JPH06105163B2 - Semiconductor image position detector - Google Patents

Semiconductor image position detector

Info

Publication number
JPH06105163B2
JPH06105163B2 JP27756189A JP27756189A JPH06105163B2 JP H06105163 B2 JPH06105163 B2 JP H06105163B2 JP 27756189 A JP27756189 A JP 27756189A JP 27756189 A JP27756189 A JP 27756189A JP H06105163 B2 JPH06105163 B2 JP H06105163B2
Authority
JP
Japan
Prior art keywords
conductive
extension
basic
image position
basic resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP27756189A
Other languages
Japanese (ja)
Other versions
JPH03138503A (en
Inventor
正徳 出澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP27756189A priority Critical patent/JPH06105163B2/en
Publication of JPH03138503A publication Critical patent/JPH03138503A/en
Publication of JPH06105163B2 publication Critical patent/JPH06105163B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、輝点像の位置を検出する半導体像位置検出素
子(以下、「PSD」という。)に係り、特に単一の基幹
抵抗より枝葉状に光感部へのびる導体を有するPSDの精
度を高めるPSDの構成に関する。
Description: TECHNICAL FIELD The present invention relates to a semiconductor image position detecting element (hereinafter, referred to as “PSD”) for detecting the position of a bright spot image, and more particularly, to a single basic resistor. The present invention relates to a structure of a PSD having a conductor having a conductor extending in a light-sensing portion in a branch shape.

(従来技術) PSDによる像位置検出精度の向上には、分割抵抗を正確
かつ安定に製作することが必要とされる。これを抵抗層
として形成する場合には、一様かつ所定の抵抗値のする
ことは容易でない。この困難を避けるため、分割抵抗を
所定の狭い領域に集中型として安定かつ正確に形成し、
これを基幹抵抗とし、この基幹抵抗より光感部へ櫛の歯
状に導電部を伸ばした構造のPSDが提案されている。第4
a図は1次元の従来のPSDの構造を示す概念図である。分
割抵抗を光感部Dの側部に集中させて基幹抵抗Rとして
構成し、基幹抵抗Rより櫛の歯状に光感部Dへと導電延
長部tを伸ばした構造となっている。櫛の歯の導電部で
生成された光電流iは歯の根元より基幹抵抗Rに流入
し、基幹抵抗Rを伝ってバイアス層Cと出力端子TA、TB
より検出される。すなわち、輝点像が中心位置にあれ
ば、同じ大きさの電流が基幹天候Rに沿って反対方向に
それぞれ出力端子TA、TBに向って流れ、その両電流の差
は零となって輝点像が中心位置にあることを示し、輝点
像が中心位置から一方に片寄った位置にあると両電流の
差は正負でその位置に対応する大きさとなってその輝点
像の位置を指示する。
(Prior Art) In order to improve the image position detection accuracy by PSD, it is necessary to manufacture the dividing resistors accurately and stably. When this is formed as a resistance layer, it is not easy to obtain a uniform and predetermined resistance value. In order to avoid this difficulty, the dividing resistors are formed as a concentrated type in a predetermined narrow area stably and accurately,
A PSD having a structure in which this is used as a basic resistance and a conductive portion is extended from the basic resistance to the light-sensing portion in the shape of a comb tooth has been proposed. the 4th
Figure a is a conceptual diagram showing the structure of a conventional one-dimensional PSD. The dividing resistance is concentrated on the side portion of the photosensitive section D to form a basic resistance R, and the conductive extension portion t is extended from the basic resistance R to the photosensitive section D in the shape of a comb tooth. The photocurrent i generated in the conductive part of the teeth of the comb flows into the basic resistance R from the root of the teeth, propagates through the basic resistance R, and the bias layer C and the output terminals T A , T B
More detected. That is, if the bright spot image is at the center position, currents of the same magnitude flow in opposite directions along the basic weather R toward the output terminals T A and T B , respectively, and the difference between the two currents becomes zero. It indicates that the bright spot image is at the center position, and when the bright spot image is offset from the center position to one side, the difference between the two currents is positive and negative and has a magnitude corresponding to that position. Give instructions.

(発明が解決しようとする問題点) この従来の櫛状のPSDでは、分割抵抗を所定の狭い領域
に集中させ基幹抵抗として構成したため検出部を極めて
安定かつ正確に製作することが可能となった半面輝点像
の大きさが小さくなってくると次のような問題が生じて
くる。
(Problems to be Solved by the Invention) In this conventional comb-shaped PSD, it is possible to manufacture the detecting portion extremely stably and accurately because the dividing resistors are concentrated in a predetermined narrow area and configured as a basic resistor. As the size of the half-plane bright spot image becomes smaller, the following problems occur.

輝点像の大きさが櫛の歯の間隔に比べて少なくとも数倍
以上ないと、検出電流の和の値および像位置検出信号が
輝点像位置の移動により櫛の歯の間隔に応じて波状に変
動してしまう。第5図は一次元の従来のPSDを用いて、
輝点像を小さく(櫛の歯の間隔程度に)して実測し検出
位置信号の一例である。
If the size of the bright spot image is at least several times larger than the distance between the comb teeth, the sum of the detection currents and the image position detection signal are wavy depending on the distance between the comb teeth due to the movement of the bright spot image position. Will fluctuate. Figure 5 shows a conventional one-dimensional PSD
This is an example of a detection position signal obtained by actually measuring a bright spot image with a small size (to a distance between comb teeth).

この問題を解決しようとして櫛の歯の導電延長部の巾を
広くすると基幹抵抗の抵抗値の一様性を乱してしまって
精確な位置決定ができないという欠点があった。
If the width of the conductive extension of the teeth of the comb is widened in an attempt to solve this problem, the uniformity of the resistance value of the basic resistance is disturbed, and the position cannot be accurately determined.

(問題を解決するための手段) 上記の問題点を解決するために本発明においては、光感
部に形成する導電延長部の巾を可能な限り広くし、基幹
抵抗へ接合する部分の巾を可能な限り狭くした枝葉状構
造とする。さらに、導電延長部の巾を広くすることによ
り輝点像の移動による像位置検出信号の波状変動を減少
し、基幹抵抗へ接続する部分の巾を狭くすることにより
基幹抵抗の抵抗値の一様性をその接続部において乱すこ
とを回避しているのである。更に像位置検出信号の波状
変動を一層減少せしめるため並列配置した導電延長部の
延長方向と直交する方向に移動する像が占める隣り合う
導電延長部の一方の面積が減少すると他方の面積が増大
するような相補的な導電延長部の形状とする。
(Means for Solving the Problems) In order to solve the above problems, in the present invention, the width of the conductive extension formed in the light-sensing portion is made as wide as possible, and the width of the portion to be joined to the core resistance is made wider. The branches and leaves are made as narrow as possible. Furthermore, by widening the width of the conductive extension, the wavy fluctuation of the image position detection signal due to the movement of the bright spot image is reduced, and by narrowing the width of the part connected to the main resistance, the resistance value of the main resistance is made uniform. It avoids disturbing the sex at its connection. Further, in order to further reduce the wavy fluctuation of the image position detection signal, if one area of the adjacent conductive extension portions occupied by the images moving in the direction orthogonal to the extension direction of the conductive extension portions arranged in parallel decreases, the area of the other increases. The shape of the complementary conductive extension is as follows.

(作用) 光感部における導電延長部の巾を可能な限り広くするこ
とにより、輝点像の大きさが小さくなった場合でも検出
光電流値の変動が小さくなる。また、導電延長部が基幹
抵抗へ結合する部分の巾を可能な限り狭くすることによ
りその接続個処において基幹抵抗値の一様性を乱す度合
が小さくなる。
(Function) By making the width of the conductive extension portion in the light-sensing portion as wide as possible, the fluctuation of the detected photocurrent value is reduced even when the size of the bright spot image is reduced. Further, by making the width of the portion where the conductive extension portion is connected to the basic resistance as narrow as possible, the degree of disturbing the uniformity of the basic resistance value at the connection point becomes small.

更に隣り合う導電延長部の形が、移動輝点像の占有面積
について相補的となるようにすることによって輝点移動
と検出電流値とが線形関係となる。
Further, by making the shapes of the adjacent conductive extensions complementary to the occupied area of the moving bright spot image, the bright spot movement and the detected current value have a linear relationship.

(実施例) 以下に添付図を参照して本発明の実施例を説明する。(Examples) Examples of the present invention will be described below with reference to the accompanying drawings.

第1図に本発明に基づいて構成された1次元PSDの構造
を示す。半導体基板の光感部Dに設けられた導電延長部
tの巾を広く、その基幹抵抗Rへ結合される部分t′の
巾が狭くなるように構成されている。第1b図の断面図に
示すように、輝点像の部分で導電延長部tとバイアス層
Cとの間に輝度Iに応じた電流密度で光電流iが流れ
る。この電流が基幹抵抗の狭い巾の導電部t′で結合さ
れた位置に流入(極性反対の場合はその位置へ流出)す
る。
FIG. 1 shows the structure of a one-dimensional PSD constructed according to the present invention. The width of the conductive extension portion t provided on the photosensitive portion D of the semiconductor substrate is widened, and the width of the portion t ′ coupled to the basic resistance R is narrowed. As shown in the cross-sectional view of FIG. 1b, the photocurrent i flows between the conductive extension t and the bias layer C in the bright spot image portion at a current density corresponding to the luminance I. This current flows into the position where it is connected by the conductive portion t'having a narrow width of the basic resistance (in the case where the polarities are opposite, it flows out to that position).

第2aないし2d図は光感部での導電延長部tの巾を変化さ
せた時の像位置検出値の変動の様子を理論的に算出した
ものの一例である。dxは検出像位置の理論値からのずれ
を示す。光感部における導電延長部tの巾を広くした方
が像位置検出値の変動が小さくなっている。
FIGS. 2a to 2d are examples of theoretically calculated changes in the image position detection value when the width of the conductive extension portion t in the light sensing portion is changed. dx indicates the deviation of the detected image position from the theoretical value. The larger the width of the conductive extension t in the light sensitive section, the smaller the fluctuation of the image position detection value.

このことから第4図の従来の櫛型構造のものでは輝点の
移動によって検出光電流値の変動が激しいのに対し、本
発明による光感部での導電延長部の巾を広くしたもので
は変動が小さくなることが理解されよう。
From this fact, in the conventional comb structure shown in FIG. 4, the detected photocurrent value fluctuates significantly due to the movement of the bright spots, whereas in the case where the width of the conductive extension portion in the photosensitive portion according to the present invention is wide. It will be appreciated that the variability will be small.

しかし第4図の構成で導電延長部の巾をたヾ広くしただ
けでは基幹抵抗Rとの接合する個所で、基幹抵抗を流れ
る電流が導電延長部の方に入り込んで流れる割合が大き
くなって基幹抵抗の抵抗値をその個所で乱してしまい、
このことが像位置検出誤差を引き起す要因となる。この
障害は本発明に従って導電延長部が基幹抵抗へ接合する
部分での巾を可能な限り狭くすることにより回避するこ
とができる。
However, if the width of the conductive extension is widened in the configuration shown in FIG. 4, the rate at which the current flowing through the basic resistance flows into the conductive extension increases at the point where it joins with the basic resistance R, and The resistance value of the resistor is disturbed at that point,
This causes an image position detection error. This obstruction can be avoided according to the invention by making the width of the electrically conductive extension where it joins the basic resistance as narrow as possible.

更に像位置検出の直線性を向上させるには、第3a、bそ
してc図に示すように並列導電延長部の延長方向と直交
する方向に移動する像が占める隣り合う導電延長部の一
方の面積が減少すると他方の面積が増大するように並列
導電延長部を相補的な形状とするのがよい(第6a、b図
及び第7a、b図参照)。
In order to further improve the linearity of the image position detection, as shown in FIGS. 3a, 3b, and 3c, the area of one of the adjacent conductive extension portions occupied by the image moving in the direction orthogonal to the extension direction of the parallel conductive extension portions. It is preferred that the parallel conductive extensions have complementary shapes so that as the other decreases, the other area increases (see Figures 6a, b and 7a, b).

本発明の構成を1次元PSDについて説明したが、バイア
ス層の代りに半導体基板の下面に同じ構成を半導体基板
の上面の構成と直交関係に配置して2次元PSDを構成す
ることもできる。
Although the configuration of the present invention has been described with respect to the one-dimensional PSD, the two-dimensional PSD may be configured by arranging the same configuration on the lower surface of the semiconductor substrate in an orthogonal relationship with the configuration of the upper surface of the semiconductor substrate instead of the bias layer.

(効果) 本発明によれば、輝点像が小さい場合の検出光電流値の
変動を回避することができ、更に並行導電延長部の相補
的形状配列により検出電流と輝点移動との間の直線性が
実現される。
(Effect) According to the present invention, it is possible to avoid the fluctuation of the detected photocurrent value when the bright spot image is small, and further, the complementary shape arrangement of the parallel conductive extension portions causes a difference between the detected current and the bright spot movement. Linearity is realized.

【図面の簡単な説明】[Brief description of drawings]

第1a図は本発明のPSDの構成の概念図を、第1b図はその
断面図を示す。第2a、b、c、d図は光感部の導電延長
部の巾を変化した時の像位置検出特性の理想特性からの
ずれの変化を示す。第3a、b、c図は本発明の光感部に
おける導電延長部形状の例を示す。第4a図は櫛型構造の
従来のPSDの構造の概念図であり、第4b図はその断面図
である。第5図は、櫛型構造の従来のPSDにおいて輝点
像を小さくした時に得られた像位置検出特性(実測値)
の一例を示す。第6a図は相補形状の延長部の機能説明図
であり、第6b図はその電流分布を示す。第7a図は別の相
補形状の延長部の機能説明図であり、第7b図はその電流
分布を示す。 TA、TB……出力端子、R……基幹抵抗 t……導電延長部、C……バイアス層 I……輝点像の照度分布、i……光電流 dx……検出像位置の理想値からのずれ
FIG. 1a is a conceptual diagram of the structure of the PSD of the present invention, and FIG. 1b is a sectional view thereof. FIGS. 2a, 2b, 2c, and 2d show changes in the deviation of the image position detection characteristic from the ideal characteristic when the width of the conductive extension portion of the light sensitive portion is changed. FIGS. 3a, 3b, and 3c show examples of the shape of the conductive extension portion in the light sensing portion of the present invention. FIG. 4a is a conceptual diagram of the structure of a conventional PSD having a comb structure, and FIG. 4b is a sectional view thereof. Figure 5 shows the image position detection characteristics (measured values) obtained when the bright spot image was made small in the conventional PSD with a comb structure.
An example is shown. FIG. 6a is a functional explanatory diagram of the extension part having a complementary shape, and FIG. 6b shows its current distribution. FIG. 7a is a functional explanatory view of another extension portion having a complementary shape, and FIG. 7b shows its current distribution. T A , T B …… Output terminal, R …… Basic resistance t …… Conduction extension, C …… Bias layer I …… Bright spot image illuminance distribution, i …… Photocurrent dx …… Ideal detection image position Deviation from the value

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】半導体基板の一面の光感区域にのびる複数
の巾広の並列導電延長部、 これらの導電延長部から離れて、導電延長部の延長方向
と直交する方向にのびる基幹抵抗、 この基幹抵抗へ上記の並列導電延長部の各々を接続する
巾の狭い接続導電部、 上記の基幹抵抗の両端に接続された出力端子、及び 上記の半導体基板の他面に設けた導体層 を備えたことを特徴とする半導体像位置検出素子。
1. A plurality of wide parallel conductive extensions extending to a light sensitive area on one surface of a semiconductor substrate, a basic resistance extending away from the conductive extensions in a direction orthogonal to an extension direction of the conductive extensions, A narrow connecting conductive portion that connects each of the parallel conductive extensions to the basic resistor, output terminals connected to both ends of the basic resistor, and a conductor layer provided on the other surface of the semiconductor substrate are provided. A semiconductor image position detecting element characterized by the above.
【請求項2】半導体基板の他面の導体層が、 半導体基板の他面の光感区域にのびる複数の巾広の並列
導電延長部、 これらの導電延長部から離れて、導電延長部の延長方向
と直交する方向にのびる基幹抵抗、 この基幹抵抗へ上記の並列導電延長部の各々を接続する
巾の狭い接続導電部、 上記の基幹抵抗の両端に接続された出力端子を備え、半
導体基板の他面の並列導電延長部と基幹抵抗とは半導体
基板の一面の並列導電延長部と基幹抵抗とに対し直交関
係に配置されている請求項1に記載の半導体像位置検出
素子。
2. A conductive layer on the other side of the semiconductor substrate, a plurality of wide parallel conductive extensions extending to a light sensitive area on the other side of the semiconductor substrate, and extending the conductive extension apart from the conductive extensions. A basic resistance extending in a direction orthogonal to the direction, a narrow conductive connecting portion that connects each of the parallel conductive extension portions to the basic resistance, and an output terminal connected to both ends of the basic resistance. 2. The semiconductor image position detecting element according to claim 1, wherein the parallel conductive extension and the basic resistance on the other surface are arranged in an orthogonal relationship with the parallel conductive extension and the basic resistance on the one surface of the semiconductor substrate.
【請求項3】並列導電延長部に延長方向と直交する方向
に移動する像が占める隣り合う導電延長部の一方の面積
が減少すると他方の面積が増大するような相補的な形状
を並列導電延長部が有している請求項1又は2に記載の
半導体像位置検出素子。
3. A parallel conductive extension having a complementary shape such that when the area of one of the adjacent conductive extensions occupied by an image moving in a direction orthogonal to the extension direction of the parallel conductive extension decreases, the area of the other increases. The semiconductor image position detecting element according to claim 1 or 2, which the portion has.
JP27756189A 1989-10-25 1989-10-25 Semiconductor image position detector Expired - Fee Related JPH06105163B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27756189A JPH06105163B2 (en) 1989-10-25 1989-10-25 Semiconductor image position detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27756189A JPH06105163B2 (en) 1989-10-25 1989-10-25 Semiconductor image position detector

Publications (2)

Publication Number Publication Date
JPH03138503A JPH03138503A (en) 1991-06-12
JPH06105163B2 true JPH06105163B2 (en) 1994-12-21

Family

ID=17585235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27756189A Expired - Fee Related JPH06105163B2 (en) 1989-10-25 1989-10-25 Semiconductor image position detector

Country Status (1)

Country Link
JP (1) JPH06105163B2 (en)

Also Published As

Publication number Publication date
JPH03138503A (en) 1991-06-12

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