JPH0598466A - Nickel-chromium plating method and apparatus - Google Patents
Nickel-chromium plating method and apparatusInfo
- Publication number
- JPH0598466A JPH0598466A JP28729391A JP28729391A JPH0598466A JP H0598466 A JPH0598466 A JP H0598466A JP 28729391 A JP28729391 A JP 28729391A JP 28729391 A JP28729391 A JP 28729391A JP H0598466 A JPH0598466 A JP H0598466A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- plating
- chromium plating
- dissolved oxygen
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 83
- 238000000034 method Methods 0.000 title claims abstract description 23
- 229910018487 Ni—Cr Inorganic materials 0.000 title claims abstract description 13
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 title claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 51
- 238000005406 washing Methods 0.000 claims abstract description 26
- 239000011651 chromium Substances 0.000 claims abstract description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000001301 oxygen Substances 0.000 claims abstract description 22
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 22
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 claims abstract description 8
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 6
- 235000010265 sodium sulphite Nutrition 0.000 claims abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 60
- 229910052759 nickel Inorganic materials 0.000 claims description 30
- 239000011261 inert gas Substances 0.000 abstract description 2
- 239000002932 luster Substances 0.000 abstract description 2
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229940123973 Oxygen scavenger Drugs 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ニッケルめっきに引き
続き、クロムめっきを行うときに生ずることがある、白
色で不定形のシミ（以下、「クロムシミ」と称する）を
防止したニッケル−クロムめっき方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nickel-chromium plating method which prevents white and amorphous spots (hereinafter referred to as "chrome stains") which may occur when nickel plating is followed by chromium plating. Regarding
【０００２】[0002]
【従来の技術】装飾めっきとして行なわれることの多い
ニッケル−クロムめっきにおいて、いわゆるクロムシミ
発生は、めっき製品の商品価値を無くしてしまうため、
非常に嫌われていた。 しかし、クロムシミ発生の原因
は、いままで十分に解明されておらず、各工場等におい
て経験的にその発生を防ぐしかなかった。2. Description of the Related Art In nickel-chromium plating, which is often performed as decorative plating, so-called chrome stains reduce the commercial value of plated products.
I was very disliked. However, the cause of the chrome stain has not been sufficiently clarified until now, and it was empirically necessary to prevent the occurrence at each factory.
【０００３】従来、クロムシミを防ぐ為の方法として
は、例えば、次に示す方法が経験的に行われていた。 クロムめっき前に希クロム酸浸漬を行う（クロムめ
っき直前の水洗槽で行う）。 クロムめっき前に希硫酸浸漬を行う。 ニッケルめっきとクロムめっきの間でアルカリ陰極
電解処理を行う。Conventionally, for example, the following method has been empirically carried out as a method for preventing chrome stains. Immerse dilute chromic acid before chrome plating (in a washing bath just before chrome plating). Dilute sulfuric acid immersion before chrome plating. Alkaline cathodic electrolysis is performed between nickel plating and chromium plating.
【０００４】しかしながら、、の方法では、この処
理に用いる酸の最適濃度の範囲が比較的狭く、これをは
ずれるとかえってクロムシミがひどくなることもある。
また、これらの酸の最適濃度は、各現場のめっき条件
により異なるため、それぞれ試行錯誤のうえ、最適濃度
を決定しているのが実情である。 更に、被めっき物に
よる前工程処理液の持ち込み、本処理液のすくい出しが
あるので、これらの酸の濃度を一定に維持することは、
なかなか困難である。However, in the method (2), the optimum concentration range of the acid used in this treatment is relatively narrow, and if it is out of this range, the chrome stain may become severe.
Further, since the optimum concentrations of these acids differ depending on the plating conditions at each site, it is the actual situation that the optimum concentrations are determined through trial and error. Furthermore, since the pretreatment liquid is brought in by the object to be plated and the treatment liquid is scooped out, it is necessary to keep the concentration of these acids constant.
It's quite difficult.
【０００５】一方、のアルカリ陰極電解処理を採用し
た場合、さらにこの処理の後にいくつかの水洗槽が必要
であり、ニッケルめっきとクロムめっきの間の工程が非
常に長くなるという欠点があった。On the other hand, when the alkaline cathodic electrolytic treatment is adopted, there is a drawback that some washing baths are required after this treatment and the process between nickel plating and chromium plating becomes very long.
【０００６】[0006]
【発明が解決しようとする課題】従って、より簡単な手
段でクロムシミの発生を有効に防止する方法の開発が求
められていた。Therefore, there has been a demand for the development of a method for effectively preventing the generation of chrome stains by a simpler means.
【０００７】[0007]
【課題を解決するための手段】本発明者らは、クロムシ
ミの発生を防止すべく、その発生機構に遡って研究を行
なった。 そしてその結果、クロムシミの原因は、ニッ
ケルめっき皮膜がクロムめっきに至る間の水洗工程で、
水洗水中に含まれる溶存酸素により酸化を受けて不活性
化し、クロムめっきの析出が異常となることによるもの
であるとの知見を得た。そしてこの知見から、クロムシ
ミの発生を防止するには、ニッケルめっきとクロムめっ
きの間の一部またはすべての水洗水中の溶存酸素を除去
するか、あるいは低下させれば良いことを見出し、本発
明を完成した。Means for Solving the Problems In order to prevent the generation of chrome stains, the present inventors conducted a research retroactively to the mechanism of the generation. And as a result, the cause of chrome stains is the water washing process during which the nickel plating film reaches chrome plating,
It was found that this is due to the fact that the oxygen is inactivated by being oxidized by the dissolved oxygen contained in the wash water and the deposition of chromium plating becomes abnormal. And from this knowledge, in order to prevent the generation of chrome stains, it was found that it is sufficient to remove or reduce dissolved oxygen in a part or all of the washing water between the nickel plating and the chrome plating, and the present invention completed.
【０００８】すなわち本発明は、ニッケルめっきに引き
続きクロムめっきを行うニッケルクロムめっき方法にお
いて、ニッケルめっき工程とクロムめっき工程の間の一
部または全部の水洗水の溶存酸素量を０〜５ｐｐｍに維
持することを特徴とするニッケル−クロムめっき方法お
よびこれに用いる装置を提供するものである。That is, according to the present invention, in a nickel-chromium plating method in which nickel plating is followed by chromium plating, the dissolved oxygen amount of a part or all of the washing water between the nickel plating steps is maintained at 0 to 5 ppm. The present invention provides a nickel-chromium plating method and an apparatus used therefor.
【０００９】本発明方法を実施するには、ニッケルめっ
き工程とクロムめっき工程の間の一部または全部の水洗
水の溶存酸素量を０〜５ｐｐｍ、好ましくは０〜３ｐｐ
ｍに維持することが必要であり、このためには水洗水槽
の溶存酸素量を上記範囲内に維持できる方法であればい
ずれの方法をも採用できるが、好ましい方法の一例とし
ては、次のものが挙げられる。To carry out the method of the present invention, the dissolved oxygen content of a part or all of the washing water between the nickel plating step and the chromium plating step is 0 to 5 ppm, preferably 0 to 3 pp.
It is necessary to maintain m. For this purpose, any method can be adopted as long as it can maintain the amount of dissolved oxygen in the washing water tank within the above range. Is mentioned.
【００１０】 水洗水に、亜硫酸ナトリウム、ヒドラ
ジンなどの溶存酸素除去剤を添加する。 水洗水に窒素ガス、アルゴンガスなどの不活性ガス
を通気し、溶存酸素を追い出す。A dissolved oxygen scavenger such as sodium sulfite and hydrazine is added to washing water. Nitrogen gas, argon gas, and other inert gas are passed through the wash water to expel dissolved oxygen.
【００１１】本発明方法を実施するに当たっては、溶存
酸素を除去もしくは減少せしめる水洗槽について溶存酸
素（ＤＯ）メーターを設置し、溶存酸素量が管理範囲を
越えないよう注意することが好ましく、上記または
の手段はこれに従い実施すれば良い。In carrying out the method of the present invention, it is preferable to install a dissolved oxygen (DO) meter in a washing tank for removing or reducing dissolved oxygen so that the amount of dissolved oxygen does not exceed the control range. The means may be implemented according to this.
【００１２】本発明において、溶存酸素を除去もしくは
減少せしめる水洗水槽は、ニッケルめっき工程とクロム
めっき工程の間の水洗槽の全てであっても、また一部で
あっても良いが、一部しか実施できないときは、なるべ
くクロムめっき槽に近い水洗槽から順に実施することが
好ましい。In the present invention, the washing water tank for removing or reducing dissolved oxygen may be all or a part of the washing water tank between the nickel plating step and the chromium plating step, but only a part thereof. When it cannot be carried out, it is preferable to carry out the washing process in order from the washing tank as close as possible to the chromium plating tank.
【００１３】本発明のニッケル−クロムめっき方法は、
ニッケルめっき工程とクロムめっき工程の間の水洗槽の
溶存酸素量を上記範囲に維持する以外は、全て通常の条
件で実施することができる。The nickel-chromium plating method of the present invention comprises:
All can be carried out under normal conditions except that the amount of dissolved oxygen in the washing bath between the nickel plating step and the chromium plating step is maintained within the above range.
【００１４】本発明方法の対象となるニッケルめっきに
は、ニッケル単層めっきのほかに、半光沢ニッケル−光
沢ニッケルの２層めっき、この２層めっきの間に、さら
に硫黄を比較的多く含むニッケルめっきを施す３層めっ
き、上記各めっきの後に、マイクロポーラスクロムめっ
きを得るための非電導性微粒子共析ニッケルめっきを施
しためっき等も含まれる。 また、本発明の対象とする
ニッケルめっきの下層に銅めっきがあってもよい。ま
た、クロムめっきも公知の条件で実施すれば良い。The nickel plating which is the object of the method of the present invention includes, in addition to nickel single layer plating, two-layer plating of semi-bright nickel-bright nickel, and nickel containing a relatively large amount of sulfur between the two-layer plating. Also included are three-layer plating for plating, plating after each of the above platings, and non-conductive fine particle eutectoid nickel plating for obtaining microporous chromium plating. Further, there may be copper plating on the lower layer of nickel plating which is the object of the present invention. Further, chromium plating may be performed under known conditions.
【００１５】[0015]
【作用】本発明は、水洗水中の溶存酸素により酸化され
やすいめっき直後のニッケル表面を、溶存酸素が少ない
かまたは存在しない水洗水を使用することにより酸化か
ら防止し、クロムシミの発生を抑制するものである。The present invention prevents the surface of nickel immediately after plating, which is easily oxidized by dissolved oxygen in the wash water, from being oxidized by using wash water with little or no dissolved oxygen, and suppresses the generation of chrome stains. Is.
【００１６】[0016]
【発明の効果】ニッケルめっきに優れた光沢を与えるた
め、光沢剤が一般に使用されているが、従来、光沢剤の
使用量、特にレベラー成分量とクロムシミの発生率との
間には相関関係があるとされており、ニッケルめっきで
極端に光沢を挙げることは困難であった。 これに対
し、本発明方法を採用すればクロムシミの発生が抑制さ
れるので光沢剤量を増やすことができ、より優れた光沢
のニッケル−クロムめっきを得ることができる。また、
作業現場においてもクロムシミ発生の問題がなくなるの
で生産性を向上させることができる。EFFECTS OF THE INVENTION A brightener is generally used in order to give an excellent luster to nickel plating, but conventionally, there is a correlation between the amount of the brightener used, particularly the leveler component amount and the incidence of chrome stain. It is said that it is difficult to obtain an extremely high gloss by nickel plating. On the other hand, when the method of the present invention is adopted, the generation of chrome stains is suppressed, so that the amount of the brightener can be increased, and nickel-chromium plating having more excellent gloss can be obtained. Also,
Since the problem of chrome stains is eliminated even at the work site, productivity can be improved.
【００１７】[0017]
【実施例】次に、実施例を挙げ、本発明を更に詳しく説
明する。EXAMPLES Next, the present invention will be described in more detail with reference to examples.
【００１８】実 施 例 １ 光沢ニッケルめっき浴およびクロムめっき浴をクロムシ
ミの出易い条件にし、下記に示す工程で半光沢ニッケル
−光沢ニッケル−クロムめっきを行なった。光沢ニッケ
ル−クロムニッケル間の水洗槽の溶存酸素量、水洗時間
を変え、クロムシミの発生しやすさを比較した結果を表
１および表２に示す。なお、各めっき浴の組成および条
件は下記の通りであり、また、ニッケルめっき槽から水
洗槽への移動時間、水洗槽間の移動時間および水洗槽か
らクロムめっき槽への移動時間はいずれも３０秒とし
た。Example 1 Semi-bright nickel-bright nickel-chromium plating was carried out in the steps shown below under the conditions in which the bright nickel plating bath and the chromium plating bath were liable to produce chrome stains. Tables 1 and 2 show the results of comparison of the susceptibility to chrome stains when the amount of dissolved oxygen and the rinsing time in the rinsing tank between bright nickel and chrome nickel were changed. The composition and conditions of each plating bath are as follows, and the transfer time from the nickel plating bath to the washing bath, the transfer time between the washing baths and the transfer time from the washing bath to the chromium plating bath were all 30 times. Seconds
【００１９】［ 半光沢ニッケル ］ めっき浴 ： 硫酸ニッケル（NiSO4・6H2O）；２８０ ｇ／ｌ 塩化ニッケル（NiCl2・6H2O）； ４５ ｇ／ｌ ほう酸（H3BO3） ； ４５ ｇ／ｌ 光沢剤 Ｂ−ｍｕ* ； １０ｍｌ／ｌ 光沢剤 ＢＴＬ* ； １.５ｍｌ／ｌ 湿潤剤 ＃６２* ； ２ｍｌ／ｌ ｐＨ ：４.０ 浴温 ：５５℃ 陰極電流密度 ：４ Ａ／ｄｍ2 めっき時間 ：１０分 撹拌 ：エアー[Semi-bright nickel] Plating bath: Nickel sulfate (NiSO 4 .6H 2 O); 280 g / l Nickel chloride (NiCl 2 .6H 2 O); 45 g / l Boric acid (H 3 BO 3 ); 45 g / l brightener B-mu * ; 10 ml / l brightener BTL * ; 1.5 ml / l wetting agent # 62 * ; 2 ml / l pH: 4.0 bath temperature: 55 ° C. cathode current density: 4 A / dm 2 Plating time: 10 minutes Stirring: Air
【００２０】［ 光沢ニッケル ］ めっき浴 ： 硫酸ニッケル（NiSO4・6H2O）；２８０ ｇ／ｌ 塩化ニッケル（NiCl2・6H2O）； ４５ ｇ／ｌ ほう酸（H3BO3） ； ４５ ｇ／ｌ 光沢剤 ＃６１０* ； １０ｍｌ／ｌ 光沢剤 ＃６３* ； １.５ｍｌ／ｌ 湿潤剤 ＃６２* ； ２ｍｌ／ｌ ｐＨ ：４.６ （標準：４.０） 浴温 ：６０℃ 陰極電流密度 ：１ Ａ／ｄｍ2 （標準：４ Ａ／ｄ
ｍ2） めっき時間 ：３分 撹拌 ：エアー[Bright Nickel] Plating Bath: Nickel Sulfate (NiSO 4 .6H 2 O); 280 g / l Nickel Chloride (NiCl 2 .6H 2 O); 45 g / l Boric Acid (H 3 BO 3 ); 45 g / L Brightener # 610 * ; 10 ml / l Brightener # 63 * ; 1.5 ml / l Wetting Agent # 62 * ; 2 ml / l pH: 4.6 (standard: 4.0) Bath temperature: 60 ° C Cathode current Density: 1 A / dm 2 (Standard: 4 A / d
m 2 ) Plating time: 3 minutes Stirring: Air
【００２１】［ ク ロ ム ］ めっき浴 ： 無水クロム酸 ；２４０ ｇ／ｌ 硫 酸（H2SO4） ； １ ｇ／ｌ クロミライト ＫＣ−４０* ； ４ ｇ／ｌ 浴温 ：３５℃（標準：４５℃） 陰極電流密度 ：２０ Ａ／ｄｍ2 めっき時間 ：１分 撹拌 ：なし （注） *の付されたものは、いずれも荏原ユージライ
ト株式会社製品。[Chromium] Plating bath: Chromic anhydride; 240 g / l Sulfuric acid (H 2 SO 4 ); 1 g / l Chromylite KC-40 * ; 4 g / l Bath temperature: 35 ° C. (standard) : 45 ° C.) Cathode current density: 20 A / dm 2 Plating time: 1 minute Stirring: None (Note) Items marked with * are products of EBARA Eugelite Co., Ltd.
【００２２】（ 結 果 ）(Result)
【表１】 [Table 1]
【００２３】[0023]
【表２】 [Table 2]
【００２４】なお、結果は、クロムめっきで発生したク
ロムシミの程度を以下の基準で評価し、示した。 評 価 内 容 ◎ ： シミは全く発生しない。 ○ ： わずかなクロムシミの発生はあるがほとんど目立たない。 △ ： めっき面の ５〜１０％程度のクロムシミが発生する。 × ： めっき面の１０〜２０％程度のクロムシミが発生する。 ×× ： ひどいクロムシミが発生する（めっき面の２０％以上）。The results are shown by evaluating the degree of chrome stain generated by chrome plating according to the following criteria. Rating content ◎: No stains occur. ◯: Little chrome stain is generated, but it is hardly noticeable. (Triangle | delta): About 5-10% of a plating surface produces a chrome stain. X: About 10 to 20% of the plated surface has chrome stains. XX: Severe chrome stain occurs (20% or more of the plated surface).
【００２５】この結果から明らかなように、クロムシミ
の発生しやすい条件下でも、水洗水の溶存酸素量を除去
もしくは減少せしめることにより、クロムシミの発生を
防止することができる。As is clear from these results, even under conditions where chrome stains are likely to occur, the generation of chrome stains can be prevented by removing or reducing the amount of dissolved oxygen in the wash water.
Claims (4)
を行うニッケル−クロムめっき方法において、ニッケル
めっき工程とクロムめっき工程の間の一部または全部の
水洗水の溶存酸素量を０〜５ｐｐｍに維持することを特
徴とするニッケル−クロムめっき方法。1. In a nickel-chromium plating method in which nickel plating is followed by chromium plating, maintaining the dissolved oxygen amount of a part or all of the washing water between 0 and 5 ppm between the nickel plating step and the chromium plating step. Characteristic nickel-chromium plating method.
の間の一部または全部の水洗水の溶存酸素量が０〜３ｐ
ｐｍである請求項第１項記載のニッケル−クロムめっき
方法。2. The amount of dissolved oxygen in a part or all of the washing water between the nickel plating step and the chromium plating step is 0 to 3 p.
The nickel-chromium plating method according to claim 1, which is pm.
の間の一部または全部の水洗水に亜硫酸ナトリウムまた
はヒドラジンを添加する請求項第１項記載のニッケル−
クロムめっき方法。3. The nickel according to claim 1, wherein sodium sulfite or hydrazine is added to a part or all of the washing water between the nickel plating step and the chromium plating step.
Chrome plating method.
の間の水洗槽の１部または全部の溶存酸素量を０〜５ｐ
ｐｍに維持したことを特徴とするニッケル−クロムめっ
き装置。4. The amount of dissolved oxygen in a part or all of the washing tank between the nickel plating tank and the chromium plating tank is 0 to 5 p.
Nickel-chromium plating equipment characterized by being maintained at pm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28729391A JPH0598466A (en) | 1991-10-08 | 1991-10-08 | Nickel-chromium plating method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28729391A JPH0598466A (en) | 1991-10-08 | 1991-10-08 | Nickel-chromium plating method and apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0598466A true JPH0598466A (en) | 1993-04-20 |
Family
ID=17715510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28729391A Pending JPH0598466A (en) | 1991-10-08 | 1991-10-08 | Nickel-chromium plating method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0598466A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995002080A1 (en) * | 1993-07-08 | 1995-01-19 | Andritz-Patentverwaltungsgesellschaft M.B.H. | Pickled steel product subsequent treatment process and device, in particular for pickled carbon steel hot strips |
| JP2002060999A (en) * | 2000-08-23 | 2002-02-28 | Ebara Udylite Kk | Plating method and plating product |
| KR100730244B1 (en) * | 1999-12-15 | 2007-06-20 | 바스프 코포레이션 | Use of a Semicarbazone Plant Growth Regulator for Crop Yield Enhancements |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61288078A (en) * | 1985-06-14 | 1986-12-18 | Sony Corp | Plating method |
-
1991
- 1991-10-08 JP JP28729391A patent/JPH0598466A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61288078A (en) * | 1985-06-14 | 1986-12-18 | Sony Corp | Plating method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995002080A1 (en) * | 1993-07-08 | 1995-01-19 | Andritz-Patentverwaltungsgesellschaft M.B.H. | Pickled steel product subsequent treatment process and device, in particular for pickled carbon steel hot strips |
| KR100730244B1 (en) * | 1999-12-15 | 2007-06-20 | 바스프 코포레이션 | Use of a Semicarbazone Plant Growth Regulator for Crop Yield Enhancements |
| JP2002060999A (en) * | 2000-08-23 | 2002-02-28 | Ebara Udylite Kk | Plating method and plating product |
| JP4627848B2 (en) * | 2000-08-23 | 2011-02-09 | 荏原ユージライト株式会社 | Plating method and plated product |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3616304A (en) | Method for treating chromium-containing baths | |
| JP2001505955A (en) | Copper layer electrolytic deposition method | |
| US5196109A (en) | Trivalent chromium electrolytes and plating processes employing same | |
| JP2009545669A (en) | Method of depositing chromium layer as hard chromium plating, electroplating bath, and hard chromium surface layer | |
| JPS5930797B2 (en) | Trivalent chromium electrolyte using vanadium reducing agent and its method | |
| US4242180A (en) | Ammonia free palladium electroplating bath using aminoacetic acid | |
| US4604167A (en) | Silver plating solution and silver plating process and pretreatment solution therefor | |
| US4462874A (en) | Cyanide-free copper plating process | |
| JPH0598466A (en) | Nickel-chromium plating method and apparatus | |
| EP0137817B1 (en) | Process for bonding high efficiency chromium electrodeposits | |
| JPH0288789A (en) | Bismuth-tin alloy electroplating bath and plating method | |
| JPH03107493A (en) | Pretreating solution for silver plating | |
| US4614568A (en) | High-speed silver plating and baths therefor | |
| US2646397A (en) | Electroplating zinc using titanium containing electrolyte | |
| CA1180677A (en) | Bath and process for high speed nickel electroplating | |
| JPH0288790A (en) | Bismuth-tin alloy electroplating method | |
| JPS5941514B2 (en) | Method of electroplating with bright tin or bright solder | |
| FR2538815A1 (en) | PROCESS FOR FORMING, BY ELECTROLYSIS, A COPPER COATING ON A SUBSTRATE FROM A CYANIDE-FREE BATH, AND ANODE FOR CARRYING OUT SAID METHOD | |
| US4810337A (en) | Method of treating a chromium electroplating bath which contains an alkyl sulfonic acid to prevent heavy lead dioxide scale build-up on lead or lead alloy anodes used therein | |
| JP3007207B2 (en) | Acidic Sn plating bath with less generation of Sn sludge | |
| US1608706A (en) | Electrodeposition of metals | |
| JPS6023200B2 (en) | Manufacturing equipment for iron-zinc alloy electroplated steel sheets | |
| Campbell et al. | Some uses of pyrophosphates in metal finishing part II. Cobalt-tungsten alloys to zinc, including pretreatment for magnesium | |
| JPS62127493A (en) | Electrolytic tinning method | |
| CA1272160A (en) | Gold alloy plating bath and process |