JPH0457897A - Detergent composition - Google Patents

Detergent composition

Info

Publication number
JPH0457897A
JPH0457897A JP16889790A JP16889790A JPH0457897A JP H0457897 A JPH0457897 A JP H0457897A JP 16889790 A JP16889790 A JP 16889790A JP 16889790 A JP16889790 A JP 16889790A JP H0457897 A JPH0457897 A JP H0457897A
Authority
JP
Japan
Prior art keywords
cleaning
parts
formulas
cleaning composition
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16889790A
Other languages
Japanese (ja)
Other versions
JPH08917B2 (en
Inventor
Kozo Kitazawa
北澤 宏造
Eiji Kashihara
栄二 樫原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Priority to JP2168897A priority Critical patent/JPH08917B2/en
Publication of JPH0457897A publication Critical patent/JPH0457897A/en
Publication of JPH08917B2 publication Critical patent/JPH08917B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Detergent Compositions (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To prepare a detergent compsn. excellent in detergency, safety and adaptability to rinsing and free from the danger of environmental pollution by compounding a specified alkylene oxide and an amine compd. CONSTITUTION:A detergent compsn. comprising 50% wt. or above of an alkylene oxide compd. selected from those of formulas I, II and III and 0.05-5% wt. of an amine compd. having 1-5 nitrogen atoms and a mol. wt. of 50-300. In the formulas, R<1> is a 1-22C hydrocarbon residue; R<2> and R<3> are each a 2-4C alkylene group; Y is H or 1-4C alkyl or acyl; (m) is 1-15; and (n), (l) and (p) are each 0-15. The detergent compsn. is useful as a detergent for precision parts or the jigs and tools used in assembling precision parts thereof. By adding a surfactant, the compsn. is additionally improved in adaptability to rinsing and detergency.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は洗浄剤組成物、更に詳しくは精密部品又はその
組立加工工程に使用される治工具類の固体表面に存在す
る、油脂、機械油、切削油、グリース、液晶、ロジン系
フラックス等の汚れの除去性に優れ、かつすすぎ性に優
れた洗浄剤組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a cleaning composition, and more particularly, to a cleaning composition that cleanses oils, fats, and machine oils that exist on the solid surfaces of precision parts or jigs and tools used in the assembly process thereof. The present invention relates to a cleaning composition that is excellent in removing stains such as cutting oil, grease, liquid crystal, rosin flux, etc., and has excellent rinsability.

〔従来の技術及び発明が解決しようとする課題〕従来、
精密部品、治工具類等の固体表面に存在する油脂等の有
機物を主体とする汚れの除去には、ケロシン、ベンゼン
、キシレン等の炭化水素系溶剤; ) IJクロロエチ
レン、テトラクロロエチレン等の塩素系溶剤;トリクロ
ロトリフルオロエタン等のフロン系溶剤;オルソケイ酸
ソーダや苛性ソ−ダに界面活性剤やビルグーを配合した
水系の洗浄剤等が使用されている。特に電子、電気、機
械等の部品にはその高洗浄性、難燃性という特性を生か
してフロン系溶剤又は塩素系溶剤が使用されている。
[Problems to be solved by conventional techniques and inventions] Conventionally,
Hydrocarbon solvents such as kerosene, benzene, xylene, etc.; ) Chlorinated solvents such as IJ chloroethylene, tetrachloroethylene, etc. to remove stains mainly composed of organic substances such as oils and fats that exist on the solid surfaces of precision parts, tools, etc. ; Freon-based solvents such as trichlorotrifluoroethane; water-based cleaning agents containing sodium orthosilicate or caustic soda mixed with surfactants and virgoo are used. In particular, fluorocarbon solvents or chlorinated solvents are used for electronic, electrical, mechanical, and other parts due to their high cleaning properties and flame retardant properties.

しかしながら、塩素系及びフロン系の溶剤を用いる洗浄
剤は、安全性、毒性、環境汚染性等に大きな問題を有し
ている。また、炭化水素系溶剤、特ニベンゼン、キシレ
ン等は毒性が高く、労働安全衛生法上の有害物に指定さ
れている化合物であって、これを取り扱う作業の危険性
及び煩雑さを考慮すると、洗浄剤として用いることは好
ましくない。一方、水系洗浄剤は、溶剤系洗浄剤に比較
して危険性と毒性が低い点では好ましいが、洗浄力にふ
いて数段劣っている。
However, cleaning agents using chlorine-based and fluorocarbon-based solvents have major problems in terms of safety, toxicity, environmental pollution, and the like. In addition, hydrocarbon solvents, especially nibenzene, xylene, etc., are highly toxic compounds and are designated as hazardous substances under the Industrial Safety and Health Act. It is not preferable to use it as an agent. On the other hand, water-based cleaning agents are preferable in that they are less dangerous and toxic than solvent-based cleaning agents, but they are several steps inferior in cleaning power.

そこで、近年、環境汚染が少なくかつ安全性の高い洗浄
剤として、米国特許第4.511.488号明細書、同
第4.640.719号明細書、同第4.740.24
7号明細書等に見られるようなリモネン、ピネン、ジペ
ンテン等のテルペン類が提案されている。これらリモネ
ンに代表されるテルペン類は、安全性と洗浄性を両立さ
せ得る化合物であるが、引火点が低く、使用時の設備が
大がかりとなる。又、天然物由来のために安定品質の物
が得難く、供給量に限界があり、工業用洗浄剤として実
際的ではない。
Therefore, in recent years, US Pat. No. 4.511.488, US Pat. No. 4.640.719, and US Pat.
Terpenes such as limonene, pinene, and dipentene, as seen in Specification No. 7, have been proposed. These terpenes, typified by limonene, are compounds that are both safe and easy to clean, but they have a low flash point and require large-scale equipment when used. Furthermore, because it is derived from natural products, it is difficult to obtain products of stable quality, and there is a limit to the amount of supply, making it impractical as an industrial cleaning agent.

一方、洗浄後、洗浄剤が残留するとプラスチック部品等
に悪影響を与えることがあるため、洗浄後のすすぎ性も
問題となっている。
On the other hand, rinsability after cleaning is also a problem, since residual cleaning agents may have an adverse effect on plastic parts and the like.

本発明の目的は、上述のような従来洗浄剤のもつ欠点を
改良した、洗浄性、安全性に優れ、かつ環境汚染がなく
、すすぎ性に優れている、精密部品又はその組立加工工
程に用いられる治工具類の固体表面に存在する油脂、機
械油、切削油、グリース、液晶、ロジン系フラックス等
の汚れ成分を除去するための洗浄剤組成物を提供するこ
とにある。
The object of the present invention is to improve the shortcomings of conventional cleaning agents as described above, to have excellent cleaning properties, safety, no environmental pollution, and excellent rinsability, and to be used for precision parts or their assembly processing process. An object of the present invention is to provide a cleaning composition for removing dirt components such as oils and fats, machine oil, cutting oil, grease, liquid crystal, and rosin-based flux existing on the solid surfaces of jigs and tools.

〔課題を解決するための手段〕[Means to solve the problem]

斯かる実情において本発明者らは上記課題を解決すべく
鋭意研究を行った結果、特定のアルキレンオキサイド化
合物にアミン系化合物を配合すれば前記の条件を具備し
た洗浄剤組成物が得られることを見出し、本発明を完成
した。
Under these circumstances, the present inventors have conducted extensive research to solve the above problems, and have found that a cleaning composition that meets the above conditions can be obtained by blending an amine compound with a specific alkylene oxide compound. The present invention has been completed.

すなわち、本発明は次の成分(A>及び(B)(A) 
 次の一般式(I)、(II)及び(III)R’−0
−GR”0÷1−−(R30IY        (I
)R’−COO+R2叶1−←”0)−r−Y    
(II)〔式中、R’は炭素数1〜22の炭化水素残基
を示し、R2及びR3はそれぞれ炭素数2〜4のアルキ
レン基を示し、Yは水素原子又は炭素数1〜4のアルキ
ル基若しくはアシル基を示し、0は1〜15の整数を、
n、1及びpはそれぞれ0〜15の整数を示す〕 で表わされる化合物からなる群より選ばれるアルキレン
オキサイド化合物    50重量%以上(B)  窒
素原子数が1〜5で分子量が50〜300の範囲である
アミン系化合物 0.05〜5重量%を含有する精密部
品又は治工具類用洗浄剤組成物を提供するものである。
That is, the present invention comprises the following components (A> and (B) (A)
The following general formulas (I), (II) and (III) R'-0
-GR"0÷1--(R30IY (I
)R'-COO+R2 Kano 1-←”0)-r-Y
(II) [In the formula, R' represents a hydrocarbon residue having 1 to 22 carbon atoms, R2 and R3 each represent an alkylene group having 2 to 4 carbon atoms, and Y is a hydrogen atom or a hydrocarbon residue having 1 to 4 carbon atoms. represents an alkyl group or an acyl group, 0 is an integer of 1 to 15,
n, 1 and p each represent an integer of 0 to 15] Alkylene oxide compound selected from the group consisting of compounds represented by 50% by weight or more (B) The number of nitrogen atoms is 1 to 5 and the molecular weight is in the range of 50 to 300. The present invention provides a cleaning composition for precision parts or tools containing 0.05 to 5% by weight of an amine compound.

本発明の洗浄剤組成物における(A)成分のアルキレン
オキサイド化合物は前記一般式(I)、(If)又は(
II[)で表わされる。
The alkylene oxide compound as component (A) in the cleaning composition of the present invention has the general formula (I), (If) or (
It is represented by II[).

一般式(I)、(II)及び(III)中、litは炭
素数1〜22の炭化水素残基であることが必要であるが
、特に炭素数4〜14の炭化水素残基であることが好ま
しい。R’が炭化水素残基でなかった場合、フラックス
や鉱油類等の有機系汚れとの親和性が低下し、また、R
’の炭化水素残基の炭素数が22を超えると洗浄液中に
固形分が析出しやすくなり、洗浄液自体の粘度も上昇す
るため、作業性及び洗浄性が低下する。
In general formulas (I), (II), and (III), lit must be a hydrocarbon residue having 1 to 22 carbon atoms, particularly a hydrocarbon residue having 4 to 14 carbon atoms. is preferred. If R' is not a hydrocarbon residue, the affinity with organic stains such as flux and mineral oils will decrease;
If the number of carbon atoms in the hydrocarbon residue exceeds 22, solid content tends to precipitate in the cleaning liquid, and the viscosity of the cleaning liquid itself also increases, resulting in decreased workability and cleaning performance.

また、mは1〜15、nSl及びpはそれぞれ0〜15
の整数であることが必要である。m十nは1〜15の範
囲であることが好ましく、特にm+n及び1+pがそれ
ぞれ1〜10の範囲のものが優れた効果を示す。
In addition, m is 1 to 15, and nSl and p are each 0 to 15.
must be an integer. It is preferable that m+n is in the range of 1 to 15, and particularly those in which m+n and 1+p are each in the range of 1 to 10 exhibit excellent effects.

斯かるひ)成分のアルキレンオキサイド化合物のIll
]としては、メチルアルコール、エチルアルコール、プ
ロピルアルコール、ブチルアルコール、イソブチルアル
コール、ヘキシルアルコール、オクチルアルコール、ラ
ウリルアルコール、オレイルアルコール、炭素数18の
ゲルベアルコール等の直鎮又は分岐鎖のアルキル基を有
するアルコール類;フェノール、クレゾール、ノニルフ
ェノール、スチレン化フェノール等のフェノール類;シ
クロヘキサノール等の脂環族のアルコール類;酢酸、プ
ロピオン酸、ヘキサン酸、イソオクチル酸、ラウリン酸
、オレイン酸、ステアリン酸、炭素数22のゲルベ酸等
の直鎖又は分岐鎖のアルキル基を有する脂肪酸;メタア
クリル酸、安息香酸等の有機カルボン酸;エチルアミン
、ジエチルアミン、ヘキシルアミン、ジブチルアミン、
オクチルアミン、ラウリルアミン、オレイルアミン、ベ
ンジルアミン、シクロヘキシルアミン等の直鎮、分岐鎖
、芳香族又は脂環族の炭化水素残基を有するアミン類な
どにアルキレン(エチレン、プロピレン、ブチレン)オ
キサイドを単独又は配合付加させたものが挙げられ、更
に、これらのアルキレンオキサイド付加物の末端水酸基
をアルキルクロライド等によりメチル化、エチル化又は
ブチル化したり、酢酸やプロピオン酸等でエステル化し
た化合物が挙げられる。
Ill of the alkylene oxide compound of the component
] Examples include alcohols having straight or branched alkyl groups such as methyl alcohol, ethyl alcohol, propyl alcohol, butyl alcohol, isobutyl alcohol, hexyl alcohol, octyl alcohol, lauryl alcohol, oleyl alcohol, and Guerbet alcohol having 18 carbon atoms. Phenols such as phenol, cresol, nonylphenol, and styrenated phenol; Alicyclic alcohols such as cyclohexanol; Acetic acid, propionic acid, hexanoic acid, isooctylic acid, lauric acid, oleic acid, stearic acid, carbon number 22 Fatty acids with linear or branched alkyl groups such as Guerbet's acid; organic carboxylic acids such as methacrylic acid and benzoic acid; ethylamine, diethylamine, hexylamine, dibutylamine,
Alkylene (ethylene, propylene, butylene) oxide alone or Further examples include compounds in which the terminal hydroxyl group of these alkylene oxide adducts is methylated, ethylated, or butylated with alkyl chloride, etc., or esterified with acetic acid, propionic acid, etc.

(A)M分のアルキレンオキサイド化合物は1種を単独
で又は2種以上を組み合わせて配合することができ、洗
浄性を維持し、かつその持続性を確保する目的で本発明
洗浄剤組成物中に50重量%(以下、単に「%」で示す
)以上配合される。
(A) The alkylene oxide compound having an M content can be blended singly or in combination of two or more, and is included in the cleaning composition of the present invention for the purpose of maintaining detergency and ensuring its sustainability. It is blended in an amount of 50% by weight or more (hereinafter simply expressed as "%").

(A)成分のアルキレンオキサイド化合物は、これのみ
でもある程度の洗浄力を有するが、(B)成分のアミン
系化合物を併用することにより、特に水分が混入した際
でも洗浄性が良好となる。
The alkylene oxide compound as component (A) has a certain degree of cleaning power by itself, but when used in combination with the amine compound as component (B), the cleaning performance becomes good even when water is mixed in.

(B)成分のアミン系化合物としては、窒素原子数が1
〜5で分子量が50〜300の範囲のものが用いられる
。分子量が50未満では得られる洗浄剤組成物の臭いが
強くなりすぎ、また、分子量が300を超えると洗浄性
改善効果が少なくなる1゜斯かる(B)成分のアミン系
化合物の具体例としては、モノエタノールアミン、ジェ
タノールアミン、トリエタノールアミン、ジメチルエタ
ノールアミン、ジブチルエタノールアミン等のアルキロ
ールアミン類;モルホリン、エチルモルホリン等のモル
ホリン類;ピペラジン、トリエチルジアミン、ペンタメ
チルジエチレントリアミン、テトラメチルプロピレンジ
アミン等が挙げられる。
The amine compound of component (B) has a nitrogen atom number of 1.
~5 and a molecular weight in the range of 50 to 300 is used. If the molecular weight is less than 50, the odor of the resulting cleaning composition will be too strong, and if the molecular weight exceeds 300, the cleaning performance improvement effect will be reduced. , monoethanolamine, jetanolamine, triethanolamine, dimethylethanolamine, dibutylethanolamine, and other alkylolamines; morpholine, ethylmorpholine, and other morpholines; piperazine, triethyldiamine, pentamethyldiethylenetriamine, tetramethylpropylenediamine, etc. can be mentioned.

(B)成分のアミン系化合物は本発明洗浄剤組成物中に
0.05〜5%配合される。配合量が0.05%未満で
あると洗浄性改善効果が充分でなく、また配合量が5%
を超えると洗浄剤組成物が強アルカリ性になり過ぎるた
め、アルミ等の材質に対する腐食やプラスチック等の材
質に対する物性劣化等の影響を及ぼす。
The amine compound (B) component is blended in the detergent composition of the present invention in an amount of 0.05 to 5%. If the blending amount is less than 0.05%, the cleaning performance improvement effect will not be sufficient, and if the blending amount is 5%.
If it exceeds 100%, the cleaning composition becomes too strongly alkaline, which may cause corrosion of materials such as aluminum and deterioration of physical properties of materials such as plastic.

本発明の洗浄剤組成物には更に(C)成分の界面活性剤
を配合することにより、水リンス性が向上し、更に洗浄
力が増大する。
By further blending component (C), a surfactant, in the cleaning composition of the present invention, the water rinsing properties are improved and the cleaning power is further increased.

(C)成分の界面活性剤としては、アニオン性活性剤、
カチオン性活性剤、非イオン性活性剤、両イオン性活性
剤のいずれも使用することができる。
As the surfactant of component (C), anionic surfactant,
Any of cationic activators, nonionic activators, and amphoteric activators can be used.

より具体的には、脂肪酸塩類、高級アルコール硫酸エス
テル塩類、液体脂肪油硫酸エステル塩類、脂肪族アミン
及び脂肪族アマイドの硫酸塩類、脂肪アルコールリン酸
エステル塩類、二塩基性脂肪酸エステルのスルホン塩類
、脂肪酸アミドスルホン酸塩類、アルキルアリルスルホ
ン酸塩類、ホルマリン縮合のナフタリンスルホン酸塩類
等のアニオン性活性剤;脂肪族アミン塩類、第4級アン
モニウム塩類、アルキルピリジニウム塩類等のカチオン
性活性剤;ポリオキシアルキレンアルキルエーテル類、
ポリオキシアルキレンアルキルフェノールエーテル類、
ポリオキシアルキレンアルキルアミン類、ポリオキシア
ルキレンアルキルエステル類、ソルビタンアルキルエス
テル類、ポリオキシソルビタンアルキルエステル類等の
非イオン性活性剤:あるいはアルキルベタイン、アルキ
ルジメチルアミンオキサイド、アルキルアラニン等の両
イオン性活性剤等が主だった物として上げられる。尚、
ここでポリオキシアルキレンとはエチレンオキサイド、
プロピレンオキサイド又はブチレンオキサイドの重合体
を示す。
More specifically, fatty acid salts, higher alcohol sulfate ester salts, liquid fatty oil sulfate ester salts, sulfates of aliphatic amines and aliphatic amides, fatty alcohol phosphate ester salts, sulfone salts of dibasic fatty acid esters, fatty acids Anionic activators such as amidosulfonates, alkylallylsulfonates, and formalin-condensed naphthalene sulfonates; cationic activators such as aliphatic amine salts, quaternary ammonium salts, alkylpyridinium salts; polyoxyalkylene alkyl ethers,
polyoxyalkylene alkylphenol ethers,
Nonionic active agents such as polyoxyalkylene alkyl amines, polyoxyalkylene alkyl esters, sorbitan alkyl esters, and polyoxysorbitan alkyl esters; or zwitterionic active agents such as alkyl betaines, alkyldimethylamine oxides, and alkylalanines. Agents are listed as the main items. still,
Here, polyoxyalkylene refers to ethylene oxide,
Indicates a polymer of propylene oxide or butylene oxide.

これら(C)成分の界面活性剤は本発明洗浄剤組成物中
に0.01〜30%、特に0.5〜10%配合されるこ
とが好ましい。配合量が0.01%未満では界面活性剤
を加えたことによる特別の効果は発現せず、また配合量
が30%を超えてもそれ以上添加した効果は得られにく
い。
These (C) component surfactants are preferably blended in the cleaning composition of the present invention in an amount of 0.01 to 30%, particularly 0.5 to 10%. If the blending amount is less than 0.01%, no special effect will be produced by adding the surfactant, and even if the blending amount exceeds 30%, it is difficult to obtain the effect of adding more.

更に本発明の洗浄剤組成物は水を含有させることにより
、有機性の汚れ以外のイオン化しやすい無機性の汚れ等
のより広範囲の汚れに対する洗浄性を示すようになる。
Furthermore, by containing water, the cleaning composition of the present invention exhibits cleaning properties against a wider range of stains such as inorganic stains that are easily ionized other than organic stains.

水は本発明洗浄剤組成物中に5〜45%、特に10〜3
0%配合されることが好ましい。配合量が5%未満では
水の添加による効果が得られにくく、また配合量が45
%を超えると有機性の汚れに対する洗浄性が低下し好ま
−しくない。
The amount of water in the cleaning composition of the present invention is 5 to 45%, especially 10 to 3%.
It is preferable that it be blended in an amount of 0%. If the blending amount is less than 5%, it is difficult to obtain the effect of adding water;
If it exceeds %, the cleaning performance against organic stains deteriorates, which is not preferable.

また、本発明の洗浄剤組成物には、本発明の効果を損わ
ない範囲で、必要に応じて更にヒドロキシエチルイミノ
2酢酸、エチレンジアミンテトラ酢酸等のアミノカルボ
ン酸塩等のキレート力を持つ化合物や防腐剤、酸化防止
剤、防錆剤、アルコール類、炭化水素系溶剤などを配合
することができる。
In addition, the cleaning composition of the present invention may further contain compounds having chelating power such as aminocarboxylic acid salts such as hydroxyethylimino diacetic acid and ethylenediaminetetraacetic acid, if necessary, within a range that does not impair the effects of the present invention. Preservatives, antioxidants, rust preventives, alcohols, hydrocarbon solvents, etc. can be added.

本発明の洗浄剤は、精密部品及びその組立加工工程に使
用される治工具類の洗浄に特に優れた効果を有するが、
ここで精密部品とは、例えば電子部品、電機部品、精密
機械部品、樹脂加工部品、光学部品等をいう。ここで、
電子部品とは、例えば電算機及びその周辺機器、家電機
器、通信機器、○A機器、その他電子応用機器等に用い
られるプリント配線基板;ICリードフレーム、抵抗器
、コンデンサー リレー等接点部材に用いられるフープ
材;OA機器、時計、電算機器、玩具、家電機器等に用
いられる液晶表示器;映像・音声記録/再生部品、その
関連部品等に用いられる磁気記録部品;シリコンやセラ
ミックスのウェハ等の半導体材料;水晶振動子等の電歪
用部品;CD。
The cleaning agent of the present invention has a particularly excellent effect on cleaning precision parts and jigs and tools used in the assembly process thereof.
Here, precision parts include, for example, electronic parts, electrical parts, precision mechanical parts, resin-processed parts, optical parts, and the like. here,
Electronic components include, for example, printed wiring boards used in computers and their peripheral equipment, home appliances, communication equipment, ○A equipment, and other electronic application equipment; used in contact members such as IC lead frames, resistors, capacitors, and relays. Hoop materials; Liquid crystal displays used in OA equipment, watches, computer equipment, toys, home appliances, etc.; Magnetic recording parts used in video/audio recording/playback parts and related parts; Semiconductors such as silicon and ceramic wafers. Materials: Electrostrictive parts such as crystal resonators; CD.

FD、複写機器、光記録機器等に用いられる光電変換部
品などをいう。電機部品とは例えばブラシ、ロータ、ス
テータ、ハウジング等の電動機部品;販売機や各種機器
に用いられる発券用部品;販売機、キャッシュデイスペ
ンサ等に用いられる貨幣検査用部品などをいう。精密機
械部品とは、例えば精密駆動機器、ビデオレコーダー等
に用いられるベアリング;超硬チップ等の加工用部品な
どをいう。樹脂加工部品とは、例えばカメラ、自動車等
に用いられる精密樹脂加工部品などをいう。更に、光学
部品としては、カメラ、眼鏡、光学機器等に用いられる
レンズがあり、また、その他部品としてメガネフレーム
、時計ケース、時計ベルト等が例示される。
Refers to photoelectric conversion parts used in FDs, copying equipment, optical recording equipment, etc. Electrical parts include, for example, electric motor parts such as brushes, rotors, stators, housings, etc.; ticket issuing parts used in vending machines and various devices; coin inspection parts used in vending machines, cash dispensers, etc. Precision mechanical parts include, for example, bearings used in precision drive equipment, video recorders, etc., and machining parts such as carbide tips. Resin processed parts refer to precision resin processed parts used for cameras, automobiles, etc., for example. Further, optical parts include lenses used in cameras, glasses, optical instruments, etc., and other parts include glasses frames, watch cases, watch straps, etc.

本発明において、組立加工工程に使用される治工具類と
は、上述の各種部品例で示したような精密部品を製造、
成形、加工、組立、仕上げ等の各種工程において取り扱
う治具、工具の他、これらの精密部品を取り扱う各種機
器、その部品等をいう。
In the present invention, the jigs and tools used in the assembly processing process are used to manufacture precision parts such as those shown in the various parts examples above.
Refers to jigs and tools used in various processes such as molding, processing, assembly, and finishing, as well as various equipment and parts that handle these precision parts.

本発明の洗浄剤組成物は、特に上述のうち、フラックス
の残存したプリント配線基板に対し好適な性能を発揮す
るが、本発明の対象となる精密部品類及び治工具類は、
これらの例に限られるものではなく、組立加工工程にお
いて各種の加工油やフラックス等の後工程の妨害物質、
又は製品の特性を低下させる各種の油性汚染物質を付着
している一定形状の固体表面を持つ精密部品類及び治工
具類であれば、本発明洗浄剤組成物が適用できる。
The cleaning composition of the present invention exhibits suitable performance particularly for the above-mentioned printed wiring boards with residual flux.
Not limited to these examples, substances that interfere with post-processes such as various processing oils and fluxes during the assembly process,
Alternatively, the cleaning composition of the present invention can be applied to precision parts and jigs and tools that have a solid surface of a certain shape and are covered with various oil-based contaminants that degrade product properties.

これらの汚染物質が例えば油脂、機械油、切削油、グリ
ース、液晶、ロジン系フラックス等の、主として有機油
分の汚れである場合、本発明の洗浄剤組成物が特に有効
であり、これに金属粉、無機物粉、水分等が混入した汚
れも充分洗浄除去することができる。
The cleaning composition of the present invention is particularly effective when these contaminants are mainly organic oil stains such as oil, machine oil, cutting oil, grease, liquid crystal, rosin flux, etc. It is also possible to sufficiently wash and remove dirt mixed with inorganic powder, moisture, etc.

本発明の洗浄剤組成物は、浸漬法、超音波洗浄法、揺動
法、スプレー法、蒸気洗浄法、手拭法、水置換乾燥法等
の各種の洗浄方法において使用でき、かつ好ましい結果
を得ることができる。
The cleaning composition of the present invention can be used in various cleaning methods such as immersion method, ultrasonic cleaning method, rocking method, spray method, steam cleaning method, manual wiping method, water displacement drying method, etc., and obtains favorable results. be able to.

本発明の洗浄剤を、例えばフラックスの付着したプリン
ト配線基板の洗浄工程に用いる場合、例えば、本発明洗
浄剤組成物をいれた超音波洗浄槽を用いて超音波洗浄を
行えばよい。
When the cleaning agent of the present invention is used, for example, in the process of cleaning a printed wiring board to which flux has adhered, ultrasonic cleaning may be performed using, for example, an ultrasonic cleaning tank containing the cleaning agent composition of the present invention.

洗浄後は、水等により簡単に本発明洗浄剤組成物を除去
することができる。
After cleaning, the cleaning composition of the present invention can be easily removed with water or the like.

〔実施例〕〔Example〕

以下、実施例を挙げて更に詳細に説明するが、本発明は
これらに限定されるものではない。
Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.

実施例1〜12及び比較例1〜5 表1に示す組成の洗浄剤組成物を調製し、その洗浄性及
びフラックス除去性を評価した。結果を表1に示す。
Examples 1 to 12 and Comparative Examples 1 to 5 Cleaning compositions having the compositions shown in Table 1 were prepared, and their cleaning properties and flux removal properties were evaluated. The results are shown in Table 1.

(1)洗浄性試験 70m+nX 150mmの鋼製テストピースに500
■/rn′の割合でナフテン系鉱油(40℃、350c
st)を塗布する。このテストピースを、40℃に保っ
た洗浄液に浸漬し、超音波で5分間洗浄した。
(1) Cleanability test 70m+nX 500 on a 150mm steel test piece
■/rn' ratio of naphthenic mineral oil (40℃, 350℃
Apply st). This test piece was immersed in a cleaning solution kept at 40° C. and cleaned with ultrasonic waves for 5 minutes.

次いで30℃のイオン交換水に10秒浸漬し、乾燥後、
目視によりその洗浄性を評価した。
Then, it was immersed in ion-exchanged water at 30°C for 10 seconds, and after drying,
The cleanability was visually evaluated.

(評価基準) 洗浄性 ◎:裏表面めて清浄 O:表面に鉱油残着はとんどなし △:裏表面鉱油残着わずかにあり X:表面に鉱油残着あり (2) フラックス除去性試験 ICチップを装着したプリント配線板をフラックス処理
し、続いてハンダ処理してテストピースとした。このテ
ストピースを50t’に保った洗浄液に浸漬し、3分間
超音波洗浄後、30℃のイオン交換水でリンスし、乾燥
後、プリント配線板からのフラックスの除去性を目視で
評価すると共に、MIL−P−28809法でプリント
配線板上に残存したイオン性汚れの除去性を評価した。
(Evaluation criteria) Cleanability ◎: Back surface is completely clean O: There is almost no mineral oil residue on the surface △: There is a slight mineral oil residue on the back surface X: There is mineral oil residue on the surface (2) Flux removability test The printed wiring board on which the IC chip was mounted was subjected to flux treatment, and then soldered to prepare a test piece. This test piece was immersed in a cleaning solution maintained at 50 t', and after 3 minutes of ultrasonic cleaning, it was rinsed with 30°C ion-exchanged water, and after drying, the removability of flux from the printed wiring board was visually evaluated. The removability of ionic stains remaining on the printed wiring board was evaluated using the MIL-P-28809 method.

(評価基準) 目視評価 ◎:フラックス残着なく、洗浄力極めて大○:フラック
ス残着がほとんどなく、洗浄力大△:フラックス残着か
わずかにあるが、洗浄力あり X:フラックスが残着し、洗浄力に乏しいNIL−P−
28809法 数値の大きい程洗浄力が大きいことを示し、2メグオ一
ム以上であれば合格である。
(Evaluation criteria) Visual evaluation ◎: No flux residue, extremely high cleaning power ○: Almost no flux residue, great cleaning power △: Slight flux residue, but good cleaning power X: No flux residue , NIL-P-, which has poor cleaning power
The larger the 28809 numerical value, the greater the cleaning power, and if it is 2 megohm or more, it is passed.

注)(POB)、:ポリオキシエチレン(POB) 、
 :ポリオキンブチレン(POP) 、 :ポリオキシ
プロピレンnは付加モル数の平均値を示す。
Note) (POB), : Polyoxyethylene (POB),
:Polyoquine butylene (POP), :Polyoxypropylene n indicates the average number of added moles.

〔発明の効果〕〔Effect of the invention〕

畝上の如く、本発明の洗浄剤組成物は、優れた洗浄性、
耐劣化性を有すると共に安全性がよく環境汚染の心配も
ないので、精密部品又はその組立加工工程に用いられる
治工具類用の洗浄剤として有利に使用できるものである
As seen from Unegami, the cleaning composition of the present invention has excellent cleaning properties,
Since it has deterioration resistance, good safety, and no concern about environmental pollution, it can be advantageously used as a cleaning agent for precision parts or jigs and tools used in the assembly process.

以上that's all

Claims (2)

【特許請求の範囲】[Claims] 1.次の成分(A)及び(B) (A)次の一般式( I )、(II)及び(III)▲数式、
化学式、表等があります▼( I ) ▲数式、化学式、表等があります▼(II) ▲数式、化学式、表等があります▼(III) 〔式中、R^1は炭素数1〜22の炭化水素残基を示し
、R^2及びR^3はそれぞれ炭素数2〜4のアルキレ
ン基を示し、Yは水素原子又は炭素数1〜4のアルキル
基若しくはアシル基を示し、mは1〜15の整数を、n
、l及びpはそれぞれ0〜15の整数を示す〕 で表わされる化合物からなる群より選ばれるアルキレン
オキサイド化合物50重量%以上 (B)窒素原子数が1〜5で分子量が50〜300の範
囲であるアミン系化合物0.05〜5重量%を含有する
精密部品又は治工具類用洗浄剤組成物。
1. The following components (A) and (B) (A) The following general formulas (I), (II) and (III) ▲ Numerical formula,
There are chemical formulas, tables, etc. ▼ (I) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (III) [In the formula, R^1 is a carbon number of 1 to 22 Represents a hydrocarbon residue, R^2 and R^3 each represent an alkylene group having 2 to 4 carbon atoms, Y represents a hydrogen atom or an alkyl group or acyl group having 1 to 4 carbon atoms, and m represents 1 to 4. 15 integers, n
, l and p each represent an integer of 0 to 15] 50% by weight or more of an alkylene oxide compound selected from the group consisting of compounds represented by (B) The number of nitrogen atoms is 1 to 5 and the molecular weight is in the range of 50 to 300. A cleaning composition for precision parts or tools containing 0.05 to 5% by weight of a certain amine compound.
2.更に、次の成分(C) (C)界面活性剤0.01〜30重量% を含有する請求項1記載の洗浄剤組成物。2. Furthermore, the following component (C) (C) Surfactant 0.01-30% by weight The cleaning composition according to claim 1, comprising:
JP2168897A 1990-06-27 1990-06-27 Detergent composition Expired - Lifetime JPH08917B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2168897A JPH08917B2 (en) 1990-06-27 1990-06-27 Detergent composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2168897A JPH08917B2 (en) 1990-06-27 1990-06-27 Detergent composition

Publications (2)

Publication Number Publication Date
JPH0457897A true JPH0457897A (en) 1992-02-25
JPH08917B2 JPH08917B2 (en) 1996-01-10

Family

ID=15876596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2168897A Expired - Lifetime JPH08917B2 (en) 1990-06-27 1990-06-27 Detergent composition

Country Status (1)

Country Link
JP (1) JPH08917B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693295A (en) * 1992-09-14 1994-04-05 Kao Corp Detergent composition for optical part
DE4332594A1 (en) * 1993-09-21 1995-03-30 Asahi Chemical Ind Propylene glycol cyclohexyl ether derivatives, their preparation and their use
JPH11349983A (en) * 1998-06-10 1999-12-21 Asahi Denka Kogyo Kk Detergent
JP2001507073A (en) * 1996-12-24 2001-05-29 アドバンスド ケミカル システムズ インターナショナル,インコーポレイテッド Formulation containing 1,3-dicarbonyl compound chelating agent for stripping residue from semiconductor substrate
JP2013122047A (en) * 2011-11-11 2013-06-20 Sanyo Chem Ind Ltd Detergent composition
JP2014065836A (en) * 2012-09-26 2014-04-17 Sanyo Chem Ind Ltd Aliphatic amine alkylene oxide adduct-containing composition
JP2014122331A (en) * 2012-11-21 2014-07-03 Sanyo Chem Ind Ltd Liquid detergent composition
JP2014122416A (en) * 2012-12-20 2014-07-03 Samsung Electro-Mechanics Co Ltd Degreasing agent for photosolder resist pre-processing, and degreasing method using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4154312B2 (en) * 2003-11-11 2008-09-24 日華化学株式会社 Rust-proof oil / water separation-type cleaning composition and cleaning method

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US3886099A (en) * 1972-03-13 1975-05-27 Griffin Bros Inc Water soluble flux remover
JPS59134891A (en) * 1983-01-21 1984-08-02 メック株式会社 Printed circuit cleaner
JPS59176398A (en) * 1983-03-28 1984-10-05 マークテック株式会社 Liquid detergent
JPS6369897A (en) * 1986-09-11 1988-03-29 第一工業製薬株式会社 Detergent composition
JPH01149981A (en) * 1987-12-07 1989-06-13 Showa Shell Sekiyu Kk Water soluble degreasing composition
JPH01291905A (en) * 1988-05-20 1989-11-24 Chichibu Cement Co Ltd Raw material blending system
JPH0328387A (en) * 1989-03-13 1991-02-06 Safety Kleen Corp Detergent compound and cleaning
JPH0362895A (en) * 1989-07-31 1991-03-18 Kao Corp Detergent composition
JPH03227400A (en) * 1989-11-08 1991-10-08 Arakawa Chem Ind Co Ltd Detergent for washing rosin-based soldering flux and washing method of same flux

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US3886099A (en) * 1972-03-13 1975-05-27 Griffin Bros Inc Water soluble flux remover
JPS59134891A (en) * 1983-01-21 1984-08-02 メック株式会社 Printed circuit cleaner
JPS59176398A (en) * 1983-03-28 1984-10-05 マークテック株式会社 Liquid detergent
JPS6369897A (en) * 1986-09-11 1988-03-29 第一工業製薬株式会社 Detergent composition
JPH01149981A (en) * 1987-12-07 1989-06-13 Showa Shell Sekiyu Kk Water soluble degreasing composition
JPH01291905A (en) * 1988-05-20 1989-11-24 Chichibu Cement Co Ltd Raw material blending system
JPH0328387A (en) * 1989-03-13 1991-02-06 Safety Kleen Corp Detergent compound and cleaning
JPH0362895A (en) * 1989-07-31 1991-03-18 Kao Corp Detergent composition
JPH03227400A (en) * 1989-11-08 1991-10-08 Arakawa Chem Ind Co Ltd Detergent for washing rosin-based soldering flux and washing method of same flux

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693295A (en) * 1992-09-14 1994-04-05 Kao Corp Detergent composition for optical part
DE4332594A1 (en) * 1993-09-21 1995-03-30 Asahi Chemical Ind Propylene glycol cyclohexyl ether derivatives, their preparation and their use
FR2710338A1 (en) * 1993-09-21 1995-03-31 Asahi Chemical Ind Cyclohexyl propylene glycol ethers, their process of preparation and their use
US5414144A (en) * 1993-09-21 1995-05-09 Asahi Kasei Kogyo Kabushiki Kaisha Propylene glycol cyclohexyl ether derivatives, method of producing same and uses thereof
CN1043882C (en) * 1993-09-21 1999-06-30 旭化成工业株式会社 Propylene glycol cyclohexyl ether derivatives, method of producing same and uses thereof
JP2001507073A (en) * 1996-12-24 2001-05-29 アドバンスド ケミカル システムズ インターナショナル,インコーポレイテッド Formulation containing 1,3-dicarbonyl compound chelating agent for stripping residue from semiconductor substrate
JPH11349983A (en) * 1998-06-10 1999-12-21 Asahi Denka Kogyo Kk Detergent
JP2013122047A (en) * 2011-11-11 2013-06-20 Sanyo Chem Ind Ltd Detergent composition
JP2014065836A (en) * 2012-09-26 2014-04-17 Sanyo Chem Ind Ltd Aliphatic amine alkylene oxide adduct-containing composition
JP2014122331A (en) * 2012-11-21 2014-07-03 Sanyo Chem Ind Ltd Liquid detergent composition
JP2014122416A (en) * 2012-12-20 2014-07-03 Samsung Electro-Mechanics Co Ltd Degreasing agent for photosolder resist pre-processing, and degreasing method using the same

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