JPH0592177A - Ultrasonic washing device - Google Patents

Abstract

PURPOSE:To enhance the working efficiency of washing work, to efficiently wash an object to be washed by the cavitation of ultrasonic waves and to certainly remove a washing solution when the object to be washed is taken out of the washing solution. CONSTITUTION:In a device washing many quartz vibrators 17 provided to a disc-shaped jig 16 after exciting electrodes are formed to the surface of the jig 16 by vacuum vapor deposition, the disc-shaped jig 16 having many quartz vibrators 17 provided thereto is held to the rotary shaft 14 arranged to a washing tank storing a washing solution 12 in a horizontal direction and the drive mechanism for rotationally driving the jig 16 is provided.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning device which can obtain a good cleaning effect and can efficiently remove a cleaning liquid at the end of cleaning.

[0002]

2. Description of the Related Art Conventionally, in a manufacturing process of a crystal oscillator, for example, an electrode made of a metal thin film is formed on a plate surface of a crystal piece by vacuum vapor deposition, and piezoelectric vibration is excited by the electrode. Then, dust, dirt, and metal pieces that easily peel off the electrode surface that adhered to the plate surface of the crystal piece when the electrode film was formed in the vapor deposition step were washed with chlorofluorocarbon, water, etc. in the washing step, and stable for a long time To obtain excellent performance.
FIG. 3 is a side cross-sectional view showing an example of a conventional cleaning device, in which an ultrasonic transducer 3 is applied to a cleaning liquid 2 such as CFC and water in a cleaning tank 1.
Then, ultrasonic vibration is applied to generate a cavity 4 in the cleaning liquid 2. On the other hand, the object to be cleaned 5, in this case FIG.
The crystal oscillator as shown in (1) is mounted on the jig 6, and the jig 6 is held by the elevating device 7 so that the crystal oscillator 5 is moved up and down so as to pass through the region where the cavity 4 is generated. Figure 4
FIG. 3 is a perspective view showing an example of the crystal unit 5 that is the object to be cleaned, and the two end portions of the crystal piece 5c are held between the tip portions of the pair of terminals 5b planted in the base 5a. The crystal piece 5c is formed by cutting a crystal of crystal into a plate shape and polishing the crystal to excite piezoelectric vibration at a predetermined resonance frequency. Then, the excitation electrodes 5d made of a metal thin film are formed on the front and back plate surfaces of the crystal piece 5c by vacuum vapor deposition. FIG. 5 is a perspective view showing an example of a jig 6 used for cleaning the crystal unit 5. Holding holes are formed at predetermined intervals in a base 6a made of aluminum having a square pipe shape. Crystal oscillator 5 that is the object to be cleaned
The terminal 5b is inserted and held.

By the way, the vacuum vapor deposition apparatus most commonly used in the manufacturing process of a crystal resonator has a large number of crystal resonators 5 on a ring-shaped table 7 as shown in FIG. 6, for example.
Are arranged in series and sequentially face an evaporation source (not shown) to form an electrode made of a metal thin film on the plate surface of the crystal piece.
Therefore, when cleaning the crystal unit 5 on which a metal thin film is formed using such a vacuum vapor deposition apparatus, the crystal unit 5 mounted on the ring-shaped table 7 is removed from the table 7 and then cleaned. Therefore, there is a problem that the work needs to be transferred to the base 6 and the crystal oscillator is easily damaged. Further, in the conventional cleaning apparatus, the crystal unit 5 to be cleaned is held by the jig 6 by its own weight, so that the crystal piece to be cleaned is located on the upper surface of the jig 6. However, in order to sufficiently expose the crystal oscillator 5 to be cleaned to the cavity 4 generated from the ultrasonic oscillator 3, the ultrasonic oscillator 3 needs to be positioned above the crystal piece, and its arrangement is limited. Receive. Further, in the conventional cleaning device, when the object to be cleaned 5 is taken out from the cleaning liquid 2, the cleaning liquid is naturally caused to flow down and removed. Therefore, the cleaning liquid cannot be sufficiently removed from the object to be cleaned. Therefore, when the object to be cleaned 5 is dried after cleaning, discolored "spots" may be generated on the surface of the object to be cleaned 5 to which the cleaning liquid 2 is attached. However, such a "spot" has a problem that the vibration characteristic is impaired in the case of the crystal resonator, and particularly the aging characteristic is deteriorated.

[0004]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to enhance the work efficiency of the cleaning work, and to efficiently clean an object to be cleaned by ultrasonic cavitation. It is an object of the present invention to provide an ultrasonic cleaning device that can perform cleaning of a cleaning liquid when the object to be cleaned is taken out from the cleaning liquid.

[0005]

SUMMARY OF THE INVENTION The present invention is an apparatus for cleaning a large number of crystal oscillators by mounting them on a disc-shaped jig and forming excitation electrodes on the plate surface by vacuum vapor deposition and then cleaning the crystal oscillators. In the cleaning tank in which the cleaning liquid is stored, a disk-shaped jig having a large number of crystal oscillators mounted on a rotating shaft arranged in a horizontal direction is held, and a drive mechanism for rotationally driving the jig is provided. To do.

[0006]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below in detail with reference to the front view of cutting shown in FIG. 1 and the side view of cutting shown in FIG. Reference numeral 11 in the drawing is a cleaning tank, and a cleaning liquid 12 such as water, alcohol, or chlorofluorocarbon is stored inside. And the washing tank 11
An ultrasonic oscillator 13 is provided at the bottom of the cleaning liquid 12 to apply ultrasonic vibration to the cleaning liquid 12. Further, in the cleaning tank 11, there is provided a bearing 15 for holding the rotating shaft 14 in a horizontal direction and detachably, and the rotating shaft 14 is provided with a disc-shaped jig 1.
Holds 6. The disc-shaped jig 16 has a large number of crystal oscillators 17 arranged at predetermined intervals on the outer peripheral portion thereof. The jig 16 is used in the vapor deposition process. In the vapor deposition process, the crystal oscillator 17 is sequentially faced to the vapor deposition source in vacuum to form the excitation electrode. Further, a drive mechanism 18 for rotating and driving the jig 16 held on the rotary shaft 14 is provided. The drive mechanism 18 includes a rotary shaft 14
The impeller 18a integrally provided on the impeller 18a and a pump 18b for spraying the cleaning liquid 12 onto the impeller 18a to rotate the impeller 18a. Since the pump 18b may circulate the cleaning liquid 12, a filter for removing dust, metal pieces, and the like in the cleaning liquid 12 may be provided in the path to have the function of purifying the cleaning liquid 12. When the cleaning liquid is removed from the object to be cleaned after the cleaning process, the cleaning liquid 1 is removed from the cleaning tank 11.
2 is discharged and the rotary shaft 14 is driven to rotate at a high speed by a sprocket gear or the like (not shown) to remove the cleaning liquid by the centrifugal force attached to the object to be cleaned.

With such a structure, the crystal oscillator 17 having the excitation electrode formed in the vapor deposition process is held on the rotary shaft 14 while being mounted on the jig 16, and is supported by the bearing 15 of the cleaning tank 11. Then, ultrasonic vibration is applied to the cleaning liquid 12 from the ultrasonic vibrator 13 to generate the cavity C. On the other hand, the pump 18b is driven to circulate the cleaning liquid 12 and spray it onto the impeller 18a. Then, the jig 16 and the crystal oscillator 17 mounted on the jig 16 are rotated in the cleaning liquid 12 via the rotary shaft 14 integrated with the impeller 18a. Then, the quartz oscillator 17 mounted on the jig 16 is exposed to the strongest cavity C at the position facing the ultrasonic oscillator 13 as it rotates, and the cleaning liquid 1 caused by the rotational movement is exposed.
In combination with the friction with 2, a very good cleaning effect can be obtained. After the cleaning process is completed, the cleaning liquid 12 is discharged, and then the rotating shaft 14 is rotated at a high speed through, for example, a sprocket gear (not shown) to remove the cleaning liquid attached to the crystal unit. For example, when the impeller 18a is blown with air and rotated, the cleaning liquid 12 attached to the crystal oscillator 17 is easily blown off by the centrifugal force, and the cleaning liquid can be reliably removed. In this case, the cleaning liquid may be removed by blowing high-pressure air or the like on the impeller 18a to rotate the crystal oscillator at a high speed. Further, when the cleaning liquid is removed, it may be performed not only in the atmosphere but also in an atmosphere of low pressure, for example. By doing so, the cleaning liquid can be removed more reliably. Therefore, the crystal unit mounted on the jig in the vapor deposition step can be washed while mounted on the jig, and the number of steps can be reduced, so that the productivity can be improved. Since the object to be cleaned is rotated in the cleaning liquid, the cleaning effect due to the cavitation generated by ultrasonic vibration can be utilized to the maximum, and the cleaning is extremely good in combination with the friction between the object to be cleaned and the cleaning liquid that occurs during rotation. The effect can be obtained. Then, after the washing step, there is an advantage that the washing solution can be efficiently removed by utilizing the centrifugal force, and furthermore, the washing solution can be removed by using the apparatus used in the washing step as it is.

[0008]

As described in detail above, according to the present invention, since the cleaning can be performed while the crystal oscillator, which is the object to be cleaned, is attached to the jig used in the vapor deposition process, the workability is good and the good workability is good. It is possible to provide an ultrasonic cleaning device which can obtain a cleaning effect and can efficiently remove the cleaning liquid after cleaning.

[0009]

[Brief description of drawings]

FIG. 1 is a cut front view showing an embodiment of the present invention.

FIG. 2 is a cut side view of the embodiment shown in FIG.

FIG. 3 is a cross-sectional view showing an example of a conventional cleaning device.

FIG. 4 is a perspective view showing an example of a crystal resonator that is an object to be cleaned.

FIG. 5 is a perspective view showing an example of a jig used in a conventional cleaning device.

FIG. 6 is a plan view showing an example of a table used in a vacuum vapor deposition device.

[Explanation of symbols]

 11 Cleaning Tank 12 Cleaning Liquid 13 Ultrasonic Transducer 14 Rotation Shaft 16 Jig 17 Crystal Oscillator (Cleaning Object) 18 Drive Mechanism

Claims (1)

[Claims] 1. An apparatus for cleaning a crystal oscillator after mounting a large number of crystal oscillators on a disc-shaped jig and forming excitation electrodes on the plate surface by vacuum vapor deposition, and a cleaning tank storing a cleaning liquid. An ultrasonic vibrator provided in the cleaning tank for applying ultrasonic vibration to the cleaning liquid; and a jig equipped with the large number of crystal resonators held on a rotary shaft horizontally arranged in the cleaning tank, An ultrasonic cleaning apparatus comprising: a driving mechanism that rotationally drives a jig.