JPH0583580B2 - - Google Patents
Info
- Publication number
- JPH0583580B2 JPH0583580B2 JP15524590A JP15524590A JPH0583580B2 JP H0583580 B2 JPH0583580 B2 JP H0583580B2 JP 15524590 A JP15524590 A JP 15524590A JP 15524590 A JP15524590 A JP 15524590A JP H0583580 B2 JPH0583580 B2 JP H0583580B2
- Authority
- JP
- Japan
- Prior art keywords
- polyamide
- epoxy resin
- group
- resin
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 claims description 30
- 229920000647 polyepoxide Polymers 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 26
- 239000011347 resin Substances 0.000 claims description 26
- 239000004962 Polyamide-imide Substances 0.000 claims description 23
- 229920002312 polyamide-imide Polymers 0.000 claims description 23
- 229920006015 heat resistant resin Polymers 0.000 claims description 11
- 239000011342 resin composition Substances 0.000 claims description 11
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 10
- -1 diamine compound Chemical class 0.000 claims description 6
- 238000006068 polycondensation reaction Methods 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000000962 organic group Chemical group 0.000 claims description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 239000002904 solvent Substances 0.000 description 10
- 239000004952 Polyamide Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229920002647 polyamide Polymers 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 4
- CDOWNLMZVKJRSC-UHFFFAOYSA-N 2-hydroxyterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(O)=C1 CDOWNLMZVKJRSC-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 2
- MNUOZFHYBCRUOD-UHFFFAOYSA-N 3-hydroxyphthalic acid Chemical compound OC(=O)C1=CC=CC(O)=C1C(O)=O MNUOZFHYBCRUOD-UHFFFAOYSA-N 0.000 description 2
- BCEQKAQCUWUNML-UHFFFAOYSA-N 4-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(O)C(C(O)=O)=C1 BCEQKAQCUWUNML-UHFFFAOYSA-N 0.000 description 2
- QNVNLUSHGRBCLO-UHFFFAOYSA-N 5-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(O)=CC(C(O)=O)=C1 QNVNLUSHGRBCLO-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- BQIOTSCEOSMFOT-UHFFFAOYSA-N 1-hydroxycyclohexa-3,5-diene-1,2-dicarboxylic acid Chemical compound OC(=O)C1C=CC=CC1(O)C(O)=O BQIOTSCEOSMFOT-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- SGEWZUYVXQESSB-UHFFFAOYSA-N 3-methylheptane-1,7-diamine Chemical compound NCCC(C)CCCCN SGEWZUYVXQESSB-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- WEMYXYMZQRSPIA-UHFFFAOYSA-N 4-(2,4-dihydroxyphenyl)sulfanylbenzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1SC1=CC=C(O)C=C1O WEMYXYMZQRSPIA-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- MITHMOYLTXMLRB-UHFFFAOYSA-N 4-(4-aminophenyl)sulfinylaniline Chemical compound C1=CC(N)=CC=C1S(=O)C1=CC=C(N)C=C1 MITHMOYLTXMLRB-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- MWRVRCAFWBBXTL-UHFFFAOYSA-N 4-hydroxyphthalic acid Chemical compound OC(=O)C1=CC=C(O)C=C1C(O)=O MWRVRCAFWBBXTL-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- LINDOXZENKYESA-UHFFFAOYSA-N TMG Natural products CNC(N)=NC LINDOXZENKYESA-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- MYMCSQDRHUQQDW-UHFFFAOYSA-N bis(4-amino-3-methylphenyl)methanone Chemical compound C1=C(N)C(C)=CC(C(=O)C=2C=C(C)C(N)=CC=2)=C1 MYMCSQDRHUQQDW-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- ITZPOSYADVYECJ-UHFFFAOYSA-N n'-cyclohexylpropane-1,3-diamine Chemical compound NCCCNC1CCCCC1 ITZPOSYADVYECJ-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Description
〔産業上の利用分野〕
本発明は、新規な耐熱性樹脂組成物に関する。
〔従来の技術〕
近年、電子部品は、高集積化、高信頼化が特に
求められている。これにともなつて、耐熱性、接
着性、成形性、電気特性に優れた高分子材料の開
発が望まれており、種々の提案がなされている。
耐熱性高分子材料として広く一般に知られている
ものとして、ポリイミド樹脂、ポリアミドイミド
樹脂及びポリアミド樹脂等があげられる。これら
の樹脂は、耐熱性の他に優れた耐衝撃性、機械強
度、耐溶剤性等を有しており、高分子電子材料と
して注目されているが、成形性、接着性等に難点
がある。そこで、これらの長所、短所のバランス
をとるために、エポキシ樹脂と併用して複合化す
ることが検討されている。
〔発明が解決しようとする課題〕
しかしながら、従来提案されているポリイミド
樹脂、ポリアミドイミド樹脂及びポリアミド樹脂
は、エポキシ樹脂との相溶性が低く、所望の組成
で均一に混合しないという問題があり、そのた
め、電子部品に必要な上記諸特性を同時に満足す
る重合体組成物を得ることができなかつた。した
がつて、耐熱性、接着性、成形性、電気特性の全
てにわたつて優れた特性を有する高分子材料の実
現が望まれているのが現状である。
本発明の目的は、耐熱性、接着性、成形性、電
気特性に優れ、高精度かつ高信頼性を示す高分子
電子材料として有用な耐熱性樹脂組成物を提供す
ることにある。
〔課題を解決するための手段〕
本発明の耐熱性樹脂組成物は、(a)ジアミン化合
物と芳香族ジカルボン酸との重縮合によつて得ら
れ、主鎖が下記一般式()で示される繰り返し
単位
[Industrial Application Field] The present invention relates to a novel heat-resistant resin composition. [Prior Art] In recent years, electronic components are particularly required to be highly integrated and highly reliable. Along with this, there is a desire to develop polymeric materials with excellent heat resistance, adhesiveness, moldability, and electrical properties, and various proposals have been made.
Polyimide resins, polyamide-imide resins, polyamide resins, and the like are widely known as heat-resistant polymer materials. These resins have excellent impact resistance, mechanical strength, solvent resistance, etc. in addition to heat resistance, and are attracting attention as polymeric electronic materials, but they have drawbacks in moldability, adhesion, etc. . Therefore, in order to balance these advantages and disadvantages, consideration has been given to using it in combination with an epoxy resin to form a composite. [Problems to be Solved by the Invention] However, the polyimide resins, polyamideimide resins, and polyamide resins that have been proposed so far have a problem that they have low compatibility with epoxy resins and are not uniformly mixed with the desired composition. However, it has not been possible to obtain a polymer composition that simultaneously satisfies the above-mentioned properties required for electronic parts. Therefore, it is currently desired to realize a polymer material that has excellent properties in all of heat resistance, adhesiveness, moldability, and electrical properties. An object of the present invention is to provide a heat-resistant resin composition useful as a polymeric electronic material that has excellent heat resistance, adhesiveness, moldability, and electrical properties, and exhibits high precision and reliability. [Means for Solving the Problems] The heat-resistant resin composition of the present invention is obtained by polycondensation of (a) a diamine compound and an aromatic dicarboxylic acid, and has a main chain represented by the following general formula (). repeat unit
【式】
(式中、Rは、低級アルキル基で置換されていて
もよいフエニレン基またはC1〜C12のアルキレン
基を表わす。)
からなり、固有粘度0.01〜3.0dl/gを有し、か
つ、主鎖の両末端にアミノ基を有するポリアミド
と、下記一般式()[Formula] (wherein, R represents a phenylene group or a C 1 to C 12 alkylene group which may be substituted with a lower alkyl group), and has an intrinsic viscosity of 0.01 to 3.0 dl/g, And a polyamide having amino groups at both ends of the main chain, and the following general formula ()
【式】
(式中、Arは、4価の芳香族有機基を表わし、
4個のカルボニル基がそれぞれ別の炭素原子に直
接結合し、かつ、各対のカルボニル基は、Ar基
中における隣接炭素原子に結合する。)
で示されるテトラカルボン酸二無水物との重縮合
体であつて、固有粘度0.1〜5.0dl/g、好ましく
は0.2〜3.0dl/gを有するポリアミドイミド樹脂
60〜99重量%と、(b)エポキシ樹脂1〜40重量%と
よりなることを特徴とする。
なお、本明細書において、固有粘度とは、樹脂
濃度0.5g/dlのN−メチル−2−ピロリドン溶
液の30℃における測定値を意味する。
本発明において使用するポリアミドイミド樹脂
は、主鎖が上記一般式()で示される繰り返し
単位からなり、固有粘度0.01〜3.0dl/gを有し、
かつ、主鎖の両末端にアミノ基を有するポリアミ
ドと、上記()で示されるテトラカルボン酸二
無水物との重縮合反応によつて製造することがで
きる。
なお、原料物質として使用される上記ポリアミ
ドは、下記一般式()
H2N−R−NH2 ()
(式中、Rは、低級アルキル基で置換されていて
もよいフエニレン基またはC1〜C12のアルキレン
基を表わす。)
で示されるジアミン化合物と、下記一般式()[Formula] (In the formula, Ar represents a tetravalent aromatic organic group,
Each of the four carbonyl groups is directly bonded to a different carbon atom, and each pair of carbonyl groups is bonded to an adjacent carbon atom in the Ar group. ) A polyamide-imide resin which is a polycondensate with a tetracarboxylic dianhydride and has an intrinsic viscosity of 0.1 to 5.0 dl/g, preferably 0.2 to 3.0 dl/g.
60 to 99% by weight, and (b) epoxy resin 1 to 40% by weight. In this specification, the intrinsic viscosity means a value measured at 30°C of an N-methyl-2-pyrrolidone solution with a resin concentration of 0.5 g/dl. The polyamide-imide resin used in the present invention has a main chain consisting of repeating units represented by the above general formula (), and has an intrinsic viscosity of 0.01 to 3.0 dl/g,
In addition, it can be produced by a polycondensation reaction between a polyamide having amino groups at both ends of the main chain and the tetracarboxylic dianhydride shown in () above. The above polyamide used as a raw material has the following general formula () H 2 NR-NH 2 () (wherein R is a phenylene group which may be substituted with a lower alkyl group or C 1 - represents a C12 alkylene group) and the following general formula ()
【式】
で示される芳香族ジカルボン酸とを、公知の方法
により重縮合反応させることによつて得ることが
できる。
その場合、使用することができる上記一般式
()で示されるジアミン化合物としては、例え
ば、次の化合物があげられる。m−フエニレンジ
アミン、p−フエニレンジアミン、メタトリレン
ジアミン、4,4′−ジアミノジフエニルエーテ
ル、3,3′−ジメチル−4,4′−ジアミノジフエ
ニルエーテル、3,3′−ジアミノジフエニルエー
テル、3,4′−ジアミノジフエニルエーテル、
4,4′−ジアミノジフエニルチオエーテル、3,
3′−ジメチル−4,4′−ジアミノジフエニルチオ
エーテル、3,3′−ジエトキシ−4,4′−ジアミ
ノジフエニルチオエーテル、3,3′−ジアミノジ
フエニルチオエーテル、4,4′−ジアミノベンゾ
フエノン、3,3′−ジメチル−4,4′−ジアミノ
ベンゾフエノン、3,3′−ジアミノジフエニルメ
タン、4,4′−ジアミノジフエニルメタン、3,
3′−メトキシ−4,4′−ジアミノジフエニルメタ
ン、2,2′−ビス(4−アミノフエニル)プロパ
ン、2,2′−ビス(3−アミノフエニル)プロパ
ン、4,4′−ジアミノジフエニルスルホキシド、
4,4′−ジアミノジフエニルスルホン、3,3′−
ジアミノジフエニルスルホン、ベンチジン、3,
3′−ジメチルベンチジン、3,3′−ジメトキシベ
ンチジン、3,3′−ジアミノビフエニル、ヘキサ
メチレンジアミン、ヘプタメチレンジアミン、テ
トラメチレンジアミン、p−キシリレンジアミ
ン、m−キシリレンジアミン、3−メチルヘプタ
メチレンジアミン等。
また、これらジアミン化合物との重縮合に使用
することができる上記一般式()で示される芳
香族ジカルボン酸としては、例えば、3−ヒドロ
キシフタル酸、4−ヒドロキシフタル酸、2−ヒ
ドロキシフタル酸、4−ヒドロキシイソフタル
酸、5−ヒドロキシイソフタル酸、2−ヒドロキ
シテレフタル酸、3−ヒドロキシテレフタル酸、
等があげられる。
一方、上記一般式()で示されるテトラカル
ボン酸二無水物誘導体としては、例えば、ピロメ
リツト酸二無水物、2,3,6,7−ナフタリン
テトラカルボン酸二無水物、3,4,3′,4′−ビ
フエニルテトラカルボン酸二無水物、2,3,
2′,3′−ビフエニルテトラカルボン酸二無水物、
ビス(3,4−ジカルボキシフエニル)メタン二
無水物、ビス(3,4−ジカルボキシフエニル)
スルホン二無水物、2,2−ビス(3,4−ジカ
ルボキシフエニル)プロパン二無水物、3,4,
3′,4′−ベンゾフエノンテトラカルボン酸二無水
物、ブタンテトラカルボン酸二無水物等があげら
れる。
主鎖が上記一般式()で示される繰り返し単
位からなり、主鎖の両末端にアミノ基を有するポ
リアミドと、上記一般式()で示されるテトラ
カルボン酸二無水物との反応は、公知の方法を用
いて行うことができる。例えば、不活性極性有機
溶媒中で、上記ポリアミドとテトラカルボン酸二
無水物を、−20〜150℃、好ましくは0〜60℃の温
度で数十分間ないし数日間反応させ、ポリアミツ
ク酸を生成させ、さらにイミド化することにより
ポリアミドイミド樹脂を製造することができる。
不活性極性有機溶媒としては、例えば、N,N
−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド、N−メチル−2−ピロリドン、N−メ
チルカプロラクタム、ジメチルスルホキシド、テ
トラメチル尿素、ピリジン、ジメチルスルホン、
ヘキサメチルリン酸トリアミド等があげられる。
イミド化の方法としては、加熱により脱水閉環
させる方法があげられる。
反応温度は150〜400℃、好ましくは180〜350℃
であり、反応時間は30秒ないし10時間、好ましく
は5分ないし5時間である。
本発明において、ポリアミドイミド樹脂の固有
粘度が、0.1dl/gよりも低くなると、フイルム
形成能がなくなり、また、5.0dl/gよりも高く
なると、フイルムが均一に形成し難くなり、ま
た、塗料にした場合、粘性が高いので、取扱い性
に問題がある。本発明において、好ましい固有粘
度範囲は0.2〜3.0dl/gである。
本発明の耐熱性樹脂組成物の他の樹脂成分であ
るエポキシ樹脂としては、例えばビスフエノール
A型エポキシ樹脂、o−クレゾールノボラツク型
エポキシ樹脂、フエノールノボラツク型エポキシ
樹脂、ビスフエノールF型エポキシ樹脂、ビスフ
エノールS型エポキシ樹脂、ベンゾフエノン型エ
ポキシ樹脂、ナフタレン型エポキシ樹脂、シクロ
ペンタジエン型エポキシ樹脂、ベンゼントリオー
ル型エポキシ樹脂、レゾルシノールスルフイド型
エポキシ樹脂、イソプロピルベンゼン型エポキシ
樹脂、フルオレン型エポキシ樹脂、変性エポキシ
樹脂等があげられる。
本発明の耐熱性樹脂組成物は、上記ポリアミド
イミド樹脂と上記エポキシ樹脂とを配合すること
によつて得られるが、その配合割合は、ポリアミ
ドイミド樹脂60〜99重量%に対して、エポキシ樹
脂1〜40重量%の範囲にあることが必要である。
ポリアミドイミド樹脂の配合割合が60重量%より
も低くなると、耐熱性が低下し、また、99重量%
よりも高くなると、成型性と接着性が低下する。
好ましい配合割合は、上記ポリアミドイミド樹脂
が70〜90重量%であるのに対して、エポキシ樹脂
が30〜10重量%の範囲である。
本発明の耐熱性樹脂組成物を製造するために
は、上記ポリアミドイミド樹脂を、溶媒に溶解
し、エポキシ樹脂を上記ポリアミドイミド樹脂溶
液に、直接溶解させるか、或いは、エポキシ樹脂
を同じ溶媒又は他の溶媒に溶解して、上記ポリア
ミドイミド樹脂溶液に配合すればよい。その場
合、ポリアミドイミド樹脂を溶解する溶媒とエポ
キシ樹脂を溶解する溶媒とは、同一のものにする
のが好ましい。溶媒は、使用に際して除去すれば
よい。エポキシ樹脂が液状の場合には、溶媒に溶
解させることなく配合することもできる。また、
加熱によりポリアミドイミド樹脂が溶融する場合
は、加熱溶融したポリアミドイミド樹脂にエポキ
シ樹脂を配合することもできる。
ポリアミドイミド樹脂及びエポキシ樹脂を溶解
する溶媒としては、例えば、N,N−ジメチルホ
ルムアミド、N,N−ジメチルアセトアミド、N
−メチル−2−ピロリドン、N−メチルカプロラ
クタム、ジメチルスルホキシド、テトラメチル尿
素、ピリジン、ジメチルスルホン、ヘキサメチル
リン酸トリアミド等があげられる。
本発明の耐熱性樹脂組成物には、所望に応じて
硬化促進剤を加えることもできる。
硬化促進剤としては、例えば、エチレンジアミ
ン、ジエチレントリアミン、トリエチレンテトラ
ミン、ジプロピレントリアミン、ジメチルアミノ
プロピルアミン、シクロヘキシルアミノプロピル
アミン、モノエタノールアミン、ジエタノールア
ミン、トリエタノールアミン、プロパノールアミ
ン、N,N−ジエチルベンジルアミン、1,8−
ジアザ−ビシクロ[5,4,0]ウンデカン−
7、1,1,3,3−テトラメチルグアニジン等
があげられる。
本発明の耐熱性樹脂組成物は、ポリアミドイミ
ド樹脂とエポキシ樹脂とを配合した後、使用に際
して、ポリアミドイミド樹脂とエポキシ樹脂との
相互作用を形成するために、200℃程度の温度で
数分間ないし数時間加熱することが好ましい。
本発明の耐熱性樹脂組成物は、耐熱性、接着
性、成形性、電気特性に優れているため、例え
ば、高温で使用するフイルム、電線被覆、接着
剤、塗料、積層品等の用途に有用である。
〔実施例〕
次に実施例によつて本発明を詳細に説明する。
実施例 1〜12
ポリアミドイミド樹脂として、第1表に示すテ
トラカルボン酸二無水物と、第1表に示す繰り返
し単位及び固有粘度を有するポリアミドとの重縮
合によつて得られたものを使用した。これを第1
表に示すエポキシ樹脂と共に、N,N−ジメチル
ホルムアミドに溶解し、得られた溶液を、ガラス
板上に流延し、60℃で1時間、100℃で2時間、
200℃で6時間熱処理してフイルムを作成した。
得られたフイルムの熱分解開始温度を熱天秤
(真空理工社製)を用いて、昇温温度10℃/min
の条件で測定し、誘電損失をアルミニウム電極を
蒸着した後、TRS−10型誘電体測定装置(安藤
電気社製)を用いて測定し、引張強度をテンシロ
ン試験器(オリエンテツク社製)を用いて測定し
た。
銅箔接着力は、ポリアミドイミド樹脂とエポキ
シ樹脂のN,N−ジメチルホルムアミド溶液を銅
箔上に流延し、60℃で1時間、100℃で2時間、
200℃、0.6Kg/cm2で2時間、プレス成形し、さら
に200℃で4時間熱処理して、厚さ40μmの銅箔と
熱接触させ、ピール強度試験器を用いて測定し
た。It can be obtained by subjecting an aromatic dicarboxylic acid represented by the formula to a polycondensation reaction using a known method. In that case, examples of diamine compounds represented by the above general formula () that can be used include the following compounds. m-phenylenediamine, p-phenylenediamine, metatolylenediamine, 4,4'-diaminodiphenyl ether, 3,3'-dimethyl-4,4'-diaminodiphenyl ether, 3,3'-diamino Diphenyl ether, 3,4'-diaminodiphenyl ether,
4,4'-diaminodiphenyl thioether, 3,
3'-dimethyl-4,4'-diaminodiphenyl thioether, 3,3'-diethoxy-4,4'-diaminodiphenyl thioether, 3,3'-diaminodiphenyl thioether, 4,4'-diaminobenzophene Non, 3,3'-dimethyl-4,4'-diaminobenzophenone, 3,3'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,
3'-methoxy-4,4'-diaminodiphenylmethane, 2,2'-bis(4-aminophenyl)propane, 2,2'-bis(3-aminophenyl)propane, 4,4'-diaminodiphenyl sulfoxide ,
4,4'-diaminodiphenylsulfone, 3,3'-
Diaminodiphenyl sulfone, benzidine, 3,
3'-dimethylbenzidine, 3,3'-dimethoxybenzidine, 3,3'-diaminobiphenyl, hexamethylene diamine, heptamethylene diamine, tetramethylene diamine, p-xylylene diamine, m-xylylene diamine, 3 -Methylheptamethylenediamine, etc. Further, the aromatic dicarboxylic acids represented by the above general formula () that can be used for polycondensation with these diamine compounds include, for example, 3-hydroxyphthalic acid, 4-hydroxyphthalic acid, 2-hydroxyphthalic acid, 4-hydroxyisophthalic acid, 5-hydroxyisophthalic acid, 2-hydroxyterephthalic acid, 3-hydroxyterephthalic acid,
etc. can be mentioned. On the other hand, examples of the tetracarboxylic dianhydride derivative represented by the above general formula () include pyromellitic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,4,3' , 4'-biphenyltetracarboxylic dianhydride, 2,3,
2′,3′-biphenyltetracarboxylic dianhydride,
Bis(3,4-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)
Sulfone dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 3,4,
Examples include 3',4'-benzophenonetetracarboxylic dianhydride and butanetetracarboxylic dianhydride. The reaction between a polyamide whose main chain is composed of repeating units represented by the above general formula () and has amino groups at both ends of the main chain and a tetracarboxylic dianhydride represented by the above general formula () can be carried out using the known method. This can be done using a method. For example, the polyamide and tetracarboxylic dianhydride are reacted in an inert polar organic solvent at a temperature of -20 to 150°C, preferably 0 to 60°C for several tens of minutes to several days to produce polyamic acid. A polyamide-imide resin can be produced by further imidizing the polyamide-imide resin. Examples of inert polar organic solvents include N, N
-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone,
Examples include hexamethylphosphoric triamide. Examples of the imidization method include a method of dehydration and ring closure by heating. Reaction temperature is 150-400℃, preferably 180-350℃
The reaction time is 30 seconds to 10 hours, preferably 5 minutes to 5 hours. In the present invention, when the intrinsic viscosity of the polyamide-imide resin is lower than 0.1 dl/g, the film-forming ability is lost, and when it is higher than 5.0 dl/g, it becomes difficult to form a film uniformly, and the paint If it is, the viscosity is high, so there is a problem in handling. In the present invention, the preferred intrinsic viscosity range is 0.2 to 3.0 dl/g. Examples of the epoxy resin which is the other resin component of the heat-resistant resin composition of the present invention include bisphenol A type epoxy resin, o-cresol novolak type epoxy resin, phenol novolak type epoxy resin, and bisphenol F type epoxy resin. , bisphenol S type epoxy resin, benzophenone type epoxy resin, naphthalene type epoxy resin, cyclopentadiene type epoxy resin, benzenetriol type epoxy resin, resorcinol sulfide type epoxy resin, isopropylbenzene type epoxy resin, fluorene type epoxy resin, modified Examples include epoxy resin. The heat-resistant resin composition of the present invention can be obtained by blending the above-mentioned polyamide-imide resin and the above-mentioned epoxy resin. It is necessary that the content be in the range of ~40% by weight.
When the blending ratio of polyamide-imide resin is lower than 60% by weight, heat resistance decreases, and when the blending ratio of polyamide-imide resin is lower than 60% by weight,
When the temperature is higher than , moldability and adhesiveness deteriorate.
A preferred blending ratio is 70 to 90% by weight of the polyamide-imide resin and 30 to 10% by weight of the epoxy resin. In order to produce the heat-resistant resin composition of the present invention, the above-mentioned polyamide-imide resin is dissolved in a solvent, and the epoxy resin is directly dissolved in the above-mentioned polyamide-imide resin solution, or the epoxy resin is dissolved in the same solvent or other solvent. What is necessary is just to dissolve it in the solvent and mix it into the above-mentioned polyamide-imide resin solution. In that case, it is preferable that the solvent in which the polyamide-imide resin is dissolved and the solvent in which the epoxy resin is dissolved are the same. The solvent may be removed before use. When the epoxy resin is in liquid form, it can also be blended without being dissolved in a solvent. Also,
When the polyamide-imide resin is melted by heating, an epoxy resin can also be blended with the heated and melted polyamide-imide resin. Examples of solvents that dissolve polyamideimide resins and epoxy resins include N,N-dimethylformamide, N,N-dimethylacetamide, and N,N-dimethylformamide.
-Methyl-2-pyrrolidone, N-methylcaprolactam, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoric triamide, and the like. A curing accelerator can also be added to the heat-resistant resin composition of the present invention, if desired. Examples of the curing accelerator include ethylenediamine, diethylenetriamine, triethylenetetramine, dipropylenetriamine, dimethylaminopropylamine, cyclohexylaminopropylamine, monoethanolamine, diethanolamine, triethanolamine, propanolamine, N,N-diethylbenzylamine. , 1,8-
Diaza-bicyclo[5,4,0]undecane-
Examples include 7,1,1,3,3-tetramethylguanidine. After blending the polyamide-imide resin and the epoxy resin, the heat-resistant resin composition of the present invention is prepared at a temperature of about 200°C for several minutes to form an interaction between the polyamide-imide resin and the epoxy resin. Preferably, the mixture is heated for several hours. The heat-resistant resin composition of the present invention has excellent heat resistance, adhesiveness, moldability, and electrical properties, so it is useful for applications such as films used at high temperatures, electric wire coatings, adhesives, paints, and laminates. It is. [Example] Next, the present invention will be explained in detail with reference to Examples. Examples 1 to 12 As polyamide-imide resins, those obtained by polycondensation of the tetracarboxylic dianhydrides shown in Table 1 and polyamides having the repeating units and intrinsic viscosity shown in Table 1 were used. . This is the first
The epoxy resin shown in the table was dissolved in N,N-dimethylformamide, and the resulting solution was cast onto a glass plate, heated at 60°C for 1 hour, and at 100°C for 2 hours.
A film was prepared by heat treatment at 200°C for 6 hours. The thermal decomposition start temperature of the obtained film was determined using a thermobalance (manufactured by Shinku Riko Co., Ltd.) at a heating temperature of 10°C/min.
The dielectric loss was measured using a TRS-10 type dielectric measuring device (manufactured by Ando Electric Co., Ltd.) after depositing an aluminum electrode, and the tensile strength was measured using a Tensilon tester (manufactured by Orientek Co., Ltd.). It was measured using Copper foil adhesive strength was determined by casting an N,N-dimethylformamide solution of polyamide-imide resin and epoxy resin onto copper foil, heating it at 60°C for 1 hour, and heating it at 100°C for 2 hours.
It was press-molded at 200° C. for 2 hours at 0.6 kg/cm 2 , then heat treated at 200° C. for 4 hours, brought into thermal contact with a 40 μm thick copper foil, and measured using a peel strength tester.
【表】【table】
本発明の耐熱性樹脂組成物は、優れた耐熱性、
接着性、成形性、電気特性を有し、例えば、高温
で使用するフイルム、電線被覆、接着剤、塗料、
積層品等の用途に有用であり、特に、高精度かつ
高信頼性を示す半導体チツプの周辺に使用する接
着材料として有用である。
The heat-resistant resin composition of the present invention has excellent heat resistance,
It has adhesion, moldability, and electrical properties, such as films used at high temperatures, wire coatings, adhesives, paints,
It is useful for applications such as laminated products, and is particularly useful as an adhesive material used around semiconductor chips that exhibit high precision and reliability.
Claims (1)
重縮合によつて得られ、主鎖が下記一般式()
で示される繰り返し単位 【化】 (式中、Rは、低級アルキル基で置換されていて
もよいフエニレン基またはC1〜C12のアルキレン
基を表わす。) からなり、固有粘度0.01〜3.0dl/gを有し、か
つ、主鎖の両末端にアミノ基を有するポリアミド
と、下記一般式() 【式】 (式中、Arは、4価の芳香族有機基を表わし、
4個のカルボニル基がそれぞれ別の炭素原子に直
接結合し、かつ、各対のカルボニル基は、Ar基
中における隣接炭素原子に結合する。) で示されるテトラカルボン酸二無水物との重縮合
体であつて、固有粘度0.1〜5.0dl/gを有するポ
リアミドイミド樹脂60〜99重量%と、(b)エポキシ
樹脂1〜40重量%とよりなることを特徴とする耐
熱性樹脂組成物。[Claims] 1 (a) Obtained by polycondensation of a diamine compound and an aromatic dicarboxylic acid, the main chain having the following general formula ()
It consists of a repeating unit represented by [formula] (wherein R represents a phenylene group or a C 1 to C 12 alkylene group which may be substituted with a lower alkyl group), and has an intrinsic viscosity of 0.01 to 3.0 dl/ g and having amino groups at both ends of the main chain, and the following general formula () [Formula] (where Ar represents a tetravalent aromatic organic group,
Each of the four carbonyl groups is directly bonded to a different carbon atom, and each pair of carbonyl groups is bonded to an adjacent carbon atom in the Ar group. ) 60-99% by weight of a polyamide-imide resin which is a polycondensate with tetracarboxylic dianhydride and has an intrinsic viscosity of 0.1-5.0 dl/g, and (b) 1-40% by weight of an epoxy resin. A heat-resistant resin composition comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15524590A JPH0446954A (en) | 1990-06-15 | 1990-06-15 | Heat-resistant resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15524590A JPH0446954A (en) | 1990-06-15 | 1990-06-15 | Heat-resistant resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0446954A JPH0446954A (en) | 1992-02-17 |
JPH0583580B2 true JPH0583580B2 (en) | 1993-11-26 |
Family
ID=15601705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15524590A Granted JPH0446954A (en) | 1990-06-15 | 1990-06-15 | Heat-resistant resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0446954A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3614516B2 (en) * | 1995-06-28 | 2005-01-26 | 大日本インキ化学工業株式会社 | Epoxy resin composition |
JP4723929B2 (en) * | 2005-06-23 | 2011-07-13 | 片山工業株式会社 | End cap and molding with end cap |
JP5453755B2 (en) * | 2007-10-11 | 2014-03-26 | 日立化成株式会社 | Curable resin composition and electronic component |
JP5265494B2 (en) | 2009-10-14 | 2013-08-14 | 株式会社ニフコ | Mounting structure and mounting tool |
-
1990
- 1990-06-15 JP JP15524590A patent/JPH0446954A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0446954A (en) | 1992-02-17 |
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