JPH0542568A - Back-flow preventing apparatus for injection molding machine - Google Patents
Back-flow preventing apparatus for injection molding machineInfo
- Publication number
- JPH0542568A JPH0542568A JP20172491A JP20172491A JPH0542568A JP H0542568 A JPH0542568 A JP H0542568A JP 20172491 A JP20172491 A JP 20172491A JP 20172491 A JP20172491 A JP 20172491A JP H0542568 A JPH0542568 A JP H0542568A
- Authority
- JP
- Japan
- Prior art keywords
- backflow prevention
- injection molding
- diamond
- molding machine
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/46—Means for plasticising or homogenising the moulding material or forcing it into the mould
- B29C45/47—Means for plasticising or homogenising the moulding material or forcing it into the mould using screws
- B29C45/50—Axially movable screw
- B29C45/52—Non-return devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/46—Means for plasticising or homogenising the moulding material or forcing it into the mould
- B29C45/47—Means for plasticising or homogenising the moulding material or forcing it into the mould using screws
- B29C45/50—Axially movable screw
- B29C45/52—Non-return devices
- B29C2045/526—Abrasion resistant means in the screw head or non-return device
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、射出成形機の逆流防止
装置に関し、特に、逆流防止リングの面にダイヤモンド
又はダイヤモンド状炭素膜からなる膜体を形成し、耐摩
耗性及び摺動性を向上させるための新規な改良に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a backflow prevention device for an injection molding machine, and more particularly, a backflow prevention ring is provided with a film body made of diamond or a diamond-like carbon film to improve wear resistance and slidability. It relates to new improvements to improve.
【０００２】[0002]
【従来の技術】従来、用いられていたこの種の射出成形
機の逆流防止装置としては種々あるが、その中で代表的
なものについて述べると、図７で示される実開平３−44
83号公報に開示された構成を挙げることができる。すな
わち、図７において、符号１で示されるものはスクリュ
ーヘッドであり、このスクリューヘッド１の細径部１ａ
に連続して形成された段部１ｂには、セラミック製の摩
擦リング２が設けられている。前記細径部１ａには、筒
形の押金３が設けられていると共に、この押金３の外周
位置には、この押金３の外周３ａよりも大きい内径部４
ａを有する逆流防止リング４が摺動自在に設けられてい
る。2. Description of the Related Art There are various types of backflow preventive devices for injection molding machines of this type that have been conventionally used. A typical one of them is shown in FIG.
The structure disclosed in Japanese Patent No. 83 can be mentioned. That is, in FIG. 7, what is indicated by reference numeral 1 is a screw head, and the small diameter portion 1 a of the screw head 1 is
A friction ring 2 made of ceramic is provided on the step portion 1b formed continuously with the above. The small diameter portion 1a is provided with a cylindrical pusher 3, and an inner diameter portion 4 larger than the outer circumference 3a of the pusher 3 is provided at an outer peripheral position of the pusher 3.
A backflow prevention ring 4 having a is slidably provided.
【０００３】[0003]
【発明が解決しようとする課題】従来の射出成形機の逆
流防止装置は、以上のように構成されていたため、次の
ような課題が存在していた。すなわち、摩擦リングのみ
をセラミック製（窒化ケイ素焼結体、ジルコニア焼結
体）としていたが、セラミックであるにも拘わらず、長
時間使用に対しては摩耗を避けることはできず、摩耗・
変形による射出成形機としての不具合を防止することは
不可能であった。また、逆流防止リング自体は金属製で
あったため、摩耗・変形による動作変化を防止すること
は不可能であった。Since the conventional backflow prevention device for the injection molding machine is constructed as described above, the following problems exist. That is, although only the friction ring was made of ceramic (silicon nitride sintered body, zirconia sintered body), even though it was ceramic, wear could not be avoided for long-term use.
It was impossible to prevent the malfunction of the injection molding machine due to the deformation. Further, since the backflow prevention ring itself is made of metal, it is impossible to prevent the change in operation due to wear and deformation.
【０００４】本発明は、以上のような課題を解決するた
めになされたもので、特に、逆流防止リングの面にダイ
ヤモンド又はダイヤモンド状炭素からなる膜体を形成
し、耐摩耗性及び摺動性を向上させるようにした射出成
形機の逆流防止装置を提供することを目的とする。The present invention has been made to solve the above problems, and in particular, a film body made of diamond or diamond-like carbon is formed on the surface of a backflow prevention ring to provide wear resistance and slidability. It is an object of the present invention to provide a backflow prevention device for an injection molding machine, which is improved.
【０００５】[0005]
【課題を解決するための手段】本発明による射出成形機
の逆流防止装置は、射出成形機のスクリューヘッドの外
周位置に作動自在に設けられた逆流防止リングを有する
構成よりなる射出成形機の逆流防止装置において、前記
逆流防止リングには、ダイヤモンド又はダイヤモンド状
炭素膜からなる膜体が形成された構成である。A backflow preventer for an injection molding machine according to the present invention is a backflow preventer for an injection molding machine having a backflow prevention ring operably provided at an outer peripheral position of a screw head of the injection molding machine. In the prevention device, the backflow prevention ring has a structure in which a film body made of diamond or a diamond-like carbon film is formed.
【０００６】さらに詳細には、前記スクリューヘッドに
は、前記膜体が形成された構成である。More specifically, the screw head is formed with the film body.
【０００７】[0007]
【作用】本発明による射出成形機の逆流防止装置におい
ては、逆流防止リングの面にダイヤモンド又はダイヤモ
ンド状炭素膜からなる膜体が形成されているため、逆流
防止リングの耐摩耗、摺動性の特性が大幅に向上し、そ
のため、稼動中におけるかじりによる異物の混入が少な
くなり、成形品の性能がより向上する。また、逆流防止
リングの寿命を長くすることができ、コストダウンを達
成することができる。In the backflow prevention device of the injection molding machine according to the present invention, since the backflow prevention ring has a film body formed of a diamond or diamond-like carbon film, the backflow prevention ring has a wear resistance and a sliding property. The characteristics are significantly improved, and therefore, foreign substances are less likely to be mixed in due to galling during operation, and the performance of the molded product is further improved. In addition, the life of the backflow prevention ring can be extended, and cost reduction can be achieved.
【０００８】[0008]
【実施例】本発明による射出成形機の逆流防止装置の好
適な実施例について詳細に説明する。なお、従来例と同
一又は同等部分には、同一符号を付して説明する。図１
から図６までは本発明による射出成形機の逆流防止装置
を示すもので、図１は半断面図、図２は逆流防止リング
にダイヤモンドの膜体をマイクロ波プラズマＣＶＤ法に
より形成させる状態を示す構成図、図３は図２の要部を
示す拡大構成図、図４はＥＡ（電子衝突）ＣＶＤ法によ
る実施例を示す構成図、図５は燃焼炎法による実施例を
示す構成図、図６はＥＣＲプラズマＣＶＤ法による実施
例を示す構成図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the backflow prevention device for an injection molding machine according to the present invention will be described in detail. It should be noted that the same or equivalent parts as those of the conventional example will be described by attaching the same reference numerals. Figure 1
1 to 6 show a backflow prevention device for an injection molding machine according to the present invention. FIG. 1 is a half sectional view, and FIG. 2 shows a state in which a diamond film is formed on a backflow prevention ring by a microwave plasma CVD method. Configuration diagram, FIG. 3 is an enlarged configuration diagram showing a main part of FIG. 2, FIG. 4 is a configuration diagram showing an embodiment by an EA (electron collision) CVD method, and FIG. 5 is a configuration diagram showing an embodiment by a combustion flame method. 6 is a configuration diagram showing an embodiment by the ECR plasma CVD method.
【０００９】図１において符号１で示されるものは、ス
クリューヘッドであり、このスクリューヘッド１の細径
部１ａに連続して形成された段部１ｂには、摩擦リング
２が設けられている。前記細径部１ａには、筒形の押金
３が設けられていると共に、この押金３の外周位置に
は、この押金３の外周３ａよりも大きい内径部４ａを有
する逆流防止リング４が摺動自在に設けられている。A screw head is designated by reference numeral 1 in FIG. 1. A friction ring 2 is provided on a step portion 1b formed continuously with the small diameter portion 1a of the screw head 1. The small diameter portion 1a is provided with a cylindrical pusher 3, and a backflow prevention ring 4 having an inner diameter portion 4a larger than the outer circumference 3a of the pusher 3 slides on the outer peripheral position of the pusher 3. It is provided freely.
【００１０】前記逆流防止リング４の面には、ダイヤモ
ンド又はダイヤモンド状炭素膜からなる膜体８が形成さ
れており、この膜体８は、図２から図６で示すマイクロ
波プラズマＣＶＤ法、ＥＡＣＶＤ法、燃焼炎法、ＥＣＲ
プラズマＣＶＤ法の何れかににより形成されている。A film body 8 made of a diamond or diamond-like carbon film is formed on the surface of the backflow prevention ring 4, and the film body 8 is formed by the microwave plasma CVD method or EACVD shown in FIGS. 2 to 6. Method, combustion flame method, ECR
It is formed by any of the plasma CVD methods.
【００１１】図２において符号１０で示されるものはマ
イクロ波発振機であり、このマイクロ波発振機１０は、
導波管１１を介して、石英等からなり、周知のプラズマ
ＣＶＤ法による反応を起こすための反応室１２に接続さ
れている。2 is a microwave oscillator, and this microwave oscillator 10 is
The waveguide 11 is connected to a reaction chamber 12 made of quartz or the like for causing a reaction by a well-known plasma CVD method.
【００１２】前記反応室１２は縦長形に構成されている
と共に、この反応室１２の下部には、この反応室１２内
を減圧状態に保持するための排気装置１２Ａが排気系バ
ルブ１３を介して接続されている。The reaction chamber 12 is formed in a vertically long shape, and an exhaust device 12A for keeping the inside of the reaction chamber 12 in a depressurized state is provided below the reaction chamber 12 via an exhaust system valve 13. It is connected.
【００１３】前記反応室１２内には、支持体１４に支持
された試料台１５が設けられており、この試料台１５上
には、例えばＳｉＣ等からなる逆流防止リング４が母材
として載置されていると共に、この試料台１５及び支持
体１４に対応する内壁１２ａには、前記マイクロ波発振
機１０からのマイクロ波１０ａを吸収するための黒鉛等
からなるマイクロ吸収剤１６が配設されている。また、
符号２５は、マイクロ波１０ａを逆流防止リング４の内
周面へ導くため試料台１５に植設されたアンテナであ
る。A sample stage 15 supported by a support 14 is provided in the reaction chamber 12, and a backflow prevention ring 4 made of, for example, SiC is mounted on the sample stage 15 as a base material. At the same time, the inner wall 12a corresponding to the sample stage 15 and the support 14 is provided with a micro absorbent 16 made of graphite or the like for absorbing the microwave 10a from the microwave oscillator 10. There is. Also,
Reference numeral 25 is an antenna implanted in the sample table 15 for guiding the microwave 10a to the inner peripheral surface of the backflow prevention ring 4.
【００１４】前記反応室１２の上部には、酸素ガス１７
ａを内蔵した酸素ガスボンベ１７が第１バルブ１８を介
して接続されていると共に、さらに、含炭素化合物であ
るアセチレンガス１９ａを内蔵したアセチレンガスボン
ベ１９が第２バルブ２０を介して接続されている。On top of the reaction chamber 12, oxygen gas 17
An oxygen gas cylinder 17 containing a is connected via a first valve 18, and an acetylene gas cylinder 19 containing an acetylene gas 19a, which is a carbon-containing compound, is connected via a second valve 20.
【００１５】従って、マイクロ波発振機１０を所定の出
力で起動させ、導波管１１を通じて反応室１２内にマイ
クロ波１０ａを導入することにより、図２に示すよう
に、マイクロ波１０ａが逆流防止リング４の面に導か
れ、プラズマが発生する。また、反応室１２内に導入さ
れたマイクロ波１０ａは、アンテナ２５によって逆流防
止リング４の内周面にもプラズマが発生する。Therefore, by starting the microwave oscillator 10 with a predetermined output and introducing the microwave 10a into the reaction chamber 12 through the waveguide 11, the microwave 10a is prevented from backflowing, as shown in FIG. The plasma is generated by being guided to the surface of the ring 4. The microwaves 10 a introduced into the reaction chamber 12 also generate plasma on the inner peripheral surface of the backflow prevention ring 4 by the antenna 25.
【００１６】この状態で、各バルブ１８，２０を開弁し
て酸素ガス(０2)及び含炭素ガスであるアセチレンガス
(Ｃ2Ｈ2)を反応室１２内に供給すると、マイクロ波１０
ａによって加熱された逆流防止リング４の面において、
アセチレンガス１９ａ中の炭素化合物の分解及び酸素ガ
ス１７ａの作用によって、多角状のダイヤモンド膜より
なる膜体８の析出が行われる。In this state, the valves 18 and 20 are opened to open oxygen gas (0 2 ) and acetylene gas which is a carbon-containing gas.
When (C 2 H 2 ) is supplied into the reaction chamber 12, the microwave 10
On the surface of the backflow prevention ring 4 heated by a,
Due to the decomposition of the carbon compound in the acetylene gas 19a and the action of the oxygen gas 17a, the film body 8 made of a polygonal diamond film is deposited.
【００１７】実験例１ 前記逆流防止リング４をＳｉＣ基材とし、排気装置１２
Ａによって反応室１２内を真空排気し、排気後、以下の
条件でダイヤモンド膜の合成を行った。 マイクロ波出力 ４００Ｗ 真空度 ４０Torr Ｃ2Ｈ2流量 ５０sccM Ｏ2 流量 １５sccM 合成時間 ５時間 前述の合成終了後、逆流防止リングを取り出して顕微鏡
で観察した結果、自形の明確な多結晶ダイヤモンドから
なる約６μmのダイヤモンドの膜体８が観察された。Experimental Example 1 The backflow prevention ring 4 is made of a SiC base material, and an exhaust device 12 is used.
The reaction chamber 12 was evacuated by A, and after evacuating, the diamond film was synthesized under the following conditions. Microwave output 400W Vacuum 40 Torr C 2 H 2 flow rate 50sccM O 2 flow rate 15sccM Synthesis time 5 hours After completion of the above synthesis, the backflow prevention ring was taken out and observed with a microscope. A 6 μm diamond film body 8 was observed.
【００１８】実験例２ ＥＡＣＶＤ法＋燃焼炎法（図４，５で示す） 図４に示すように反応室１２内の逆流防止リング４内に
フィラメント３０が設けられていると共に、試料台１５
に電圧が印加され、フィラメント３０と試料台１５との
間に電位差（試料台＋，フィラメント−）が設けられて
いる。ＳＫＨ製逆流防止リング４を用い、まず、ＥＡＣ
ＶＤ法で、逆流防止リング４内筒へフィラメント３０を
通し、以下の条件で成膜した。 フィラメント温度 ２０００℃ 電位差 １００Ｖ 真空度 ３０Torr ＣＨ4流量 ６SCCM Ｈ2 流量 ２００SCCM ５時間後、逆流防止リング４を取り出して観察したとこ
ろ、逆流防止リング４の内筒部及び上面下面の一部に成
膜されていた。次に、図５に示すように、燃焼炎法によ
り、逆流防止リング４内へ水冷用銅パイプ３１を通しト
ーチ３２を用いた状態で、以下の条件で表面を成膜し
た。 Ｃ2Ｈ2／０2流量比 １０／９ 基板トーチ間距離 ７mm ５分の成膜ののちに、冷却し、逆流防止リング４を取り
外して観察したところ、表面に成膜されていた。膜厚は
外筒、内筒とも約５μm程度であった。Experimental Example 2 EACVD method + combustion flame method (shown in FIGS. 4 and 5) As shown in FIG. 4, a filament 30 is provided in the backflow prevention ring 4 in the reaction chamber 12, and the sample table 15 is provided.
A voltage is applied to the filament 30 and a potential difference (sample stage +, filament −) is provided between the filament 30 and the sample stage 15. Using SKH backflow prevention ring 4, first, EAC
The filament 30 was passed through the inner cylinder of the backflow prevention ring 4 by the VD method, and a film was formed under the following conditions. Filament temperature 2000 ° C Potential difference 100V Vacuum degree 30 Torr CH 4 flow rate 6 SCC M H 2 flow rate 200 SCC M After 5 hours, the backflow prevention ring 4 was taken out and observed. Was deposited on. Next, as shown in FIG. 5, a surface was formed by a combustion flame method under the following conditions while passing the water cooling copper pipe 31 through the backflow prevention ring 4 and using the torch 32. C 2 H 2 / O 2 flow rate ratio 10/9 Substrate torch distance 7 mm After film formation for 5 minutes, the film was cooled and the backflow prevention ring 4 was removed. Observation revealed that a film was formed on the surface. The film thickness was about 5 μm for both the outer cylinder and the inner cylinder.
【００１９】実験例３ ＥＣＲプラズマＣＶＤ法（図６で示す） Ｓｉ3Ｎ4製逆流防止リング４を回転させつつ保持して用
い、以下の条件でダイヤモンド状炭素膜からなる膜体８
を成膜した。 ＣＨ4流量 ５０SCCM Ｈ2流量 １０SCCM マイクロ波出力 １ＫＷ ＲＦバイアス １００Ｗ 真空度 ３.０×１０-4Torr １時間の成膜後、約５μmのダイヤモンド状炭素膜が生
成していた。Experimental Example 3 ECR plasma CVD method (shown in FIG. 6) A Si 3 N 4 backflow prevention ring 4 was used while being rotated, and a film body 8 made of a diamond-like carbon film was used under the following conditions.
Was deposited. CH 4 flow rate 50 SCC MH 2 flow rate 10 SCC M microwave output 1 kW RF bias 100 W vacuum degree 3.0 × 10 −4 Torr After film formation for 1 hour, a diamond-like carbon film of about 5 μm was formed.
【００２０】以上の逆流防止リングと通常のＳＫＨ製リ
ングを用いて、射出成形したところ、いずれも、摩耗が
少なく極めて良好な耐摩耗性、摺動性が得られた。次
に、以上の各実験例１，２，３によって製作した逆流防
止リング４の摩耗量を各々比較すると下記表１の通りで
あり、従来例（比較例）よりも大幅に向上していること
が明らかである。なお表１はセラミック粉末成形におけ
る５００ショット後の逆流防止リングの摩耗量を示した
ものである。When injection molding was carried out using the above-mentioned backflow prevention ring and a normal SKH ring, in both cases, very little wear was obtained and extremely good wear resistance and slidability were obtained. Next, when comparing the amounts of wear of the backflow prevention rings 4 manufactured by the above-described Experimental Examples 1, 2, and 3, respectively, the results are shown in Table 1 below, which is significantly improved over the conventional example (comparative example). Is clear. Table 1 shows the amount of wear of the backflow prevention ring after 500 shots in ceramic powder molding.
【００２１】[0021]
【表１】 なお、本実施例においては、逆流防止リング４のみに膜
体８を形成した場合について述べたが、スクリューヘッ
ド自体に前記膜体８を形成した場合も、逆流防止リング
４との相乗効果により、より一層顕著な効果を得ること
ができる。また、前述のガスは、Ｃ2Ｈ2−０2系に限る
ことなく、ＣＨ4−Ｈ2系、ＣＨ4−Ｏ2系、Ｃ2Ｈ2−Ｈ2
系、ＣＯ−Ｈ2系の場合でもダイヤモンドの合成が可能
である。[Table 1] In addition, in the present embodiment, the case where the film body 8 is formed only on the backflow prevention ring 4 is described, but even when the film body 8 is formed on the screw head itself, due to the synergistic effect with the backflow prevention ring 4, An even more remarkable effect can be obtained. Further, the foregoing gas is not limited to C 2 H 2 -0 2 system, CH 4 -H 2 system, CH 4 -O 2 system, C 2 H 2 -H 2
It is possible to synthesize diamond even in the case of CO-H 2 system and CO-H 2 system.
【００２２】[0022]
【発明の効果】本発明による射出成形機の逆流防止装置
は、以上のように構成されているため、次のような効果
を得ることができる。すなわち、逆流防止リングにダイ
ヤモンド又はダイヤモンド状炭素膜よりなる膜体が形成
されているため、耐摩耗性及び摺動性に秀れた逆流防止
装置を得ることができる。また、逆流防止リングの面の
耐摩耗性が高いため、かじりによる異物の混入が少なく
装置の性能及び寿命の向上を得ることができる。Since the backflow prevention device for the injection molding machine according to the present invention is configured as described above, the following effects can be obtained. That is, since a film body made of diamond or a diamond-like carbon film is formed on the backflow prevention ring, a backflow prevention device having excellent wear resistance and slidability can be obtained. Further, since the surface of the backflow prevention ring has high wear resistance, foreign substances due to galling are less mixed, and the performance and life of the device can be improved.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明による射出成形機の逆流防止装置を示す
半断面図である。FIG. 1 is a half sectional view showing a backflow prevention device of an injection molding machine according to the present invention.
【図２】図２は逆流防止リングにダイヤモンドの膜体を
マイクロ波プラズマＣＶＤ法により形成させる状態を示
す構成図である。FIG. 2 is a configuration diagram showing a state in which a diamond film body is formed on a backflow prevention ring by a microwave plasma CVD method.
【図３】図２の要部を示す拡大構成図である。FIG. 3 is an enlarged configuration diagram showing a main part of FIG.
【図４】ＥＡＣＶＤ法による実施例を示す構成図であ
る。FIG. 4 is a configuration diagram showing an example by an EACVD method.
【図５】燃焼炎法による実施例を示す構成図である。FIG. 5 is a configuration diagram showing an embodiment by a combustion flame method.
【図６】ＥＣＲプラズマＣＶＤ法による実施例を示す構
成図である。FIG. 6 is a configuration diagram showing an example by an ECR plasma CVD method.
【図７】従来の射出成形機の逆流防止装置を示す半断面
図である。FIG. 7 is a half cross-sectional view showing a backflow prevention device of a conventional injection molding machine.
１ スクリューヘッド ４ 逆流防止リング ８ 膜体 1 Screw head 4 Backflow prevention ring 8 Membrane body
───────────────────────────────────────────────────── フロントページの続き (72)発明者 三浦 毅 千葉県四街道市鷹の台一丁目３番 株式会 社日本製鋼所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takeshi Miura 1-3, Takanodai, Yotsukaido-shi, Chiba Stock Company Japan Steel Works
Claims (2)
周位置に作動自在に設けられた逆流防止リング(4)を有
する構成よりなる射出成形機の逆流防止装置において、
前記逆流防止リング(4)には、ダイヤモンド又はダイヤ
モンド状炭素膜からなる膜体(8)が形成された構成より
なることを特徴とする射出成形機の逆流防止装置。A backflow prevention device for an injection molding machine, comprising a backflow prevention ring (4) operably provided at an outer peripheral position of a screw head (1) of the injection molding machine,
The backflow prevention device for an injection molding machine, wherein the backflow prevention ring (4) has a structure in which a film body (8) made of a diamond or a diamond-like carbon film is formed.
体(8)が形成された構成よりなることを特徴とする請求
項１記載の射出成形機の逆流防止装置。2. The backflow prevention device for an injection molding machine according to claim 1, wherein the screw head (1) has a structure in which the film body (8) is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20172491A JPH0542568A (en) | 1991-08-12 | 1991-08-12 | Back-flow preventing apparatus for injection molding machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20172491A JPH0542568A (en) | 1991-08-12 | 1991-08-12 | Back-flow preventing apparatus for injection molding machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0542568A true JPH0542568A (en) | 1993-02-23 |
Family
ID=16445885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20172491A Pending JPH0542568A (en) | 1991-08-12 | 1991-08-12 | Back-flow preventing apparatus for injection molding machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0542568A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007079836A1 (en) * | 2005-12-28 | 2007-07-19 | Günther Heisskanaltechnik Gmbh | Actuating device for shut-off needles in injection moulding devices comprising needle shut-off nozzles |
| WO2011006648A1 (en) | 2009-07-17 | 2011-01-20 | Fraunhofer-Gesellschaft Zur Förderung Der... | Device for producing plastic molded parts and the use thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230016A (en) * | 1985-08-01 | 1987-02-09 | Hitachi Metals Ltd | Corrosion-resistant and wearproof screw head |
| JPS6360617B2 (en) * | 1982-02-16 | 1988-11-25 |
-
1991
- 1991-08-12 JP JP20172491A patent/JPH0542568A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6360617B2 (en) * | 1982-02-16 | 1988-11-25 | ||
| JPS6230016A (en) * | 1985-08-01 | 1987-02-09 | Hitachi Metals Ltd | Corrosion-resistant and wearproof screw head |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007079836A1 (en) * | 2005-12-28 | 2007-07-19 | Günther Heisskanaltechnik Gmbh | Actuating device for shut-off needles in injection moulding devices comprising needle shut-off nozzles |
| US7815431B2 (en) | 2005-12-28 | 2010-10-19 | Gunther Heisskanaltechnik Gmbh | Actuating device for shut-off needles in injection molding devices comprising needle shut-off nozzles |
| WO2011006648A1 (en) | 2009-07-17 | 2011-01-20 | Fraunhofer-Gesellschaft Zur Förderung Der... | Device for producing plastic molded parts and the use thereof |
| DE102009033681A1 (en) * | 2009-07-17 | 2011-02-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for the production of plastic moldings and their use |
| US8684726B2 (en) | 2009-07-17 | 2014-04-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for producing plastic molded parts having a locking ring with a wear resistant material |
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