JPH0560899A - Electron beam irradiation device - Google Patents

Electron beam irradiation device

Info

Publication number
JPH0560899A
JPH0560899A JP25037291A JP25037291A JPH0560899A JP H0560899 A JPH0560899 A JP H0560899A JP 25037291 A JP25037291 A JP 25037291A JP 25037291 A JP25037291 A JP 25037291A JP H0560899 A JPH0560899 A JP H0560899A
Authority
JP
Japan
Prior art keywords
inert gas
irradiation
electron beam
irradiated
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25037291A
Other languages
Japanese (ja)
Inventor
Toshiro Nishikimi
敏朗 錦見
Takahiro Terasawa
隆裕 寺澤
Kenichi Mizusawa
健一 水澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin High Voltage Co Ltd
Original Assignee
Nissin High Voltage Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin High Voltage Co Ltd filed Critical Nissin High Voltage Co Ltd
Priority to JP25037291A priority Critical patent/JPH0560899A/en
Publication of JPH0560899A publication Critical patent/JPH0560899A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve the utilization efficiency of inert gas with a simple constitution by providing a transport duct covering nozzles and rollers along the transport path and replacing the atmosphere in an irradiation region with inert gas. CONSTITUTION:Along the transport path transporting an irradiated body 4, a transport duct 20 is formed in nearly parallel to the irradiated body 4 so that it covers nozzles 10 and rollers 11. By blowing inert gas out of the nozzles 10, the air sticking to the surface of the irradiated body 4 is blown off and is replaced by the inert gas and so the atmosphere in the irradiation region 71 becomes below a desired oxigen concentration. As the space of inert gas environment is quite limited, the inert gas does not disperse. Therefore, useless inert gas need not be supplied and the utilization efficiency of the inert gas can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、電子線照射装置に関
し、特に不活性ガスの消費量の低減を図ったものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam irradiation apparatus, and particularly to reducing the consumption of inert gas.

【0002】[0002]

【従来の技術】電子線照射装置において、電線、チュー
ブ、テープその他の長尺状の被照射体を、電子線発生装
置からの電子線を被照射体に照射する照射室内の照射領
域に向けて搬送し、これに順次電子線を照射するように
したものは既によく知られている。この場合電子線を照
射したときに発生するX線が外部に漏洩するのを防止す
るとともに、被照射体に付着してくる酸素すなわち空気
を不活性ガスによって吹き飛ばし、不活性ガス雰囲気中
で被照射体に電子線を照射することが要求されている。
2. Description of the Related Art In an electron beam irradiation apparatus, an electric wire, a tube, a tape or other long object to be irradiated is directed toward an irradiation area in an irradiation chamber where the electron beam from the electron beam generator is applied to the object to be irradiated. It is well known that the carrier is carried and the electron beam is sequentially irradiated onto the carrier. In this case, the X-rays generated when the electron beam is irradiated are prevented from leaking to the outside, and the oxygen, that is, the air adhering to the irradiation target is blown off by the inert gas, and the irradiation is performed in the inert gas atmosphere. It is required to irradiate the body with an electron beam.

【0003】図3は従来の電子線照射装置の概略構成を
示し、1は電子線発生装置、2は照射窓、3はビームキ
ャッチャー、4は長尺状の被照射体である。そしてX線
を遮蔽するX線遮蔽ケース5を遮蔽壁6によって照射室
7と複数の予備室8に区画し、各遮蔽壁6にスリット9
を形成し、このスリット9の間を被照射体4が通過する
ようにしてある。71は照射室7内の電子線を照射する
照射領域である。前記被照射体4が搬送される照射室8
および予備室9の搬送通路には、不活性ガスを被照射体
4に吹き付けるためのノズル10と、被照射体4をガイ
ドするローラ11が配置されている。
FIG. 3 shows a schematic structure of a conventional electron beam irradiation apparatus, in which 1 is an electron beam generator, 2 is an irradiation window, 3 is a beam catcher, and 4 is a long irradiation object. Then, the X-ray shielding case 5 for shielding X-rays is divided into an irradiation chamber 7 and a plurality of preliminary chambers 8 by a shielding wall 6, and a slit 9 is formed in each shielding wall 6.
Is formed so that the irradiated body 4 passes between the slits 9. Reference numeral 71 is an irradiation area in the irradiation chamber 7 where the electron beam is irradiated. Irradiation chamber 8 in which the irradiated body 4 is transported
Further, a nozzle 10 for spraying an inert gas onto the irradiation target 4 and a roller 11 for guiding the irradiation target 4 are arranged in the transfer passage of the preliminary chamber 9.

【0004】電子線発生装置1からの電子線eによって
照射室7で発生したX線は、X線遮蔽ケース5および各
遮蔽壁6によって減衰または/および遮蔽され、X線遮
蔽ケース5の被照射体4の出入り口12から外部に漏洩
しないように構成されている。また各ノズル10から被
照射体4の表面に例えば窒素ガスなどの不活性ガスを吹
き付けることによって、被照射体4の表面に付着してき
た空気を吹き飛ばし、不活性ガスに置換して照射領域7
1における照射雰囲気の酸素濃度を所望の値以下となる
ようにしている。
X-rays generated in the irradiation chamber 7 by the electron beam e from the electron beam generator 1 are attenuated and / or shielded by the X-ray shielding case 5 and each shielding wall 6, and the X-ray shielding case 5 is irradiated with the X-rays. It is configured so as not to leak to the outside through the entrance / exit 12 of the body 4. Further, by blowing an inert gas such as nitrogen gas from the nozzles 10 onto the surface of the irradiated body 4, the air adhering to the surface of the irradiated body 4 is blown off and replaced with the inert gas to irradiate the irradiation area 7
The oxygen concentration of the irradiation atmosphere in No. 1 is set to be a desired value or less.

【0005】[0005]

【発明が解決しょうとする課題】しかしこのような構成
によれば、照射室7および各予備室8の空間が広く、そ
のため多量の不活性ガスを吹き付ける必要があり、その
量に不足が生じると、所望の酸素濃度以下とならない
し、また空気との置換に要する時間が長くなるなどの欠
点がある。
However, according to such a structure, the space of the irradiation chamber 7 and each of the preliminary chambers 8 is large, so that it is necessary to blow a large amount of inert gas, which causes a shortage of the amount. However, there are drawbacks such that the oxygen concentration does not fall below the desired level and the time required for replacement with air becomes long.

【0006】またノズル10とローラ11とが互いに向
かい合う位置にないため、不活性ガスの吹き付けによっ
て、被照射体4がばたつくことがあり、そのため照射室
7内での電子線照射に支障が生じることがある。
Further, since the nozzle 10 and the roller 11 are not located at the positions facing each other, the irradiated object 4 may flutter due to the spraying of the inert gas, which may hinder the electron beam irradiation in the irradiation chamber 7. There is.

【0007】この発明は、この種電子線照射装置におけ
る不活性ガスの利用効率の向上を図ることを目的とす
る。
An object of the present invention is to improve the utilization efficiency of the inert gas in this kind of electron beam irradiation apparatus.

【0008】またこの発明は、不活性ガスの吹き付けに
よる被照射体のばたつきを防止することを目的とする。
Another object of the present invention is to prevent the irradiation object from fluttering due to the blowing of an inert gas.

【0009】[0009]

【課題を解決するための手段】この発明は、搬送通路に
沿って、かつノズルおよびローラの少なくとも一部を包
み込むように搬送ダクトを形成し、照射領域を不活性ガ
ス雰囲気にすることを特徴とする。
The present invention is characterized in that a conveying duct is formed along a conveying passage and so as to wrap at least a part of a nozzle and a roller, and an irradiation area is made an inert gas atmosphere. To do.

【0010】またこの発明は、ノズルおよびローラを、
被照射体を挟んで対象の位置に向い合わせに配置するこ
とを特徴とする。
The present invention also includes a nozzle and a roller,
It is characterized in that the object to be irradiated is placed facing each other at a target position.

【0011】[0011]

【作用】搬送通路に沿って、かつノズルおよびローラの
少なくとも一部を包み込むように搬送ダクトを形成した
ので、不活性ガスに置換する空間がきわめて少なくな
る。そのため、ノズルから吹き出される不活性ガスは、
効果的に被照射体に吹き付けられ、被照射体の表面に付
着する空気と置換され、照射領域が所望の酸素濃度以下
となる。
Since the conveying duct is formed along the conveying passage so as to wrap at least a part of the nozzle and the roller, the space for substituting the inert gas is extremely small. Therefore, the inert gas blown from the nozzle,
The air is effectively blown onto the irradiation target and is replaced with air adhering to the surface of the irradiation target, so that the irradiation region has a desired oxygen concentration or less.

【0012】ノズルとローラは互いに向かい合っている
ので、ノズルからの不活性ガスが被照射体に吹き付けら
れても、これをローラが受け止めるようになり、被照射
体のばたつきは、これをもって防止される。
Since the nozzle and the roller face each other, even if the inert gas from the nozzle is blown onto the object to be irradiated, the roller receives the inert gas, and the flapping of the object to be irradiated is prevented by this. ..

【0013】[0013]

【実施例】この発明の一実施例を図1に基づいて説明す
る。なお、図3と同じ符号を付した部分は同一または対
応する部分を示す。図示例では、被照射体4が搬送され
る搬送通路に沿って、被照射体4と略平行に、かつノズ
ル10を包み込むように搬送ダクト20が形成されてあ
る。この搬送ダクト20は、例えばステンレス、銅、ア
ルミニュウムなどの薄板をプレス成形により所望の形状
に加工した各ダクト片21を組み合わせて形成すること
ができる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described with reference to FIG. It should be noted that the parts denoted by the same reference numerals as those in FIG. 3 indicate the same or corresponding parts. In the illustrated example, a transport duct 20 is formed along the transport path along which the irradiated body 4 is transported, substantially parallel to the irradiated body 4 and surrounding the nozzle 10. The transport duct 20 can be formed by combining respective duct pieces 21 obtained by processing a thin plate of stainless steel, copper, aluminum or the like into a desired shape by press molding.

【0014】ローラ11も同様に搬送ダクト20によっ
て図に示すように包み込まれている。この場合、ローラ
11の回転に支障のないようにしてあるのは勿論であ
る。そして各ローラ11は、被照射体4の搬送通路に沿
って配置されている。なお、X線遮蔽ケース5および遮
蔽壁6は、鉛などのようにX線の遮蔽能力の大きい物質
と、鉄、ステンレス、アルミニュウムなどのように構造
物として好ましい物質とを適宜組み合わせて構成するの
がよい。
The roller 11 is also wrapped by the transport duct 20 as shown in the figure. In this case, it goes without saying that the rotation of the roller 11 is not hindered. Each roller 11 is arranged along the conveyance path of the irradiated body 4. The X-ray shielding case 5 and the shielding wall 6 are formed by appropriately combining a substance having a large X-ray shielding ability such as lead and a substance preferable as a structure such as iron, stainless steel, and aluminum. Is good.

【0015】被照射体4の裏面側の酸素濃度も表面と同
程度にすることが要求される場合は、被照射体4の裏面
側にもノズル10を適宜配置すればよい。
When it is required that the oxygen concentration on the back surface side of the irradiated body 4 is about the same as that on the front surface, the nozzle 10 may be appropriately arranged on the back surface side of the irradiated body 4.

【0016】ノズル10から不活性ガスを吹き付けるこ
とによって、被照射体4の表面に付着した空気は吹き飛
ばされ、不活性ガスに置換されるとともに、照射領域7
1の雰囲気が所望の酸素濃度以下となる。そして、不活
性ガス雰囲気とする空間は、従来のような空間が存在し
ないので、そのような空間に不活性ガスが飛来するよう
なことはなく、したがって無駄な不活性ガスの供給を必
要としなく、不活性ガスの利用効率の向上を図ることが
できる。
By blowing the inert gas from the nozzle 10, the air adhering to the surface of the irradiated body 4 is blown away and replaced with the inert gas, and the irradiation area 7
The atmosphere of No. 1 is below the desired oxygen concentration. In addition, since the space used as the inert gas atmosphere does not have a conventional space, the inert gas does not fly into such a space, and therefore, it is not necessary to supply useless inert gas. Therefore, the utilization efficiency of the inert gas can be improved.

【0017】またノズル10とローラ11とは互いに向
かい合っているので、ノズル10からの不活性ガスが被
照射体4に吹き付けられても、これをローラ11が受け
止めるので、被照射体4のばたつきは防止される。
Further, since the nozzle 10 and the roller 11 face each other, even if the inert gas from the nozzle 10 is blown to the irradiated body 4, the roller 11 receives the inert gas, so that the irradiated body 4 does not flap. To be prevented.

【0018】次にこの発明の他の実施例を図2に基づい
て説明する。図示例では、X線を遮蔽するX線遮蔽ケー
ス5を、照射室7を形成するケース51と、予備室8を
形成するケース52とを一体的に組み合わせて構成し、
ケース51内を遮蔽壁6により2つの予備室8に区画し
てある。搬送ダクト20は、被照射体4の搬送通路に沿
って配設されたノズル10およびローラ11のうち、前
記予備室8内に配設されたものについては、それに沿う
ように包み込み、照射室7内に配設されたローラ11に
ついては、その下側を沿って覆うよう、各ダクト片21
を適宜連結、組み合わせて構成したものである。なお、
13は照射窓2の冷却を兼ねて不活性ガスを吹き出すた
めのノズル、14はX線を減衰または/および遮蔽する
ための遮蔽板、31はビームキャッチャー3の冷却路
で、冷却水などの冷媒が循環される。
Next, another embodiment of the present invention will be described with reference to FIG. In the illustrated example, the X-ray shielding case 5 that shields X-rays is configured by integrally combining a case 51 that forms the irradiation chamber 7 and a case 52 that forms the preliminary chamber 8.
The inside of the case 51 is divided into two auxiliary chambers 8 by the shielding wall 6. Of the nozzle 10 and the roller 11 arranged along the conveying path of the irradiation target 4, the conveying duct 20 encloses the nozzle 10 and the roller 11 arranged in the preliminary chamber 8 so as to follow the irradiation duct 7. With respect to the roller 11 disposed inside, each duct piece 21 is covered so as to cover the lower side thereof.
Are appropriately connected and combined. In addition,
Reference numeral 13 is a nozzle for blowing out an inert gas also for cooling the irradiation window 2, 14 is a shield plate for attenuating and / or shielding X-rays, 31 is a cooling passage for the beam catcher 3, and a coolant such as cooling water is provided. Is circulated.

【0019】この実施例では、図1に示す実施例に比べ
搬送通路の全てを搬送ダクト20で形成していないの
で、不活性ガスの使用量は若干増加するが、従来例に比
べその使用量が軽減される外、搬送ダクト20の組立お
よび構成が簡略化でき都合がよい。
In this embodiment, compared with the embodiment shown in FIG. 1, since the entire conveying passage is not formed by the conveying duct 20, the amount of the inert gas used is slightly increased, but the amount of the inert gas used is increased as compared with the conventional example. Besides, the assembly and configuration of the transport duct 20 can be simplified, which is convenient.

【0020】なお、両実施例において、被照射体4を搬
送ダクト20からなる搬送通路に案内する場合、必要に
応じて薄板状の案内治具を用いればよい。また通常、照
射室7には、照射窓2の窓薄を交換するためにメンテナ
ンス用の扉あるいは開閉機構が設けられており、必要に
応じてこれを用い、前述の被照射体4の案内に利用すれ
ばよいは勿論である。
In each of the embodiments, when guiding the irradiated body 4 to the transfer passage formed of the transfer duct 20, a thin plate-shaped guide jig may be used if necessary. Further, the irradiation chamber 7 is usually provided with a maintenance door or an opening / closing mechanism for changing the thinness of the irradiation window 2, and is used as needed to guide the irradiation target 4 described above. Of course, you can use it.

【0021】[0021]

【発明の効果】以上詳述したようにこの発明によれば、
搬送ダクトを設けると言った簡単な構成により、不活性
ガスの利用効率の向上を図ることができる。
As described in detail above, according to the present invention,
With a simple configuration such as providing a transport duct, it is possible to improve the utilization efficiency of the inert gas.

【0022】また、この発明によれば、不活性ガスの吹
き付けによる被照射体のばたつきを防止することができ
る効果を奏する。
Further, according to the present invention, it is possible to prevent the irradiation object from fluttering due to the blowing of the inert gas.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の一実施例を示す概略断面図である。FIG. 1 is a schematic sectional view showing an embodiment of the present invention.

【図2】この発明の他の実施例を示す概略断面図であ
る。
FIG. 2 is a schematic sectional view showing another embodiment of the present invention.

【図3】従来例を示す概略断面図である。FIG. 3 is a schematic sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1:電子線発生装置 4:被照射体 5:X線遮蔽ケース 7:照射室 71:照射領域 10:ノズル 11:ローラ 20:搬送ダクト 1: Electron beam generator 4: Irradiation target 5: X-ray shielding case 7: Irradiation chamber 71: Irradiation area 10: Nozzle 11: Roller 20: Transport duct

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 電子線発生装置からの電子線を被照射体
に照射する照射室内の照射領域に向かって搬送される被
照射体の搬送通路に沿って、前記被照射体の表面に向か
って不活性ガスを吹き付けるための複数のノズルと、前
記被照射体の搬送をガイドする複数のローラと、これら
ノズルやローラおよび前記照射領域を含む搬送通路を包
囲するX線遮蔽ケースとを有する電子線照射装置におい
て、前記搬送通路に沿って、かつ前記ノズルおよびロー
ラの少なくとも一部を包み込むように搬送ダクトを形成
し、前記照射領域を不活性ガス雰囲気としてなることを
特徴とする電子線照射装置。
1. A surface of the object to be irradiated is conveyed along a transfer path of the object to be irradiated, which is conveyed toward an irradiation region in an irradiation chamber for irradiating the object to be irradiated with an electron beam from an electron beam generator. An electron beam having a plurality of nozzles for spraying an inert gas, a plurality of rollers for guiding the transfer of the irradiation target, and an X-ray shielding case surrounding a transfer passage including the nozzles and the rollers and the irradiation region. In the irradiation device, a conveyance duct is formed along the conveyance passage so as to wrap at least a part of the nozzle and the roller, and the irradiation region is made an inert gas atmosphere.
【請求項2】 ノズルおよびローラを、被照射体を挟ん
で対象の位置に向い合わせに配置してなる請求項1記載
の電子線照射装置。
2. The electron beam irradiation apparatus according to claim 1, wherein the nozzle and the roller are arranged so as to face the target position with the object to be irradiated interposed therebetween.
JP25037291A 1991-09-02 1991-09-02 Electron beam irradiation device Pending JPH0560899A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25037291A JPH0560899A (en) 1991-09-02 1991-09-02 Electron beam irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25037291A JPH0560899A (en) 1991-09-02 1991-09-02 Electron beam irradiation device

Publications (1)

Publication Number Publication Date
JPH0560899A true JPH0560899A (en) 1993-03-12

Family

ID=17206944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25037291A Pending JPH0560899A (en) 1991-09-02 1991-09-02 Electron beam irradiation device

Country Status (1)

Country Link
JP (1) JPH0560899A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
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US6930315B2 (en) 1999-10-12 2005-08-16 Toyo Ink Manufacturing Co., Ltd. Method and apparatus for irradiation of active energy beam
WO2005086176A1 (en) * 2004-03-09 2005-09-15 Dai Nippon Printing Co., Ltd. Electron beam irradiation device
JP2006275515A (en) * 2005-03-25 2006-10-12 Dainippon Printing Co Ltd Electron beam irradiation device
WO2008062669A1 (en) * 2006-11-24 2008-05-29 Hamamatsu Photonics K.K. Electron beam irradiation system
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CN103029242A (en) * 2011-09-30 2013-04-10 软控股份有限公司 Film electron irradiation device and method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930315B2 (en) 1999-10-12 2005-08-16 Toyo Ink Manufacturing Co., Ltd. Method and apparatus for irradiation of active energy beam
WO2005086176A1 (en) * 2004-03-09 2005-09-15 Dai Nippon Printing Co., Ltd. Electron beam irradiation device
US7435980B2 (en) 2004-03-09 2008-10-14 Dai Nippon Printing Co., Ltd. Electron beam irradiation device
JP2006275515A (en) * 2005-03-25 2006-10-12 Dainippon Printing Co Ltd Electron beam irradiation device
US7705330B2 (en) 2005-03-25 2010-04-27 Dai Nippon Printing Co., Ltd. Electron beam irradiation device
JP4641844B2 (en) * 2005-03-25 2011-03-02 大日本印刷株式会社 Electron beam irradiation device
WO2008062669A1 (en) * 2006-11-24 2008-05-29 Hamamatsu Photonics K.K. Electron beam irradiation system
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