JPH06100665A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH06100665A
JPH06100665A JP24963292A JP24963292A JPH06100665A JP H06100665 A JPH06100665 A JP H06100665A JP 24963292 A JP24963292 A JP 24963292A JP 24963292 A JP24963292 A JP 24963292A JP H06100665 A JPH06100665 A JP H06100665A
Authority
JP
Japan
Prior art keywords
resin
content
epoxy resin
binuclear
viscosity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24963292A
Other languages
Japanese (ja)
Inventor
Tomoko Takashima
智子 高嶋
Shigeru Iimuro
茂 飯室
Takashi Kitamura
隆 北村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP24963292A priority Critical patent/JPH06100665A/en
Priority to MYPI93001633A priority patent/MY110530A/en
Publication of JPH06100665A publication Critical patent/JPH06100665A/en
Pending legal-status Critical Current

Links

Landscapes

  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

PURPOSE:To obtain the compsn. having a low viscosity and giving a cured article excellent in heat resistance by compounding an epoxy resin with a novolac phenol resin contg. a low concn. of binuclear compds. and a high concn. of trinuclear compds. as a curative. CONSTITUTION:An epoxy resin is compounded with a novolac phenol resin which contains binuclear compds. in a concn. of 10wt.% or lower, tetranuclear compds. in a concn. of 5-15wt.%, and trinuclear compds. in a concn. 2-19 times that of the tetranuclear compds.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はエポキシ樹脂組成物に関
する。詳しくは、本発明はノボラック型フェノール樹脂
を含有するエポキシ樹脂組成物に関する。
FIELD OF THE INVENTION The present invention relates to an epoxy resin composition. Specifically, the present invention relates to an epoxy resin composition containing a novolac type phenol resin.

【0002】[0002]

【従来の技術】一般にエポキシ樹脂は接着性、耐薬品
性、電気特性、耐熱性に優れるため、接着剤、塗料、電
気材料、各種複合材料などに広く使用されている。
2. Description of the Related Art Generally, epoxy resins are excellent in adhesiveness, chemical resistance, electric characteristics and heat resistance, and are therefore widely used in adhesives, paints, electric materials and various composite materials.

【0003】最近の半導体素子関連技術の進歩は殊の外
速く、しかも多様化している。例えば、LSIの高集積
化に伴いチップサイズが大型化し、逆にパッケージの形
状は小型化、薄型化の傾向にある。半導体素子を封止す
る方法として、エポキシ樹脂等を用いた、いわゆる樹脂
封止法が広く用いられている。封止用樹脂としてはノボ
ラック型フェノール樹脂がエポキシ樹脂の硬化剤とし
て、またはエポキシ樹脂のベースレジンとしてその耐熱
性、成形性、電気特性、また、原料の低廉さから封止用
樹脂の主流となっている。半導体封止樹脂であるエポキ
シ樹脂に要求される性能として、より少量でより性能の
高い樹脂であることが要求されるようになってきた。
Recent advances in semiconductor device-related technology are extremely fast and diversified. For example, the chip size becomes larger as the LSI becomes more highly integrated, while the package shape tends to become smaller and thinner. A so-called resin sealing method using an epoxy resin or the like is widely used as a method of sealing a semiconductor element. As the encapsulating resin, novolac type phenolic resin has become the mainstream of the encapsulating resin because of its heat resistance, moldability, electrical characteristics, and low cost of raw materials as a curing agent for epoxy resin or as a base resin for epoxy resin. ing. As a performance required for an epoxy resin which is a semiconductor sealing resin, a resin having a smaller amount and higher performance has been required.

【0004】例えば、はんだづけ工程においてはパッケ
ージそのものが200℃以上の高温に急激にさらされる
ことにより、パッケージ内の水分や揮発分が急に発生
し、パッケージ内にクラックを発生させ、半導体の信頼
性を低下させる原因となっていて、封止樹脂の耐熱性の
向上は大きな課題である。
For example, in the soldering process, the package itself is suddenly exposed to a high temperature of 200 ° C. or more, so that moisture and volatile components in the package are suddenly generated, and cracks are generated in the package, resulting in semiconductor reliability. Is a cause of lowering the heat resistance, and improving the heat resistance of the sealing resin is a major issue.

【0005】また、メタルと封止材の熱膨張率の差から
生じる応力で半導体素子が割れることがある。極端な場
合はチップ自身にクラックが入ってしまうこともあり、
問題となっている。このため、樹脂の熱膨張係数をそこ
で使われているメタルにできるだけ近づけるために、フ
ィラー等の充填材が添加されるが、流動性が悪くなるた
めに添加量には限度がある。フィラーを増量するために
は、樹脂がさらに低粘度であることが必要である。従っ
て、クラックの発生回数を減少し、硬化物の耐熱性が向
上するためには樹脂自身の粘度を低くすることが重要で
ある。
Further, the semiconductor element may be cracked by the stress caused by the difference in the coefficient of thermal expansion between the metal and the sealing material. In extreme cases, the chip itself may crack,
It's a problem. Therefore, a filler such as a filler is added in order to make the thermal expansion coefficient of the resin as close as possible to the metal used therein, but the addition amount is limited because the fluidity deteriorates. In order to increase the amount of filler, it is necessary that the resin has a lower viscosity. Therefore, in order to reduce the number of cracks and improve the heat resistance of the cured product, it is important to lower the viscosity of the resin itself.

【0006】半導体封止用エポキシ樹脂の要求される性
能の一つである耐熱性を向上させるために、硬化剤であ
るノボラック型フェノール樹脂、特にそのノボラック型
フェノール樹脂の核体分布に着目した。架橋反応に寄与
しない2核体以下のフェノール類、すなわちフリーフェ
ノール類、2核体フェノール類の含有率が低いノボラッ
ク型フェノール樹脂を用いると、硬化物の架橋度が増
し、耐熱温度が向上する。また、揮発分が少なくなるた
め、作業性が向上する、揮発分が原因で発生していたク
ラックの発生回数が減少する、といった特徴が出る。ま
た、耐熱性向上の手段として、フィラー等の充填材を添
加する場合が多い。ここでも充填材を増量できるように
封止樹脂の粘度を下げることが必要となってくる。つま
り、2核体以下の成分の含有量を低減し、かつ樹脂の粘
度を下げることが重要である。
In order to improve heat resistance, which is one of the required performances of epoxy resins for semiconductor encapsulation, attention was paid to the novolak type phenol resin as a curing agent, and particularly to the distribution of the cores of the novolac type phenol resin. When a novolac-type phenol resin having a low content of binuclear or less phenols that do not contribute to the crosslinking reaction, that is, free phenols and binuclear phenols, is used, the degree of crosslinking of the cured product is increased and the heat resistance temperature is improved. Further, since the volatile content is reduced, the workability is improved, and the number of cracks generated due to the volatile content is reduced. In addition, a filler such as a filler is often added as a means for improving heat resistance. Here too, it becomes necessary to lower the viscosity of the sealing resin so that the amount of the filler can be increased. That is, it is important to reduce the content of the components of the binuclear and lower components and to reduce the viscosity of the resin.

【0007】例えば、特開平2−70721号公報には
2核体成分が1.0重量%以上5.0重量%以下の範囲
で、軟化点が80℃以上、120℃以下、かつ数平均分
子量が300以上、900以下の範囲であるノボラック
型フェノール樹脂を硬化剤とするエポキシ樹脂組成物が
開示されている。この樹脂は2核体を低減しているので
架橋度が上がる。しかし粘度が高く、樹脂の線膨脹係数
を下げるためのフィラーを増量できなかった。
For example, Japanese Patent Laid-Open No. 2-70721 discloses a binuclear component in a range of 1.0% by weight to 5.0% by weight, a softening point of 80 ° C. to 120 ° C. and a number average molecular weight. There is disclosed an epoxy resin composition containing a novolac type phenol resin having a ratio of 300 to 900 as a curing agent. Since this resin has reduced the binuclear body, the degree of crosslinking increases. However, the viscosity was so high that the amount of filler for decreasing the linear expansion coefficient of the resin could not be increased.

【0008】また、特開平3−24115号公報には2
核体が20重量%以上、2核体成分と3核体成分との和
が35重量%以上のノボラック型フェノール樹脂をエポ
キシ樹脂の硬化剤として含有するエポキシ樹脂組成物が
開示されている。低分子量の硬化剤のため低粘度であ
り、無機フィラー等の充填材を増量でき、熱膨張係数の
差を縮めることが可能となった。しかしながら2核体成
分の含有率が高いために硬化物の耐熱性が向上せず、揮
発分も多いためにクラックの発生率は減少しなかった。
Further, in Japanese Patent Application Laid-Open No. 3-24115, 2
Disclosed is an epoxy resin composition containing a novolac-type phenol resin containing 20% by weight or more of a nuclide and 35% by weight or more of a sum of a dinuclear component and a trinuclear component as a curing agent for an epoxy resin. Since the curing agent has a low molecular weight, it has a low viscosity, and it is possible to increase the amount of the filler such as an inorganic filler and to reduce the difference in the coefficient of thermal expansion. However, the heat resistance of the cured product was not improved due to the high content of the binuclear component, and the occurrence rate of cracks was not reduced due to the high volatile content.

【0009】特開平4−68020号公報にはエポキシ
樹脂に液状のエポキシ樹脂を使用し、硬化剤にノボラッ
ク型フェノール樹脂を含有するエポキシ樹脂組成物が開
示されている。液状のエポキシ樹脂を使用することで揮
発分を多く含む低分子量の樹脂を硬化剤として使用しな
くても低粘度化でき、無機フィラー等の充填材を増量で
き、熱膨張係数の差を縮めることが可能となった。しか
しながらその硬化物の耐熱性、耐クラック性では不十分
であった。
Japanese Unexamined Patent Publication (Kokai) No. 4-68020 discloses an epoxy resin composition in which a liquid epoxy resin is used as the epoxy resin and a novolac type phenol resin is contained as a curing agent. By using a liquid epoxy resin, it is possible to reduce the viscosity without using a low molecular weight resin containing a large amount of volatiles as a curing agent, increase the amount of filler such as inorganic filler, and reduce the difference in thermal expansion coefficient. Became possible. However, the heat resistance and crack resistance of the cured product were insufficient.

【0010】硬化物の耐熱性を保ちつつ粘度を下げるこ
とは、半導体封止用樹脂だけでなく積層板、塗料、その
他各種用途での作業性や性能向上に非常に重要であり、
大きな課題の一つである。
Reducing the viscosity while maintaining the heat resistance of the cured product is very important for improving workability and performance not only for resin for semiconductor encapsulation but also for laminates, paints and various other applications.
This is one of the major challenges.

【0011】[0011]

【発明が解決しようとする課題】本発明の目的は、粘度
が低く、かつ硬化物の耐熱性に優れたエポキシ樹脂組成
物を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an epoxy resin composition having a low viscosity and a cured product having excellent heat resistance.

【0012】[0012]

【課題を解決するための手段】本発明者らは、上記目的
を達成するために鋭意検討し、含有させるノボラック型
フェノール樹脂が、樹脂中の2核体含有率が低く、3核
体含有率が高い樹脂であることによって目的が達成でき
ることを見出し、遂に本発明を完成させるに至った。
DISCLOSURE OF THE INVENTION The inventors of the present invention have made extensive studies to achieve the above object, and the novolac type phenolic resin to be contained has a low binuclear content in the resin and a trinuclear content. It has been found that the purpose can be achieved by using a resin having a high value, and finally the present invention has been completed.

【0013】即ち、本発明は、エポキシ樹脂とノボラッ
ク型フェノール樹脂とを必須成分として含有するエポキ
シ樹脂組成物において、ノボラック型フェノール樹脂と
して、樹脂中の2核体含有率が10重量%以下であり、
かつ、4核体含有率が5〜15重量%、3核体含有率が
4核体含有率の2〜19倍であるノボラック型フェノー
ル樹脂を含有することを特徴とするエポキシ樹脂組成物
である。
That is, according to the present invention, in an epoxy resin composition containing an epoxy resin and a novolac type phenol resin as essential components, the novolac type phenol resin has a binuclear content of 10% by weight or less. ,
An epoxy resin composition comprising a novolac-type phenol resin having a tetranuclear body content of 5 to 15% by weight and a trinuclear body content of 2 to 19 times the tetranuclear body content. .

【0014】本発明の必須成分であるエポキシ樹脂は1
分子中にエポキシ基を2つ以上含有するエポキシ樹脂で
ある。フェノールノボラック型エポキシ樹脂、オルソク
レゾールノボラック型エポキシ樹脂、フェノールアラル
キル型エポキシ樹脂、ビスフェノールA型エポキシ樹
脂、ビスフェノールF型エポキシ樹脂、難燃性を付与し
た臭素化ビスフェノールA型エポキシ樹脂、臭素化ビス
フェノールF型エポキシ樹脂等を例示できる。また、こ
れらのエポキシ樹脂が液状エポキシ樹脂であっても良
い。液状エポキシ樹脂を使用すればさらに低粘度化でき
る。これらのエポキシ樹脂を、単独で用いてもよいが2
種以上の混合物でもかまわない。
The epoxy resin which is an essential component of the present invention is 1
It is an epoxy resin containing two or more epoxy groups in the molecule. Phenol novolac type epoxy resin, orthocresol novolac type epoxy resin, phenol aralkyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, flame-retardant brominated bisphenol A type epoxy resin, brominated bisphenol F type An epoxy resin etc. can be illustrated. Further, these epoxy resins may be liquid epoxy resins. The viscosity can be further reduced by using a liquid epoxy resin. Although these epoxy resins may be used alone, 2
It may be a mixture of two or more species.

【0015】本発明のエポキシ樹脂組成物に含有させる
ノボラック型フェノール樹脂の最大の特徴は、樹脂中の
2核体含有率が低く、かつ、3核体含有率が高いという
核体分布をもっている点である。このような特徴的な核
体分布をもつノボラック型フェノール樹脂は、架橋反応
に寄与しない2核体含有率が低いため、硬化物は高架橋
度を有し、耐熱性が向上する。また、2核体含有率を低
くすると2核体を含有する場合に比べて粘度が上がって
しまうが、本発明では3核体の含有率が高いため、硬化
した際のガラス転移点(以後Tgと略)が同一のノボラ
ック型フェノール樹脂では得られない低溶融粘度を有す
ることができる。
The most characteristic feature of the novolak type phenolic resin contained in the epoxy resin composition of the present invention is that it has a low nuclide content and a high trinuclear content distribution in the resin. Is. The novolac type phenolic resin having such a characteristic nuclide distribution has a low binuclear content that does not contribute to the crosslinking reaction, so that the cured product has a high degree of crosslinking and the heat resistance is improved. Further, when the content of the binuclear body is lowered, the viscosity is increased as compared with the case where the binuclear body is contained, but in the present invention, the content of the trinuclear body is high, so that the glass transition point (hereinafter Tg Can have a low melt viscosity that cannot be obtained with the same novolac type phenolic resin.

【0016】本発明の必須成分であるノボラック型フェ
ノール樹脂中の2核体含有率については、通常10重量
%以下である。2核体は架橋反応に寄与しないためその
含有率は低い方が好ましい。しかし2核体含有率を増や
せば粘度が下がるため、要求する架橋度に差し障りがな
い範囲で2核体を含有させることができる。
The content of binuclear bodies in the novolak type phenolic resin which is an essential component of the present invention is usually 10% by weight or less. Since the binuclear body does not contribute to the crosslinking reaction, its content is preferably low. However, as the content of the binuclear body increases, the viscosity decreases, so that the binuclear body can be contained within a range that does not hinder the required degree of crosslinking.

【0017】ノボラック型フェノール樹脂中の4核体含
有率は5〜15重量%の範囲である。ノボラック型フェ
ノール樹脂中の3核体含有率は4核体含有率に対して2
〜19倍である。
The tetranuclear content in the novolac type phenol resin is in the range of 5 to 15% by weight. The trinuclear content in the novolac type phenolic resin is 2 with respect to the tetranuclear content.
~ 19 times.

【0018】これらの条件を満たす核体分布を持つ樹脂
であれば、同一のガラス転移温度(Tg)を有する硬化
物を与える樹脂と比較して低溶融粘度を有するノボラッ
ク型フェノール樹脂が実現する。
A resin having a nuclear distribution satisfying these conditions can realize a novolac type phenol resin having a low melt viscosity as compared with a resin which gives a cured product having the same glass transition temperature (Tg).

【0019】本発明のエポキシ樹脂組成物は、ノボラッ
ク型フェノール樹脂およびエポキシ樹脂を必須成分とす
るエポキシ樹脂組成物であるが、その他のフェノール系
樹脂、硬化促進剤、各種添加剤等を本発明の目的を損な
わない範囲であれば添加しても良い。
The epoxy resin composition of the present invention is a novolac type phenolic resin and an epoxy resin composition containing an epoxy resin as an essential component, but other phenolic resins, curing accelerators, various additives, etc. may be added to the epoxy resin composition of the present invention. You may add in the range which does not spoil the purpose.

【0020】本発明のエポキシ樹脂組成物には、エポキ
シ樹脂のエポキシ基と硬化剤のヒドロキシル基の反応を
促進する化合物を用いることができる。硬化促進剤とし
ては例えば、窒素含有化合物類、ホスフィン類、オニウ
ム塩類を例示できる。
In the epoxy resin composition of the present invention, a compound which accelerates the reaction between the epoxy group of the epoxy resin and the hydroxyl group of the curing agent can be used. Examples of the curing accelerator include nitrogen-containing compounds, phosphines and onium salts.

【0021】エポキシ樹脂とノボラック型フェノール樹
脂との混合比は、エポキシ樹脂のエポキシ基1モルに対
して、硬化剤樹脂のヒドロキシル基が0.1〜10の範
囲が一般的である。
The mixing ratio of the epoxy resin and the novolac type phenol resin is generally such that the hydroxyl group of the curing agent resin is 0.1 to 10 with respect to 1 mol of the epoxy group of the epoxy resin.

【0022】本発明のノボラック型フェノール樹脂の製
造の一例を示すと、まず最初にフェノール類をホルムア
ルデヒドに対して4〜30モル倍(以下P/F=4〜3
0と略)程度の割合で混合し、酸性触媒を添加して60
〜100℃で4時間縮合反応を行って初期縮合物を製造
する。次いで、得られた初期縮合物を大気圧下に加熱し
て水および少量のフェノール類を取り除き、さらに減圧
下に加熱して未反応のフェノール類を取り除く。次にマ
クマホンパッキング等の充填物を付した装置により減圧
下、さらに温度を上げて蒸留を行い、缶出物として2核
体含有率が低く3核体含有率が高いノボラック型フェノ
ール樹脂を得ることができる。2核体含有率は蒸留時の
温度、圧力によってコントロールできる。2核体除去は
このように減圧蒸留によってもよいが、その他抽出、水
蒸気蒸留によっても良い。3核体以上の成分の含有率の
割合は反応モル比によってコントロールできる。この缶
出物として得られた3核体含有率の多い樹脂をそのまま
樹脂組成物として用いても良いが、この缶出物を原料と
してホルマリン等のホルムアルデヒド源を添加してさら
に縮合反応を行い、任意の分子量の該樹脂、すなわち2
核体含有率の少ない、3核体含有率の多いノボラック型
フェノール樹脂を得ることもできる。
An example of the production of the novolac type phenol resin of the present invention will be described. First, the phenols are 4 to 30 mole times the formaldehyde (hereinafter P / F = 4 to 3).
Mix with the ratio of about 0) and add an acidic catalyst to 60
A condensation reaction is performed at -100 ° C for 4 hours to produce an initial condensate. Then, the obtained initial condensate is heated under atmospheric pressure to remove water and a small amount of phenols, and further heated under reduced pressure to remove unreacted phenols. Next, a novolac-type phenol resin having a low content of dinuclear bodies and a high content of trinuclear bodies is obtained as bottom product by distillation under reduced pressure with a device equipped with a packing material such as McMahon packing, while further raising the temperature. You can The binuclear body content can be controlled by the temperature and pressure during distillation. The removal of the binuclear body may be carried out by vacuum distillation as described above, but it may also be carried out by extraction or steam distillation. The content ratio of the trinuclear or higher component can be controlled by the reaction molar ratio. The resin having a high trinuclear body content obtained as the bottom product may be used as it is as a resin composition, but a formaldehyde source such as formalin is added to the bottom product as a raw material for further condensation reaction, The resin of any molecular weight, ie 2
It is also possible to obtain a novolak-type phenol resin having a low content of nucleolar and a high content of trinuclear.

【0023】また、留出した2核体は有用なビスフェノ
ールF類として利用できる。
Further, the distilled binuclear body can be utilized as useful bisphenol Fs.

【0024】本発明のノボラック型フェノール樹脂の原
料であるフェノール類としてはフェノールの他に、例え
ば、クレゾール、オルソまたはパラ、メタ置換アルキル
フェノール類を例示できる。
Examples of the phenols as a raw material of the novolac type phenol resin of the present invention include cresol, ortho or para, and meta-substituted alkylphenols in addition to phenol.

【0025】次にホルムアルデヒド源としてはホルマリ
ン、パラホルムアルデヒド、ヘキサメチレンテトラミ
ン、トリオキサンおよび環状ホルマール等を例示でき
る。
Examples of formaldehyde sources include formalin, paraformaldehyde, hexamethylenetetramine, trioxane and cyclic formal.

【0026】また、本発明のノボラック型フェノール樹
脂を得るための反応モル比はP/F=4以上であり、好
ましくは8以上である。反応モル比が大きい程3核体含
有率の高い樹脂が得られる。
The reaction molar ratio for obtaining the novolac type phenol resin of the present invention is P / F = 4 or more, preferably 8 or more. The resin having a higher trinuclear content is obtained as the reaction molar ratio is higher.

【0027】本発明においてホルムアルデヒド源とフェ
ノール類の反応に用いる酸性触媒としては、塩酸、硫
酸、パラトルエンスルホン酸、シュウ酸等の有機酸およ
び無機酸が挙げられる。
Examples of the acidic catalyst used in the reaction of the formaldehyde source and the phenols in the present invention include organic acids such as hydrochloric acid, sulfuric acid, paratoluenesulfonic acid and oxalic acid, and inorganic acids.

【0028】本発明においてノボラック型フェノール樹
脂にホルムアルデヒド源を添加して更に高分子量化させ
たノボラック型フェノール樹脂を製造する際のホルムア
ルデヒド添加量は、ホルムアルデヒドが添加される樹脂
の平均分子量や核体分布による。例えば数平均分子量が
600程度の樹脂を得ようとする場合には、反応モル比
P/F=10で製造した樹脂に対して11〜12重量%
程度の37%ホルマリン水溶液を添加すれば良い。
In the present invention, when the novolac type phenol resin is produced by adding a formaldehyde source to the novolac type phenol resin to produce a higher molecular weight, the amount of formaldehyde added is the average molecular weight of the resin to which formaldehyde is added or the distribution of the nucleus. by. For example, when trying to obtain a resin having a number average molecular weight of about 600, 11 to 12% by weight based on the resin produced at a reaction molar ratio P / F = 10.
It is sufficient to add about 37% formalin aqueous solution.

【0029】[0029]

【実施例】以下実施例および比較例により本発明をさら
に詳しく説明する。なお、実施例における各種特性値の
評価または測定は下記(1)〜(4)の方法により実施
した。
The present invention will be described in more detail with reference to Examples and Comparative Examples. The evaluation or measurement of various characteristic values in the examples was carried out by the following methods (1) to (4).

【0030】(1)各核体含有率 明細書中%で表した各核体含有率はゲルパーミエーショ
ンクロマトグラフィー(カラム:東ソーG4000HX
L+G2500HXL+G2000HXL×2本、溶離
液:テトラヒドロフラン、検出器:示差屈折率計)によ
り測定した重量%である。
(1) Content of Each Nucleus The content of each nucleus expressed in% in the specification is determined by gel permeation chromatography (column: Tosoh G4000HX).
L + G2500HXL + G2000HXL × 2, eluent: tetrahydrofuran, detector: differential refractometer).

【0031】(2)粘度 粘度はICIコーン&プレート型粘度計(リサーチ・エ
クイップメント社製:ロンドン)を用い、130℃で測
定した。
(2) Viscosity The viscosity was measured at 130 ° C. using an ICI cone & plate type viscometer (manufactured by Research Equipment Co., London).

【0032】(3)ガラス転移温度(Tg) TgはTMA(熱機械分析)法により測定した。(3) Glass transition temperature (Tg) Tg was measured by the TMA (thermo-mechanical analysis) method.

【0033】(4)軟化点 軟化点はJIS K−2207(環球法)により測定し
た。
(4) Softening point The softening point was measured according to JIS K-2207 (ring and ball method).

【0034】1.ノボラック型フェノール樹脂の製造 実施例1 フェノール2000gと37%ホルマリン水溶液17
2.5gとを混合(P/F=10)し、シュウ酸二水和
物5.6gを加えて、70℃で4時間反応を行った。
1. Production of Novolac Phenolic Resin Example 1 Phenol 2000 g and 37% formalin aqueous solution 17
2.5 g was mixed (P / F = 10), 5.6 g of oxalic acid dihydrate was added, and the reaction was carried out at 70 ° C. for 4 hours.

【0035】ついで反応生成物の混合物を大気圧下に1
60℃まで加熱して、水および少量のフェノールを取り
除き、さらに最終20mmHg、170℃まで加熱し
て、未反応フェノールを分離した。その後、6mmH
g、210℃まで加熱してフェノールを除去した。次
に、径15mm、高さ20mmのマクマホンパッキング
を付した装置により3mmHg、最終温度250℃まで
蒸留を行い、缶出物を得た。この缶出物40gと37%
ホルマリン水溶液2.0gとを混合してシュウ酸二水和
物0.11gを添加して100℃で2時間反応を行っ
た。ついで、得られた反応生成物を大気圧下に100〜
150℃に加熱して脱水し、更に280mmHg、17
0℃まで加熱して水分を取り除いた。以上の操作により
目的のフェノール樹脂を得た。得られた樹脂を室温まで
冷却したところ、粉砕可能な固形物を得た。得られた樹
脂中の2核体含有率、3核体含有率、4核体含有率、粘
度および軟化点を〔表1〕に示す。
The reaction product mixture is then brought to atmospheric pressure at 1
The mixture was heated to 60 ° C to remove water and a small amount of phenol, and further heated to 170 ° C at a final 20 mmHg to separate unreacted phenol. After that, 6mmH
g, heated to 210 ° C. to remove phenol. Next, distillation was performed by an apparatus equipped with a McMahon packing having a diameter of 15 mm and a height of 20 mm to 3 mmHg and a final temperature of 250 ° C. to obtain a bottom product. 40g of this canned product and 37%
2.0 g of a formalin aqueous solution was mixed, 0.11 g of oxalic acid dihydrate was added, and the reaction was carried out at 100 ° C. for 2 hours. Then, the obtained reaction product is heated to 100 to 100 at atmospheric pressure.
Dehydrated by heating to 150 ℃, 280mmHg, 17
Water was removed by heating to 0 ° C. The target phenolic resin was obtained by the above operation. When the obtained resin was cooled to room temperature, a pulverizable solid substance was obtained. [Table 1] shows the binuclear content, trinuclear content, tetranuclear content, viscosity and softening point of the obtained resin.

【0036】実施例2 実施例1と同様にフェノール2000gと37%ホルマ
リン水溶液172.5gとを混合(P/F=10)し、
シュウ酸二水和物5.6gを加えて70℃で4時間反応
を行った。次に実施例1と同様な装置を用いて、脱フェ
ノールを行い、蒸留を最終圧3mmHg、最終温度24
5℃まで行い、缶出物を得た。この缶出物40gと37
%ホルマリン水溶液3.2gとを混合してシュウ酸二水
和物0.11gを添加して100℃で2時間反応を行っ
た。ついで、得られた反応生成物を大気圧下に100〜
150℃に加熱して脱水し、更に280mmHg、17
0℃まで加熱して水分を取り除いた。以上の操作により
目的のノボラック型フェノール樹脂を得た。得られた樹
脂の2核体含有率、3核体含有率、4核体含有率、粘度
および軟化点を〔表1〕に示す。
Example 2 As in Example 1, 2000 g of phenol and 172.5 g of 37% formalin aqueous solution were mixed (P / F = 10),
5.6 g of oxalic acid dihydrate was added and the reaction was carried out at 70 ° C. for 4 hours. Then, using the same apparatus as in Example 1, dephenoling was carried out, and distillation was carried out at a final pressure of 3 mmHg and a final temperature of 24.
The temperature was raised to 5 ° C. to obtain a bottom product. This canned product 40g and 37
% Formalin aqueous solution (3.2 g) was mixed, 0.11 g of oxalic acid dihydrate was added, and the reaction was carried out at 100 ° C. for 2 hours. Then, the obtained reaction product is heated to 100 to 100 at atmospheric pressure.
Dehydrated by heating to 150 ℃, 280mmHg, 17
Water was removed by heating to 0 ° C. The target novolak type phenolic resin was obtained by the above operation. The binuclear content, trinuclear content, tetranuclear content, viscosity and softening point of the obtained resin are shown in [Table 1].

【0037】比較例1 フェノール2000gと37%ホルマリン水溶液104
0gとを混合(P/F=1.66)する以外は実施例1
と同じ条件で反応を行った。次に実施例1と同様な装置
を用いて、蒸留を最終圧3mmHg、最終温度220℃
まで行い、缶出物を得た。缶出物を室温まで冷却したと
ころ、粉砕不可能なペ−スト状樹脂を得た。この樹脂中
の2核体含有率、3核体含有率、4核体含有率、粘度、
および軟化点を〔表1〕に示す。
Comparative Example 1 Phenol 2000 g and 37% formalin aqueous solution 104
Example 1 except mixing with 0 g (P / F = 1.66)
The reaction was carried out under the same conditions as. Then, using the same apparatus as in Example 1, the distillation was performed at a final pressure of 3 mmHg and a final temperature of 220 ° C.
Until I got a canned product. When the bottom product was cooled to room temperature, a non-crushable paste resin was obtained. The content of binuclear bodies, the content of trinuclear bodies, the content of tetranuclear bodies, the viscosity,
The softening points are shown in [Table 1].

【0038】比較例2 フェノール2000gと37%ホルマリン水溶液115
0gとを混合(P/F=1.51)する以外は実施例1
と同じ条件で反応を行った。次に実施例1と同様な装置
を用いて、蒸留を最終圧3mmHg、最終温度250℃
まで行い、缶出物を得た。缶出物を室温まで冷却したと
ころ、粉砕可能な固形物として樹脂を得た。樹脂中の2
核体含有率、3核体含有率、4核体含有率、粘度および
軟化点を〔表1〕に示す。
Comparative Example 2 Phenol 2000 g and 37% formalin aqueous solution 115
Example 1 except mixing with 0 g (P / F = 1.51)
The reaction was carried out under the same conditions as. Next, using the same apparatus as in Example 1, the distillation was performed at a final pressure of 3 mmHg and a final temperature of 250 ° C.
Until I got a canned product. When the bottom product was cooled to room temperature, a resin was obtained as a pulverizable solid. 2 in resin
[Table 1] shows the nuclear content, trinuclear content, tetranuclear content, viscosity and softening point.

【0039】2.エポキシ硬化物の製造 得られた樹脂それぞれについて、この缶出物、エポキシ
当量214、軟化点75℃のオルソクレゾールノボラッ
ク型エポキシ樹脂(日本化薬(株)製、商品名:EOC
N102S、粘度(150℃)6.3P)、硬化促進剤
としてトリフェニルホスフィン(以下TPPと略)、離
型剤としてモンタン酸グリコールエステルワックス、着
色剤としてカーボンブラック、充填剤としてシリカを配
合し、混練温度100〜110℃、混練時間5分の条件
でロール混練を行った。シート状の混練物を冷却したの
ち、粉砕し、エポキシ樹脂組成物を得た。
2. Production of Epoxy Cured Product For each of the obtained resins, this output, an epoxy equivalent of 214, and an orthocresol novolac type epoxy resin having a softening point of 75 ° C. (manufactured by Nippon Kayaku Co., Ltd., trade name: EOC)
N102S, viscosity (150 ° C) 6.3P), triphenylphosphine (hereinafter abbreviated as TPP) as a curing accelerator, montanic acid glycol ester wax as a release agent, carbon black as a colorant, and silica as a filler, Roll kneading was performed under conditions of a kneading temperature of 100 to 110 ° C. and a kneading time of 5 minutes. The sheet-shaped kneaded product was cooled and then pulverized to obtain an epoxy resin composition.

【0040】次に、該組成物を5分間圧縮成形すること
により所定の形状の成形品を作成し、さらに、175℃
で5時間ポストキュアーした。得られた成形品のTgを
〔表1〕に示す。
Next, the composition is compression-molded for 5 minutes to prepare a molded article having a predetermined shape, and further, 175 ° C.
I did post cure for 5 hours. The Tg of the obtained molded product is shown in [Table 1].

【0041】各組成物の配合比は主剤であるエポキシ樹
脂100重量部に対して硬化剤としてノボラック型フェ
ノール樹脂を49重量部、TPPが1.2重量部、モン
タン酸グリコールエステルワックス2重量部、カーボン
ブラック1重量部、シリカ450重量部の割合である。
The compounding ratio of each composition is as follows: 49 parts by weight of novolac type phenol resin as a curing agent, 1.2 parts by weight of TPP, 2 parts by weight of montanic acid glycol ester wax, relative to 100 parts by weight of the epoxy resin as the main component. The ratio is 1 part by weight of carbon black and 450 parts by weight of silica.

【0042】[0042]

【表1】 各核体含有率の単位は面積%である。粘度の単位はP
(130℃で測定)である。Tgの単位は℃である。軟
化点の単位は℃である。
[Table 1] The unit of each nuclear content is area%. The unit of viscosity is P
(Measured at 130 ° C.). The unit of Tg is ° C. The unit of softening point is ° C.

【0043】[0043]

【発明の効果】本発明はエポキシ樹脂組成物として含有
されるノボラック型フェノール樹脂の核体分布が、2核
体以下の成分が10%以下でありかつ、4核体含有率が
5〜15%、3核体含有率が4核体含有率に対して2〜
19倍であるフェノール樹脂を使用することによって硬
化物の耐熱性を表すTgが同一の樹脂に対してより低溶
融粘度を有する樹脂を実現するものである。
INDUSTRIAL APPLICABILITY According to the present invention, the novolak-type phenol resin contained as an epoxy resin composition has a nucleus distribution of 10% or less for a dinuclear or less component and a tetranuclear content of 5 to 15%. The trinuclear body content rate is 2 to the tetranuclear body content rate.
By using a 19-fold phenol resin, a resin having a lower melt viscosity than a resin having the same Tg, which represents the heat resistance of a cured product, is realized.

【0044】例えば実施例1のTgが148℃、比較例
1のTgが148℃であるとき、粘度がそれぞれ4.5
P、7.3Pであり、本発明のフェノール樹脂の粘度は
低いといえる。実施例2と比較例2からも同様なことが
いえる。
For example, when the Tg of Example 1 is 148 ° C. and the Tg of Comparative Example 1 is 148 ° C., the viscosity is 4.5.
It is P and 7.3P, and it can be said that the viscosity of the phenol resin of the present invention is low. The same can be said from Example 2 and Comparative Example 2.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂とノボラック型フェノール
樹脂とを必須成分として含有するエポキシ樹脂組成物に
おいて、ノボラック型フェノール樹脂として、樹脂中の
2核体含有率が10重量%以下であり、かつ、4核体含
有率が5〜15重量%、3核体含有率が4核体含有率の
2〜19倍であるノボラック型フェノール樹脂を含有す
ることを特徴とするエポキシ樹脂組成物。
1. An epoxy resin composition containing an epoxy resin and a novolac-type phenol resin as essential components, wherein the novolac-type phenol resin has a binuclear content in the resin of 10% by weight or less, and 4 An epoxy resin composition comprising a novolac-type phenol resin having a nucleolar content of 5 to 15% by weight and a trinuclear content of 2 to 19 times the tetranuclear content.
JP24963292A 1992-09-18 1992-09-18 Epoxy resin composition Pending JPH06100665A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP24963292A JPH06100665A (en) 1992-09-18 1992-09-18 Epoxy resin composition
MYPI93001633A MY110530A (en) 1992-09-18 1993-08-17 Method for simultaneous preparation of bisphenol f and novolak phenol resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24963292A JPH06100665A (en) 1992-09-18 1992-09-18 Epoxy resin composition

Publications (1)

Publication Number Publication Date
JPH06100665A true JPH06100665A (en) 1994-04-12

Family

ID=17195918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24963292A Pending JPH06100665A (en) 1992-09-18 1992-09-18 Epoxy resin composition

Country Status (2)

Country Link
JP (1) JPH06100665A (en)
MY (1) MY110530A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0759449A3 (en) * 1995-08-21 1997-03-26 Vianova Resins GmbH Process for the preparation of methyl-substituted polyalkylidene polyphenols
JPH09165566A (en) * 1995-12-14 1997-06-24 Sumitomo Bakelite Co Ltd Die bonding material
WO2005019299A1 (en) * 2003-08-21 2005-03-03 Asahi Kasei Chemicals Corporation Photosensitive composition and cured product thereof
CN100358932C (en) * 2003-08-21 2008-01-02 旭化成化学株式会社 Photosensitive composition and cured product thereof
JP4491900B2 (en) * 2000-03-28 2010-06-30 パナソニック電工株式会社 Epoxy resin composition and semiconductor device
JP2011026387A (en) * 2009-07-22 2011-02-10 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor and semiconductor device
KR20110131263A (en) * 2009-03-11 2011-12-06 스미토모 베이클리트 컴퍼니 리미티드 Semiconductor-sealing resin composition and semiconductor device
JP2014062188A (en) * 2012-09-21 2014-04-10 Dic Corp Phenylphenol-naphthol resin, curable resin composition, cured product thereof and printed wiring board
WO2015046398A1 (en) * 2013-09-30 2015-04-02 明和化成株式会社 Epoxy resin composition, sealing material, cured product thereof, and phenol resin
JP2015172105A (en) * 2014-03-11 2015-10-01 日本化薬株式会社 Epoxy resin mixture, curable resin composition, cured product thereof, and semiconductor device
US11390708B2 (en) * 2018-03-09 2022-07-19 Nippon Steel Chemical & Material Co., Ltd. Resin composition for fiber-reinforced composite materials, and fiber-reinforced composite material using same

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0759449A3 (en) * 1995-08-21 1997-03-26 Vianova Resins GmbH Process for the preparation of methyl-substituted polyalkylidene polyphenols
JPH09165566A (en) * 1995-12-14 1997-06-24 Sumitomo Bakelite Co Ltd Die bonding material
JP4491900B2 (en) * 2000-03-28 2010-06-30 パナソニック電工株式会社 Epoxy resin composition and semiconductor device
WO2005019299A1 (en) * 2003-08-21 2005-03-03 Asahi Kasei Chemicals Corporation Photosensitive composition and cured product thereof
CN100358932C (en) * 2003-08-21 2008-01-02 旭化成化学株式会社 Photosensitive composition and cured product thereof
KR100799146B1 (en) * 2003-08-21 2008-01-29 아사히 가세이 케미칼즈 가부시키가이샤 Photosensitive composition and cured product thereof
US7569260B2 (en) 2003-08-21 2009-08-04 Asahi Kasei Chemicals Corporation Photosensitive composition and cured products thereof
US8653205B2 (en) * 2009-03-11 2014-02-18 Sumitomo Bakelite Co., Ltd. Resin composition for encapsulating semiconductor and semiconductor device
KR20110131263A (en) * 2009-03-11 2011-12-06 스미토모 베이클리트 컴퍼니 리미티드 Semiconductor-sealing resin composition and semiconductor device
US20120001350A1 (en) * 2009-03-11 2012-01-05 Masahiro Wada Resin composition for encapsulating semiconductor and semiconductor device
JP5578168B2 (en) * 2009-03-11 2014-08-27 住友ベークライト株式会社 Semiconductor sealing resin composition and semiconductor device
JP2011026387A (en) * 2009-07-22 2011-02-10 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor and semiconductor device
JP2014062188A (en) * 2012-09-21 2014-04-10 Dic Corp Phenylphenol-naphthol resin, curable resin composition, cured product thereof and printed wiring board
WO2015046398A1 (en) * 2013-09-30 2015-04-02 明和化成株式会社 Epoxy resin composition, sealing material, cured product thereof, and phenol resin
JP2015067816A (en) * 2013-09-30 2015-04-13 明和化成株式会社 Epoxy resin composition, sealing material, hardened product of the composition and phenol resin
CN105555828A (en) * 2013-09-30 2016-05-04 明和化成株式会社 Epoxy resin composition, sealing material, cured product thereof, and phenol resin
KR20160065084A (en) * 2013-09-30 2016-06-08 메이와가세이가부시키가이샤 Epoxy resin composition, sealing material, cured product thereof, and phenol resin
TWI640569B (en) * 2013-09-30 2018-11-11 明和化成股份有限公司 Epoxy resin composition, encapsulating material, hardened material thereof and phenol resin
JP2015172105A (en) * 2014-03-11 2015-10-01 日本化薬株式会社 Epoxy resin mixture, curable resin composition, cured product thereof, and semiconductor device
US11390708B2 (en) * 2018-03-09 2022-07-19 Nippon Steel Chemical & Material Co., Ltd. Resin composition for fiber-reinforced composite materials, and fiber-reinforced composite material using same

Also Published As

Publication number Publication date
MY110530A (en) 1998-07-31

Similar Documents

Publication Publication Date Title
JP5413488B2 (en) Phenol novolac resin, method for producing the same, epoxy resin composition and cured product using the same
JP2009132774A (en) Cashew novolac resin, its preparation method and curing agent for epoxy resin
JPH06100665A (en) Epoxy resin composition
JP5876976B2 (en) Novolac resin and thermosetting resin composition
JP3833940B2 (en) Phenol polymer, process for producing the same, and epoxy resin curing agent using the same
JP3633674B2 (en) Liquid epoxy resin composition for sealing and cured product thereof
JPH06192361A (en) Phenolic resin and epoxy resin composition and maleimide resin composition comprising the same
JPH10330594A (en) Epoxy resin molding material for sealing electronic part and electronic part
JP2009242719A (en) Phenolic novolac resin, epoxy resin composition and cured product therefrom, and semiconductor device
KR20150066441A (en) Phenol resin composition, thermosetting resin composition, and cured product
JPH0521651A (en) Epoxy resin molding material for sealing semiconductor
JP3555803B2 (en) Method for producing phenolic resin, epoxy resin curing agent, and epoxy resin composition
JPH07207125A (en) Phenolic resin composition
JPH05132543A (en) Epoxy resin composition
JP3143721B2 (en) Epoxy resin composition for sealing
JPH10279669A (en) Epoxy resin hardener
JP6729863B2 (en) Method for producing novolac type phenol resin, novolac type phenol resin, thermosetting resin composition and cured product
KR20150040752A (en) Thermosetting resin composition and cured product obtained from curing the same
JPH07216041A (en) Naphtholaldehyde condensate and epoxy resin composition containing the same
JPH10330591A (en) Epoxy resin molding material for sealing electronic part and electronic part
JPH07216052A (en) Epoxy resin and epoxy resin composition
JP2005179453A (en) Epoxy resin and method for producing the same
JPH07224142A (en) Epoxy resin and epoxy resin composition
JP2005089541A (en) Epoxy resin mixture and epoxy resin composition
JP2000204131A (en) Phenol polymer composition