JPH0590387A - Processor - Google Patents

Abstract

PURPOSE:To selectively alter a plurality of processing steps of a conveyed wafer as required and to improve throughput of processes by providing an interface mechanism between a material to-be-processed conveying/delivering mechanism and a holding/conveying mechanism of a conveying passage. CONSTITUTION:When a wafer WB is processed, the waver WB before processing is set to a cassette 121 provided in a conveying/delivering mechanism 120. The cassette 121 is set displaceably in four directions of a longitudinal direction X, a lateral direction Y, a vertical direction Z and further a turning direction theta, and the wafer WB is removed from the cassette 121. It is transferred in a baton passing manner to one of forceps 112, 113 of a holding/conveying mechanism 110 of a conveying passage 102 through an interface mechanism provided at a connector of the mechanism 120 to the passage 102. In the meantime, the wafer WB is centered and aligned, and the wafer WB is set to a processing step of next stage in an optimum attitude by the mechanism 110.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The disclosed technology belongs to the technical field of processing systems such as semiconductor manufacturing equipment.

[0002]

As is well known to those skilled in the art, in the manufacture of semiconductor devices such as ICs, in order to form elements such as transistors on a wafer of a semiconductor single crystal such as silicon (hereinafter simply referred to as a wafer), A large number of fine processing steps are included, and among them, a PEP (photoengraving process) step of forming a predetermined resist pattern on the surface of the wafer is an extremely important step in the processing steps.

This is because the resist pattern formed by the PEP process is used as an etching mask or the like and forms the basis of a fine processing technique such as circuit formation in the present electronic equipment.

Thus, the formation of the resist pattern in the PEP process is carried out, for example, by applying a thin film of photoresist on the surface of the wafer to form a uniform film as disclosed in the invention of Japanese Patent Application Laid-Open No. 52-27367. A step of forming a thick photoresist film, a step of selectively exposing a predetermined region of the photoresist film thereafter, and a step of subsequently developing the exposed photoresist film to form a desired resist pattern Consists of.

Of these, the exposure process is, for example, a step
An exposure apparatus such as an And Repeat Aligner (usually called a stepper) is used, while the step of forming a photoresist film on the surface of the wafer is performed using, for example, the apparatus described below. , These are performed in series such as the forward process of the first stage and the return process of the second stage.

The flow chart of FIG. 9 shows an aspect of a processing procedure in such a series type photoresist film forming apparatus generally called a track method. It has a plurality of processing stations that perform the preheating step 4, the cooling step 5, the coating step 6, and the heating step 8 in series from the first to the second step.

The wafer 1 on which the photoresist film is to be formed is stored in the cassette 2 for storage before processing, taken out one by one and introduced into the photoresist film forming apparatus, and the belt holding and conveying mechanism. 3 is sequentially transported to each processing station and subjected to a predetermined processing.

In the preheating step 4, the water content of the wafer 1 is removed by heating, and the preheated wafer 1 is
After being cooled in the cooling step 5 of the next stage, it is sent to the coating step 6, and in the coating step 6, a predetermined photoresist solution is set on the surface of the thin film by a coating device such as a spinner coater. It is evenly applied to thick layers.

Next, the wafer 1 coated with the photoresist solution is sent to a heating step 8 equipped with a walking beam type transport mechanism 7 to be heated, whereby the photoresist solution coated on the wafer 1 is heated. Is formed into a film and is stabilized.

Then, the heating process in the heating step 8 is completed, and the wafer 9 having the predetermined photoresist film formed on the surface thereof is stored in the processed wafer storing cassette 10 by the belt holding and conveying mechanism 3. To be done.

[0011]

As described above, in the conventional photoresist film forming apparatus, the stations of the respective processing steps are arranged in series, and the wafer 1 to be processed is provided with these stations at predetermined positions. The processing is always performed in order and in the one-way mode of the forward feed method, and the processing is required to be performed regardless of whether or not the processing is originally required by design.

For this reason, there has been a drawback that the processing order once set in advance cannot be arbitrarily changed, and it is also impossible to selectively pass only a certain processing station.

By the way, the processing steps necessary for forming a semiconductor element on the wafer 1 including the order thereof are
It depends on the type of function, purpose, etc. of the IC to be formed.

Nevertheless, in the conventional photoresist film forming apparatus, all processing steps have to be performed even for a wafer that does not require a certain processing step, which is an obstacle to improving the so-called throughput performance. There were difficulties.

Further, when the wafer 1 is transferred from the cassette 2 to a predetermined processing step, it is transferred to a processing section by a belt holding transfer mechanism 3 such as a pre-feed type cord belt conveyor.
There is a possibility that deviation and the like will inevitably occur during transportation, and the most undesirable dust adhesion such as particles may occur.

In particular, when the relative speed of the pair of belts is changed to displace the wafer, the generation of particles is more likely to occur.

Therefore, according to the type of wafer to be processed, which of the processing stations among the multi-stage processing stations provided in the photoresist film forming apparatus is used in any order, including the case of only a single station. It has been desired to develop a processing apparatus such as a photoresist film forming apparatus that can be changed independently.

Then, when the object to be processed is taken out of the storage cassette of the object to be processed and transferred to a station for a predetermined processing step, for example, holding as shown in US Pat. No. 4,775,281. Forward and backward as a transport mechanism,
Also, a system having tweezers that can be displaced in the vertical direction has been developed. However, in such a system technology, there is only the freedom of displacement in two directions, and an object to be processed is centered at a station of a predetermined processing step. There was a problem that it was not possible to carry in and out in the shortest distance with the alignment adjusted and the optimal posture.

Therefore, it is necessary to perform centering and alignment adjustment of the object to be processed at a station portion of a predetermined processing step, which causes a time delay and the like, resulting in a decrease in efficiency.

Further, when another unit system is added to the processing system of the preset unit, these problems have a negative point of further increasing.

Further, since the products are conveyed straight from the storage cassette to the station of the processing step in a series, the object to be processed is always held in the holding and conveying mechanism, and other processing and preparatory work for the processing cannot be performed, resulting in the work efficiency. There was a problem that was restricted.

[0022]

OBJECT OF THE INVENTION The object of the invention of this application is the problem of carrying in and out of a predetermined plurality of processing steps of an object to be processed such as a wafer or the like based on the above-mentioned prior art, and a mode in which another unit system is added to these unit systems. This is a technical issue to be solved, and multiple processing steps of the loaded wafer can be selectively changed as needed, and the throughput of each processing can be improved, and moreover, alignment adjustment in the transfer process of the object to be processed. The present invention intends to provide an excellent processing device that can be centered and improved in processing efficiency to benefit the field of processing technology application in various machine device manufacturing industries.

[0023]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the structure of the invention of this application, which has been made in line with the above-mentioned object and has the scope of the appended claims, is intended to solve the above-mentioned problems. When performing a predetermined process such as coating and developing, an object to be processed such as an unprocessed wafer is set in a predetermined storage cassette, and a transfer mechanism such as tweezers is vertically installed in the storage cassette. Direction (X), lateral direction (Y), up and down direction (Z), and further, it is displaceable in four directions of the turning direction (θ) to take out the object to be processed from the storage cassette, and carry in / out mechanism. At the connection portion with the transfer path provided adjacent to the transfer path, the transfer path is transferred to one of a predetermined number of tweezers of the transfer path via the interface mechanism during the baton touch. Transport mechanism The centering and alignment of the object to be processed is performed so that the holding and transporting mechanism sets the object to be processed in the optimum posture for the next processing step. The holding and transporting mechanism is held in the set posture, and the holding and transporting mechanism in the transporting path is provided on both sides of the transporting path by a predetermined moving mechanism, and
Predetermined processing such as heat treatment is performed at each station in a predetermined manner independently of each other, and is loaded and set in each station that is stacked up and down in the thermally separated multi-stage processing process. Depending on the design, a plurality of types of processing are performed, and then the holding / transporting mechanism of the transporting path is transferred to the station of the next processing step according to a predetermined program, while the holding / transporting mechanism supports devices such as tweezers. Has three fulcrums, such as a negative pressure type, and is supported by three points so that scratches and distortions do not occur on the object to be processed, and fine dust and the like do not adhere. A route is attached, and further, in a multi-stage processing unit system added to the above-mentioned processing unit system, desired processing can be smoothly performed in series by a buffer mechanism or the like as described above. , In parallel, or in combination with each other so that predetermined processing is performed in accordance with a desired program, mutually independently, mutually reciprocally, and to the stations of the multi-step processing steps, and It is a technical measure that allows the treatment to be selectively performed as designed.

[0024]

Embodiments of the invention of the present application will be described below with reference to a processing system having a device for coating a photoresist film on a wafer with reference to FIGS.

The embodiment shown in FIG. 1 shows a mode of a photoresist film coating / developing apparatus 100, in which a main body base 101 is provided near one side of the center (upper part in the figure).
In the central portion of the main body base 101, the arrow Y direction (lateral direction)
A wafer passage 102 for transferring a wafer to be processed is extended to one side, and on one side thereof, an HMDS (hexamethyldisilazane) treatment for heating an untreated wafer W to remove moisture and the like is performed. Or a simple heating station 103 for heating, and a cooling station 10 for cooling the preheated wafer W attached thereto.
4. Further, for example, a first having two heating devices (not shown) in the vertical direction used for heating the wafer W after applying the photoresist solution and forming a dried photoresist film, and Second heating station 1
05 and 106 are provided laterally along the passage 102.

On the other side of the passage 102, first and second coating stations 107 used for coating, for example, a photoresist solution on the surface of the wafer W which has been preheated and cooled. , 108 are provided adjacent to each other.

In FIG. 1, the preheating station 103, the cooling station 104, and the first and second heating stations 105 and 106 are illustrated as being arranged in a plane for convenience of illustration. However, this is for the sake of convenience, and in practice, the heating device of the preheating station 103 is provided above and below the cooling station 104 in a two-layer structure.

Thus, the passage 102 has stations 103, 104, 105, 106, and 10 on both sides thereof.
Since 7 and 108 are arranged to face each other, they are thermally separated from each other, which facilitates thermal management control and maintenance.

Thus, the inside of the passage 102 is
For example, a handling unit that moves in the Y direction (lateral direction) by a drive mechanism (not shown) such as a ball screw, for example, a wafer holding / transporting device 110 as a holding / transporting mechanism that transports the wafer W to a predetermined station is provided. The holding and carrying device 110 has a carriage 111 as a carrying mechanism, and vacuum tweezers, for example, two tweezers 112 and 113 for sucking and holding a wafer W are attached to the carriage 111 so as to be vertically stacked. ing.

The tweezers 112 and 113 are independently movable in the X direction (vertical direction) and the Y direction (horizontal direction), and at the same time, can be translated in the Z direction (vertical direction). It is designed to be able to turn in the angle θ direction (plane).

In order to enable such parallel movement and swivel movement of the tweezers 112 and 113, the carriage 111
Is provided with a stepping motor and a driving mechanism (not shown) such as a ball screw connected to the stepping motor.

Then, the tweezers 112 and 113 hold the wafer W with one of the tweezers, carry out centering, alignment adjustment and transfer to a predetermined processing station in an optimum posture, and when the processed wafer W is present in the processing station. The other tweezers is multifunctional so as to pick up the processed wafer W and set it back.

On the left side of the main body base 101 in the figure,
Wafer unloading and input mechanism 120 is provided, et al, the wafer cassette 122 for accommodating the wafer W _B of the pretreatment, and the wafer cassette 123 is provided for accommodating the wafer W _F after processing, also adsorb the back surface of the wafer W Equipped with tweezers 121 as a transfer mechanism for holding.

The tweezers 121 is the tweezers 1 described above.
With the same configuration as 12, 113, X direction (vertical direction), Y
Direction (transverse direction), Z direction (vertical direction) translation, and θ direction (turning direction) turning movement are possible.
The unprocessed wafer W _B is taken out from the wafer cassette 122, and the processed wafer W _F is stored in the wafer cassette 123 in a baton-touch manner in accordance with a program.

Further, tweezers 121 of the carry-in / carry-out mechanism 120
Is configured to transfer the unprocessed wafer W _B to the tweezers 112 and 113 of the transfer device 110, and to receive the processed wafer W _F from the tweezers 112 and 113, so that such baton-touch transfer is possible. An interface 30 described later is provided at the boundary between the passage 102 and the loading / unloading mechanism 120.

Then, the tweezers 11 of the carrier device 110
2 and 113 are adapted to freely transfer the wafers W to and from the processing stations 103 to 108 in series or in terms of throughput, whereby the wafers W are set in the order of the setting program. Accordingly, the predetermined processing is performed in each of the processing stations 103 to 108.

The operation of the holding and transporting mechanism 110 is controlled and controlled by a control system (not shown).

Therefore, by changing the program of the control system, the processing in each processing station 103 to 108 of the wafer W can be performed in series, in parallel, sequentially, or in throughput, and independently. , Can be arbitrarily set mutually reciprocally, that is,
It is possible to perform only some of the processing in each processing station 103-108 independently or to change the order of the processing.

2 to 5, the mechanism of the tweezers 112, 113, 121 is shown in detail in common for convenience of illustration. In the drawings, 21 is a fork-shaped tweezer body in plan view. , Three fulcrums 22, 23, 2 on one side
4 are arranged in a triangular shape so as to project, and the wafer W is supported and held at three points by these fulcrums 22, 23, and 24, and these fulcrums 22, 23, and
It is floated by three-point support via 24, and it is possible to prevent dust from adhering to the wafer W on the surface of the tweezer body 21.

Of the fulcrums 22, 23, 24, the fulcrum 24 is provided with a suction port (not shown) that opens to the minute top surface for vacuum suction.

Of course, it is within the scope of design change to make the other fulcrums 22 and 23 have the same mechanism.

Further, an arc-shaped guide member 25 corresponding to the peripheral edge of the wafer W and a stopper member 26 on the opposite side thereof are provided for centering and / or alignment of the wafer W. First, the wafer W is placed on the fulcrums 22, 23, 24 in the state shown in FIG. 3, and in this state, the wafer W is not centered or aligned and is not vacuum-sucked.

[0043] Then, as shown in FIG. 4, is moved horizontally toward the forceps body 21 to the stopper member 26 is brought into contact with the orientation flat W _a of the wafer W to the stopper member 26.

Thereafter, by continuing the horizontal movement of the tweezers body 21, the wafer W is moved to the tweezers body 21.
Lightly slide on the three fulcrums 22, 23, 24, and finally come into contact with the guide member 25 for centering,
The alignment is adjusted and then stopped.

Therefore, if the wafer W in the state of FIG.
Even if the position of is deviated from the central portion of the tweezers main body 21, the wafer W is guided by the guide member 25 as shown in FIG.
As shown in FIG. 5, the tweezers main body 21 can be centered and aligned at a predetermined position in the center of the tweezers main body 21 by being guided.

FIG. 6 shows the interface mechanism 30 provided at the boundary between the passage 102 and the wafer loading / unloading mechanism 120. The interface mechanism 30 is provided between the tweezers 121 and the tweezers 112 and 113. A holding member 31 that also has a buffer function of temporarily holding the delivered wafer W and holds the wafer W by a vacuum suction mechanism, and a driving device 32 such as an air cylinder for raising and lowering the holding member 31. And consists of.

When the tweezers 121 of the transfer mechanism of the carry-in / carry-out mechanism 120 carries the wafer W to the position shown in the figure, the holding member 32 moves up via the driving device 32, lifts and holds the wafer W, and then The wafer holding / transporting mechanism 110 on the resist coating / developing apparatus 100 side moves to the position of the interface mechanism 30 shown in the figure.

Then, when the holding member 31 is lowered by the driving device 32, the wafer W held by the holding member 31.
Is placed on the tweezers 112 or 113.

The delivery of the wafer W from the tweezers 112 and 113 to the tweezers 121 is also performed in the same manner as the above process.

The steps of forming a photoresist film on the surface of the wafer W by the resist coating / developing apparatus 100 in the above structure will be described step by step.

Each step is processed based on a program stored in advance in the control system.

First, one unprocessed wafer W _B is taken out from the cassette 122 by the tweezers 121 of the transfer mechanism of the carry-in / carry-out mechanism 120 and is carried to the position of the interface mechanism 30.

Then, the transferred wafer W _B is passed through the interface mechanism 30 to one of the tweezers, for example, the tweezers 112, of the holding and transporting mechanism 110 waiting at the entrance of the passage 102 for suction holding. Then, it is set in the preheating station 103 and provided for preheating.

If only one wafer W _{B of the} same type is stored in one cassette 122, the cassette 122
The ID code may be displayed on the screen, and the program for the manufacturing process may be selected by reading the ID code.

Hereinafter, the preheating station 103, the cooling station 104, the first coating station 107,
A case in which the processing in the first heating station 105 is selected to be performed in this order will be described.

First, the tweezers 112 that has received the first wafer W, that is, the first wafer W, is attached to the preheating station 10.
3 to move the wafer W to the standby station 1
03 is centered in a predetermined manner, set in an aligned posture, and placed on a heater plate (not shown) provided therein for preheating.

During this time, the wafer W is displaced by the transfer mechanism 121 and the holding / transporting mechanism 110 in a predetermined direction in the vertical direction (X), the horizontal direction (Y), the vertical direction (Z), and the turning direction (θ) as described above. The position and orientation are adjusted so that the process is set in the optimum state.

At this time, the wafer W is not brought into direct contact with the heater plate but the three fulcrums 2 of the tweezers 121.
When the set height, for example, about 0.3 mm is floated by transfer via the three-point support by 2, 23, 24, measures against dust are good.

In the meantime, move the tweezers 121 to 2
After the second wafer W is taken out of the cassette 122 and kept in the interface mechanism 30 and the first wafer W has been loaded into the preheating station 103, the holding and transporting mechanism 110 removes the second wafer W from the interface mechanism 30. The tweezers 112 receives the tweezers 1
Then, the wafer 12 is sucked and held on the wafer 12 and waits until the processing of the first wafer W in the preheating station 103 is completed.

When the preliminary heating process for the first wafer W is completed, the holding / transporting mechanism 110 performs the following operation.

That is, first, by moving the tweezers 113 that does not hold the wafer W, the first wafer W after the preheating process is completed is moved to the preheating station 10.
Take out from 3.

After emptying the preheating station 103 in this way, the tweezers 112 holding the second wafer W are operated to set the second wafer W in the preheating station 103.

Then, the tweezers 112 and 113 are moved in the Y direction, the θ direction, and the Z direction to move the cooling station 104.
, The tweezers 113 holding the wafer W is operated in the X direction, and the first wafer W is moved to the cooling station 1.
Set to 04.

From the above operation, the two tweezers 112,
The advantage of providing 113 is utilized.

That is, in the case where there is only one tweezers, the holding and transporting mechanism 110 first takes out the first wafer W from the preheating station 103, sets it in the cooling station 104, and then the second from the interface mechanism 30. This is because it is necessary to receive the wafer W and set it in the preheating station 103.

While the above operation is being carried out, in the carry-in / carry-out mechanism 120, the third wafer W to be processed next by the tweezers 121 is kept waiting in the interface mechanism 30.

Next, the holding / transporting mechanism 110 tweezers the third wafer W from the interface mechanism 30.
Then, the process is kept waiting until the processing in the cooling station 104 is completed.

Then, when the first wafer W cooling process is completed, the holding / transporting mechanism 110 takes out the wafer W from the cooling station 104 with the tweezers 113 that does not hold the wafer W, and then the programmed photo. It is set at the first coating station 107 on the opposite side of the passage 102 for the resist film coating process.

During the coating process, when the processing of the second wafer W in the preheating station 103 is completed,
The holding / transporting mechanism 110 takes out the wafer W from the preheating station 103 by using the tweezers 113 that does not hold the wafer W.

Then, the third wafer W held by the tweezers 112 is set in the preheating station 103, and at the same time, the second wafer W held by the tweezers 113 is set in the cooling station 104.

This operation is the same as the above-described mode.

If the preheating treatment for the second wafer W is completed before the completion of the cooling process for the first wafer W, the following processing operation may be programmed. It is possible.

That is, while the third unprocessed wafer W is first held by the tweezers 112, the second wafer W is taken out from the preheating station 103 by the tweezers 113 and then held by the tweezers 112. After the second wafer W is set in the preheating station 103, it stands by.

After the cooling process of the first wafer W in the cooling station 104 is completed, the first wafer W is taken out by the tweezers 112 or 113 and set in the first coating station 107.

The application of the photoresist solution at the station 107 is carried out, for example, by a spin coating apparatus under a resist droplet well known to those skilled in the art.

Thus, when the coating process of the photoresist liquid on the first wafer W is completed in the first coating station 107, the holding / transporting mechanism 110 operates the tweezers 1.
13, the wafer W is applied to the first coating station 107.
Take out from.

Subsequently, the wafer W is moved to the right side in the drawing along the Y direction, the first wafer W taken out is set in the first heating station 105, and the heat treatment is performed.

When the cooling process of the second wafer W in the cooling station 104 is completed during this heating process, the holding and transporting mechanism 110 takes out the wafer W with the tweezers 113, and further, the first wafer W is removed. Coating station 10
Set to 7 and start coating the photoresist solution.

When the processing of the first wafer W is completed in the first heating station 105 and a desired photoresist film is formed, the holding / transporting mechanism 110 sets the first wafer W on the tweezers 113. Take out.

Subsequently, the holding / transporting mechanism 110 moves to the left side in the Y direction in the drawing, and transfers the wafer W held by the tweezers 113 to the interface mechanism 30.

During standby in the interface mechanism 30,
As described above, it is effective to mount the wafer W on the mounting portion in a slightly floating manner without directly contacting it with the mounting portion.

Further, it is more advantageous to form the standby interface mechanism 30 by a carrier cassette.

When the wafer W _F which has been processed in this way is put on standby by the interface mechanism 30, the loading / unloading mechanism 12
The tweezers 121 of 0 receives the wafer W _F and stores it in the cassette 123.

In this way, the interface mechanism 30
Due to the presence of the above, the holding and transporting mechanism 110 can have a plurality of processing functions.

The series of processing operations described above is performed by the cassette 1
This is continued until there are no unprocessed wafers W _{B in} 22.

Although the first coating station 107 and the first heating station 105 are used in the above description of the operation, instead of these, the second coating station 10 is used.
8 and a second heating station 106 may be used.

Further, a photoresist film coating step and / or
Alternatively, if the heating process takes longer than the other processes, it is possible to use the two coating stations 107, 108 and / or the two heating stations 105, 106 at the same time, and the transfer mechanism 121. It is also possible to transfer from a site to a desired processing step at a throughput for processing.

By the way, when carrying out the above-mentioned photoresist film forming process, in order to confirm whether or not the programmed process is appropriate, one wafer W is subjected to trial processing. In this case, it is necessary to take out the test wafer W _{T for} which the trial processing has been completed from the tweezers 123 for inspection, but in order to facilitate this taking out, as shown in FIG.
A retractable receiver 40 is provided at the base of 23, a handle 41 is provided at one end of the receiver 40, and a wafer mounting table 42 is provided inside the test wafer W _T after the trial processing is completed. Is inserted from the opening 43 and placed on the mounting table 42.

Therefore, the test wafer W _T can be easily taken out by pulling out the receiver 40 as shown.

Incidentally, the tweezers of the holding and transporting mechanism 110 do not necessarily have to be two in terms of design change, and may be three or more.

As is clear from the above description of the operation, according to the processing apparatus of the above-described embodiment, a plurality of processing steps necessary for forming and developing the photoresist film on the surface of the wafer W are performed in the order. The best process can be programmed in any combination including the above.

Therefore, it is possible to obtain the maximum throughput by selecting the most efficient combination process of the processing steps according to the type of the wafer W to be processed.

Further, since the holding / transporting mechanism 110 has the two tweezers 112 and 113 and operates independently of each other, the degree of freedom in processing is high, for example, when the wafer W is present at the station for the next process. , Wafer W of the process
There is no inconvenience that you can not replace.

Further, since the processing stations are arranged along the passage 102 on both sides thereof, the stations on both sides are opposed to each other and are thermally separated from each other, which facilitates heat management and heat control. The degree of freedom in changing the operation program of the mechanism 110 is extremely high, and therefore the processing program can be easily changed.

Further, since the preheating station 103 and the cooling station 104 are vertically stacked,
The floor space required for installation is also reduced.

Those skilled in the art can use the apparatus of the above embodiment as an apparatus for developing a photoresist film exposed in a predetermined pattern to form a resist pattern without any difficulty.

In that case, the coating stations 107, 10
A device for applying a developing solution to 8 can also be provided.

Further, the developing device may be configured, for example, so that the developing solution is jetted onto the wafer W which is rotating at a variable speed to develop.

Furthermore, the two coating stations 107, 1
08 is used to apply the photoresist liquid,
By using the other for coating the developing solution, it can be used as an apparatus for both forming the photoresist film and developing.

At this time, the interface mechanism 30 shown in FIG. 6 is also provided at the right end of the passage 102 in the figure so that the wafer W can be delivered to and from the exposure apparatus, so that the photoresist film coating process to the developing process can be performed. Can be carried out in series as a consistent continuous process, or optionally in parallel, and with throughput.

When it is desired to add a plurality of processing units to connect a plurality of units, the following passage is formed on the extension line of the passage 102, and a standby mechanism as a buffer mechanism for the wafer W is formed at the connection portion thereof. For example, a carrier station may be provided.

By the way, as shown in FIG.
Wafer W in 2,123 is unloaded or cassette 12
Each processing is performed by the above-described operations by the unit 150 of the first processing system having the loading / unloading mechanism 120 having the arm 120a for loading into the 2, 123 and the holding / transporting mechanism 110a for delivering the wafer W by the interface mechanism 30. I do.

For example, the unit 150 of the first processing system
The HMDS (hexamethyldisilazane) processing station 151, the first heating station 1152, and the first cooling station 15 with the holding and transporting mechanism 110a in between.
3, a first coating station 154 for spin coating the first layer photoresist solution, a second coating station 155 for spin coating the first layer photoresist solution,
Selectively to each of these stations, independently, or
The wafer W is discharged and processed, and further, a plurality of processing stations, for example, the second heating station 1
56, the second cooling station 157, CEL on the upper surface of the photoresist film to prevent diffused reflection in the exposure process.
A third processing station 158 for coating and forming a surface coating layer such as a film is arranged to face each other, and a second processing system unit 159 provided with a holding and transporting mechanism 110b for transporting the wafer W to each of these stations is provided. A standby mechanism 160 as a buffer mechanism is provided between the second processing system unit 159 and the first processing system unit 150, and one wafer W can be mounted on the standby mechanism 160. A mounting table 161 is provided, and similarly to the transfer of the wafer W in the interface mechanism 30, the holding table 161 is used to hold and transfer the holding mechanism 1 of the unit 150 of the first processing system.
It is possible to transfer the wafer W between 10a and the holding and transporting mechanism 110b of the unit 159 of the second processing system.
The structure of the standby mechanism 160 of the buffer mechanism is as follows.
A buffer cassette (not shown) is provided without 61.
The buffer cassette may have a structure capable of holding a plurality of wafers W on standby.

With the buffer cassette, it is possible to reduce the waiting time of one of the holding and conveying mechanisms 110a and 110b even if there is a difference in the work amount between the holding and conveying mechanisms 110a and 110b.

As described above, by providing the holding and conveying mechanism with two systems via the standby mechanism 160, it is possible to easily cope with the addition of processing stations in a multi-stage processing process and to realize high throughput processing.

Therefore, the holding and conveying mechanism is not limited to two systems and may be two or more systems, and the number can be increased appropriately as the standby mechanism is added.

In the above-mentioned embodiments, the embodiment applied to the coating and developing treatment of the photoresist film as the manufacturing apparatus has been described, but the invention of this application is not limited to this.
For example, etching treatment, CVD treatment, ashing treatment and the like can be similarly performed.

[0108]

As described above, according to the invention of this application, a storage cassette before and after processing of an object to be processed is basically provided in an apparatus for performing processing such as photoresist film coating of the object to be processed such as a wafer. A holding / transporting mechanism for the object to be processed provided on the transporting path connecting the loading / unloading mechanism of the to-be-processed object with a predetermined plurality of processing steps is arranged in a vertical direction (X), a horizontal direction (Y), and a vertical direction. Not only direction (Z) but also turning direction (θ)
By having a support device for conveying the object to be processed which has a degree of freedom of displacing in four directions, the object to be processed can be directly subjected to the optimum processing step depending on the condition for processing the object, or Since it can be given in terms of throughput, as a result, processing in each processing step can be performed under optimum conditions,
As a result, the performance of the processed product is remarkably improved and the reliability of the product is remarkably improved.

Therefore, even if the processing apparatus is provided with a plurality of stations for processing steps based on a predetermined program from the design stage by vertically stacking the stations on both sides of the transfer path, the object holding and transfer mechanism from the storage cassette. When the object to be processed is taken out from the storage cassette and selectively and mutually independently or mutually reciprocally conveyed directly or indirectly to the station of the desired processing step, centering or alignment adjustment during the carrying-in set is performed. Can be done, and therefore
The excellent effect that optimum processing is performed for a target product is achieved.

Further, since the interface mechanism is provided between the loading / unloading mechanism of the object to be processed and the holding / transporting mechanism of the transport path, the holding / transporting mechanism can perform a plurality of types of work, and The excellent effect that the work efficiency is remarkably improved is exhibited.

Also, from the storage cassette as designed,
The object to be processed can be smoothly taken out and stored in the cassette under optimum conditions, and therefore, the excellent effect that damage, distortion, adhesion of dust, etc. of the object to be processed during transfer can be surely prevented. Played.

Further, even when a plurality of unit systems are added to the processing system of one unit, a buffer mechanism is provided between the respective systems to smoothly connect the processing between the respective unit systems and improve the overall efficiency. The excellent effect of being improved is achieved.

[Brief description of drawings]

FIG. 1 is a schematic plan view of a photoresist film coating and developing apparatus for a wafer according to an embodiment of the invention of this application.

FIG. 2 is a schematic side view of the tweezers of FIG.

FIG. 3 is a plan view of the tweezers of FIG. 1 before actuation.

FIG. 4 is a plan view of the same during operation.

FIG. 5 is a plan view of the same after operation.

FIG. 6 is a wall side view of the interface.

FIG. 7 is a schematic cross-sectional view of the structure of the cassette of FIG.

FIG. 8 is a schematic plan view of another embodiment.

FIG. 9 is a schematic plan view of a photoresist film coating apparatus for a wafer based on a conventional technique.

[Explanation of symbols]

 W (1) Processing object (wafer) 122,123 Storage cassette 120 Carrying in / out mechanism 103,108 Processing process (station) 102 Transfer path 100 Processing device 110 Holding transfer mechanism 112,113 Support device 22-24 Support point 30 Interface mechanism 150 First processing system 159 Second processing system 160 Buffer mechanism (standby mechanism)

Continuation of front page (51) Int.Cl. ⁵ Identification number Internal reference number FI Technical indication H01L 21/027 (72) Inventor Osamu Hirakawa 2655 Tsukure, Kikuyo-cho, Kikuchi-gun, Kumamoto Tokyo Electron Kyushu Co., Ltd. ( 72) Inventor Yoshio Kimura 2655 Tsukure, Kikuyo-cho, Kikuchi-gun, Kumamoto Prefecture Tokyo Electron Kyushu Co., Ltd.

Claims (3)

[Claims] 1. A processing apparatus in which a transfer path from a loading / unloading mechanism for an object to be processed having a storage cassette for the object to be processed to a plurality of processing steps is connected and extended, and is disposed on the transfer path. An interface mechanism is provided between the holding and transporting mechanism for the object to be processed and the loading / unloading mechanism. 2. A processing apparatus in which a transfer path for a plurality of processing steps from a loading / unloading mechanism for an object to be processed, which has a cassette for accommodating the object to be processed, is connected and extended, and is disposed on the transfer path. An interface mechanism is provided between at least one of the plurality of holding / transporting mechanisms for the object to be processed and the loading / unloading mechanism, and a predetermined number of processing systems are provided up to the end of the transporting path. A processing apparatus, wherein the processing apparatus is connected, and a buffer mechanism is provided between each of the unit processing systems to transfer an object to be processed among the plurality of holding and conveying mechanisms. 3. The processing apparatus according to claim 2, wherein the buffer mechanism is provided with an object mounting base.