JPH0597418A - Production of highly oriented graphite - Google Patents

Production of highly oriented graphite

Info

Publication number
JPH0597418A
JPH0597418A JP3257393A JP25739391A JPH0597418A JP H0597418 A JPH0597418 A JP H0597418A JP 3257393 A JP3257393 A JP 3257393A JP 25739391 A JP25739391 A JP 25739391A JP H0597418 A JPH0597418 A JP H0597418A
Authority
JP
Japan
Prior art keywords
temperature
graphite
pressure
film
temp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3257393A
Other languages
Japanese (ja)
Inventor
Toshiharu Hoshi
敏春 星
Kazuhiro Watanabe
和廣 渡辺
Toyoichi Ozaki
豊一 尾崎
Mutsuaki Murakami
睦明 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3257393A priority Critical patent/JPH0597418A/en
Publication of JPH0597418A publication Critical patent/JPH0597418A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce highly oriented graphite by improving conditions in treatment at a high temp. at the time of producing graphite. CONSTITUTION:Plural polymer films or plural carbonaceous films obtd. from polymer films are laminated, set in an electric furnace, heated from room temp. to >=2,600 deg.C and treated under pressure in a temp. range of >=2,600 deg.C. After cooling to a temp. range of <=1,500 deg.C, the films are treated under no pressure in a temp. range above that of the initial treatment under pressure. After cooling to a temp. range of <=1,500 deg.C again, the films are heated to a temp. range above that of the initial treatment under pressure and treatment under pressure is carried out to obtain objective highly oriented graphite.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、X線モノクロメ−タ
−、中性子線モノクロメ−タ−、中性子線フィルタ−等
の放射線光学素子として利用できる高配向グラファイト
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing highly oriented graphite which can be used as a radiation optical element such as an X-ray monochromator, a neutron beam monochromator, a neutron beam filter and the like.

【0002】[0002]

【従来の技術】近年、高配向グラファイトは、X線や中
性子線に対する優れた分光、反射特性を有するために、
X線や中性子線のモノクロメ−タ−あるいはフィルタ−
等の放射線光学素子として使用されている。この用途に
供する高配向グラファイトとしては、天然グラファイト
が最適であるが、良質の天然グラファイトは、生産量が
が非常に限られ、しかも、粉末状あるいは燐片状で取り
扱いが難しい等の問題点があるため、これに代わるもの
として人工的にグラファイトを製造することが行われて
おり、この人工グラファイトが使用されはじめていた。
2. Description of the Related Art In recent years, highly oriented graphite has excellent spectral and reflection characteristics with respect to X-rays and neutron rays.
Monochrome meters or filters for X-rays and neutrons
Etc. are used as radiation optical elements. Natural graphite is the most suitable as highly oriented graphite for this purpose, but high-quality natural graphite has such problems that the production amount is very limited, and that it is powdery or scaly and difficult to handle. Therefore, as an alternative to this, artificial production of graphite has been carried out, and this artificial graphite has begun to be used.

【0003】従来、人工グラファイトの製造方法として
気相中での炭化水素ガスの高温分解沈積と、その熱間加
工による方法があり、これは圧力を印可しつつ3400
℃近傍で長時間再焼鈍するという工程によって作製する
ものである。この様にして作製されるグラファイトは高
配向性グラファイト(HOPG)と呼ばれ、天然の単結
晶グラファイトと比較し得る優れた特性を有する。しか
しながら、この方法は製造工程が極めて複雑で且つ歩留
りが著しく低く、その結果HOPGは極めて高価にな
り、実用に向かないという問題がある。
Conventionally, as a method for producing artificial graphite, there is a method by high-temperature decomposition and deposition of hydrocarbon gas in a gas phase and hot working thereof, which is 3400 while applying pressure.
It is manufactured by a process of re-annealing for a long time at around ℃. The graphite produced in this manner is called highly oriented graphite (HOPG) and has excellent properties comparable to natural single crystal graphite. However, this method has a problem that the manufacturing process is extremely complicated and the yield is extremely low, and as a result, HOPG becomes extremely expensive and is not suitable for practical use.

【0004】そこで、この様な問題点を解消できるグラ
ファイトの製造方法として、高分子フィルムを高温焼成
して良質グラファイトを容易且つ低コストで作製する方
法が開発された。高分子化合物は一般的には難グラファ
イト材料に属し、たとえ3000℃の高温で加熱しても
良質のグラファイトに転化される事は無いとされてき
た。しかし、最近の研究の結果、高分子化合物の幾つか
は適当な熱処理を行うことによって良質なグラファィト
に転化させられることが分かってきた。
Therefore, as a method for producing graphite that can solve such problems, a method has been developed in which a high-quality graphite is produced easily and at low cost by firing a polymer film at a high temperature. It has been considered that a polymer compound generally belongs to a difficult graphite material and is not converted into good quality graphite even when heated at a high temperature of 3000 ° C. However, as a result of recent research, it has been found that some of the high molecular compounds can be converted into good quality graphite by appropriate heat treatment.

【0005】良質なグラファイトに転化できる高分子化
合物としては、例えば、ポリオキサジアゾ−ル、芳香族
ポリイミド、芳香族ポリアミド、ポリベンゾビスチアゾ
−ル、ポリベンゾオキサゾ−ル、ポリチアゾ−ル、およ
びポリパラフェニレンビニレン等がある。
Examples of the polymer compound which can be converted into good quality graphite include polyoxadiazol, aromatic polyimide, aromatic polyamide, polybenzobisthiazole, polybenzoxazol, polythiazole, and the like. And polyparaphenylene vinylene.

【0006】これらの高分子を、複数枚の高分子フィル
ム、あるいは高分子フィルムから得られた炭素質フィル
ムを複数枚積層して、2600℃以上の温度域で加圧処
理を行いグラファイトブロックを得る方法が知られてい
る(特開昭63−235218号公報、特開昭63−2
35219号公報参照)。
A plurality of polymer films or a plurality of carbonaceous films obtained from the polymer films are laminated with these polymers, and pressure treatment is performed at a temperature range of 2600 ° C. or higher to obtain a graphite block. Methods are known (JP-A-63-235218, JP-A-63-2).
35219 gazette).

【0007】[0007]

【発明が解決しようとする課題】しかしながら、前述の
従来のグラファイトの製造方法では、完全に満足できる
ものが得られる訳ではないことが分かった。複数枚のフ
ィルムを積層し高温度域で加圧処理するというだけで
は、高配向性ブロック状グラファイトを得るには至らな
いのである。優れたブロック状の高配向性グラファイト
であるためには、各グラファイト化層内部は炭素原子が
所定通りに規則正しく並んだ結晶がきちんと配向した状
態(高配向性状態)になっており、各グラファイト化層
同士がしっかりと接着してひとつのブロック体になって
いなければならない。単純に高温度で圧力をかけ熱処理
しただけでは、しわや内部歪がフィルムにできたり、ま
た圧力のかかり具合いによっては結晶子の成長が、妨げ
られたりして高配向性のグラファイトができにくくなっ
てしまうという課題を有していた。
However, it has been found that the above-mentioned conventional method for producing graphite does not provide a completely satisfactory one. It is not possible to obtain highly oriented block-shaped graphite simply by laminating a plurality of films and pressurizing them in a high temperature range. In order to be an excellent block-shaped highly oriented graphite, the inside of each graphitized layer is in a state where crystals in which carbon atoms are regularly arranged in a predetermined manner are properly oriented (highly oriented state). The layers must be firmly adhered to form a block. Simply by applying pressure at a high temperature and heat-treating, wrinkles and internal strain can be generated in the film, and the growth of crystallites can be hindered depending on the degree of pressure applied, making it difficult to form highly oriented graphite. There was a problem that it would end up.

【0008】本発明は上記従来の課題を解決するもの
で、高温域での圧力処理の後、無圧処理を行い、再び圧
力処理を行うことにより配向性の高いグラファイトを得
る高配向グラファイトの製造方法を提供することを目的
とする。
The present invention is to solve the above-mentioned conventional problems. After the pressure treatment in the high temperature region, the pressureless treatment is performed, and the pressure treatment is performed again to obtain highly oriented graphite. The purpose is to provide a method.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に本発明の高配向グラファイトの製造方法は、複数枚の
高分子フィルム、あるいは高分子フィルムから得られた
炭素質フィルムを複数枚積層して、2600℃以上の温
度域で加圧処理を行った後、一旦1500℃以下の温度
域まで下げてから、再び初期加圧処理以上の温度域で無
圧熱処理を行った後、再度1500℃以下の温度域まで
下げ、再び初期の加圧処理温度域以上まで昇温し、加圧
処理を行うことにより容易に達成される。
In order to achieve the above object, a method for producing highly oriented graphite according to the present invention comprises a plurality of polymer films or a plurality of carbonaceous films obtained from the polymer films laminated together. After performing pressure treatment in the temperature range of 2600 ° C or higher, once lowering the temperature range to 1500 ° C or lower, performing pressureless heat treatment again in the temperature range of the initial pressure treatment or higher, and then again 1500 ° C. It can be easily achieved by lowering the temperature to the following temperature range, raising the temperature again to the initial pressure treatment temperature range or higher, and performing the pressure treatment.

【0010】また本発明における出発原料用高分子フィ
ルムとしては、請求項2に記載したように、ポリオキサ
ジアゾ−ル、芳香族ポリイミド、芳香族ポリアミド、ポ
リベンゾビスチアゾ−ル、ポリベンゾオキサゾ−ル、ポ
リチアゾ−ル、およびポリパラフェニレンビニレンのう
ちの少なくともひとつからなるフィルムが挙げられる
が、これに限らず高温での熱処理で良質のグラファイト
に転化させられる高分子フィルムであれば、出発原料フ
ィルムとして使えることはいうまでもない。またフィル
ムの厚みは、400μm以下であることが好ましい。厚
みが400μm以上になると、フィルム内部で発生する
ガスのためにフィルムの内部構造が破壊され高配向性が
難しくなってしまうからである。
Further, as the polymer film for starting material in the present invention, as described in claim 2, polyoxadiazol, aromatic polyimide, aromatic polyamide, polybenzobisthiazole, polybenzoxazole. Examples thereof include a film made of at least one of zole, polythiazole, and polyparaphenylene vinylene, but not limited to this, any polymer film that can be converted into good quality graphite by heat treatment at high temperature may be used. It goes without saying that it can be used as a raw material film. The thickness of the film is preferably 400 μm or less. This is because if the thickness is 400 μm or more, the internal structure of the film is destroyed due to the gas generated inside the film, and high orientation becomes difficult.

【0011】[0011]

【作用】この方法によって、フィルム寸法変化の殆どな
い温度領域で加圧処理して、しわや内部構造歪の発性を
抑制するが、ここでの圧力処理では、しわや内部歪が完
全に除去しにくく、圧力の具合いによっては結晶子の成
長の妨げにもなってしまうため、圧力処理後、無圧力の
もとで熱処理を行い、内部歪を完全に取り除き更には結
晶子の成長を促し、再度、圧力処理を行うことによっ
て、高配向性のものが得られるものである。この発明
は、焼成工程で温度と圧力をコントロ−ルする程度で行
えるため、何らの困難もなく極めて容易に実施できる。
By this method, pressure treatment is performed in the temperature range where there is almost no change in the film size to suppress the generation of wrinkles and internal structural strains. With this pressure treatment, wrinkles and internal strains are completely removed. It is difficult to do, and it also hinders the growth of crystallites depending on the condition of pressure, so after pressure treatment, heat treatment is performed under no pressure to completely remove internal strain and further promote crystallite growth. By carrying out the pressure treatment again, highly oriented ones can be obtained. Since the present invention can be carried out by controlling the temperature and pressure in the firing step, it can be carried out extremely easily without any difficulty.

【0012】[0012]

【実施例】以下、本発明の実施例について説明する。EXAMPLES Examples of the present invention will be described below.

【0013】まず、高分子フィルムがポリイミドフィル
ムである場合を例にとって、図面を参照しながら説明す
る。
First, the case where the polymer film is a polyimide film will be described as an example with reference to the drawings.

【0014】出発原料として、ポリイミドフィルム(D
upon社製 商品名 カプトン厚さ25μm)を用い
た。図1はこのポリイミドフィルムの熱処理温度上昇に
伴う面方面の伸び・縮み、および熱処理温度上昇に伴う
グラファイト化率(X線回折を利用した測定による)を
あらわす。
As a starting material, a polyimide film (D
The product name, Kapton thickness 25 μm, manufactured by Upon Co. was used. FIG. 1 shows the expansion and contraction of the surface area of this polyimide film as the heat treatment temperature rises, and the graphitization rate (by measurement using X-ray diffraction) as the heat treatment temperature rises.

【0015】このポリイミドフィルムは、図1のフィル
ム寸法曲線Aにみられるように、450〜500℃では
僅かに伸びるだけであるが、500〜700℃の高分子
分解温度域で急激に縮小し元の長さの75%ほどの長さ
になる。そして、この高分子分解温度を越え2000℃
の間ではフィルムは伸び縮みせず寸法変化が殆ど起こら
ない。しかし、2000〜2600℃ではフィルムは逆
に伸びて元の寸法の90%まで戻る。この温度領域での
フィルムの伸長はグラファイト化の進行と密接に結びつ
いており、図1のグラファイト化率曲線Bに見られるよ
うに、フィルムが伸びるに従いグラファイト化率が急激
に上昇する。このように2600℃以下の温度領域では
フィルム寸法に変化が起こるのである。これに対し26
00℃以上の温度領域、図1にも見られるように、フィ
ルム寸法は殆ど変化しなくなる。
As shown in the film dimension curve A of FIG. 1, this polyimide film only slightly expands at 450 to 500 ° C., but sharply shrinks in the polymer decomposition temperature range of 500 to 700 ° C. Is about 75% of the length. And, the temperature above this polymer decomposition temperature is 2000 ℃
In the meantime, the film does not expand or contract, and dimensional change hardly occurs. However, at 2000-2600 ° C., the film reversely stretches back to 90% of its original size. The elongation of the film in this temperature region is closely linked to the progress of graphitization, and as seen in the graphitization rate curve B of FIG. 1, the graphitization rate sharply increases as the film stretches. Thus, the film size changes in the temperature range of 2600 ° C. or lower. On the other hand, 26
In the temperature range of 00 ° C. or higher, as can be seen in FIG. 1, the film size hardly changes.

【0016】温度変化に対して上記のような寸法変化を
示すフィルムに、以下のようにして熱処理を施すように
する。
A film which exhibits the above-mentioned dimensional changes with respect to temperature changes is subjected to heat treatment as follows.

【0017】まず、熱分解に伴う寸法変化の大きい温度
領域からグラファイト化進行に伴う寸法変化の大きい温
度領域(0℃から2600℃まで)では実質無圧処理を
行い、次のグラファイト化をほぼ終えた2600℃以上
の寸法変化の殆どない温度領域で200kg/cm2
圧力処理を行う。
First, in the temperature range where the dimensional change is large due to thermal decomposition to the temperature range where the dimensional change is large along with the progress of graphitization (from 0 ° C. to 2600 ° C.), substantially pressureless treatment is performed, and the next graphitization is almost completed. In addition, pressure treatment of 200 kg / cm 2 is performed in a temperature range of 2600 ° C. or higher where there is almost no dimensional change.

【0018】この後、一旦温度を1500℃以下まで下
げる。降温させる場合、それまでかけていた圧力は少な
くとも1500℃までは維持することが望ましく、降温
は室温まで下げても良い。降温の後、再び2600℃の
温度まで上げる。この再昇温は前の処理温度以上の温度
まで昇温することが望ましい。昇温後、無圧の状態で熱
処理を行い内部構造の歪や結晶子の成長の促進を行う。
この後、再度温度を1500℃まで下げ、再び2600
℃以上に昇温し初期と同様の圧力処理を行う。
After that, the temperature is once lowered to 1500 ° C. or lower. When lowering the temperature, it is desirable to maintain the pressure applied up to at least 1500 ° C., and the temperature may be lowered to room temperature. After the temperature is lowered, the temperature is raised again to 2600 ° C. It is desirable to raise the temperature again to a temperature higher than the previous processing temperature. After the temperature is raised, heat treatment is performed in a pressureless state to promote distortion of the internal structure and growth of crystallites.
After this, the temperature is lowered again to 1500 ° C and then to 2600 again.
The temperature is raised to ℃ or higher and the same pressure treatment as in the initial stage is performed.

【0019】以上のことは、勿論ポリイミドフィルムに
ついて当てはまるだけということではなく、一般に熱処
理によって優れたグラファイトに転化可能な高分子フィ
ルム全般にいえるものである。
The above is not limited to the polyimide film, of course, and is generally applicable to all polymer films which can be converted into excellent graphite by heat treatment.

【0020】(実施例1)縦7cm、横7cm、厚さ5
0μmのポリオキサジアゾ−ル(POD)フィルム10
0枚を重ねてグラファイト製の冶具にセットし、ホット
プレス電気炉にて以下のようにして焼成した。
(Example 1) Length 7 cm, width 7 cm, thickness 5
0 μm polyoxadiazol (POD) film 10
0 sheets were piled up and set on a jig made of graphite, and fired in a hot press electric furnace as follows.

【0021】まず、アルゴンガス雰囲気中、10℃/m
inの速度で2600℃まで昇温した。この間フィルム
には、冶具重量による100g/cm2だけが加わるよ
うにした。温度が2600℃に達した後、200kg/
cm2の圧力をかけ、そのまま200kg/cm2の圧力
を維持しながら4時間保持した。続いて圧力をかけたま
ま1500℃まで降温し、30分間の保持時間の間に圧
力を解除し、再び10℃/minの速度で2800℃ま
で昇温した後、無圧力のもとで1時間熱処理を行い、再
度、1500℃まで降温し30分間保持の後、初期処理
と同様に10℃/minで2600℃まで昇温し、20
0kg/cm2の圧力をかけながら4時間保持して、高
配向性のブロック状グラファイトを得た。
First, in an argon gas atmosphere, 10 ° C./m
The temperature was raised to 2600 ° C. at a rate of in. During this time, only 100 g / cm 2 of the jig weight was applied to the film. 200kg / after the temperature reaches 2600 ℃
A pressure of cm 2 was applied, and the pressure was maintained as it was for 4 hours while maintaining the pressure of 200 kg / cm 2 . Then, the temperature was lowered to 1500 ° C with pressure applied, the pressure was released during the holding time of 30 minutes, the temperature was raised again to 2800 ° C at a rate of 10 ° C / min, and then 1 hour under no pressure. After heat treatment, the temperature is lowered to 1500 ° C. again and kept for 30 minutes.
It was maintained for 4 hours while applying a pressure of 0 kg / cm 2 , to obtain highly oriented block-shaped graphite.

【0022】(実施例2)縦7cm、横7cm、厚さ2
5μmの芳香族ポリイミド(PI)フィルム100枚を
重ねてグラファイト製の冶具にセットし、ホットプレス
電気炉にて以下のようにして焼成した。
(Example 2) Length 7 cm, width 7 cm, thickness 2
100 pieces of 5 μm aromatic polyimide (PI) films were stacked and set on a jig made of graphite, and baked in a hot press electric furnace as follows.

【0023】まず、アルゴンガス雰囲気中、10℃/m
inの速度で2700℃まで昇温した。この間フィルム
には、冶具重量による100g/cm2だけが加わるよ
うにした。温度が2700℃に達した後、200kg/
cm2の圧力をかけ、そのまま200kg/cm2の圧力
を維持しながら4時間保持した。続いて圧力をかけたま
ま1500℃まで降温し、30分間の保持時間の間に圧
力を解除し、再び10℃/minの速度で2900℃ま
で昇温した後、無圧力のもとで1時間熱処理を行い、再
度、1500℃まで降温し30分間保持の後、初期処理
と同様に10℃/minで2700℃まで昇温し、20
0kg/cm2の圧力をかけながら4時間保持して、ブ
ロック状グラファイトを得た。
First, in an argon gas atmosphere, 10 ° C./m
The temperature was raised to 2700 ° C. at a rate of in. During this time, only 100 g / cm 2 of the jig weight was applied to the film. 200kg / after the temperature reaches 2700 ℃
A pressure of cm 2 was applied, and the pressure was maintained as it was for 4 hours while maintaining the pressure of 200 kg / cm 2 . Then, the temperature was lowered to 1500 ° C with pressure applied, the pressure was released during the holding time of 30 minutes, the temperature was raised again to 2900 ° C at a rate of 10 ° C / min, and then 1 hour under no pressure. After heat treatment, the temperature is lowered to 1500 ° C. again and kept for 30 minutes.
While maintaining a pressure of 0 kg / cm 2 for 4 hours, block-shaped graphite was obtained.

【0024】(実施例3)縦7cm、横7cm、厚さ2
5μmの芳香族ポリアミド(PA)フィルム100枚を
重ねてグラファイト製の冶具にセットし、ホットプレス
電気炉にて以下のようにして焼成した。
(Example 3) Length 7 cm, width 7 cm, thickness 2
100 sheets of 5 μm aromatic polyamide (PA) films were stacked, set on a jig made of graphite, and baked in a hot press electric furnace as follows.

【0025】まず、アルゴンガス雰囲気中、10℃/m
inの速度で2800℃まで昇温した。この間フィルム
には、冶具重量による100g/cm2だけが加わるよ
うにした。温度が2800℃に達した後、300kg/
cm2の圧力をかけ、そのまま200kg/cm2の圧力
を維持しながら4時間保持した。続いて圧力をかけたま
ま1500℃まで降温し圧力を解除し、室温まで昇温し
た後、再び10℃/minの速度で3000℃まで昇温
した後、無圧力のもとで1時間熱処理を行い、再度、室
温まで降温した後、初期処理と同様に10℃/minで
2800℃まで昇温し、300kg/cm2の圧力をか
けながら4時間保持して、ブロック状グラファイトを得
た。
First, in an argon gas atmosphere, 10 ° C./m
The temperature was raised to 2800 ° C. at a rate of in. During this time, only 100 g / cm 2 of the jig weight was applied to the film. 300kg / after the temperature reaches 2800 ℃
A pressure of cm 2 was applied, and the pressure was maintained as it was for 4 hours while maintaining the pressure of 200 kg / cm 2 . Then, the pressure was released to 1500 ° C, the pressure was released, the temperature was raised to room temperature, the temperature was raised again to 3000 ° C at a rate of 10 ° C / min, and heat treatment was performed for 1 hour under no pressure. After the temperature was lowered to room temperature again, the temperature was raised to 2800 ° C. at 10 ° C./min and held for 4 hours while applying a pressure of 300 kg / cm 2 in the same manner as in the initial treatment to obtain a block-shaped graphite.

【0026】(実施例4)PAフィルムに代えてポリベ
ンゾビスチアゾ−ル(PBBT)フィルムを用いるよう
にした他は、実施例3と同様にしてブロック状グラファ
イトを得た。
Example 4 A block-like graphite was obtained in the same manner as in Example 3 except that a polybenzobisthiazole (PBBT) film was used instead of the PA film.

【0027】(実施例5)PAフィルムに代えてポリベ
ンゾオキサゾ−ル(PBO)フィルムを用いるようにし
た他は、実施例3と同様にしてブロック状グラファイト
を得た。
Example 5 A block graphite was obtained in the same manner as in Example 3 except that a polybenzoxazole (PBO) film was used instead of the PA film.

【0028】(実施例6)PAフィルムに代えてポリチ
アゾ−ル(PT)フィルムを用いるようにした他は、実
施例3と同様にしてブロック状グラファイトを得た。
(Example 6) Block graphite was obtained in the same manner as in Example 3 except that a polythiazole (PT) film was used instead of the PA film.

【0029】(実施例7)PAフィルムに代えてポリパ
ラフェニレンビニレン(PPV)フィルムを用いるよう
にした他は、実施例3と同様にしてブロック状グラファ
イトを得た。
Example 7 A block graphite was obtained in the same manner as in Example 3 except that a polyparaphenylene vinylene (PPV) film was used instead of the PA film.

【0030】実施例1から7で得られたブロック状グラ
ファイトは、しわの殆ど無い平滑な表面を有していた。
The block-shaped graphites obtained in Examples 1 to 7 had a smooth surface with almost no wrinkles.

【0031】本実施例によるロッキング特性と従来のロ
ッキングの特性を(表1)に示す。各ロッキング特性
は、理学電機社製ロ−タ−フレックスRU−200B型
X線回折装置を用いて測定した。グラファイト(00
2)回折線のピ−ク位置におけるロッキング特性測定の
結果得られた回折線の半値幅をもって評価した。
The locking characteristics according to this embodiment and the conventional locking characteristics are shown in (Table 1). Each rocking characteristic was measured by using a rotor flex RU-200B type X-ray diffractometer manufactured by Rigaku Denki Co., Ltd. Graphite (00
2) The half value width of the diffraction line obtained as a result of the measurement of the rocking characteristic at the peak position of the diffraction line was evaluated.

【0032】[0032]

【表1】 [Table 1]

【0033】この(表1)から明らかなように、本実施
例による高配向性グラファイトの製造方法は、いずれも
従来に比べて優れたロッキング特性を有し、X線や中子
線のモノクロメ−タ等に最適であることが分かる。
As is clear from (Table 1), all of the methods for producing highly oriented graphite according to the present embodiment have excellent rocking characteristics as compared with the conventional methods, and the X-ray and core wire monochromatic images are obtained. It turns out that it is most suitable for data.

【0034】[0034]

【発明の効果】以上のように本発明は、高分子フィルム
から得られた炭素質フィルムを複数枚積層して昇温し、
加圧処理を行った後、一旦降温し再び初期加圧処理以上
の温度域で無圧熱処理を行った後、再度降温の後、再び
昇温により、加圧処理を行いグラファイト化すること
で、しわや内部歪の無い優れた高配向性のグラファイト
が容易に得られるものである。また、請求項2の高分子
フィルムは、本発明の製造方法に非常に適しており、高
配向性グラファイトが得やすいものである。
As described above, according to the present invention, a plurality of carbonaceous films obtained from a polymer film are laminated and heated,
After performing the pressure treatment, the temperature is once lowered, and the pressureless heat treatment is again performed in the temperature range higher than the initial pressure treatment, and then the temperature is lowered again and the temperature is raised again to perform the pressure treatment and graphitize. It is possible to easily obtain an excellent highly oriented graphite without wrinkles or internal strain. Further, the polymer film of claim 2 is very suitable for the production method of the present invention, and easily obtains highly oriented graphite.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、ポリイミドフィルムの焼成の際の温度
−フィルム寸法および温度−フィルムのグラファイト化
率をあらわす特性図
FIG. 1 is a characteristic diagram showing temperature-film size and temperature-graphitization rate of a film when baking a polyimide film.

【符号の説明】[Explanation of symbols]

A フィルム寸法曲線 B グラファイト化率曲線 A Film size curve B Graphitization rate curve

───────────────────────────────────────────────────── フロントページの続き (72)発明者 村上 睦明 神奈川県川崎市多摩区東三田3丁目10番1 号 松下技研株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mutsumi Murakami 3-10-1 Higashisanda, Tama-ku, Kawasaki-shi, Kanagawa Matsushita Giken Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】複数枚の高分子フィルム、あるいは高分子
フィルムから得られた炭素質フィルムを複数枚積層し
て、2600℃以上の温度域で加圧処理を行った後、一
旦1500℃以下の温度域まで下げてから、再び初期加
圧処理以上の温度域で無圧熱処理を行った後、再度15
00℃以下の温度域まで下げ、再び初期の加圧処理温度
域以上まで昇温し、加圧処理を行うことによりグラファ
イト化することを特徴とする高配向グラファイトの製造
方法。
1. A plurality of polymer films, or a plurality of carbonaceous films obtained from the polymer films are laminated and subjected to a pressure treatment in a temperature range of 2600 ° C. or higher, and then once heated to 1500 ° C. or lower. After the temperature is lowered to the temperature range, the pressureless heat treatment is performed again in the temperature range above the initial pressurization process, and then 15 times again.
A method for producing highly oriented graphite, characterized in that the temperature is lowered to a temperature range of 00 ° C. or lower, the temperature is raised again to an initial pressure treatment temperature range or higher, and pressure treatment is performed to graphitize.
【請求項2】高分子フィルムが、ポリオキサジアゾ−
ル、芳香族ポリイミド、芳香族ポリアミド、ポリベンゾ
ビスチアゾ−ル、ポリベンゾオキサゾ−ル、ポリチアゾ
−ル、およびポリパラフェニレンビニレンのうちの少な
くともひとつからなる請求項1記載の高配向グラファイ
トの製造方法。
2. The polymer film is polyoxadiazo-
A highly-oriented graphite according to claim 1, which comprises at least one of the following: a polyimide, an aromatic polyimide, an aromatic polyamide, a polybenzobisthiazole, a polybenzoxazole, a polythiazole, and a polyparaphenylene vinylene. Production method.
JP3257393A 1991-10-04 1991-10-04 Production of highly oriented graphite Pending JPH0597418A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3257393A JPH0597418A (en) 1991-10-04 1991-10-04 Production of highly oriented graphite

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3257393A JPH0597418A (en) 1991-10-04 1991-10-04 Production of highly oriented graphite

Publications (1)

Publication Number Publication Date
JPH0597418A true JPH0597418A (en) 1993-04-20

Family

ID=17305768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3257393A Pending JPH0597418A (en) 1991-10-04 1991-10-04 Production of highly oriented graphite

Country Status (1)

Country Link
JP (1) JPH0597418A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0691803A1 (en) 1994-07-06 1996-01-10 Matsushita Electric Industrial Co., Ltd. Heat radiating member made of highly oriented graphite
JP2002308611A (en) * 2001-04-06 2002-10-23 Ube Ind Ltd Graphite laminar sheet material and method for manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0691803A1 (en) 1994-07-06 1996-01-10 Matsushita Electric Industrial Co., Ltd. Heat radiating member made of highly oriented graphite
JP2002308611A (en) * 2001-04-06 2002-10-23 Ube Ind Ltd Graphite laminar sheet material and method for manufacturing the same

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