JPH0582849B2 - - Google Patents
Info
- Publication number
- JPH0582849B2 JPH0582849B2 JP61201060A JP20106086A JPH0582849B2 JP H0582849 B2 JPH0582849 B2 JP H0582849B2 JP 61201060 A JP61201060 A JP 61201060A JP 20106086 A JP20106086 A JP 20106086A JP H0582849 B2 JPH0582849 B2 JP H0582849B2
- Authority
- JP
- Japan
- Prior art keywords
- bis
- polyimide resin
- diphenoxyalkane
- represented
- succinic anhydride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920001721 polyimide Polymers 0.000 claims description 32
- 239000009719 polyimide resin Substances 0.000 claims description 28
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 claims description 16
- 229940014800 succinic anhydride Drugs 0.000 claims description 16
- 229920005575 poly(amic acid) Polymers 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 13
- 150000004984 aromatic diamines Chemical group 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 230000018044 dehydration Effects 0.000 claims description 8
- 238000006297 dehydration reaction Methods 0.000 claims description 8
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 5
- 150000004985 diamines Chemical class 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 18
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- -1 tetracarboxylic compound Chemical class 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 238000000862 absorption spectrum Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- FHBXQJDYHHJCIF-UHFFFAOYSA-N (2,3-diaminophenyl)-phenylmethanone Chemical compound NC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1N FHBXQJDYHHJCIF-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- ISXCYFNKGRXZFQ-UHFFFAOYSA-N 1,1-diphenylpropane-2,2-diamine Chemical compound C=1C=CC=CC=1C(C(N)(N)C)C1=CC=CC=C1 ISXCYFNKGRXZFQ-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ITNADJKYRCCJNX-UHFFFAOYSA-N 3-(2,3-diaminophenyl)sulfonylbenzene-1,2-diamine Chemical compound NC1=CC=CC(S(=O)(=O)C=2C(=C(N)C=CC=2)N)=C1N ITNADJKYRCCJNX-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- MLIREBYILWEBDM-UHFFFAOYSA-N anhydrous cyanoacetic acid Natural products OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Furan Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
(イ) 産業上の利用分野
本発明は、脂肪族構造を有するテトラカルボン
酸無水物から導かれる新規な線状ポリイミド樹脂
及びそれらの製造法に関するものである。更に詳
しくは、耐熱性、透明性、耐薬品性及び各種基材
に対する密着性に優れた新規な線状ポリイミド樹
脂及びその製造法に関するものである。
(ロ) 従来の技術
ポリイミド樹脂は、ピロメリツト酸二無水物等
の芳香族テトラカルボン酸二無水物と芳香族ジア
ミンの反応によつて得られる線状の高分子であ
り、高引張強度、強靱性をもち優れた電気絶縁性
と耐薬品性を示すうえ、耐熱性が優れるという特
徴をもつ。
従つて、耐熱性のフイルム、接着剤、成形用樹
脂、積層用樹脂、繊維として使用するのに好適で
あり、近年これらの特性を利用して、自動車部
品、特殊機械部品、電気、電子材料、宇宙・航空
機材料等への応用が盛んになりつつある。
これらの耐熱性芳香族ポリイミド樹脂は濃い琥
珀色に着色していることが、一つの外観上の特徴
である。
一方、最近になつて適当な脂肪族構造を有する
テトラカルボン酸無水物を使用した透明性に優れ
且つ耐熱性が良好なポリイミド樹脂が提案されて
いる(特開昭60−6727号)。
しかし、このポリイミド樹脂は原料であるテト
ラカルボン酸無水物の製造が比較的煩雑であり、
実用上必ずしも満足の行くものではない。
(ハ) 発明が解決しようとする問題点
本発明は、上記問題点を改良した工業的に製造
が有利で、耐熱性、密着性及び透明性に優れたポ
リイミド樹脂の製造原料として有用なテトラカル
ボン酸無水物から得られる耐熱性、透明性、耐薬
品性及び各種基材に対する密着性に優れた脂肪族
構造を有する新規なポリイミド樹脂及びその製造
法を提供するものである。
(ニ) 問題点を解決するための手段
本発明者は、下記一般式〔〕で表されるジフ
エノキシアルカン−4,4′−ビス(コハク酸無水
物)を芳香族ジアミンと重合させて、次いで脱水
閉環させて得られるポリイミド樹脂は、透明強靱
で耐熱性、耐薬品性及びガラス、金属等の各種基
材に対する密着性が優れていることも見出した。
先ず、本発明に使用するジフエノキシアルカン
−4,4′−ビス(コハク酸無水物)の製造法につ
いて述べる。
一般式〔〕
(a) Industrial Application Field The present invention relates to novel linear polyimide resins derived from tetracarboxylic acid anhydrides having an aliphatic structure and methods for producing them. More specifically, the present invention relates to a novel linear polyimide resin that has excellent heat resistance, transparency, chemical resistance, and adhesion to various substrates, and a method for producing the same. (b) Prior art Polyimide resin is a linear polymer obtained by the reaction of aromatic tetracarboxylic dianhydride such as pyromellitic dianhydride with aromatic diamine, and has high tensile strength and toughness. In addition to exhibiting excellent electrical insulation and chemical resistance, it also has excellent heat resistance. Therefore, it is suitable for use as heat-resistant films, adhesives, molding resins, laminating resins, and fibers.In recent years, these properties have been utilized to produce automobile parts, special mechanical parts, electrical and electronic materials, Applications to space and aircraft materials are becoming more popular. One of the external features of these heat-resistant aromatic polyimide resins is that they are colored a deep amber color. On the other hand, recently, a polyimide resin using a tetracarboxylic acid anhydride having an appropriate aliphatic structure and having excellent transparency and good heat resistance has been proposed (Japanese Patent Application Laid-open No. 6727-1989). However, the production of the raw material tetracarboxylic acid anhydride for this polyimide resin is relatively complicated;
This is not necessarily satisfactory in practice. (c) Problems to be Solved by the Invention The present invention solves the above-mentioned problems and provides a tetracarboxylic compound useful as a raw material for producing polyimide resins that are advantageous in industrial production and have excellent heat resistance, adhesion, and transparency. The present invention provides a novel polyimide resin having an aliphatic structure that is obtained from an acid anhydride and has excellent heat resistance, transparency, chemical resistance, and adhesion to various substrates, and a method for producing the same. (d) Means for Solving the Problems The present inventor has developed a method by polymerizing diphenoxyalkane-4,4'-bis(succinic anhydride) represented by the following general formula [] with an aromatic diamine. It has also been found that the polyimide resin obtained by subsequent dehydration and ring closure is transparent, tough, and has excellent heat resistance, chemical resistance, and adhesion to various substrates such as glass and metal. First, a method for producing diphenoxyalkane-4,4'-bis(succinic anhydride) used in the present invention will be described. General formula []
【化】
(式中、nは1〜5の整数を示す。)
で表されるジフエノキシアルカン−4,4′−ビス
(コハク酸無水物)の製造法は、一般式〔〕The method for producing diphenoxyalkane-4,4'-bis(succinic anhydride) represented by the following general formula []
【化】
(式中、nは1〜5の整数を示し、R2は炭素数
1〜4のアルキル基を示す。)
で表される4,4′−ビス(β−シアノ、β−アル
コキシカルボニルビニル)−ジフエノキシアルカ
ンとシアン化アルカリを反応させて製造すること
ができる。
上記製造法において、出発原料として用いられ
る一般式〔〕で表される4,4′−ビス(β−シ
アノ、β−アルコキシカルボニルビニル)−ジフ
エノキシアルカンは、一般式〔〕で表される
4,4′−ジホルミルジフエノキシアルカンとシア
ノ酢酸エステルとの反応によつて製造することが
でき、この反応は、次式で表すことができる。4,4'-bis(β- cyano , β-alkoxy It can be produced by reacting carbonylvinyl)-diphenoxyalkane with alkali cyanide. In the above production method, the 4,4'-bis(β-cyano, β-alkoxycarbonylvinyl)-diphenoxyalkane represented by the general formula [] used as a starting material is represented by the general formula [] It can be produced by the reaction of 4,4'-diformyldiphenoxyalkane and cyanoacetic acid ester, and this reaction can be represented by the following formula.
【化】
(式中、n、R2は前期に同じ)
ここで、一般式〔〕で表される4,4′−ビス
(β−シアノ、β−アルコキシカルボニルビニル)
−ジフエノキシアルカンは、p−ヒドロキシフエ
ニルアルデヒド類と一般式〔〕で表されるメチ
レンジハロゲン化物の反応によつて製造すること
ができる。
この反応は、次式で表すことができる。[Chemical formula] (In the formula, n and R 2 are the same as in the previous term) Here, 4,4'-bis(β-cyano, β-alkoxycarbonylvinyl) represented by the general formula []
-Diphenoxyalkanes can be produced by reacting p-hydroxyphenylaldehydes with methylene dihalides represented by the general formula []. This reaction can be expressed by the following formula.
【化】 (式中、Xはハロゲン、nは前記に同じ)[ka] (In the formula, X is halogen, n is the same as above)
【式】
上記一般式〔〕で表されるジフエノキシアル
カン−4,4′−ビス(コハク酸無水物)の製造法
において、シアン化アルカリと一般式〔〕で表
される4,4′−ビス(βシアノ、β−アルコキシ
カルボニルビニル)−ジフエノキシアルカンの反
応は無触媒で進行し、付加化合物が生成すること
が分かつた。この付加化合物を酸性で加水分解す
ると、一般式〔〕で表されるジフエノキシアル
カン−4,4′−ビス(コハク酸)を製造すること
ができる。
この反応は次式で表すことができる。[Formula] In the method for producing diphenoxyalkane-4,4'-bis(succinic anhydride) represented by the general formula [] above, alkali cyanide and 4,4' represented by the general formula [] It was found that the reaction of -bis(β-cyano, β-alkoxycarbonylvinyl)-diphenoxyalkane proceeded without a catalyst and an addition compound was produced. By acidically hydrolyzing this addition compound, diphenoxyalkane-4,4'-bis(succinic acid) represented by the general formula [] can be produced. This reaction can be expressed by the following formula.
【化】[ka]
【化】
(式中、n及びR2は前記に同じ)
ジフエノキシアルカン−4,4′−ビス(コハク
酸)と無水酢酸を煮沸することにより一般式
〔〕で表されるジフエノキシアルカン−4,
4′−ビス(コハク酸無水物)を製造することがで
きる。[Chemical formula] (In the formula, n and R 2 are the same as above.) Diphenoxylated by boiling diphenoxyalkane-4,4'-bis(succinic acid) and acetic anhydride. Alkane-4,
4'-bis(succinic anhydride) can be produced.
【化】
(式中、nは前記に同じ)
次に本発明の目的である線状ポリイミドについ
て述べる。
本発明は、第1に下記繰返し構造単位〔〕で
表される線状ポリイミドに関するものである。embedded image (where n is the same as above) Next, the linear polyimide which is the object of the present invention will be described. The present invention first relates to a linear polyimide represented by the following repeating structural unit [ ].
【化】
(式中、nは1〜5の整数、R1は芳香族ジアミ
ン残基を示す。)
更に、本発明は、第2に上記繰返し単位〔〕
で表される線状ポリイミド樹脂の製造法に関し、
その製造法は一般式〔〕で表されるジフエノキ
シアルカン−4,4′−ビス(コハク酸無水物)と
芳香族ジアミンを溶媒中で重合させ、次いで脱水
閉環させるものである。
ジフエノキシアルカン−4,4′−ビス(コハク
酸無水物)と反応させる芳香族ジアミンは、特に
制限されるものではない。
その代表的な例をあげれば、p−フエニレンジ
アミン、m−フエニレンジアミン、ジアミノジフ
エニルメタン、ジアミノジフエニルエーテル、
2,2−ジアミノジフエニルプロパン、ジアミノ
フエニルスルホン、ジアミノベンゾフエノン、ジ
アミノナフタレン、1,3−ビス(4−アミノフ
エノキシ)ベンゼン、1,4−ビス(4−アミノ
フエノキシ)ベンゼン、4,4′−ジ(4−アミノ
フエノキシ)ジフエニルスルホン、2,2′−ビス
〔4(4−アミノフエノキシ)フエニル〕プロパン
等が挙げられる。
これらの芳香族ジアミンは一種に限定されるも
のではなく、二種以上を用いてもかまわない。
又、本発明におけるポリミド樹脂の用途に応じ
て、特定の性質を付与する目的でこれら芳香族ジ
アミンを種々選択することは当然好ましいことで
あり、この目的で芳香族ジアミンの一部を脂肪族
ジアミン、脂環式ジアミン等で使用することも何
等差支えない。
更に、得られるポリイミド樹脂の耐熱性、透明
性並びに各種基材に対する密着性を損なわない限
りにおいて、ジフエノキシアルカン−4,4′−ビ
ス(コハク酸無水物)の一部を他のテトラカルボ
ン酸無水物、例えば、ピロメリツト酸二無水物、
ベンゾフエノンテトラカルボン酸二無水物等の芳
香族酸無水物、ブタンテトラカルボン酸二無水物
等の脂肪族酸無水物等で置換して用いることも差
支えない。
ジフエノキシアルカン−4,4′−ビス(コハク
酸無水物)と芳香族ジアミンを溶媒中で重合さ
せ、所謂ポリアミド酸とし、次いで脱水閉環する
ことによりポリイミド樹脂とする重合法は生成す
るポリアミド酸を単離せずにポリイミド樹脂とす
る一段法で行つてもよく、或いは生成したポリア
ミド酸を単離し、次いで脱水閉環させてポリミド
樹脂とする二段法で行つてもよい。
本発明における重合法は、溶液法が好適であ
る。
溶液法に用いられる溶媒としては、生成するポ
リアミド酸を溶解するものであれば特に限定され
るものではない。
代表的な溶媒としては、N,N−ジメチルホル
ムアミド、N,N−ジメチルアセトアミド、N−
メチルピロリドン、N−メチルカプロラクタム、
ジメチルスルホキシド、テトラメチル尿素、ピリ
ジン、ジメチルスルホン、ヘキサメチルホスホル
アミド、ブチロラクトン等が挙げられる。
これらは、単独で用いてもよく、又混合して用
いてもかまわない。
更に、ポリアミド酸を溶解しない溶媒であつて
も、ポリアミド酸を溶解させうる範囲内でこれを
上記溶媒に加えても何等差支えない。
本発明における重合においては、ジフエノキシ
アルカン−4,4′−ビス(コハク酸無水物)と芳
香族ジアミンのモル比は0.5〜2、好ましくは0.9
〜1.1の任意のモル比で反応させることができる。
通常の重合反応と同様、これら二成分のモル比が
1に近いほど生成するポリアミド酸の分子量は大
きくなる。
ポリアミド酸生成のための重合温度は−20〜
150℃の任意の温度を選択できるが、特に−5〜
100℃の範囲が好ましい。
本発明において、ポリアミド酸をポリイミド樹
脂に転化するには、通常は加熱により脱水閉環す
る方法がとられる。この加熱脱水閉環する温度
は、150〜400℃、好ましくは170〜350℃の任意の
温度を選択できる。
又、この脱水閉環に要する時間は上記反応温度
にもによるが30秒〜10時間、好ましくは5分〜5
時間をかけることが適当である。
又、ポリアミド酸をポリイミド樹脂に転化する
他の方法として、脱水閉環触媒を用いて化学的に
閉環する方法もとりうる。これらの方法について
は、通常のポリイミド樹脂の合成において用いら
れる公知の方法をそのまま採用でき、特に条件等
を制限されるものではない。
(ホ) 発明の効果
本発明の方法により比較的安価に得られる一般
式〔〕で表されるジフエノキシアルカン−4,
4′−ビス(コハク酸無水物)を原料の一成分とし
て用いて得られるポリイミド樹脂はこれまで知ら
れていなかつた。
又、本発明のポリイミド樹脂は、透明性、耐熱
性、耐薬品性に優れ、更にガラス、金属等の各種
基材に対して優れた密着性をもつ等の特徴を有し
ている。
従つて、本発明のポリイミド樹脂は、表示材料
(例えば透明導電膜のベースフイルム、液晶配向
膜)フイルム、シートを始めエナメル、ラミネー
ト、接着剤、積層剤等への応用が可能である。
(ホ) 実施例
以下、実施例について本発明を具体的に説明す
るが、本発明はこれらに限定されるものではな
い。
実施例 1〜9
ポリアミド酸及びポリイミド樹脂の製造
反応式を下記に示す。尚、結果を表1に示し
た。(In the formula, n is an integer of 1 to 5, and R 1 represents an aromatic diamine residue.) Furthermore, the present invention secondly provides the above repeating unit []
Regarding the manufacturing method of linear polyimide resin represented by
The manufacturing method is to polymerize diphenoxyalkane-4,4'-bis (succinic anhydride) represented by the general formula [] and aromatic diamine in a solvent, followed by dehydration and ring closure. The aromatic diamine to be reacted with diphenoxyalkane-4,4'-bis(succinic anhydride) is not particularly limited. Representative examples include p-phenylenediamine, m-phenylenediamine, diaminodiphenylmethane, diaminodiphenyl ether,
2,2-diaminodiphenylpropane, diaminophenyl sulfone, diaminobenzophenone, diaminonaphthalene, 1,3-bis(4-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 4,4' -di(4-aminophenoxy)diphenylsulfone, 2,2'-bis[4(4-aminophenoxy)phenyl]propane, and the like. These aromatic diamines are not limited to one type, and two or more types may be used. Furthermore, depending on the use of the polymide resin in the present invention, it is naturally preferable to select various aromatic diamines for the purpose of imparting specific properties, and for this purpose, some of the aromatic diamines are replaced with aliphatic diamines. , alicyclic diamine, etc. may be used without any problem. Furthermore, a portion of the diphenoxyalkane-4,4'-bis(succinic anhydride) may be added to other tetracarbons as long as the heat resistance, transparency, and adhesion to various substrates of the resulting polyimide resin are not impaired. Acid anhydrides, such as pyromellitic dianhydride,
There is no problem in using aromatic acid anhydrides such as benzophenonetetracarboxylic dianhydride, aliphatic acid anhydrides such as butanetetracarboxylic dianhydride, and the like. A polymerization method in which diphenoxyalkane-4,4'-bis (succinic anhydride) and aromatic diamine are polymerized in a solvent to form a so-called polyamic acid, which is then dehydrated and ring-closed to form a polyimide resin. This may be carried out in a one-step method in which a polyimide resin is obtained without isolating the polyamic acid, or in a two-step method in which the produced polyamic acid is isolated and then subjected to dehydration and ring closure to obtain a polyimide resin. The polymerization method used in the present invention is preferably a solution method. The solvent used in the solution method is not particularly limited as long as it dissolves the polyamic acid produced. Typical solvents include N,N-dimethylformamide, N,N-dimethylacetamide, N-
Methylpyrrolidone, N-methylcaprolactam,
Examples include dimethyl sulfoxide, tetramethylurea, pyridine, dimethyl sulfone, hexamethylphosphoramide, butyrolactone, and the like. These may be used alone or in combination. Furthermore, even if the solvent does not dissolve the polyamic acid, there is no problem in adding it to the above solvent as long as it can dissolve the polyamic acid. In the polymerization in the present invention, the molar ratio of diphenoxyalkane-4,4'-bis(succinic anhydride) to aromatic diamine is 0.5 to 2, preferably 0.9.
Any molar ratio between ~1.1 can be reacted.
As in normal polymerization reactions, the closer the molar ratio of these two components is to 1, the greater the molecular weight of the produced polyamic acid. The polymerization temperature for producing polyamic acid is −20~
Any temperature of 150℃ can be selected, especially from -5 to
A range of 100°C is preferred. In the present invention, in order to convert polyamic acid into polyimide resin, a method of dehydration and ring closure by heating is usually used. The temperature for this thermal dehydration ring closure can be selected from any temperature from 150 to 400°C, preferably from 170 to 350°C. The time required for this dehydration ring closure depends on the above reaction temperature, but is preferably 30 seconds to 10 hours, preferably 5 minutes to 5 hours.
It is appropriate to take your time. Further, as another method for converting polyamic acid into polyimide resin, a method of chemically ring-closing using a dehydration ring-closing catalyst can also be used. Regarding these methods, known methods used in the synthesis of ordinary polyimide resins can be used as they are, and the conditions are not particularly limited. (E) Effects of the invention Diphenoxyalkane-4 represented by the general formula [], which can be obtained relatively inexpensively by the method of the invention,
A polyimide resin obtained using 4'-bis(succinic anhydride) as one of the raw materials has not been known so far. Furthermore, the polyimide resin of the present invention has characteristics such as excellent transparency, heat resistance, and chemical resistance, and also excellent adhesion to various substrates such as glass and metal. Therefore, the polyimide resin of the present invention can be applied to display materials (for example, base films for transparent conductive films, liquid crystal alignment films), films, sheets, enamels, laminates, adhesives, laminating agents, and the like. (e) Examples The present invention will be specifically described below with reference to Examples, but the present invention is not limited thereto. Examples 1 to 9 Production of polyamic acid and polyimide resin The reaction formula is shown below. The results are shown in Table 1.
【化】
(Yは、表1に記載の通りO、S又はCH2を示
す。)[Chemical formula] (Y represents O, S, or CH 2 as described in Table 1.)
【化】
ジアミン0.001モルをジメチルアセトアミド3.0
mlに加え、均一溶液とした。次にジフエノキシア
ルカン−4,4′−ビス(コハク酸無水物)0.001
モルを少しづつ加え、室温で24時間反応させた。
反応溶液をアルミ製シート上にキヤストし、減
圧下60〜70℃、4時間乾燥しポリアミド酸フイル
ムとした。更に、このフイルムを減圧下220℃で
10時間加熱処理した後、希塩酸でアルミ製シート
を溶解除去し、薄黄色の透明なポリイミド樹脂フ
イルムを得た。
表1にポリアミド酸の還元粘度、ポリイミド樹
脂の元素分析値、熱軟化温度及び熱安定性の測定
結果を示す。測定条件は次の通りである。
ポリアミド酸還元粘度
0.2g/dlジメチルアセトアミド溶液30℃
軟化温度
熱安定性
空気中及び窒素ガス中における加熱減量曲線
(昇温速度5℃/分)の10%重量減少温度
図1,2,3,4,5,6,7,8及び図9に
実施例1(n=2、Y=O)、2(n=2、Y=
S)、3(n=2、Y=CH2)、4(n=3、Y=
O)、5(n=3、Y=S)、6(n=3、Y=
CH2)、7(n=4、Y=O)、8(n=4、Y=
S)及び実施例9(n=4、Y=CH2)のポリイ
ミドの赤外線吸収スペクトル(KBr錠剤法)の
チヤートを示す。
赤外線吸収スペクトルは、1770cm-1、1700cm
-1、1290cm-1の吸収があり5員環状イミドが生成
していることを示している。又、実施例1、2、
3、4、5、6、7、8及び9の生成したポリイ
ミド樹脂はジメチルアセトアミド、N−メチル−
2−ピロリジノンには加熱しても不溶であつた。
更に、図13,14,15,16,17,1
8,19,20及び21に実施例1、2、3、
4、5、6、7、8及び9のポリイミド樹脂の加
熱減量曲線を示す。
実線は空気中、点線は窒素中での測定である。[Chemical] 0.001 mol of diamine to 3.0 mol of dimethylacetamide
ml to make a homogeneous solution. Next, diphenoxyalkane-4,4'-bis(succinic anhydride) 0.001
mol was added little by little and allowed to react at room temperature for 24 hours. The reaction solution was cast on an aluminum sheet and dried under reduced pressure at 60 to 70°C for 4 hours to obtain a polyamic acid film. Furthermore, this film was heated at 220℃ under reduced pressure.
After heat treatment for 10 hours, the aluminum sheet was dissolved and removed with dilute hydrochloric acid to obtain a light yellow transparent polyimide resin film. Table 1 shows the measurement results of the reduced viscosity of the polyamic acid, the elemental analysis values of the polyimide resin, the thermal softening temperature, and the thermal stability. The measurement conditions are as follows. Polyamide acid reduced viscosity 0.2g/dl dimethylacetamide solution 30℃ Softening temperature Thermal stability 10% weight loss temperature of heating loss curve (heating rate 5℃/min) in air and nitrogen gas Figures 1, 2, 3, 4, 5, 6, 7, 8 and FIG. 9 show examples 1 (n=2, Y=O) and 2 (n=2, Y=
S), 3 (n=2, Y=CH 2 ), 4 (n=3, Y=
O), 5 (n=3, Y=S), 6 (n=3, Y=
CH 2 ), 7 (n = 4, Y = O), 8 (n = 4, Y =
Figure 3 shows charts of infrared absorption spectra (KBr tablet method) of polyimides of S) and Example 9 (n=4, Y= CH2 ). The infrared absorption spectrum is 1770cm -1 and 1700cm
-1 and 1290 cm -1 , indicating that a 5-membered cyclic imide is produced. Moreover, Examples 1, 2,
The polyimide resins produced in Nos. 3, 4, 5, 6, 7, 8 and 9 are dimethylacetamide, N-methyl-
It was insoluble in 2-pyrrolidinone even when heated. Furthermore, FIGS. 13, 14, 15, 16, 17, 1
8, 19, 20 and 21, Examples 1, 2, 3,
4 shows heating loss curves of polyimide resins Nos. 4, 5, 6, 7, 8 and 9. The solid line is the measurement in air, and the dotted line is the measurement in nitrogen.
【表】
参考例 1〜3
以下に、本発明に使用したシアルカン−4,
4′−ビス(コハク酸無水物)の製造例を参考とし
て示す。[Table] Reference Examples 1 to 3 Below, sialkane-4 used in the present invention,
An example of the production of 4'-bis(succinic anhydride) is shown for reference.
【化】[ka]
【化】
0.2モルの4,4′−ビス(β−シアノ、β−エ
トキシカルボニルビニル)−ジフエノキシアルカ
ンをエタノール1000mlに分散し、42gのシアン化
カリウムを含む200mlの水溶液を滴下し室温で12
時間攪拌した。濃塩酸で強酸性にした後、ロータ
リーエバポレーターでエタノールと水を減圧留去
し、残渣に濃塩酸200mlを加え、12時間還流した。
放冷後、冷却し結晶を濾別し、氷酢酸と水の混合
液(9:1)から再結晶させた。この結晶0.1モ
ルを200mlの無水酢酸に分散し、4時間還流した。
次に、室温に放冷し、同体積のエチルエーテルを
加えて生成物を濾別後、加熱した無水酢酸に溶解
し、エチルエーテルを加えて結晶化させジフエノ
キシアルカン−4,4′−ビス(コハク酸無水物)
を得た。
表2に生成物の収率、融点、元素分析値を示
す。
又、参考例1(n=2)、2(n=3)及び参考
例3(n=4)に対応する赤外線吸収スペクトル
(KBr錠剤法)のチヤートを図10,11及び1
2に示す。[Chemical formula] 0.2 mol of 4,4'-bis(β-cyano, β-ethoxycarbonylvinyl)-diphenoxyalkane was dispersed in 1000 ml of ethanol, and 200 ml of an aqueous solution containing 42 g of potassium cyanide was added dropwise to the mixture at room temperature for 12 hours.
Stir for hours. After making the mixture strongly acidic with concentrated hydrochloric acid, ethanol and water were distilled off under reduced pressure using a rotary evaporator, 200 ml of concentrated hydrochloric acid was added to the residue, and the mixture was refluxed for 12 hours.
After cooling, the crystals were filtered off and recrystallized from a mixture of glacial acetic acid and water (9:1). 0.1 mol of this crystal was dispersed in 200 ml of acetic anhydride and refluxed for 4 hours.
Next, the product was allowed to cool to room temperature, the same volume of ethyl ether was added thereto, the product was filtered out, dissolved in heated acetic anhydride, and ethyl ether was added to crystallize the product.Diphenoxyalkane-4,4'- Bis(succinic anhydride)
I got it. Table 2 shows the yield, melting point, and elemental analysis values of the product. In addition, charts of infrared absorption spectra (KBr tablet method) corresponding to Reference Examples 1 (n = 2), 2 (n = 3) and Reference Example 3 (n = 4) are shown in Figures 10, 11 and 1.
Shown in 2.
図1,2,3,4,5,6,7,8及び9は、
実施例1、2、3、4、5、6、7、8及び9の
各種生成ポリイミド樹脂の赤外線吸収スペクトル
(KBr錠剤法)のチヤートを示す。図10,11
及び12は参考例1、2及び3の置換ジフエノキ
シアルカン−4,4′−ビス(コハク酸無水物)の
赤外線吸収スペクトル(KBr錠剤法)のチヤー
トを示す。又、図13,14,15,16,1
7,18,19,20及び21は実施例1、2、
3、4、5、6、7、8及び9の各種生成ポリイ
ミドの加熱減量曲線(実線は空気中、点線は窒素
中の測定、縦軸は重量残率%、横軸は温度を示
す。
Figures 1, 2, 3, 4, 5, 6, 7, 8 and 9 are
1 shows charts of infrared absorption spectra (KBr tablet method) of various polyimide resins produced in Examples 1, 2, 3, 4, 5, 6, 7, 8, and 9. Figures 10 and 11
and 12 show charts of infrared absorption spectra (KBr tablet method) of substituted diphenoxyalkane-4,4'-bis(succinic anhydride) of Reference Examples 1, 2, and 3. Also, Figures 13, 14, 15, 16, 1
7, 18, 19, 20 and 21 are Examples 1, 2,
Heating loss curves of various polyimides produced Nos. 3, 4, 5, 6, 7, 8, and 9 (solid lines are measurements in air, dotted lines are measurements in nitrogen, the vertical axis shows the weight remaining percentage, and the horizontal axis shows the temperature.
Claims (1)
ミン残基を示す。) で表され、前駆体であるポリアミド酸の還元粘度
が0.1〜2.0dl/g(30℃、0.2g/dlジメチルアセ
トアミド溶液)である線状ポリイミド樹脂。 2 一般式〔〕 【化】 (式中、nは1〜5の整数を示す。) で表されるジフエノキシアルカン−4,4′−ビス
(コハク酸無水物)とジアミンを溶媒中で重合さ
せ、次いで、脱水閉環せしめることを特徴とする
繰返し構造単位〔〕 【化】 (式中、nは1〜5の整数を示し、R1は芳香族
ジアミン残基を示す。) で表される線状ポリイミド樹脂の製造法。[Scope of Claims] 1 The following structural unit [] [Chemical formula] (wherein, n is an integer of 1 to 5, and R 1 represents an aromatic diamine residue), which is a precursor of polyamic acid A linear polyimide resin having a reduced viscosity of 0.1 to 2.0 dl/g (30°C, 0.2 g/dl dimethylacetamide solution). 2 Diphenoxyalkane-4,4'-bis(succinic anhydride) represented by the general formula [] [Chemical formula] (wherein n represents an integer of 1 to 5) and a diamine in a solvent. A repeating structural unit characterized by being polymerized and then subjected to dehydration ring closure [] [Chemical formula] (wherein n represents an integer of 1 to 5, and R 1 represents an aromatic diamine residue) A method for producing linear polyimide resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20106086A JPS6357581A (en) | 1986-08-27 | 1986-08-27 | Substituted diphenoxyalkane-4,4'-bis(succinic anhydride), linear polyimide and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20106086A JPS6357581A (en) | 1986-08-27 | 1986-08-27 | Substituted diphenoxyalkane-4,4'-bis(succinic anhydride), linear polyimide and production thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6357581A JPS6357581A (en) | 1988-03-12 |
JPH0582849B2 true JPH0582849B2 (en) | 1993-11-22 |
Family
ID=16434717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20106086A Granted JPS6357581A (en) | 1986-08-27 | 1986-08-27 | Substituted diphenoxyalkane-4,4'-bis(succinic anhydride), linear polyimide and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6357581A (en) |
Families Citing this family (2)
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---|---|---|---|---|
JPH0768745B2 (en) * | 1990-08-09 | 1995-07-26 | 日新工業株式会社 | Degassing waterproofing method and degassing lid used therefor |
WO2010056452A2 (en) * | 2008-11-14 | 2010-05-20 | Cytec Technology Corp. | Dimeric cyanoacrylate compounds as red-shifted uv absorbers |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4263209A (en) * | 1979-07-02 | 1981-04-21 | The Dow Chemical Company | Aromatic dianhydrides |
-
1986
- 1986-08-27 JP JP20106086A patent/JPS6357581A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4263209A (en) * | 1979-07-02 | 1981-04-21 | The Dow Chemical Company | Aromatic dianhydrides |
Also Published As
Publication number | Publication date |
---|---|
JPS6357581A (en) | 1988-03-12 |
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