JPH0559990B2 - - Google Patents
Info
- Publication number
- JPH0559990B2 JPH0559990B2 JP14173185A JP14173185A JPH0559990B2 JP H0559990 B2 JPH0559990 B2 JP H0559990B2 JP 14173185 A JP14173185 A JP 14173185A JP 14173185 A JP14173185 A JP 14173185A JP H0559990 B2 JPH0559990 B2 JP H0559990B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- temperature
- sample substrate
- compound gas
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 57
- 239000000758 substrate Substances 0.000 claims description 46
- 238000006243 chemical reaction Methods 0.000 claims description 36
- 150000001875 compounds Chemical class 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 28
- 230000005284 excitation Effects 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000000059 patterning Methods 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 9
- 230000000977 initiatory effect Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 28
- 239000007789 gas Substances 0.000 description 22
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 12
- 238000000151 deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000012212 insulator Substances 0.000 description 4
- 238000006552 photochemical reaction Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 235000008529 Ziziphus vulgaris Nutrition 0.000 description 2
- 244000126002 Ziziphus vulgaris Species 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000005068 transpiration Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14173185A JPS624871A (ja) | 1985-06-28 | 1985-06-28 | 光照射薄膜パタ−ニング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14173185A JPS624871A (ja) | 1985-06-28 | 1985-06-28 | 光照射薄膜パタ−ニング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS624871A JPS624871A (ja) | 1987-01-10 |
| JPH0559990B2 true JPH0559990B2 (ko) | 1993-09-01 |
Family
ID=15298897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14173185A Granted JPS624871A (ja) | 1985-06-28 | 1985-06-28 | 光照射薄膜パタ−ニング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS624871A (ko) |
-
1985
- 1985-06-28 JP JP14173185A patent/JPS624871A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS624871A (ja) | 1987-01-10 |
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