JPH0537473Y2 - - Google Patents
Info
- Publication number
- JPH0537473Y2 JPH0537473Y2 JP16999688U JP16999688U JPH0537473Y2 JP H0537473 Y2 JPH0537473 Y2 JP H0537473Y2 JP 16999688 U JP16999688 U JP 16999688U JP 16999688 U JP16999688 U JP 16999688U JP H0537473 Y2 JPH0537473 Y2 JP H0537473Y2
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- temperature
- chemical liquid
- heating device
- chemical solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000126 substance Substances 0.000 claims description 63
- 239000007788 liquid Substances 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 13
- 230000005674 electromagnetic induction Effects 0.000 claims description 9
- 239000000243 solution Substances 0.000 description 20
- 235000012431 wafers Nutrition 0.000 description 11
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910001120 nichrome Inorganic materials 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 239000008155 medical solution Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
Landscapes
- Weting (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は、半導体ウエーハを化学処理するため
の薬液加熱装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a chemical liquid heating device for chemically processing semiconductor wafers.
従来、この種の薬液加熱装置は、ウエーハのエ
ツチング処理、あるいは洗浄等の工程に使用され
るもので、薬液、例えば、酸、アルカリ、有機溶
剤等を薬液槽に入れ、この薬液を温度50〜200℃
に加熱し、ウエーハを薬液槽の薬液に浸し処理を
行つていた。
Conventionally, this type of chemical heating device is used in processes such as etching or cleaning wafers.A chemical, such as an acid, an alkali, or an organic solvent, is placed in a chemical tank and heated to a temperature of 50 to 50°C. 200℃
The process was carried out by heating the wafer to a temperature of
第３図は従来の一例を示す薬液加熱装置の断面
図である。この薬液加熱装置は、薬液２が満たさ
れた薬液槽１にニクロム線等の発熱体を石英管に
封止したヒータ１５を入れ、このヒータ１５に電
流を流し発熱させ、薬液２を所定の温度に加熱さ
せていた。 FIG. 3 is a sectional view of a conventional chemical liquid heating device. In this chemical solution heating device, a heater 15 in which a heating element such as a nichrome wire is sealed in a quartz tube is placed in a chemical solution tank 1 filled with a chemical solution 2, and an electric current is passed through the heater 15 to generate heat to maintain the chemical solution 2 at a predetermined temperature. It was heated to
〔考案が解決しようとする課題〕
上述した従来の薬液加熱装置では、ニクロム線
のような発熱体が挿入されている石英管が薬液に
侵され、しばしば、石英管にピンホールが生ず
る。このため、石英管内に侵入した薬液によりニ
クロム線が溶解され、薬液中に重金属が溶出し、
薬液が汚染する。この溶出した重金属が処理中の
ウエーハに付着し、半導体装置の性能及び信頼性
を劣化させるという問題がある。[Problems to be Solved by the Invention] In the conventional chemical liquid heating device described above, the quartz tube into which a heating element such as a nichrome wire is inserted is eroded by the chemical liquid, and pinholes are often formed in the quartz tube. For this reason, the nichrome wire is dissolved by the chemical solution that has entered the quartz tube, and heavy metals are eluted into the chemical solution.
The chemical solution becomes contaminated. There is a problem in that the eluted heavy metals adhere to wafers being processed, deteriorating the performance and reliability of semiconductor devices.
本考案の目的は、ウエーハ処理中にウエーハを
汚染しない薬液加熱装置を提供することにある。 An object of the present invention is to provide a chemical heating device that does not contaminate wafers during wafer processing.
本考案の薬液加熱装置は、薬液を満たす薬液槽
と、薬液槽の周囲に配置された電磁誘導加熱器
と、この電磁誘導加熱器を含み前記薬液槽を包合
する防磁壁材と、前記薬液に没するとともに前記
薬液の温度を測定する温度測定用熱伝対と、前記
防磁壁材外に配置されるとともに前記薬液の温度
を所定の温度に制御する温度調節器とを備え構成
される。
The chemical solution heating device of the present invention includes a chemical solution tank filled with a chemical solution, an electromagnetic induction heater placed around the drug solution tank, a magnetic shielding wall material including the electromagnetic induction heater and surrounding the chemical solution tank, and the chemical solution A temperature measuring thermocouple that is immersed in the chemical liquid and measures the temperature of the chemical liquid, and a temperature regulator that is disposed outside the magnetic shielding wall material and controls the temperature of the chemical liquid to a predetermined temperature.
次に、本考案について図面を参照して説明す
る。
Next, the present invention will be explained with reference to the drawings.
第１図は本考案の第１の実施例を示す薬液加熱
装置の断面図である。この薬液加熱装置は、ウエ
ーハ及びキヤリア３を浸した薬液２が満たされた
薬液槽１と、この薬液槽１の周囲に配置された電
磁誘導加熱器７と、この電磁誘導加熱器７を含み
薬液槽１を包合する防磁壁８及び防磁材上蓋４
と、薬液２に没するとともに薬液の温度を測定す
る温度測定用熱伝対６と、防磁壁８の外に配置さ
れるとともに薬液の温度を所定の温度に制御する
温度調節器５とを有している。 FIG. 1 is a sectional view of a chemical liquid heating device showing a first embodiment of the present invention. This chemical liquid heating device includes a chemical liquid tank 1 filled with a chemical liquid 2 in which a wafer and a carrier 3 are immersed, an electromagnetic induction heater 7 disposed around this chemical liquid tank 1, and a chemical liquid heating device 7. Magnetic shielding wall 8 and magnetic shielding material top cover 4 enclosing tank 1
, a temperature measuring thermocouple 6 that is immersed in the chemical solution 2 and measures the temperature of the chemical solution, and a temperature regulator 5 that is arranged outside the magnetic shield wall 8 and controls the temperature of the chemical solution to a predetermined temperature. are doing.
この薬液加熱装置の動作は、まず、防磁材上蓋
４を開き、薬液槽１に薬液２を満たす。次に、防
磁材上蓋４を閉じ、電磁誘導加熱器７を動作さ
せ、薬液２を、例えば、温度50〜200℃程度に加
熱し、温度調節器５にて温度を調節する。その
後、再び、防磁材上蓋４を開き、ウエーハを収納
したキヤリアを薬液２に浸す。次に、防磁材上蓋
４を閉じ、所定の処理を行なう。次に、処理完了
後、防磁材上蓋４を開け、ウエーハ及びキヤリア
３を取り出す。また、これら一連の動作の間、電
磁誘導加熱器７は、上蓋開閉検知センサー９によ
り防磁材上蓋４が閉じていることを検知し、この
ときのみ動作するようになつている。 The operation of this chemical liquid heating device is as follows: First, the magnetic shielding material upper cover 4 is opened, and the chemical liquid tank 1 is filled with the chemical liquid 2. Next, the magnetic shielding material upper cover 4 is closed, and the electromagnetic induction heater 7 is operated to heat the chemical solution 2 to a temperature of, for example, about 50 to 200° C., and the temperature is adjusted by the temperature controller 5. Thereafter, the magnetic shielding material upper cover 4 is opened again, and the carrier containing the wafer is immersed in the chemical solution 2. Next, the magnetic shielding material upper cover 4 is closed and predetermined processing is performed. Next, after the processing is completed, the magnetic shielding material upper cover 4 is opened and the wafer and carrier 3 are taken out. Further, during these series of operations, the electromagnetic induction heater 7 is configured to operate only when the upper lid opening/closing detection sensor 9 detects that the magnetically shielding material upper lid 4 is closed.
第２図は本考案の第２の実施例を示す薬液加熱
装置の断面図である。この薬液加熱装置は、薬液
入口１０と薬液出口１４とを連結し、加熱された
薬液２をポンプ１３により薬液２を循環すること
である。それ以外は、第１の実施例と同じであ
る。この実施例で、例えば、薬液入口１０と薬液
出口１４との間にフイルタを設ければ、薬液は常
に清浄度を保ち、また、この循環により薬液がよ
く攪拌されるので、薬液の温度が液層間が均一に
なるという利点がある。 FIG. 2 is a sectional view of a chemical liquid heating device showing a second embodiment of the present invention. This chemical liquid heating device connects a chemical liquid inlet 10 and a chemical liquid outlet 14, and circulates the heated chemical liquid 2 by a pump 13. The rest is the same as the first embodiment. In this embodiment, for example, if a filter is provided between the chemical liquid inlet 10 and the chemical liquid outlet 14, the chemical liquid will always maintain its cleanliness, and since the chemical liquid will be well stirred by this circulation, the temperature of the chemical liquid will be lower than that of the liquid. This has the advantage that the layers are uniform.
以上説明したように本考案は、薬液槽外に電磁
誘導加熱器を設けて、薬液を間接的に加熱するこ
とによつて、薬液を汚染することなく、また、ウ
エーハ面に異物が付着しない薬液加熱装置が得ら
れるという効果がある。
As explained above, the present invention provides an electromagnetic induction heater outside the chemical tank to heat the chemical indirectly, thereby preventing contamination of the chemical and preventing foreign matter from adhering to the wafer surface. This has the effect of providing a heating device.
第１図は本考案の第１の実施例を示す薬液加熱
装置の断面図、第２図は本考案の第２の実施例を
示す薬液加熱装置の断面図、第３図は従来の一例
を示す薬液加熱装置の断面図である。
１，１２……薬液槽、２……薬液、３……ウエ
ーハ及びキヤリア、４……防磁材上蓋、５……温
度調節器、６……温度測定用熱伝対、７……電磁
誘導加熱器、８，１１……防磁壁、９……上蓋開
閉検知センサー、１０……薬液入口、１３……ポ
ンプ、１４……薬液出口、１５……ヒータ。
Fig. 1 is a cross-sectional view of a chemical liquid heating device showing a first embodiment of the present invention, Fig. 2 is a cross-sectional view of a chemical liquid heating device showing a second embodiment of the present invention, and Fig. 3 is a conventional example. It is a sectional view of the chemical liquid heating device shown. 1, 12... Chemical solution tank, 2... Chemical solution, 3... Wafer and carrier, 4... Magnetic shielding material top cover, 5... Temperature controller, 6... Temperature measurement thermocouple, 7... Electromagnetic induction heating Container, 8, 11...Magnetic shield wall, 9...Top lid opening/closing detection sensor, 10...Medical solution inlet, 13...Pump, 14...Medical solution outlet, 15...Heater.
Claims (1)
置された電磁誘導加熱器と、この電磁誘導加熱器
を含み前記薬液槽を包合する防磁壁材と、前記薬
液に没するとともに前記薬液の温度を測定する温
度測定用熱伝対と、前記防磁壁材外に配置される
とともに前記薬液の温度を所定の温度に制御する
温度調節器とを備えることを特徴とする薬液加熱
装置。 A chemical tank filled with a chemical solution, an electromagnetic induction heater placed around the chemical tank, a magnetically shielding wall material containing the electromagnetic induction heater and enclosing the chemical tank, and a wall material immersed in the chemical solution and containing the chemical solution. A chemical liquid heating device comprising: a temperature measuring thermocouple for measuring temperature; and a temperature regulator disposed outside the magnetic shielding wall material and controlling the temperature of the chemical liquid to a predetermined temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16999688U JPH0537473Y2 (en) | 1988-12-28 | 1988-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16999688U JPH0537473Y2 (en) | 1988-12-28 | 1988-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0289830U JPH0289830U (en) | 1990-07-17 |
| JPH0537473Y2 true JPH0537473Y2 (en) | 1993-09-22 |
Family
ID=31460554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16999688U Expired - Lifetime JPH0537473Y2 (en) | 1988-12-28 | 1988-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0537473Y2 (en) |
-
1988
- 1988-12-28 JP JP16999688U patent/JPH0537473Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0289830U (en) | 1990-07-17 |
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