JPH06100380A - Joint structure of ceramic material and metallic part - Google Patents

Joint structure of ceramic material and metallic part

Info

Publication number
JPH06100380A
JPH06100380A JP25091892A JP25091892A JPH06100380A JP H06100380 A JPH06100380 A JP H06100380A JP 25091892 A JP25091892 A JP 25091892A JP 25091892 A JP25091892 A JP 25091892A JP H06100380 A JPH06100380 A JP H06100380A
Authority
JP
Japan
Prior art keywords
ceramic body
gold
brazing material
metal
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25091892A
Other languages
Japanese (ja)
Inventor
Shin Fukumoto
伸 福本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP25091892A priority Critical patent/JPH06100380A/en
Publication of JPH06100380A publication Critical patent/JPH06100380A/en
Pending legal-status Critical Current

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  • Connections Arranged To Contact A Plurality Of Conductors (AREA)

Abstract

PURPOSE:To obtain a joint structure resistant to corrosive gas and liquid, free from restriction on the kind of the material of ceramics and necessitating reduced time and labor by directly soldering with a gold or nickel-based soldering material incorporated with a specific amount of titanium hydride. CONSTITUTION:Metallic members 2, 3 are directly soldered to a ceramic member 1 with soldering materials 4, 5 containing gold or Ni as main component and incorporated with 1.0-40.0 pts.wt. of titanium hydride. The eutectic mixture of gold, Ni and Ti resistant to corrosive gas and liquid is active to all oxide, nitride and carbide ceramics to enable firm bonding to the ceramics. When the amount of titanium hydride is <1.0 pt.wt., the absolute amount of Ti-Au and Ti-Ni eutectic mixture is insufficient to get a firm bond and when the amount exceeds 40.0 pts.wt., the reaction of the eutectic mixture with the ceramic material takes place to form a large amount of fragile reaction layer and remarkably deteriorate the mechanical strength at the joint part.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はセラミック体と金属部材
の接合構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a joint structure of a ceramic body and a metal member.

【0002】[0002]

【従来の技術】従来、セラミック体と金属部材の接合は
生もしくは焼成セラミック体表面にモリブデン、マンガ
ン等の高融点金属粉末に適当な有機バインダー及び溶剤
を添加混合し、ペースト状となしたものをスクリーン印
刷法により塗布し、これを還元雰囲気中で焼成して高融
点金属粉末とセラミック体とを焼結一体化させメタライ
ズ金属層を被着させるとともに該メタライズ金属層に金
属部材を銀ロウ材(銅ー銀合金)を介しロウ付けするこ
とによって行われている。
2. Description of the Related Art Conventionally, a ceramic body is joined to a metal member by forming a paste by mixing an appropriate organic binder and a solvent with a refractory metal powder such as molybdenum or manganese on the surface of a raw or fired ceramic body. It is applied by a screen printing method, and this is fired in a reducing atmosphere to sinter and integrate the refractory metal powder and the ceramic body to deposit a metallized metal layer, and the metallized metal layer is coated with a silver brazing material ( (Copper-silver alloy).

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この従
来のセラミック体と金属部材の接合はセラミック体に予
めメタライズ金属層を被着させておき、該メタライズ金
属層に金属部材を銀ロウ材を介しロウ付けすることによ
って行われており、メタライズ金属層を構成するモリブ
デン、マンガン及びロウ材を構成する銅、銀はいずれも
塩素ガス等の腐食性ガス、液体に弱いことから、例えば
半導体製造装置等の腐食性ガスを使用する装置の部品と
して適用するとメタライズ金属層やロウ材が腐食されて
セラミック体と金属部材の接合が破れるという欠点を有
していた。
However, in the conventional joining of the ceramic body and the metal member, a metallized metal layer is applied to the ceramic body in advance, and the metal member is brazed to the metallized metal layer via a silver brazing material. Since the molybdenum, manganese, and copper, which form the brazing material, which compose the metallized metal layer, are vulnerable to corrosive gases such as chlorine gas and liquids, for example, semiconductor manufacturing equipment, etc. When it is applied as a part of an apparatus using corrosive gas, it has a drawback that the metallized metal layer and the brazing material are corroded and the bond between the ceramic body and the metal member is broken.

【0004】またこの従来のセラミック体と金属部材の
接合は、セラミック体表面に予めメタライズ金属層を被
着させておかなければならず、セラミック体表面にメタ
ライズ金属層を被着させる場合、予め金属ペーストを準
備する必要があり、該金属ペーストはモリブデン、マン
ガン等、高融点金属粉末をスクリーン印刷機のメッシュ
を通過する程度の粒径となるように微粉砕するとともに
有機バインダーおよび溶剤を添加し、ペースト状となす
ことによって製作され、金属ペーストの作製に多大な時
間と手間を要するという欠点も有する。
Further, in the conventional joining of a ceramic body and a metal member, a metallized metal layer must be previously deposited on the surface of the ceramic body. When the metallized metal layer is deposited on the surface of the ceramic body, the metal is previously deposited. It is necessary to prepare a paste, the metal paste is molybdenum, manganese, etc., finely pulverized so that the refractory metal powder has a particle size such that it passes through a mesh of a screen printing machine, and an organic binder and a solvent are added, It is manufactured by forming it into a paste, and it also has a drawback that it takes a lot of time and effort to manufacture the metal paste.

【0005】更に前記モリブデン、マンガン等を使用し
たメタライズ金属層は酸化アルミニウムに代表される酸
化物系セラミック体にしか被着せず、窒化珪素や炭化珪
素に代表される窒化物系セラミック体、炭化物系セラミ
ック体には被着しないことからセラミック体と金属部材
の接合においてセラミック体側の材質に大きな制約を受
けるという欠点も有していた。
Further, the metallized metal layer using molybdenum, manganese, etc. is applied only to an oxide ceramic body represented by aluminum oxide, and a nitride ceramic body represented by silicon nitride or silicon carbide, or a carbide system. Since it is not adhered to the ceramic body, it has a drawback that the material on the ceramic body side is greatly restricted in joining the ceramic body and the metal member.

【0006】[0006]

【発明の目的】本発明者は上記欠点に鑑み種々実験の結
果、腐食性ガスに対し耐性を有する金及びニッケルとチ
タンはその共晶物が酸化物系、窒化物系及び炭化物系の
すべてのセラミック体に活性があり、強固に接合すると
ともに金属部材に対しても強固に接合することを知見し
た。
DISCLOSURE OF THE INVENTION In view of the above-mentioned drawbacks, the present inventor has conducted various experiments and found that gold, nickel and titanium, which have resistance to corrosive gases, have all eutectic compounds of oxide type, nitride type and carbide type. It has been found that the ceramic body is active and firmly bonds to the metal member as well.

【0007】本発明は上記知見に基づき、腐食性ガス、
液体に対し耐性を有するセラミック体と金属部材の接合
構造を提供するをその目的とするものである。
The present invention is based on the above findings,
It is an object of the present invention to provide a joint structure of a ceramic body and a metal member having resistance to a liquid.

【0008】本発明の接合構造によれば腐食性ガス、液
体に対し耐性を有することから、例えば腐食性ガスを使
用する半導体製造装置等の部品に好適に使用される。
Since the joint structure of the present invention has resistance to corrosive gases and liquids, it is preferably used for parts such as semiconductor manufacturing equipment using corrosive gases.

【0009】[0009]

【課題を解決するための手段】本発明のセラミック体と
金属部材の接合構造は、セラミック体に金属部材が、金
もしくはニッケルを主成分とし、水素化チタンを1.0 乃
至40.0重量部添加したロウ材を介して直接ロウ付けされ
ていることを特徴とするものである。
The joining structure of a ceramic body and a metal member according to the present invention is a brazing material in which the metal member is mainly composed of gold or nickel and 1.0 to 40.0 parts by weight of titanium hydride is added to the ceramic body. It is characterized by being directly brazed through.

【0010】本発明の接合構造においては、金もしくは
ニッケルを主成分とする金属に添加される水素化チタン
はその添加量が1.0 重量部未満であるとチタンー金、チ
タンーニッケル共晶物の絶対量が不足し、金属部材をセ
ラミック体に強固に接合させることができず、また40.0
重量部を越えるとチタンー金、チタンーニッケルの共晶
物が過剰に生成されるとともに該チタンー金、チタンー
ニッケルの共晶物とセラミック体とが反応して脆弱な反
応層が多量に形成され、セラミック体と金属部材との接
合部における機械的強度が大きく劣化してしまう。従っ
て、前記金もしくはニッケルを主成分とする金属に添加
される水素化チタンの添加量は1.0 乃至40.0重量部の範
囲に特定される。
In the joining structure of the present invention, when the amount of titanium hydride added to the metal containing gold or nickel as the main component is less than 1.0 part by weight, the absolute content of the titanium-gold and titanium-nickel eutectic crystal is The amount is insufficient, the metal member cannot be firmly bonded to the ceramic body, and
If it exceeds the weight part, the eutectic of titanium-gold and titanium-nickel is excessively formed, and the eutectic of titanium-gold and titanium-nickel reacts with the ceramic body to form a large amount of brittle reaction layer. However, the mechanical strength at the joint between the ceramic body and the metal member is greatly deteriorated. Therefore, the addition amount of titanium hydride added to the metal containing gold or nickel as a main component is specified in the range of 1.0 to 40.0 parts by weight.

【0011】[0011]

【実施例】次に本発明を添付図面に示す実施例に基づき
詳細に説明する。図1 は本発明のセラミック体と金属部
材の接合構造を半導体製造装置の真空装置に取着される
真空端子に適用した場合の一実施例を示し、1 はセラミ
ック体、2 はスリーブ、3 はリードピンである。
The present invention will now be described in detail with reference to the embodiments shown in the accompanying drawings. FIG. 1 shows an embodiment in which the joining structure of the ceramic body and the metal member of the present invention is applied to a vacuum terminal attached to a vacuum device of a semiconductor manufacturing apparatus, where 1 is a ceramic body, 2 is a sleeve, and 3 is It is a lead pin.

【0012】前記セラミック体1 は外周部に鍔部1aを、
中心部に貫通孔1bを有しており、鍔部1aには筒状のスリ
ーブ2 がロウ材4 を介してロウ付けされ、また貫通孔1b
にはリードピン3 がその両端を突出させた状態で挿通固
定される。
The ceramic body 1 has a collar portion 1a on the outer peripheral portion,
It has a through hole 1b in the center, and a cylindrical sleeve 2 is brazed to the collar 1a via a brazing material 4 and the through hole 1b
The lead pin 3 is inserted and fixed in this state with both ends thereof protruding.

【0013】前記セラミック体1 は酸化アルミニウム質
焼結体、窒化珪素質焼結体、炭化珪素質焼結体等の電気
絶縁材料から成りリードピン3 を電気的絶縁をもって保
持する作用を為す。
The ceramic body 1 is made of an electrically insulating material such as an aluminum oxide sintered body, a silicon nitride sintered body, or a silicon carbide sintered body, and has a function of holding the lead pin 3 with electrical insulation.

【0014】尚、前記セラミック体1 は酸化アルミニウ
ム質焼結体から成る場合、例えばアルミナ(Al 2 O 3 )
、シリカ(SiO2 ) 、マグネシア(MgO) 、カルシア(CaO)
等に適当な有機溶剤、溶媒を添加混合して成る原料粉
末を準備し、次に前記原料粉末を所定形状のプレス型内
に充填するとともに所定圧力で押圧して形成し、最後に
前記成形品を約1600℃の温度で焼成することによって製
作される。
When the ceramic body 1 is made of an aluminum oxide sintered body, for example, alumina (Al 2 O 3 )
, Silica (SiO 2 ), magnesia (MgO), calcia (CaO)
To prepare a raw material powder formed by adding and mixing a suitable organic solvent, a solvent, and the like, and then filling the raw material powder in a press die of a predetermined shape and pressing with a predetermined pressure to form the molded product at the end. Is produced by firing at a temperature of about 1600 ° C.

【0015】前記セラミック体1 はまたその外周部の鍔
部1aにスリーブ2 がロウ材4 を介して直接ロウ付けされ
ており、これによってスリーブ2 はセラミック体1 の鍔
部1a取着される。
In the ceramic body 1, a sleeve 2 is directly brazed to a flange portion 1a on an outer peripheral portion of the ceramic body 1 through a brazing material 4, whereby the sleeve 2 is attached to the flange portion 1a of the ceramic body 1.

【0016】前記スリーブ2 は真空端子を半導体製造装
置の真空装置に取着する作用を為し、例えば、コバール
金属(Fe-Ni-Co 合金) やチタン(Ti)等の金属材料で形成
され、コバール金属やチタン等のインゴット( 塊) を従
来周知の金属加工法を採用し、筒状に加工することによ
って得られる。
The sleeve 2 serves to attach the vacuum terminal to a vacuum device of a semiconductor manufacturing apparatus, and is formed of a metal material such as Kovar metal (Fe-Ni-Co alloy) or titanium (Ti). It is obtained by processing an ingot (lump) of Kovar metal, titanium or the like into a tubular shape by adopting a conventionally known metal processing method.

【0017】尚、前記スリーブ2 がコバール金属から成
る場合、スリーブ2 の表面には耐蝕性を向上させるため
にロウ付け前に厚さ3 μm 以上のニッケルメッキ層が層
着される。
When the sleeve 2 is made of Kovar metal, a nickel plating layer having a thickness of 3 μm or more is layered on the surface of the sleeve 2 before brazing in order to improve corrosion resistance.

【0018】また前記スリーブ2 をセラミック体1 の鍔
部1aにロウ付けするロウ材4 は、金もしくはニッケルを
主成分とする金属に水素化チタンを1.0 乃至40.0重量部
添加したものから成り、セラミック体1 の鍔部1aとスリ
ーブ2 との間にロウ材4 を配するとともにこれを約1000
℃の温度で加熱するとロウ材4 の水素化チタンは金、ニ
ッケルと反応してセラミック体1 及びスリーブ2 に対し
活性の有る金ーチタン、ニッケルーチタンの共晶物を作
り、該金ーチタン、ニッケルーチタンの共晶物によって
スリーブ2 をセラミック体1 に直接強固に接合させるこ
ととなる。
The brazing material 4 for brazing the sleeve 2 to the collar portion 1a of the ceramic body 1 is made of a metal containing gold or nickel as a main component and titanium hydride in an amount of 1.0 to 40.0 parts by weight. Place the brazing material 4 between the collar 1a of the body 1 and the sleeve 2 and keep it about 1000
When heated at a temperature of ° C, the titanium hydride of the brazing material 4 reacts with gold and nickel to form an active gold-titanium or nickel-titanium eutectic for the ceramic body 1 and sleeve 2, and the gold-titanium and nickel nickel The eutectic of ruthenium directly and firmly joins the sleeve 2 to the ceramic body 1.

【0019】尚、前記ロウ材4 はそれを構成する金、ニ
ッケル及び水素化チタンのいずれもが塩素ガス等、腐食
性ガスに対し耐性があることからセラミック体1 にスリ
ーブ2 をロウ材4 を介しロウ付けした後、ロウ材4 等に
塩素ガス等の腐食性ガスが接触したとしてもロウ材4 は
一切腐食を受けることはなく、その結果、セラミック体
1 へのスリーブ2 の強固な接合をそのまま維持すること
が可能となる。
Since the brazing material 4 is resistant to corrosive gas such as chlorine gas such as gold, nickel and titanium hydride, the brazing material 4 is made of the ceramic body 1 and the brazing material 4 After brazing through the brazing material, even if a corrosive gas such as chlorine gas comes into contact with the brazing material 4, etc., the brazing material 4 will not be corroded at all, and as a result, the ceramic body will not be corroded.
It is possible to maintain the strong joint of the sleeve 2 to the 1 as it is.

【0020】また前記セラミック体1 はその中央部の貫
通孔1bにリードピン3 が両端を突出させた状態で挿通固
定されている。
Further, the ceramic body 1 is inserted and fixed in the through hole 1b at the center thereof with the lead pins 3 protruding at both ends.

【0021】前記セラミック体1 の貫通孔1b内に挿通さ
れるリードピン3 は真空装置内の装置と真空装置外の装
置を電気的に接続させる作用を為し、コバール金属やチ
タン等の金属材料で形成されている。
The lead pin 3 inserted into the through hole 1b of the ceramic body 1 serves to electrically connect a device inside the vacuum device and a device outside the vacuum device, and is made of a metal material such as Kovar metal or titanium. Has been formed.

【0022】尚、前記リードピン3 がコバール金属から
成る場合、リードピン3 の表面には耐蝕性を向上させる
ためにロウ付け前に厚さ3 μm 以上のニッケルメッキ層
が層着される。
When the lead pin 3 is made of Kovar metal, a nickel plating layer having a thickness of 3 μm or more is layered on the surface of the lead pin 3 before brazing in order to improve corrosion resistance.

【0023】前記リードピン3 はセラミック体1 の貫通
孔1b内に挿通させるとともにセラミック体1 の貫通孔1b
周辺にロウ材5 を介しロウ付けすることによってセラミ
ック体1 に固定される。
The lead pin 3 is inserted into the through hole 1b of the ceramic body 1 and the through hole 1b of the ceramic body 1 is inserted.
It is fixed to the ceramic body 1 by brazing it around the brazing material 5.

【0024】前記リードピン3 をセラミック体1 に固定
するロウ材5 は、前記セラミック体1 にスリーブ2 をロ
ウ付けするロウ材4 と実質的に同一材料のものが使用さ
れ、スリーブ2 をセラミック体1 に接合させる時と同様
の方法によってセラミック体1 にリードピン3 を接合さ
せる。
The brazing material 5 for fixing the lead pin 3 to the ceramic body 1 is substantially the same as the brazing material 4 for brazing the sleeve 2 to the ceramic body 1, and the sleeve 2 is used for the ceramic body 1. The lead pins 3 are joined to the ceramic body 1 by the same method as for joining to the ceramic body 1.

【0025】尚、前記ロウ材5 はロウ材4 と同様、塩素
ガス等、腐食性ガスに対し耐性があることからセラミッ
ク体1 にリードピン3 をロウ材5 を介しロウ付けした
後、ロウ材5 等に塩素ガス等の腐食性ガスが接触したと
してもロウ材5 は一切腐食を受けることはなく、その結
果、セラミック体1 へのリードピン3 の強固な接合をそ
のまま維持することが可能となる。
Since the brazing material 5 has resistance to corrosive gas such as chlorine gas like the brazing material 4, after brazing the lead pins 3 to the ceramic body 1 through the brazing material 5, the brazing material 5 Even if a corrosive gas such as chlorine gas comes into contact with the above, the brazing material 5 is not corroded at all, and as a result, it is possible to maintain the strong bonding of the lead pin 3 to the ceramic body 1 as it is.

【0026】かくして上述の真空端子によればスリーブ
2 を半導体製造装置等の真空装置に取着し、真空装置内
の装置と真空装置外の装置とをリードピン3 の突出した
両端にそれぞれ電気的に接続させることによって真空装
置内外の装置間に電気信号を伝達させる端子として機能
する。
Thus, according to the above-mentioned vacuum terminal, the sleeve
2 is attached to a vacuum device such as a semiconductor manufacturing device, and the device inside the vacuum device and the device outside the vacuum device are electrically connected to the projecting ends of the lead pins 3 to electrically connect the device inside and outside the vacuum device. Functions as a terminal for transmitting signals.

【0027】(実験例)次に本発明の作用効果を以下に示
す実験例に基づき説明する。まず、セラミック体として
酸化アルミニウム質焼結体(Al 2 O 3 ) 、窒化珪素質焼
結体(Si 3 N 4 ) 、炭化珪素質焼結体(SiC) を準備し、
次にこれらセラミック体に、主成分としての金(Au)もし
くはニッケル(Ni)粉末に水素化チタンを外添加で表1 及
び表2 に示す量添加して成るロウ材試料を間に挟んで直
径5mm 、長さ20mmのコバール金属から成る金属棒を配す
るとともにこれを10-5Torrの真空中、約1000℃の温度で
焼成し、ロウ材試料中の金もしくはニッケルと水素化チ
タンとを反応させて、金ーチタンもしくはニッケルーチ
タンの共晶物を生成させるとともに該共晶物をセラミッ
ク体と金属棒とに反応させて金属棒をセラミック体に接
合させる。
(Experimental Example) Next, the operation and effect of the present invention will be described based on the experimental example shown below. First, an aluminum oxide sintered body (Al 2 O 3 ), a silicon nitride sintered body (Si 3 N 4 ), and a silicon carbide sintered body (SiC) are prepared as ceramic bodies,
Next, the diameter of the ceramic body was set by sandwiching a brazing material sample consisting of gold (Au) or nickel (Ni) powder as the main component with titanium hydride added externally in the amounts shown in Tables 1 and 2. A metal rod made of Kovar metal with a length of 5 mm and a length of 20 mm is placed, and this is fired at a temperature of about 1000 ° C. in a vacuum of 10 -5 Torr to react gold or nickel in the brazing material sample with titanium hydride. Then, a eutectic of gold-titanium or nickel-titanium is generated, and the eutectic is reacted with the ceramic body and the metal rod to bond the metal rod to the ceramic body.

【0028】そして次に前記金属棒をセラミック体に接
合させた直後及び塩素ガス(濃度20%)中に100 時間放
置した後、金属棒をセラミック体に対し垂直方向に引っ
張り、金属棒がセラミック体から剥がれた際の引っ張り
強度を調べ、単位面積当たりの接合強度を算出した。
Then, immediately after the metal rod is joined to the ceramic body and after being left in chlorine gas (concentration 20%) for 100 hours, the metal rod is pulled vertically to the ceramic body. The tensile strength when peeled off was examined, and the bonding strength per unit area was calculated.

【0029】尚、表1 、表2 中、試料番号17乃至19は本
発明と比較するための比較試料であり、各セラミック体
に予めモリブデンーマンガンから成るメタライズ金属層
をスクリーン印刷法を採用することによって被着させる
とともに該メタライズ金属層に金属棒を銀ロウ( 銀ー銅
合金) を介しロウ付けしたものである。上記の結果を表
1 及び表2 に示す。
In Tables 1 and 2, sample Nos. 17 to 19 are comparative samples for comparison with the present invention, and a metallized metal layer made of molybdenum-manganese is previously screen-printed on each ceramic body. The metallized metal layer is brazed to the metallized metal layer through silver brazing (silver-copper alloy). Table the above results
It is shown in 1 and Table 2.

【0030】[0030]

【表1】 [Table 1]

【0031】[0031]

【表2】 [Table 2]

【0032】[0032]

【発明の効果】上記実験結果からも判るように従来のセ
ラミック体にモリブデンーマンガン等のメタライズ金属
層を被着させ、更にメタライズ金属層に金属部材をロウ
付け接合させたものはメタライズ金属層が酸化アルミニ
ウム質焼結体には被着するものの炭化珪素質焼結体や窒
化珪素質焼結体には一切被着せず、セラミック体と金属
部材との接合においてセラミック体側に大きな制約を受
ける。これに対し本発明の接合構造によれば金属部材を
酸化アルミニウム質焼結体、炭化珪素質焼結体、窒化珪
素質焼結体のいずれにもその接合強度が2Kg/mm2 以上の
強度で接合し、金属部材をあらゆるセラミック体に強固
に接合させることが可能となる。
As can be seen from the above experimental results, a metallized metal layer such as molybdenum-manganese is deposited on a conventional ceramic body, and a metal member is brazed and bonded to the metallized metal layer. Although it adheres to the aluminum oxide sintered body, it does not adhere to the silicon carbide sintered body or the silicon nitride sintered body at all, and the ceramic body side is greatly restricted in joining the ceramic body and the metal member. On the other hand, according to the joining structure of the present invention, the metal member is bonded to any of the aluminum oxide sintered body, the silicon carbide sintered body, and the silicon nitride sintered body with a joint strength of 2 Kg / mm 2 or more. By joining, it becomes possible to firmly join the metal member to any ceramic body.

【0033】また従来のメタライズ金属層に金属部材を
ロウ付け接合させたものは塩素ガス中に100 時間放置さ
せておくとメタライズ金属層及びロウ材が塩素ガスによ
る腐食を受けメタライズ金属層のセラミック体に対する
接合強度が約70% にまで低下してしまうのに対し、本発
明の接合構造によればセラミック体に金属部材を接合さ
せるロウ材に腐食性ガス、液体に対し耐性を有する金属
のみを使用していることからロウ材に腐食性ガス等が接
触したとしてもロウ材は腐食を受けることはなく、その
結果、セラミック体と金属部材の接合を強固な状態で維
持することが可能となる。
In the conventional metallized metal layer to which a metal member is brazed and joined, the metallized metal layer and the brazing material are corroded by the chlorine gas when left to stand in chlorine gas for 100 hours. However, according to the joining structure of the present invention, only the metal having resistance to corrosive gas and liquid is used as the brazing material for joining the metal member to the ceramic body. Therefore, even if a corrosive gas or the like comes into contact with the brazing material, the brazing material is not corroded, and as a result, it becomes possible to maintain the bonding between the ceramic body and the metal member in a strong state.

【0034】従って、本発明のセラミック体と金属部材
の接合構造は腐食性ガス、液体を使用する装置、例えば
半導体製造装置等に使用される部品に好適に適用され
る。
Therefore, the joining structure of the ceramic body and the metal member according to the present invention is preferably applied to a device using a corrosive gas or a liquid, for example, a component used in a semiconductor manufacturing device or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のセラミック体と金属部材の接合構造を
半導体製造装置の真空装置に取着される真空端子に適用
した場合の一実施例を示す断面図である。
FIG. 1 is a cross-sectional view showing an embodiment in which the bonding structure of a ceramic body and a metal member according to the present invention is applied to a vacuum terminal attached to a vacuum device of a semiconductor manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1・・・・セラミック体 2・・・・スリーブ 3・・・・リードピン 4、5・・ロウ材 1 ... Ceramic body 2 ... Sleeve 3 ... Lead pin 4, 5 ...

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】セラミック体に金属部材が、金もしくはニ
ッケルを主成分とし、水素化チタンを1.0乃至40.
0重量部添加したロウ材を介して直接ロウ付けされてい
ることを特徴とするセラミック体と金属部材の接合構
造。
1. A ceramic member comprising a metal member containing gold or nickel as a main component and titanium hydride in an amount of 1.0 to 40.
A joined structure of a ceramic body and a metal member, which is directly brazed through a brazing material added with 0 part by weight.
JP25091892A 1992-09-21 1992-09-21 Joint structure of ceramic material and metallic part Pending JPH06100380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25091892A JPH06100380A (en) 1992-09-21 1992-09-21 Joint structure of ceramic material and metallic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25091892A JPH06100380A (en) 1992-09-21 1992-09-21 Joint structure of ceramic material and metallic part

Publications (1)

Publication Number Publication Date
JPH06100380A true JPH06100380A (en) 1994-04-12

Family

ID=17214961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25091892A Pending JPH06100380A (en) 1992-09-21 1992-09-21 Joint structure of ceramic material and metallic part

Country Status (1)

Country Link
JP (1) JPH06100380A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021144835A (en) * 2020-03-11 2021-09-24 京セラ株式会社 Airtight terminal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021144835A (en) * 2020-03-11 2021-09-24 京セラ株式会社 Airtight terminal

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