JPH0612604Y2 - Electronic beam processing equipment - Google Patents

Electronic beam processing equipment

Info

Publication number
JPH0612604Y2
JPH0612604Y2 JP1986057656U JP5765686U JPH0612604Y2 JP H0612604 Y2 JPH0612604 Y2 JP H0612604Y2 JP 1986057656 U JP1986057656 U JP 1986057656U JP 5765686 U JP5765686 U JP 5765686U JP H0612604 Y2 JPH0612604 Y2 JP H0612604Y2
Authority
JP
Japan
Prior art keywords
electron beam
valve
opening
electron
sealing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986057656U
Other languages
Japanese (ja)
Other versions
JPS62169463U (en
Inventor
敏之 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1986057656U priority Critical patent/JPH0612604Y2/en
Publication of JPS62169463U publication Critical patent/JPS62169463U/ja
Application granted granted Critical
Publication of JPH0612604Y2 publication Critical patent/JPH0612604Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Welding Or Cutting Using Electron Beams (AREA)

Description

【考案の詳細な説明】 この考案は、真空雰囲気(10−5mmHg程度)中に被加
工物を置き、これに高電圧で加速された電子ビームを集
束レンズ(電子レンズともいう)で集束させて被加工物
に照射すると、その運動エネルギの大部分は熱エネルギ
に変わるため、この電子ビームが照射された部分は加熱
され、たとえば1〜10μsでその材料の融点に達し、
材料が蒸発し、その蒸発圧力によつて所定の加工(穴あ
け、切断、溶接、溶解および蒸着等)を行なう電子ビー
ム加工装置に関するもので、特にこの考案は装置本体内
を電子ビームを発生させる電子銃を収容した高真空側電
子銃室と、低真空電子銃室とに仕切る仕切体を開閉自在
に閉塞する開閉弁のシール材の保護に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION In this invention, a work piece is placed in a vacuum atmosphere (about 10 −5 mmHg), and an electron beam accelerated by a high voltage is focused on the work piece by a focusing lens (also called an electron lens). When the work piece is irradiated with the work piece, most of its kinetic energy is converted into heat energy, so that the part irradiated with this electron beam is heated and reaches the melting point of the material in 1 to 10 μs, for example.
The present invention relates to an electron beam processing apparatus that performs a predetermined process (drilling, cutting, welding, melting, vapor deposition, etc.) by evaporating a material and the evaporation pressure thereof. In particular, the present invention relates to an electron beam processing apparatus that generates an electron beam inside the apparatus body. The present invention relates to protection of a sealing material for an on-off valve that opens and closes a partition body that divides a high vacuum side electron gun chamber containing a gun and a low vacuum electron gun chamber.

[従来の技術] 第2図および第3図はたとえば実開昭59-10986号公報に
示される従来の電子ビーム加工装置の電子銃室と、開閉
弁および保護プレートを示す断面図で、まず第2図にお
いて、(1)は仕切壁(2)によつて内部高真空側電子銃室(3
a)と、低真空側電子銃室(3b)とに仕切られた装置本体
で、上記高真空側電子銃室(3a)内には、負の電子加速用
電圧が印加される陰極(4)と、接地された陽極(5)とから
なる電子銃(6)が収容されている。(7)は上記仕切壁の
(2)のほぼ中央部に複数の取付ボルト(8)によつて取付け
られ、ほぼ中心部に電子ビーム(9)を通過させる透孔(7
a)と、この透孔を開閉自在に閉塞するための後述する開
閉弁(11)が離接する弁座(7b)とを形成した仕切体、(11)
はこの仕切体(7)の弁座(7b)の近傍において回動軸(12)
と一体に反復回動自在に配設され、上記仕切体(7)の弁
座(7b)を開閉自在に閉塞する上記開閉弁で、この開閉弁
(11)の上記弁座(7b)との対応面に形成された環状溝(11
a)内には、第3図にも示すように、上記仕切体(7)の弁
座(7b)に弾性的に接触して、この弁座(7b)、すなわち透
孔(7a)を気密に閉塞するゴム材等の「Oリング」からな
るシール材(13)が嵌め込められている。(14)は上記開閉
弁(11)の近傍において支軸(15)に反復回動自在に支持さ
れた保護プレートで、この保護プレート(14)の自由端部
は、この保護プレート(14)が反時計方向に回動したとき
に第2図に示すように上記仕切体(7)の弁座(7b)に接触
するようになされ、かつこの保護プレート(14)の自由端
部には電子ビーム(9)を通過させるための小孔(14a)が穿
けられている。(16)は上記保護プレート(14)を常時反時
計方向に付勢するための引張りばねで、開閉弁(11)が第
2図に示すように仕切体(7)の弁座(7b)を開放している
ときに保護プレート(14)を開閉弁(11)に接近させ、加工
室(18)内の被加工物(17)に電子ビーム(9)を照射して所
定の加工を行なうときに発生する金属蒸気およびX線、
ならびに電子ビーム(9)が仕切体(7)を通過するときに発
生する散乱電子によつて開閉弁(11)のシール材(13)が急
速に劣化しないように保護するようになされている。
[Prior Art] FIGS. 2 and 3 are sectional views showing an electron gun chamber, an on-off valve and a protection plate of a conventional electron beam processing apparatus disclosed in, for example, Japanese Utility Model Laid-Open No. 59-10986. In Fig. 2, (1) is the internal high vacuum side electron gun chamber (3
a) and a device body partitioned into a low vacuum side electron gun chamber (3b), and a cathode (4) to which a negative electron acceleration voltage is applied in the high vacuum side electron gun chamber (3a). And an electron gun (6) consisting of a grounded anode (5). (7) is for the above partition wall
It is attached to the center of (2) with a plurality of mounting bolts (8), and the through hole (7
A partition body having (a) and a valve seat (7b) to and from which an on-off valve (11) described later for opening and closing the through hole can be opened and closed,
Is a rotating shaft (12) near the valve seat (7b) of this partition (7).
The on-off valve which is integrally and repeatedly rotatable with the partition body (7) to open and close the valve seat (7b).
An annular groove (11) formed on the surface of (11) corresponding to the valve seat (7b).
As shown in FIG. 3, the inside of a) is elastically contacted with the valve seat (7b) of the partition body (7) to hermetically seal the valve seat (7b), that is, the through hole (7a). A sealing material (13) made of an "O-ring" such as a rubber material, which is closed off, is fitted therein. (14) is a protection plate that is repeatedly rotatably supported by a support shaft (15) in the vicinity of the on-off valve (11), and the free end of the protection plate (14) has this protection plate (14). As shown in FIG. 2, when it is rotated counterclockwise, it comes into contact with the valve seat (7b) of the partition body (7), and the free end of the protection plate (14) has an electron beam. A small hole (14a) is formed to allow (9) to pass through. (16) is a tension spring for constantly biasing the protection plate (14) in a counterclockwise direction, and the opening / closing valve (11) opens the valve seat (7b) of the partition body (7) as shown in FIG. When the protective plate (14) is brought close to the on-off valve (11) while it is open, and the workpiece (17) in the machining chamber (18) is irradiated with the electron beam (9) to perform the prescribed machining. Metal vapor and X-rays generated in
In addition, the sealing material (13) of the on-off valve (11) is protected from rapid deterioration by scattered electrons generated when the electron beam (9) passes through the partition body (7).

なお、被加工物(17)の所定の加工を終えたときには、回
動軸(12)を介して開閉弁(11)を反時計方向に回動させ、
1点鎖線で示すように、この開閉弁(11)のシール材(13)
を仕切体(7)の弁座(7b)圧接させることにより、高真空
側電子銃室(3a)と、低真空側電子銃室(3b)とは気密的に
隔離されるので、加工室(18)内の被加工物(17)を装置本
体(1)の外部に取り出すことができるが、このとき、高
真空側電子銃室(3a)は次の電子ビーム加工に備えて真空
引きされていることはいうまでもない。また、被加工物
(17)に対し所定の加工を終えて開閉弁(11)が反時計方向
に回動するときにはこの開閉弁(11)は上記記保護プレー
ト(14)に係合してこれを引張りばね(16)に抗して時計方
向に回動させ、1点鎖線で示すように回避させるように
なされている。
When the predetermined processing of the workpiece (17) is completed, the opening / closing valve (11) is rotated counterclockwise via the rotation shaft (12),
As shown by the alternate long and short dash line, the sealing material (13) for this on-off valve (11)
Since the high vacuum side electron gun chamber (3a) and the low vacuum side electron gun chamber (3b) are airtightly separated by pressing the valve seat (7b) of the partition body (7), the processing chamber ( The workpiece (17) in 18) can be taken out of the main body (1) of the device, but at this time, the high vacuum side electron gun chamber (3a) is evacuated in preparation for the next electron beam processing. Needless to say Also, the work piece
When the opening / closing valve (11) is rotated counterclockwise after finishing the predetermined processing for (17), the opening / closing valve (11) engages with the above-mentioned protection plate (14) and the tension spring (16) ) To rotate in the clockwise direction to avoid it as indicated by the one-dot chain line.

[考案が解決しようとする問題点] 上述した従来の電子ビーム加工装置において、高真空側
電子銃室(3a)と、低真空側電子銃室(3b)との仕切体(7)
を開閉自在に閉塞する開閉弁(11)のシール材(13)は、第
3図に示すようにこのシール材(13)に所定間隙をあけて
開閉弁(11)の正面に対向する平面的な保護プレート(14)
によつて、散乱電子ビームならびに金属蒸気およびX線
から保護するようにしているため、平面的な保護プレー
ト(14)の側面から矢印で示すように散乱電子および金属
蒸気ならびX線がシール材(11)に向つて侵入してこのシ
ール材(13)の劣化を早める欠点がある。
[Problems to be Solved by the Invention] In the conventional electron beam processing apparatus described above, a partition body (7) for the high vacuum side electron gun chamber (3a) and the low vacuum side electron gun chamber (3b)
The sealing material (13) of the on-off valve (11) for opening and closing the valve is a flat surface facing the front of the on-off valve (11) with a predetermined gap in the sealing material (13) as shown in FIG. Protective plate (14)
Therefore, the scattered electron beam, the metal vapor and the X-ray are protected from the scattered electron beam, the metal vapor and the X-ray as shown by the arrow from the side surface of the flat protective plate (14). There is a drawback that it enters toward 11) and accelerates the deterioration of the sealing material (13).

この考案はかかる点に着目してなされたもので、散乱電
子ビームならびに金属蒸気およびX線が開閉弁(11)のシ
ール材(13)に向つて侵入しないようにした保護プレート
を有する電子ビーム加工装置を提供しようとするもので
ある。
This invention has been made in view of this point, and has an electron beam processing having a protective plate that prevents scattered electron beams, metal vapor, and X-rays from entering the sealing material (13) of the on-off valve (11). It is intended to provide a device.

[問題点を解決するための手段] この考案に係る電子ビーム加工装置は、電子銃を収容し
た高真空側の第1の電子銃室と、被加工物を収容する低
真空側の第2の電子銃室との間に仕切体を配置し、電子
銃から出た電子ビームが仕切体の透孔を通過して、電子
ビームが被加工物に照射できるようにし、被加工物を第
2の電子銃室から取り出すときに透孔をシール材を有す
る開閉弁で気密的に閉塞するようにした電子ビーム加工
装置において、電子ビームが照射されているときに開閉
弁のシール材が取付けられている正面と対向して該正面
をしゃ蔽する平面部及び開閉弁の側面と対向して該側面
をしゃ蔽する側壁部を備えた保護プレートを設け、開閉
弁が透孔を閉塞する方向に回動するとき保護プレートを
押圧して、保護プレートが開閉弁のシール材と対向する
位置から外れるように構成したものである。
[Means for Solving the Problems] An electron beam processing apparatus according to the present invention includes a high vacuum side first electron gun chamber accommodating an electron gun and a low vacuum side second chamber accommodating a workpiece. A partition body is arranged between the electron gun chamber and the electron gun so that the electron beam emitted from the electron gun passes through the through hole of the partition body so that the electron beam can be applied to the work piece, and the work piece is In an electron beam processing apparatus in which a through-hole is hermetically closed by an opening / closing valve having a sealing material when taken out from an electron gun chamber, a sealing material for the opening / closing valve is attached when an electron beam is irradiated. A protective plate having a flat surface portion facing the front surface to shield the front surface and a side wall portion facing the side surface of the opening / closing valve to shield the side surface is provided, and the opening / closing valve rotates in the direction of closing the through hole. The protective plate when it is It is configured so as to be separated from the position facing the lumber.

[作用] この考案においては、保護プレートが、電子ビームが照
射されているときに開閉弁のシール材が取付けられてい
る正面と対向して該正面をしゃ蔽する平面部及び開閉弁
の側面と対向して該側面をしゃ蔽する側壁部を備えてい
るので、散乱電子ビームならびに金属蒸気およびX線か
ら開閉弁のシール材を保護することができる。
[Operation] In the present invention, the protection plate includes a flat surface portion that faces the front surface of the opening / closing valve on which the sealing material is attached and shields the front surface when the electron beam is irradiated, and a side surface of the opening / closing valve. Since the side wall portions are provided so as to oppose each other and shield the side surface, it is possible to protect the sealing material of the on-off valve from the scattered electron beam, the metal vapor and the X-ray.

[考案の実施例] 第1図はこの考案の一実施例にかかる開閉弁と保護プレ
ートとを示すものであるが、開閉弁と保護プレートを使
用する電子ビーム加工装置の電子銃室は上述した従来の
ものと同一のためその説明を省略する。
[Embodiment of the Invention] FIG. 1 shows an opening / closing valve and a protection plate according to an embodiment of the present invention. The electron gun chamber of the electron beam processing apparatus using the opening / closing valve and the protection plate has been described above. Since it is the same as the conventional one, its explanation is omitted.

(19)は開閉弁(11)の近傍において支軸(15)に反復回動自
在に支持された保護プレートで、この保護プレート(19)
は、シール材(13)を取付けた開閉弁(11)の正面に対向し
てこれをしや蔽する平面部(19a)と、開閉弁(11)の側面
に対向してこれをしや蔽する側壁部(19b),(19b)とによ
つて構成されている。
Reference numeral (19) is a protection plate which is repeatedly and rotatably supported by a support shaft (15) near the opening / closing valve (11).
Is a flat part (19a) facing the front of the on-off valve (11) to which the seal material (13) is attached, and a flat part (19a) facing the front of the on-off valve (11). The side wall portions (19b) and (19b) are formed.

[考案の効果] この考案は以上説明したとおり、高真空側の第1の電子
銃室と低真空側の第2の電子銃室との間に、電子ビーム
が通過する透孔を形成した仕切体を有し、被加工物を第
2の電子銃室から取り出すときに仕切体の透孔をシール
材を有する開閉弁で閉塞するようにした電子ビーム加工
装置において、電子ビームが照射されているときに開閉
弁のシール材が取付けられている正面と対向して該正面
をしゃ蔽する平面部及び開閉弁の側面と対向して該側面
をしゃ蔽する側壁部を備えた保護プレートを設けたの
で、散乱電子ビームならびに金属蒸気およびX線が開閉
弁のシール材に向って侵入するようなことがなく、シー
ル材の早期劣化を防止することができ、長期にわたつて
安定した電子ビーム加工装置の運転が期待できる優れた
実用的効果を有するものである。
[Advantages of the Invention] As described above, the invention has a partition in which a through hole through which an electron beam passes is formed between the first electron gun chamber on the high vacuum side and the second electron gun chamber on the low vacuum side. An electron beam is irradiated in an electron beam processing apparatus that has a body and is configured such that when a workpiece is taken out of the second electron gun chamber, a through hole of a partition body is closed by an opening / closing valve having a sealing material. Occasionally, a protective plate having a flat surface portion facing the front surface on which the sealing material of the opening / closing valve is mounted and shielding the front surface and a side wall portion facing the side surface of the opening / closing valve and shielding the side surface are provided Therefore, scattered electron beams and metal vapor and X-rays do not enter the sealing material of the on-off valve, and it is possible to prevent early deterioration of the sealing material, and a stable electron beam processing device for a long period of time. Excellent practical use that can be expected to drive Have a positive effect.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの考案の一実施例にかかる開閉弁と保護プレ
ートを示す断面図、第2図は従来の電子ビーム加工装置
の電子銃室を示す断面図、第3図は開閉弁と保護プレー
トを示す断面図である。 図において、(1)は装置本体、(3a)は高真空側電子銃
室、(3b)は低真空側銃室、(6)は電子銃、(7)は仕切体、
(7a)は透孔、(7b)は弁座、(11)は開閉弁、(11a)は環状
溝、(13)はシール材、(19)は保護プレート、(19a)は平
面部、(19b)は側壁部である。 なお、図中同一符号は同一または相当部分を示す。
1 is a sectional view showing an on-off valve and a protective plate according to an embodiment of the present invention, FIG. 2 is a sectional view showing an electron gun chamber of a conventional electron beam processing apparatus, and FIG. 3 is an on-off valve and a protective plate. FIG. In the figure, (1) is the apparatus main body, (3a) is the high vacuum side electron gun chamber, (3b) is the low vacuum side gun chamber, (6) is the electron gun, (7) is a partition,
(7a) is a through hole, (7b) is a valve seat, (11) is an on-off valve, (11a) is an annular groove, (13) is a sealing material, (19) is a protective plate, (19a) is a flat part, ( 19b) is a side wall. The same reference numerals in the drawings indicate the same or corresponding parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】電子銃を収容した高真空側の第1の電子銃
室と、被加工物を収容する低真空側の第2の電子銃室と
の間に仕切体を配置し、上記電子銃から出た電子ビーム
が上記仕切体の透孔を通過して、上記電子ビームが上記
被加工物に照射できるようにし、上記被加工物を上記第
2の電子銃室から取り出すときに上記透孔をシール材を
有する開閉弁で気密的に閉塞するようにした電子ビーム
加工装置において、 上記電子ビームが照射されているときに上記開閉弁の上
記シール材が取付けられている正面と対向して該正面を
しゃ蔽する平面部及び上記開閉弁の側面と対向して該側
面をしゃ蔽する側壁部を備えた保護プレートを設け、 上記開閉弁が上記透孔を閉塞する方向に回動するとき上
記保護プレートを押圧して、上記保護プレートが上記開
閉弁の上記シール材と対向する位置から外れるように構
成したことを特徴とする電子ビーム加工装置。
1. A partition body is arranged between a high vacuum side first electron gun chamber accommodating an electron gun and a low vacuum side second electron gun chamber accommodating a work, and the electron is provided. The electron beam emitted from the gun passes through the through hole of the partition body so that the electron beam can irradiate the work piece, and when the work piece is taken out of the second electron gun chamber, In an electron beam processing apparatus in which an opening / closing valve having a sealing material is used to hermetically close the hole, when facing the front surface of the opening / closing valve on which the sealing material is attached, when the electron beam is irradiated. When a protective plate having a flat surface portion that shields the front surface and a side wall portion that faces the side surface of the opening / closing valve and shields the side surface is provided, and the opening / closing valve rotates in a direction to close the through hole Press the protection plate so that the protection plate Electron beam machining apparatus characterized by being configured to disengage from the sealing material facing the position of the valve closing.
JP1986057656U 1986-04-18 1986-04-18 Electronic beam processing equipment Expired - Lifetime JPH0612604Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986057656U JPH0612604Y2 (en) 1986-04-18 1986-04-18 Electronic beam processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986057656U JPH0612604Y2 (en) 1986-04-18 1986-04-18 Electronic beam processing equipment

Publications (2)

Publication Number Publication Date
JPS62169463U JPS62169463U (en) 1987-10-27
JPH0612604Y2 true JPH0612604Y2 (en) 1994-03-30

Family

ID=30887565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986057656U Expired - Lifetime JPH0612604Y2 (en) 1986-04-18 1986-04-18 Electronic beam processing equipment

Country Status (1)

Country Link
JP (1) JPH0612604Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548545Y2 (en) * 1973-12-29 1980-11-13

Also Published As

Publication number Publication date
JPS62169463U (en) 1987-10-27

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