JPH0599564A - Gas purifying device - Google Patents

Gas purifying device

Info

Publication number
JPH0599564A
JPH0599564A JP3260109A JP26010991A JPH0599564A JP H0599564 A JPH0599564 A JP H0599564A JP 3260109 A JP3260109 A JP 3260109A JP 26010991 A JP26010991 A JP 26010991A JP H0599564 A JPH0599564 A JP H0599564A
Authority
JP
Japan
Prior art keywords
gas
filter
holding plate
filler
purifying device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3260109A
Other languages
Japanese (ja)
Other versions
JP3213024B2 (en
Inventor
Masaki Kimura
正城 木村
Hidenori Awata
秀則 粟田
Osamu Kitaguchi
治 北口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LIQUID GAS KK
Aisin Corp
Original Assignee
LIQUID GAS KK
Aisin Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LIQUID GAS KK, Aisin Seiki Co Ltd filed Critical LIQUID GAS KK
Priority to JP26010991A priority Critical patent/JP3213024B2/en
Publication of JPH0599564A publication Critical patent/JPH0599564A/en
Application granted granted Critical
Publication of JP3213024B2 publication Critical patent/JP3213024B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Abstract

PURPOSE:To provide a gas purifying device without leakage of fine powder of a filler from a gas effluent side even in the case where it is used under greater vibration and acceleration. CONSTITUTION:There is provided a gas purifying device wherein fillers 41, 42 for purification of gas to be processed are held between holding plates 46, 47 having a pair of filters in a purifying device casing 45 in the state that the filters are shielded with respect to the purifying device casing 45, and wherein a flow passage of the gas is formed from the filter-equipped holding plate 46 in the direction of the filter-equipped holding plate 47. The filter- equipped holding plate 47 is fixed to the purifying device casing 45, and the filter-equipped holding plate 46 is provided slidably to the purifying device casing 45 along the flow passage. Further, there is provided energyzation means 48 for energyzing the filter-equipped holding plate 46 in a direction where the fillers are pressed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はガス精製装置に関するも
のであり、このようなガス精製装置は、例えばヘリウム
ガス液化装置に使用されるものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas purifier, and such a gas purifier is used, for example, in a helium gas liquefier.

【0002】[0002]

【従来の技術】さらに詳細にガス精製装置の構成を説明
すると、従来このようなガス精製装置は、精製装置ケー
シング内で、この精製装置ケーシングに対してシール状
態で配設される一対のフィルター付保持板間に処理対象
ガス精製用の充填剤を保持し、一方のフィルター付保持
板から他方のフィルター付保持板の方向に処理対象ガス
の流通路を形成して構成されていた。この装置において
は、処理対象のガスは、一方のフィルター付保持板側か
ら充填剤部位へ流入し、この充填剤部位において所定の
処理を受けて他方のフィルター付保持板側から流出す
る。ここで、流出するガスは精製処理を受けて清浄なも
のとされる。また、フィルター付保持板と精製装置ケー
シング間に於けるシール構成は、ガス、その他の不純物
が両者間の隙間から漏出しないために必要とされる構成
である。そして、従来こういったガス精製装置としては
定置型のものがほとんどで、図3に示す構成のものが多
く、大きな振動・加速等の作用を受ける車載形式のガス
精製装置は、開発されていなかった。
2. Description of the Related Art The structure of a gas refining apparatus will be described in more detail. Conventionally, such a gas refining apparatus has a pair of filters which are disposed in the refining apparatus casing in a sealed state with respect to the refining apparatus casing. A filler for purifying the gas to be treated is held between the holding plates, and a flow path for the gas to be treated is formed from one holding plate with a filter to the other holding plate with a filter. In this apparatus, the gas to be treated flows into the filler portion from one filter holding plate side, undergoes a predetermined treatment in this filler portion, and flows out from the other filter holding plate side. Here, the gas flowing out is subjected to a refining process to be made clean. Further, the seal structure between the holding plate with filter and the purifier casing is a structure required so that gas and other impurities do not leak from the gap between the two. Most of the conventional gas purifiers are of the stationary type, and many of them have the configuration shown in FIG. 3, and no on-vehicle type gas purifier that is affected by large vibrations and accelerations has been developed. It was

【0003】[0003]

【発明が解決しようとする課題】しかしながら、リニヤ
モーターカー他、ロケット、自動車等、ガス精製装置が
大きな振動・加速等を受ける状況下で、この装置を配設
・使用する場合がある。このような環境において、従来
構成のガス精製装置を使用した場合は、振動・加速等に
よって、精製装置内に充填されている触媒、吸着剤等で
ある充填剤の移動が起こり、その充填密度が変化し、装
置内に空隙が生ずる。そしてこのような状態になると、
充填剤相互間あるいは充填剤と装置ケーシング間におい
て、それらの相対移動による磨耗・衝突による相互破壊
等が起こり、充填剤の一部が粉化され、このガス精製装
置から処理対象ガスとともに漏れ出すという問題があっ
た。例えばガス精製装置が、リニヤモーターカーに搭載
されるヘリウムガス液化装置に使用されるものの場合
は、上記の問題ははなはだしい。リニヤモーターカー於
ける振動・加速は、振動数300Hz、動加速度10G
にも及ぶものである。この状況においては、充填剤の部
分的な粉化が著しく、発生する微粉末がガス精製装置か
らヘリウムガス液化装置の循環冷凍系内に侵入する。こ
ういった場合、この装置が正常に運転できない等の問題
を引き起こすこととなっていた。
However, there is a case where this device is installed and used in a situation where a gas purification device such as a linear motor car, rocket, automobile, or the like is subjected to a large vibration or acceleration. In such an environment, when a gas purifier with a conventional configuration is used, the catalyst, the adsorbent, and other fillers filled in the purifier move due to vibration and acceleration, and the packing density is Changes and creates voids in the device. And when this happens,
Between the fillers or between the filler and the equipment casing, the relative movement of the fillers causes mutual destruction due to wear and collision, and a part of the filler is pulverized and leaks from the gas purification equipment together with the gas to be treated. There was a problem. For example, when the gas refining device is used for a helium gas liquefaction device mounted on a linear motor car, the above problem is severe. Vibration / acceleration in a linear motor car is vibration frequency 300Hz, dynamic acceleration 10G
It extends to. In this situation, partial pulverization of the filler is significant, and the fine powder generated enters the circulation refrigeration system of the helium gas liquefaction device from the gas purification device. In such a case, there is a problem that the device cannot operate normally.

【0004】このような微粉末漏出の例を以下に示す。 装置構成; 図3に示すガス精製装置(充填材の両側
に配設されるフィルター付保持板が固定のもの) 充填容積 140cc 充填剤形状; 粒状 充填剤充填率(かさ密度)0.71cc/g,1.25
cc/g 充填剤 物理吸着剤、化学吸着剤 使用環境; 振動数300Hz、動加速度10G
An example of such fine powder leakage is shown below. Device configuration: Gas purification device shown in FIG. 3 (fixed holding plates with filters arranged on both sides of the packing material) Packing volume 140 cc Filler shape; Granular packing rate (bulk density) 0.71 cc / g , 1.25
cc / g Filler Physical adsorbent, Chemical adsorbent Operating environment; Frequency 300Hz, Dynamic acceleration 10G

【0005】[0005]

【表1】 [Table 1]

【0006】振動ありの状態における漏洩微粉末数は異
常なものであり、このような状況はとうてい容認できな
い。従って、本発明の目的は、大きな振動・加速作動を
受ける状況で使用される場合においても、その充填剤の
相互移動が起こりにくく充填剤の粉化が起こらず、さら
にある程度の微粉末が生成された場合にも、この微粉末
がガス流出側から処理対象のガスとともに漏れ出すこと
がないガス精製装置を得ることである。
The number of leaking fine powders in the presence of vibration is abnormal, and such a situation is almost unacceptable. Therefore, an object of the present invention is that even when it is used in a situation where it is subjected to a large vibration / acceleration operation, the mutual movement of the filler is unlikely to occur, and the filler is not pulverized, and a certain amount of fine powder is produced. In the case of the above, it is also possible to obtain a gas purification apparatus in which this fine powder does not leak out together with the gas to be treated from the gas outflow side.

【0007】[0007]

【課題を解決するための手段】この目的を達成するため
の本発明によるガス精製装置の特徴構成は、他方のフィ
ルター付保持板を精製装置ケーシングに対して固定し、
一方のフィルター付保持板を流通路に沿った方向に、精
製装置ケーシングに対して摺動自在に設けるとともに、
一方のフィルター付保持板を充填剤押圧方向に付勢する
付勢手段を設けたことにあり、その作用・効果は次の通
りである。
To achieve this object, the gas purifier according to the present invention is characterized in that the other holding plate with a filter is fixed to the purifier casing,
One holding plate with a filter is provided slidably with respect to the purifier casing in the direction along the flow passage,
There is an urging means for urging one of the holding plates with a filter in the direction of pressing the filler, and the action and effect are as follows.

【0008】[0008]

【作用】このガス精製装置においても、充填剤は、一方
のフィルター付保持板と他方のフィルター付保持板との
間に挟持保持されるのであるが、ガス流の上流側に位置
する一方のフィルター付保持板が、精製装置ケーシング
に対して摺動自在に構成され、付勢手段により充填剤を
押圧する。従って、ガス精製装置が大きな加速作動、振
動を受けて、充填剤の装置内の移動が起こった場合に
も、この移動が一方のフィルター付保持板の押圧方向へ
の移動・調整により吸収されることとなる。従って、充
填剤は振動等を受けても、その最も安定な充填状態に維
持され、充填剤の粉化が抑制される。一方、ある程度の
微粉末が生成されても、この微粉末は他方のフィルター
付保持板、及び他方のフィルター付保持板と精製装置ケ
ーシング間のシール構成により精製装置内に保持される
こととなる。
In this gas purifying apparatus as well, the filler is sandwiched and held between the one holding plate with the filter and the other holding plate with the filter, and one of the filters located upstream of the gas flow. The attached holding plate is configured to be slidable with respect to the refiner casing, and the biasing means presses the filler. Therefore, even if the gas purifier is subjected to a large acceleration operation or vibration and the filler is moved inside the device, this movement is absorbed by the movement or adjustment of one of the holding plates with a filter in the pressing direction. It will be. Therefore, even if the filler is subjected to vibration or the like, it is maintained in the most stable filled state, and the powdering of the filler is suppressed. On the other hand, even if a certain amount of fine powder is produced, this fine powder will be held in the refining device by the other holding plate with a filter and the seal structure between the other holding plate with a filter and the purifying device casing.

【0009】[0009]

【発明の効果】従って、大きな振動・加速作動を受ける
状況で使用される場合においても、その充填剤の相互移
動が起こりにくく充填剤の粉化が起こらず、さらにある
程度の微粉末が生成された場合にも、この微粉末がガス
流出側から処理対象のガスとともに漏れ出すことがない
ガス精製装置を得ることができた(実施例に示す実験例
を参照のこと)。
Therefore, even when the filler is used in a situation where it is subjected to a large vibration / acceleration operation, the mutual movement of the filler hardly occurs, and the filler is not pulverized, and a certain amount of fine powder is produced. Also in this case, it was possible to obtain a gas purification apparatus in which this fine powder did not leak from the gas outflow side together with the gas to be treated (see the experimental example shown in the examples).

【0010】[0010]

【実施例】本願の実施例を図面に基づいて説明する。図
1に、本願のガス精製装置を採用したリニヤモーターカ
ーに搭載されるヘリウムガス液化装置1の構成が示され
ている。このヘリウムガス液化装置1は、ヘリウム循環
系100に、ガス圧縮機2、このガス圧縮機2の吐出側
に接続され、以下に示す機器を備え、前述のガス圧縮機
2吸い込み側に接続されるガス路3、常温精製装置4、
熱交換器5、低温精製装置6、ジュールトムソン弁7、
液体ヘリウムタンク8を備えて構成されている。ここ
で、ガス圧縮機2は液化に必要な状態にヘリウムガスを
加圧するものである。また熱交換器5は、ガス圧縮機2
から液体ヘリウムタンク8に到る往路側ガスg1を、液
体ヘリウムタンク8からガス圧縮機2に到る復路側ガス
g2と熱交換させて、これを冷却するためのものであ
り、本願においては四段設けられている。さらに、前述
の熱交換器5間の中間段階において、ガスは冷凍機9に
よってそれぞれ冷却され、所定の温度(第一段熱交換器
51と第二段熱交換器52との間の段では70K程度、
第三段熱交換器53と第四段熱交換器54との間の段で
は20K程度)とされる。また、第一段熱交換器51と
第二段熱交換器52との間、及び第三段熱交換器53と
第四段熱交換器54との間には、前述の低温精製装置6
が配設されており、各装置6において液化した不純物成
分が除去される。一方、この循環系100に対して、ヘ
リウムガスを供給もしくは補給するヘリウムガス供給系
(ヘリウムボンベ10、及び供給ガス用精製器11を備
える。)101が設けられている。
Embodiments of the present application will be described with reference to the drawings. FIG. 1 shows the configuration of a helium gas liquefaction device 1 mounted on a linear motor car that employs the gas purification device of the present application. This helium gas liquefaction device 1 is connected to a helium circulation system 100, a gas compressor 2 and a discharge side of the gas compressor 2, and is equipped with the following devices and connected to the suction side of the gas compressor 2 described above. Gas passage 3, room temperature refining device 4,
Heat exchanger 5, low temperature purification device 6, Joule Thomson valve 7,
The liquid helium tank 8 is provided. Here, the gas compressor 2 pressurizes the helium gas to a state required for liquefaction. The heat exchanger 5 is the gas compressor 2
The gas g1 on the outward path from the liquid helium tank 8 to the gas compressor 2 on the return path from the liquid helium tank 8 to the gas compressor 2 is heat-exchanged to cool it. It is provided with steps. Further, in the intermediate stage between the heat exchangers 5 described above, the gas is cooled by the refrigerator 9 respectively, and the gas is cooled to a predetermined temperature (70 K in the stage between the first stage heat exchanger 51 and the second stage heat exchanger 52). degree,
It is about 20K in the stage between the third stage heat exchanger 53 and the fourth stage heat exchanger 54). In addition, the low temperature purification device 6 described above is provided between the first stage heat exchanger 51 and the second stage heat exchanger 52 and between the third stage heat exchanger 53 and the fourth stage heat exchanger 54.
Is provided, and the liquefied impurity component in each device 6 is removed. On the other hand, a helium gas supply system (including a helium cylinder 10 and a supply gas purifier 11) 101 for supplying or replenishing helium gas is provided for the circulation system 100.

【0011】以下に、ヘリウムガスの精製構成について
説明する。この機能を果たす部位は、前述の常温精製装
置4、低温精製装置6である。ここでこれらの作動温度
は、常温精製装置4が所謂常温であり、低温精製装置6
のそれは70K程度及び20K程度である。さて、この
常温精製装置4は、化学及び物理吸着剤41、42をこ
の順に収納して構成される。化学吸着剤41としては、
重量%が50〜75%の酸化ニッケル(NiO)及び2
5〜50%の酸化アルミニウム(Al23)を主成分と
する吸着剤が採用されており、物理吸着剤42として
は、重量%が25〜45%の酸化アルミニウム(Al2
3)、35〜55%の酸化シリコン(SiO2 )及び
10〜30%の酸化ナトリウム(Na2O)を主成分と
するモレキュラーシーブスが採用されている。モレキュ
ラーシーブスの粒子径としては、吸着除去に適切な径が
選択されている。ここで、化学吸着剤41の形状は、球
状とした。
The structure for purifying helium gas will be described below. The parts that fulfill this function are the above-mentioned room temperature refining device 4 and low temperature refining device 6. Here, these operating temperatures are the so-called normal temperature of the room temperature refining device 4 and the low temperature refining device 6
It is about 70K and about 20K. Now, the room temperature refining apparatus 4 is constructed by accommodating the chemical and physical adsorbents 41 and 42 in this order. As the chemical adsorbent 41,
50% to 75% by weight of nickel oxide (NiO) and 2
5-50% aluminum oxide (Al 2 O 3) is and the adsorbent is employed as a main component, as a physical adsorbent 42,% by weight 25% to 45% of aluminum oxide (Al 2
O 3 ), molecular sieves containing 35 to 55% of silicon oxide (SiO 2 ) and 10 to 30% of sodium oxide (Na 2 O) as main components are adopted. As the particle size of the molecular sieves, a size suitable for adsorption removal is selected. Here, the shape of the chemical adsorbent 41 was spherical.

【0012】各精製装置4、6の除去対象不純物につい
て説明すると、常温精製装置4では酸素、一酸化炭素、
二酸化炭素、水、水素等が対象とされ、低温精製装置6
では窒素、メタン、二酸化炭素、水が除去対象となる。
この構成において、低温精製装置6は冷凍機近くに設置
することとなり、低温精製装置6に許容される容積は少
ない。従って、この精製装置6に割り当てることができ
る吸着能力(基本的には吸着剤の容積量が限定されるた
めに能力限界)に限りがあるため、常温精製装置4で窒
素、メタン以外の不純物はできる限り多く除去する必要
がある。
Impurities to be removed by the purifiers 4 and 6 will be described. In the room temperature purifier 4, oxygen, carbon monoxide,
Targeting carbon dioxide, water, hydrogen, etc., low temperature purification device 6
Then, nitrogen, methane, carbon dioxide, and water are targeted for removal.
In this structure, the low temperature refining device 6 is installed near the refrigerator, and the volume allowed for the low temperature refining device 6 is small. Therefore, since the adsorption capacity that can be assigned to the purifier 6 (basically the capacity limit because the volume of the adsorbent is limited) is limited, impurities other than nitrogen and methane in the ambient temperature purifier 4 are limited. It is necessary to remove as much as possible.

【0013】次に、図2に基づいてガス精製装置として
の常温精製装置4、低温精製装置6の構成について説明
する。常温、及び低温精製装置ではそのディメンジョン
が異なるのみである。この装置においては、図で左側の
ガス入口43から処理対象のガスが流入し、吸着処理を
受けた後右端のガス出口44からガスが流出する。装置
は、円筒形の精製装置ケーシングとしての精製器容器4
5内に充填剤としての吸着剤41、42を収納して構成
されるのであるが、容器45内において吸着剤41、4
2を、その両端より一方のフィルター付保持板としての
流入側挟持部材46と、他方のフィルター付保持板とし
ての流出側挟持部材47とで挟持する構成とされてい
る。これらの挟持部材46、47は、吸着剤41、42
に近接する側から、グラスウール層46a、47a、ス
テンレス製のメタルフィルター46b、47b、金属性
保持板46c、47cを備えている。ここで、メタルフ
ィルター46b、47bと金属性保持板46c、47c
とはそのフィルター46b、47bの周端部が溶接固定
されている。グラスウール層46a、47aが設けられ
ている理由は、メタルフィルター46b、47b単独で
はパーティクルの100%捕捉が難しいため、グラスウ
ール層46a、47aを形成することにより、パーティ
クルの捕捉率を高めている。さらに、流入側挟持部材4
6の金属性保持板46cは、これに固定されたメタルフ
ィルター46bとともにガスの流路方向に摺動可能な構
成とされ、そのガス流入側(非吸着剤側)を弾性部材と
してのスプリング48で弾性保持されている。一方、流
出側挟持部材47においては、その金属性保持板47a
の流出側周縁部が精製器容器45に溶接固定されてい
る。この構造を採用することにより、振動等により収納
される吸着剤41、42の微粉末が発生した場合にも、
充填物である吸着剤41、42の振動による流動化が、
流入側挟持部材46によって防止され、微粉末自体の発
生が抑制されるとともに、捕捉が確実に行われて、循環
系100内にこの微粉末が混入することはない。
Next, the configurations of the room temperature refining apparatus 4 and the low temperature refining apparatus 6 as the gas refining apparatus will be described with reference to FIG. The dimensions of normal temperature and low temperature refining equipment are different. In this apparatus, the gas to be treated flows in from the gas inlet 43 on the left side in the figure, and the gas flows out from the gas outlet 44 at the right end after being subjected to the adsorption treatment. The apparatus is a purifier container 4 as a cylindrical purifier casing.
Although the adsorbents 41 and 42 as a filler are housed in the container 5, the adsorbents 41 and 4 are contained in the container 45.
2 is sandwiched from both ends thereof by an inflow side holding member 46 as one holding plate with a filter and an outflow side holding member 47 as another holding plate with a filter. These sandwiching members 46, 47 are used as adsorbents 41, 42
Glass wool layers 46a, 47a, metal filters 46b, 47b made of stainless steel, and metal holding plates 46c, 47c are provided from the side close to. Here, the metal filters 46b and 47b and the metallic holding plates 46c and 47c
The peripheral ends of the filters 46b and 47b are welded and fixed. The reason why the glass wool layers 46a and 47a are provided is that it is difficult to capture 100% of the particles with the metal filters 46b and 47b alone. Therefore, by forming the glass wool layers 46a and 47a, the capture rate of particles is increased. Further, the inflow side holding member 4
The metal holding plate 46c of 6 is configured to be slidable in the gas flow direction together with the metal filter 46b fixed thereto, and the gas inflow side (non-adsorbent side) of the metal holding plate 46c is a spring 48 as an elastic member. Elastically retained. On the other hand, in the outflow side holding member 47, the metallic holding plate 47a
The peripheral portion on the outflow side of is fixed to the refiner container 45 by welding. By adopting this structure, even when fine powder of the adsorbents 41 and 42 stored due to vibration is generated,
The fluidization due to the vibration of the adsorbents 41 and 42, which are the filling materials,
This is prevented by the inflow side holding member 46, the generation of the fine powder itself is suppressed, and the fine powder is reliably captured, so that the fine powder is not mixed in the circulation system 100.

【0014】〔実験例〕上記の構成のガス精製装置を採
用することによる効果を確認するために、振動時及び、
無振動時の微粉末の発生量をパーティクルカウンターに
よって計測した。そのデータを表2に示す。 装置構成;図2に示すガス精製装置 充填容積 140cc 充填剤形状 概球状 充填剤充填率(かさ密度)0.71cc/g,1.3c
c/g 充填剤 物理・化学吸着剤 使用環境; 振動数300Hz、動加速度10G
[Experimental Example] In order to confirm the effect of adopting the gas purifying apparatus having the above-described structure,
The amount of fine powder generated without vibration was measured with a particle counter. The data are shown in Table 2. Device configuration: Gas purification device shown in FIG. 2 Filling volume 140 cc Filler shape Almost spherical Filler filling rate (bulk density) 0.71 cc / g, 1.3 c
c / g Filler Physical / Chemical adsorbent Usage environment: Frequency 300Hz, dynamic acceleration 10G

【0015】[0015]

【表2】 [Table 2]

【0016】表2に示すように、激しい振動のある場合
とない場合を比較すると、微粉末の精製装置外への漏洩
数は振動の激しい割には多くないことがわかる。また表
1の結果と比較しても良好な結果が得られている。
As shown in Table 2, when comparing the case where there is vigorous vibration and the case where there is no vigorous vibration, it can be seen that the number of leaks of the fine powder to the outside of the refining apparatus is not so large for vigorous vibration. Further, even when compared with the results in Table 1, good results are obtained.

【0017】〔別実施例〕上記の実施例においては、リ
ニアモータカーに採用されるヘリウム液化装置に本願の
ガス精製装置を採用する例を示したが、大きな加速度の
掛かるロケットへの適応、自動車などに車載した排気ガ
ス処置装置に対する適応等、様々な用途への適応が考え
られる。
[Other Embodiments] In the above embodiment, an example in which the gas purification device of the present application is adopted in the helium liquefaction device used in the linear motor car is shown, but it is applied to a rocket with a large acceleration, an automobile, etc. It can be applied to various applications such as the exhaust gas treatment device mounted on the vehicle.

【0018】さらに、上記の実施例においては流入側挟
持部材46を、スプリング48により押圧する構成を示
したが、これはエアーダンパー構成等、任意の構成を採
用することができる。従ってこの装置を付勢手段と称す
る。
Further, in the above-mentioned embodiment, the structure in which the inflow side holding member 46 is pressed by the spring 48 is shown, but any structure such as an air damper structure can be adopted. Therefore, this device is called a biasing means.

【図面の簡単な説明】[Brief description of drawings]

【図1】本願のヘリウム冷凍液化装置の構成図FIG. 1 is a configuration diagram of a helium freeze liquefaction device of the present application.

【図2】ガス精製装置の断面図FIG. 2 is a cross-sectional view of a gas purification device.

【図3】従来の精製装置の構成図FIG. 3 is a block diagram of a conventional refining device

【符号の説明】 41 充填剤 42 充填剤 45 精製装置ケーシング 46 一方のフィルター付保持板 47 他方のフィルター付保持板 100 ヘリウム循環系[Explanation of reference numerals] 41 packing material 42 packing material 45 refining device casing 46 holding plate with one filter 47 holding plate with the other filter 100 helium circulation system

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 精製装置ケーシング(45)内におい
て、この精製装置ケーシング(45)に対してシール状
態で配設される一対のフィルター付保持板(46)、
(47)間に処理対象ガス精製用の充填剤(41)、
(42)を保持し、一方の前記フィルター付保持板(4
6)から他方の前記フィルター付保持板(47)の方向
に前記処理対象ガスの流通路を形成してあるガス精製装
置において、 前記他方のフィルター付保持板(47)を前記精製装置
ケーシング(45)に対して固定し、 前記一方のフィルター付保持板(46)を前記流通路に
沿った方向に、前記精製装置ケーシング(45)に対し
て摺動自在に設けるとともに、 前記一方のフィルター付保持板(46)を前記充填剤押
圧方向に付勢する付勢手段(48)を設けたガス精製装
置。
1. A pair of holding plates with a filter (46) disposed inside the refining device casing (45) in a sealed state with respect to the refining device casing (45),
A filler (41) for purifying the gas to be treated between (47),
(42) and holds one of the holding plates with filter (4
6) A gas purifying device in which a flow passage for the gas to be treated is formed in the direction from the other holding plate with filter (47) to the other holding plate with filter (47). ), The one holding plate with a filter (46) is slidably provided with respect to the refiner casing (45) in the direction along the flow passage, and the one holding plate with a filter is provided. A gas purification device provided with a biasing means (48) for biasing the plate (46) in the direction of pressing the filler.
【請求項2】 前記他方のフィルター付保持板(47)
が、メタルフィルター(47b)を金属性保持板(47
c)に溶接固定したものであり、 さらに、前記金属性保持板(47c)が前記精製装置ケ
ーシング(45)に溶接固定されている請求項1記載の
ガス精製装置。
2. The other holding plate with a filter (47)
The metal holding plate (47b)
The gas purifier according to claim 1, which is welded and fixed to c), and further, the metallic holding plate (47c) is welded and fixed to the refiner casing (45).
【請求項3】 前記充填剤(41)が球状である請求項
1記載のガス精製装置。
3. Gas purifier according to claim 1, wherein the filler (41) is spherical.
JP26010991A 1991-10-08 1991-10-08 Gas purification equipment Expired - Fee Related JP3213024B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26010991A JP3213024B2 (en) 1991-10-08 1991-10-08 Gas purification equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26010991A JP3213024B2 (en) 1991-10-08 1991-10-08 Gas purification equipment

Publications (2)

Publication Number Publication Date
JPH0599564A true JPH0599564A (en) 1993-04-20
JP3213024B2 JP3213024B2 (en) 2001-09-25

Family

ID=17343413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26010991A Expired - Fee Related JP3213024B2 (en) 1991-10-08 1991-10-08 Gas purification equipment

Country Status (1)

Country Link
JP (1) JP3213024B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011220716A (en) * 2010-04-05 2011-11-04 Osaka Gas Co Ltd Filter, gas sensor and gas detector
CN112403199A (en) * 2020-11-17 2021-02-26 杭州天利空分设备制造有限公司 Molecular sieve circulating device of PSA adsorption bed

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011220716A (en) * 2010-04-05 2011-11-04 Osaka Gas Co Ltd Filter, gas sensor and gas detector
CN112403199A (en) * 2020-11-17 2021-02-26 杭州天利空分设备制造有限公司 Molecular sieve circulating device of PSA adsorption bed
CN112403199B (en) * 2020-11-17 2022-06-24 杭州天利空分设备制造有限公司 Molecular sieve circulating device of PSA (pressure swing adsorption) bed

Also Published As

Publication number Publication date
JP3213024B2 (en) 2001-09-25

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