JPH0551460B2 - - Google Patents

Info

Publication number

JPH0551460B2

JPH0551460B2 JP1005183A JP1005183A JPH0551460B2 JP H0551460 B2 JPH0551460 B2 JP H0551460B2 JP 1005183 A JP1005183 A JP 1005183A JP 1005183 A JP1005183 A JP 1005183A JP H0551460 B2 JPH0551460 B2 JP H0551460B2

Authority

JP

Japan

Prior art keywords

layer

heat

ink

liquid

recording head

Prior art date

1983-01-25

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired - Lifetime

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• 239000010410 layer Substances 0.000 claims description 60
• 238000010438 heat treatment Methods 0.000 claims description 36
• 239000011241 protective layer Substances 0.000 claims description 9
• 229910052787 antimony Inorganic materials 0.000 claims description 3
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
• 229910052797 bismuth Inorganic materials 0.000 claims description 3
• 229910052793 cadmium Inorganic materials 0.000 claims description 3
• 229910052804 chromium Inorganic materials 0.000 claims description 3
• 229910052802 copper Inorganic materials 0.000 claims description 3
• 229910052733 gallium Inorganic materials 0.000 claims description 3
• 229910052737 gold Inorganic materials 0.000 claims description 3
• 229910052735 hafnium Inorganic materials 0.000 claims description 3
• 229910052742 iron Inorganic materials 0.000 claims description 3
• 229910052748 manganese Inorganic materials 0.000 claims description 3
• 229910052750 molybdenum Inorganic materials 0.000 claims description 3
• 229910052759 nickel Inorganic materials 0.000 claims description 3
• 229910052758 niobium Inorganic materials 0.000 claims description 3
• 229910052760 oxygen Inorganic materials 0.000 claims description 3
• 239000001301 oxygen Substances 0.000 claims description 3
• 229910052763 palladium Inorganic materials 0.000 claims description 3
• 229910052702 rhenium Inorganic materials 0.000 claims description 3
• 229910052707 ruthenium Inorganic materials 0.000 claims description 3
• 229910052715 tantalum Inorganic materials 0.000 claims description 3
• 229910052721 tungsten Inorganic materials 0.000 claims description 3
• 229910052720 vanadium Inorganic materials 0.000 claims description 3
• 229910052725 zinc Inorganic materials 0.000 claims description 3
• 229910052726 zirconium Inorganic materials 0.000 claims description 3
• 238000007641 inkjet printing Methods 0.000 claims 1
• 239000007788 liquid Substances 0.000 description 65
• 239000000758 substrate Substances 0.000 description 13
• -1 V 2 O 5 ) Chemical compound 0.000 description 8
• 230000005611 electricity Effects 0.000 description 6
• 239000000463 material Substances 0.000 description 6
• 238000004519 manufacturing process Methods 0.000 description 5
• 230000009471 action Effects 0.000 description 4
• 239000003086 colorant Substances 0.000 description 4
• 238000007599 discharging Methods 0.000 description 4
• 229910052751 metal Inorganic materials 0.000 description 4
• 239000002184 metal Substances 0.000 description 4
• 230000004044 response Effects 0.000 description 4
• 230000015572 biosynthetic process Effects 0.000 description 3
• 239000011651 chromium Substances 0.000 description 3
• 230000006870 function Effects 0.000 description 3
• 239000011521 glass Substances 0.000 description 3
• 229910004298 SiO 2 Inorganic materials 0.000 description 2
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
• 239000000654 additive Substances 0.000 description 2
• 230000000996 additive effect Effects 0.000 description 2
• PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
• 230000008901 benefit Effects 0.000 description 2
• 230000008859 change Effects 0.000 description 2
• 230000000052 comparative effect Effects 0.000 description 2
• 230000006378 damage Effects 0.000 description 2
• 230000007547 defect Effects 0.000 description 2
• 238000003487 electrochemical reaction Methods 0.000 description 2
• 238000005516 engineering process Methods 0.000 description 2
• 150000002739 metals Chemical class 0.000 description 2
• PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
• 230000035939 shock Effects 0.000 description 2
• 229910052710 silicon Inorganic materials 0.000 description 2
• 239000010703 silicon Substances 0.000 description 2
• 239000000126 substance Substances 0.000 description 2
• 229910018182 Al—Cu Inorganic materials 0.000 description 1
• LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
• WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
• XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
• 229910045601 alloy Inorganic materials 0.000 description 1
• 239000000956 alloy Substances 0.000 description 1
• 229910052782 aluminium Inorganic materials 0.000 description 1
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
• 230000001754 anti-pyretic effect Effects 0.000 description 1
• 229910000410 antimony oxide Inorganic materials 0.000 description 1
• 239000002221 antipyretic Substances 0.000 description 1
• 229910000416 bismuth oxide Inorganic materials 0.000 description 1
• 239000000919 ceramic Substances 0.000 description 1
• 238000006243 chemical reaction Methods 0.000 description 1
• 238000005229 chemical vapour deposition Methods 0.000 description 1
• VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
• 229910000423 chromium oxide Inorganic materials 0.000 description 1
• 239000011248 coating agent Substances 0.000 description 1
• 238000000576 coating method Methods 0.000 description 1
• 229910000428 cobalt oxide Inorganic materials 0.000 description 1
• IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
• 239000000470 constituent Substances 0.000 description 1
• 230000008602 contraction Effects 0.000 description 1
• 230000007797 corrosion Effects 0.000 description 1
• 238000005260 corrosion Methods 0.000 description 1
• 238000005520 cutting process Methods 0.000 description 1
• 230000007423 decrease Effects 0.000 description 1
• 230000006866 deterioration Effects 0.000 description 1
• TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 239000007772 electrode material Substances 0.000 description 1
• 238000005868 electrolysis reaction Methods 0.000 description 1
• 239000003792 electrolyte Substances 0.000 description 1
• 238000005566 electron beam evaporation Methods 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• 238000011156 evaluation Methods 0.000 description 1
• 238000005187 foaming Methods 0.000 description 1
• 229920006015 heat resistant resin Polymers 0.000 description 1
• 230000008595 infiltration Effects 0.000 description 1
• 238000001764 infiltration Methods 0.000 description 1
• 229910010272 inorganic material Inorganic materials 0.000 description 1
• 239000011147 inorganic material Substances 0.000 description 1
• 238000005304 joining Methods 0.000 description 1
• 229910001507 metal halide Inorganic materials 0.000 description 1
• 150000005309 metal halides Chemical class 0.000 description 1
• 238000002156 mixing Methods 0.000 description 1
• 229910001120 nichrome Inorganic materials 0.000 description 1
• 229910000480 nickel oxide Inorganic materials 0.000 description 1
• QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
• 230000003647 oxidation Effects 0.000 description 1
• 238000007254 oxidation reaction Methods 0.000 description 1
• VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
• GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
• BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
• RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
• 239000008188 pellet Substances 0.000 description 1
• 230000009993 protective function Effects 0.000 description 1
• 239000004065 semiconductor Substances 0.000 description 1
• 229910001415 sodium ion Inorganic materials 0.000 description 1
• 238000004544 sputter deposition Methods 0.000 description 1
• 230000006641 stabilisation Effects 0.000 description 1
• 238000011105 stabilization Methods 0.000 description 1
• 229910001936 tantalum oxide Inorganic materials 0.000 description 1
• 229910001930 tungsten oxide Inorganic materials 0.000 description 1
• 229910001935 vanadium oxide Inorganic materials 0.000 description 1
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
• 229910001928 zirconium oxide Inorganic materials 0.000 description 1