JPH055990A - Photosensitive composition and pattern forming method - Google Patents

Photosensitive composition and pattern forming method

Info

Publication number
JPH055990A
JPH055990A JP14467491A JP14467491A JPH055990A JP H055990 A JPH055990 A JP H055990A JP 14467491 A JP14467491 A JP 14467491A JP 14467491 A JP14467491 A JP 14467491A JP H055990 A JPH055990 A JP H055990A
Authority
JP
Japan
Prior art keywords
photosensitive composition
water
forming method
pattern forming
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14467491A
Other languages
Japanese (ja)
Inventor
Tatsushi Goto
達士 後藤
Eiji Omori
英二 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP14467491A priority Critical patent/JPH055990A/en
Publication of JPH055990A publication Critical patent/JPH055990A/en
Pending legal-status Critical Current

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  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To obtain a high sensitive photosensitive composition capable of exposure even at low illuminance and to shorten exposure time and to improve productivity, for example, in the case of forming the black matrics of a large- sized color cathod-ray tube. CONSTITUTION:This photosensitive composition consisto of water soluble polymer, polyvinyl alcohol system photosensitive resin and water, and this pattern forming method is carried out by using the photosensitive composition.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、感光性組成物およびこ
れを用いたパターンの形成方法、特にカラーブラウン管
のブラックマトリックスの形成に有用な感光性組成物お
よびこれを用いたパターンの形成方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive composition and a pattern forming method using the same, and more particularly to a photosensitive composition useful for forming a black matrix of a color cathode ray tube and a pattern forming method using the same. ..

【0002】[0002]

【従来の技術】従来のパターン形成方法の一例として、
特開昭50−33764号公報に示されているようにカ
ラーブラウン管のブラックマトリックスの製造に水溶性
ポリマーと感光性物質、例えばアクリルアミド−ジアセ
トンアクリルアミド共重合体と芳香族ビスアジドよりな
る感光性組成物を用いる方法がある。
2. Description of the Related Art As an example of a conventional pattern forming method,
As disclosed in JP-A-50-33764, a photosensitive composition comprising a water-soluble polymer and a photosensitive substance, for example, an acrylamide-diacetone acrylamide copolymer and an aromatic bisazide, for producing a black matrix of a color CRT. There is a method of using.

【0003】[0003]

【発明が解決しようとする課題】上記従来技術はカラー
ブラウン管の大型化については考慮されておらず、大型
のカラーブラウン管のブラックマトリックスを形成する
際、露光面が光源から遠くなるため露光面の照度が下が
り、露光に要する時間が長くかかり、生産性が悪くなる
という問題があった。本発明は、低照度でも露光できる
高感度な感光性組成物およびこれを用いたパターンの形
成方法を提供するものである。
The above-mentioned prior art does not consider the enlargement of the color cathode ray tube, and when forming the black matrix of a large color cathode ray tube, the exposure surface becomes far from the light source, so that the illuminance of the exposure surface is large. However, there is a problem in that the exposure time is long and the productivity is poor. The present invention provides a highly sensitive photosensitive composition that can be exposed even at low illuminance, and a pattern forming method using the same.

【0004】[0004]

【課題を解決するための手段】本発明は水溶性ポリマ
ー、ポリビニルアルコール系感光性樹脂および水を含む
感光性組成物およびこれを用いるパターンの形成方法に
関する。
The present invention relates to a photosensitive composition containing a water-soluble polymer, a polyvinyl alcohol type photosensitive resin and water, and a pattern forming method using the same.

【0005】本発明になる感光性組成物には、水溶性ポ
リマーとしてポリビニルアルコール、ポリビニルピロリ
ドン、ポリアクリルアミド、アクリルアミド−ジアセト
ンアクリルアミド共重合体などを用いることができる。
またポリビニルアルコール系感光性樹脂としては、ポリ
ビニルアルコールの主鎖にスチルバゾリウム基が導入さ
れている次の構造を持つもの等を用いることができる。
この樹脂については特開昭55−23163号公報に開
示されている。
In the photosensitive composition of the present invention, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylamide, acrylamide-diacetone acrylamide copolymer, etc. can be used as the water-soluble polymer.
As the polyvinyl alcohol-based photosensitive resin, those having the following structure in which a stilbazolium group is introduced into the main chain of polyvinyl alcohol can be used.
This resin is disclosed in JP-A-55-23163.

【化1】 (式においてRは水素原子又はアルキル基、X-はC
-、SO2 -、NO3 -等の強酸の陰イオン、nは整数を
示す。)
[Chemical 1] (In the formula, R is a hydrogen atom or an alkyl group, X is C
Anions of strong acids such as l , SO 2 , NO 3 , and n represents an integer. )

【0006】感光性組成物中の水溶性ポリマーとポリビ
ニルアルコール系感光性樹脂の比率は、水溶性ポリマー
10重量部に対してポリビニルアルコール系感光性樹脂
を5〜200重量部とすることが好ましく、10〜10
0重量部とすることがより好ましい。5重量部未満では
感度が低下し、200重量部を越えると粘度が高くなり
塗布性が低下する傾向がある。
The ratio of the water-soluble polymer to the polyvinyl alcohol-based photosensitive resin in the photosensitive composition is preferably 5 to 200 parts by weight of the polyvinyl alcohol-based photosensitive resin with respect to 10 parts by weight of the water-soluble polymer, 10 to 10
More preferably, it is 0 part by weight. If it is less than 5 parts by weight, the sensitivity tends to be low, and if it exceeds 200 parts by weight, the viscosity tends to be high and the coating property tends to be poor.

【0007】感光性組成物中の水の量は、感光性組成物
の塗布性および現像性から、水溶性ポリマー10重量部
に対して、500〜5000重量部とすることが好まし
く、1000〜2000重量部とすることがより好まし
い。
The amount of water in the photosensitive composition is preferably 500 to 5000 parts by weight, and 1000 to 2000 parts by weight, based on 10 parts by weight of the water-soluble polymer, from the viewpoint of coatability and developability of the photosensitive composition. It is more preferable to set it as a weight part.

【0008】上記感光性組成物をパターンを形成しよう
とするカラーブラウン管等のガラス、プラスチック、ア
ルミ基板等の金属板などの面上にスピンコーティング法
等を用いて塗布し、形成された塗膜にマスクを介してパ
ターン露光を行った後、現像処理することにより所望の
パターンを形成することができる。現像は水を用いて行
われ、一般には40℃程度の温水を用いることが好まし
い。
The photosensitive composition is applied onto the surface of glass such as a color cathode ray tube or the like for forming a pattern, plastic, a metal plate such as an aluminum substrate using a spin coating method or the like to form a coating film. A desired pattern can be formed by performing pattern exposure after performing pattern exposure through a mask. Development is carried out using water, and it is generally preferable to use warm water at about 40 ° C.

【0009】本発明になる感光性組成物は、シランカッ
プリング剤等の接着性改良剤、エチレングリコール等の
塗布性改良剤などを含んでもよい。
The photosensitive composition of the present invention may contain an adhesion improver such as a silane coupling agent, a coatability improver such as ethylene glycol and the like.

【0010】[0010]

【実施例】次に実施例により本発明を説明する。実施
例、比較例中部とあるのは重量部である。 比較例 アクリルアミド−ジアセトンアクリルアミド共重合体
(共重合比;アクリルアミド:ジアセトンアクリルアミ
ド=1:1、重量平均分子量約10,000)1.7
部、4.4′−ジアジドスチルベン−2,2′−ジスル
ホン酸ナトリウム0.3部、水98部を混合撹拌して感
光性組成物Aを調整した。これをガラス基板に0.5〜
1μmの厚さにスピンコートし、60℃で1分間乾燥し
て塗膜とした。
EXAMPLES The present invention will now be described with reference to examples. In the examples and comparative examples, the middle parts are parts by weight. Comparative Example Acrylamide-diacetone acrylamide copolymer (copolymerization ratio; acrylamide: diacetone acrylamide = 1: 1, weight average molecular weight about 10,000) 1.7
Parts, 4.4'-diazidostilbene-2,2'-sodium disulfonate (0.3 parts) and water (98 parts) were mixed and stirred to prepare a photosensitive composition A. 0.5 to this on a glass substrate
It was spin-coated to a thickness of 1 μm and dried at 60 ° C. for 1 minute to form a coating film.

【0011】実施例1 東洋合成工業(株)製商品名SPP−H−13(スチル
バゾリウム基ペンダントポリビニルアルコール水溶液、
重合度1,700、固形分11.5%)13部、アクリ
ルアミド−ジアセトンアクリルアミド共重合体(共重合
比;アクリルアミド:ジアセトンアクリルアミド=1:
1、重量平均分子量約10,000)0.5部、水8
6.5部を混合撹拌して感光性組成物Bを調整した。こ
れを比較例と同様の手法で塗膜とした。
Example 1 Toyo Gosei Co., Ltd. trade name SPP-H-13 (stilbazolium group pendant polyvinyl alcohol aqueous solution,
Polymerization degree 1,700, solid content 11.5%) 13 parts, acrylamide-diacetone acrylamide copolymer (copolymerization ratio; acrylamide: diacetone acrylamide = 1:
1, weight average molecular weight about 10,000) 0.5 parts, water 8
The photosensitive composition B was prepared by mixing and stirring 6.5 parts. This was made into a coating film by the same method as in the comparative example.

【0012】実施例2 実施例1のアクリルアミド−ジアセトンアクリルアミド
共重合体をポリビニルピロリドンに変えた以外は実施例
1と同様にして感光性組成物Cを調整し、これを比較例
と同様の手法で塗膜とした。実施例及び比較例の塗膜の
感度比較を表1に示す。
Example 2 A photosensitive composition C was prepared in the same manner as in Example 1 except that the acrylamide-diacetone acrylamide copolymer of Example 1 was changed to polyvinylpyrrolidone. To make a coating film. Table 1 shows a comparison of the sensitivities of the coating films of Examples and Comparative Examples.

【0013】[0013]

【表1】 *塗膜上から超高圧水銀灯により紫外光を20秒間照射
し、温水現像して160μmのホール径のパターンを得
るのに最低どれだけの照度(W/m2)が必要かを調
べ、それを比較した。(なお感度は比較例の場合を1と
する相対感度で表わしてある)表1に示されるように実
施例の塗膜は高感度であり、より低照度で露光してパタ
ーンを形成することができる。
[Table 1] * Examine the minimum illuminance (W / m 2 ) required to obtain a pattern with a hole diameter of 160 μm by irradiating UV light from the coating film with an ultra-high pressure mercury lamp for 20 seconds and developing it. Compared. (Note that the sensitivity is represented by relative sensitivity with 1 in the case of the comparative example.) As shown in Table 1, the coating films of the examples have high sensitivity and may be exposed at lower illuminance to form a pattern. it can.

【0014】[0014]

【発明の効果】本発明になる感光性組成物を用いたパタ
ーンの形成方法によれば低照度でも露光できる高感度な
感光性組成物によって例えば大型のカラーブラウン管の
ブラックマトリックスを形成する際、露光時間の短縮が
可能となり生産性が向上する。
According to the method of forming a pattern using the photosensitive composition of the present invention, when a black matrix of a large color cathode ray tube is formed with a highly sensitive photosensitive composition that can be exposed even at low illuminance, the exposure is performed. Time can be shortened and productivity is improved.

Claims (1)

【特許請求の範囲】 【請求項1】 水溶性ポリマー、ポリビニルアルコール
系感光性樹脂および水を含む感光性組成物。 【請求項2】 請求項1記載の感光性組成物を用いるパ
ターンの形成方法。
Claim: What is claimed is: 1. A photosensitive composition comprising a water-soluble polymer, a polyvinyl alcohol-based photosensitive resin, and water. 2. A method of forming a pattern using the photosensitive composition according to claim 1.
JP14467491A 1991-06-17 1991-06-17 Photosensitive composition and pattern forming method Pending JPH055990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14467491A JPH055990A (en) 1991-06-17 1991-06-17 Photosensitive composition and pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14467491A JPH055990A (en) 1991-06-17 1991-06-17 Photosensitive composition and pattern forming method

Publications (1)

Publication Number Publication Date
JPH055990A true JPH055990A (en) 1993-01-14

Family

ID=15367609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14467491A Pending JPH055990A (en) 1991-06-17 1991-06-17 Photosensitive composition and pattern forming method

Country Status (1)

Country Link
JP (1) JPH055990A (en)

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