JPH0553241U - Substrate cleaning equipment - Google Patents
Substrate cleaning equipmentInfo
- Publication number
- JPH0553241U JPH0553241U JP10996391U JP10996391U JPH0553241U JP H0553241 U JPH0553241 U JP H0553241U JP 10996391 U JP10996391 U JP 10996391U JP 10996391 U JP10996391 U JP 10996391U JP H0553241 U JPH0553241 U JP H0553241U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- hydrogen peroxide
- concentration
- liquid supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【目的】 洗浄液採取管や採取用ポンプ等の配管を不要
にし、かつ薬液供給量制御手段の複雑な演算を簡素化す
る。
【構成】 基板Wの洗浄槽1に洗浄液供給管3を接続し、
洗浄液供給管3に複数種の薬液貯溜容器5A〜5Cを連通し
て、その洗浄液供給管3内で純水Wと薬液QA〜QCとを調合
して洗浄槽1内へアンモニア過水洗浄液又は塩酸過水洗
浄液を供給する。洗浄液供給管3に透過光測定手段100と
して紫外光検出部13及び赤外光検出部14とを付設し、洗
浄液2を洗浄槽1内へ供給する途中で、紫外光検出手部13
で洗浄液2中の過酸化水素水の濃度を検出するととも
に、赤外光検出部14で洗浄液2中のアンモニア水の濃度
又は塩酸の濃度を検出する。 (57) [Summary] [Purpose] To eliminate the need for piping such as a cleaning liquid sampling pipe and a sampling pump, and to simplify the complicated calculation of the chemical liquid supply control means. [Structure] Connect the cleaning liquid supply pipe 3 to the cleaning tank 1 of the substrate W,
Plural kinds of chemical liquid storage containers 5 A to 5 C are connected to the cleaning liquid supply pipe 3, pure water W and chemical liquids Q A to Q C are mixed in the cleaning liquid supply pipe 3, and ammonia gas is passed into the cleaning tank 1. Supply a water cleaning solution or a hydrochloric acid / hydrogen peroxide cleaning solution. An ultraviolet light detection unit 13 and an infrared light detection unit 14 are attached to the cleaning liquid supply pipe 3 as the transmitted light measuring means 100, and the ultraviolet light detection hand unit 13 is supplied during the supply of the cleaning liquid 2 into the cleaning tank 1.
Detects the concentration of hydrogen peroxide water in the cleaning liquid (2), and detects the concentration of ammonia water or hydrochloric acid in the cleaning liquid (2) in the infrared light detecting section (14).
Description
【０００１】[0001]
この考案は、基板の洗浄装置に関するものである。 The present invention relates to a substrate cleaning device.
【０００２】[0002]
この種の装置としては従来より、例えば特開昭６１−２８１５３２号公報に開 示されたものが知られている。 それは図１０に示すように、洗浄液２中に基板Ｗを浸漬してその表面を洗浄す る洗浄槽１０１と、各薬液供給管１０６及び各薬液導入弁１０９を介して洗浄槽 １０１にそれぞれ連通され、アンモニア水ＱAを貯溜した容器１０５A及び過酸化 水素水ＱBを貯溜した容器１０５Bと、洗浄槽１０１から採取した洗浄液２中の薬 液濃度を測定して薬液導入弁１０９を制御する薬液供給量制御手段１１０とを具 備して成る。As this type of device, a device disclosed in, for example, Japanese Patent Application Laid-Open No. 61-281532 is known. As shown in FIG. 10, it is connected to the cleaning tank 101 in which the substrate W is immersed in the cleaning liquid 2 to clean the surface thereof, and the cleaning tank 101 via each chemical solution supply pipe 106 and each chemical solution introduction valve 109. , The container 105 A storing the ammonia water Q A , the container 105 B storing the hydrogen peroxide water Q B , and the chemical concentration in the cleaning liquid 2 collected from the cleaning tank 101 are measured to control the chemical liquid introducing valve 109. And a chemical liquid supply amount control means 110.
【０００３】 上記薬液供給量制御手段１１０は、マイクロコンピュータ１１１及びインター フェイス１１２と、それぞれ洗浄液採取管１０３の前段透過光測定部１０３ａに 付設された紫外光検出手段１１３Ａ及び後段の透過光測定部１０３ｂに付設され た紫外光検出手段１１３Ｂと、弁駆動回路１１４とを具備して成り、上記２つの 紫外光検出手段で洗浄液２の吸光度を測定して、洗浄液２中の過酸化水素水の濃 度とアンモニア水の濃度を検出し得るように構成されている。 なお、符号１０５Cは塩酸ＱCを貯溜した容器、１０５Dは純水を貯溜した容器 であり、洗浄液２中の水素イオン濃度がＰＨ４以下に成るように、塩酸ＱCを後段 の透過光測定部１０３ｂに供給するように構成されている。The chemical liquid supply amount control means 110 includes a microcomputer 111, an interface 112, an ultraviolet light detection means 113A attached to the front stage transmitted light measuring section 103a of the cleaning liquid sampling tube 103, and a rear stage transmitted light measuring section 103b. Is provided with an ultraviolet light detecting means 113B attached to the valve and a valve driving circuit 114, and the absorbance of the cleaning liquid 2 is measured by the two ultraviolet light detecting means, and the concentration of the hydrogen peroxide solution in the cleaning liquid 2 is measured. And the concentration of ammonia water can be detected. Incidentally, the container code 105 C is that reservoir hydrochloride Q C, 105 D is a container in which reservoir the pure water, so that the hydrogen ion concentration in the cleaning liquid 2 is made to PH4 below, transmitted light measurement hydrochloride Q C subsequent It is configured to supply to the portion 103b.
【０００４】 この従来技術は、水溶液中にアンモニアと過酸化水素とが共存する場合に、以 下の手法により洗浄液中の過酸化水素水の濃度とアンモニア水の濃度を検出し得 るようにしたものである。 ３００nm付近の吸光度を測定して過酸化水素による酸素濃度のみを独立に測定 しようとする場合、上記水溶液の酸素濃度は水素イオン濃度の影響を受ける。 一方、この水溶液に過剰の酸を添加して、常に水溶液の水素イオン濃度をＰＨ ４以下にしておくと、アンモニア濃度に関係なく一定の紫外光領域の吸光度を示 す。 つまり、過酸化水素水の濃度は、水溶液の水素イオン濃度をＰＨ４以下にして おき、紫外光領域の吸光度を測定することにより求め、アンモニア水の濃度は、 酸を添加しないときと、酸を添加したときの紫外光領域の吸光度を測定すること により求める。[0004] This prior art is adapted to detect the concentration of aqueous hydrogen peroxide and the concentration of aqueous ammonia in the cleaning liquid by the following method when ammonia and hydrogen peroxide coexist in the aqueous solution. It is a thing. When the absorbance near 300 nm is measured to independently measure only the oxygen concentration due to hydrogen peroxide, the oxygen concentration of the aqueous solution is affected by the hydrogen ion concentration. On the other hand, if an excessive amount of acid is added to this aqueous solution and the hydrogen ion concentration of the aqueous solution is constantly kept at PH 4 or less, a constant absorbance in the ultraviolet region is exhibited regardless of the ammonia concentration. That is, the concentration of hydrogen peroxide water is determined by setting the hydrogen ion concentration of the aqueous solution to PH4 or less and measuring the absorbance in the ultraviolet region. The concentration of ammonia water is the same as when the acid is not added and when the acid is added. It is obtained by measuring the absorbance in the ultraviolet region at that time.
【０００５】[0005]
上記従来技術では、過酸化水素水の濃度は、水溶液の水素イオン濃度をＰＨ４ 以下にしておき、紫外光領域の吸光度を測定することにより求め、アンモニア水 の濃度は、酸を添加しないときと、酸を添加したときの紫外光領域の吸光度を測 定することにより求める手法であるため、以下のような不都合がある。 洗浄液採取管１０３の前段透過光測定部１０３ａと後段の透過光測定部１０３ ｂとに、それぞれ紫外光検出手段１１３Ａ・１１３Ｂを必要とし、しかも、洗浄 液２中の水素イオン濃度がＰＨ４以下になるように、塩酸ＱCを後段の透過光測 定部１０３ｂに供給する必要がある。このため、洗浄液採取管１０３や採取用ポ ンプ１０８Ａ・１０８Ｂ等の配管が複雑化するうえ、上記薬液供給量制御手段１ １０の演算も複雑化する。 本考案はこのような事情を考慮してなされたもので、上記洗浄液採取管や採取 用ポンプ等の配管を不要にし、かつ薬液供給量制御手段の演算を簡素化すること を技術課題とする。In the above-mentioned conventional technique, the concentration of hydrogen peroxide water is determined by setting the hydrogen ion concentration of the aqueous solution to PH4 or less and measuring the absorbance in the ultraviolet region. The concentration of ammonia water is the same as when the acid is not added. The method has the following disadvantages because it is a method of obtaining by measuring the absorbance in the ultraviolet region when an acid is added. Ultraviolet light detecting means 113A and 113B are required respectively for the front-stage transmitted light measuring unit 103a and the rear-stage transmitted light measuring unit 103b of the cleaning liquid sampling tube 103, and the hydrogen ion concentration in the cleaning liquid 2 becomes PH4 or less. as such, it is necessary to supply the hydrochloric Q C downstream of the transmitted light measurement tough 103b. Therefore, the cleaning liquid sampling pipe 103, the sampling pumps 108A and 108B, and other pipes are complicated, and the calculation of the chemical liquid supply control means 110 is also complicated. The present invention has been made in consideration of such circumstances, and an technical subject is to eliminate the need for piping such as the cleaning liquid sampling pipe and the sampling pump, and to simplify the calculation of the chemical liquid supply control means.
【０００６】[0006]
本考案者等は、水溶液中にアンモニアと過酸化水素とが共存する場合、又は水 溶液中に塩酸と過酸化水素とが共存する場合に、実験により赤外光で洗浄液中の アンモニア水の濃度又は塩酸の濃度を検出し得ることを知見して、上記課題を解 決するに至った。以下図２〜図８を参照しつつ、その基本原理について説明する。 The inventors of the present invention have conducted experiments to determine the concentration of ammonia water in the cleaning solution by infrared light when ammonia and hydrogen peroxide coexist in an aqueous solution or when hydrochloric acid and hydrogen peroxide coexist in an aqueous solution. Or, they have found that the concentration of hydrochloric acid can be detected, and have reached a solution to the above problems. The basic principle will be described below with reference to FIGS.
【０００７】 図２は、アンモニアと過酸化水素とが共存する洗浄液の分光透過率を示すグラ フであり、この洗浄液の構成比率は、アンモニア水：過酸化水素水：純水＝１： １：１である。この図からアンモニア過水中のアンモニア水による赤外光の吸収 は、２２００nmで顕著に見られることが分かる。 図３は、塩酸と過酸化水素とが共存する洗浄液の分光透過率を示すグラフであ り、この洗浄液の構成比率は、塩酸：過酸化水素水：純水＝１：１：１である。 この図から塩酸過水中の塩酸による赤外光の吸収は、１８２０nm付近と２１００ 〜２３００nmで顕著に見られることが分かる。FIG. 2 is a graph showing the spectral transmittance of a cleaning liquid in which ammonia and hydrogen peroxide coexist, and the composition ratio of this cleaning liquid is ammonia water: hydrogen peroxide water: pure water = 1: 1: 1: It is 1. From this figure, it can be seen that the absorption of infrared light by the ammonia water in the ammonia-hydrogen peroxide mixture is noticeable at 2200 nm. FIG. 3 is a graph showing the spectral transmittance of a cleaning solution in which hydrochloric acid and hydrogen peroxide coexist, and the composition ratio of this cleaning solution is hydrochloric acid: hydrogen peroxide solution: pure water = 1: 1: 1. From this figure, it can be seen that the absorption of infrared light by hydrochloric acid in hydrochloric acid-hydrogen peroxide mixture is noticeable at around 1820 nm and at 2100 to 2300 nm.
【０００８】 図４及び図５はアンモニアと過酸化水素とが共存する洗浄液のアンモニア水の 濃度と吸光度との関係を示すグラフであり、これらの図からアンモニア過水中の アンモニア濃度と赤外光の吸光度はリニアな関係があり、赤外光により濃度検出 が可能であることを示している。 なお、図４の洗浄液の構成比率は、アンモニア水：過酸化水素水：純水（変数 ）＝１：１：χであり、赤外光の波長は２２００nmである。また図５の洗浄液の 構成比率は、アンモニア水(変数)：過酸化水素水：純水＝χ：１：５０であり、 赤外光の波長は２２１０nmである。FIG. 4 and FIG. 5 are graphs showing the relationship between the concentration of ammonia water and the absorbance of the cleaning liquid in which ammonia and hydrogen peroxide coexist. The absorbance has a linear relationship, indicating that the concentration can be detected by infrared light. The composition ratio of the cleaning liquid in FIG. 4 is ammonia water: hydrogen peroxide water: pure water (variable) = 1: 1: χ, and the wavelength of infrared light is 2200 nm. The composition ratio of the cleaning liquid in FIG. 5 is ammonia water (variable): hydrogen peroxide water: pure water = χ: 1: 50, and the wavelength of infrared light is 2210 nm.
【０００９】 図６及び図７は塩酸と過酸化水素とが共存する洗浄液の塩酸の濃度と吸光度と の関係を示すグラフであり、これらの図から塩酸過水中の塩酸濃度と赤外光の吸 光度はリニアな関係があり、赤外光により濃度検出が可能であることを示してい る。 なお、図６の洗浄液の構成比率は、塩酸：過酸化水素水：純水(変数)＝１：１ ：χであり、赤外光の波長は１８２０nm及び２１８０nmである。また図７の洗浄 液の構成比率は、塩酸(変数)：過酸化水素水：純水＝χ：１：５０であり、赤外 光の波長は１８１０nm及び２２１０nmである。FIG. 6 and FIG. 7 are graphs showing the relationship between the concentration of hydrochloric acid and the absorbance of the cleaning solution in which hydrochloric acid and hydrogen peroxide coexist, and from these figures, the concentration of hydrochloric acid in hydrochloric acid-hydrogen peroxide and the absorption of infrared light are shown. The luminosity has a linear relationship, indicating that concentration can be detected by infrared light. The composition ratio of the cleaning liquid in FIG. 6 is hydrochloric acid: hydrogen peroxide solution: pure water (variable) = 1: 1: χ, and the wavelengths of infrared light are 1820 nm and 2180 nm. The composition ratio of the cleaning liquid in FIG. 7 is hydrochloric acid (variable): hydrogen peroxide water: pure water = χ: 1: 50, and the wavelengths of infrared light are 1810 nm and 2210 nm.
【００１０】 図８はアンモニア水と過酸化水素とが共存する洗浄液の過酸化水素水の濃度と 吸光度との関係を示すグラフであり、これらの図からアンモニア過水中の過酸化 水素の濃度と紫外光の吸光度はリニアな関係があり、周知のように紫外光により 過酸化水素の濃度検出が可能であることを示している。 なお、この洗浄液の構成比率は、アンモニア水：過酸化水素水(変数)：純水＝ １：χ：５０であり、紫外光の波長は３００nm及び３１０nmである。FIG. 8 is a graph showing the relationship between the concentration of hydrogen peroxide solution and the absorbance of a cleaning solution in which ammonia water and hydrogen peroxide coexist, and from these figures, the concentration of hydrogen peroxide in ammonia peroxide water and the ultraviolet light are shown. The light absorbance has a linear relationship, and it is known that the concentration of hydrogen peroxide can be detected by ultraviolet light as is well known. The composition ratio of this cleaning solution is ammonia water: hydrogen peroxide solution (variable): pure water = 1: χ: 50, and the wavelengths of ultraviolet light are 300 nm and 310 nm.
【００１１】 図９は塩酸と過酸化水素とが共存する洗浄液の過酸化水素水の濃度と吸光度と の関係を示すグラフであり、これらの図から塩酸過水中の過酸化水素の濃度と紫 外光の吸光度はリニアな関係があり、上記と同様、紫外光により過酸化水素の濃 度検出が可能であることを示している。 なお、この洗浄液の構成比率は、塩酸：過酸化水素水(変数)：純水＝１：χ： ５０であり、紫外光の波長は３００nm及び３１０nmである。FIG. 9 is a graph showing the relationship between the concentration of hydrogen peroxide solution and the absorbance of a cleaning solution in which hydrochloric acid and hydrogen peroxide coexist. The absorbance of light has a linear relationship, and it is shown that the concentration of hydrogen peroxide can be detected by ultraviolet light as in the above. The composition ratio of this cleaning solution was hydrochloric acid: hydrogen peroxide solution (variable): pure water = 1: χ: 50, and the wavelengths of ultraviolet light were 300 nm and 310 nm.
【００１２】 以上のことから、水溶液中にアンモニアと過酸化水素とが共存する洗浄液の場 合、又は水溶液中に塩酸と過酸化水素とが共存する洗浄液の場合に、紫外光で洗 浄液中の過酸化水素水の濃度を検出するとともに、赤外光で洗浄液中のアンモニ ア水の濃度又は塩酸の濃度を検出することができる。From the above, in the case of a cleaning solution in which ammonia and hydrogen peroxide coexist in the aqueous solution, or in the case of a cleaning solution in which hydrochloric acid and hydrogen peroxide coexist in the aqueous solution, the cleaning solution in ultraviolet light is used. It is possible to detect the concentration of hydrogen peroxide water of the above and the concentration of ammonia water or hydrochloric acid in the cleaning liquid by infrared light.
【００１３】[0013]
本考案は上記知見に基づいてなされたもので、前記課題を解決するものとして 、以下のように構成される。 即ち、洗浄液中に基板を浸漬してその表面を洗浄する洗浄槽と、純水の主要通 路をなし、その通路内で純水と複数種の薬液とを調合して複数種の洗浄液を洗浄 槽内へ供給する洗浄液供給管と、各薬液供給管及び各薬液導入手段を介して洗浄 液供給管に連通された複数種の薬液貯溜容器と、各薬液導入手段を制御する薬液 供給量制御手段とを具備して成り、 上記複数種の薬液貯溜容器は、過酸化水素水を貯溜した容器と、少なくともア ンモニア水を貯溜した容器又は塩酸を貯溜した容器とから成り、 上記洗浄液供給管には純水を流通させ、この純水に上記過酸化水素水及びアン モニア水を供給してアンモニア過水洗浄液を調合し、又は上記純水に上記過酸化 水素水及び塩酸を供給して塩酸過水洗浄液を調合するように構成し、 上記薬液供給量制御手段は、洗浄液供給管に付設された透過光測定手段を備え 、前記透過光測定手段によって紫外光の吸光度を測定して前記複数種の洗浄液中 の過酸化水素水の濃度を検出するとともに、赤外光の吸光度を測定して前記複数 種の洗浄液中のアンモニア水の濃度又は塩酸の濃度を検出するように構成したこ とを特徴とするものである。 The present invention has been made based on the above findings, and is configured as follows to solve the above problems. That is, a cleaning tank for immersing a substrate in a cleaning liquid to clean its surface and a main passage for pure water are formed, and pure water and a plurality of types of chemical liquids are mixed in the passage to wash a plurality of types of cleaning liquid. A cleaning liquid supply pipe for supplying into the tank, a plurality of types of chemical liquid storage containers connected to the cleaning liquid supply pipe via each chemical liquid supply pipe and each chemical liquid introduction means, and a chemical liquid supply amount control means for controlling each chemical liquid introduction means And a container for storing hydrogen peroxide water, and a container for storing at least ammonia water or a container for storing hydrochloric acid, wherein the cleaning liquid supply pipe is Pure water is circulated, and the hydrogen peroxide solution and ammonia water are supplied to the pure water to prepare an ammonia / hydrogen peroxide cleaning solution, or the pure hydrogen peroxide water and the hydrochloric acid are supplied to the pure water to supply the hydrochloric acid / hydrogen peroxide solution. It is configured to prepare a cleaning solution, and The supply control means includes a transmitted light measuring means attached to the cleaning liquid supply pipe, and the absorbance of the ultraviolet light is measured by the transmitted light measuring means to detect the concentration of the hydrogen peroxide solution in the plurality of kinds of cleaning liquids. In addition, it is characterized in that the absorbance of infrared light is measured to detect the concentration of aqueous ammonia or the concentration of hydrochloric acid in the plurality of types of cleaning solutions.
【００１４】[0014]
本考案では、洗浄液供給管内で純水と過酸化水素水及びアンモニア水を調合し てアンモニア過水洗浄液を作り、又は上記純水と上記過酸化水素水及び塩酸を調 合して塩酸過水洗浄液を作る。この洗浄液を洗浄槽内へ供給する途中で、上記透 過光測定手段により紫外光の吸光度を測定して上記洗浄液中の過酸化水素水の濃 度を独立に検出し、一方赤外光の吸光度を測定して洗浄液中のアンモニア水の濃 度又は塩酸の濃度を独立に検出する。この検出結果に基づき、薬液供給量制御手 段で各薬液導入手段を個別に制御する。これにより、従来例のような洗浄液採取 管や採取用ポンプ等の配管を不要にし、かつ従来例のような複雑な演算を簡素化 することができる。 In the present invention, pure water, hydrogen peroxide solution, and ammonia water are mixed in the cleaning solution supply pipe to form an ammonia perhydrogen cleaning solution, or the pure water is mixed with the hydrogen peroxide solution and hydrochloric acid to prepare a hydrochloric acid perhydrogen cleaning solution. make. While supplying this cleaning solution into the cleaning tank, the absorbance of ultraviolet light is measured by the above-mentioned transmitted light measuring means to independently detect the concentration of hydrogen peroxide solution in the cleaning solution, while the absorbance of infrared light is measured. Is measured to independently detect the concentration of aqueous ammonia or the concentration of hydrochloric acid in the cleaning solution. Based on the detection result, each chemical solution introduction means is individually controlled by the chemical solution supply amount control means. This eliminates the need for piping such as a cleaning liquid sampling pipe and a sampling pump as in the conventional example, and simplifies the complicated calculation as in the conventional example.
【００１５】[0015]
以下本考案の実施例を図面に基づいてさらに詳しく説明する。図１は本考案の 実施例に係る基板洗浄装置の概要図である。 この実施例は、洗浄液２中に基板Ｗを浸漬してその表面を洗浄する洗浄槽１と 、純水ＤWの主要通路をなし、その通路内で純水ＤWと複数種の薬液ＱA〜ＱCとを 調合して複数種の洗浄液２を洗浄槽１内へ供給する洗浄液供給管３と、各薬液供 給管６A〜６C及び各薬液導入手段７A〜７Cを介して洗浄液供給管３に連通された 複数種の薬液貯溜容器５A〜５Cと、各薬液導入手段７A〜７Cを制御する薬液供給 量制御手段１０とを具備して成る。Hereinafter, embodiments of the present invention will be described in more detail with reference to the drawings. FIG. 1 is a schematic diagram of a substrate cleaning apparatus according to an embodiment of the present invention. This embodiment includes a cleaning tank 1 for cleaning the surface by immersing the substrate W in the cleaning liquid 2, pure water D W without major passages of pure water D W and a plurality of kinds of chemical Q A in the passage formulated a to Q C as a cleaning solution supply pipe 3 for supplying a plurality of types of the cleaning liquid 2 into the cleaning tank 1 via the respective chemical liquid supply pipe 6 a to 6 C, and the chemical introducing means 7 a to 7-C formed by including a plurality of kinds of liquid medicine reservoir container 5 a to 5 C communicating with the cleaning liquid supply pipe 3, and a chemical liquid supply amount control means 10 for controlling the respective chemical introducing means 7 a to 7-C.
【００１６】 上記洗浄槽１は石英ガラスで形成され、その下部に純水供給管３を接続して成 る。そして槽内は整流多孔板１ａで上下に仕切り、洗浄槽１の上部側壁を外側へ 向けて広がり形状をなすように形成して渦流の発生を防止し、かつ整流多孔板１ ａで処理液２を均一に上昇させてオーバーフローさせ、その上昇流でキャリア１ ７に収容した基板Ｗの表面を洗浄し、槽内の洗浄液２を迅速に交換し得るように 構成されている。なお、上記洗浄槽１は排液槽２０内に設けられ、オーバーフロ ーした洗浄液２は排液管２１を介して排液ドレン２２へ流下するように構成され ている。The cleaning tank 1 is made of quartz glass, and a pure water supply pipe 3 is connected to the lower part thereof. The inside of the tank is partitioned by a rectifying perforated plate 1a into upper and lower parts, and the upper side wall of the cleaning tub 1 is formed so as to spread outward so as to prevent the generation of a vortex flow. Is uniformly raised to overflow, and the surface of the substrate W accommodated in the carrier 17 is cleaned by the rising flow, so that the cleaning liquid 2 in the bath can be quickly replaced. The cleaning tank 1 is provided in the drainage tank 20, and the overflowed cleaning liquid 2 is configured to flow down to the drainage drain 22 through the drainage pipe 21.
【００１７】 洗浄液給液管３には、上流側に向けて順次ラインミキサー４と複数の薬液導入 弁９が付設され、純水ＤＷを供給する純水の主要通路として構成され、かつ純水 ＤWと各薬液ＱA〜ＱCとを調合して洗浄槽１に供給するように構成されている。 上記ラインミキサー４は、純水ＤＷと薬液ＱＡ〜ＱCとを均一に混合するため のもので、このラインミキサー４に代えて他の混合器を用いても良く、管路が十 分に長ければかかる混合器を省くことも出来る。The cleaning liquid supply pipe 3 is provided with a line mixer 4 and a plurality of chemical liquid introducing valves 9 sequentially toward the upstream side, and is configured as a main passage of pure water for supplying pure water D W , and D W and the each drug solution Q a to Q C is configured to supply the cleaning tank 1 formulated. The line mixer 4 is for uniformly mixing the pure water D W and the chemical Q A to Q C, may be used other mixer instead of the line mixer 4, the conduit is sufficient If it is long, you can omit the mixer.
【００１８】 各薬液導入手段７A〜７Cは、薬液ＱＡ〜ＱCを洗浄液給液管３へ圧送する圧送 ポンプ８と、各薬液給液管６Ａ〜６Cを開閉する薬液導入弁９とから成り、薬液 供給量制御手段１０により、圧送ポンプ８及び薬液導入弁９を選択的に開閉制御 して、所定の薬液ＱＡ〜ＱCを洗浄液給液管３へ圧送するように構成されている。 なお、各薬液導入手段７A〜７Cは、圧送ポンプ８と薬液導入弁９の少なくとも 一方のみで構成することもできる。 ここで、薬液貯溜容器６Ａ〜６C内の薬液は、ＱＡ＝ＮＨ4ＯＨ、ＱB＝Ｈ2Ｏ2 、ＱC＝Ｈｃｌである。[0018] Each chemical introducing means 7 A to 7-C is chemical Q A to Q C and a pressure pump 8 for pumping the washing liquid and liquid feed line 3, the chemical liquid feed line 6 A chemical introducing valve for opening and closing the to 6 C consists 9 Prefecture, the chemical liquid supply amount control means 10, selectively controls the opening and closing of the pressure pump 8 and chemical introducing valve 9, constituting a predetermined chemical liquid Q a to Q C to pump the cleaning liquid and liquid feed line 3 Has been done. It should be noted that each of the chemical liquid introducing means 7 A to 7 C may be configured by at least one of the pressure pump 8 and the chemical liquid introducing valve 9. Here, chemical drug solution reservoir container 6 A in to 6 C is Q A = NH 4 OH, Q B = H 2 O 2, Q C = Hcl.
【００１９】 薬液供給量制御手段１０は、例えば図１に示すように、複数種の洗浄処理毎の 薬液供給量を設定入力する設定入力部１１と、洗浄液供給管３の透過光測定部３ ａに付設された紫外光検出部１３及び赤外光検出部１４とから構成される透過光 測定手段１００と、紫外光検出部１３及び赤外光検出部１４からの吸光度信号を 受けて薬液濃度を演算し、各圧送ポンプ８及び各薬液導入弁９に向けて制御信号 ＩＡ〜ＩCを出力する制御部１２とから成る。As shown in FIG. 1, for example, the chemical liquid supply amount control means 10 includes a setting input unit 11 for setting and inputting the chemical liquid supply amount for each of a plurality of types of cleaning processes, and a transmitted light measuring unit 3 a of the cleaning liquid supply pipe 3. The transmitted light measuring means 100 composed of an ultraviolet light detecting section 13 and an infrared light detecting section 14 attached to the device and an absorbance signal from the ultraviolet light detecting section 13 and the infrared light detecting section 14 are received to determine the chemical concentration. The control unit 12 calculates and outputs the control signals I A to I C to the pressure pumps 8 and the chemical liquid introducing valves 9.
【００２０】 ちなみに、本実施例では次のような洗浄プログラムを実行することができる。 ステップ１：純水＋ＱＡ＋ＱB ステップ２：純水 ステップ３：純水＋ＱＢ＋ＱC ステップ４：純水（終了）Incidentally, the following cleaning program can be executed in this embodiment. Step 1: pure water + Q A + Q B Step 2: pure water Step 3: purified water + Q B + Q C Step 4: pure water (End)
【００２１】 上記紫外光検出部１３は、紫外光を多く発光する光源１３ａと、紫外光のうち ３００nm近傍の光を感度領域とする受光素子１３ｂとを備え、また赤外光検出部 １４は、赤外光を多く発光する光源１４ａと、赤外光のうち２２００nm近傍の光 を感度領域とする受光素子１４ｂとを備える。 この紫外光検出部１３は、上記洗浄液供給管３の透過光測定部３ａ内を流れる 複数種の洗浄液２中の過酸化水素水の吸光度を検出し、赤外光検出部１４は、上 記洗浄液供給管３の透過光測定部３ａ内を流れる複数種の洗浄液２中のアンモニ ア水及び塩酸の吸光度を検出する。The ultraviolet light detection unit 13 includes a light source 13 a that emits a large amount of ultraviolet light, and a light receiving element 13 b that uses light near 300 nm of ultraviolet light as a sensitivity region, and the infrared light detection unit 14 includes A light source 14a that emits a large amount of infrared light and a light receiving element 14b that uses light near 2200 nm of infrared light as a sensitivity region are provided. The ultraviolet light detection unit 13 detects the absorbance of the hydrogen peroxide solution in the plurality of types of cleaning liquid 2 flowing in the transmitted light measuring unit 3a of the cleaning liquid supply pipe 3, and the infrared light detection unit 14 detects the cleaning liquid described above. The absorbance of ammonia water and hydrochloric acid in the plurality of types of cleaning liquids 2 flowing in the transmitted light measuring unit 3a of the supply pipe 3 is detected.
【００２２】 上記制御部１２は、紫外光検出部１３及び赤外光検出部１４で検出した吸光度 に対応する各薬液濃度を演算し、あらかじめ入力された洗浄処理プログラム及び 設定入力された薬液濃度とを対比して過不足無く薬液を供給するため、各圧送ポ ンプ８及び各薬液導入弁９を駆動制御するように構成されている。The control unit 12 calculates the concentration of each chemical solution corresponding to the absorbance detected by the ultraviolet light detection unit 13 and the infrared light detection unit 14, and calculates the cleaning process program input in advance and the chemical concentration input by setting. In contrast to this, in order to supply the chemical liquid without excess or deficiency, each pumping pump 8 and each chemical liquid introduction valve 9 are driven and controlled.
【００２３】 なお、上記実施例では洗浄槽１の下部に洗浄液供給管３を接続したものについ て例示したが、これに限らず洗浄槽１の上部の一側より洗浄液を供給して、他側 よりオーバーフローさせるようにしても良い。 また上記実施例では、透過光測定手段１００が、紫外光用の光源１３ａ及び受 光素子１３ｂから成る紫外光検出部１３と、赤外光用の光源１４ａ及び受光素子 １４ｂから成る赤外光検出部１４とにより構成されているものとして説明したが 、これには限らない。In the above embodiment, the cleaning liquid supply pipe 3 is connected to the lower part of the cleaning tank 1, but the invention is not limited to this, and the cleaning liquid is supplied from one side of the upper part of the cleaning tank 1 to the other side. You may make it overflow more. Further, in the above-described embodiment, the transmitted light measuring means 100 includes the ultraviolet light detection unit 13 including the ultraviolet light source 13a and the light receiving element 13b, and the infrared light detection including the infrared light source 14a and the light receiving element 14b. Although it has been described as being configured by the unit 14 and the unit 14, it is not limited to this.
【００２４】 例えば紫外光及び赤外光の両方の発光領域を有する光源であれば、単一の光源 を用いることもできる。 また、洗浄液中の過酸化水素水の濃度を測定するタイミングとアンモニア水又 は塩酸の濃度を測定するタイミングとを、あらかじめ測定プログラム等で峻別す ることにより、紫外光と赤外光との双方の感度領域を有する単一の受光素子を用 いて紫外光の吸光度と赤外光の吸光度とを独立に検出することもできる。For example, a single light source can be used as long as it is a light source having both ultraviolet light and infrared light emitting regions. In addition, the timing for measuring the concentration of hydrogen peroxide solution in the cleaning liquid and the timing for measuring the concentration of ammonia water or hydrochloric acid are distinguished in advance by a measurement program, etc., so that both ultraviolet light and infrared light can be detected. It is also possible to detect the absorbance of ultraviolet light and the absorbance of infrared light independently by using a single light receiving element having the sensitivity region of.
【００２５】[0025]
以上の説明で明らかなように、本考案では洗浄液供給管内で調合した洗浄液を 洗浄槽内へ供給する途中で、透過光測定手段により紫外光の吸光度を測定して上 記洗浄液中の過酸化水素水の濃度を独立に検出し、一方赤外光の吸光度を測定し て洗浄液中のアンモニア水の濃度又は塩酸の濃度を独立に検出し、この検出結果 に基づき、薬液供給量制御手段で各薬液導入手段を個別に制御するように構成し たので、従来例のような洗浄液採取管や採取用ポンプ等の配管を不要にし、かつ 従来例のような複雑な演算を簡素化することができる。 As is clear from the above description, in the present invention, while the cleaning liquid prepared in the cleaning liquid supply pipe is being supplied into the cleaning tank, the absorbance of ultraviolet light is measured by the transmitted light measuring means to measure the hydrogen peroxide in the cleaning liquid. The concentration of water is detected independently, while the absorbance of infrared light is measured to independently detect the concentration of ammonia water or hydrochloric acid in the cleaning liquid.Based on this detection result, the chemical liquid supply controller controls each chemical liquid. Since the introduction means is configured to be individually controlled, it is possible to eliminate the need for piping such as the cleaning liquid sampling pipe and the sampling pump as in the conventional example, and to simplify the complicated calculation as in the conventional example.
【図１】本考案の実施例に係る基板洗浄装置の概要図で
ある。FIG. 1 is a schematic diagram of a substrate cleaning apparatus according to an embodiment of the present invention.
【図２】アンモニアと過酸化水素とが共存する洗浄液の
分光透過率を示すグラフである。FIG. 2 is a graph showing the spectral transmittance of a cleaning liquid in which ammonia and hydrogen peroxide coexist.
【図３】塩酸と過酸化水素とが共存する洗浄液の分光透
過率を示すグラフである。FIG. 3 is a graph showing the spectral transmittance of a cleaning liquid in which hydrochloric acid and hydrogen peroxide coexist.
【図４】アンモニアと過酸化水素とが共存する洗浄液の
アンモニア濃度と吸光度の関係を示すグラフ図である。FIG. 4 is a graph showing the relationship between the ammonia concentration and the absorbance of a cleaning liquid in which ammonia and hydrogen peroxide coexist.
【図５】アンモニアと過酸化水素とが共存する洗浄液の
アンモニア濃度と吸光度の関係を示すグラフである。FIG. 5 is a graph showing the relationship between the ammonia concentration and the absorbance of a cleaning liquid in which ammonia and hydrogen peroxide coexist.
【図６】塩酸と過酸化水素とが共存する洗浄液の塩酸濃
度と吸光度の関係を示すグラフである。FIG. 6 is a graph showing the relationship between the concentration of hydrochloric acid and the absorbance of a cleaning liquid in which hydrochloric acid and hydrogen peroxide coexist.
【図７】塩酸と過酸化水素とが共存する洗浄液の塩酸濃
度と吸光度の関係を示すグラフである。FIG. 7 is a graph showing the relationship between the concentration of hydrochloric acid and the absorbance of a cleaning liquid in which hydrochloric acid and hydrogen peroxide coexist.
【図８】アンモニアと過酸化水素とが共存する洗浄液の
過酸化水素水の濃度と吸光度の関係を示すグラフであ
る。FIG. 8 is a graph showing the relationship between the concentration of hydrogen peroxide solution and the absorbance of a cleaning liquid in which ammonia and hydrogen peroxide coexist.
【図９】塩酸と過酸化水素とが共存する洗浄液の過酸化
水素水の濃度と吸光度の関係を示すグラフである。FIG. 9 is a graph showing the relationship between the concentration of hydrogen peroxide solution and the absorbance of a cleaning solution in which hydrochloric acid and hydrogen peroxide coexist.
【図１０】従来例の基板洗浄装置の概要図である。FIG. 10 is a schematic diagram of a conventional substrate cleaning apparatus.
１…洗浄槽、 ２…洗浄液、３…洗
浄液給液管、 ３ａ…透過光測定部、５Ａ〜５
C…薬液貯溜容器、 ６Ａ〜６C…薬液供給管、７
Ａ〜７C…薬液導入手段、 １０…薬液供給量制御
手段、１００…透過光測定手段、 ＤW…純水、
ＱA…アンモニア水、 ＱB…過酸化水素
水、ＱC…塩酸、 Ｗ…基板。1 ... washing tank, 2 ... cleaning liquid, 3 ... washing solution and liquid feed line, 3a ... transmitted light measuring unit, 5 A to 5
C ... chemical reservoir container, 6 A to 6 C ... chemical supply pipe, 7
A to 7 C ... Medicinal solution introducing means, 10 ... Mechanical solution supply amount controlling means, 100 ... Transmitted light measuring means, D W ... Pure water,
Q A ... ammonia water, Q B ... hydrogen peroxide, Q C ... hydrochloric acid, W ... substrate.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ１１Ｄ 7:04 7:18） (72)考案者 藤川 和憲 滋賀県彦根市高宮町480番地の１ 大日本 スクリーン製造株式会社彦根地区事業所内 (72)考案者 荒木 浩之 滋賀県彦根市高宮町480番地の１ 大日本 スクリーン製造株式会社彦根地区事業所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Internal reference number FI technical display location C11D 7:04 7:18) (72) Inventor Kazunori Fujikawa 1 at 480 Takamiya-cho, Hikone City, Shiga Prefecture Dainippon Screen Mfg. Co., Ltd. Hikone District Office (72) Inventor Hiroyuki Araki 1 480 Takamiyacho, Hikone City, Shiga Prefecture Dainippon Screen Mfg. Co., Ltd. Hikone District Office
Claims (1)
浄する洗浄槽と、 純水の主要通路をなし、その通路内で純水と複数種の薬
液とを調合して複数種の洗浄液を洗浄槽内へ供給する洗
浄液供給管と、 各薬液供給管及び各薬液導入手段を介して洗浄液供給管
に連通された複数種の薬液貯溜容器と、 各薬液導入手段を制御する薬液供給量制御手段とを具備
して成り、 前記複数種の薬液貯溜容器は、過酸化水素水を貯溜した
容器と、少なくともアンモニア水を貯溜した容器又は塩
酸を貯溜した容器とから成り、 前記洗浄液供給管には純水を流通させ、この純水に前記
過酸化水素水及びアンモニア水を供給してアンモニア過
水洗浄液を調合し、又は前記純水に前記過酸化水素水及
び塩酸を供給して塩酸過水洗浄液を調合するように構成
し、 前記薬液供給量制御手段は、洗浄液供給管に付設された
透過光測定手段を備え、前記透過光測定手段によって紫
外光の吸光度を測定して前記複数種の洗浄液中の過酸化
水素水の濃度を検出するとともに、赤外光の吸光度を測
定して前記複数種の洗浄液中のアンモニア水の濃度又は
塩酸の濃度を検出するように構成したことを特徴とする
基板洗浄装置。1. A cleaning tank for immersing a substrate in a cleaning liquid to clean the surface thereof, and a main passage for pure water, in which pure water and a plurality of chemicals are mixed to prepare a plurality of cleaning liquids. For supplying cleaning liquid into the cleaning tank, a plurality of types of chemical liquid storage containers connected to the cleaning liquid supply pipe via the chemical liquid supply pipes and the chemical liquid introducing means, and the chemical liquid supply amount control for controlling the chemical liquid introducing means And a container for storing hydrogen peroxide water, and a container for storing at least ammonia water or a container for storing hydrochloric acid, wherein the cleaning liquid supply pipe is connected to the cleaning liquid supply pipe. Pure water is circulated, and the hydrogen peroxide solution and the ammonia water are supplied to the pure water to prepare an ammonia-hydrogen peroxide mixture cleaning solution, or the hydrogen peroxide solution and the hydrochloric acid are supplied to the pure water to generate a hydrochloric acid perhydrogen cleaning solution. And the drug The liquid supply amount control means includes a transmitted light measuring means attached to the cleaning liquid supply pipe, and the absorbance of the ultraviolet light is measured by the transmitted light measuring means to detect the concentration of the hydrogen peroxide solution in the plurality of kinds of cleaning liquids. In addition, the substrate cleaning apparatus is configured to measure the absorbance of infrared light to detect the concentration of aqueous ammonia or the concentration of hydrochloric acid in the plurality of types of cleaning liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10996391U JP2533460Y2 (en) | 1991-12-13 | 1991-12-13 | Substrate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10996391U JP2533460Y2 (en) | 1991-12-13 | 1991-12-13 | Substrate cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0553241U true JPH0553241U (en) | 1993-07-13 |
| JP2533460Y2 JP2533460Y2 (en) | 1997-04-23 |
Family
ID=14523589
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10996391U Expired - Lifetime JP2533460Y2 (en) | 1991-12-13 | 1991-12-13 | Substrate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2533460Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09283488A (en) * | 1996-04-12 | 1997-10-31 | Lg Semicon Co Ltd | Semiconductor wafer washing equipment |
| JP2010232520A (en) * | 2009-03-27 | 2010-10-14 | Dainippon Screen Mfg Co Ltd | Processing liquid feeder and method for feeding processing liquid |
| KR20160138145A (en) * | 2014-03-27 | 2016-12-02 | 가부시키가이샤 에바라 세이사꾸쇼 | Substrate processing apparatus and pipe cleaning method for substrate processing apparatus |
-
1991
- 1991-12-13 JP JP10996391U patent/JP2533460Y2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09283488A (en) * | 1996-04-12 | 1997-10-31 | Lg Semicon Co Ltd | Semiconductor wafer washing equipment |
| JP2010232520A (en) * | 2009-03-27 | 2010-10-14 | Dainippon Screen Mfg Co Ltd | Processing liquid feeder and method for feeding processing liquid |
| KR20160138145A (en) * | 2014-03-27 | 2016-12-02 | 가부시키가이샤 에바라 세이사꾸쇼 | Substrate processing apparatus and pipe cleaning method for substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2533460Y2 (en) | 1997-04-23 |
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