JPH06102553A - Optical wavelength conversion element and short wavelength laser beam source - Google Patents

Optical wavelength conversion element and short wavelength laser beam source

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Publication number
JPH06102553A
JPH06102553A JP25258992A JP25258992A JPH06102553A JP H06102553 A JPH06102553 A JP H06102553A JP 25258992 A JP25258992 A JP 25258992A JP 25258992 A JP25258992 A JP 25258992A JP H06102553 A JPH06102553 A JP H06102553A
Authority
JP
Japan
Prior art keywords
wavelength conversion
conversion element
optical
output
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25258992A
Other languages
Japanese (ja)
Other versions
JP3006309B2 (en
Inventor
Kiminori Mizuuchi
公典 水内
Kazuhisa Yamamoto
和久 山本
Mutsuo Takenaga
睦生 竹永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Filing date
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Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP25258992A priority Critical patent/JP3006309B2/en
Publication of JPH06102553A publication Critical patent/JPH06102553A/en
Application granted granted Critical
Publication of JP3006309B2 publication Critical patent/JP3006309B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To stably output and modulate the higher harmonic waves emitted from the optical wavelength conversion element constituted by using a nonlinear optical effect. CONSTITUTION:Electrodes 15 are formed on an optical waveguide 2 of the optical wavelength conversion element constituted by forming polarization inversion layers 3 and the optical waveguide 2 on an LiTaO3 substrate 1. The output light of an SHG (second harmonic wave generating element) is stabilized by impressing the electric field by the electrodes 15 to the above-mentioned optical wavelength conversion element. The output of the SHG is modulated to multiple stages by dividing the electrodes and controlling the respective voltages. Then the stable operation is executed by changing the voltage to be impressed to the optical wavelength conversion element even if the environmental temp. changes and the wavelength of a semiconductor laser changes. The phase matching states under the respective electrodes are controlled by dividing the electrodes and, therefore, the high-speed modulation of the output in multiple stages is possible. In addition, the integration of the modulating mechanisms on the optical wavelength conversion element is possible and, therefore, the small-sized light source is constituted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、コヒ−レント光を利用
する光情報処理分野、あるいは光応用計測制御分野に使
用する光波長変換素子および短波長レーザ光源に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical wavelength conversion device and a short wavelength laser light source used in the field of optical information processing utilizing coherent light or in the field of optical measurement control.

【0002】[0002]

【従来の技術】強誘電体の分極を強制的に反転させる分
極反転は、強誘電体に周期的な分極反転層を形成するこ
とにより、表面弾性波を利用した光周波数変調器や、非
線形分極の分極反転を利用した光波長変換素子などに利
用される。特に非線形光学物質の非線形分極を周期的に
反転することが可能になれば、非常に変換効率の高い第
二高調波発生素子(以下SHG素子とする)を作製する
ことができる。これによって半導体レーザなどの光を変
換すると、小型の短波長光源が実現でき、印刷、光情報
処理、光応用計測制御分野などに応用できるため盛んに
研究が行われている。分極反転型のSHG素子は高効率
の波長変換が可能であり、かつ周期構造を変えることに
より、任意の波長変換が行える。しかしながら、周期構
造を基本としているため、波長依存性が高く基本光の波
長変動に対する出力変動が非常に大きかった。
2. Description of the Related Art Polarization reversal for forcibly reversing the polarization of a ferroelectric substance is performed by forming a periodic polarization reversal layer in the ferroelectric substance, and using an optical frequency modulator utilizing surface acoustic waves or a nonlinear polarization. It is used for an optical wavelength conversion element that uses polarization inversion. In particular, if it becomes possible to periodically invert the nonlinear polarization of the nonlinear optical material, it is possible to manufacture a second harmonic generation element (hereinafter referred to as an SHG element) having a very high conversion efficiency. Thus, by converting light from a semiconductor laser or the like, a compact short-wavelength light source can be realized, and it can be applied to the fields of printing, optical information processing, optical application measurement control, and the like, and thus is actively studied. The polarization inversion type SHG element is capable of highly efficient wavelength conversion, and can also perform arbitrary wavelength conversion by changing the periodic structure. However, since it is based on the periodic structure, the wavelength dependence is high and the output fluctuation with respect to the wavelength fluctuation of the fundamental light is very large.

【0003】これを示す例として例えば、光波長変換素
子として擬位相整合(以下、QPMと記す。)方式の分
極反転光導波路を用いた半導体レーザの波長変換の報告
がある。(山本他、オプティクス・レターズ Optics L
etters Vol.16, No.15, 1156(1991))。図12に、半導
体レーザーとQPM光波長変換素子を用いた短波長光源
の概略構成図を示す。半導体レーザー101から放射さ
れた光は、コリメートレンズ102により平行ビームに
変換され、λ/2板103で偏向方向を回転させ、N.A.
=0.6のフォーカシングレンズ104により光導波路の入
射端面5に集光される。そして波長変換されたブルー光
が得られる。半導体レーザーへの戻り光を避けるため入
射端面105には無反射コートを施してあるが、端面1
05から約1%の戻り光が生じる。この結果、半導体レー
ザーの光導波路内への入射光強度35mWに対し1.1mWのブ
ルー光を得た。非線形光学効果を利用しているため、出
力光は入力光強度の2乗に比例した。しかし、QPM光
波長変換素子は波長許容度が0.2nmしかなかった。
As an example showing this, there is a report of wavelength conversion of a semiconductor laser using a quasi-phase matching (hereinafter referred to as QPM) type polarization inversion optical waveguide as an optical wavelength conversion element. (Yamamoto et al., Optics Letters Optics L
etters Vol.16, No.15, 1156 (1991)). FIG. 12 shows a schematic configuration diagram of a short wavelength light source using a semiconductor laser and a QPM light wavelength conversion element. The light emitted from the semiconductor laser 101 is converted into a parallel beam by the collimator lens 102, and the deflection direction is rotated by the λ / 2 plate 103 to change the NA.
The light is focused on the incident end surface 5 of the optical waveguide by the focusing lens 104 of = 0.6. Then, wavelength-converted blue light is obtained. The incident end face 105 is provided with a non-reflective coating in order to avoid returning light to the semiconductor laser.
From 05, about 1% of return light is generated. As a result, 1.1 mW of blue light was obtained for an incident light intensity of 35 mW entering the optical waveguide of the semiconductor laser. Since the nonlinear optical effect is used, the output light is proportional to the square of the input light intensity. However, the wavelength tolerance of the QPM light wavelength conversion element was only 0.2 nm.

【0004】一方、短波長レーザ光源として、光ディス
ク、レーザプリンタ等に応用するには、光源の出力強度
を変調する必要がある。特に、光ディスクへの記録を行
うには数100MHzでの出力強度の変調が必要不可欠
である。従来、短波長レーザ光源の出力強度の変調は、
基本波の半導体レーザの出力の変調によりSHG出力変
調を行っていた。
On the other hand, in order to apply the short wavelength laser light source to an optical disk, a laser printer, etc., it is necessary to modulate the output intensity of the light source. In particular, modulation of output intensity at several 100 MHz is indispensable for recording on an optical disc. Conventionally, the modulation of the output intensity of a short wavelength laser light source is
The SHG output modulation is performed by modulating the output of the semiconductor laser of the fundamental wave.

【0005】また、その他の光の強度を変調する方法と
しては、表面弾性波を利用したAO変調器がある。これを
用いて、光波長変換素子から出力された光の強度を変調
することができる。
Another method for modulating the intensity of light is an AO modulator using surface acoustic waves. This can be used to modulate the intensity of the light output from the light wavelength conversion element.

【0006】[0006]

【発明が解決しようとする課題】従来の光波長変換素子
においては、素子内に出力光強度を変調する機構がなか
ったため、出力光強度の変調は基本波の半導体レーザの
強度変調で行っていた。基本波の半導体レーザの出力を
変調するには、半導体レーザの駆動電流を変調すること
により行っていたが、出力を変調すると、出力波長の変
動が同時に発生し、出力波長が1nm以上大きく変動し
ていた。
In the conventional light wavelength conversion element, since there is no mechanism for modulating the output light intensity in the element, the output light intensity is modulated by the fundamental wave semiconductor laser intensity modulation. . The output of the semiconductor laser of the fundamental wave was modulated by modulating the driving current of the semiconductor laser. However, when the output is modulated, the output wavelength fluctuates at the same time, and the output wavelength fluctuates significantly by 1 nm or more. Was there.

【0007】ところが、SHGの変換効率は基本波の波
長依存性が大きく、基本波の波長が数オングストローム
変化すると、変換効率が50%以上変化していた。その
ため、波長変動にともなう、SHG光の出力変動が発生
し、安定した強度変調が難いという問題があった。
However, the conversion efficiency of SHG has a large wavelength dependence of the fundamental wave, and when the wavelength of the fundamental wave changes by several angstroms, the conversion efficiency changes by 50% or more. Therefore, there is a problem in that the output of the SHG light fluctuates with the fluctuation of the wavelength, and stable intensity modulation is difficult.

【0008】また、SHG出力は入力光強度の2乗に比
例するため、出力光強度を数段階に直線的に変調するた
めには、入力光強度を複雑に調整する必要があるという
問題があった。
Further, since the SHG output is proportional to the square of the input light intensity, there is a problem that the input light intensity needs to be adjusted in a complicated manner in order to linearly modulate the output light intensity in several steps. It was

【0009】またAO変調器を用いて光波長変換素子から
の出力変調を行おうとすると、AO変調器を介して出力を
出すため、出力が減少する。コストが高くなる。モジュ
ールが複雑になり、光源の小型化が困難になるなどの問
題があった。
Further, if an output modulation from the optical wavelength conversion element is attempted by using the AO modulator, the output is output via the AO modulator, so that the output decreases. High cost. However, the module becomes complicated and it is difficult to reduce the size of the light source.

【0010】そこで本発明は、高調波を安定に変調する
光波長変換素子および短波長レーザ光源を提供すること
を目的とする。
Therefore, an object of the present invention is to provide an optical wavelength conversion element and a short wavelength laser light source for stably modulating a harmonic wave.

【0011】[0011]

【課題を解決するための手段】本発明は、上記問題点を
解決するため分極反転構造を基本とした光波長変換素子
に新たな工夫を加えることにより出力の強度を安定に保
ったまま、多段階に変調可能な光波長変換素子を提供す
るものである。
In order to solve the above-mentioned problems, the present invention adds a new device to an optical wavelength conversion element based on a domain-inverted structure so as to maintain a stable output intensity and The present invention provides an optical wavelength conversion element that can be modulated in stages.

【0012】つまり、本発明は光導波路と分極反転層と
入射部と出射部とを有する非線形物質からなる基板と前
記基板上に形成したn個(n≧2)の電極とを有し、な
おかつ前記電極が前記光導波路の伝搬方向に並んでいる
光波長変換素子である。
That is, the present invention has a substrate made of a non-linear material having an optical waveguide, a domain inversion layer, an incident portion and an emitting portion, and n (n ≧ 2) electrodes formed on the substrate, and In the optical wavelength conversion element, the electrodes are arranged in the propagation direction of the optical waveguide.

【0013】また光導波路と分極反転層と入射部と出射
部とを有する非線形物質からなる基板と前記基板上に形
成したn個(n≧2)の薄膜ヒータとを有し、なおかつ
前記薄膜ヒータが前記光導波路の伝搬方向に並んでいる
光波長変換素子である。
Further, the thin film heater has a substrate made of a non-linear material having an optical waveguide, a polarization inversion layer, an incident part and an emission part, and n (n ≧ 2) thin film heaters formed on the substrate. Are optical wavelength conversion elements arranged in the propagation direction of the optical waveguide.

【0014】[0014]

【作用】本発明の光波長変換素子は導波路の伝搬方向に
形成した電極により分極反転層における位相整合条件を
制御することによりSHG出力を制御し、半導体レーザ
の波長が変化しても位相整合状態を変化させることで常
に最高の高調波出力が得られるため、非常に安定な出力
が得られる。また、複数の電極により、それぞれの電極
下における位相整合状態を制御できるため、SHG出力
強度を多段階変調することができ、出力強度変調可能な
光波長変換素子を構成できる。なおかつ、出力変調部を
光波長変換素子上に集積化できるため小型の素子を構成
できる。
In the optical wavelength conversion device of the present invention, the SHG output is controlled by controlling the phase matching condition in the polarization inversion layer by the electrodes formed in the propagation direction of the waveguide, and the phase matching is performed even if the wavelength of the semiconductor laser changes. Since the highest harmonic output is always obtained by changing the state, a very stable output can be obtained. Moreover, since the phase matching state under each electrode can be controlled by the plurality of electrodes, the SHG output intensity can be modulated in multiple stages, and an optical wavelength conversion element capable of output intensity modulation can be configured. Moreover, since the output modulator can be integrated on the optical wavelength conversion element, a small element can be constructed.

【0015】[0015]

【実施例】実施例の一つとして本発明の光波長変換素子
の構成を図を用いて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As one of the embodiments, the structure of the optical wavelength conversion device of the present invention will be described with reference to the drawings.

【0016】(実施例1)まず、本発明による光波長変
換素子の第1の実施例の構造図を図1に示す。この実施
例では分極反転型の光波長変換素子としてLiTaO3基板1
中にプロトン交換を用いて作製した光導波路2を用いた
ものである。図1で1は−C板(C軸と垂直に切り出さ
れた基板の−側)のLiTaO3基板、2は形成された光導波
路、3は分極反転層、10は基本波P1の入射部、12
は高調波P2の出射部、15は光導波路上に形成された
櫛形電極である。
(Embodiment 1) First, FIG. 1 shows a structural diagram of a first embodiment of an optical wavelength conversion device according to the present invention. In this embodiment, as a polarization inversion type optical wavelength conversion element, a LiTaO 3 substrate 1 is used.
The optical waveguide 2 manufactured by using proton exchange is used therein. In FIG. 1, 1 is a -C plate (-side of a substrate cut out perpendicular to the C axis), a LiTaO 3 substrate, 2 is an optical waveguide formed, 3 is a polarization inversion layer, 10 is an incident portion of a fundamental wave P1, 12
Is an emission part of the harmonic P2, and 15 is a comb-shaped electrode formed on the optical waveguide.

【0017】光波長変換素子製造方法の工程を図2を用
いて説明する。 (a)−C板のLiTaO3基板1上にスパッタリング法によ
りTa膜13を30nm形成する。(b)Ta膜13上にフォト
レジストを塗布した後、通常のフォトリソグラフィ法に
より周期Λごとに幅Wのストライプを10mmに渡って
基板のY伝搬方向に形成した後、CF4雰囲気中でドラ
イエッチングでTaマスク13にレジストのパターンを
転写する。(c)260℃のピロ燐酸中で20分間熱処
理しプロトン交換層を形成する。(d)LiTaO3基板を高
速昇温の加熱炉で加熱する。(e)この基板を410℃
で4時間アニール処理して、プロトン交換層を拡散さ
せ、分極反転層と非反転層間の屈折率差を減少させる。
(f)LiTaO3基板1上にスパッタリング法によりTa膜を
形成する。このTa膜上にレジストを塗布した後、フォト
リソグラフィ法により幅4μmの光導波路ストライプを
基板のX伝搬方向に形成する、つぎにCF4雰囲気中で
ドライエッチングを行いTaマスク13を形成する。
(g)この基板を230℃のピロ燐酸で20分間熱処理
し、非マスク部分のLiTaO3をプロトン交換処理し、プロ
トン交換光導波路6を形成する。(h)Taマスクを除去
した後、光導波路2に垂直な面を光学研磨し入射部10
および出射部12を形成した。作製した素子の分極反転
層周期は3.6μm、反転層幅1.8μm、深さ1.8
μm、光導波路は幅4μm、深さ1.9μmであった。
作製した光波長変換素子上に同様のフォトリソグラフィ
プロセスによりアルミの櫛形電極を形成した。上記の工
程により櫛形電極付きの光波長変換素子が作製できた。
The steps of the method for manufacturing the light wavelength conversion element will be described with reference to FIG. (A) A Ta film 13 having a thickness of 30 nm is formed on the LiTaO 3 substrate 1 of the -C plate by a sputtering method. (B) After applying a photoresist on the Ta film 13, a stripe having a width W is formed for 10 mm in every cycle Λ in the Y propagation direction of the substrate by a normal photolithography method, and then dried in a CF 4 atmosphere. The resist pattern is transferred to the Ta mask 13 by etching. (C) Heat treatment in pyrophosphoric acid at 260 ° C. for 20 minutes to form a proton exchange layer. (D) The LiTaO 3 substrate is heated in a heating furnace with a high temperature rise. (E) 410 ° C. of this substrate
Is annealed for 4 hours to diffuse the proton exchange layer and reduce the refractive index difference between the polarization inversion layer and the non-inversion layer.
(F) A Ta film is formed on the LiTaO 3 substrate 1 by the sputtering method. After coating a resist on the Ta film, an optical waveguide stripe having a width of 4 μm is formed in the X propagation direction of the substrate by a photolithography method, and then dry etching is performed in a CF 4 atmosphere to form a Ta mask 13.
(G) This substrate is heat-treated with pyrophosphoric acid at 230 ° C. for 20 minutes, and the unmasked portion of LiTaO 3 is subjected to proton exchange treatment to form the proton exchange optical waveguide 6. (H) After removing the Ta mask, the surface perpendicular to the optical waveguide 2 is optically polished to make the incident portion 10
And the emission part 12 was formed. The polarization inversion layer period of the manufactured element was 3.6 μm, the inversion layer width was 1.8 μm, and the depth was 1.8.
The optical waveguide had a width of 4 μm and a depth of 1.9 μm.
An aluminum comb-shaped electrode was formed on the manufactured light wavelength conversion element by the same photolithography process. An optical wavelength conversion device with a comb-shaped electrode could be manufactured by the above steps.

【0018】次に、作製した光波長変換素子の動作原理
について説明する。光導波路2に入った基本波P1は周
期Λの分極反転層によって位相整合長Λ/2の長さを持
った分極反転層で高調波P2に変換され、次の同じくΛ
/2の長さを持った非分極反転層で高調波パワーは増す
ことになる。このようにして光導波路2内でパワーを増
した高調波P2は出射部12より放射される。
Next, the operation principle of the manufactured light wavelength conversion element will be described. The fundamental wave P1 entering the optical waveguide 2 is converted into a harmonic wave P2 by a polarization inversion layer having a phase matching length Λ / 2 by a polarization inversion layer having a period Λ, and the following
The harmonic power is increased by the non-polarization inversion layer having the length of / 2. The higher harmonic wave P2 thus increased in power in the optical waveguide 2 is emitted from the emitting portion 12.

【0019】今、波長0.86μmの基本波P1に対し
て分極反転層の周期Λは約3.6μmとなり、波長変換
された波長0.43μmの光P2が得られる。図3はこ
のとき光導波路の距離とSHG出力の関係を示してい
る。光導波路を伝搬するに従い、分極反転層により基本
波から高調波に波長変換され、高調波の強度P2は距離
の2乗に比例して増加していく。また出力P2は、入射
光強度P1の二乗に比例する。
Now, the period .LAMBDA. Of the polarization inversion layer is about 3.6 .mu.m for the fundamental wave P1 having a wavelength of 0.86 .mu.m, and the wavelength-converted light P2 having a wavelength of 0.43 .mu.m can be obtained. FIG. 3 shows the relationship between the distance of the optical waveguide and the SHG output at this time. As the wave propagates through the optical waveguide, the fundamental wave is converted into a harmonic by the polarization inversion layer, and the intensity P2 of the harmonic increases in proportion to the square of the distance. The output P2 is proportional to the square of the incident light intensity P1.

【0020】次に、電極による出力光強度の制御につい
て説明する。光波長変換素子の断面図を用いて、櫛形電
極による光波長変換素子の位相整合状態の変調方法につ
いて説明する。図4(a)において1は−C板(C軸と
垂直に切り出された基板の−側)のLiTaO3基板、2は形
成された光導波路、3は分極反転層、10は基本波P1
の入射部、12は高調波P2の出射部、15は光導波路
上に形成された櫛形電極である。分極反転層の周期はΛ
である。分極反転層の周期に合わせて櫛形電極を形成す
ると、LiTaO3結晶中の電界は図4(b)に示す様に発生
する。LiTaO3はC軸方向に大きなる電気光学定数をもっ
ており、C軸方向に電圧を印可すると、電気光学効果に
よって屈折率が変化する(図4(b))。分極反転型の
光波長変換素子において、波長変換が効率よく行われる
には位相整合条件を成立させる必要がある。この条件は
Λ=λ/2(N2ω−Nω)であり、Λは分極反転層の
周期、λは基本波の波長、N2ωは光導波路内での高調
波の実効屈折率、Nωは光導波路内での基本波の実効屈
折率である。櫛形電極により電界を印可すると、分極反
転層、非分極反転層の両方で、分極方向と電界方向の関
係が等しくなるため、どちらの部分でも同じ方向に屈折
率が変化する。例えば、分極反転層で屈折率がΔn増加
すれば、非反転層でもΔn増加する。そのため、全体の
屈折率がΔn増加する。光導波路内の屈折率を変化させ
れば、N2ω−Nωの値が変化するため、位相整合条件
を制御することができ、電界により光波長変換素子の変
換効率を変調する事ができる。図4(c)は櫛形電極の
変わりに平面電極を用いた場合を示す。電界は同方向に
印可されている。この場合、分極反転層では屈折率変化
がΔnならば、分極方向が異なる非反転層での屈折率変
化は−Δnとなり、図4(d)に示すように、全体の屈
折率変化の平均は0となってしまい、電界による屈折率
の制御ができず、位相整合状態の制御も不可能となる。
Next, the control of the output light intensity by the electrodes will be described. A method of modulating the phase matching state of the light wavelength conversion element by the comb-shaped electrodes will be described with reference to the cross-sectional view of the light wavelength conversion element. In FIG. 4A, 1 is a LiTaO 3 substrate of a −C plate (the − side of the substrate cut out perpendicular to the C axis), 2 is an optical waveguide formed, 3 is a polarization inversion layer, and 10 is a fundamental wave P1.
Is an incident part, 12 is an output part of the harmonic P2, and 15 is a comb-shaped electrode formed on the optical waveguide. The period of the domain inversion layer is Λ
Is. When the comb-shaped electrodes are formed according to the period of the domain inversion layer, the electric field in the LiTaO 3 crystal is generated as shown in FIG. 4 (b). LiTaO 3 has a large electro-optical constant in the C-axis direction, and when a voltage is applied in the C-axis direction, the refractive index changes due to the electro-optical effect (FIG. 4 (b)). In the polarization inversion type optical wavelength conversion element, it is necessary to satisfy the phase matching condition for efficient wavelength conversion. This condition is Λ = λ / 2 (N2ω-Nω), Λ is the period of the polarization inversion layer, λ is the wavelength of the fundamental wave, N2ω is the effective refractive index of the harmonic in the optical waveguide, and Nω is the optical waveguide. Is the effective refractive index of the fundamental wave at. When an electric field is applied by the comb-shaped electrodes, the polarization direction and the electric field direction have the same relationship in both the polarization inversion layer and the non-polarization inversion layer, so that the refractive index changes in the same direction in both parts. For example, if the refractive index increases by Δn in the polarization inversion layer, Δn also increases in the non-inversion layer. Therefore, the total refractive index increases by Δn. When the refractive index in the optical waveguide is changed, the value of N2ω-Nω is changed, so that the phase matching condition can be controlled and the conversion efficiency of the optical wavelength conversion element can be modulated by the electric field. FIG. 4C shows a case where a flat electrode is used instead of the comb-shaped electrode. The electric field is applied in the same direction. In this case, if the refractive index change in the polarization inversion layer is Δn, the refractive index change in the non-inversion layer having different polarization directions is −Δn, and as shown in FIG. It becomes 0, the refractive index cannot be controlled by the electric field, and the phase matching state cannot be controlled.

【0021】電気光学効果とは電界を印可することによ
り、屈折率が変化する現象で、電界の方向と大きさに依
存した屈折率変化を起こす。LiTaO3電気光学効果の大き
な材料で、特にC軸方向のr33という大きな電気光学定
数を持っている。これは、C軸方向の電界によりC軸方
向の屈折率が変化するもので、電界の方向により屈折率
変化Δnも±の値をとる。例えば、+C方向に電界が印
可された場合、分極の反転している部分では屈折率変化
−Δnは、他の部分のでは屈折率変化は+Δnの値を示
す。そこで櫛形電極を用いて、分極反転層部分と、非反
転層部分で逆方向の電界を印可しすると全体の屈折率が
Δn変化させることができる。
The electro-optic effect is a phenomenon in which the refractive index changes when an electric field is applied, and the refractive index changes depending on the direction and magnitude of the electric field. LiTaO 3 A material having a large electro-optical effect, and particularly has a large electro-optical constant of r 33 in the C-axis direction. This is because the refractive index in the C-axis direction changes due to the electric field in the C-axis direction, and the refractive index change Δn also takes a value of ± depending on the direction of the electric field. For example, when an electric field is applied in the + C direction, the refractive index change −Δn indicates the value where the polarization is inverted, and the refractive index change + Δn indicates the value in the other portions. Therefore, when the electric field in the opposite direction is applied between the polarization inversion layer portion and the non-inversion layer portion by using the comb-shaped electrode, the entire refractive index can be changed by Δn.

【0022】櫛形電極に印可する電圧とSHG出力の関
係を示したのが図5であり、印可電圧によりSHG出力
が変化することがわかる。環境の変化や、基本波の波長
変動が発生しても、SHG出力が常に最大になるように
印可電圧を調整すれば、安定な光波長変換素子が構成で
きる。
FIG. 5 shows the relationship between the voltage applied to the comb electrodes and the SHG output. It can be seen that the SHG output changes depending on the applied voltage. A stable optical wavelength conversion element can be constructed by adjusting the applied voltage so that the SHG output is always maximized even when the environment changes or the wavelength of the fundamental wave changes.

【0023】次に、この素子による出力光強度の変調を
行った。櫛形電極を分割すれば、それぞれの部分で位相
整合状態を独立に制御できる。図3に示したように、光
導波路の伝搬距離とSHG出力は二乗特性となる。そこ
で、出力を直線的に変化させるために、電極の長さを、
L0、L0(21/2−11/2)、L0(31/2−21/2)とし
た。図6から分かるように、長さL0の部分の位相整合
条件が成立し、他の部分の位相整合がとれていないとき
の出力をP0とすると、L0、L0(21/2−11/2)の位
相整合条件が成立し、他の部分が整合がとれていないと
きの出力は2P0に、L0、L0(21/2−11/2)、L0
(31/2−21/2)の位相整合条件が成立したときの出力
3P0のなり、3段階に直線的にSHG出力を変調する
ことができる。
Next, the output light intensity was modulated by this element. If the comb-shaped electrodes are divided, the phase matching state can be controlled independently in each part. As shown in FIG. 3, the propagation distance of the optical waveguide and the SHG output have a squared characteristic. Therefore, in order to change the output linearly, the length of the electrode is
L0, L0 (2 1/2 -1 1/2 ) and L0 (3 1/2 -2 1/2 ) were used. As can be seen from FIG. 6, when the output is P0 when the phase matching condition of the portion of length L0 is satisfied and the phase matching of the other portion is not established, L0, L0 (2 1/2 −1 1 / When the phase matching condition of 2 ) is satisfied and the other parts are not matched, the output is 2P0, L0, L0 (2 1/2 -1 1/2 ), L0
The output 3P0 is obtained when the phase matching condition of (3 1/2 -2 1/2 ) is satisfied, and the SHG output can be linearly modulated in three stages.

【0024】実際作製した素子は、素子長20mmで波
長に対する許容度は0.8nmであった。半導体レーザ
の波長変動を光波長変換素子上に作製した櫛形電極の電
圧を変化させて補正し高調波が安定に出力されるように
する。半導体レーザの波長変化に対する光波長変換素子
の最適電圧との関係を図7に示す。波長が0.3nmず
れても電圧を10V変化させるとまた、高調波出力は最
大になる。高調波出力の安定度は従来の光波長変換素子
に比べ大幅に改善され実用性が増した。半導体レーザは
20℃程度変化しても高調波出力は安定に得られた。素
子に作製した電極は、入射部から、出射部に向かって長
さL1=11.5mm、L2=4.8mm、L3=3.7
mmの櫛形電極を形成した。それぞれ電極1、電極2、
電極3とする。半導体レーザにより光導波路に40mW
の基本波を入力した。電極に電圧10Vを印可したとき
電極において位相整合条件が成立した。そこで、それぞ
れの電極に印可する電圧とSHG出力の関係を測定した。
The element actually manufactured had an element length of 20 mm and a wavelength tolerance of 0.8 nm. The wavelength variation of the semiconductor laser is corrected by changing the voltage of the comb-shaped electrode formed on the optical wavelength conversion element so that the harmonic wave is stably output. FIG. 7 shows the relationship between the wavelength change of the semiconductor laser and the optimum voltage of the light wavelength conversion element. Even if the wavelength is deviated by 0.3 nm, the harmonic output becomes maximum when the voltage is changed by 10V. The stability of the harmonic output is greatly improved compared to the conventional optical wavelength conversion element, and its practicality is increased. The semiconductor laser obtained a stable harmonic output even when it was changed by about 20 ° C. The electrodes formed on the device have lengths L1 = 11.5 mm, L2 = 4.8 mm, and L3 = 3.7 from the entrance to the exit.
mm comb electrodes were formed. Electrode 1, electrode 2,
The electrode 3 is used. 40mW for optical waveguide by semiconductor laser
I input the fundamental wave of. When a voltage of 10 V was applied to the electrodes, the phase matching condition was satisfied at the electrodes. Therefore, the relationship between the voltage applied to each electrode and the SHG output was measured.

【0025】[0025]

【表1】 [Table 1]

【0026】以上のように、分極反転層に素子の位相整
合状態を制御する電極を形成し、かつこれを分割するこ
とにより、安定なSHG出力が得られ、またその出力を
他段階に強度変調することができた。さらに、作製した
素子の、高速変調実験を行った。印可電圧±5V、変調
周波数200MHzで変調したところ、S/N=30d
B以上と良好な変調特性が得られた。
As described above, by forming the electrodes for controlling the phase matching state of the device in the polarization inversion layer and dividing the electrodes, a stable SHG output can be obtained and the output is intensity-modulated to another stage. We were able to. Furthermore, a high-speed modulation experiment was conducted on the manufactured device. When applied voltage ± 5V and modulation frequency 200MHz, S / N = 30d
A good modulation characteristic of B or more was obtained.

【0027】作製した素子は導波ロスが0.2dB/c
mと非常に小さいため、電極の長さは導波ロスを考慮せ
ずに作製できた。しかし、導波ロスの大きな素子の場
合、素子の電極の長さに導波ロスによる損失を考慮する
必要がある。例えば、導波ロスがadB/cmあると
き、電極の長さは、L1=L0×10E(-10aL0)、L2
=L0(21/2−11/2)×10E(-10aL0√2)、L3=
L0(31/2−21/2)×10E(-10aL0√3)となり、導
波ロスより計算した値に電極長を補正する必要がある。
The produced device has a waveguide loss of 0.2 dB / c.
Since the length is very small as m, the electrode length could be produced without considering the waveguide loss. However, in the case of an element with a large waveguide loss, it is necessary to consider the loss due to the waveguide loss in the length of the electrode of the element. For example, when the waveguide loss is adB / cm, the electrode length is L1 = L0 × 10E (-10aL0), L2
= L0 (2 1/2 -1 1/2 ) × 10E (-10aL0√2), L3 =
It becomes L0 (3 1/2 -2 1/2 ) x 10E (-10aL0√3), and it is necessary to correct the electrode length to the value calculated from the waveguide loss.

【0028】次に本発明の実施例の他の光波長変換素子
の動作原理について説明する。光波長変換素子の位相整
合状態を制御する方法は櫛形電極以外の電極構造によっ
ても実現する。ここでは、図8を用いて構造が簡単で作
製が容易な平面電極を用いた場合について説明する。図
8(a)において、1は−C板(C軸と垂直に切り出さ
れた基板の−側)のLiTaO3基板、2は形成された光導波
路、3は分極反転層、16は平面電極である。分極反転
層に電界を印可すると、電気光学効果により屈折率が変
化する。周期的に分極方向が反転している部分に電極1
6を作製し、電圧を印可するとz方向の電界が印可され
る。電界により分極反転層と非反転層間に屈折率の差が
生じ、グレーティングとなる。グレーティングの周期を
Λとする。電圧の印可による屈折率変化をΔn、反転層
の幅をW、周期Λとすると、電極下の平均屈折率変化Δ
N=(ΔnW−Δn(Λ−W))/Λとなり、W≠0.
5Λのとき印可する電界により変化する屈折率Δnによ
りΔNを変化させることができる。その結果、作製が容
易な平面電極により、先の実施例と同様に光導波路を伝
搬する基本波と高調波の位相整合条件を制御できる。
Next, the operation principle of another optical wavelength conversion device according to the embodiment of the present invention will be described. The method of controlling the phase matching state of the light wavelength conversion element can be realized by an electrode structure other than the comb electrode. Here, a case where a planar electrode having a simple structure and easy to manufacture is used will be described with reference to FIG. In FIG. 8 (a), 1 is -C plate (C axis of the substrate cut out in vertical - side) LiTaO 3 substrate, an optical waveguide formed in 2, 3 the polarization inversion layer, 16 is a flat electrode is there. When an electric field is applied to the polarization inversion layer, the refractive index changes due to the electro-optic effect. Electrode 1 is placed on the part where the polarization direction is periodically reversed.
When 6 is produced and a voltage is applied, an electric field in the z direction is applied. The electric field causes a difference in refractive index between the polarization inversion layer and the non-inversion layer to form a grating. Let the grating period be Λ. Letting Δn be the change in the refractive index due to application of a voltage, W the width of the inversion layer, and Λ the period, the average change in the refractive index under the electrode Δ
N = (ΔnW−Δn (Λ−W)) / Λ, and W ≠ 0.
When 5Λ, ΔN can be changed by the refractive index Δn that changes depending on the applied electric field. As a result, it is possible to control the phase matching condition of the fundamental wave and the higher harmonic wave propagating through the optical waveguide by using the planar electrode which can be easily manufactured as in the previous embodiment.

【0029】次に、グレーティングを用いた、半導体レ
ーザの波長安定化と、光波長変換素子の出力変調とを組
み合わせた実施例について説明する。本実施例の図9に
示すようにLiTaO3基板1に光導波路2が形成され、さら
に光導波路2には周期的に分極の反転した層3(分極反
転層)が形成されている。基本波と発生する高調波の伝
搬定数の不整合を分極反転層3の周期構造で補償するこ
とにより高効率に高調波を出すことができる。光導波路
2の入射面に基本波P1を入射すると、光導波路2から
高調波P2が効率良く発生され、光波長変換素子として
動作する。出射部近傍に作製したブラッグ反射グレーテ
ィング18(Disitributed Bragg Reflector以下DBR
グレーティングとする)により、素子に基本光を入射す
る半導体レーザの波長を固定していた。半導体レーザの
波長が固定されると、光波長変換素子の出力は環境の変
化に依存せず非常に安定に動作する。
Next, an embodiment in which wavelength stabilization of a semiconductor laser and output modulation of an optical wavelength conversion element are combined using a grating will be described. As shown in FIG. 9 of this embodiment, an optical waveguide 2 is formed on a LiTaO 3 substrate 1, and a layer 3 (polarization inversion layer) in which the polarization is periodically inverted is further formed on the optical waveguide 2. By compensating the mismatch between the propagation constants of the fundamental wave and the generated harmonic by the periodic structure of the polarization inversion layer 3, the harmonic can be generated with high efficiency. When the fundamental wave P1 is incident on the incident surface of the optical waveguide 2, the harmonic P2 is efficiently generated from the optical waveguide 2 and operates as an optical wavelength conversion element. Bragg reflection grating 18 (Distributed Bragg Reflector or less DBR manufactured near the emission part
By using a grating), the wavelength of the semiconductor laser which makes the basic light incident on the device is fixed. When the wavelength of the semiconductor laser is fixed, the output of the optical wavelength conversion element operates very stably without depending on changes in the environment.

【0030】DBRは波長選択性を有する反射器で特定
波長のみ反射する。DBRグレーティングにより半導体
レーザに特定の波長を帰還すると、半導体レーザの波長
がDBRの反射波長に固定される。QPMによる位相整
合波長とDBRの反射波長を一致させれば、半導体レー
ザを用いて、安定な波長変換が行える。従来の実施例で
は、光導波路内に分極反転層を形成し、これをDBRグ
レーティングとしても用いていた。そのため半導体レー
ザから出射された光はファイバーを通って光導波路に結
合するが、DBRグレーティングによって一部反射され
半導体レーザの発振波長を固定することができる。
The DBR is a reflector having wavelength selectivity and reflects only a specific wavelength. When a specific wavelength is fed back to the semiconductor laser by the DBR grating, the wavelength of the semiconductor laser is fixed to the reflection wavelength of the DBR. If the phase matching wavelength by QPM and the reflection wavelength of DBR are matched, stable wavelength conversion can be performed using a semiconductor laser. In the conventional example, the polarization inversion layer was formed in the optical waveguide, and this was also used as the DBR grating. Therefore, the light emitted from the semiconductor laser is coupled to the optical waveguide through the fiber, but it is partially reflected by the DBR grating and the oscillation wavelength of the semiconductor laser can be fixed.

【0031】なお、本実施例では分極反転層の作製方向
をY伝搬方向としたがX伝搬方向でも同様な素子が作製
できる。
In the present embodiment, the polarization inversion layer is produced in the Y propagation direction, but the same element can be produced in the X propagation direction.

【0032】なお、本実施例では、基板に−c板を用い
たが、他にx板、y板でも電極による電界の方向をc方
向に印可するようにすれば、同様な素子が作製できる。
In this embodiment, the -c plate is used as the substrate, but the same device can be manufactured also by applying the electric field direction by the electrodes to the c direction also with the x plate and the y plate. .

【0033】なお、本実施例では基板にLiTaO3基板を用
いたが他にMgO、Nb、NdなどをドープしたLiTaO3基板で
も同様な素子が作製できる。
In this embodiment, a LiTaO 3 substrate was used as the substrate, but a LiTaO 3 substrate doped with MgO, Nb, Nd or the like can be used to produce a similar device.

【0034】なお、本実施例では、イオン交換にピロ燐
酸を用いたが、他にオルト燐酸、安息香酸、硫酸、など
も用いることができる。
In this embodiment, pyrophosphoric acid was used for ion exchange, but orthophosphoric acid, benzoic acid, sulfuric acid, etc. can also be used.

【0035】なお、本実施例では耐イオン化のマスクと
して、Ta膜を用いたが、他にTa2O 5、Pt、Auなど耐酸
性を有する膜なら用いることができる。
In this embodiment, an ionization-resistant mask is used.
Then, the Ta film was used, but2O FiveAcid resistance such as Pt, Au, etc.
Any film having a property can be used.

【0036】なお、本実施例では光導波路としてプロト
ン交換導波路を用いたが、他にTi拡散導波路、Nb拡
散導波路、イオン注入導波路など他の光導波路も用いる
ことができる。
Although the proton exchange waveguide is used as the optical waveguide in the present embodiment, other optical waveguides such as Ti diffusion waveguide, Nb diffusion waveguide and ion implantation waveguide can also be used.

【0037】(実施例2)ここでは温度による位相整合
条件の制御について説明する。
(Embodiment 2) Here, the control of the phase matching condition by temperature will be described.

【0038】実施例1で説明した櫛形電極による光波長
変換素子の出力光強度の変調の代わりに、薄膜ヒータに
よる、制御を行った。
Instead of the modulation of the output light intensity of the light wavelength conversion element by the comb-shaped electrode described in the first embodiment, the control is performed by the thin film heater.

【0039】まず、光波長変換素子上に薄膜ヒータを形
成する方法を説明する。光波長変換素子は実施例1と同
様である。作製した光波長変換素子に、蒸着によりSiO2
を300nm付加した後、Ni-Cr層を厚み200nm形
成した。このNi-Cr層が薄膜ヒーター15となる。
First, a method of forming a thin film heater on the light wavelength conversion element will be described. The light wavelength conversion element is similar to that of the first embodiment. The fabricated optical wavelength conversion element was vapor-deposited with SiO 2
After adding 300 nm, a Ni-Cr layer having a thickness of 200 nm was formed. This Ni—Cr layer becomes the thin film heater 15.

【0040】上記のような工程により薄膜ヒーター15
付き光導波路が製造され、図10に示される光波長変換
素子が製造できる。この素子の長さは20mmである。
図10で基本波P1として半導体レーザ光(波長0.8
6μm)を入射部10より導波させたところシングルモ
ード伝搬し、波長0.43μmの高調波P2が出射部1
2より基板外部に取り出された。光導波路2の伝搬損失
0.2dB/cmと小さく高調波P2が有効に取り出され
た。低損失化の原因の1つとして燐酸により均一な光導
波路が形成されたことがある。薄膜ヒーター17により
加熱を行い光波長変換素子の温度30℃に制御した。基
本波40mWの入力で3mWの高調波(波長0.43μ
m)を得た。この場合の変換効率は7.5%である。光
波長変換素子の波長に対する許容度は0.8nmであ
る。この半導体レーザの波長変動を光波長変換素子の温
度を変化させて補正し高調波が安定に出力されるように
する。半導体レーザの波長変化に対する光波長変換素子
の最適温度との関係を図9に示す。波長が0.8nmず
れても温度を2℃変化させるとまた、高調波出力は最大
になる。高調波出力の安定度は従来の光波長変換素子に
比べ大幅に改善され実用性が増した。半導体レーザは2
0℃程度変化しても高調波出力は安定に得られた。薄膜
ヒーターは消費電力が少なく、しかもμs程度の速さで
応答が可能なので波長変動に対して追随させるには効果
的である。
The thin film heater 15 is manufactured by the above-mentioned steps.
The attached optical waveguide is manufactured, and the optical wavelength conversion element shown in FIG. 10 can be manufactured. The length of this element is 20 mm.
In FIG. 10, the semiconductor laser light (wavelength 0.8
6 μm) is guided from the incident part 10 and propagates in a single mode, and a harmonic wave P2 having a wavelength of 0.43 μm is emitted from the emitting part 1.
2 was taken out of the substrate. The propagation loss of the optical waveguide 2 was as small as 0.2 dB / cm, and the harmonic P2 was effectively extracted. One of the causes of low loss is that phosphoric acid forms a uniform optical waveguide. The thin film heater 17 was used for heating to control the temperature of the light wavelength conversion element to 30 ° C. Harmonics of 3mW (wavelength 0.43μ with input of 40mW of fundamental wave)
m) was obtained. The conversion efficiency in this case is 7.5%. The tolerance for the wavelength of the light wavelength conversion element is 0.8 nm. The wavelength variation of the semiconductor laser is corrected by changing the temperature of the light wavelength conversion element so that the harmonic wave is stably output. FIG. 9 shows the relationship between the wavelength change of the semiconductor laser and the optimum temperature of the light wavelength conversion element. Even if the wavelength is shifted by 0.8 nm, the harmonic output becomes maximum when the temperature is changed by 2 ° C. The stability of the harmonic output is greatly improved compared to the conventional optical wavelength conversion element, and its practicality is increased. 2 semiconductor lasers
Harmonic output was stably obtained even when the temperature changed by about 0 ° C. Since the thin film heater consumes less power and can respond at a speed of about μs, it is effective in tracking wavelength fluctuations.

【0041】次に、実施例1と同様に、薄膜ヒータ分割
し、各ヒータにおける位相整合条件を制御した。その結
果、実施例1と同様に、出力を3段階に強度変調するこ
とができた。
Next, in the same manner as in Example 1, the thin film heater was divided, and the phase matching condition in each heater was controlled. As a result, similarly to Example 1, the output could be intensity-modulated in three stages.

【0042】なお基本波に対してマルチモード伝搬では
高調波の出力が不安定で実用的ではなくシングルモード
が有効である。
In the multimode propagation with respect to the fundamental wave, the output of the harmonic wave is unstable, which is not practical and the single mode is effective.

【0043】次に本発明の短波長レーザ光源の第2の実
施例を説明する。図11の短波長レーザ光源の構成図を
示す。短波長レーザ光源は基本的には半導体レーザ31
と光波長変換素子1により構成される。Al枠30に固
定された半導体レーザ31から出射された基本波P1は
コリメータレンズ34で平行光にされた後、フォーカス
レンズ35で光波長変換素子1の光導波路2に導入され
高調波P2へと変換される。また、33は石英板であり
断熱のためのものである。ここで光波長変換素子の構成
は実施例1と同様である。この実施例ではこの光波長変
換素子と半導体レーザを組み合わせて短波長レーザ光源
を作製した。出力される高調波出力はビームスプリッタ
36により分岐され、Siディテクター27により検出
され電気処理によりフィードバックがかかり高調波出力
の最大点で電極の電圧が一定に保たれる。この状態で、
電極28に印可する電圧を変調することにより、短波長
レーザ光源の出力を多段階に変調できる。
Next, a second embodiment of the short wavelength laser light source of the present invention will be described. FIG. 12 shows a configuration diagram of the short wavelength laser light source of FIG. 11. The short wavelength laser light source is basically a semiconductor laser 31.
And the light wavelength conversion element 1. The fundamental wave P1 emitted from the semiconductor laser 31 fixed to the Al frame 30 is collimated by the collimator lens 34, and then introduced into the optical waveguide 2 of the optical wavelength conversion element 1 by the focus lens 35 to become the harmonic P2. To be converted. Further, 33 is a quartz plate for heat insulation. Here, the configuration of the light wavelength conversion element is similar to that of the first embodiment. In this example, a short wavelength laser light source was manufactured by combining this optical wavelength conversion element and a semiconductor laser. The output harmonic output is split by the beam splitter 36, detected by the Si detector 27, and fed back by electrical processing to keep the voltage of the electrode constant at the maximum point of the harmonic output. In this state,
By modulating the voltage applied to the electrode 28, the output of the short wavelength laser light source can be modulated in multiple stages.

【0044】なお実施例では非線形光学結晶としてLiNb
O3、LiTaO3を用いたがKNbO3、KTP等の強誘電体、M
NA等の有機材料にも適用可能である。
In the embodiment, LiNb is used as the nonlinear optical crystal.
O 3 and LiTaO 3 were used, but ferroelectrics such as KNbO 3 and KTP, M
It is also applicable to organic materials such as NA.

【0045】[0045]

【発明の効果】以上説明したように本発明の光波長変換
素子によれば、分極反転層を持つ光波長変換素子上に、
光導波路の伝搬方向に複数の電極を設けることにより、
光波長変換素子の出力を多段階に直線的の変化させるこ
とができる。しかも、電極により、光波長変換素子の出
力安定化も同時に行えるため、安定な出力も同時に得ら
れる。
As described above, according to the optical wavelength conversion element of the present invention, on the optical wavelength conversion element having the polarization inversion layer,
By providing multiple electrodes in the propagation direction of the optical waveguide,
The output of the light wavelength conversion element can be linearly changed in multiple stages. Moreover, since the output of the optical wavelength conversion element can be stabilized at the same time by the electrode, stable output can be obtained at the same time.

【0046】また、本発明の短波長レーザ光源により、
短波長でかつ、出力変調の可能な光源が実現でき、かつ
出力変調器は素子に集積化されているため、小型の光源
が構成できる。その結果、光ディスク、レーザプリンタ
などの用途の応用が可能になり、その実用的効果は極め
て大きい。
Further, by the short wavelength laser light source of the present invention,
Since a light source having a short wavelength and capable of output modulation can be realized, and the output modulator is integrated in the element, a small light source can be configured. As a result, it becomes possible to apply to applications such as optical disks and laser printers, and the practical effects are extremely large.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光波長変換素子の第1の実施例の構造
FIG. 1 is a structural diagram of a first embodiment of an optical wavelength conversion device of the present invention.

【図2】本発明の光波長変換素子の光波長変換素子の製
造工程図
FIG. 2 is a manufacturing process diagram of the optical wavelength conversion element of the optical wavelength conversion element of the present invention.

【図3】分極反転がた光波長変換素子の第二高調波の出
力を表す特性図
FIG. 3 is a characteristic diagram showing the output of the second harmonic of an optical wavelength conversion device with polarization inversion.

【図4】(a)は櫛形電極付きの光波長変換素子の断面
図 (b)は櫛形電極付きの光波長変換素子における、電界
分布、電気光学定数、屈折率変化を表す特性図 (c)は平面電極付きの光波長変換素子の断面図 (d)は平面付きの光波長変換素子における、電界分
布、電気光学定数、屈折率変化を表す特性図
4A is a cross-sectional view of a light wavelength conversion element with a comb-shaped electrode, and FIG. 4B is a characteristic diagram showing electric field distribution, electro-optical constant, and refractive index change in the light wavelength conversion element with a comb-shaped electrode. Is a cross-sectional view of a light wavelength conversion element with a planar electrode. (D) is a characteristic diagram showing the electric field distribution, electro-optic constant, and refractive index change in the light wavelength conversion element with a flat surface.

【図5】印可電界とSHG出力の関係を表す特性図FIG. 5 is a characteristic diagram showing a relationship between an applied electric field and SHG output.

【図6】光波長変換素子の長さとSHG出力の関係を表
す特性図
FIG. 6 is a characteristic diagram showing the relationship between the length of the light wavelength conversion element and the SHG output.

【図7】印可電圧と位相整合波長の関係を表す特性図FIG. 7 is a characteristic diagram showing the relationship between applied voltage and phase matching wavelength.

【図8】(a)は平面電極付きの光波長変換素子の断面
図 (b)は光波長変換素子における、電界分布、電気光学
定数、屈折率変化を表す特性図
FIG. 8A is a cross-sectional view of a light wavelength conversion element with a planar electrode, and FIG. 8B is a characteristic diagram showing an electric field distribution, an electro-optic constant, and a refractive index change in the light wavelength conversion element.

【図9】他の実施例の光波長変換素子の構成図FIG. 9 is a configuration diagram of an optical wavelength conversion element according to another embodiment.

【図10】本発明の他の実施例の光波長変換素子の構成
FIG. 10 is a configuration diagram of an optical wavelength conversion device according to another embodiment of the present invention.

【図11】本発明の短波長レーザ光源の構成図FIG. 11 is a block diagram of a short wavelength laser light source of the present invention.

【図12】従来の光波長変換素子の構成図FIG. 12 is a configuration diagram of a conventional optical wavelength conversion element.

【符号の説明】[Explanation of symbols]

1 LiNbO3基板 2 光導波路 3 分極反転層 10 入射部 12 出射部 13 Taマスク 14 プロトン交換層 15 櫛形電極 16 平面電極 17 薄膜ヒーター 18 グレーティング P1 基本波 P2 高調波 27 Siディテクター 28 電極 30 Al枠 31 半導体レーザ 33 石英板 34 コリメータレンズ 35 フォーカスレンズ 36 ビームスプリッタ 101 半導体レーザ 102 コリメートレンズ 103 λ/2板 104 フォーカスレンズ 105 端面1 LiNbO 3 substrate 2 optical waveguide 3 polarization inversion layer 10 incidence part 12 emission part 13 Ta mask 14 proton exchange layer 15 comb-shaped electrode 16 planar electrode 17 thin film heater 18 grating P1 fundamental wave P2 harmonic 27 Si detector 28 electrode 30 Al frame 31 Semiconductor laser 33 Quartz plate 34 Collimator lens 35 Focus lens 36 Beam splitter 101 Semiconductor laser 102 Collimator lens 103 λ / 2 plate 104 Focus lens 105 End surface

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】光導波路と分極反転層と入射部と出射部と
を有する非線形物質からなる基板と前記基板上に形成し
たn個(n≧2)の電極とを有し、前記電極が前記光導
波路の伝搬方向に並んでいることを特徴とする光波長変
換素子。
1. A substrate made of a non-linear material having an optical waveguide, a domain inversion layer, an incident part and an emission part, and n (n ≧ 2) electrodes formed on the substrate, wherein the electrodes are the An optical wavelength conversion element characterized by being arranged in the propagation direction of an optical waveguide.
【請求項2】光導波路と分極反転層と入射部と出射部と
を有する非線形物質からなる基板と前記基板上に形成し
たn個(n≧2)の薄膜ヒータとを有し、前記薄膜ヒー
タが前記光導波路の伝搬方向に並んでいることを特徴と
する光波長変換素子。
2. A thin film heater comprising: a substrate made of a non-linear material having an optical waveguide, a polarization inversion layer, an incident part and an emission part, and n (n ≧ 2) thin film heaters formed on the substrate. Are arranged in the propagation direction of the optical waveguide.
【請求項3】電極の長さが入射部近傍から順にL0、L0
(21/2−11/2)、L0(31/2−21/2)、・・・、L0
(n1/2−(n−1)1/2)の関係を満足していることを
特徴とする請求項1の光波長変換素子。
3. The lengths of the electrodes are L0 and L0 in order from the vicinity of the incident portion.
(2 1/2 -1 1/2 ), L0 (3 1/2 -2 1/2 ), ..., L0
The optical wavelength conversion device according to claim 1, wherein the relationship of (n 1 /2- (n-1) 1/2 ) is satisfied.
【請求項4】前記薄膜ヒータの長さが入射部近傍から順
にL0、L0(21/2−11/2)、L0(31/2−21/2)、
・・・、L0(n1/2−(n−1)1/2)の関係を満足し
ていることを特徴とする請求項2の光波長変換素子。
4. The length of the thin film heater is L0, L0 (2 1/2 -1 1/2 ), L0 (3 1/2 -2 1/2 ), in order from the vicinity of the incident portion.
The light wavelength conversion element according to claim 2, wherein the relationship of L0 (n1 / 2- (n-1) 1/2 ) is satisfied.
【請求項5】請求項1または2記載の光波長変換素子と
半導体レーザとを備えたことを特徴とする短波長レーザ
光源。
5. A short wavelength laser light source comprising the light wavelength conversion element according to claim 1 and a semiconductor laser.
【請求項6】非線形物質からなる基板がLiNbxTa
1-x3(0≦X≦1)基板である請求項1または2記載
の光波長変換素子。
6. A substrate made of a non-linear material is LiNb x Ta.
The optical wavelength conversion device according to claim 1, which is a 1-x O 3 (0 ≦ X ≦ 1) substrate.
【請求項7】電極が櫛形電極であることを特徴とする請
求項1の光波長変換素子。
7. The light wavelength conversion element according to claim 1, wherein the electrode is a comb-shaped electrode.
【請求項8】電極が平行電極であり、前記電極下の分極
反転層の周期Λと分極反転層反転層の幅WがW≠Λ/2
であることを特徴とする請求項1記載の光波長変換素
子。
8. The electrode is a parallel electrode, and the period Λ of the domain inversion layer and the width W of the domain inversion layer below the electrode are W ≠ Λ / 2.
The optical wavelength conversion element according to claim 1, wherein
【請求項9】電極が平行電極であり、前記電極下の分極
反転層の深さDaと前記光導波路の深さDwがDw>Daで
あることを特徴とする請求項1記載の光波長変換素子。
9. The light wavelength conversion device according to claim 1, wherein the electrodes are parallel electrodes, and the depth Da of the domain-inverted layer below the electrodes and the depth Dw of the optical waveguide are Dw> Da. element.
JP25258992A 1992-09-22 1992-09-22 Optical wavelength conversion element and short wavelength laser light source Expired - Fee Related JP3006309B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25258992A JP3006309B2 (en) 1992-09-22 1992-09-22 Optical wavelength conversion element and short wavelength laser light source

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JPH06102553A true JPH06102553A (en) 1994-04-15
JP3006309B2 JP3006309B2 (en) 2000-02-07

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US6069904A (en) * 1995-11-16 2000-05-30 Matsushita Electric Industrial Co., Ltd. Optical apparatus and method for producing the same
US6298075B1 (en) 1995-11-16 2001-10-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus and method for producing the same
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JP2014211538A (en) * 2013-04-18 2014-11-13 日本電信電話株式会社 Wavelength conversion element

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