After that, diameter 6mm, total length 200
10 to 20 rpm by attaching the seed crystal 4 set on the seed crystal support rod 6 of mm through the platinum / rhodium wire 11 to the melt.
At a speed of 1.5 to 2.5 mm / hr to grow crystals. As a result of lowering the temperature and solidification with the lower portion of the single crystal thus obtained attached to the residual raw material melt, no damage such as cracks was found in the iridium crucible, and reproducibility was good. When the lower part of the single crystal is separated from the raw material melt and the temperature is lowered and solidified as usual, 10
It was damaged with a 0% chance.

【0008】[0008]

【発明の効果】以上述べた通り、本発明によれば、比較
的高価なイリジウム材からなるルツボのクラックの発生
がなくなった。
As described above, according to the present invention, the generation of cracks in the crucible made of a relatively expensive iridium material is eliminated.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による単結晶の育成方法の概略を示す説
明図。
FIG. 1 is an explanatory view showing an outline of a method for growing a single crystal according to the present invention.

【符号の説明】[Explanation of symbols]

1 イリジウムルツボ 2 イットリウム・珪素の酸化物原料 3 高周波加熱コイル 4 単結晶 5 種結晶 6 種結晶支持棒 7 ルツボ保温材 8 ジルコニア粉末 9,10 保温筒 11 白金・ロジウム線 1 Iridium crucible 2 Yttrium / silicon oxide raw material 3 High-frequency heating coil 4 Single crystal 5 Seed crystal 6 Seed crystal support rod 7 Crucible heat insulating material 8 Zirconia powder 9,10 Heat insulating tube 11 Platinum / rhodium wire

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 融液から種結晶を用いて単結晶を引上げ
て育成する方法において、単結晶育成終了後に、育成し
た単結晶下部を該残存融液に付けたままで降温し、該残
存融液に結晶性を持たせて固化させることによりルツボ
破損を防止することを特徴とする単結晶育成方法。
1. A method of pulling and growing a single crystal from a melt using a seed crystal, wherein after the growth of the single crystal, the grown lower part of the single crystal is cooled while being attached to the remaining melt, A method for growing a single crystal, wherein crucible damage is prevented by imparting crystallinity to and solidifying.
JP30664592A 1992-10-19 1992-10-19 Growing method for single crystal Pending JPH06128075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30664592A JPH06128075A (en) 1992-10-19 1992-10-19 Growing method for single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30664592A JPH06128075A (en) 1992-10-19 1992-10-19 Growing method for single crystal

Publications (1)

Publication Number Publication Date
JPH06128075A true JPH06128075A (en) 1994-05-10

Family

ID=17959601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30664592A Pending JPH06128075A (en) 1992-10-19 1992-10-19 Growing method for single crystal

Country Status (1)

Country Link
JP (1) JPH06128075A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007077013A (en) * 2005-09-13 2007-03-29 Schott Ag Method and apparatus for making highly uniform low-stress single crystal by pulling from melt and use of the single crystal
CN105200514A (en) * 2015-10-20 2015-12-30 南京光宝光电科技有限公司 Method for protecting iridium crucible during process of growing crystals through Czochralski method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007077013A (en) * 2005-09-13 2007-03-29 Schott Ag Method and apparatus for making highly uniform low-stress single crystal by pulling from melt and use of the single crystal
US7868708B2 (en) 2005-09-13 2011-01-11 Schott Ag Method and apparatus for making a highly uniform low-stress single crystal by drawing from a melt and uses of said crystal
CN105200514A (en) * 2015-10-20 2015-12-30 南京光宝光电科技有限公司 Method for protecting iridium crucible during process of growing crystals through Czochralski method

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