JPH0566393A - Liquid crystal element and liquid crystal display device - Google Patents

Liquid crystal element and liquid crystal display device

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Publication number
JPH0566393A
JPH0566393A JP3230367A JP23036791A JPH0566393A JP H0566393 A JPH0566393 A JP H0566393A JP 3230367 A JP3230367 A JP 3230367A JP 23036791 A JP23036791 A JP 23036791A JP H0566393 A JPH0566393 A JP H0566393A
Authority
JP
Japan
Prior art keywords
liquid crystal
transparent
display device
film
transparent substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3230367A
Other languages
Japanese (ja)
Inventor
Tetsuya Morita
哲也 森田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP3230367A priority Critical patent/JPH0566393A/en
Publication of JPH0566393A publication Critical patent/JPH0566393A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To increase the transmissivity of a display element and increase the lightness of a display, and to prevent the display quality from being spoiled by forming a reflection preventive film on at least one of a couple of glass substrates. CONSTITUTION:This liquid crystal display element has the couple of transparent substrates 14 and 15, a layer of liquid crystal 24 interposed between those transparent substrates 14 and 15, and the reflection preventive film 28 constituted by laminating at least two layers of transparent insulating films 26 and 27 which have different refractive index on at least one of the transparent substrates 14 and 15 on the side of the layer of the liquid crystal 24. A liquid crystal cell 7 in a figure has the reflection preventive film 28 formed only on the side of the glass substrate 15 where write laser light 6 is made incident. Thus, at least one of the glass substrates 14 and 15 constituting the liquid crystal cell 7 is coated with the reflection preventive film 28, so no multiple reflection is caused by the liquid crystal layer and interference fringes due to an irregularity in interference color never appears on a screen.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はエンジニアワークステー
ション(EWS)、コンピュータグラフィックス(C
G)、コンピュータアイドデザイン(CAD)等の表示
素子又は表示装置に適用して有用な液晶表示素子又は液
晶表示装置に係わり、特に反射防止膜を液晶セル内に設
けた液晶素子及び液晶表示装置に関する。
BACKGROUND OF THE INVENTION The present invention relates to an engineer workstation (EWS), computer graphics (C
G), a liquid crystal display device or a liquid crystal display device that is useful when applied to a display device or a display device such as computer-aided design (CAD), and particularly to a liquid crystal device and a liquid crystal display device in which an antireflection film is provided in a liquid crystal cell. ..

【0002】[0002]

【従来の技術】従来からEWS,CG,CAD等では表
示素子又は表示装置としてCRTの精細度を超えるもの
が希まれていた、この様な要求に対応出来るものとし
て、レーザ熱書込み型の液晶素子及び液晶表示装置が知
られている。この様なレーザ熱書込み型の液晶素子及び
液晶表示装置として例えば、液晶素子としてスメクチッ
ク液晶を用いて液晶セルにレーザ光を照射し、熱電気光
学効果を利用し、熱書込みした画像をスクリーン上に投
射表示する投射型ディスプレイ等が知られている。
2. Description of the Related Art Conventionally, in EWS, CG, CAD, etc., a display element or display device having a resolution exceeding that of a CRT has been rare. And liquid crystal display devices are known. As such a laser thermal writing type liquid crystal element and liquid crystal display device, for example, a smectic liquid crystal is used as a liquid crystal element to irradiate a liquid crystal cell with laser light, and a thermoelectrooptic effect is used to display a thermally written image on a screen. 2. Description of the Related Art Projection-type displays that perform projection display are known.

【0003】図5は上述したレーザ熱書込み型液晶表示
素子を用いた投射型液晶表示装置の光学システムの概要
を示すものである。図でレーザダイオード1から出射し
たレーザビームはコリメーションレンズ2を通って後述
する液晶セル7のX軸並にY軸方向に走査されるガルバ
ノスキャナーミラー3を介し、第1の集光レンズ4を透
過し、二色性ミラ5で反射されて書込みレーザ光6とな
され、液晶セル7の液晶面にフォーカスする様に照射さ
れる。この液晶セル7に書込みレーザ光6によって照射
された書込み点は、そのまま保持される。
FIG. 5 shows an outline of an optical system of a projection type liquid crystal display device using the laser thermal writing type liquid crystal display element described above. In the figure, a laser beam emitted from a laser diode 1 passes through a collimation lens 2 and a galvano-scanner mirror 3 which is scanned in the X-axis as well as the Y-axis direction of a liquid crystal cell 7, which will be described later, and passes through a first condenser lens 4. Then, the writing laser light 6 is reflected by the dichroic mirror 5 and is irradiated so as to focus on the liquid crystal surface of the liquid crystal cell 7. The writing point with which the liquid crystal cell 7 is irradiated with the writing laser beam 6 is held as it is.

【0004】更に液晶セル面上に投射された書込みレー
ザ光6はX軸及びY軸用の二つのガルバノスキャナーミ
ラ3で走査され、液晶面上の任意の位置に図形等を描写
することが出来る。
Further, the writing laser beam 6 projected on the liquid crystal cell surface is scanned by the two galvano-scanner mirrors 3 for the X-axis and the Y-axis, and a figure or the like can be drawn at an arbitrary position on the liquid crystal surface. ..

【0005】液晶セル7の液晶面上に描画された図形等
は投射ランプ8からの投射光10によってスクリーン9
上に投影される。即ち、投射ランプ8の投射光10は第
2の集光レンズ11に集められて二色性ミラ5を介し液
晶セル7にバックから当てられ、液晶面上の図形等は投
影レンズ12及び折り返しミラ13を介しスクリーン9
上に投影される。
A figure or the like drawn on the liquid crystal surface of the liquid crystal cell 7 is projected onto the screen 9 by the projection light 10 from the projection lamp 8.
Projected on. That is, the projection light 10 of the projection lamp 8 is collected by the second condenser lens 11 and applied to the liquid crystal cell 7 from the back via the dichroic mirror 5, and the figure on the liquid crystal surface is projected onto the projection lens 12 and the folding mirror. Screen 9 through 13
Projected on.

【0006】上述の構成では透過型の投射液晶表示装置
を説明したが、液晶セル7からの反射光をスクリーン上
に投影させる反射型の投射液晶表示装置も知られてい
る。
Although the transmission type projection liquid crystal display device has been described in the above configuration, a reflection type projection liquid crystal display device for projecting the reflected light from the liquid crystal cell 7 on the screen is also known.

【0007】この様な反射型の投射液晶表示装置の反射
型液晶素子では一方のガラス基板の内面に透明電極が、
他方のガラス基板の内面にはレーザ光を吸収する金属薄
膜を液晶層に接触配置されたものが知られている(特開
昭57−165820号公報)
In the reflection type liquid crystal element of such a reflection type projection liquid crystal display device, a transparent electrode is formed on the inner surface of one glass substrate.
It is known that the inner surface of the other glass substrate is provided with a metal thin film that absorbs laser light in contact with the liquid crystal layer (JP-A-57-165820).

【0008】更に、書込みに使用されるレーザ光の波長
域に大きな吸収を有する光−熱変換色素を液晶層に添加
し、2枚のガラス基板の間にスメクチックA液晶を挟持
させたものも公知である(特開昭58−42372号公
報)
Further, a method is also known in which a light-to-heat conversion dye having a large absorption in the wavelength range of a laser beam used for writing is added to a liquid crystal layer and a smectic A liquid crystal is sandwiched between two glass substrates. (JP-A-58-42372)

【0009】上記した液晶セル7の熱書込みの原理を図
6A,B,C,Dによって説明する。図で液晶セル7は
二枚のガラス基板14及び15から成る。これらガラス
基板14にはITO(Indium−Tin−Oxid
e)等の透明電極膜16,17並にSiO2 (二酸化シ
リコン)等の絶縁膜18,19がコーティングされ、更
に書込みレーザ光6が入射される反射側のガラス基板1
4にはレーザミラ20が形成されている。このレーザミ
ラ20は誘電体の光学多層膜で構成される。
The principle of thermal writing of the liquid crystal cell 7 will be described with reference to FIGS. 6A, 6B, 6C and 6D. In the figure, the liquid crystal cell 7 is composed of two glass substrates 14 and 15. These glass substrates 14 have ITO (Indium-Tin-Oxid).
The transparent electrode films 16 and 17 such as e) and the insulating films 18 and 19 such as SiO 2 (silicon dioxide) are coated, and the glass substrate 1 on the reflection side on which the writing laser beam 6 is incident.
A laser mirror 20 is formed at 4. This laser mirror 20 is composed of a dielectric optical multilayer film.

【0010】二つのガラス基板14及び15間は例えば
熱硬化性樹脂等の接着材層から成るシール材21でシー
ルされる。
A space between the two glass substrates 14 and 15 is sealed with a sealing material 21 composed of an adhesive layer such as a thermosetting resin.

【0011】シール材21でシールされた空セル容器内
にはスメクチック液晶24等が充填される。この液晶2
4はレーザ等の熱書込みによって、SmA(スメクチッ
クA)液晶相⇔N液晶相⇔等方性液晶相(Iso相)に
相変化するものが用いられる。勿論、コレステリック相
とIso相の間の相転移がなされるコレステリック液晶
であってもよい。
A smectic liquid crystal 24 or the like is filled in the empty cell container sealed with the sealing material 21. This liquid crystal 2
For No. 4, a material that changes its phase from SmA (smectic A) liquid crystal phase to N liquid crystal phase to isotropic liquid crystal phase (Iso phase) by thermal writing with a laser or the like is used. Of course, it may be a cholesteric liquid crystal that undergoes a phase transition between a cholesteric phase and an Iso phase.

【0012】この様な液晶24にレーザ等の熱を加えS
mA相からIso相へ一度相転移させた後に元のSmA
相に戻すとIso相でのランダムな配向がSmA相で保
持され、光散乱状態が形成されて、メモリ状態を保持す
る。この状態を消去するには電圧を印加して一様配向し
ているSmA相に戻す様にしてやればよい。
Heat such as a laser is applied to the liquid crystal 24 as described above to cause S
The original SmA after a single phase transition from the mA phase to the Iso phase
When returning to the phase, the random orientation in the Iso phase is retained in the SmA phase, a light scattering state is formed, and the memory state is retained. To erase this state, a voltage may be applied to restore the uniformly oriented SmA phase.

【0013】即ち、透明電極膜16,17は画面を消去
するときに電圧を印加するために形成され、絶縁膜1
8,19は液晶中の不純物によって、透明電極16,1
7間がショートされるのを防止するために形成される。
更にレーザミラ20はレーザダイオード30から入射さ
れて来る書込みレーザ光を反射し、レーザビームのエネ
ルギーを有効利用するためにコーティングされている。
That is, the transparent electrode films 16 and 17 are formed to apply a voltage when the screen is erased, and the insulating film 1
8 and 19 are transparent electrodes 16 and 1 due to impurities in the liquid crystal.
It is formed to prevent short-circuiting between the seven.
Further, the laser mirror 20 reflects the writing laser light incident from the laser diode 30 and is coated to effectively use the energy of the laser beam.

【0014】上述の如き液晶セル7の透明電極膜16,
17間にはスイッチ22及び交流の電源23が直列接続
されている。
The transparent electrode film 16 of the liquid crystal cell 7 as described above,
A switch 22 and an AC power supply 23 are connected in series between 17 and 17.

【0015】図6Aに示す状態ではスイッチ22はオフ
状態で液晶24は一様に配列されたSmA相である。
In the state shown in FIG. 6A, the switch 22 is in the off state and the liquid crystal 24 is in the uniformly aligned SmA phase.

【0016】次に図6Bに示す様に、書込みレーザ光6
をガラス基板15側から入射させると書込みレーザ光6
の当たった部分の液晶24aだけ光散乱状態となり図6
Cに示す様に画素25となり、所定の画像が描画可能と
なる。
Next, as shown in FIG. 6B, the writing laser beam 6
Is incident from the glass substrate 15 side, the writing laser light 6
Only the liquid crystal 24a in the hit portion is in the light scattering state.
As shown in C, the pixel becomes 25, and a predetermined image can be drawn.

【0017】次に図6Dに示す様にスイッチ22をオン
して交流の電源23から透明電極16,17に電圧を印
加すれば液晶24a(画素25)のIso相は元のSm
A相の一様な配列に戻される。
Next, as shown in FIG. 6D, when the switch 22 is turned on and a voltage is applied from the AC power source 23 to the transparent electrodes 16 and 17, the Iso phase of the liquid crystal 24a (pixel 25) becomes the original Sm.
It is returned to the uniform arrangement of phase A.

【0018】特に、この様な液晶パネル7に於いては、
標準的なセルギャップt(図6D参照)の厚みの値は1
0μmに、画素サイズは10μm2 程度であるので、1
0μm径のガラスファイバ等のスペーサを表示領域に散
布すると、このガラスファイバによって画面がつぶされ
るために、セルギャップtの厚みはシール材21中に混
入したガラスファイバによって保持する様に成されてい
る。
Particularly, in such a liquid crystal panel 7,
The thickness value of the standard cell gap t (see FIG. 6D) is 1
At 0 μm, the pixel size is about 10 μm 2 , so 1
When a spacer such as a glass fiber having a diameter of 0 μm is dispersed in the display area, the screen is crushed by the glass fiber, so that the thickness of the cell gap t is held by the glass fiber mixed in the sealing material 21. ..

【0019】[0019]

【発明が解決しようとする課題】上述の様にレーザ熱書
込み型の液晶セル7では画素サイズが極めて小さいため
に通常のX−Yマトリックス型の液晶表示装置の様に、
表示画面内にはスペーサを均一に散布してセルギャップ
tの厚みを均一に保つことが出来ない問題があった。
As described above, since the laser thermal writing type liquid crystal cell 7 has an extremely small pixel size, it is possible to use the liquid crystal cell 7 like an ordinary XY matrix type liquid crystal display device.
There is a problem that the spacers cannot be uniformly dispersed in the display screen to keep the thickness of the cell gap t uniform.

【0020】この様な液晶セル7を例えば直視型の液晶
表示装置として利用する場合にはバックライトの光によ
り、上例の様に投射型の液晶表示装置として利用する場
合には投射光源からの投射光が液晶セル7に当たるとセ
ルギャップtの厚みムラに沿って干渉色が発生する。こ
の干渉色は通常は赤と緑の縞模様状のパターンとなって
表れ表示品位を損なう問題があった。
When such a liquid crystal cell 7 is used, for example, as a direct-viewing type liquid crystal display device, light from a backlight is used. When it is used as a projection type liquid crystal display device as in the above example, a light source from a projection light source is used. When the projected light hits the liquid crystal cell 7, an interference color is generated along the uneven thickness of the cell gap t. This interference color usually appears as a red-and-green striped pattern, which impairs the display quality.

【0021】この様な干渉縞の発生原因は図7で説明出
来る。図は従来の液晶セル7の基本的構成を模式的に示
したもので、実際には液晶素子としての機能や動作に必
要な透明電極やカラーフィルタ等が配設されている。
The cause of such interference fringes can be explained with reference to FIG. The figure schematically shows the basic structure of a conventional liquid crystal cell 7, and in reality, transparent electrodes, color filters and the like necessary for the function and operation of a liquid crystal element are arranged.

【0022】上述の構成で液晶セル7の一方のガラス基
板14側から、バックライトの光又は投射用の投射光1
0が入射したとすると液晶24の層間で入射光は多重反
射26を起こし、特定の波長が強調されて干渉色を生
じ、表示領域のセルギャップtの厚みの不均一による干
渉色のムラを発生することになる。この液晶セル7を投
射光10でスクリーン9に投射すると干渉縞が発生す
る。
With the above-mentioned structure, the light of the backlight or the projection light 1 for projection is applied from one glass substrate 14 side of the liquid crystal cell 7.
When 0 is incident, the incident light undergoes multiple reflection 26 between the layers of the liquid crystal 24, a specific wavelength is emphasized to generate an interference color, and unevenness of the interference color is generated due to the nonuniform thickness of the cell gap t in the display region. Will be done. When this liquid crystal cell 7 is projected onto the screen 9 by the projection light 10, interference fringes are generated.

【0023】本発明は叙上の問題点を解消するためにな
されたもので、その目的とするところは干渉縞が生ぜ
ず、表示品質の向上した液晶素子及び液晶表示装置を提
供しようとするものである。
The present invention has been made to solve the above problems, and an object of the present invention is to provide a liquid crystal element and a liquid crystal display device in which interference fringes do not occur and display quality is improved. Is.

【0024】[0024]

【課題を解決するための手段】本発明の液晶素子はその
例が図1に示されている様に、一対の透明基板14及び
15と、この透明基板14及び15間に挟持された液晶
24の層と、透明基板14及び15の少なくとも一方の
透明基板14又は15の液晶24の層側に設けた屈折率
の異なる透明で絶縁性を有する膜26及び27を少なく
とも2層積層して構成された反射防止膜28とを有する
ものである。
As shown in FIG. 1, the liquid crystal device of the present invention has a pair of transparent substrates 14 and 15 and a liquid crystal 24 sandwiched between the transparent substrates 14 and 15. And at least two transparent and insulative films 26 and 27 having different refractive indexes, which are provided on the liquid crystal 24 layer side of at least one of the transparent substrates 14 and 15 and are laminated. And an antireflection film 28.

【0025】[0025]

【作用】本発明によれば液晶セルを構成する一対のガラ
ス基板14及び15の少なくとも一方に反射防止膜28
をコーティングしたので液晶層で多重反射が生ぜず、干
渉色のムラによる干渉縞がスクリーン9上に表れること
のない液晶素子及び液晶表示装置が得られる。
According to the present invention, the antireflection film 28 is formed on at least one of the pair of glass substrates 14 and 15 constituting the liquid crystal cell.
Thus, a liquid crystal element and a liquid crystal display device can be obtained in which multiple reflection does not occur in the liquid crystal layer and interference fringes due to uneven interference colors do not appear on the screen 9.

【0026】[0026]

【実施例】以下、本発明の液晶素子及び液晶表示装置の
一実施例を図1乃至図4によって説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the liquid crystal element and the liquid crystal display device of the present invention will be described below with reference to FIGS.

【0027】図1は本例の液晶セル7の一態様を示すも
ので、従来構成の図6で説明したと同様のレーザ熱書込
み液晶素子とし、例えばCAD用の投射型の液晶表示装
置として用いる場合である。
FIG. 1 shows one mode of the liquid crystal cell 7 of this example, which is a laser thermal writing liquid crystal element similar to that described with reference to FIG. 6 and is used as, for example, a projection type liquid crystal display device for CAD. This is the case.

【0028】図1で図6との対応部分には同一符号を付
して重複説明を省略するが本例では図6の液晶セル7で
書込みレーザ光6が入射する側のガラス基板15側のみ
に反射防止膜28をコーティングする。
In FIG. 1, the portions corresponding to those in FIG. 6 are designated by the same reference numerals and duplicate description is omitted, but in this example, only the glass substrate 15 side on which the writing laser beam 6 is incident in the liquid crystal cell 7 in FIG. Then, an antireflection film 28 is coated.

【0029】即ち、スクリーン9側のガラス基板14に
はレーザミラ20が配設されているのでこれを反射防止
膜として用い、こちら側のガラス基板14には反射防止
膜28をコーティングしない。
That is, since the laser mirror 20 is disposed on the glass substrate 14 on the screen 9 side, this is used as an antireflection film, and the glass substrate 14 on this side is not coated with the antireflection film 28.

【0030】ガラス基板15は洗浄された後にアルミナ
(Al2 3 )膜27を蒸着又はスパッタリングし、更
にAl2 3 膜27上に二酸化チタン(TiO2 )膜2
6を蒸着又はスパッタリングすることで所定厚みの反射
防止膜28が構成される。
After cleaning the glass substrate 15, an alumina (Al 2 O 3 ) film 27 is vapor-deposited or sputtered, and a titanium dioxide (TiO 2 ) film 2 is further formed on the Al 2 O 3 film 27.
The antireflection film 28 having a predetermined thickness is formed by vapor-depositing or sputtering 6.

【0031】次にこの反射防止膜28を構成するTiO
2 膜26上に導電膜を全ベタ状に形成する、導電膜はI
TO等の透明電極17(16)であり、更に必要に応じ
て透明電極17(16)上にSiO2 等の絶縁膜19
(18)が蒸着される。
Next, the TiO which constitutes this antireflection film 28.
2 The conductive film is formed in a solid pattern on the film 26. The conductive film is I
A transparent electrode 17 (16) such as TO, and if necessary, an insulating film 19 such as SiO 2 on the transparent electrode 17 (16).
(18) is vapor deposited.

【0032】この絶縁膜19(18)はガラス基板15
(14)中のアルカリ成分が透明電極17(16)のピ
ンホールを通って液晶24中に溶解するのを防止するた
めに形成したもので、この様な弊害がなければ絶縁膜1
7(18)は設ける必要が無い。
The insulating film 19 (18) is formed on the glass substrate 15
It was formed in order to prevent the alkaline component in (14) from dissolving in the liquid crystal 24 through the pinholes of the transparent electrode 17 (16). If there is no such an adverse effect, the insulating film 1
It is not necessary to provide 7 (18).

【0033】この様に形成した絶縁膜19(18)上に
配向層が形成され、シール材21を介して一対のガラス
基板15及び14は貼り合わされる。
An orientation layer is formed on the insulating film 19 (18) formed in this way, and the pair of glass substrates 15 and 14 are bonded to each other with the sealing material 21 interposed therebetween.

【0034】貼り合わせ時は上述した様にセルギャップ
tを所定の厚みに保持するためにシール材21としての
熱硬化樹脂の接着剤中に直径10μm程度のガラスファ
イバを混入して液晶セル7のセルギャップtの厚みを一
定に保つ様にする。然し表示領域内にはガラスファイバ
等のスペーサを上述した理由で散布することは出来な
い。
At the time of bonding, as described above, in order to maintain the cell gap t at a predetermined thickness, a glass fiber having a diameter of about 10 μm is mixed in the adhesive of thermosetting resin as the sealing material 21 to form the liquid crystal cell 7. The thickness of the cell gap t is kept constant. However, spacers such as glass fibers cannot be dispersed in the display area for the above-mentioned reason.

【0035】この様に一対の電極形成したガラス基板1
5,14は貼り合わせて作られた空セル容器を加熱硬化
後に真空チャンバ内に入れ、液晶材料24としてスメク
チック液晶等が注入された後に封止が行なわれる。
A glass substrate 1 having a pair of electrodes thus formed
Numerals 5 and 14 are sealed after the empty cell containers made by pasting are put into a vacuum chamber after being heated and cured, and smectic liquid crystal or the like is injected as the liquid crystal material 24.

【0036】図1で示した液晶セルは反射防止膜28を
一方のガラス基板15にのみ蒸着させたが、レーザミラ
20が蒸着されていない図2に示す如き液晶セル7では
一対のガラス基板14,15に反射防止膜28,28を
形成する様に成されている。この反射防止膜28,28
は図1と同様に少なくともAl2 3 膜27とTiO 2
膜26の2層で構成されている。
The liquid crystal cell shown in FIG. 1 has an antireflection film 28.
Only one of the glass substrates 15 was vapor-deposited.
In the liquid crystal cell 7 as shown in FIG.
Antireflection films 28 and 28 are provided on the pair of glass substrates 14 and 15, respectively.
It is made to form. This antireflection film 28, 28
Is at least Al as in FIG.2O3Membrane 27 and TiO 2
It is composed of two layers of membrane 26.

【0037】この様な反射防止膜形成後の液晶セル製造
は図1と同様工程で作製可能である。
The liquid crystal cell after the formation of such an antireflection film can be manufactured by the same steps as in FIG.

【0038】上述の実施例では反射防止膜28としてA
2 3膜27とTiO2 膜26を重ねて反射防止膜を
構成しているが、これに限らず屈折率の異なる膜を適宜
組み合わせて反射防止膜とすることができる。高屈折率
の材料としては屈折率nが2.3程度のTiO2 、中屈
折率の材料としては屈折率nが1.6程度のAl
2 3 、低屈折率の材料としては、屈折率nが1.4程
度のSiO2 等の透明な酸化物等があるが、これに限ら
れるものでなく、有機材料等で構成してもよい。透明な
酸化物からなる膜の形成方法としては、真空蒸着等を用
いれば、層厚の制御が容易である。
In the above-mentioned embodiment, A is used as the antireflection film 28.
l2O3Membrane 27 and TiO2The film 26 is overlaid to form an antireflection film.
Although it is configured, it is not limited to this, and a film having a different refractive index is appropriately used.
It can be combined to form an antireflection film. High refractive index
As the material of TiO 2, the refractive index n is about 2.32, Middle bend
As a material having a folding ratio, Al having a refractive index n of about 1.6
2O 3, A low refractive index material has a refractive index n of about 1.4
Degree of SiO2Transparent oxides, etc., but not limited to this
However, it may be made of an organic material or the like. Transparent
As a method for forming the oxide film, vacuum deposition or the like is used.
If so, it is easy to control the layer thickness.

【0039】図1の構成ではスクリーン9側のガラス基
板14にレーザミラ20が形成されているので、これに
は手を付けず書込みレーザ光6の入射側のガラス基板1
5に反射防止膜28を形成したが、ガラス基板14側に
は既に透明電極16と絶縁膜18が蒸着されているの
で、これらの各層を含めて反射防止膜28の厚さ等の光
学特性を定める必要がある。
In the configuration of FIG. 1, since the laser mirror 20 is formed on the glass substrate 14 on the screen 9 side, the glass substrate 1 on the incident side of the writing laser beam 6 is left untouched.
Although the antireflection film 28 was formed on No. 5, since the transparent electrode 16 and the insulating film 18 have already been vapor-deposited on the glass substrate 14 side, the optical characteristics such as the thickness of the antireflection film 28 including these layers can be determined. Need to be determined.

【0040】図3A,Bに図1及び図2の要部の各膜断
面厚と反射率の計算結果を示す。透明電極膜16(1
7)としてITO(屈折率n=1.9)を、絶縁膜18
(19)としてSiO2 (屈折率n=1.46)を、反
射防止膜28としてAl2 3 (屈折率n=1.6)並
にTiO2 (屈折率n=2.3)を用い、又、液晶24
の屈折率n=1.65とする図3Aの如き膜構成を考え
ると、各膜の厚さをAl 2 3 =94nm、TiO2
130nm、ITO=79nm、SiO2 =205nm
とすると書込みレーザ光6の入射側のガラス基板15の
反射率(入射光30の強度に対する反射光31の強度の
割合で定まり垂直入射条件で考える。)の計算結果は図
3Bの様にプロットされて充分な反射率が得られる。
In FIGS. 3A and 3B, the membrane breaks of the main parts of FIGS.
The calculation results of surface thickness and reflectance are shown below. Transparent electrode film 16 (1
7) ITO (refractive index n = 1.9) is used as the insulating film 18
(19) as SiO2(Refractive index n = 1.46)
Al as the protection film 282O3(Refractive index n = 1.6)
To TiO2(Refractive index n = 2.3) and the liquid crystal 24
Considering the film structure as shown in FIG.
Then, change the thickness of each film to Al 2O3= 94 nm, TiO2=
130 nm, ITO = 79 nm, SiO2= 205 nm
Then, the glass substrate 15 on the incident side of the writing laser beam 6
Reflectance (of the intensity of the reflected light 31 relative to the intensity of the incident light 30)
It is determined by the ratio and considered under the vertical incidence condition. ) Is the figure
3B is plotted and sufficient reflectance is obtained.

【0041】図4A,Bは膜構成を透明電極16及び1
7のITOを79nmに、絶縁膜18及び19を205
nmに選択した場合の反射率の計算結果を示している。
この構成の様に反射防止膜28が施されていないもので
は反射率が高く図3A,Bに比べて反射防止膜28とし
て利用し得ないことが解る。
FIGS. 4A and 4B show the film structure of transparent electrodes 16 and 1.
ITO of 7 to 79 nm and 205 of insulating films 18 and 19
The calculation result of the reflectance when nm is selected is shown.
It can be seen that the one without the antireflection film 28 like this structure has a high reflectance and cannot be used as the antireflection film 28 as compared with FIGS. 3A and 3B.

【0042】本発明の液晶素子及び液晶表示装置によれ
ば反射防止膜を設けることでセルギャップtの厚みムラ
で生ずる干渉縞が見えなくなり、表示素子としての透過
率が上がって表示の明るさが増し、表示品位を損なうこ
とのないものが得られる。
According to the liquid crystal element and the liquid crystal display device of the present invention, by providing the antireflection film, the interference fringes caused by the uneven thickness of the cell gap t become invisible, and the transmittance as the display element is increased to improve the display brightness. It is possible to obtain a display device that does not impair the display quality.

【0043】上述の各実施例ではレーザ熱書込み液晶素
子について説明したが、通常の各種表示装置用の液晶素
子に本例を適用し得ることは明白である。
Although the laser thermal writing liquid crystal element has been described in each of the above-mentioned embodiments, it is obvious that this example can be applied to a liquid crystal element for various ordinary display devices.

【0044】[0044]

【発明の効果】本発明の液晶素子及び液晶表示装置によ
れば干渉縞が目立たず表示品位の損なわれないものが得
られる。
According to the liquid crystal element and the liquid crystal display device of the present invention, it is possible to obtain a liquid crystal device in which interference fringes are not conspicuous and the display quality is not impaired.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液晶素子の一実施例を示す構成図であ
る。
FIG. 1 is a configuration diagram showing an embodiment of a liquid crystal element of the present invention.

【図2】本発明の液晶素子の他の実施例を示す構成図で
ある。
FIG. 2 is a configuration diagram showing another embodiment of the liquid crystal element of the present invention.

【図3】本発明の液晶素子の反射率の一実施例を示す説
明図である。
FIG. 3 is an explanatory diagram showing an example of the reflectance of the liquid crystal element of the present invention.

【図4】本発明の液晶素子の反射率の比較例を示す説明
図である。
FIG. 4 is an explanatory diagram showing a comparative example of the reflectance of the liquid crystal element of the present invention.

【図5】従来の熱書込み投射型液晶セルのシステム構成
図である。
FIG. 5 is a system configuration diagram of a conventional thermal writing projection type liquid crystal cell.

【図6】従来の熱書込み投射型液晶セルの動作原理説明
図である。
FIG. 6 is an explanatory diagram of an operating principle of a conventional thermal writing projection type liquid crystal cell.

【図7】干渉縞発生原因説明図である。FIG. 7 is a diagram illustrating the cause of interference fringes.

【符号の説明】[Explanation of symbols]

1 レーザダイオード 7 液晶セル 8 投射ランプ 9 スクリーン 14,15 ガラス基板 21 シール材 24 液晶 26 TiO2 膜 27 Al2 3 膜 28 反射防止膜1 Laser Diode 7 Liquid Crystal Cell 8 Projection Lamp 9 Screen 14, 15 Glass Substrate 21 Sealing Material 24 Liquid Crystal 26 TiO 2 Film 27 Al 2 O 3 Film 28 Antireflection Film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一対の透明基板と、 上記透明基板間に挟持された液晶層と、 上記透明基板の少なくとも一方の透明基板の該液晶層側
に設けた屈折率の異なる透明で絶縁性をを有する膜を少
なくとも2層積層した反射防止膜とを有することを特徴
とする液晶素子。
1. A pair of transparent substrates, a liquid crystal layer sandwiched between the transparent substrates, and a transparent and insulating material having a different refractive index provided on the liquid crystal layer side of at least one transparent substrate of the transparent substrates. A liquid crystal element, comprising: an antireflection film obtained by laminating at least two layers of the film.
【請求項2】 レーザー光照射で発生する熱による液晶
の相変化により液晶素子に光学像を記録し、該光学像を
光源からの光により投影表示する液晶表示装置におい
て、 上記液晶素子が、一対の透明基板と、該透明基板間に挟
持された液晶層と、該透明基板の少なくとも一方の透明
基板の該液晶層側に設けた屈折率の異なる透明で絶縁性
を有する膜を少なくとも2層積層した反射防止膜とを有
することを特徴とする液晶表示装置。
2. A liquid crystal display device in which an optical image is recorded on a liquid crystal element by a phase change of liquid crystal due to heat generated by laser light irradiation, and the optical image is projected and displayed by light from a light source. At least two layers of a transparent substrate, a liquid crystal layer sandwiched between the transparent substrates, and a transparent and insulating film having a different refractive index provided on the liquid crystal layer side of at least one transparent substrate of the transparent substrates. A liquid crystal display device having the above antireflection film.
JP3230367A 1991-09-10 1991-09-10 Liquid crystal element and liquid crystal display device Pending JPH0566393A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3230367A JPH0566393A (en) 1991-09-10 1991-09-10 Liquid crystal element and liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3230367A JPH0566393A (en) 1991-09-10 1991-09-10 Liquid crystal element and liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH0566393A true JPH0566393A (en) 1993-03-19

Family

ID=16906749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3230367A Pending JPH0566393A (en) 1991-09-10 1991-09-10 Liquid crystal element and liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH0566393A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123339A (en) * 1997-05-20 2000-09-26 Daiso Corporation Non-gasket sealing structure
JP2007248674A (en) * 2006-03-15 2007-09-27 Ricoh Co Ltd Optical element, optical deflector, and image forming apparatus
US9379145B2 (en) 2014-01-10 2016-06-28 Samsung Display Co., Ltd. Display apparatus and method of manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123339A (en) * 1997-05-20 2000-09-26 Daiso Corporation Non-gasket sealing structure
JP2007248674A (en) * 2006-03-15 2007-09-27 Ricoh Co Ltd Optical element, optical deflector, and image forming apparatus
US9379145B2 (en) 2014-01-10 2016-06-28 Samsung Display Co., Ltd. Display apparatus and method of manufacturing the same

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