JPH0546306A - Coordinate input device - Google Patents

Coordinate input device

Info

Publication number
JPH0546306A
JPH0546306A JP20704391A JP20704391A JPH0546306A JP H0546306 A JPH0546306 A JP H0546306A JP 20704391 A JP20704391 A JP 20704391A JP 20704391 A JP20704391 A JP 20704391A JP H0546306 A JPH0546306 A JP H0546306A
Authority
JP
Japan
Prior art keywords
conductive films
conductive film
voltage
film
input
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20704391A
Other languages
Japanese (ja)
Inventor
Fumihiko Nakazawa
文彦 中沢
Masao Shibayama
政雄 柴山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20704391A priority Critical patent/JPH0546306A/en
Publication of JPH0546306A publication Critical patent/JPH0546306A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Abstract

PURPOSE:To constitute the device so that an input coordinate can be detected with high precision, and also, an erroneous input is not executed by pressure of the palm by connecting electrically two pieces of opposed conductive films only when they are pressurized by a cordless exclusive input jig. CONSTITUTION:The device is provided with a first and a second conductive films 14, 12 in which each of them has a uniform resistance distribution, and at least one of them is formed on a flexible substrate, and also, which are placed so as to be opposed to each other, and an insulating film 13 which is interposed and placed between a first and a second conductive films 14, 12, and insulates between a first and a second conductive films 14, 12. In such a state, only when a first conductive film 14 is pressurized by a cordless exclusive input jig 18, the electric connection of a first and a second conductive films 14, 12 is executed through an opening 17 of the insulating film 13. Accordingly, since the insulating film 13 for selecting a pressurizing means is provided, by the pressure of the palm, etc., in whick an area of a pressurizing part is larger than the exclusive input jig 18, the electric connection of a first and a second conductive films 14, 12 cannot be executed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は座標入力装置に係り、特
に液晶表示装置などの表示装置の表示面上に重ね、表示
位置と入力装置の位置とを対応させた手書き入力用の入
出力一体型装置に適した座標入力装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coordinate input device, and more particularly, to an input / output device for handwriting input which is superposed on the display surface of a display device such as a liquid crystal display device so that the display position corresponds to the position of the input device. The present invention relates to a coordinate input device suitable for a body type device.

【0002】[0002]

【従来の技術】入力位置座標を表示装置の表示面上に表
示させたりする座標入力装置は、従来より透明導電膜を
有する2枚の透明基板を、ドットスペーサを介して対向
させ、それら2枚の透明基板を加圧時のみ電気的接続さ
せるように構成するメンブラン・タッチパネルが知られ
ている(例えば、米国特許第3911215号明細書及
び同、第4484038号明細書)。
2. Description of the Related Art A coordinate input device for displaying input position coordinates on a display surface of a display device has conventionally been arranged such that two transparent substrates having a transparent conductive film are opposed to each other via a dot spacer, and the two transparent substrates are opposed to each other. There is known a membrane touch panel in which the transparent substrate is electrically connected only when pressure is applied (for example, US Pat. No. 3,911,215 and US Pat. No. 4,484,038).

【0003】図5は米国特許第3911215号明細書
に開示された従来装置の一例の構成図を示す。同図中、
ケース31内に点電極32が設けられ、更にその上に導
電膜(抵抗膜)33と突起34とを有する可撓性導電膜
35とが対向配置されている。更に、可撓性導電膜35
上に保護膜36が設けられている。
FIG. 5 is a block diagram showing an example of a conventional device disclosed in US Pat. No. 3,911,215. In the figure,
A point electrode 32 is provided in the case 31, and a conductive film (resistive film) 33 and a flexible conductive film 35 having a protrusion 34 are arranged opposite to the point electrode 32. Furthermore, the flexible conductive film 35
A protective film 36 is provided on the top.

【0004】かかる従来装置(メンブラン・タッチパネ
ル)では、導電膜33と35との間は突起34により非
接触とされているが、ペン37により保護膜36上の所
望位置を加圧すると、可撓性導電膜35が変形し導電膜
34に接触する。
In such a conventional device (membrane / touch panel), the conductive films 33 and 35 are not in contact with each other by the projection 34, but when a desired position on the protective film 36 is pressed by the pen 37, the flexible film is flexible. The conductive conductive film 35 is deformed and comes into contact with the conductive film 34.

【0005】この状態で時分割で基準電圧を印加し、接
触位置の電位により接触位置座標を検出する構成であ
る。このメンブラン・タッチパネルは導電膜をパターニ
ングすることなく形成できることから、製造が容易であ
り、低コストであり、また加圧入力手段は指でも可能で
あり、操作性が容易であるという特長がある。
In this state, the reference voltage is applied in a time division manner, and the contact position coordinates are detected by the potential of the contact position. Since this membrane touch panel can be formed without patterning the conductive film, it has advantages that it is easy to manufacture, it is low in cost, and the pressure input means can be a finger, and operability is easy.

【0006】また、従来、高位置精度を有する座標入力
装置として、容量結合型入力パネルが知られている(例
えば、特開昭63−13115号公報、特開昭63−1
42415号公報)。この容量結合型入力パネルは、入
力パネル上の電極と、コードで入力パネル本体に接続さ
れた専用スタイラスペンの先端に設けられた電極間で形
成されるコンデンサに蓄積される電荷により位置座標を
入力する構成である。
Further, conventionally, a capacitive coupling type input panel is known as a coordinate input device having high position accuracy (for example, JP-A-63-13115 and JP-A-63-1).
No. 42415). This capacitively coupled input panel inputs position coordinates by the charge accumulated in the capacitor formed between the electrode on the input panel and the electrode provided at the tip of the dedicated stylus pen connected to the input panel body with a cord. It is a configuration that does.

【0007】図6は上記の特開昭63−142415号
公報で開示された従来の座標入力装置の他の例の構成図
を示す。同図中、ガラス基板41と42は、ガラス基板
41の下面に形成された透明抵抗体43と、ガラス基板
42の上面に形成された透明抵抗体44とを介して重ね
られている。
FIG. 6 is a block diagram showing another example of the conventional coordinate input device disclosed in Japanese Patent Laid-Open No. 63-142415. In the figure, the glass substrates 41 and 42 are stacked via a transparent resistor 43 formed on the lower surface of the glass substrate 41 and a transparent resistor 44 formed on the upper surface of the glass substrate 42.

【0008】また、ガラス基板41の下面のX軸方向の
両端部には電極45,46が形成されている。ガラス基
板42の上面のY軸方向の両端部には電極47,48が
形成されている。抵抗体43にはギャップ部Gが形成さ
れている。また、49は検出電極で、ガラス基板41の
上面に置かれている。
Further, electrodes 45 and 46 are formed on both ends of the lower surface of the glass substrate 41 in the X-axis direction. Electrodes 47 and 48 are formed on both ends of the upper surface of the glass substrate 42 in the Y-axis direction. A gap portion G is formed in the resistor 43. A detection electrode 49 is placed on the upper surface of the glass substrate 41.

【0009】かかる構成において、検出電極49の位置
のX座標を求める場合は、スイッチ50を接点S側に、
またスイッチ51,52及び53を夫々接点E側に閉成
する。これにより、信号源54からの信号が電極45と
46の間に流れ、検出電極49と抵抗体43の対向する
部分との間で容量結合が生じ、電極45,46間の電位
が検出される。
In this structure, when the X coordinate of the position of the detection electrode 49 is obtained, the switch 50 is set to the contact S side.
Also, the switches 51, 52 and 53 are closed on the contact E side, respectively. As a result, the signal from the signal source 54 flows between the electrodes 45 and 46, capacitive coupling occurs between the detection electrode 49 and the opposing portion of the resistor 43, and the potential between the electrodes 45 and 46 is detected. ..

【0010】検出電極49の電位はピーク検波回路55
及びA/D変換器56を夫々通して第1のX座標データ
として取り出される。次に、スイッチ50を接点E,ス
イッチ51を接点Sに夫々切換え、そのとき検出電極4
9に生ずる電位をピーク検波回路55及びA/D変換器
56を夫々通して第2のX座標データとして取り出す。
そして、上記第1及び第2のX座標データから真のX座
標データを求める。
The potential of the detection electrode 49 is the peak detection circuit 55.
And the A / D converter 56, respectively, to obtain the first X coordinate data. Next, the switch 50 is switched to the contact E and the switch 51 is switched to the contact S, respectively.
The potential generated at 9 is taken out as the second X coordinate data through the peak detection circuit 55 and the A / D converter 56, respectively.
Then, the true X coordinate data is obtained from the first and second X coordinate data.

【0011】検出電極49の位置のY座標を求める場合
は、スイッチ52を接点S側に閉成し、他のスイッチ5
0,51及び53は夫々接点E側に閉成して検出電極4
9と抵抗体44の対向する部分との間でギャップ部Gを
介して容量結合を生じさせたときのデータと、スイッチ
52を接点Eに切換えると共にスイッチ53を接点S側
に切換えたときのデータとから求める。なお、上記の検
出電極49は専用スタイラスペン(図示せず)の先端に
設けられている。
To obtain the Y coordinate of the position of the detection electrode 49, the switch 52 is closed on the contact S side and the other switch 5 is closed.
0, 51, and 53 are closed on the contact E side, respectively, and the detection electrode 4
9 and the data when the capacitive coupling is generated between the resistor 9 and the opposing portion of the resistor 44 via the gap G, and the data when the switch 52 is switched to the contact E and the switch 53 is switched to the contact S side. And ask from. The detection electrode 49 is provided on the tip of a dedicated stylus pen (not shown).

【0012】なお、前記した特開昭63−13115号
公報記載の従来の容量結合型入力パネルでは、電圧をパ
ルス的に与え、その際に放電される電荷を電流で検出
し、その後に電源電圧変換することにより、位置座標を
検出する「放電電流検出方式」が採用されている。
In the conventional capacitively coupled input panel described in the above-mentioned Japanese Patent Laid-Open No. 63-13115, a voltage is applied in a pulsed manner, the electric charge discharged at that time is detected by a current, and then a power supply voltage is applied. A “discharge current detection method” is used in which the position coordinates are detected by conversion.

【0013】[0013]

【発明が解決しようとする課題】しかるに、前記した図
5に示す如き従来装置は、導電膜としてすずをドープし
た酸化インジウム(ITO:Indium Tin Oxide)や二酸
化すず(SnO2 )などを透明基板上に蒸着した透明導
電膜が用いられているため、面内において約10%のシ
ート抵抗のバラツキがある。
However, in the conventional device as shown in FIG. 5, the indium tin oxide (ITO) or tin dioxide (SnO 2 ) doped with tin is used as the conductive film on the transparent substrate. Since the transparent conductive film vapor-deposited on is used, there is a variation in the sheet resistance of about 10% within the surface.

【0014】この場合には、例えば200mm×130mm
の入力面では、最大20mmの位置ずれを生じることにな
り、図形入力などには使えないという問題がある。ま
た、ペンにて入力を行なう際に、ペン以外の部分、例え
ば掌などがタッチパネルを加圧すると、ペン先の正常な
位置検出ができないという問題もある。
In this case, for example, 200 mm × 130 mm
On the input surface, the maximum displacement is 20 mm, which cannot be used for figure input. In addition, when inputting with the pen, if a portion other than the pen, such as the palm, presses the touch panel, there is a problem that the normal position of the pen tip cannot be detected.

【0015】また、前記図6などに示す如き容量結合型
の従来装置では、位置精度として0.1 mmの高精度が得ら
れているものの、専用スタイラスペンがコードで入力パ
ネル本体に接続されているため、操作性がコードで制限
されてしまうという問題がある。
Further, in the conventional device of the capacitive coupling type as shown in FIG. 6 and the like, although a high position accuracy of 0.1 mm is obtained, a dedicated stylus pen is connected to the input panel body by a cord. However, there is a problem that the operability is limited by the code.

【0016】また、専用スタイラスペンの構造は外部か
らのノイズの影響を低減するために、ペンの筺体をシー
ルドし、アンプ回路を内蔵しなければならず、ペンが重
く、太くなるという問題もある。更に、ペンと入力パネ
ルとをつなぐコードは、外部からのノイズの影響を低減
するためにシールドが必要であり、従って、コードも太
くなってしまう。
Further, in the structure of the dedicated stylus pen, in order to reduce the influence of noise from the outside, the pen housing must be shielded and an amplifier circuit must be built in, and the pen becomes heavy and thick. .. Further, the cord connecting the pen and the input panel needs a shield in order to reduce the influence of noise from the outside, and therefore the cord also becomes thick.

【0017】本発明は以上の点に鑑みなされたもので、
対向する2枚の導電膜を、コードレスの専用入力治具で
加圧したときのみ電気的に接続されるよう構成すること
により、上記の課題を解決した座標入力装置を提供する
ことを目的とする。
The present invention has been made in view of the above points,
An object of the present invention is to provide a coordinate input device that solves the above-mentioned problems by configuring two opposing conductive films to be electrically connected only when pressed by a cordless dedicated input jig. ..

【0018】[0018]

【課題を解決するための手段】上記目的を達成するた
め、本発明は請求項1に記載したように、各々一様の抵
抗分布を有し、少なくとも一方が可撓性基板上に形成さ
れると共に、互いに対向配置された第1及び第2の導電
膜と、規則的に開口が形成されると共に、前記第1及び
第2の導電膜の間に介在配置されて前記第1及び第2の
導電膜間を絶縁する絶縁膜とを有し、コードレスの専用
入力治具で前記第1の導電膜が加圧されたときのみ、前
記絶縁膜の開口を介して前記第1及び第2の導電膜の電
気的接続を行なうようにしたものである。
In order to achieve the above-mentioned object, the present invention, as described in claim 1, has a uniform resistance distribution, at least one of which is formed on a flexible substrate. Along with the first and second conductive films arranged to face each other, openings are regularly formed, and the first and second conductive films are interposed between the first and second conductive films. An insulating film for insulating between the conductive films, and only when the first conductive film is pressed by a cordless dedicated input jig, the first and second conductive films are opened through the opening of the insulating film. It is intended to electrically connect the membranes.

【0019】また、本発明は請求項2に記載したよう
に、前記第1及び第2の導電膜に交互に互いに直交する
直流電圧を印加し、一方の導電膜を検出電極として座標
出力を取り出す検出手段を設けてなる。
Further, according to the present invention, as described in claim 2, DC voltages which are orthogonal to each other are alternately applied to the first and second conductive films, and one of the conductive films is used as a detection electrode to take out coordinate output. A detection means is provided.

【0020】また、前記第1及び第2の導電膜は、夫々
平面が四辺形で、導電膜製膜時の基板移動方向に直交す
る二辺に、直流電圧印加用電極が形成される。
Further, the first and second conductive films each have a quadrilateral plane, and DC voltage applying electrodes are formed on two sides orthogonal to the substrate moving direction during film formation.

【0021】更に、本発明は前記検出手段に電流制限用
抵抗を介して基準電圧を第1の導電膜に印加又は遮断す
るスイッチング素子を含むよう構成している。
Further, according to the present invention, the detecting means includes a switching element for applying or blocking a reference voltage to the first conductive film via a current limiting resistor.

【0022】また更に、本発明は前記第1及び第2の導
電膜と絶縁膜が形成された基板の透過率を、可視光の波
長領域で50%以上としたものである。
Further, according to the present invention, the transmittance of the substrate on which the first and second conductive films and the insulating film are formed is 50% or more in the visible light wavelength region.

【0023】[0023]

【作用】請求項1記載の発明では、加圧手段を選択する
絶縁膜を設けたため、専用入力治具よりも加圧部の面積
が大なる掌等による加圧によっては前記第1及び第2の
導電膜間の電気的接続が行なえないようにすることがで
きる。また、前記専用入力治具はコードレスなので、容
量結合型従来装置の専用スタイラスペンのようなノイズ
低減構造は一切不要である。
According to the first aspect of the present invention, since the insulating film for selecting the pressing means is provided, depending on the pressure applied by the palm or the like, the area of the pressing part is larger than that of the dedicated input jig, the first and second The electrical connection between the conductive films can be prevented. Further, since the dedicated input jig is cordless, no noise reduction structure like the dedicated stylus pen of the capacitive coupling type conventional device is required.

【0024】また、請求項2記載の発明の検出手段で
は、前記絶縁膜の開口を介して前記前記第1及び第2の
導電膜間が電気的接続された状態において、電位降下を
生ずるように直流電圧を一方の導電膜に印加し、対向す
る他方の導電膜にて電気的接続点のX方向の電位を検出
する。
Further, in the detecting means according to the second aspect of the present invention, a potential drop is generated in a state where the first and second conductive films are electrically connected through the opening of the insulating film. A DC voltage is applied to one of the conductive films, and the potential of the electrical connection point in the X direction is detected by the opposing conductive film.

【0025】次に前記検出手段は上記他方の導電膜に対
し、前記直流電圧の電圧降下と垂直方向に電圧降下を生
じるように直流電圧を印加し、上記一方の導電膜にて電
気的接続点のY方向の電位を検出する。これにより、加
圧点の位置座標が算出できる。
Next, the detection means applies a DC voltage to the other conductive film so as to cause a voltage drop in a direction perpendicular to the voltage drop of the DC voltage, and the one conductive film makes an electrical connection point. The electric potential in the Y direction is detected. Thereby, the position coordinates of the pressure point can be calculated.

【0026】また、請求項3記載の発明では、直流電圧
印加用電極を導電膜製膜時の基板移動方向と直交する方
向の導電膜の二辺に配設しているため、導電膜の直流電
圧の電位降下の方向をシート抵抗のばらつきが少ない方
向に一致させることができる。
According to the third aspect of the present invention, since the DC voltage applying electrodes are arranged on two sides of the conductive film in the direction orthogonal to the substrate moving direction when the conductive film is formed, the DC voltage of the conductive film is reduced. It is possible to match the direction of the potential drop of the voltage with the direction in which the variation of the sheet resistance is small.

【0027】また、請求項4記載の発明では、第2の導
電膜と電気的接続状態にある第1の導電膜に前記スイッ
チング素子及び前記電流制限用抵抗を介して前記基準電
圧を印加し、第1の導電膜の電位が一定値以下になった
ことを検出した後、スイッチング素子により前記基準電
圧を遮断することにより、前記電流制限用抵抗による電
圧検出の影響を無くすことができる。
Further, in the invention according to claim 4, the reference voltage is applied to the first conductive film which is electrically connected to the second conductive film through the switching element and the current limiting resistor, After detecting that the potential of the first conductive film has become equal to or lower than a certain value, the reference voltage is cut off by the switching element, so that the influence of the voltage detection by the current limiting resistor can be eliminated.

【0028】更に、請求項5記載の発明では、前記第1
及び第2の導電膜並びに前記絶縁膜が形成された基板を
実質的に透明にできるため、第1の導電膜側から反対方
向を透かして見ることができる。
Further, in the invention according to claim 5, the first
Since the substrate on which the second conductive film and the insulating film are formed can be made substantially transparent, the opposite direction can be seen through from the first conductive film side.

【0029】[0029]

【実施例】図1は本発明の一実施例の要部の一部切截斜
視図を示す。同図中、透明ガラス基板11上に透明導電
膜12が蒸着されている。透明導電膜12上には後述の
絶縁膜13,透明導電膜14及び透明絶縁基板15が順
次積層されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a partially cutaway perspective view of the essential part of one embodiment of the present invention. In the figure, a transparent conductive film 12 is deposited on a transparent glass substrate 11. An insulating film 13, a transparent conductive film 14, and a transparent insulating substrate 15, which will be described later, are sequentially laminated on the transparent conductive film 12.

【0030】透明絶縁基板15は可視光の波長領域での
透過率が良いこと、及び耐熱性に優れていることの観点
から、例えばポリエチレンテレフタレート(PET)又
はポリエステルサルフォン(PES)等の可撓性フィル
ム基板より構成されている。この透明絶縁基板15の表
面に透明導電膜14が蒸着されている。
The transparent insulating substrate 15 is flexible such as polyethylene terephthalate (PET) or polyester sulfone (PES) from the viewpoint of good transmittance in the visible light wavelength region and excellent heat resistance. It is composed of a flexible film substrate. The transparent conductive film 14 is vapor-deposited on the surface of the transparent insulating substrate 15.

【0031】透明導電膜12及び14としては、上記と
同様に可視光の波長領域での透過率及び耐熱性を考慮す
ると、ITO,SnO2 あるいは二酸化亜鉛(Zn
2 )等の透明導電膜が用いられる。この透明導電膜1
2及び14は夫々酸素フロー中の直流スパッタリング装
置で公知の製膜条件により、比抵抗5×10-4(Ω・c
m)以下の一様の抵抗分布を有する膜として、透明ガラ
ス基板11,透明絶縁基板15上に蒸着形成される。
The transparent conductive films 12 and 14 are made of ITO, SnO 2 or zinc dioxide (Zn) in consideration of the transmittance and heat resistance in the visible light wavelength region as described above.
A transparent conductive film such as O 2 ) is used. This transparent conductive film 1
Nos. 2 and 14 are DC sputtering devices in an oxygen flow, respectively, and have a specific resistance of 5 × 10 −4 (Ω · c) under known film forming conditions.
m) A film having a uniform resistance distribution of m or less is formed by vapor deposition on the transparent glass substrate 11 and the transparent insulating substrate 15.

【0032】なお、透明導電膜12及び14は図2に示
すように平面が四辺形状に形成され、夫々対向する二辺
に直流電圧印加用電極21と22,23と24がAgペ
ースト,カーボンペーストをスクリーン印刷の後熱処理
を行なうことにより形成される。ただし、本実施例では
後述する如く、電極21及び22,23及び24は所定
位置に設けられる。
As shown in FIG. 2, the transparent conductive films 12 and 14 have quadrilateral planes, and the DC voltage applying electrodes 21 and 22, and 23 and 24 are Ag paste and carbon paste on two opposite sides, respectively. Is formed by screen printing followed by heat treatment. However, in this embodiment, as will be described later, the electrodes 21 and 22, 23 and 24 are provided at predetermined positions.

【0033】次に絶縁膜13が透明導電膜12上に形成
される。形成方法としては、例えばスクリーン印刷が用
いられ、絶縁膜の材料としては熱硬化型のシリコン系樹
脂、あるいは紫外線硬化型のウレタン系樹脂を含む樹脂
が望ましい。
Next, the insulating film 13 is formed on the transparent conductive film 12. As a forming method, for example, screen printing is used, and it is desirable that the material of the insulating film is a resin containing a thermosetting silicone resin or an ultraviolet curing urethane resin.

【0034】また、絶縁膜13には規則的に円形の開口
17が穿設されている。絶縁膜13は開口17の半径と
厚さが、専用入力治具18の加圧により開口17を介し
て透明導電膜12と14が接触し、かつ、掌による加圧
では接触しないような値に、専用入力治具18の先端の
半径と、透明絶縁基板15のヤング率(厚さ)を考慮し
て設定されている。
Further, circular openings 17 are regularly formed in the insulating film 13. The radius and thickness of the opening 17 of the insulating film 13 are set so that the transparent conductive films 12 and 14 contact each other through the opening 17 by the pressure applied by the dedicated input jig 18 and do not contact by the pressure applied by the palm. It is set in consideration of the radius of the tip of the dedicated input jig 18 and the Young's modulus (thickness) of the transparent insulating substrate 15.

【0035】一例として、専用入力治具18の先端の半
径は0.25mm,絶縁膜13の開口17の半径は240μm
,絶縁膜13の膜厚は5μmに設定されている。専用入
力治具18はコードレスであり、手で操作できる程度の
小型、軽量の構造とされている。
As an example, the radius of the tip of the dedicated input jig 18 is 0.25 mm and the radius of the opening 17 of the insulating film 13 is 240 μm.
The thickness of the insulating film 13 is set to 5 μm. The dedicated input jig 18 is cordless and has a small and lightweight structure that can be manually operated.

【0036】これにより、掌による面加圧では透明導電
膜12と14は絶縁膜13の非開口部分に遮られて接触
することはないが、専用入力治具18の先端による加圧
時のみ開口17を通して透明導電膜12と14が接触す
る。従って、文字等の入力を専用入力治具18を用いて
行なう場合、入力面を掌で加圧しても正常な座標検出が
可能となる。
As a result, the transparent conductive films 12 and 14 are not blocked by the non-opening portion of the insulating film 13 and are not in contact with each other when the surface pressure is applied by the palm, but the transparent conductive films 12 and 14 are opened only when pressure is applied by the tip of the dedicated input jig 18. The transparent conductive films 12 and 14 are in contact with each other through 17. Therefore, when characters or the like are input using the dedicated input jig 18, normal coordinates can be detected even if the input surface is pressed by the palm.

【0037】最後に、可撓性透明絶縁基板15上に蒸着
形成されている透明導電膜14を絶縁膜13上に載置し
た後、両面接着テープ16で透明ガラス基板11と透明
絶縁基板15の各周辺部の間を接着固定する。
Finally, after the transparent conductive film 14 formed by vapor deposition on the flexible transparent insulating substrate 15 is placed on the insulating film 13, the double-sided adhesive tape 16 is used to bond the transparent glass substrate 11 and the transparent insulating substrate 15. The peripheral parts are fixed by adhesion.

【0038】このようにして作成された座標入力装置
は、透明ガラス基板11から透明絶縁基板15に至る透
過率が、可視光の波長領域で50%以上である。これに
より、例えば液晶表示装置の表示面上に、この座標入力
装置を透明ガラス基板11が載るように配置し、入出力
一体型装置を構成することができる。
In the coordinate input device thus produced, the transmittance from the transparent glass substrate 11 to the transparent insulating substrate 15 is 50% or more in the visible light wavelength region. Thereby, for example, the coordinate input device is arranged so that the transparent glass substrate 11 is placed on the display surface of the liquid crystal display device, and the input / output integrated device can be configured.

【0039】次に、図2に示す如く平面四辺形状の透明
導電膜12及び14に対する、直流電圧印加用電極2
1,22,23,24の形成位置について説明する。透
明導電膜12及び14は酸素フロー中の直流スパッタリ
ング装置で、基板11,15を平行移動しながらITO
により製膜されるものとする。
Next, as shown in FIG. 2, electrodes 2 for applying a DC voltage are applied to the transparent conductive films 12 and 14 having a quadrilateral planar shape.
The formation positions of 1, 22, 23, and 24 will be described. The transparent conductive films 12 and 14 are a direct-current sputtering device in an oxygen flow, and are ITO while translating the substrates 11 and 15.
Shall be formed into a film.

【0040】この場合、スパッタリングターゲットとし
て充分幅の広い25インチ幅のIn−Sn(10wt%)
を用い、600mm幅のロール状のPET等の可撓性フィ
ルム基板をターゲットの長手方向に直角な方向に往復の
平行移動ができる機構を設け、10%O2 −90%Ar
ガス流量50sccm,反応ガス圧7×10-3Torr,直流電
圧90WでITO膜を形成する。
In this case, a 25-inch wide In-Sn (10 wt%) wide enough as a sputtering target
A flexible film substrate such as 600 mm wide roll-shaped PET is provided with a mechanism capable of reciprocating parallel movement in a direction perpendicular to the longitudinal direction of the target using 10% O 2 -90% Ar.
An ITO film is formed with a gas flow rate of 50 sccm, a reaction gas pressure of 7 × 10 −3 Torr, and a DC voltage of 90 W.

【0041】この場合のITO膜(すなわち透明導電膜
12又は14)のシート抵抗は、図3に、またシート抵
抗のばらつきは図4に示す如くになることが実験により
確かめられた。
It has been confirmed by experiments that the sheet resistance of the ITO film (that is, the transparent conductive film 12 or 14) in this case is as shown in FIG. 3 and the variation of the sheet resistance is as shown in FIG.

【0042】図3からわかるように、600mm幅の透明
絶縁基板の移動方向に垂直な方向(すなわち、幅方向
で、これをy軸方向とする)の中心から±150mmの範
囲において、ITO膜のシート抵抗ρは約60Ω/□か
ら約90Ω/□までばらついており、y軸方向のシート
抵抗のばらつきは約±25%である。
As can be seen from FIG. 3, in the range of ± 150 mm from the center of the direction perpendicular to the moving direction of the transparent insulating substrate having a width of 600 mm (that is, the y direction is the width direction), the ITO film The sheet resistance ρ varies from about 60 Ω / □ to about 90 Ω / □, and the variation of the sheet resistance in the y-axis direction is about ± 25%.

【0043】一方、図3からわかるように、上記のy軸
方向の中心から±150mmの範囲内においては、x軸方
向(すなわち、透明絶縁基板の移動方向と平行な方向)
の位置が50mm,100mm,150mm,200mm,25
0mmの各位置に変化してもy軸方向の位置が同じならば
シート抵抗は略同一の値を示すことがわかる。
On the other hand, as can be seen from FIG. 3, in the range of ± 150 mm from the center in the y-axis direction, the x-axis direction (that is, the direction parallel to the moving direction of the transparent insulating substrate).
Position of 50mm, 100mm, 150mm, 200mm, 25
It can be seen that the sheet resistance shows substantially the same value if the position in the y-axis direction is the same even if the position is changed to 0 mm.

【0044】そこで、同一個所のシート抵抗を複数回繰
り返し測定してシート抵抗のばらつきを算出すると、図
4に示す如くになる。図4からわかるように、y軸方向
の中心から±150mmの範囲内において、x軸方向の各
点のシート抵抗のばらつきは、測定装置の精度(±0.5
%)以下である。
Therefore, when the sheet resistance at the same location is repeatedly measured a plurality of times to calculate the variation in the sheet resistance, it becomes as shown in FIG. As can be seen from FIG. 4, within a range of ± 150 mm from the center in the y-axis direction, the variation in the sheet resistance at each point in the x-axis direction is the accuracy of the measuring device (± 0.5 mm).
%) Or less.

【0045】そこで、本発明者は上記の実験結果に着目
し、透明導電膜12の製膜時の基板11の移動方向(図
2にAで示す)に直交する相対向する二辺に電極21,
22を夫々形成し、同様に透明導電膜14の製膜時の基
板15の移動方向(図2にBで示す)に直交する相対向
する二辺に電極23及び24を形成する。
Therefore, the present inventor pays attention to the above experimental result, and the electrodes 21 are formed on two opposite sides which are orthogonal to the moving direction (shown by A in FIG. 2) of the substrate 11 when the transparent conductive film 12 is formed. ,
22 are formed respectively, and similarly, electrodes 23 and 24 are formed on two opposite sides orthogonal to the moving direction of the substrate 15 (shown by B in FIG. 2) when the transparent conductive film 14 is formed.

【0046】これにより、透明導電膜12及び14は、
いずれもシート抵抗のばらつきが±0.5 %以下の基板移
動方向A,B(x軸方向)に一致する方向に、印加直流
電圧の電圧降下が発生するため、電極21〜24上の位
置精度を±0.5 %以下の高精度にすることができる。
As a result, the transparent conductive films 12 and 14 are
In both cases, since the voltage drop of the applied DC voltage occurs in the direction in which the sheet resistance variation is ± 0.5% or less and matches the substrate moving directions A and B (x-axis direction), the positional accuracy on the electrodes 21 to 24 is ±. High accuracy of 0.5% or less can be achieved.

【0047】次に本実施例の座標検出信号を取り出す検
出手段について図2と共に説明する。前記した直流電圧
印加用電極21と22が相対向する二辺に形成された透
明導電膜12と、直流電圧印加用電極23と24が相対
向する二辺に形成された透明導電膜14とは、直流電圧
降下方向が互いに直交するように、図2に示す如く配置
される。x座標位置とy座標位置の二次元座標位置を検
出するためである。
Next, the detection means for extracting the coordinate detection signal of this embodiment will be described with reference to FIG. The transparent conductive film 12 on which the DC voltage applying electrodes 21 and 22 are formed on the two sides facing each other and the transparent conductive film 14 on which the DC voltage applying electrodes 23 and 24 are formed on the two sides facing each other , Are arranged as shown in FIG. 2 so that the DC voltage drop directions are orthogonal to each other. This is for detecting the two-dimensional coordinate position of the x coordinate position and the y coordinate position.

【0048】電極21はPNPトランジスタTr1のコレ
クタ、エミッタを介して高電位側電源電圧である基準電
圧Vccに接続されている。また、電極22はNPNトラ
ンジスタTr2のコレクタ、エミッタを介して低電位側電
源電圧であるグランド電位に接続されている(接地され
ている)。
The electrode 21 is connected to the reference voltage Vcc, which is the power supply voltage on the high potential side, through the collector and emitter of the PNP transistor Tr1. The electrode 22 is connected (grounded) to the ground potential, which is the low-potential-side power supply voltage, via the collector and emitter of the NPN transistor Tr2.

【0049】電極23はPNPトランジスタTr3のコレ
クタ、エミッタを介して基準電圧Vccに接続され、電極
24はNPNトランジスタTr4のコレクタ、エミッタを
介して接地されている。更に、スイッチング素子である
PNPトランジスタTr5はコレクタが電流制限用抵抗R
1 を介して電極23に接続され、また、そのエミッタに
基準電圧Vccが印加される構成とされている。
The electrode 23 is connected to the reference voltage Vcc via the collector and emitter of the PNP transistor Tr3, and the electrode 24 is grounded via the collector and emitter of the NPN transistor Tr4. Further, the PNP transistor Tr5, which is a switching element, has a collector with a current limiting resistor R
It is connected to the electrode 23 via 1 and the reference voltage Vcc is applied to its emitter.

【0050】トランジスタTr1〜Tr5はいずれも、図示
しない制御回路からのパルスがベースに印加され、互い
に独立してスイッチング動作を行なうことにより、透明
導電膜12と14とに交互に互いに直交する直流電圧を
印加し、直流電圧が印加されていない方の透明導電膜を
検出電極として両透明導電膜12,14の接触位置に応
じた検出電圧を得る。
A pulse from a control circuit (not shown) is applied to the bases of all the transistors Tr1 to Tr5, and the transistors Tr1 to Tr5 perform a switching operation independently of each other, so that the transparent conductive films 12 and 14 are alternately applied with a DC voltage. Is applied, and the detection voltage corresponding to the contact position of both transparent conductive films 12 and 14 is obtained using the transparent conductive film to which the DC voltage is not applied as the detection electrode.

【0051】次に、トランジスタTr1〜Tr5及び抵抗R
1 による検出動作について説明する。まず、トランジス
タTr2及びTr5がオン、トランジスタTr1,Tr3及びT
r4が夫々オフに制御される。これにより、基準電圧Vcc
がトランジスタTr5のエミッタ、コレクタ、抵抗R1
夫々介して電極23に印加される。また、これと同時に
電極22がトランジスタTr2を介してグランド電位とさ
れる。
Next, the transistors Tr1 to Tr5 and the resistor R
The detection operation by 1 will be described. First, the transistors Tr2 and Tr5 are turned on, and the transistors Tr1, Tr3 and T5 are turned on.
Each r4 is controlled off. As a result, the reference voltage Vcc
There emitter of the transistor Tr5, a collector, is applied to resistor R 1 respectively via the electrode 23. At the same time, the electrode 22 is set to the ground potential via the transistor Tr2.

【0052】従って、このとき、抵抗R1 の抵抗値を透
明導電膜12,14の全シート抵抗値より充分大きく選
定しておくことにより、専用入力治具18の加圧により
透明導電膜12,14間が接触した場合には、抵抗
1 ,トランジスタTr3のコレクタ及び電極23の接続
点の電位VSENSEXは、ほぼグランド電位となる。
Therefore, at this time, by selecting the resistance value of the resistor R 1 to be sufficiently larger than the total sheet resistance values of the transparent conductive films 12 and 14, the pressure applied by the dedicated input jig 18 causes the transparent conductive film 12 and When 14 contact each other, the potential V SENSEX at the connection point between the resistor R 1 , the collector of the transistor Tr3 and the electrode 23 becomes substantially the ground potential.

【0053】VSENSEXがグランド電位となることによ
り、透明導電膜12と14との接触が確認されると、次
にトランジスタTr3,Tr4が夫々オン、トランジスタT
r1,Tr2及びTr5が夫々オフとされる。
When the contact between the transparent conductive films 12 and 14 is confirmed by setting V SENSEX to the ground potential, then the transistors Tr3 and Tr4 are turned on and the transistor T is turned on.
r1, Tr2 and Tr5 are turned off respectively.

【0054】この結果、電極23にトランジスタTr3の
エミッタ、コレクタを介して基準電圧Vccが印加される
と共に、トランジスタTr4を介して電極24がグランド
電位とされ、透明導電膜14に直流電圧Vccが印加され
る。
As a result, the reference voltage Vcc is applied to the electrode 23 via the emitter and collector of the transistor Tr3, the electrode 24 is set to the ground potential via the transistor Tr4, and the DC voltage Vcc is applied to the transparent conductive film 14. To be done.

【0055】これにより、透明導電膜12と14との接
触位置のX方向の位置座標に応じた電圧降下分だけ低下
した直流電圧が、透明導電膜14を介して電極21とト
ランジスタTr1のコレクタとの接続点より検出電圧V
SENSEYとして取り出される。
As a result, the DC voltage reduced by a voltage drop corresponding to the position coordinate in the X direction of the contact position between the transparent conductive films 12 and 14 is transmitted to the electrode 21 and the collector of the transistor Tr1 via the transparent conductive film 14. Detection voltage V from the connection point
It is taken out as SENSEY .

【0056】なお、トランジスタTr5のオフにより、抵
抗R1 と電極23との電気的接続が切り離されるため、
抵抗R1 による電位検出の影響を無くすことができる。
Since the transistor Tr5 is turned off, the electrical connection between the resistor R 1 and the electrode 23 is cut off.
It is possible to eliminate the influence of potential detection by the resistor R 1 .

【0057】続いて、トランジスタTr1及びTr2が夫々
オン、トランジスタTr3,Tr4及びTr5が夫々オフとさ
れる。これにより、電極21と22との間に基準電圧V
ccが印加される。透明導電膜12と14との接触位置
は、直流電圧であるVccが印加されている方の透明導電
膜12の電位が生じており、この電位が抵抗体である直
流電圧が印加されていない方の透明導電膜14を介して
電極23から検出電圧V SENSEXとして取り出される。
Subsequently, the transistors Tr1 and Tr2 are respectively
ON, transistors Tr3, Tr4 and Tr5 are OFF respectively.
Be done. Thereby, the reference voltage V is applied between the electrodes 21 and 22.
cc is applied. Contact position between the transparent conductive films 12 and 14
Is the transparent conductivity of the one to which Vcc which is DC voltage is applied.
The electric potential of the membrane 12 is generated, and this electric potential is
Through the transparent conductive film 14 to which no flowing voltage is applied
Detection voltage V from electrode 23 SENSEXIs taken out as.

【0058】従って、この検出電圧VSENSEXは透明導電
膜12と14との接触位置の,Y方向の位置に応じて電
圧降下された基準電圧の分圧電圧である。これにより、
上記した検出電圧VSENSEYとこの検出電圧VSENSEXとか
ら、透明導電膜12と14との接触位置、つまり入力座
標位置を算出できる。
Therefore, the detected voltage V SENSEX is a divided voltage of the reference voltage which is dropped according to the position of the contact position between the transparent conductive films 12 and 14 in the Y direction. This allows
From the above-described detection voltage V SENSEY and this detection voltage V SENSEX , the contact position between the transparent conductive films 12 and 14, that is, the input coordinate position can be calculated.

【0059】本実施例では透明導電膜12,14の電圧
降下の方向のシート抵抗のバラツキが1%以下となるよ
うにしているため、従来のメンブラン・タッチパネルに
比べて10倍以上の高分解能が実現できる。
In the present embodiment, the variation in sheet resistance in the direction of voltage drop of the transparent conductive films 12 and 14 is set to 1% or less, so that a high resolution of 10 times or more as compared with the conventional membrane touch panel can be obtained. realizable.

【0060】[0060]

【発明の効果】上述の如く、請求項1記載の発明によれ
ば、絶縁膜に加圧手段判別機能を持たせたので、専用入
力治具により座標入力を行なうときに掌を入力面につい
ても正常に入力位置を検出することができ、また、専用
入力治具はコードレスでノイズ低減構造を施す必要がな
いため、専用入力治具を軽量、小型の極めて操作し易い
構造とすることができる。
As described above, according to the invention described in claim 1, since the insulating film is provided with the function of discriminating the pressing means, the palm is also used for the input surface when the coordinate is input by the dedicated input jig. Since the input position can be normally detected, and the dedicated input jig does not need to be cordless and has no noise reduction structure, the dedicated input jig can have a lightweight, small-sized and extremely easy-to-operate structure.

【0061】また、請求項2記載の発明では、上記の絶
縁膜を有する座標入力装置で入力座標位置の検出信号を
得ることができ、また請求項3記載の発明によれば、導
電膜の直流電圧の電圧降下の方向をシート抵抗のばらつ
きの少ない方向に一致させることができるため、従来の
メンブラン・タッチパネルに比し10倍以上の高分解能
を構成することができる。
According to the second aspect of the invention, a detection signal of the input coordinate position can be obtained by the coordinate input device having the insulating film. According to the third aspect of the invention, the direct current of the conductive film is Since the direction of the voltage drop of the voltage can be made to coincide with the direction in which the variation in the sheet resistance is small, it is possible to configure a resolution that is 10 times or more higher than that of the conventional membrane touch panel.

【0062】更に請求項4記載の発明では電流制限用抵
抗による電圧検出の影響を無くすことができるため、高
精度の入力位置座標の検出ができ、また請求項5記載の
発明によれば装置全体を実質的に透明にできるため、表
示装置の表示面上に重ねて、表示位置と入力位置を対応
させた手書き入力用の入出力一体型装置に適用できる等
の特長を有するものである。
Further, according to the invention of claim 4, since the influence of the voltage detection by the current limiting resistor can be eliminated, it is possible to detect the input position coordinates with high accuracy, and according to the invention of claim 5, the whole apparatus can be detected. Since it can be made substantially transparent, it has a feature that it can be applied to an input / output integrated device for handwriting input in which the display position and the input position are associated with each other by overlapping on the display surface of the display device.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の要部の一部切截斜視図であ
る。
FIG. 1 is a partially cutaway perspective view of an essential part of an embodiment of the present invention.

【図2】本発明の一実施例の他の要部の構成図である。FIG. 2 is a configuration diagram of another main part of an embodiment of the present invention.

【図3】透明導電膜のシート抵抗値を示す図である。FIG. 3 is a diagram showing a sheet resistance value of a transparent conductive film.

【図4】透明導電膜のシート抵抗のばらつきを示す図で
ある。
FIG. 4 is a diagram showing variations in sheet resistance of transparent conductive films.

【図5】従来の一例の構成図である。FIG. 5 is a configuration diagram of a conventional example.

【図6】従来の他の例の構成図である。FIG. 6 is a configuration diagram of another conventional example.

【符号の説明】[Explanation of symbols]

11 透明ガラス基板 12 透明導電膜(第2の導電膜) 13 絶縁膜 14 透明導電膜(第1の導電膜) 15 透明絶縁基板 16 接着テープ 17 開口 18 専用入力治具 21〜24 直流電圧印加用電極 Tr1,Tr3,Tr5 スイッチング用PNPトランジスタ Tr2,Tr4 スイッチング用NPNトランジスタ R1 電流制限用抵抗11 transparent glass substrate 12 transparent conductive film (second conductive film) 13 insulating film 14 transparent conductive film (first conductive film) 15 transparent insulating substrate 16 adhesive tape 17 opening 18 dedicated input jigs 21-24 for applying DC voltage Electrode Tr1, Tr3, Tr5 Switching PNP transistor Tr2, Tr4 Switching NPN transistor R 1 Current limiting resistor

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 各々一様の抵抗分布を有し、少なくとも
一方が可撓性基板上に形成されると共に、互いに対向配
置された第1及び第2の導電膜(14,12)と、 規則的に開口(19)が形成されると共に、前記第1及
び第2の導電膜(14,12)の間に介在配置されて該
第1及び第2の導電膜(14,12)間を絶縁する絶縁
膜(13)とを有し、コードレスの専用入力治具(1
8)で前記第1の導電膜(14)が加圧されたときの
み、前記絶縁膜(13)の開口(17)を介して前記第
1及び第2の導電膜(14,12)の電気的接続を行な
うことを特徴とする座標入力装置。
1. A first and a second conductive film (14, 12) each having a uniform resistance distribution, at least one of which is formed on a flexible substrate, and which are arranged to face each other, and a rule. An opening (19) is formed, and is interposed between the first and second conductive films (14, 12) to insulate the first and second conductive films (14, 12). Cordless dedicated input jig (1
Only when the first conductive film (14) is pressed in 8), the electrical conductivity of the first and second conductive films (14, 12) is increased through the opening (17) of the insulating film (13). Input device characterized by performing physical connection.
【請求項2】 前記第1及び第2の導電膜(14,1
2)に交互に互いに直交する直流電圧を印加し、該直流
電圧が印加されていない方の導電膜を検出電極として座
標出力を取り出す検出手段(Tr1〜Tr5,R1 )を設け
たことを特徴とする請求項1記載の座標入力装置。
2. The first and second conductive films (14, 1)
Characterized in that a DC voltage is applied perpendicular to each other in 2) alternately, detection means for extracting the coordinates output as the conductive film detection electrodes towards which the DC voltage is not applied (Tr1~Tr5, provided R 1) The coordinate input device according to claim 1.
【請求項3】 前記第1及び第2の導電膜(14,1
2)は、夫々平面が四辺形で、導電膜の製膜時の基板移
動方向に直交する二辺に、前記直流電圧印加用電極(2
3,24,:21,22)を形成したことを特徴とする
請求項2記載の座標入力装置。
3. The first and second conductive films (14, 1)
In 2), each of the planes is a quadrilateral, and the DC voltage applying electrode (2) is provided on two sides orthogonal to the substrate moving direction during film formation of the conductive film.
3, 24 ,: 21, 22) are formed.
【請求項4】 前記検出手段(Tr1〜Tr5,R1 )は、
前記第1の導電膜(14)に電流制限用抵抗(R1 )を
介して基準電圧を印加又は遮断するスイッチング素子
(Tr5)を含むことを特徴とする請求項2記載の座標入
力装置。
4. The detection means (Tr1 to Tr5, R 1 ) is
It said first conductive film (14) to a current limiting resistor (R 1) coordinate input device according to claim 2, characterized in that it comprises a switching element (Tr5) for applying or shutting off the reference voltage through.
【請求項5】 前記第1及び第2の導電膜(14,1
2)及び絶縁膜(13)が形成された基板の透過率が、
可視光の波長領域で50%以上であることを特徴とする
請求項1記載の座標入力装置。
5. The first and second conductive films (14, 1)
2) and the transmittance of the substrate on which the insulating film (13) is formed are
The coordinate input device according to claim 1, wherein the visible light wavelength region is 50% or more.
JP20704391A 1991-08-19 1991-08-19 Coordinate input device Pending JPH0546306A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20704391A JPH0546306A (en) 1991-08-19 1991-08-19 Coordinate input device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20704391A JPH0546306A (en) 1991-08-19 1991-08-19 Coordinate input device

Publications (1)

Publication Number Publication Date
JPH0546306A true JPH0546306A (en) 1993-02-26

Family

ID=16533265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20704391A Pending JPH0546306A (en) 1991-08-19 1991-08-19 Coordinate input device

Country Status (1)

Country Link
JP (1) JPH0546306A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5764956A (en) * 1994-11-07 1998-06-09 Seiko Epson Conporation Computer peripheral function emulator
JP2007025904A (en) * 2005-07-13 2007-02-01 Fujitsu Component Ltd Coordinate detector
JP2009277046A (en) * 2008-05-15 2009-11-26 Fujitsu Component Ltd Method for manufacturing coordinate detector
JP2009277047A (en) * 2008-05-15 2009-11-26 Fujitsu Component Ltd Coordinate detector

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131114A (en) * 1984-11-30 1986-06-18 Pentel Kk Coordinate signal detector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131114A (en) * 1984-11-30 1986-06-18 Pentel Kk Coordinate signal detector

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5764956A (en) * 1994-11-07 1998-06-09 Seiko Epson Conporation Computer peripheral function emulator
JP2007025904A (en) * 2005-07-13 2007-02-01 Fujitsu Component Ltd Coordinate detector
JP2009277046A (en) * 2008-05-15 2009-11-26 Fujitsu Component Ltd Method for manufacturing coordinate detector
JP2009277047A (en) * 2008-05-15 2009-11-26 Fujitsu Component Ltd Coordinate detector

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