JPH0545744A - Image exposing device - Google Patents

Abstract

PURPOSE:To obviate the generation of a deviation or fluctuation in the light emission density in a photosensitive material even if there is the deviation or fluctuation in the wavelength of exit light or a degradation in emitted light quantity by providing specific optical members in at least one optical paths of the exit light. CONSTITUTION:A correction filter 16M has the transmission density characteristic, i.e., spectral transmission characteristic to the wavelength near for example, 670nm wavelength. A laser device (LD) 12M has an individual difference if such correction filter 16M is inserted between a collimator lens 14M and the photosensitive material A. The transmission density of the filter 16M changes according to the change in the wavelength even at the central wavelength deviated form the set central wavelength; for example, any of the wavelengths within a 670+ or -10nm wavelength range and in spite of the generation of the fluctuation in the wavelength by the temp. rise arising from the self-heat generation of the LD 12 and, therefore, the M color development density of the photosensitive material A by the laser beam 15M transmitted through the filter 16M is constant regardless of a change in the wavelength.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention image-wise exposes a monochrome or color light-sensitive material having spectral sensitivity with wavelength dependence by a light source such as a semiconductor laser which emits light of a predetermined narrow band wavelength. The present invention relates to an image exposure device. More specifically, an image exposure apparatus that can always expose a photosensitive material at a stable density even when the center wavelength of a light source such as a semiconductor laser shifts or the wavelength of the light source changes due to heat generation or the light amount decreases. Regarding

[0002]

2. Description of the Related Art Conventionally, in printing, printing, copying, etc., an image forming apparatus using a monochrome photosensitive material or a color photosensitive material has been used to record and reproduce a monochrome image or a color image. Monochrome and color light-sensitive materials used in such image forming apparatuses have wavelength dependence in spectral sensitivity like silver salt photographic light-sensitive materials. On the other hand, in an image exposure apparatus that imagewise exposes such a photosensitive material, a semiconductor laser (hereinafter,
A light source that emits light of a predetermined narrow band wavelength such as a light emitting element such as an LD or a light emitting diode (hereinafter, referred to as an LED) has been widely used.

A photosensitive material using such a light source is, for example, a false-color photosensitive material having a spectral sensitivity as shown in FIG. As a light emitting element for exposing this photosensitive material, for example, when a color image is formed on the color photosensitive material shown in FIG. 2, as shown in FIG. 3, the emission center wavelength for cyan (C) light is 810 nm.
For LD and yellow (Y) light, the emission center wavelength is 75
It is possible to use an LD of 0 nm and an LD having an emission center wavelength of 670 nm for magenta (M) light.

Thus, when LD is used, C, M,
Since the wavelength intervals of the Y3 colors are narrow, color mixing occurs. For example,
In the case of the photosensitive material shown by the dotted line in FIG.
When it is desired to develop only yellow (Y) in D, cyan (C) is also developed at the same time, and development occurs in which green is applied. In order to prevent this color mixture, a method has recently been adopted in which the spectral sensitivity of the photosensitive material is sharpened, that is, the inclination is steep, as indicated by the solid line in the figure.

On the other hand, the light emitting element used as the light source is
Individual variations (individual differences) occur at the manufacturing stage, and there are variations from the central wavelength (oscillation wavelength), for example, variations of about ± 10 nm as shown in FIG. Further, in the above-mentioned light emitting element, as shown in FIGS. 10 and 11, the optical output level and the oscillation wavelength greatly change due to the temperature change. Therefore, the temperature of the case of the light emitting element such as the LD is kept at a temperature to suppress the fluctuation. However, in a light emitting element such as an LD, even if the case temperature is constant, since the case and the light emitting section have thermal resistance, the temperature of the light emitting section rises due to self-heating. As a result, the oscillation wavelength of the light emitting element becomes longer. For example, LD has an oscillation wavelength extension of about 0.2 to 0.3 nm / ° C. That is, there are two problems on the light source side: individual error wavelength variation and wavelength variation due to self-heating.

Further, in a light emitting device such as an LD, not only is the oscillation wavelength extended by the temperature rise due to self-heating as described above, but the emission efficiency is also reduced, and therefore the temperature rises if it is driven at a constant current. As a result, there is also a problem that so-called droop occurs, which is a decrease in luminous efficiency. For this reason, in the light emitting element, automatic light output control (APC) is performed in which the drive current is increased to keep the light output level constant according to the decrease in light emission efficiency, but since the temperature rises due to self-heating, Even if the light output is constant, the oscillation wavelength always extends.

[0007]

By the way, first of all,
If the wavelength dependence of the spectral characteristics of the photosensitive material is large, L
If a light emitting element such as D has a variation in the oscillation wavelength at the manufacturing stage or a wavelength change due to self-heating, even if there is no droop or is extremely small, or the optical output is kept constant by APC or the like. As shown in FIG. 2, since the slope of the spectral sensitivity of the photosensitive material is steep, a slight wavelength shift or change causes a large change in the color density of the photosensitive material, which causes a machine difference or a large fluctuation in the color density. There is a problem that it will occur.

Of these, the deviation of the color density (device difference) due to the individual difference of the light emitting element is obtained by measuring the peculiar oscillation wavelength of each light emitting element at the time of factory shipment and adjusting the light quantity according to the peculiar oscillation wavelength. , Can be absorbed. However, this has a problem that it takes a lot of time and increases the cost of the device. On the other hand, the fluctuation of the oscillation wavelength due to self-heating depends on the history of energization to the light emitting element, and therefore it is very difficult to adjust this in advance at the time of shipping. Of course, it is technically possible to measure the wavelength variation due to the energization history of the light emitting element in advance and correct the light quantity by predicting this history, but since the temperature of the light emitting element changes with a certain time constant, This adjustment would require very complex and expensive circuits and equipment.

Further, if the light emitting element has a droop, even if the spectral sensitivity of the photosensitive material is constant near the oscillation wavelength of the light emitting element as shown in FIG. Due to the decrease in the light emission amount, there is a problem that the exposure amount is decreased and the color density is decreased.

As described above, in a pseudo color light-sensitive material using a light emitting device such as an LD, the spectral sensitivity is sharp in order to prevent color mixing, so that the oscillation wavelength changes due to self-heating of the light emitting device and the droop, that is, the light emitting efficiency. When the decrease occurs at the same time, there is a problem that the change in the spectral sensitivity of the photosensitive material caused by the change in the wavelength and the decrease in the light emission amount due to the droop, that is, the decrease in the exposure amount are superposed, and the color density is complicatedly changed.

A first object of the present invention is to solve the above-mentioned problems of the prior art, and to expose a photosensitive material having spectral sensitivity with wavelength dependence by using a light source which emits light of a predetermined narrow band wavelength. In this case, there is provided an image exposure apparatus that does not cause a deviation or fluctuation in color density even if the light source has individual differences or a temperature rise due to self-heating during use, resulting in deviation or fluctuation in wavelength of emitted light. ..

A second object of the present invention is to not only change the center wavelength of the emitted light due to the temperature rise due to self-heating of the light source of the narrow band wavelength, but also reduce the luminous efficiency, that is, droop at the same time. An object of the present invention is to provide an image exposure apparatus that prevents a decrease in the exposure amount due to this droop and does not cause a deviation in the color density of the photosensitive material.

Further, a third object of the present invention is to provide a light-sensitive material having spectral sensitivity with wavelength dependence even if the light source causes a shift due to individual difference in center wavelength, fluctuation of center wavelength due to self-heating and droop. An object of the present invention is to provide an image exposure apparatus capable of obtaining a stable color density that does not cause a change in color density.

[0014]

In order to achieve the above-mentioned first object, the first aspect of the present invention is to use at least one light source for emitting light of a predetermined narrow band wavelength to obtain a spectral sensitivity wavelength. An image exposure apparatus for exposing a photosensitive material having dependence, wherein an optical member having a spectral transmission or spectral reflection characteristic for canceling the spectral sensitivity characteristic of the photosensitive material is provided in at least one optical path of the emitted light. An image exposure apparatus characterized by the above is provided.

In order to achieve the above-mentioned second object, a second aspect of the present invention is an image exposure apparatus for exposing a photosensitive material using at least one light source which emits light of a predetermined narrow band wavelength. And an optical member having a spectral transmission or spectral reflection characteristic for canceling the characteristic of the light quantity corresponding to the wavelength of the emitted light of the light source is provided in at least one optical path of the emitted light. A device is provided.

In order to achieve the above-mentioned third object, a third aspect of the present invention is to use a light-sensitive material having wavelength dependence of spectral sensitivity by using at least one light source which emits light having a predetermined narrow band wavelength. An image exposure apparatus for exposing, wherein an optical member having a spectral transmission or spectral reflection characteristic that cancels out both characteristics of the light amount characteristic corresponding to the wavelength of the emitted light of the light source and the spectral sensitivity characteristic of the photosensitive material, An image exposure apparatus is provided which is provided in at least one optical path of the emitted light.

In each of the above aspects, the light sources have three kinds of wavelengths different from each other, the photosensitive material is a color photosensitive material that develops three colors by the three light sources, and the optical member is a spectral component of the photosensitive material. It is preferable to arrange it in the optical path of a light source that emits a color having the steepest gradient of sensitivity. Further, it is preferable that the optical member is arranged between a collimator lens that shapes the light emitted from the light source and the photosensitive material.

[0018]

The image exposure apparatus according to the first aspect of the present invention comprises:
Spectral transmission or spectral reflection characteristics that cancel out the spectral sensitivity of the photosensitive material when imagewise exposing the photosensitive material having spectral sensitivity with wavelength dependence using a light source that emits light of at least one predetermined narrow band wavelength. That is, by disposing an optical member such as a filter having an inverse characteristic between at least one of the light sources and the photosensitive material, individual differences in the center wavelength of the light sources, environmental (case) temperature change, and increase due to self-heating. Even if the center wavelength fluctuates due to temperature, the spectral characteristics of the optical member change according to the change in the center wavelength of the light source, so that special correction or adjustment is required for variations or deviations or fluctuations in the center wavelength of the light source. Since the color density can be stabilized without the need, it is possible to always form a uniform monochrome or color image.

In the image exposure apparatus of the second aspect of the present invention, the change of the light emission amount due to the temperature change of the light source, particularly the decrease of the light emission efficiency due to the temperature rise due to self-heating, that is, the spectral transmission for canceling the droop. Alternatively, by disposing an optical member having a spectral reflection characteristic, that is, a spectral characteristic opposite to the relationship between the droop of the light source and the fluctuation of the central wavelength that occurs at the same time, between at least one of the light source and the photosensitive material, When the spectral sensitivity characteristics of the light-sensitive material can be regarded as flat near the center wavelength of the light source, the influence of the droop, that is, the temperature dependence of the light source is reduced, no special correction or adjustment is required, and the color density is always uniform. You can get
A stable concentration can be regenerated.

Further, in the third aspect of the present invention,
Even when imagewise exposing a light source having droop and wavelength variation due to the temperature change to a photosensitive material having wavelength dependence in spectral sensitivity, both the wavelength and emission amount characteristics of the light source and the spectral sensitivity of the photosensitive material are measured. By arranging an optical member for canceling the overall color density-wavelength characteristic between at least one light source and the photosensitive material, the spectral sensitivity characteristic of the photosensitive material and the temperature dependence of the light source are canceled at the same time,
A stable concentration can be regenerated.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The image exposure apparatus of the present invention will be described below in detail with reference to the preferred embodiments shown in the accompanying drawings.

FIG. 1 is a stylized perspective view showing an embodiment of the image exposure apparatus of the present invention.

As shown in the figure, the image exposure apparatus 10 of the present invention uses the color photosensitive material A having the spectral sensitivity shown by the solid line in FIG. 2, and C (cyan) and Y (shown in FIG. 3 respectively. Semiconductor lasers (LD) 12C, 12Y, 12M that emit light having a wavelength and an optical output for coloring yellow) and M (magenta), and these LD1
Collimator lenses 14C, 14Y, 14M and M are arranged along the traveling direction of the light emitted from 2C, 12Y, 12M.
A 3LD light different-angle incident optical system having a correction filter 16M arranged in the color forming optical path, cylindrical lenses 18C, 18Y, 18M, a reflection mirror 20, a polygon mirror 22, an fθ lens 24, and a cylindrical mirror 26. Although not shown, it comprises a sub-scan transporting means for transporting the photosensitive material A in the sub-scan.

The 3LD light different-angle incidence optical system is a light source for emitting light of a predetermined narrow band wavelength, and three semiconductor lasers (LD) 12C, 12Y, 12M which are incident on the reflecting surface 22a of the polygon mirror 22 at slightly different angles. However, as shown in FIG. 3, the LD 12C for developing the cyan color of the dye on the photosensitive material A emits light having a wavelength of 810 nm, and for developing the yellow dye of the photosensitive material A. The LD 12Y emits light having a wavelength of 750 nm, and the LD 12M for developing the magenta dye of the photosensitive material A emits light having a wavelength of 670 nm.

Collimator lenses 14C, 14Y, 14M
Is to shape the lights emitted from the LDs 12C, 12Y, and 12M into parallel lights. The cylindrical lenses 18C, 18Y, and 18M, the fθ lens 24, and the cylindrical mirror 26 form a surface tilt correction optical system, and correct the surface tilt of the polygon mirror 22. here,
Laser light 1 emitted from LD 12C, 12Y, 12M
5C, 15Y, and 15M are reflection surfaces 2 of the polygon mirror 22.
2a is incident on the reflecting surface 22a at slightly different angles.
The LDs 12C, 12Y, 12M are arranged so as to be imaged on the same main scanning line SL on the photosensitive material A at different angles, and to scan on the same main scanning line SL with a time interval. It Therefore, the reflection mirror 20 emits the laser light 15
The optical paths of C, 15Y, and 15M are changed, and all of them are made incident on the same position on the same line of the reflection surface 22a of the polygon mirror 22 or at the same point.

The fθ lens 24 uses the laser beams 15C, 1
This is for correctly forming images of 5Y and 15M at any position of the main scanning line SL. It should be noted that the fθ lens 50 is corrected so that the chromatic aberration falls within an allowable range for light having wavelengths of 670, 750, and 810 nm.
The cylindrical mirror 26 is a cylindrical lens 1.
8C, 18Y, 18M, and a plane tilt correction optical system. In addition, each laser beam 15C, 15Y, 15M is lowered to perform main scanning substantially orthogonal to the sub-scanning direction on the photosensitive material A which is sub-scanned and conveyed. It is directed to the line SL.

The correction filter 16M arranged in the optical path of the laser beam 15M is the most characteristic optical member of the present invention, and is a photosensitive material even when the wavelength variation of the LD 12M, individual difference or reduction of luminous efficiency occurs. It is for stabilizing the color density in A.

First, the correction filter 16M is the first embodiment of the present invention.
The case of the optical member according to the aspect will be described. Here, the correction filter 16M has the wavelength 6 shown in FIG.
It is an optical member having a transmission density characteristic for a wavelength near 70 nm, that is, a spectral transmission characteristic (or spectral transmittance). The spectral transmission characteristic of the correction filter 16M shown in FIG. 4A cancels the spectral sensitivity characteristic of the color development of the magenta dye near the wavelength of 670 nm of the photosensitive material shown in FIG. 2, for example, 670 ± 10 nm. Here, the slope of the transmission density of the filter 16M of FIG. 4A is equal to the slope of the spectral sensitivity of FIG. 2 in the vicinity of the wavelength of 670 nm.

By inserting such a correction filter 16M between the collimator lens 14M and the photosensitive material A, the LD 12M has individual differences and a center wavelength deviated from the set center wavelength, for example, a range of wavelength 670 ± 10 nm. At any wavelength in the filter 16M, even if the wavelength fluctuates due to the temperature rise due to self-heating of the LD 12, the transmission density of the filter 16M changes according to the change in the wavelength. The M color density of the photosensitive material A due to the laser beam 15M that has passed through is constant regardless of the change in wavelength.

By the way, in the example shown in FIG. 1, the correction filter is inserted only in the magenta (M) coloring laser beam 15M, but the filter having the spectral transmission characteristics shown in FIGS. 4B and 4C. At least one of 16Y and 16C is yellow (Y) coloring laser light 15Y, cyan (C)
It may be inserted into the coloring laser beam 15C. Further, in the present invention, among the spectral sensitivity of the three colors of the photosensitive material A, it is preferable to dispose the correction filter from the laser beam having the steepest wavelength to the required number of laser beams.

Further, the correction filter 16M (16Y, 16Y
The insertion position of C) is the laser beam 15M (15Y, 15C)
Is parallel light, the collimator lens 14M (14Y, 14C) and the cylindrical lens 18 are
The distance between M (18Y, 18C) is preferable, but not limited to this. For example, between LD 12M (12Y, 12C) and collimator lens 14M (14Y, 14C) or cylindrical lens 18M (18Y, 18C). And the polygon mirror 22.

An interference filter whose transmission density depends on the wavelength can be used as the correction filter in which the transmission density of the narrow band wavelength light changes at a predetermined rate depending on the wavelength. As a method of keeping the transmission density of a predetermined inclination in this interference filter, there can be mentioned a method of stacking a required number of dielectric layers on a glass plate, that is, a method of manufacturing a multilayer interference filter. That is, in the present invention, it is preferable to use a multilayer interference filter having a predetermined transmission density characteristic for a specific wavelength band as a correction filter.

As shown in FIG. 5A, when the LD is driven by a constant current, the temperature of the LD rises due to self-heating, the oscillation wavelength is extended and the light emission efficiency is lowered, that is, droop occurs. Therefore, in the LD, the relationship between the light emission efficiency due to temperature change and the wavelength is as shown in the graph of FIG.

Here, the correction filter 16M used as the optical member according to the second aspect of the present invention will be described.
In this embodiment, a photosensitive material whose spectral sensitivity as shown in FIG. 6 can be regarded as flat in the vicinity of the oscillation wavelengths of the exposure LDs 12C, 12Y and 12M is used as the photosensitive material.

Therefore, the correction filter 16M of this embodiment
Is a filter that cancels the droop of the LD 12M, and has a transmission density characteristic shown in FIG.
This is the slope opposite to the slope of the emission efficiency (light amount) -wavelength characteristic of the LD 12M shown in (b).

Therefore, even if the LD 12M rises in temperature due to self-heating and causes a droop as the oscillation wavelength expands, the light amount of the laser light 15M transmitted through the correction filter 16M is constant, so that the color density of the photosensitive material is stable. It will be homogeneous.

Next, the correction filter 16M used as the optical member of the third aspect of the present invention will be described. In the present embodiment, the photosensitive material A having the wavelength dependence of the spectral sensitivity as shown in FIG. 2 is used by the LD 12M having the temperature dependence as shown in FIG.
Light emission amount-wavelength characteristic of LD12M shown in (b) and FIG.
The total characteristics (coloring density-wavelength characteristics) shown in FIG. 8 in which both the spectral sensitivity (coloring density-wavelength) characteristics of the specific color of the photosensitive material A shown in FIG.

Therefore, the correction filter 16M of this embodiment is
It has a transmission density-wavelength characteristic (spectral transmission characteristic) shown in FIG. The inclination of the spectral transmission characteristic of the correction filter 16M shows an inclination opposite to the inclination of the overall characteristic shown in FIG.

As a result, in the image exposure apparatus of this embodiment, the overall characteristics of the spectral sensitivity of the photosensitive material, the wavelength extension and the decrease in the amount of light emission (droop) due to the temperature rise due to self-heating of the light emitting element (LD). Since the correction filter that cancels out is disposed in the optical path of the laser light, even if wavelength variation or droop occurs in the light emitting element, it is possible to cancel the spectral characteristics of the photosensitive material and the temperature dependence of the light emitting element. The color density of the photosensitive material exposed by the laser beam transmitted through the correction filter is stable and uniform.

In the above second and third aspects of the present invention,
The correction filter may be arranged in order from the laser light of the wavelength having the largest droop among the laser light of the three wavelengths to the laser light of the required wavelength of 1 wavelength, 2 wavelengths, and 3 wavelengths in order. Further, the arrangement position of the correction filter is not limited to the same as in the first aspect of the present invention.

In the present invention, the light-sensitive material may be monochrome or color, and one or three light sources may be used accordingly, but the invention is not limited thereto, and the color light-sensitive material may be used. Exposure may be performed with two light sources, or four light sources may be used with the color light-sensitive material having four primary colors and black.

In the above-mentioned example, the correction filter is inserted in the optical path to transmit the light, and the color density of the photosensitive material is stabilized by the spectral transmission characteristic. However, the correction filter arranged in the optical path reflects the light. The color density of the light-sensitive material may be stabilized by the spectral reflection characteristic.

[0043]

According to the first aspect of the present invention, when a light-sensitive material having a spectral sensitivity wavelength dependence is imagewise exposed by using at least one light source which emits light having a predetermined narrow band wavelength. By disposing an optical member such as a filter having a spectral transmission or spectral reflection characteristic for canceling the spectral sensitivity of the light-sensitive material, that is, an inverse characteristic between at least one of the light sources and the light-sensitive material, Even if the center wavelength fluctuates due to individual differences in wavelength, environmental (case) temperature changes, and temperature rise due to self-heating, the spectral characteristics of the optical member change according to the change in the center wavelength of the light source, so the center of the light source It is possible to form a uniform monochrome or color image at all times, because it is possible to stabilize the color density without requiring special correction or adjustment for wavelength variations, shifts, or fluctuations. Kill.

According to the second aspect of the present invention, a change in the amount of light emission due to a change in the temperature of the light source, particularly a decrease in light emission efficiency due to a temperature rise caused by self-heating, that is, a spectral transmission or spectral reflection characteristic that cancels droop. That is, by disposing an optical member having a spectral characteristic opposite to the relationship between the droop of the light source and the fluctuation of the central wavelength occurring at the same time between at least one of the light source and the photosensitive material, When the sensitivity characteristic can be regarded as flat in the vicinity of the central wavelength of the light source, the influence of the droop, that is, the temperature dependence of the light source is reduced, and no special correction or adjustment is required,
It is possible to always obtain a uniform coloring temperature and reproduce a stable density.

Furthermore, according to the third aspect of the present invention, even when a light source having droop and wavelength fluctuation due to the temperature change is imagewise exposed to a photosensitive material having spectral sensitivity wavelength dependence. By disposing an optical member for canceling the color density-wavelength characteristic, which is a combination of both wavelength and luminescence amount characteristics and spectral sensitivity of the photosensitive material, between at least one light source and the photosensitive material, the spectral distribution of the photosensitive material is improved. The sensitivity characteristics and the temperature dependence of the light source can be canceled at the same time to reproduce a stable density.

[Brief description of drawings]

FIG. 1 is a schematic diagram of an embodiment of an image exposure apparatus according to the present invention.

FIG. 2 is a graph showing an example of spectral sensitivity of a photosensitive material used in the present invention.

FIG. 3 is a graph showing an example of light output of a light source used in the present invention.

4 (a), (b) and (c) are graphs showing examples of transmission density-wavelength characteristics of an optical member used in the present invention.

FIG. 5A is a graph showing an example of temperature dependence of a light source used in the present invention, and FIG. 5B is a graph showing an example of luminous efficiency-wavelength characteristics thereof.

FIG. 6 is a graph showing another example of the spectral sensitivity of the photosensitive material used in the present invention.

FIG. 7 is a graph showing another example of transmission density-wavelength characteristics of the optical member used in the present invention.

FIG. 8 is a graph showing general characteristics of a light-sensitive material and a light source used in the present invention.

FIG. 9 is a graph showing another example of transmission density-wavelength characteristics of the optical member used in the present invention.

FIG. 10 is a graph showing an example of light output-current characteristics of the light source used in the present invention.

FIG. 11 is a graph showing an example of wavelength-temperature characteristics of the light source used in the present invention.

[Explanation of symbols]

 10 Image exposure device 12C, 12M, 12Y Semiconductor laser 14C, 14M, 14Y Collimator lens 15C, 15M, 15Y Laser light 16C, 16M, 16Y Correction filter 18C, 18M, 18Y Cylindrical lens 20 Mirror 22 Polygon mirror 24 fθ lens 26 Cylindrical mirror 26

Claims (3)

[Claims] 1. An image exposure apparatus for exposing a photosensitive material having wavelength dependence in spectral sensitivity by using at least one light source that emits light having a predetermined narrow band wavelength, wherein the spectral sensitivity characteristic of the photosensitive material is An image exposure apparatus, comprising an optical member having a canceling spectral transmission or spectral reflection characteristic in at least one optical path of the emitted light. 2. An image exposure apparatus for exposing a photosensitive material by using at least one light source that emits light of a predetermined narrow band wavelength, and cancels the characteristic of the amount of light corresponding to the wavelength of the emitted light of the light source. An image exposure apparatus, comprising: an optical member having a spectral transmission or spectral reflection characteristic that is provided in at least one optical path of the emitted light. 3. An image exposure apparatus for exposing a photosensitive material having wavelength dependence of spectral sensitivity using at least one light source for emitting light of a predetermined narrow band wavelength, the wavelength of the emitted light of the light source. And an optical member having a spectral transmission or spectral reflection characteristic that cancels out both the characteristic of the light amount corresponding to the above and the spectral sensitivity characteristic of the photosensitive material in at least one optical path of the emitted light. Exposure equipment.