JPH0572095B2 - - Google Patents
Info
- Publication number
- JPH0572095B2 JPH0572095B2 JP57098084A JP9808482A JPH0572095B2 JP H0572095 B2 JPH0572095 B2 JP H0572095B2 JP 57098084 A JP57098084 A JP 57098084A JP 9808482 A JP9808482 A JP 9808482A JP H0572095 B2 JPH0572095 B2 JP H0572095B2
- Authority
- JP
- Japan
- Prior art keywords
- molecular beam
- temperature
- raw material
- buffer chamber
- beam source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9808482A JPS58215021A (ja) | 1982-06-08 | 1982-06-08 | 分子線源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9808482A JPS58215021A (ja) | 1982-06-08 | 1982-06-08 | 分子線源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58215021A JPS58215021A (ja) | 1983-12-14 |
| JPH0572095B2 true JPH0572095B2 (enrdf_load_stackoverflow) | 1993-10-08 |
Family
ID=14210474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9808482A Granted JPS58215021A (ja) | 1982-06-08 | 1982-06-08 | 分子線源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58215021A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60115219A (ja) * | 1983-11-26 | 1985-06-21 | Anelva Corp | 薄膜形成装置用蒸発源セル |
| FR2572099B1 (fr) * | 1984-10-24 | 1987-03-20 | Comp Generale Electricite | Generateur de jets moleculaires par craquage thermique pour la fabrication de semi-conducteurs par depot epitaxial |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461464A (en) * | 1977-10-25 | 1979-05-17 | Fujitsu Ltd | Hot wall epitaxial growing unit |
| JPS5759127Y2 (enrdf_load_stackoverflow) * | 1978-09-26 | 1982-12-17 |
-
1982
- 1982-06-08 JP JP9808482A patent/JPS58215021A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58215021A (ja) | 1983-12-14 |
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