JPH059499A - Cleaning agent composition - Google Patents
Cleaning agent compositionInfo
- Publication number
- JPH059499A JPH059499A JP3190926A JP19092691A JPH059499A JP H059499 A JPH059499 A JP H059499A JP 3190926 A JP3190926 A JP 3190926A JP 19092691 A JP19092691 A JP 19092691A JP H059499 A JPH059499 A JP H059499A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- ethylene oxide
- carbon atoms
- alcohol
- aliphatic saturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims description 18
- 239000012459 cleaning agent Substances 0.000 title abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 36
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 25
- -1 aliphatic saturated alcohol Chemical class 0.000 claims description 27
- 125000004432 carbon atom Chemical group C* 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000002736 nonionic surfactant Substances 0.000 claims description 4
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical class C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims 1
- 230000004907 flux Effects 0.000 abstract description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 8
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 6
- 229910000679 solder Inorganic materials 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 3
- 230000001464 adherent effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 14
- 235000019441 ethanol Nutrition 0.000 description 9
- 150000001298 alcohols Chemical class 0.000 description 6
- 239000003599 detergent Substances 0.000 description 5
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000002798 spectrophotometry method Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子部品用洗浄剤組成
物であり、主にプリント基板よりハンダフラックスの除
去に用いる洗浄剤組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning composition for electronic parts, and more particularly to a cleaning composition used for removing solder flux from a printed circuit board.
【0002】[0002]
【従来の技術】従来のプリント基板付着ハンダフラック
ス洗浄用洗浄剤としては、例えばCFC−113に代表
される通称フロン溶剤又は1,1,1−トリクロロエタ
ンに代表される塩素系溶剤が主として用いられていた。2. Description of the Related Art As a conventional cleaning agent for cleaning a solder flux attached to a printed circuit board, for example, a Freon solvent represented by CFC-113 or a chlorine-based solvent represented by 1,1,1-trichloroethane is mainly used. It was
【0003】[0003]
【発明が解決しようとする課題】しかしながら、このよ
うな従来のCFC−113或いは1,1,1−トリクロ
ロエタンにあっては、オゾン層を破壊する原因物質とし
て厳しい使用削減を計らねばならず、当該洗浄に用いる
事が不可能となってきたため、代替洗浄剤が広く要望さ
れてきている。代替洗浄には、オゾン破壊係数の少ない
或いは無い代替フロンや、アルコール或いは炭化水素油
を主成分とする水系洗浄剤又はアルカリを主成分とする
水系洗浄剤が広く提案されている。しかしながらこれら
代替フロン洗浄は、安全性・洗浄性・経済性の点におい
て充分に満足するレベルには到っておらず、アルコール
(系)洗浄は引火点の低い事より操業安全性に懸念が残
り、炭化水素油を主体とする水系洗浄又はアルカリを主
体とする水系洗浄剤は被洗浄素材選択性すなわち被洗浄
素材への影響場合により洗浄剤自身の残存等が懸念され
るという問題点があった。又特開平3−62895号公
報に開示されているような炭素数6〜22のアルコール
に炭素数2〜4のアルキレンオキシドを付加したものが
提案されているが、これらは洗浄性に劣り、目的とする
十分な洗浄効果が得られない。However, in such a conventional CFC-113 or 1,1,1-trichloroethane, it is necessary to severely reduce the use as a causative substance that destroys the ozone layer. Since it has become impossible to use for cleaning, alternative cleaning agents have been widely demanded. For alternative cleaning, alternative CFCs with or without ozone depletion potential, water-based cleaning agents containing alcohol or hydrocarbon oil as a main component, or water-based cleaning agents containing alkali as a main component have been widely proposed. However, these CFC cleaning alternatives have not reached a level that is sufficiently satisfactory in terms of safety, cleaning performance, and economical efficiency, and alcohol (based) cleaning has a low flash point, and there is concern about operational safety. The water-based cleaning mainly composed of hydrocarbon oil or the water-based cleaning composition mainly composed of alkali has a problem that selectivity of the material to be cleaned, that is, the cleaning material itself may remain due to influence on the material to be cleaned. . Further, it has been proposed that an alkylene oxide having 2 to 4 carbon atoms is added to an alcohol having 6 to 22 carbon atoms as disclosed in JP-A-3-62895. The sufficient cleaning effect cannot be obtained.
【0004】[0004]
【課題を解決するための手段】この発明は、このような
従来の問題点に着目してなされたものである。すなわ
ち、炭素数2〜4の脂肪族飽和アルコールのエチレンオ
キシド2〜4モル付加物及び炭素数6〜8の脂肪族飽和
アルコールのエチレンオキシド1〜3モル付加物から成
る電子部品用洗浄剤組成物である。The present invention has been made in view of the above-mentioned conventional problems. That is, it is a detergent composition for electronic parts, which comprises an ethylene oxide 2-4 mol addition product of a C2-4 aliphatic saturated alcohol and an ethylene oxide 1-3 mol addition product of a C6-8 aliphatic saturated alcohol. .
【0005】本発明の炭素数2〜4の脂肪族飽和アルコ
ールエチレンオキシド2〜4モル付加物に使用するアル
コールはエチルアルコール、プロピルアルコール、ブチ
ルアルコールが挙げられる。炭素数6〜8の脂肪族飽和
アルコールエチレンオキシド1〜3モル付加物に使用す
るアルコールはヘキシルアルコール、ヘプチルアルコー
ル、2エチルヘキシルアルコールが挙げられる。又、H
LB8〜12の非イオン界面活性剤は、炭素数2〜4の
オキシアルキレン鎖を有するアルキルフェニルエーテ
ル、アルキルエーテルやポリオキシエチレンポリオキシ
プロピレンブロックポリマー、ソルビタン脂肪酸エステ
ル、又はショ糖脂肪酸エステル等が挙げられる。Alcohols used in the aliphatic saturated alcohol having 2 to 4 carbon atoms and 2 to 4 moles of ethylene oxide of the present invention include ethyl alcohol, propyl alcohol and butyl alcohol. Alcohols used for 1 to 3 mol of aliphatic saturated alcohol ethylene oxide having 6 to 8 carbon atoms include hexyl alcohol, heptyl alcohol, and 2 ethylhexyl alcohol. Also, H
Examples of the nonionic surfactant of LB8 to 12 include alkylphenyl ether having an oxyalkylene chain having 2 to 4 carbon atoms, alkyl ether, polyoxyethylene polyoxypropylene block polymer, sorbitan fatty acid ester, sucrose fatty acid ester and the like. To be
【0006】上記成分以外に、任意的補助成分として、
アルカノールアミン、シクロヘキシルアミン等のアミン
類や、脂肪酸塩、アルキルベンゼンスルホン酸塩、ジア
ルキルスルホコハク酸エステル塩等のアニオン界面活性
剤やアルキルカルボキシベタイン、アルキルアミノカル
ボン酸、アルキルイミダゾリン等の両性界面活性剤或
は、アルキルピコリニウムクロライド、アルキルトリメ
チルアンモニウムクロライド等のカチオン界面活性剤が
添加される。In addition to the above-mentioned components, as an optional auxiliary component,
Amines such as alkanolamine and cyclohexylamine, anionic surfactants such as fatty acid salts, alkylbenzene sulfonates, and dialkylsulfosuccinic acid ester salts, and amphoteric surfactants such as alkylcarboxybetaines, alkylaminocarboxylic acids, and alkylimidazolines, or , Alkylpicolinium chloride, alkyltrimethylammonium chloride, and other cationic surfactants are added.
【0007】炭素数2〜4の脂肪族飽和アルコールのエ
チレンオキシド付加物並びに炭素数6〜8の脂肪族飽和
アルコールのエチレンオキシド付加物は、その2群を組
み合わせる事でその優れた洗浄効果が発揮され且つ、前
者は、エチレンオキシド付加モル数2〜4以外、後者は
1〜3モル付加以外では、良好なる効果が発現しない。
又、この2群の配合量として、全脂肪族飽和アルコール
中、炭素数2〜4の脂肪族飽和アルコールのエチレンオ
キシド2〜4モル付加物が70〜95重量%で、炭素数
6〜8の脂肪族飽和アルコールのエチレンオキシド1〜
3モル付加物が5〜30重量%の時、又は前者が5〜3
0重量%で後者が70〜95重量%の時に特に優れた洗
浄性が発現できる。The ethylene oxide adducts of aliphatic saturated alcohols having 2 to 4 carbon atoms and the ethylene oxide adducts of aliphatic saturated alcohols having 6 to 8 carbon atoms exhibit excellent cleaning effect by combining the two groups. The former does not exhibit good effects except when the number of moles of ethylene oxide added is 2 to 4, and the latter is other than the number of moles of 1 to 3 added.
Further, as the blending amount of these two groups, in the total aliphatic saturated alcohol, ethylene oxide 2 to 4 mol adduct of aliphatic saturated alcohol having 2 to 4 carbon atoms is 70 to 95% by weight, and fat having 6 to 8 carbon atoms is used. Ethylene oxide of group saturated alcohol 1-
When the 3 mol adduct is 5 to 30% by weight, or the former is 5 to 3%
When the amount of the latter is 0% by weight and the amount of the latter is 70 to 95% by weight, particularly excellent detergency can be exhibited.
【0008】更に前記2者の洗浄剤組成物80〜95重
量部、HLB8〜12の非イオン界面活性剤0.1〜5
重量部及び水5〜15重量部という構成をとる時にも更
に優れた洗浄性が発現できる。非イオン界面活性剤はH
LB8〜12の時、洗浄効果が優れ、HLBが8未満で
は洗浄性あるいは洗浄剤自身の残存が問題となる場合が
あり、HLBが12をこえると洗浄操作上発泡に問題が
生じる。又、水の存在は、15部をこえると洗浄性が劣
り、5部未満の場合洗浄組成物に引火性が発現しその取
り扱いが難しくなる。Further, 80 to 95 parts by weight of the above two detergent compositions and 0.1 to 5 of HLB 8 to 12 nonionic surfactants.
Even when the composition is composed of 5 parts by weight of water and 5 to 15 parts by weight of water, more excellent detergency can be exhibited. Nonionic surfactant is H
When the LB is 8 to 12, the cleaning effect is excellent, and when the HLB is less than 8, the cleaning property or the residual of the cleaning agent itself may be a problem, and when the HLB is more than 12, foaming occurs in the cleaning operation. When the amount of water exceeds 15 parts, the detergency is poor, and when the amount of water is less than 5 parts, the detergency of the cleaning composition is manifested and the handling becomes difficult.
【0009】本願発明洗浄剤はそのまま、或は、水で希
釈して浸漬(揺動)・超音波又は噴霧等の洗浄方式に基
づき、プリント基板等に付着、或は残存するハンダフラ
ックスの洗浄処理を行う事が出来る。The cleaning agent of the present invention is used as it is, or after being diluted with water, it is subjected to cleaning treatment of solder flux that adheres to or remains on the printed circuit board based on a cleaning method such as immersion (swing), ultrasonic waves or spraying. Can be done.
【0010】[0010]
【作用】本発明の電子部品用洗浄剤組成物は炭素数2〜
4の脂肪族飽和アルコールのエチレンオキシド付加物と
炭素数6〜8の脂肪族飽和アルコールのエチレンオキシ
ド付加物の両者を併用することによって、そのメカニズ
ムは定かではないが優れた洗浄効果を発現する。これら
の内どちらかが欠けても目的とする洗浄効果は得られな
い。The cleaning composition for electronic parts of the present invention has 2 to 2 carbon atoms.
By using both the ethylene oxide adduct of aliphatic saturated alcohol of 4 and the ethylene oxide adduct of aliphatic saturated alcohol of 6 to 8 carbon atoms in combination, an excellent cleaning effect is exhibited although the mechanism is not clear. If either of these is missing, the desired cleaning effect cannot be obtained.
【0011】[0011]
【実施例】次に実施例により本発明を具体的に説明す
る。
効果例−1
ICチップ装着、油性フラックス付着モデル基板を表
1,表2の各々の洗浄剤で50℃、20秒間浸漬処理の
後、50℃、40秒間で1kg/cm2 圧のスプレー洗
浄を行う。次に後リンス処理を実施し乾燥後、残存フラ
ックスを紫外分光光度法にて測定し、次式により洗浄性
(%)を求める。結果を表3に示す。
洗浄性(%)=(付着油性フラックス(mg)−残存油性フ
ラックス(mg))÷付着油性フラックス(mg)×100EXAMPLES The present invention will be described in detail with reference to examples. Example of effect-1 An IC chip mounted, oil-based flux adhesion model substrate is immersed in each of the cleaning agents shown in Tables 1 and 2 at 50 ° C for 20 seconds, and then spray washed at 1 ° C / cm 2 pressure at 50 ° C for 40 seconds. To do. Then, after post-rinsing treatment and drying, the residual flux is measured by an ultraviolet spectrophotometric method, and the cleaning property (%) is determined by the following formula. The results are shown in Table 3. Detergency (%) = (Adhesive oily flux (mg) -Residual oily flux (mg)) / Adhesive oily flux (mg) x 100
【0012】効果例−2
銅板上に所定量のクリームハンダ材を塗布し、熱処理を
行いモデル汚染板を作成する。表1,表2の各々の洗浄
剤で55℃、40秒間超音波洗浄を行い、次に後リンス
処理を行い乾燥後、残存フラックス紫外分光光度法にて
効果例−1と同様に評価する。結果を表3に示す。Effect Example-2 A predetermined amount of cream solder material is applied on a copper plate and heat-treated to prepare a model contaminated plate. Ultrasonic cleaning is performed at 55 ° C. for 40 seconds with each of the cleaning agents in Tables 1 and 2, then post-rinse treatment is performed, and after drying, evaluation is performed by the residual flux ultraviolet spectrophotometry in the same manner as in Effect Example-1. The results are shown in Table 3.
【0013】効果例−3
効果例−2と同様に洗浄処理を行い、40℃流水中での
リンス挙動を以下の基準にて目視評価する。結果を表3
に示す。
◎ 優れたリンス性を呈す。
○ 良好なリンス性を呈す。
△ ややリンス性が劣る。
× 全んどリンス性を呈さない。Effect example-3 The same cleaning treatment as in effect example-2 is performed, and the rinse behavior in running water at 40 ° C is visually evaluated according to the following criteria. The results are shown in Table 3.
Shown in. ◎ Exhibits excellent rinsing property. ○ Good rinsing property is exhibited. Fairly inferior in rinsing property. × It shows almost no rinsing property.
【0014】[0014]
【表1】 [Table 1]
【0015】[0015]
【表2】 [Table 2]
【0016】[0016]
【表3】 [Table 3]
【0017】本発明洗浄剤組成物1〜3はいずれも優れ
た洗浄性と洗浄剤残存にともなう、優れたリンス挙動が
発現される。一方、比較洗浄剤組成物は、
A)は炭素数2〜4の脂肪族飽和アルコールが炭素数1
となる為、洗浄力に劣る。
B)は炭素数2〜4の脂肪族飽和アルコールのプロピレ
ンオキシドとなる為、洗浄力、リンス挙動に劣る。
C)は炭素数2〜4の脂肪族飽和アルコールのエチレン
オキシド付加モル数が低く洗浄力に劣る。
D)は炭素数6〜8の脂肪族飽和アルコールのエチレン
オキシド付加モル数が高く、洗浄力に劣る。
E)は脂肪族飽和アルコールのエチレンオキシドが炭素
数2〜4タイプしか含有せず且つ界面活性剤のHLBが
低く、洗浄力、リンス挙動に劣る。
F)は脂肪族飽和アルコールのエチレンオキシドが炭素
数6〜8タイプしか含有せず且つ界面活性剤のHLBが
高く、特に洗浄力に劣る。
G)は比較的高い洗浄力を示すもののオゾン層破壊原因
物質であり、
H)は比較的高い洗浄力を示すものの、引火点が低くそ
の取り扱いに問題を有する。
I)は脂肪族飽和アルコールの炭素数が6〜8のエチレ
ンオキシド付加物単独であり、洗浄力、リンス性に劣
る。
本発明洗浄剤組成物はオゾン層破壊する原因物質に該当
せず、かつCFC−113と同様な洗浄効果を示し、取
り扱い上安全で優れた洗浄力を発揮するものである。All of the cleaning compositions 1 to 3 of the present invention exhibit excellent detergency and excellent rinsing behavior due to residual cleaning agent. On the other hand, in the comparative detergent composition, in A), the aliphatic saturated alcohol having 2 to 4 carbon atoms has 1 carbon atom.
Therefore, the cleaning power is inferior. Since B) is propylene oxide of an aliphatic saturated alcohol having 2 to 4 carbon atoms, it has poor detergency and rinse behavior. C) has a low ethylene oxide addition mole number of an aliphatic saturated alcohol having 2 to 4 carbon atoms and is poor in detergency. In D), the number of moles of ethylene oxide added to the aliphatic saturated alcohol having 6 to 8 carbon atoms is high and the detergency is poor. In E), the ethylene oxide of the aliphatic saturated alcohol contains only 2 to 4 carbon atoms and the surfactant has a low HLB, and the detergency and rinse behavior are poor. In F), the ethylene oxide of the aliphatic saturated alcohol contains only 6 to 8 carbon atoms, and the HLB of the surfactant is high, and the detergency is particularly poor. G) has a relatively high detergency, but is a substance that causes ozone layer depletion, and H) has a relatively high detergency, but has a low flash point and has a problem in its handling. I) is an ethylene oxide adduct having 6 to 8 carbon atoms of an aliphatic saturated alcohol, and is inferior in detergency and rinsing property. The cleaning composition of the present invention does not correspond to a causative substance that destroys the ozone layer, exhibits the same cleaning effect as CFC-113, and is safe in handling and exhibits excellent cleaning power.
【0018】[0018]
【発明の効果】本発明洗浄剤組成物は、CFC−113
或いは1,1,1−トリクロロエタン等ロジン系フラッ
クス洗浄用に用いられる水溶性洗浄剤組成物でオゾン層
破壊に原因する物質を全く含有せず、アルコール系洗浄
剤に比較し、引火点を持たず取り扱いが容易であり且つ
優れた洗浄効果を有し、炭化水素油を主体とする水系洗
浄剤やアルカリ水系洗浄剤等に比べ被洗浄素材への影響
が少なく、除去性すなわち洗浄剤自身の残存も著しく低
く、且つ優れた洗浄効果を発揮するものである。The cleaning composition of the present invention is CFC-113.
Alternatively, the water-soluble detergent composition used for washing rosin-based flux such as 1,1,1-trichloroethane does not contain any substance causing ozone layer depletion and has no flash point as compared with alcohol-based detergent. It is easy to handle and has an excellent cleaning effect. It has less effect on the material to be cleaned than water-based cleaning agents mainly composed of hydrocarbon oil or alkaline water-based cleaning agents, and the removability, that is, the cleaning agent itself remains. It is extremely low and exhibits an excellent cleaning effect.
Claims (3)
エチレンオキシド2〜4モル付加物及び炭素数6〜8の
脂肪族飽和アルコールのエチレンオキシド1〜3モル付
加物からなる電子部品用洗浄剤組成物。1. A cleaning composition for electronic parts, which comprises an adduct of 2 to 4 mol of ethylene oxide with a saturated aliphatic alcohol having 2 to 4 carbon atoms and an adduct of 1 to 3 mol of ethylene oxide with an aliphatic saturated alcohol having 6 to 8 carbon atoms. object.
オキシド付加物中、(a)炭素数2〜4の脂肪族飽和ア
ルコールのエチレンオキシド2〜4モル付加物が70〜
95重量%及び炭素数6〜8の脂肪族飽和アルコールの
エチレンオキシド1〜3モル付加物が5〜30重量%、
又は、(b)炭素数2〜4の脂肪族飽和アルコールのエ
チレンオキシド2〜4モル付加物が5〜30重量%及び
炭素数6〜8の脂肪族飽和アルコールのエチレンオキシ
ド1〜3モル付加物が70〜95重量%からなる請求項
1記載の電子部品用洗浄剤組成物。2. Among the ethylene oxide adducts of the total aliphatic saturated alcohol, 70 to 70% of (a) an ethylene oxide 2 to 4 mol adduct of an aliphatic saturated alcohol having 2 to 4 carbon atoms is used.
95 wt% and 5 to 30 wt% of an ethylene oxide 1 to 3 mol adduct of an aliphatic saturated alcohol having 6 to 8 carbon atoms,
Or (b) 5 to 30% by weight of an ethylene oxide 2 to 4 mol adduct of an aliphatic saturated alcohol having 2 to 4 carbon atoms and 70 to 1 to 3 mol of an ethylene oxide adduct of an aliphatic saturated alcohol of 6 to 8 carbon atoms. The cleaning composition for electronic parts according to claim 1, which comprises ˜95% by weight.
〜95重量部、HLB8〜12の非イオン界面活性剤
0.1〜5重量部及び水5〜15重量部からなる電子部
品用洗浄剤組成物。3. The cleaning composition 80 according to claim 1 or 2.
To 95 parts by weight, 0.1 to 5 parts by weight of nonionic surfactant of HLB 8 to 12 and 5 to 15 parts by weight of water, a cleaning composition for electronic parts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3190926A JPH0756039B2 (en) | 1991-07-04 | 1991-07-04 | Cleaning composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3190926A JPH0756039B2 (en) | 1991-07-04 | 1991-07-04 | Cleaning composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH059499A true JPH059499A (en) | 1993-01-19 |
JPH0756039B2 JPH0756039B2 (en) | 1995-06-14 |
Family
ID=16265989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3190926A Expired - Fee Related JPH0756039B2 (en) | 1991-07-04 | 1991-07-04 | Cleaning composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0756039B2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6369897A (en) * | 1986-09-11 | 1988-03-29 | 第一工業製薬株式会社 | Detergent composition |
JPH0362895A (en) * | 1989-07-31 | 1991-03-18 | Kao Corp | Detergent composition |
EP0426943A2 (en) * | 1989-11-08 | 1991-05-15 | Arakawa Chemical Industries, Ltd. | Agent and method for removing rosinbase solder flux |
JPH03162496A (en) * | 1989-11-21 | 1991-07-12 | Kao Corp | Detergent composition |
-
1991
- 1991-07-04 JP JP3190926A patent/JPH0756039B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6369897A (en) * | 1986-09-11 | 1988-03-29 | 第一工業製薬株式会社 | Detergent composition |
JPH0362895A (en) * | 1989-07-31 | 1991-03-18 | Kao Corp | Detergent composition |
EP0426943A2 (en) * | 1989-11-08 | 1991-05-15 | Arakawa Chemical Industries, Ltd. | Agent and method for removing rosinbase solder flux |
JPH03227400A (en) * | 1989-11-08 | 1991-10-08 | Arakawa Chem Ind Co Ltd | Detergent for washing rosin-based soldering flux and washing method of same flux |
JPH03162496A (en) * | 1989-11-21 | 1991-07-12 | Kao Corp | Detergent composition |
Also Published As
Publication number | Publication date |
---|---|
JPH0756039B2 (en) | 1995-06-14 |
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