JPH0562722B2 - - Google Patents

Info

Publication number
JPH0562722B2
JPH0562722B2 JP60044123A JP4412385A JPH0562722B2 JP H0562722 B2 JPH0562722 B2 JP H0562722B2 JP 60044123 A JP60044123 A JP 60044123A JP 4412385 A JP4412385 A JP 4412385A JP H0562722 B2 JPH0562722 B2 JP H0562722B2
Authority
JP
Japan
Prior art keywords
refractive
optical system
aplanatic
curvature
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60044123A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61203419A (ja
Inventor
Koichi Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP60044123A priority Critical patent/JPS61203419A/ja
Publication of JPS61203419A publication Critical patent/JPS61203419A/ja
Priority to US07/171,169 priority patent/US4812028A/en
Publication of JPH0562722B2 publication Critical patent/JPH0562722B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60044123A 1984-07-23 1985-03-06 反射縮小投影光学系 Granted JPS61203419A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60044123A JPS61203419A (ja) 1985-03-06 1985-03-06 反射縮小投影光学系
US07/171,169 US4812028A (en) 1984-07-23 1988-03-21 Reflection type reduction projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60044123A JPS61203419A (ja) 1985-03-06 1985-03-06 反射縮小投影光学系

Publications (2)

Publication Number Publication Date
JPS61203419A JPS61203419A (ja) 1986-09-09
JPH0562722B2 true JPH0562722B2 (enExample) 1993-09-09

Family

ID=12682824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60044123A Granted JPS61203419A (ja) 1984-07-23 1985-03-06 反射縮小投影光学系

Country Status (1)

Country Link
JP (1) JPS61203419A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204935A (ja) * 1985-03-07 1986-09-11 Seiko Epson Corp 反射縮小投影露光装置
JP6882053B2 (ja) 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法

Also Published As

Publication number Publication date
JPS61203419A (ja) 1986-09-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term