JPH055005A - Photopolymerization initiator and photopolymerizable composition containing the same - Google Patents

Photopolymerization initiator and photopolymerizable composition containing the same

Info

Publication number
JPH055005A
JPH055005A JP23960391A JP23960391A JPH055005A JP H055005 A JPH055005 A JP H055005A JP 23960391 A JP23960391 A JP 23960391A JP 23960391 A JP23960391 A JP 23960391A JP H055005 A JPH055005 A JP H055005A
Authority
JP
Japan
Prior art keywords
photopolymerization initiator
parts
photopolymerizable composition
acid
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23960391A
Other languages
Japanese (ja)
Other versions
JP2988756B2 (en
Inventor
Tsugio Yamaoka
亜夫 山岡
Kenichi Koseki
健一 小関
Mitsuharu Obara
光晴 小原
Ikuo Shimizu
幾夫 清水
Yukiyoshi Ito
幸良 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Priority to JP23960391A priority Critical patent/JP2988756B2/en
Publication of JPH055005A publication Critical patent/JPH055005A/en
Application granted granted Critical
Publication of JP2988756B2 publication Critical patent/JP2988756B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject composition, containing an unsaturated monomer, a binder and a photopolymerization initiator composed of a specific squarylium derivative and a free radical former, capable of performing scanning and memorizing at a high speed with visible laser and useful for dry film resists, etc. CONSTITUTION:The objective photopolymerizable composition is obtained by dissolving an addition polymerizable compound (e.g. pentaerythritol triacrylate) having at least one ethylenically unsaturated double bond, a binder (e.g. polymethacrylic acid polymer) and a photopolymerization initiator composed of a squarylium derivative expressed by the formula (R1 is lower alkyl; R2 is H, alkyl, aryl or aralkyl; X is halogen) and a free radical former [e.g. 2,4,6- tris(trichloromethyl)-s-triazine] in a solvent such as ethyl cellosolve. Furthermore, the aforementioned composition is applied onto a substrate and dried to form a film, which can be overcoated with an aqueous solution of PVA, etc., and irradiated with light at about 630nm wavelength to afford a cured film.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光重合開始剤およびこれ
を含有する光重合性組成物に関する。該光重合性組成物
は可視光、特に600〜700nmの波長領域に発振波長
を有するHe−Neレーザー、発光ダイオード、半導体レー
ザー等に対して高い感度を有することから可視レーザー
による、高速度走査記録が可能であり、レーザーダイレ
クト製版用PS版、ドライフィルムレジスト、デジタル
プルーフ、ホログラム等の材料として有用である。
FIELD OF THE INVENTION The present invention relates to a photopolymerization initiator and a photopolymerizable composition containing the same. Since the photopolymerizable composition has high sensitivity to visible light, particularly He-Ne laser having an oscillation wavelength in the wavelength range of 600 to 700 nm, light emitting diode, semiconductor laser, etc., high speed scanning recording by visible laser is performed. And is useful as a material for PS plates for laser direct plate making, dry film resists, digital proofs, holograms and the like.

【0002】[0002]

【従来の技術】スクアリリウム誘導体は、従来、電子写
真感光体の電荷発生剤(例えば、特開昭52−5564
3号公報、USP4353971、特開昭60−224
674号公報、同60−243653号公報)、電気泳
動法による湿式現像用色素(USP4175956)、集光用樹脂板
用色素(例えば特開昭63−235370号公報)、L
B(Langmuir-Brodget) 膜素材 (Nikkei New Material
s, 1987年10月26日号) 等として知られている。しか
し、スクアリリウム誘導体が光重合開始剤として用いら
れることは知られていない。
2. Description of the Related Art Squalylium derivatives have hitherto been used as charge generating agents for electrophotographic photoreceptors (for example, JP-A-52-5564).
No. 3, USP4353971, JP-A-60-224.
674, 60-243653), a dye for wet development by an electrophoretic method (USP4175956), a dye for a light-collecting resin plate (for example, JP-A-63-235370), L
B (Langmuir-Brodget) Membrane Material (Nikkei New Material)
s, October 26, 1987) etc. However, it is not known that the squarylium derivative is used as a photopolymerization initiator.

【0003】[0003]

【発明が解決しようとする課題】本発明は可視光、特に
600〜700nmの波長領域に発振波長を有する汎用性
の高い低出力のHe−Neレーザー、発光ダイオード、半導
体レーザー等に対して優れた感光性を有する光重合開始
剤およびこれを含有する光重合性組成物を提供すること
を目的とする。
INDUSTRIAL APPLICABILITY The present invention is excellent for visible light, particularly He-Ne lasers, light emitting diodes, semiconductor lasers, etc., which have a versatile low power and have an oscillation wavelength in the wavelength range of 600 to 700 nm. It is an object to provide a photopolymerization initiator having photosensitivity and a photopolymerizable composition containing the photopolymerization initiator.

【0004】[0004]

【課題を解決するための手段】本発明は式(I)The present invention provides a compound of formula (I)

【0005】[0005]

【化3】 [Chemical 3]

【0006】(式中、R1 は低級アルキルを表わし、R
2 は水素、アルキル、アリールまたはアラルキルを表わ
し、Xは水素またはハロゲンを表わす。)で表わされる
スクアリリウム誘導体とラジカル発生剤とからなる光重
合開始剤および該光重合開始剤、エチレン性不飽和二重
結合を少なくとも1個有する付加重合可能な化合物(以
下、エチレン性化合物と称す)およびバインダーを含有
する光重合性組成物に関する。
(In the formula, R 1 represents lower alkyl,
2 represents hydrogen, alkyl, aryl or aralkyl, and X represents hydrogen or halogen. ), A photopolymerization initiator comprising a squarylium derivative and a radical generator, the photopolymerization initiator, and an addition-polymerizable compound having at least one ethylenically unsaturated double bond (hereinafter referred to as an ethylenic compound) And a photopolymerizable composition containing a binder.

【0007】式(I)におけるR1 の低級アルキルとし
ては、炭素数1〜5の例えば、メチル、エチル、プロピ
ル、イソプロピル、ブチル、ペンチル等があげられ、R
2 の定義中、アルキルとしては炭素数1〜20の例え
ば、メチル、エチル、プロピル、イソプロピル、ブチ
ル、ペンチル、ヘキシル、オクチル、デシル、ドデシ
ル、ペンタデシル、オクタデシル、エイコシル等があげ
られ、アリールとしては、炭素数6〜10の例えば、フ
ェニル、ナフチル等があげられ、アラルキルとしては炭
素数7〜10の例えば、ベンジル、フェニルエチル、フ
ェニルプロピル等があげられる。Xの定義中、ハロゲン
としては、塩素、臭素、フッ素等があげられる。
Examples of the lower alkyl of R 1 in the formula (I) include C 1-5, for example, methyl, ethyl, propyl, isopropyl, butyl, pentyl and the like.
In the definition of 2 , alkyl has 1 to 20 carbon atoms, for example, methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, decyl, dodecyl, pentadecyl, octadecyl, eicosyl, and the like. Examples of the aralkyl include those having 6 to 10 carbon atoms such as phenyl and naphthyl, and examples of the aralkyl include those having 7 to 10 carbon atoms such as benzyl, phenylethyl and phenylpropyl. In the definition of X, examples of halogen include chlorine, bromine, fluorine and the like.

【0008】式(I)で表わされるスクアリリウム誘導
体の例としては第1表に示される化合物があげられる。
該化合物は公知化合物である(USP417595
6)。
Examples of the squarylium derivative represented by the formula (I) include the compounds shown in Table 1.
The compound is a known compound (USP 417595).
6).

【0009】[0009]

【表1】 [Table 1]

【0010】ラジカル発生剤としては、少なくとも1個
のトリハロメチル基で置換したs−トリアジン化合物類
〔2,4,6- トリス(トリクロロメチル)−s−トリアジ
ン、2−(4−メトキシフェニル)−4,6−ビス(トリ
クロロメチル)−s−トリアジン、2−(4−メトキシ
−1−ナフタレニル)−4,6−ビス(トリクロロメチ
ル)−s−トリアジン等〕、有機過酸化物類〔3,
3′,4,4′−テトラキス(t−ブチルジオキシカル
ボニル)ベンゾフェノン(以下、BTTBと称す)
等〕、N−フェニルグリシン類(N−フェニルグリシ
ン、p−クロロ−N−フェニルグリシン、m−メチル−
N−フェニルグリシン等)、芳香族スルホニルハライド
化合物類(ベンゼンスルホニルクロライド、p−トルエ
ンスルホニルクロライド等)、イミダゾール二量体類
〔2,2′−ビス(o−クロロフェニル)−4,4′,
5,5′−テトラフェニルビイミダゾール等〕、鉄アレ
ーン錯体類〔η6 −ベンゼン)(η5 −シクロペンタジ
エニル)鉄(II) のPF6 -塩等〕、チタノセン類(フ
ルオロアリールチタノセン等)、ジアリールヨードニウ
ム塩、トリアリールスルホニウム塩、分枝鎖状ポリエチ
レンイミン類等があげられる。本発明の光重合開始剤に
おけるラジカル発生剤の使用量はスクアリリウム誘導体
1重量部(以下、重量部を部と称す)に対して0.1〜1
00部、好ましくは1〜50部である。該光重合開始剤
は以下に説明する本発明の光重合性組成物の光重合開始
剤として用いられる。
As the radical generator, s-triazine compounds substituted with at least one trihalomethyl group [2,4,6-tris (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl)- 4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-1-naphthalenyl) -4,6-bis (trichloromethyl) -s-triazine, etc.], organic peroxides [3,
3 ', 4,4'-tetrakis (t-butyldioxycarbonyl) benzophenone (hereinafter referred to as BTTB)
Etc.], N-phenylglycines (N-phenylglycine, p-chloro-N-phenylglycine, m-methyl-
N-phenylglycine, etc.), aromatic sulfonyl halide compounds (benzenesulfonyl chloride, p-toluenesulfonyl chloride, etc.), imidazole dimers [2,2′-bis (o-chlorophenyl) -4,4 ′,
5,5'-tetraphenylbiimidazole and the like], iron arene complexes [eta 6 - benzene) (eta 5 - PF 6 cyclopentadienyl) iron (II) - salt, etc.], titanocene (fluoroaryl titanocene etc. ), Diaryl iodonium salts, triaryl sulfonium salts, branched polyethyleneimines and the like. The amount of the radical generator used in the photopolymerization initiator of the present invention is 0.1 to 1 part by weight of the squarylium derivative (hereinafter, parts by weight will be referred to as parts).
It is 00 parts, preferably 1 to 50 parts. The photopolymerization initiator is used as a photopolymerization initiator of the photopolymerizable composition of the present invention described below.

【0011】次に、本発明の光重合性組成物について説
明する。該光重合性組成物はエチレン性化合物、バイン
ダー、前記光重合開始剤、さらに必要に応じて通常の添
加剤(例えば、熱重合禁止剤、可塑剤等)を混合するこ
とによって調製される。光重合性組成物におけるエチレ
ン性化合物とは光重合性組成物が活性光線の照射を受け
た場合に光重合開始剤の光分解生成物の作用により付加
重合することにより硬化し、実質的に不溶化をもたらす
ようなエチレン性不飽和二重結合を有する単量体または
主鎖もしくは側鎖にエチレン性不飽和二重結合を有する
重合体である。
Next, the photopolymerizable composition of the present invention will be described. The photopolymerizable composition is prepared by mixing an ethylenic compound, a binder, the above-mentioned photopolymerization initiator, and, if necessary, a usual additive (for example, a thermal polymerization inhibitor, a plasticizer, etc.). The ethylenic compound in the photopolymerizable composition means that when the photopolymerizable composition is exposed to actinic rays, it is cured by addition polymerization due to the action of the photodecomposition product of the photopolymerization initiator, and is substantially insolubilized. Is a monomer having an ethylenically unsaturated double bond or a polymer having an ethylenically unsaturated double bond in the main chain or side chain.

【0012】エチレン性不飽和二重結合を有する単量体
としては、例えば、不飽和カルボン酸、不飽和カルボン
酸と脂肪族ポリヒドロキシ化合物とのエステル、不飽和
カルボン酸と芳香族ポリヒドロキシ化合物とのエステ
ル、不飽和カルボン酸と多価カルボン酸とポリヒドロキ
シ化合物とのエステル化反応により得られるエステル等
があげられる。
Examples of the monomer having an ethylenically unsaturated double bond include unsaturated carboxylic acids, esters of unsaturated carboxylic acids and aliphatic polyhydroxy compounds, unsaturated carboxylic acids and aromatic polyhydroxy compounds. And an ester obtained by an esterification reaction of an unsaturated carboxylic acid, a polycarboxylic acid and a polyhydroxy compound.

【0013】不飽和カルボン酸としては、例えば、アク
リル酸、メタクリル酸、イタコン酸、クロトン酸、マレ
イン酸等があげられる。不飽和カルボン酸と脂肪族ポリ
ヒドロキシ化合物とのエステルとしては、例えば、エチ
レングリコールジアクリレート、トリエチレングリコー
ルジアクリレート、トリメチロールプロパントリアクリ
レート、トリメチロールエタントリアククリレート、ペ
ンタエリスリトールジアクリレート、ペンタエリスリト
ールトリアクリレート、ペンタエリスリトールテトラア
クリレート、ジペンタエリスリトールテトラアクリレー
ト、ジペンタエリスリトールペンタアクリレート、ジペ
ンタエリスリトールヘキサアクリレート、グリセロール
アクリレート等のアクリル酸エステル;トリエチレング
リコールジメタクリレート、トリメチロールプロパント
リメタクリレート、トリメチロールエタントリメタクリ
レート、ペンタエリスリトールジメタクリレート、ペン
タエリスリトールトリメタクリレート、ペンタエリスリ
トールテトラメタクリレート、ジペンタエリスリトール
ジメタクリレート、ジペンタエリスリトールトリメタク
リレート、ジペンタエリスリトールテトラメタクリレー
ト等のメタクリル酸エステル;その他、脂肪族ポリヒド
ロキシ化合物のイタコン酸エステル、クロトン酸エステ
ル、マレイン酸エステル等があげられる。
Examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid and the like. Examples of the ester of an unsaturated carboxylic acid and an aliphatic polyhydroxy compound include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylol propane triacrylate, trimethylol ethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate. Acrylic esters such as acrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate; triethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate , Pentaerythritol dimethacrylate , Methacrylic acid esters such as pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol trimethacrylate, dipentaerythritol tetramethacrylate; itaconic acid esters of aliphatic polyhydroxy compounds, crotonic acid Examples thereof include esters and maleic acid esters.

【0014】不飽和カルボン酸と芳香族ポリヒドロキシ
化合物とのエステルとしては、例えば、ハイドロキノン
ジアクリレート、ハイドロキノンジメタクリレート、レ
ゾルシンジアクリレート、レゾルシンジメタクリレー
ト、ピロガロールトリアクリレート等があげられる。不
飽和カルボン酸と多価カルボン酸とポリヒドロキシ化合
物とのエステル化反応により得られるエステルとして
は、例えば、アクリル酸とフタル酸とエチレングリコー
ルとの縮合物;アクリル酸とマレイン酸とジエチレング
リコールとの縮合物;メタクリル酸とテレフタル酸とペ
ンタエリスリトールとの縮合物;アクリル酸とアジピン
酸とブタンジオールとグリセリンとの縮合物等があげら
れる。
Examples of the ester of unsaturated carboxylic acid and aromatic polyhydroxy compound include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. Examples of the ester obtained by the esterification reaction of an unsaturated carboxylic acid, a polyvalent carboxylic acid and a polyhydroxy compound include, for example, a condensate of acrylic acid, phthalic acid and ethylene glycol; a condensation of acrylic acid, maleic acid and diethylene glycol. Examples thereof include condensation products of methacrylic acid, terephthalic acid, and pentaerythritol; condensation products of acrylic acid, adipic acid, butanediol, and glycerin.

【0015】その他本発明に用いられるエチレン性不飽
和二重結合を有する化合物の例としては、エチレンビス
アクリルアミド等のアクリルアミド類、フタル酸ジアリ
ル等のアリルエステルおよびそのプレポリマー、ジビニ
ルフタレート等のビニル基含有化合物等があげられる。
主鎖にエチレン性不飽和二重結合を有する重合体として
は、例えば不飽和二価カルボン酸とジヒドロキシ化合物
との重縮合反応により得られるポリエステル、不飽和二
価カルボン酸とジアミンとの重縮合反応により得られる
ポリアミド等があげられる。
Other examples of the compound having an ethylenically unsaturated double bond used in the present invention include acrylamides such as ethylenebisacrylamide, allyl esters such as diallyl phthalate and prepolymers thereof, and vinyl groups such as divinylphthalate. Examples include contained compounds.
As the polymer having an ethylenically unsaturated double bond in the main chain, for example, polyester obtained by polycondensation reaction of unsaturated divalent carboxylic acid and dihydroxy compound, polycondensation reaction of unsaturated divalent carboxylic acid and diamine The polyamide and the like obtained by

【0016】側鎖にエチレン性不飽和二重結合を有する
重合体としては、例えば、側鎖に不飽和結合をもつ二価
カルボン酸、例えば、イタコン酸、プロピリデンコハク
酸、エチリデンマロン酸等とジヒドロキシまたはジアミ
ン化合物との縮合重合体等があげられる。また、側鎖に
ヒドロキシ基やハロゲン化メチル基の如き官能基をもつ
重合体、例えば、ポリビニルアルコール、ポリ(2−ヒ
ドロキシエチルメタクリレート)、エポキシ樹脂、フェ
ノキシ樹脂ポリエピクロルヒドリン等とアクリル酸、メ
タクリル酸、クロトン酸の様な不飽和カルボン酸との高
分子反応により得られるポリマーも使用できる。
Examples of the polymer having an ethylenically unsaturated double bond in the side chain include divalent carboxylic acids having an unsaturated bond in the side chain, such as itaconic acid, propylidene succinic acid and ethylidene malonic acid. Examples thereof include condensation polymers with dihydroxy or diamine compounds. Further, a polymer having a functional group such as a hydroxy group or a methyl halide group in its side chain, for example, polyvinyl alcohol, poly (2-hydroxyethyl methacrylate), an epoxy resin, a phenoxy resin, polyepichlorohydrin, etc., and acrylic acid, methacrylic acid, Polymers obtained by macromolecular reaction with unsaturated carboxylic acids such as crotonic acid can also be used.

【0017】バインダーとしては、例えば、ポリメタク
リル酸エステルまたはその部分加水分解物、ポリアクリ
ル酸エステルまたはその部分加水分解物、ポリスチレ
ン、ポリ酢酸ビニルまたはその部分加水分解物、ポリビ
ニルブチラール、ポリクロロプレン、ポリ塩化ビニル、
塩素化ポリエチレン、塩素化ポリプロピレン、ポリビニ
ルピロリドン、ポリエチレンオキサイド、ポリメタクリ
ル酸または側鎖にカルボキシル基を有するメタクリル酸
共重合体、ポリアクリル酸または側鎖にカルボキシル基
を有するアクリル酸共重合体、ポリウレタン、ポリアミ
ド、ポリカーボネート、アセチルセルロース、ポリビニ
ルカルバゾール、その他アクリル酸エステル、メタクリ
ル酸エステル、(無水)マレイン酸、アクリロニトリ
ル、スチレン、酢酸ビニル、塩化ビニル、塩化ビニリデ
ン、ブタジエン、イソプレン、クロロプレン等の共重合
体等があげられる。
As the binder, for example, polymethacrylic acid ester or a partial hydrolyzate thereof, polyacrylic acid ester or a partial hydrolyzate thereof, polystyrene, polyvinyl acetate or a partial hydrolyzate thereof, polyvinyl butyral, polychloroprene, poly Vinyl chloride,
Chlorinated polyethylene, chlorinated polypropylene, polyvinylpyrrolidone, polyethylene oxide, polymethacrylic acid or a methacrylic acid copolymer having a carboxyl group on the side chain, polyacrylic acid or an acrylic acid copolymer having a carboxyl group on the side chain, polyurethane, Polyamide, polycarbonate, acetyl cellulose, polyvinyl carbazole, other acrylic acid ester, methacrylic acid ester, (anhydrous) maleic acid, acrylonitrile, styrene, vinyl acetate, vinyl chloride, vinylidene chloride, butadiene, isoprene, chloroprene and other copolymers can give.

【0018】バインダーの使用量はエチレン性化合物1
00部に対して10〜1000部、好ましくは60〜2
00部である。光重合開始剤中のスクアリリウム誘導体
およびラジカル発生剤の使用量はエチレン性化合物10
0部に対してそれぞれ0.1〜30部、好ましくは0.5〜
5部および1〜50部、好ましくは2〜30部である。
The amount of binder used is ethylenic compound 1
10 to 1000 parts with respect to 00 parts, preferably 60 to 2 parts
It is 00 copies. The amount of the squarylium derivative and the radical generator used in the photopolymerization initiator is the ethylenic compound 10
0.1 to 30 parts, preferably 0.5 to 0 parts, respectively
5 parts and 1 to 50 parts, preferably 2 to 30 parts.

【0019】以下に実施例および比較例を示す。Examples and comparative examples will be shown below.

【0020】[0020]

【実施例】【Example】

実施例1〜7および比較例1〜2 ペンタエリスリトールトリアクリレート100部、ポリ
メタクリル酸エステルポリマー(平均分子量15万)1
00部並びに第2表に示したスクアリリウム誘導体およ
び/またはラジカル発生剤の所定量をエチルセロソルブ
900mlに溶解して感光性樹脂溶液を得た。この感光性
樹脂溶液を砂目立ておよび陽極酸化処理を施したアルミ
ニウム板に回転塗布器を用いて乾燥膜厚が2μmとなる
ように塗布し80℃で2分間乾燥した。この上にポリビ
ニルアルコール(クラレポバール706)の水溶液を乾
燥膜厚が1.0μmとなるように塗布しオーバーコート層
を設けた。得られた感光性試料に光学濃度段差0.15の
ステップタブレットを重ね、3kw超高圧水銀灯より熱線
吸収フィルターHA−30(HOYA製)、色ガラスフ
ィルターR−61および干渉フィルターKL−63(い
ずれも東芝ガラス社製)を通して得られる630nm前後
の波長の光(66μJ/cm2 S)を2分間照射した。つい
で、PS版現像液DN3C(富士写真フィルム社製)で
現象を行った後、PS版現像インキPI−2(富士写真
フィルム社製)によりインキを着け、インキの付着した
硬化段数から硬化に必要なエネルギー量を求め感度とし
た。その結果を第2表に示す。
Examples 1-7 and Comparative Examples 1-2 Pentaerythritol triacrylate 100 parts, polymethacrylic acid ester polymer (average molecular weight 150,000) 1
A photosensitive resin solution was obtained by dissolving 00 parts and a predetermined amount of the squarylium derivative and / or the radical generator shown in Table 2 in 900 ml of ethyl cellosolve. This photosensitive resin solution was applied to a grained and anodized aluminum plate using a rotary applicator so that the dry film thickness was 2 μm, and dried at 80 ° C. for 2 minutes. An aqueous solution of polyvinyl alcohol (Kuraray Poval 706) was applied onto this so that the dry film thickness would be 1.0 μm to form an overcoat layer. A step tablet with an optical density difference of 0.15 was placed on the obtained photosensitive sample, and a heat ray absorption filter HA-30 (manufactured by HOYA), a colored glass filter R-61, and an interference filter KL-63 from a 3 kw ultra-high pressure mercury lamp (all were used). Light (66 μJ / cm 2 S) having a wavelength of about 630 nm obtained through Toshiba Glass Co., Ltd. was irradiated for 2 minutes. Then, after performing the phenomenon with PS plate developer DN3C (manufactured by Fuji Photo Film Co., Ltd.), ink is applied with PS plate developing ink PI-2 (manufactured by Fuji Photo Film Co., Ltd.), and it is necessary for curing from the number of curing stages where the ink adheres The amount of energy was calculated as the sensitivity. The results are shown in Table 2.

【0021】[0021]

【表2】 [Table 2]

【0022】表から明らかな如く、スクアリリウム誘導
体とラジカル発生剤とからなる光重合開始剤では630
nm前後の波長の光に対して高い感度を示したが、スクア
リリウム誘導体またはラジカル発生剤のみでは同じ波長
の光に対して感度を示さなかった。
As is clear from the table, the photopolymerization initiator comprising the squarylium derivative and the radical generator is 630
It showed high sensitivity to light of wavelength around nm, but did not show sensitivity to light of the same wavelength only with squarylium derivative or radical generator.

【0023】実施例8 ペンタエリスリトールトリアクリレート100部、ポリ
ビニルピロリドン100部、化合物2 1.4部およびs
−Tri(1)14部をエチルセロソルブ900mlに溶
解して感光性樹脂溶液を得た。この感光性樹脂溶液を砂
目立ておよび陽極酸化処理を施したアルミニウム板に回
転塗布器を用いて乾燥膜厚が2μmとなるように塗布し
80℃で2分間乾燥した。
Example 8 100 parts of pentaerythritol triacrylate, 100 parts of polyvinylpyrrolidone, 1.4 parts of compound 2 and s
14 parts of -Tri (1) was dissolved in 900 ml of ethyl cellosolve to obtain a photosensitive resin solution. This photosensitive resin solution was applied to a grained and anodized aluminum plate using a rotary applicator so that the dry film thickness was 2 μm, and dried at 80 ° C. for 2 minutes.

【0024】得られた感光性試料に光学濃度段差0.15
のステップタブレットを重ね、3kw超高圧水銀灯より熱
線吸収フィルターHA−30(HOYA製)、色ガラス
フィルターR−61および干渉フィルターKL−63
(いずれも東芝ガラス社製)を通して得られる630nm
前後の波長の光(66μJ/cm2 S)を真空下で2分間照
射した。アルコールで現像を行った後、メチルブルー水
溶液より染色し、染色した硬化段数から硬化に必要なエ
ネルギー量を求めたところ、0.06mJ/cm2 と非常に
高い感度を示した。
The resulting photosensitive sample had an optical density difference of 0.15.
Step tablet is piled up and heat ray absorption filter HA-30 (made by HOYA), colored glass filter R-61 and interference filter KL-63 from a 3kw ultra-high pressure mercury lamp.
630nm obtained through (all manufactured by Toshiba Glass Co., Ltd.)
Irradiation with light having a wavelength of before and after (66 μJ / cm 2 S) was performed for 2 minutes under vacuum. After development with alcohol, dyeing was carried out from an aqueous solution of methyl blue, and the amount of energy required for curing was determined from the number of dyed curing stages. As a result, a very high sensitivity of 0.06 mJ / cm 2 was exhibited.

【0025】実施例9 実施例1において、化合物1 0.6部およびs−Tri
(1)3.7部の代わりに化合物1 1.6部およびBTT
B 8.7部を用いる以外は実施例1と同様に行ったところ
感度は0.07mJ/cm2 であった。
Example 9 In Example 1, 0.6 part of Compound 1 and s-Tri were used.
(1) 1.6 parts of compound 1 and BTT instead of 3.7 parts
When the same procedure as in Example 1 was carried out except that 8.7 parts of B was used, the sensitivity was 0.07 mJ / cm 2 .

【0026】実施例10 ペンタエリスリトールトリアクリレート100部、ポリ
メタクリル酸エステルポリマー100部、化合物1 1.
9およびs−Tri(1)7.4部をエチルセロソルブ9
00mlに溶解して、感光性樹脂溶液を得た。この感光性
樹脂溶液を砂目立ておよび陽極酸化処理を施したアルミ
ニウム板に回転塗布器を用いて乾燥膜厚が2.0μmとな
るように塗布し80℃で2分間乾燥した。更に、この上
にポリビニルアルコール(クラレポバール706)の水
溶液を乾燥膜厚が1.0μmとなるように塗布しオーバー
コート層を設けた。得られた感光性試料にHe−Neレ
ーザーを用い波長633nm、ビーム径0.8mmのレーザー
光を照射し、ビーム径と同一の硬化径を得るのに必要と
される照射エネルギーを感度とした。この結果、0.5m
J/cm2 の感度を得た。
Example 10 100 parts of pentaerythritol triacrylate, 100 parts of polymethacrylic acid ester polymer, compound 1 1.
9 and s-Tri (1) 7.4 parts with ethyl cellosolve 9
It was dissolved in 00 ml to obtain a photosensitive resin solution. This photosensitive resin solution was applied to a grained and anodized aluminum plate using a spin coater to a dry film thickness of 2.0 μm and dried at 80 ° C. for 2 minutes. Further, an aqueous solution of polyvinyl alcohol (Kuraray Poval 706) was applied on this so as to have a dry film thickness of 1.0 μm to form an overcoat layer. The obtained photosensitive sample was irradiated with a laser beam having a wavelength of 633 nm and a beam diameter of 0.8 mm using a He-Ne laser, and the irradiation energy required to obtain a cured diameter the same as the beam diameter was taken as the sensitivity. As a result, 0.5m
A sensitivity of J / cm 2 was obtained.

【0027】実施例11〜14 実施例1において、化合物1 0.6部およびs−Tri
(1)3.7部の代わりに、第3表に示すスクアリリウム
誘導体およびラジカル発生剤を用いる以外は実施例1と
同様に行って第3表に示す感度を得た。
Examples 11-14 In Example 1, 0.6 part of Compound 1 and s-Tri
(1) The sensitivity shown in Table 3 was obtained in the same manner as in Example 1 except that the squarylium derivative and the radical generator shown in Table 3 were used instead of 3.7 parts.

【0028】[0028]

【表3】 [Table 3]

【0029】実施例15 実施例7において、化合物2 1.8部およびs−Tri
(1)8.8部の代わりに化合物2 1.4部およびBTT
B8部を用いる以外は実施例7と同様に行い感度0.29
mJ/cm2 を得た。
Example 15 In Example 7, 1.8 parts of compound 2 and s-Tri
(1) 1.4 parts of compound 2 and BTT instead of 8.8 parts
Same as Example 7 except that B8 part is used, and sensitivity is 0.29.
mJ / cm 2 was obtained.

【0030】実施例16 実施例15において、化合物2 1.4部の代わりに化合
物5 1.4部を用いる以外は実施例15と同様に行い感
度0.78mJ/cm2 を得た。
Example 16 A sensitivity of 0.78 mJ / cm 2 was obtained in the same manner as in Example 15 except that 1.4 parts of compound 5 was used instead of 1.4 parts of compound 2 in Example 15.

【0031】実施例17 スチレン−マレイン酸イソブチル共重合体100部、多
官能モノマーM315〔東亜合成化学工業(株)製〕1
00部、化合物1 0.76部およびs−Tri(1)7
部をメチルセロソルブ900mlに溶解して感光性樹脂溶
液を得た。この感光性樹脂溶液をガラス基板上に乾燥膜
厚が6μmになるように塗布し、60℃のオーブン中で
乾燥させて感光体とした。
Example 17 100 parts of styrene-isobutyl maleate copolymer, polyfunctional monomer M315 [manufactured by Toagosei Chemical Industry Co., Ltd.] 1
00 parts, Compound 1 0.76 parts and s-Tri (1) 7
A part was dissolved in 900 ml of methyl cellosolve to obtain a photosensitive resin solution. This photosensitive resin solution was applied onto a glass substrate so that the dry film thickness was 6 μm, and dried in an oven at 60 ° C. to obtain a photoreceptor.

【0032】得られた感光性試料にHe−Neレーザー
を光源とする二光束干渉系を用い9mJ/cm2 の露光に
よりホログラム記録を行った後、可視光により10mJ/
cm2 の全面露光を行った。露光終了後、イソプロパノー
ルに90秒間浸漬した後、n−ヘプタンに約10秒間浸
漬することで現像処理を行い、乾燥することで体積ホロ
グラムを得た。得られた体積ホログラムの最大回折効率
は約85%であった。
Holographic recording was performed on the obtained photosensitive sample by exposure to 9 mJ / cm 2 using a two- beam interference system using a He-Ne laser as a light source, and then 10 mJ / visible with visible light.
A full-area exposure of cm 2 was performed. After completion of the exposure, the resultant was dipped in isopropanol for 90 seconds and then dipped in n-heptane for about 10 seconds to perform a development treatment, and dried to obtain a volume hologram. The maximum diffraction efficiency of the obtained volume hologram was about 85%.

【0033】実施例18 実施例17においてs−Tri(1)7部の代わりにB
TTB 7部を用いる以外は実施例17と同様に行い感
光体を得た。得られた感光性試料に5mJ/cm2 のHe−
Neレーザーを光源とするデニシュク型の露光によりホ
ログラム記録を行った。以下、実施例17と同様に行い
被写体の明るい像を得た。
Example 18 In Example 17, B was used instead of 7 parts of s-Tri (1).
A photoreceptor was obtained in the same manner as in Example 17, except that 7 parts of TTB was used. Hem of 5 mJ / cm 2 was applied to the obtained photosensitive sample.
Holographic recording was performed by Denishk type exposure using a Ne laser as a light source. Thereafter, the same procedure as in Example 17 was performed to obtain a bright image of the subject.

【0034】実施例19 実施例17においてスチレンーマレイン酸イソブチル共
重合体100部の代わりにポリビニルカルバゾール10
0部を用いる以外は実施例17と同様に行い感光体を得
た。得られた感光性試料に5mJ/cm2 のHe−Neレ
ーザーを光源とするデニシュク型の露光によりホログラ
ム記録を行った後、可視光により全面露光を行った。そ
の後、トルエン/キシレン(1/1v/v)の溶液に90
秒間浸漬した後、n−ヘプタンに約10秒間浸漬するこ
とで現像処理を行い被写体の明るい像を得た。
Example 19 Polyvinylcarbazole 10 was used in place of 100 parts of styrene-isobutyl maleate copolymer in Example 17.
A photoreceptor was obtained in the same manner as in Example 17 except that 0 part was used. Holographic recording was performed on the obtained photosensitive sample by a Denishk type exposure using a He-Ne laser of 5 mJ / cm 2 as a light source, and then the entire surface was exposed by visible light. Then, add 90% to a solution of toluene / xylene (1/1 v / v).
After soaking for 2 seconds, it was soaked in n-heptane for about 10 seconds to perform development processing, and a bright image of the subject was obtained.

【0035】[0035]

【発明の効果】本発明の光重合開始剤は優れた感光性を
有するものである。
The photopolymerization initiator of the present invention has excellent photosensitivity.

フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/027 Continuation of front page (51) Int.Cl. 5 Identification code Office reference number FI technical display area H01L 21/027

Claims (1)

【特許請求の範囲】 【請求項1】 式(I) 【化1】 (式中、R1 は低級アルキルを表わし、R2 は水素、ア
ルキル、アリールまたはアラルキルを表わし、Xは水素
またはハロゲンを表わす。)で表わされるスクアリリウ
ム誘導体とラジカル発生剤とからなる光重合開始剤。 【請求項2】 エチレン性不飽和二重結合を少なくとも
1個有する付加重合可能な化合物、バインダーおよび式
(I) 【化2】 (式中、R1 は低級アルキルを表わし、R2 は水素、ア
ルキル、アリールまたはアラルキルを表わし、Xは水素
またはハロゲンを表わす。)で表わされるスクアリリウ
ム誘導体とラジカル発生剤とからなる光重合開始剤を含
有する光重合性組成物。
What is claimed is: (Claim 1) Formula (I) (In the formula, R 1 represents lower alkyl, R 2 represents hydrogen, alkyl, aryl or aralkyl, and X represents hydrogen or halogen.) A photopolymerization initiator comprising a squarylium derivative and a radical generator. .. 2. An addition-polymerizable compound having at least one ethylenically unsaturated double bond, a binder and a compound represented by formula (I): (In the formula, R 1 represents lower alkyl, R 2 represents hydrogen, alkyl, aryl or aralkyl, and X represents hydrogen or halogen.) A photopolymerization initiator comprising a squarylium derivative and a radical generator. A photopolymerizable composition containing:
JP23960391A 1991-04-26 1991-09-19 Photopolymerization initiator and photopolymerizable composition containing the same Expired - Fee Related JP2988756B2 (en)

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