JPH06112406A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPH06112406A JPH06112406A JP4260941A JP26094192A JPH06112406A JP H06112406 A JPH06112406 A JP H06112406A JP 4260941 A JP4260941 A JP 4260941A JP 26094192 A JP26094192 A JP 26094192A JP H06112406 A JPH06112406 A JP H06112406A
- Authority
- JP
- Japan
- Prior art keywords
- layer wiring
- integrated circuit
- insulating film
- semiconductor integrated
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体集積回路に関
し、特に外部との容量結合を可能にする半導体集積回路
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor integrated circuit, and more particularly to a semiconductor integrated circuit capable of capacitive coupling with the outside.
【0002】[0002]
【従来の技術】従来の集積回路では、外部と容量結合を
行う場合は、図5に示すように集積回路1の入出力部に
コンデンサ2をハンダ付けによって外付けしていた。2. Description of the Related Art In a conventional integrated circuit, when capacitive coupling is performed with the outside, a capacitor 2 is externally attached to the input / output portion of the integrated circuit 1 by soldering as shown in FIG.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、このよ
うに集積回路1にコンデンサ2を外付けする場合は、
(1)部品数が多くなる、(2)製造工程が多くなる、
(3)コンデンサ2のリードなどによって寄生インダク
タンスが増大する、(4)集積回路1+コンデンサ2で
占有面積が大きくなる等の問題が生じ、これによって性
能低下やコスト高になるという問題があった。However, when the capacitor 2 is externally attached to the integrated circuit 1 as described above,
(1) The number of parts increases, (2) the manufacturing process increases,
(3) The parasitic inductance increases due to the leads of the capacitor 2 and the like, and (4) the occupied area of the integrated circuit 1 + capacitor 2 increases, which results in lower performance and higher cost.
【0004】本発明は、上述の如き従来の問題点を解決
するためになされたもので、その目的は、外部との容量
結合を行う際に生ずる性能低下やコスト高になる点を防
止した半導体集積回路を提供することである。The present invention has been made in order to solve the above-mentioned conventional problems, and an object thereof is a semiconductor that prevents performance deterioration and cost increase that occur when capacitive coupling with the outside is performed. It is to provide an integrated circuit.
【0005】[0005]
【課題を解決するための手段】上記目的を達成するため
に、本発明の特徴は、半導体素子を有する半絶縁性基板
上に形成され、該半導体素子と電気的に接続された第1
層配線と、前記第1層配線上に形成された所定膜厚の容
量形成用の絶縁膜と、前記絶縁膜上に形成されたボンデ
ィングパッド用の第2層配線とを備えたものである。In order to achieve the above object, a feature of the present invention is that a first insulating film is formed on a semi-insulating substrate having a semiconductor element and is electrically connected to the semiconductor element.
A layer wiring, an insulating film having a predetermined film thickness for forming a capacitance formed on the first layer wiring, and a second layer wiring for a bonding pad formed on the insulating film.
【0006】前記容量形成用の絶縁膜は、前記半絶縁性
基板に形成される他の絶縁膜と別工程で形成し、その膜
厚または材質が該他の絶縁膜と異なるものであってもよ
い。The insulating film for forming the capacitance may be formed in a process different from that of the other insulating film formed on the semi-insulating substrate, and its film thickness or material may be different from that of the other insulating film. Good.
【0007】また、前記半絶縁性基板と前記第1層配線
との間に絶縁膜を形成してもよい。An insulating film may be formed between the semi-insulating substrate and the first layer wiring.
【0008】[0008]
【作用】上述の如き構成によれば、第1層配線、容量形
成用の絶縁膜及びボンディングパッドとして使用される
第2層配線により、容量が形成され、従来のように、コ
ンデンサを外付けすることなく、外部回路と容量結合す
ることが可能となる。According to the above-described structure, the first layer wiring, the insulating film for forming the capacitance, and the second layer wiring used as the bonding pad form a capacitance, and the capacitor is externally attached as in the conventional case. It becomes possible to capacitively couple with an external circuit without the need.
【0009】[0009]
【実施例】以下、本発明の一実施例を図面に基づいて説
明する。図1は、本発明を実施した半導体集積回路の入
出力部の断面構成図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional configuration diagram of an input / output unit of a semiconductor integrated circuit embodying the present invention.
【0010】図1に示すが如く、この半導体集積回路の
入出力部の半導体基板11上には、半導体集積回路内部
に延設されるアルミニューム等の第1層配線12が形成
され、さらに該第1層配線12の表面上には所定の膜厚
の絶縁膜(SiO2 )13を介してボンディングパット
である第2層配線14が形成されている。これら第1及
び第2層配線12,14と絶縁膜13とによりコンデン
サが形成され、この半導体集積回路は、外部と容量結合
が可能となる。As shown in FIG. 1, on a semiconductor substrate 11 of an input / output portion of this semiconductor integrated circuit, a first layer wiring 12 such as aluminum extending inside the semiconductor integrated circuit is formed, and further, the first layer wiring 12 is formed. On the surface of the first layer wiring 12, a second layer wiring 14 which is a bonding pad is formed via an insulating film (SiO2) 13 having a predetermined thickness. A capacitor is formed by the first and second layer wirings 12 and 14 and the insulating film 13, and this semiconductor integrated circuit can be capacitively coupled to the outside.
【0011】この図1の半導体集積回路をパッケージに
実装した場合の断面構成図を図2に示すと共に、この場
合の部分平面図を図3に示す。FIG. 2 is a sectional view showing the case where the semiconductor integrated circuit of FIG. 1 is mounted in a package, and FIG. 3 is a partial plan view of this case.
【0012】パッケージ内には、上記半導体集積回路が
収納されており、図2に示すパッケージ底面21上には
図1の入出力部が搭載されている。この入出力部におけ
る半導体基板11上には、第1層配線12、絶縁膜13
及び第2層配線14を保護するための保護膜22が、こ
れら第1層配線12、絶縁膜13及び第2層配線14の
端面を被包するように形成されている。The above semiconductor integrated circuit is housed in the package, and the input / output section of FIG. 1 is mounted on the bottom surface 21 of the package shown in FIG. The first layer wiring 12 and the insulating film 13 are formed on the semiconductor substrate 11 in the input / output section.
The protective film 22 for protecting the second layer wiring 14 is formed so as to cover the end faces of the first layer wiring 12, the insulating film 13, and the second layer wiring 14.
【0013】さらに、ボンディングパットの第2層配線
14とパッケージの内部リード24とは、ボンディング
ワイヤ23により電気的に接続され、その内部リード2
4が外部リード25に接続されている。このように、コ
ンデンサをICチップ内部に収納するように構成したの
で、本実施例の半導体集積回路は、従来のように、コン
デンサを外付けすることなく、外部リード25に接続さ
れる外部回路と容量結合することが可能となる。Further, the second layer wiring 14 of the bonding pad and the internal lead 24 of the package are electrically connected by the bonding wire 23, and the internal lead 2
4 is connected to the external lead 25. Since the capacitor is housed inside the IC chip as described above, the semiconductor integrated circuit of this embodiment is different from the conventional external circuit connected to the external lead 25 without externally attaching the capacitor. Capacitive coupling is possible.
【0014】なお、本発明は上記実施例に限定されず、
種々の変形が可能である。その変形例としては、例えば
次のようなものがある。The present invention is not limited to the above embodiment,
Various modifications are possible. The following are examples of such modifications.
【0015】(1)絶縁膜13は、第2層配線14の直
下以外の層間絶縁膜と同一工程で形成してもよいし、ま
た、別工程で形成して膜厚を変えたり、別材料にしたり
する変形も可能である。(1) The insulating film 13 may be formed in the same step as the interlayer insulating film other than directly below the second layer wiring 14, or may be formed in a different step to change the film thickness, or by a different material. It is also possible to change the shape.
【0016】(2)上記実施例では、図1に示すように
半導体基板11上直に第1層配線12が形成されている
が、例えば図4に示すように半導体基板11上に絶縁膜
30を介して第1層配線12が形成されるようにしてい
もよい。(2) In the above embodiment, the first layer wiring 12 is formed directly on the semiconductor substrate 11 as shown in FIG. 1, but the insulating film 30 is formed on the semiconductor substrate 11 as shown in FIG. 4, for example. The first layer wiring 12 may be formed via the.
【0017】[0017]
【発明の効果】以上詳細に説明したように、本発明で
は、第1層配線、絶縁膜及び第2層配線によって容量が
形成されるようにしたので、従来のように、コンデンサ
を外付けすることなく、外部と容量結合することが可能
となる。これにより、部品数が低減すると共に、コンデ
ンサの外付けするための工程が省略でき、従来に比べて
コスト低下となる。さらに、寄生インダクタンスの増加
を防ぐことができるため、性能低下を防止できる。As described above in detail, in the present invention, the capacitor is formed by the first layer wiring, the insulating film and the second layer wiring, so that the capacitor is externally mounted as in the conventional case. Without the need for capacitive coupling with the outside. As a result, the number of parts is reduced, and the step for externally attaching the capacitor can be omitted, resulting in a cost reduction compared to the conventional case. Furthermore, since it is possible to prevent an increase in parasitic inductance, it is possible to prevent performance deterioration.
【図1】本発明を実施した半導体集積回路の入出力部の
断面構成図である。FIG. 1 is a cross-sectional configuration diagram of an input / output unit of a semiconductor integrated circuit embodying the present invention.
【図2】図1の半導体集積回路をパッケージに実装した
場合の断面構成図である。FIG. 2 is a cross-sectional configuration diagram when the semiconductor integrated circuit of FIG. 1 is mounted in a package.
【図3】図1の半導体集積回路をパッケージに実装した
場合の部分平面図である。FIG. 3 is a partial plan view of the semiconductor integrated circuit of FIG. 1 mounted on a package.
【図4】上記実施例の変形例を示す図である。FIG. 4 is a diagram showing a modification of the above embodiment.
【図5】従来の半導体集積回路における外部との容量結
合を示す図である。FIG. 5 is a diagram showing external capacitive coupling in a conventional semiconductor integrated circuit.
11 半絶縁性基板 12 第1層配線 13,30 絶縁膜 14 第2層配線 11 semi-insulating substrate 12 first layer wiring 13 and 30 insulating film 14 second layer wiring
Claims (3)
成され、該半導体素子と電気的に接続された第1層配線
と、 前記第1層配線上に形成された所定膜厚の容量形成用の
絶縁膜と、 前記絶縁膜上に形成されたボンディングパッド用の第2
層配線とを備えたことを特徴とする半導体集積回路。1. A first layer wiring formed on a semi-insulating substrate having a semiconductor element and electrically connected to the semiconductor element, and a capacitor having a predetermined thickness formed on the first layer wiring. Insulation film and a second bonding pad formed on the insulation film
A semiconductor integrated circuit comprising: a layer wiring.
性基板に形成される他の絶縁膜と別工程で形成し、その
膜厚または材質が該他の絶縁膜と異なるものであること
を特徴とする請求項1記載の半導体集積回路。2. The insulating film for forming the capacitance is formed in a step different from that of the other insulating film formed on the semi-insulating substrate, and the film thickness or material thereof is different from the other insulating film. The semiconductor integrated circuit according to claim 1, wherein:
間に絶縁膜を形成したことを特徴とする請求項1記載の
半導体集積回路。3. The semiconductor integrated circuit according to claim 1, wherein an insulating film is formed between the semi-insulating substrate and the first layer wiring.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4260941A JPH06112406A (en) | 1992-09-30 | 1992-09-30 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4260941A JPH06112406A (en) | 1992-09-30 | 1992-09-30 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06112406A true JPH06112406A (en) | 1994-04-22 |
Family
ID=17354909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4260941A Withdrawn JPH06112406A (en) | 1992-09-30 | 1992-09-30 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06112406A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004061575A1 (en) * | 2004-05-17 | 2005-12-15 | Mitsubishi Denki K.K. | Semiconductor device for electric power module, has metal layer connected to bonding wire, which is provided at front surface of substrate, so that metal layer overlaps capacitor |
JP2014229632A (en) * | 2013-05-17 | 2014-12-08 | 住友電気工業株式会社 | Semiconductor device |
JPWO2014021358A1 (en) * | 2012-08-02 | 2016-07-21 | 株式会社堀場製作所 | Amplifier and radiation detector |
-
1992
- 1992-09-30 JP JP4260941A patent/JPH06112406A/en not_active Withdrawn
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004061575A1 (en) * | 2004-05-17 | 2005-12-15 | Mitsubishi Denki K.K. | Semiconductor device for electric power module, has metal layer connected to bonding wire, which is provided at front surface of substrate, so that metal layer overlaps capacitor |
US7368825B2 (en) | 2004-05-17 | 2008-05-06 | Mitsubishi Denki Kabushiki Kaisha | Power semiconductor device |
JPWO2014021358A1 (en) * | 2012-08-02 | 2016-07-21 | 株式会社堀場製作所 | Amplifier and radiation detector |
US20180006613A1 (en) | 2012-08-02 | 2018-01-04 | Horiba, Ltd. | Amplifier and radiation detector |
US10554178B2 (en) | 2012-08-02 | 2020-02-04 | Horiba, Ltd. | Amplifier and radiation detector |
JP2014229632A (en) * | 2013-05-17 | 2014-12-08 | 住友電気工業株式会社 | Semiconductor device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19991130 |