JPH0560830A - Thermostat for ic testing device - Google Patents
Thermostat for ic testing deviceInfo
- Publication number
- JPH0560830A JPH0560830A JP3224221A JP22422191A JPH0560830A JP H0560830 A JPH0560830 A JP H0560830A JP 3224221 A JP3224221 A JP 3224221A JP 22422191 A JP22422191 A JP 22422191A JP H0560830 A JPH0560830 A JP H0560830A
- Authority
- JP
- Japan
- Prior art keywords
- case
- hot air
- duct
- unit
- constant temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Tests Of Electronic Circuits (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、多数のIC測定部に
おける温度を一様にするIC試験装置用恒温槽に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a constant temperature bath for an IC testing device which makes the temperatures in a large number of IC measuring sections uniform.
【0002】[0002]
【従来の技術】ICについての評価或いはIC受け入れ
検査は、多数のICを恒温槽に収容して恒温状態におい
て一度に同時に実施される。この様な用途に供されるI
C試験装置用恒温槽の従来例を図1を参照して説明す
る。2. Description of the Related Art Evaluations of ICs or IC acceptance inspections are carried out simultaneously at a time in a constant temperature state in which a large number of ICs are housed in a constant temperature tank. I used for such applications
A conventional example of a constant temperature bath for a C test device will be described with reference to FIG.
【0003】図1において、1はIC試験装置用恒温槽
のケースである。ケース1は、図においてその右上方領
域にファン・ユニット2およびヒータ・ユニット3を収
容し、その下方領域に多数のICを同時に測定する多数
のIC測定部が構成される。4は熱風を案内するダクト
であり、その下端はケース1の右上方領域を形成するケ
ース下面に係合してこれらの間に熱風流通路が形成され
る。5はケース背面基板であり、この背面基板5にはコ
ンタクト・ユニット(レール・ユニット)6が取り付け
られる。In FIG. 1, reference numeral 1 is a case of a constant temperature bath for an IC test apparatus. The case 1 accommodates the fan unit 2 and the heater unit 3 in the upper right area in the figure, and has a large number of IC measurement units for simultaneously measuring a large number of ICs in the lower area. Reference numeral 4 denotes a duct for guiding hot air, the lower end of which is engaged with the lower surface of the case forming the upper right region of the case 1 to form a hot air flow passage therebetween. Reference numeral 5 denotes a case rear substrate, to which a contact unit (rail unit) 6 is attached.
【0004】コンタクト・ユニット6は図2に示される
が如きものである。コンタクト・ユニット6は上述した
通りケースの背面基板5に取り付けられ、測定されるべ
きIC7をIC測定部8に位置決め保持するためのもの
である。IC7は、共に上下方向に延伸するレール9お
よびルーフ10とストッパ11の3者により図示される
が如くに位置決めされるのであるが、その詳細について
は説明を省略する。なお、多数のIC測定部8における
温度が一様であるか否かを判断するには測定部8におけ
る温度を測定する必要があることは言うまでもないこと
であるが、そのためには例えばPtセンサをIC測定部
8に位置決め保持されたIC7の近傍に配置する。Contact unit 6 is as shown in FIG. The contact unit 6 is attached to the rear substrate 5 of the case as described above, and serves to position and hold the IC 7 to be measured in the IC measuring section 8. The IC 7 is positioned as shown by the three members including the rail 9 and the roof 10 that both extend in the vertical direction, and the stopper 11, but a detailed description thereof will be omitted. Needless to say, it is necessary to measure the temperature in the measuring unit 8 in order to determine whether or not the temperature in the multiple IC measuring units 8 is uniform. It is arranged near the IC 7 positioned and held by the IC measuring unit 8.
【0005】[0005]
【発明が解決しようとする課題】上述されたIC試験装
置用恒温槽の従来例において、ファン・ユニット2によ
り生ぜしめられた高速空気の流れはヒータ・ユニット3
に到達し、ここにおいて熱交換されながらダクト4によ
り案内されて図1の矢印により示されるが如くに流通す
る。即ち、加熱された熱風の流れはダクト4により偏向
されて上から下向きに吹き出され、流通、循環せしめら
れる。この従来例の場合、IC測定部8は合計32箇所
構成されるのであるが、何分にもコンタクト・ユニット
6は図2に示されるが如く大変に複雑な形状構造を有す
るものであることから、32箇所のIC測定部8に加熱
された高速空気を一様に流通、循環せしめることは容易
なことではないのである。現実に、恒温槽内温度を一様
に100℃としたい場合、恒温槽内上部を100℃に保
持したものとすると、下部は90℃程度にしかならな
い。実際は、IC測定部8すべてについて設定温度±3
℃程度の精度におさめたく、種々の対策を講じてきたた
のであるが、今の所この精度を実現することはできてい
ない。In the conventional example of the constant temperature bath for the IC test apparatus described above, the flow of high-speed air generated by the fan unit 2 is the heater unit 3
And is guided by the duct 4 while exchanging heat there, and flows as shown by the arrow in FIG. That is, the flow of the heated hot air is deflected by the duct 4 and blown downward from above, and is circulated and circulated. In the case of this conventional example, the IC measuring section 8 is configured in 32 places in total, but since the contact unit 6 has a very complicated shape structure as shown in FIG. It is not easy to uniformly circulate and circulate the heated high-speed air in the 32 IC measuring units 8. In reality, when it is desired to keep the temperature inside the constant temperature bath at 100 ° C. uniformly, if the upper portion inside the constant temperature bath is kept at 100 ° C., the lower portion is only about 90 ° C. Actually, the set temperature is ± 3 for all IC measuring units 8.
Although various measures have been taken in order to reduce the accuracy to about ℃, this accuracy has not been realized so far.
【0006】この発明は、上述の通りの問題を解消しよ
うとするものである。The present invention is intended to solve the above problems.
【0007】[0007]
【課題を解決するための手段】ケース1を具備し、ケー
ス1の上方領域にはファン・ユニット2およびヒータ・
ユニット3を収容し、その下方領域には多数のIC測定
部8を構成するコンタクト・ユニット6を収容し、熱風
を案内するダクト4を具備するIC試験装置用恒温槽に
おいて、ダクト4とケース1とによりこれらの間に熱風
流通路を形成し、熱風流通路の下端はケース下方領域下
部において開口するものとした。A case 1 is provided, and a fan unit 2 and a heater are provided in an upper region of the case 1.
The duct 4 and the case 1 are provided in a thermostatic chamber for an IC test apparatus, which accommodates the unit 3 and the contact unit 6 that constitutes a large number of IC measuring units 8 in the lower region thereof and includes the duct 4 that guides hot air. A hot air flow passage is formed between them by means of, and the lower end of the hot air flow passage opens at the lower part of the lower region of the case.
【0008】[0008]
【実施例】この発明の実施例を図3を参照して説明す
る。図3について、図1における参照数字と共通する参
照数字は互いに同一の部材を示すものとする。図3に示
されるこの発明のIC試験装置用恒温槽は図1に示され
る従来のIC試験装置用恒温槽におけるダクト4の先端
部にケース1底面近傍に達する垂直延長部4’を付加し
たものに相当する。この垂直延長部4’は、ダクト4の
先端部からケース1底面近傍に迄達する前面板12と、
前面板12の左右両端部において屈曲してケースの背面
基板5に達すると共に下端はケース1底面に達する左右
の側面板13とにより構成される。結局、この垂直延長
部4’とケースの背面基板5との間にも熱風流通路が形
成され、そしてこの熱風流通路の下端はケース下方領域
下部、即ちケース1底面近傍において開口するものであ
る。従って、ダクト4とケース1の右上方領域を形成す
るケース下面との間に形成される熱風流通路とダクトの
垂直延長部4’とケースの背面基板5との間に形成され
る熱風流通路とは互いに連通しており、ヒータ・ユニッ
ト3から送り出される熱風はこれら連通する熱風流通路
を流れ下り、図3において矢印で示される如くに恒温槽
下部から上向きに吹き出され、流通、循環せしめられ
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described with reference to FIG. 3, reference numerals common to those in FIG. 1 denote the same members. The temperature chamber for IC test equipment of the present invention shown in FIG. 3 is obtained by adding a vertical extension 4 ′ reaching the vicinity of the bottom surface of the case 1 to the tip of the duct 4 in the conventional temperature chamber for IC test equipment shown in FIG. Equivalent to. The vertical extension 4 ′ includes a front plate 12 that extends from the tip of the duct 4 to near the bottom of the case 1,
The left and right side plates 13 of the front plate 12 are bent to reach the rear substrate 5 of the case and the lower ends thereof reach the bottom surface of the case 1. Eventually, a hot air flow passage is also formed between the vertical extension 4'and the back substrate 5 of the case, and the lower end of the hot air flow passage opens at the lower part of the lower region of the case, that is, near the bottom surface of the case 1. .. Therefore, the hot air flow passage formed between the duct 4 and the lower surface of the case forming the upper right region of the case 1 and the hot air flow passage formed between the vertical extension 4 ′ of the duct and the back substrate 5 of the case. Are communicated with each other, and the hot air sent out from the heater unit 3 flows down through the hot air flow passages communicating with each other, and is blown upward from the lower part of the constant temperature oven as shown by an arrow in FIG. 3 to be circulated and circulated. ..
【0009】[0009]
【発明の効果】熱風の流れが恒温槽内に上から下向きに
吹き出され、流通、循環せしめられるIC試験装置用恒
温槽について、IC測定部8すべてについて設定温度±
3℃程度の精度におさめるべく種々の対策を講じてもこ
の精度を実現することができなかったのであるが、この
発明によってダクト4の先端部にケース1底面近傍に達
する垂直延長部4’を付加するという一見極く簡単な構
成を採用して熱風流通路を形成し、熱風を図3において
矢印で示されるが如くに恒温槽下部から上向きに吹き出
し、流通循環せしめたところ、IC測定部8すべてにつ
いて設定温度±3℃の精度は充分に保たれていることを
実測することができた。IC試験装置用恒温槽について
この程度の精度を保つことにより、ICについての評価
或いはIC受け入れ検査の信頼性は充分に担保されるに
到った。EFFECTS OF THE INVENTION Regarding the constant temperature chamber for the IC test apparatus in which the flow of hot air is blown downward from the inside into the constant temperature chamber, the temperature is set ± for all the IC measuring units 8 in the constant temperature chamber for IC test equipment.
Even if various measures were taken to reduce the accuracy to about 3 ° C., this accuracy could not be realized, but according to the present invention, the vertical extension 4 ′ reaching the vicinity of the bottom surface of the case 1 is provided at the tip of the duct 4. The hot air flow passage was formed by adopting a seemingly extremely simple configuration of adding, and hot air was blown upward from the lower part of the constant temperature chamber as shown by the arrow in FIG. It was possible to measure that the accuracy of the set temperature ± 3 ° C was sufficiently maintained for all of them. By maintaining this degree of accuracy in the constant temperature bath for the IC test apparatus, the reliability of the IC evaluation or IC acceptance inspection has been sufficiently ensured.
【図1】IC試験装置用恒温槽の従来例を示す図。FIG. 1 is a view showing a conventional example of a constant temperature bath for an IC test device.
【図2】IC試験装置に使用されるコンタクト・ユニッ
トを示す図。FIG. 2 is a diagram showing a contact unit used in an IC test apparatus.
【図3】この発明のIC試験装置用恒温槽を示す図。FIG. 3 is a view showing a thermostatic chamber for an IC test device according to the present invention.
1 ケース 2 ファン・ユニット 3 ヒータ・ユニット 4 ダクト 6 コンタクト・ユニット 1 case 2 fan unit 3 heater unit 4 duct 6 contact unit
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成4年8月21日[Submission date] August 21, 1992
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】請求項1[Name of item to be corrected] Claim 1
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【手続補正2】[Procedure Amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0007[Correction target item name] 0007
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【0007】[0007]
【課題を解決するための手段】ケース1を具備し、ケー
ス1の上方領域にはファン・ユニット2およびヒータ・
ユニット3を収容し、その下方領域には多数のIC測定
部8を構成するコンタクト・ユニット6を収容し、熱風
および冷風を案内するダクト4を具備するIC試験装置
用恒温槽において、ダクト4とケース1とによりこれら
の間に熱風流通路を形成し、熱風流通路の下端はケース
下方領域下部において開口するものとした。A case 1 is provided, and a fan unit 2 and a heater are provided in an upper region of the case 1.
The unit 3 is housed, and the contact unit 6 that constitutes a large number of IC measuring units 8 is housed in the lower region of the unit 3.
And a constant temperature bath for an IC test apparatus, which is provided with a duct 4 for guiding cold air, in which a hot air flow passage is formed between the duct 4 and the case 1, and a lower end of the hot air flow passage opens at a lower portion of a lower region of the case. And
Claims (1)
ファン・ユニットおよびヒータ・ユニットを収容し、そ
の下方領域には多数のIC測定部を構成するコンタクト
・ユニットを収容し、熱風を案内するダクトを具備する
IC試験装置用恒温槽において、ダクトとケースとによ
りこれらの間に熱風流通路を形成し、熱風流通路の下端
はケース下方領域下部において開口するものであること
を特徴とするIC試験装置用恒温槽。1. A case is provided, a fan unit and a heater unit are accommodated in an upper region of the case, and a contact unit which constitutes a large number of IC measuring units is accommodated in a lower region thereof, and hot air is guided. In a thermostatic chamber for an IC test apparatus including a duct, a hot air flow passage is formed between a duct and a case, and a lower end of the hot air flow passage opens at a lower portion of a lower region of the case. Constant temperature bath for IC test equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03224221A JP3075542B2 (en) | 1991-09-04 | 1991-09-04 | Constant temperature bath for IC test equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03224221A JP3075542B2 (en) | 1991-09-04 | 1991-09-04 | Constant temperature bath for IC test equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0560830A true JPH0560830A (en) | 1993-03-12 |
JP3075542B2 JP3075542B2 (en) | 2000-08-14 |
Family
ID=16810409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP03224221A Expired - Lifetime JP3075542B2 (en) | 1991-09-04 | 1991-09-04 | Constant temperature bath for IC test equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3075542B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100811418B1 (en) * | 2007-06-08 | 2008-03-07 | 김기영 | A corrugated board |
EP2048283B1 (en) | 2007-08-30 | 2015-08-19 | INDUSTRIE CARTARIE TRONCHETTI SpA | Apparatus for pasting two or more plies for manufacturing tissue products |
-
1991
- 1991-09-04 JP JP03224221A patent/JP3075542B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100811418B1 (en) * | 2007-06-08 | 2008-03-07 | 김기영 | A corrugated board |
EP2048283B1 (en) | 2007-08-30 | 2015-08-19 | INDUSTRIE CARTARIE TRONCHETTI SpA | Apparatus for pasting two or more plies for manufacturing tissue products |
Also Published As
Publication number | Publication date |
---|---|
JP3075542B2 (en) | 2000-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20000509 |